JP2009540341A - 光アドレス式グレースケール電荷蓄積型空間光変調器 - Google Patents
光アドレス式グレースケール電荷蓄積型空間光変調器 Download PDFInfo
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Abstract
【選択図】図11
Description
グレースケールの異なるビットの1に対応する2つの入力光パルスの、異なる画素aおよびbに対応する読み出しバルブは、OASLMの異なる位置、すなわち印加電圧信号68の開始端74に対してシフトした時点に到達する。図示される光パルス50および52は異なる持続時間および異なる強度を有する。実際、あるパルスに対する別のパルスの持続時間または強度あるいは持続時間および強度の両方は、適切なビット重みもたらすように調整されてもよい。
・ OASLMの積算特性における非線形性
・ OASLMの積算特性における非対称性
・ 書き込みバルブ液晶材料における応答時間変動
・ 書き込みバルブのコントラスト(オン対オフ比)における変動
・ 特に温度の関数としての、書き込みバルブの理想的でないスイッチング特性
・ 書き込みバルブ照射LEDにおけるタイミングまたは電流制御誤差
・ 最初に、実際に所望するものよりも約50%高いフルスケール値をもたらすはずのパルスタイミング、幅、および電流の初期セットを、上に開示された方法のいずれかを使用して、選択する(この50%の値は、以下のステップに記載される調整の蓄積効果を訂正するためのものである。50%の数字は本明細書に記載の例にほぼ適切であるが、実際に行なわれる選択に応じてその他の値を使用してもよい)。
・ LSB+1から順々に、次のビットの有効ビット重みを、そのビットより下位の全てのビットのビット重みの和より約10%少ないものに設定する。
・ これを、順々に上位のビットへと繰り返し、MSBで終了する。従って、MSBに選択される有効重みは、全下位ビットの和の予測重みの90%である。あるいは、512値パルスに提供されるデジタル重みは、511値を形成するように組み合わされるパルスのデジタル重みの90%であると言える。
・ 実際は、当然ながら10%以外の調整も使用可能である。多くの場合、5%でも十分である。また、実際は、上述の違いに大幅に影響される可能性があるため、この調整も、いくつかの最大有効ビットだけに適用する必要があるだけの場合もある。
・ 必要に応じて、所望のフルスケール応答および所望の非単調性ビットキャリーが達成されるまで、異なる初期条件を使用して上記順序全体を繰り返すことが可能である。
Claims (36)
- 読み出しライトバルブに光学的に書き込む方法であって、1つのフレーム中に、
光書き込み型ライトバルブの特定の画素位置に対し、選択された書き込みセル電圧を印加することと、
前記画素位置から書き込み光パルスを放射させるべく、前記画素位置が光学的な安定状態を達成した後に、変調した光源パルスで前記画素位置を照射することと、
光読み出しライトバルブの電気光学層の局所部分に、前記書き込み光パルスを誘導することと、
前記印加すること、照射すること、および誘導することを、複数の選択された書き込みセル電圧および変調光源パルスについて順々に繰り返すことと、
を含む、方法。 - 前記フレームの持続時間の間、前記読み出しライトバルブの前記電気光学層に駆動電圧を印加することと、前記光読み出しライトバルブの前記局所部分について、前記書き込み光パルスの光パワーに対応する電圧を、前記フレームに亘って積分することと、をさらに含む、請求項1に記載の方法。
- 前記光読み出しバルブの前記電気光学層に、前記書き込み光パルスの関数としてもたらされる変調は、単調性(monotonic)である、請求項1に記載の方法。
- 前記画素位置が光学的に安定状態に到達した後に前記画素位置を照射することは、前記選択された書き込みセル電圧の各々をまず印加した後に、応答待機時間を設定することを含む、請求項1に記載の方法。
- 前記応答待機時間は、前記複数の選択された書き込みセル電圧の各々について一定である、請求項4に記載の方法。
- 前記光源は、パルス幅によって変調される、請求項1に記載の方法。
- 前記選択された書き込みセル電圧の各々は、前記画素位置が前記光学的な安定状態に達するのにかかる時間と、前記パルス幅変調された光源パルスのそれぞれによって前記画素位置が照射される時間とを加えた時間にほぼ等しい持続時間の間印加される、請求項6に記載の方法。
- 前記光源は、パルス振幅またはデューティサイクルによって変調される、請求項1に記載の方法。
- 前記選択された書き込みセル電圧を印加することは、書き込みセル画素電圧"On"を前記光書き込み型ライトバルブの第1のバックプレートデータラッチに印加することと、その後の選択された時間において、前記書き込みセル画素電圧"On"を、前記画素位置を画定する電極に出力が接続される第2のデータラッチに転送することを含む、請求項1に記載の方法。
