JP2009540567A - 高エネルギー・パルスレーザ用途のためのビーム形状及び対称性を安定化させるための装置及び方法 - Google Patents

高エネルギー・パルスレーザ用途のためのビーム形状及び対称性を安定化させるための装置及び方法 Download PDF

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JP2009540567A
JP2009540567A JP2009514300A JP2009514300A JP2009540567A JP 2009540567 A JP2009540567 A JP 2009540567A JP 2009514300 A JP2009514300 A JP 2009514300A JP 2009514300 A JP2009514300 A JP 2009514300A JP 2009540567 A JP2009540567 A JP 2009540567A
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JP2009540567A5 (cg-RX-API-DMAC7.html
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トーマス ホフマン
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サイマー インコーポレイテッド
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0977—Reflective elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Lasers (AREA)
  • Recrystallisation Techniques (AREA)
JP2009514300A 2006-06-05 2007-05-22 高エネルギー・パルスレーザ用途のためのビーム形状及び対称性を安定化させるための装置及び方法 Pending JP2009540567A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/447,380 US7433372B2 (en) 2006-06-05 2006-06-05 Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
PCT/US2007/012389 WO2007145791A2 (en) 2006-06-05 2007-05-22 Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications

Publications (2)

Publication Number Publication Date
JP2009540567A true JP2009540567A (ja) 2009-11-19
JP2009540567A5 JP2009540567A5 (cg-RX-API-DMAC7.html) 2010-07-08

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ID=38789765

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JP2009514300A Pending JP2009540567A (ja) 2006-06-05 2007-05-22 高エネルギー・パルスレーザ用途のためのビーム形状及び対称性を安定化させるための装置及び方法

Country Status (6)

Country Link
US (1) US7433372B2 (cg-RX-API-DMAC7.html)
EP (1) EP2036168B1 (cg-RX-API-DMAC7.html)
JP (1) JP2009540567A (cg-RX-API-DMAC7.html)
KR (1) KR101389722B1 (cg-RX-API-DMAC7.html)
TW (1) TWI344014B (cg-RX-API-DMAC7.html)
WO (1) WO2007145791A2 (cg-RX-API-DMAC7.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7564888B2 (en) * 2004-05-18 2009-07-21 Cymer, Inc. High power excimer laser with a pulse stretcher
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US8803027B2 (en) * 2006-06-05 2014-08-12 Cymer, Llc Device and method to create a low divergence, high power laser beam for material processing applications
JP5891504B2 (ja) * 2011-03-08 2016-03-23 株式会社Ｊｏｌｅｄ 薄膜トランジスタアレイ装置の製造方法
KR102369090B1 (ko) 2015-09-15 2022-03-02 삼성디스플레이 주식회사 레이저 장치
KR102744480B1 (ko) 2019-04-12 2024-12-20 삼성디스플레이 주식회사 레이저 장치 및 이를 이용한 표시 장치의 제조 방법

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5042499A (cg-RX-API-DMAC7.html) * 1973-08-21 1975-04-17
JPH01319727A (ja) * 1988-06-22 1989-12-26 Sony Corp 光学装置
JPH02166783A (ja) * 1988-12-21 1990-06-27 Adomon Sci Kk エキシマレーザーのホモジナイザー
JPH0990265A (ja) * 1995-09-26 1997-04-04 Asahi Optical Co Ltd 像反転光学系
JPH11283933A (ja) * 1998-01-29 1999-10-15 Toshiba Corp レ―ザ照射装置，非単結晶半導体膜の製造方法及び液晶表示装置の製造方法
JPH11312631A (ja) * 1998-04-27 1999-11-09 Nikon Corp 照明光学装置および露光装置
JPH11352419A (ja) * 1998-06-04 1999-12-24 Sumitomo Heavy Ind Ltd ビーム回転機能付ホモジナイザ装置及びこれを用いたレーザ加工装置
JP2002139697A (ja) * 2000-11-02 2002-05-17 Mitsubishi Electric Corp 複数レーザビームを用いたレーザ光学系とレーザアニーリング装置
JP2002174767A (ja) * 2000-12-08 2002-06-21 Mitsubishi Electric Corp レーザ処理用のレーザ光学系
JP2005502211A (ja) * 2001-08-29 2005-01-20 サイマー インコーポレイテッド ビームデリバリーを備えたレーザリソグラフィー光源

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6693930B1 (en) * 2000-12-12 2004-02-17 Kla-Tencor Technologies Corporation Peak power and speckle contrast reduction for a single laser pulse
US7167499B2 (en) 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7009140B2 (en) 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US7326948B2 (en) * 2005-08-15 2008-02-05 Asml Netherlands B.V. Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5042499A (cg-RX-API-DMAC7.html) * 1973-08-21 1975-04-17
JPH01319727A (ja) * 1988-06-22 1989-12-26 Sony Corp 光学装置
JPH02166783A (ja) * 1988-12-21 1990-06-27 Adomon Sci Kk エキシマレーザーのホモジナイザー
JPH0990265A (ja) * 1995-09-26 1997-04-04 Asahi Optical Co Ltd 像反転光学系
JPH11283933A (ja) * 1998-01-29 1999-10-15 Toshiba Corp レ―ザ照射装置，非単結晶半導体膜の製造方法及び液晶表示装置の製造方法
JPH11312631A (ja) * 1998-04-27 1999-11-09 Nikon Corp 照明光学装置および露光装置
JPH11352419A (ja) * 1998-06-04 1999-12-24 Sumitomo Heavy Ind Ltd ビーム回転機能付ホモジナイザ装置及びこれを用いたレーザ加工装置
JP2002139697A (ja) * 2000-11-02 2002-05-17 Mitsubishi Electric Corp 複数レーザビームを用いたレーザ光学系とレーザアニーリング装置
JP2002174767A (ja) * 2000-12-08 2002-06-21 Mitsubishi Electric Corp レーザ処理用のレーザ光学系
JP2005502211A (ja) * 2001-08-29 2005-01-20 サイマー インコーポレイテッド ビームデリバリーを備えたレーザリソグラフィー光源

Also Published As

Publication number Publication date
US20070279747A1 (en) 2007-12-06
TWI344014B (en) 2011-06-21
EP2036168B1 (en) 2019-07-03
US7433372B2 (en) 2008-10-07
WO2007145791A2 (en) 2007-12-21
TW200804869A (en) 2008-01-16
EP2036168A4 (en) 2011-07-13
EP2036168A2 (en) 2009-03-18
WO2007145791A3 (en) 2008-03-13
KR101389722B1 (ko) 2014-04-29
KR20090015962A (ko) 2009-02-12

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