JP2010007161A5 - - Google Patents

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Publication number
JP2010007161A5
JP2010007161A5 JP2008170806A JP2008170806A JP2010007161A5 JP 2010007161 A5 JP2010007161 A5 JP 2010007161A5 JP 2008170806 A JP2008170806 A JP 2008170806A JP 2008170806 A JP2008170806 A JP 2008170806A JP 2010007161 A5 JP2010007161 A5 JP 2010007161A5
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JP
Japan
Prior art keywords
electrode
discharge
discharge circuit
discharge current
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008170806A
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English (en)
Japanese (ja)
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JP2010007161A (ja
JP5429772B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2008170806A external-priority patent/JP5429772B2/ja
Priority to JP2008170806A priority Critical patent/JP5429772B2/ja
Priority to US13/001,454 priority patent/US9210788B2/en
Priority to CN2009801254002A priority patent/CN102084024B/zh
Priority to PCT/JP2009/060988 priority patent/WO2010001723A1/ja
Priority to KR1020117002276A priority patent/KR101298167B1/ko
Priority to TW098120658A priority patent/TWI500799B/zh
Publication of JP2010007161A publication Critical patent/JP2010007161A/ja
Publication of JP2010007161A5 publication Critical patent/JP2010007161A5/ja
Publication of JP5429772B2 publication Critical patent/JP5429772B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008170806A 2008-06-30 2008-06-30 電源装置 Active JP5429772B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2008170806A JP5429772B2 (ja) 2008-06-30 2008-06-30 電源装置
KR1020117002276A KR101298167B1 (ko) 2008-06-30 2009-06-17 전원 장치
CN2009801254002A CN102084024B (zh) 2008-06-30 2009-06-17 电源装置
PCT/JP2009/060988 WO2010001723A1 (ja) 2008-06-30 2009-06-17 電源装置
US13/001,454 US9210788B2 (en) 2008-06-30 2009-06-17 Power supply apparatus
TW098120658A TWI500799B (zh) 2008-06-30 2009-06-19 Power supply

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008170806A JP5429772B2 (ja) 2008-06-30 2008-06-30 電源装置

Publications (3)

Publication Number Publication Date
JP2010007161A JP2010007161A (ja) 2010-01-14
JP2010007161A5 true JP2010007161A5 (enExample) 2011-06-30
JP5429772B2 JP5429772B2 (ja) 2014-02-26

Family

ID=41465824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008170806A Active JP5429772B2 (ja) 2008-06-30 2008-06-30 電源装置

Country Status (6)

Country Link
US (1) US9210788B2 (enExample)
JP (1) JP5429772B2 (enExample)
KR (1) KR101298167B1 (enExample)
CN (1) CN102084024B (enExample)
TW (1) TWI500799B (enExample)
WO (1) WO2010001723A1 (enExample)

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US10510575B2 (en) * 2017-09-20 2019-12-17 Applied Materials, Inc. Substrate support with multiple embedded electrodes
US10555412B2 (en) 2018-05-10 2020-02-04 Applied Materials, Inc. Method of controlling ion energy distribution using a pulse generator with a current-return output stage
US11476145B2 (en) 2018-11-20 2022-10-18 Applied Materials, Inc. Automatic ESC bias compensation when using pulsed DC bias
KR20250100790A (ko) 2019-01-22 2025-07-03 어플라이드 머티어리얼스, 인코포레이티드 펄스 전압 파형을 제어하기 위한 피드백 루프
US11508554B2 (en) 2019-01-24 2022-11-22 Applied Materials, Inc. High voltage filter assembly
CN109811324B (zh) * 2019-03-14 2021-02-09 哈尔滨工业大学 基于异质双靶高功率脉冲磁控溅射制备掺杂类薄膜的装置及方法
TWI692921B (zh) * 2019-06-26 2020-05-01 台達電子工業股份有限公司 電源供應電路與操作方法
US11462388B2 (en) 2020-07-31 2022-10-04 Applied Materials, Inc. Plasma processing assembly using pulsed-voltage and radio-frequency power
US11901157B2 (en) 2020-11-16 2024-02-13 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11798790B2 (en) 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11495470B1 (en) 2021-04-16 2022-11-08 Applied Materials, Inc. Method of enhancing etching selectivity using a pulsed plasma
US11948780B2 (en) 2021-05-12 2024-04-02 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11791138B2 (en) 2021-05-12 2023-10-17 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11967483B2 (en) 2021-06-02 2024-04-23 Applied Materials, Inc. Plasma excitation with ion energy control
US12148595B2 (en) 2021-06-09 2024-11-19 Applied Materials, Inc. Plasma uniformity control in pulsed DC plasma chamber
US12525433B2 (en) 2021-06-09 2026-01-13 Applied Materials, Inc. Method and apparatus to reduce feature charging in plasma processing chamber
US12525441B2 (en) 2021-06-09 2026-01-13 Applied Materials, Inc. Plasma chamber and chamber component cleaning methods
US11810760B2 (en) 2021-06-16 2023-11-07 Applied Materials, Inc. Apparatus and method of ion current compensation
US11569066B2 (en) 2021-06-23 2023-01-31 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US11776788B2 (en) 2021-06-28 2023-10-03 Applied Materials, Inc. Pulsed voltage boost for substrate processing
US11476090B1 (en) 2021-08-24 2022-10-18 Applied Materials, Inc. Voltage pulse time-domain multiplexing
US12106938B2 (en) 2021-09-14 2024-10-01 Applied Materials, Inc. Distortion current mitigation in a radio frequency plasma processing chamber
US11694876B2 (en) 2021-12-08 2023-07-04 Applied Materials, Inc. Apparatus and method for delivering a plurality of waveform signals during plasma processing
US11972924B2 (en) 2022-06-08 2024-04-30 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US12315732B2 (en) 2022-06-10 2025-05-27 Applied Materials, Inc. Method and apparatus for etching a semiconductor substrate in a plasma etch chamber
US12272524B2 (en) 2022-09-19 2025-04-08 Applied Materials, Inc. Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics
US12111341B2 (en) 2022-10-05 2024-10-08 Applied Materials, Inc. In-situ electric field detection method and apparatus

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