- 前記光書き込み型ライトバルブは、シリコンデバイス上に液晶を備え、前記変調光源は、発光ダイオードまたは前記光書き込み型ライトバルブにおいて単色として見なされる波長を発光するレーザダイオードを備える、請求項9に記載の方法。
- 前記順々に印加される選択された書き込みセル電圧は、前記フレーム全体において分散される、請求項1に記載の方法。
- 前記順々に印加される選択された書き込みセル電圧は、前記フレームの前半部分に制限される、請求項1に記載の方法。
- 前記書き込み光パルスを誘導することは、3つの光読み出しライトバルブの電気光学層の局所部分に前記書き込み光パルスを誘導することを含み、前記フレームは、前記光読み出しライトバルブのフレームの長さの約3分の1である書き込みセルフレームである、請求項1に記載の方法。
- 電気光学層と、
前記電気光学層の画素位置を画定するバックプレートと、
前記電気光学層と光学的に接続される光源と、
メモリが組み合わされる制御器であって、1つのフレームの間に、光書き込み型ライトバルブの特定の画素位置に対して、選択された複数の書き込みセル電圧を順々に且つ非連続的に印加し、前記印加された書き込みセル電圧毎に、前記画素位置が光学的な安定状態に達した後に、前記選択された書き込みセル電圧が印加された時間に応じて前記光源を変調するように構成される制御器と、
を備える、光書き込み型ライトバルブ。 - 前記書き込みバルブの前記電気光学層と光学的に接続される光読み出しライトバルブをさらに備え、前記制御器は、前記フレームの持続時間の間に、前記光読み出しライトバルブの電気光学層に駆動電圧を印加するようにさらに構成される、請求項14に記載の光書き込み型ライトバルブ。
- 前記光書き込み型ライトバルブの前記画素位置から放射する前記光読み出しバルブの前記電気光学層に、前記書き込み光パルスの関数としてもたらされる変調は、単調性(monotonic)である、請求項15に記載の光書き込み型ライトバルブ。
- 前記制御器は、前記選択された書き込みセル電圧の各々を印加した後に応答待機時間を設定することによって、前記画素位置が光学的に安定状態に到達した後に、前記光源を変調するように構成される、請求項14に記載の光書き込み型ライトバルブ。
- 前記応答待機時間は、前記選択された書き込みセル電圧の各々について一定である、請求項17に記載の光書き込み型ライトバルブ。
- 前記制御器は、前記光源パルス幅を変調する、請求項14に記載の光書き込み型ライトバルブ。
- 前記選択された書き込みセル電圧の各々は、前記画素位置が前記光学的な安定状態に達するのにかかる時間と、前記パルス幅変調された光源パルスのそれぞれによって前記画素位置が照射される時間とを加えた時間にほぼ等しい持続時間の間印加される、請求項19に記載の光書き込み型ライトバルブ。
- 前記光源は、パルス振幅またはデューティサイクルによって変調される、請求項14に記載の光書き込み型ライトバルブ。
- 前記バックプレートは、第1および第2のデータラッチをさらに備え、前記制御器は、書き込みセル画素電圧"On"を前記光書き込み型ライトバルブの第1のデータラッチにおいて印加することによって前記選択された書き込みセル電圧の各々を印加し、その後の選択された時間において、前記書き込みセル画素電圧"On"を、前記画素位置を画定する電極に出力が接続される第2のデータラッチに転送するように構成される、請求項14に記載の光書き込み型ライトバルブ。
- 前記光書き込み型ライトバルブは、シリコンデバイス上に液晶を備え、前記変調光源は、発光ダイオードまたは前記光書き込み型ライトバルブにおいて単色として見なされる波長を発光するレーザダイオードを備える、請求項22に記載の光書き込み型ライトバルブ。
- 前記複数の選択された書き込みセル電圧は、前記フレーム全体において分散されるように印加される、請求項14に記載の光書き込み型ライトバルブ。
- 前記複数の選択された書き込みセル電圧は、前記フレームの前半部分に制限されるように印加される、請求項14に記載の光書き込み型ライトバルブ。
- 光学書き込み光を発光させるための動作を実行するためのコンピュータ可読命令を含むメモリに具現化されるコンピュータプログラムであって、前記動作は、あるフレームにおいて、
光書き込み型ライトバルブの特定の画素位置に対して選択された書き込みセル電圧を印加することと、
前記画素位置から書き込み光パルスを放射させるべく、前記画素位置が光学的な安定状態を達成した後に、変調した光源パルスで前記画素位置を照射することと、
光読み出しライトバルブの電気光学層の局所部分に、前記書き込み光パルスを誘導することと、
前記印加すること、照射すること、および誘導することを、複数の選択された書き込みセル電圧および変調光源パルスについて順々に繰り返すことと、
を、含む、コンピュータプログラム。 - 前記フレームの持続時間の間に、前記読み出しライトバルブの前記電気光学層に駆動電圧を印加することと、読み出しライトバルブ前記光読み出しライトバルブの前記局所部分について、前記書き込み光パルスの光パワーに対応する電圧を、前記フレームに亘って積分することと、をさらに含む、請求項26に記載のコンピュータプログラム。
- 前記光読み出しバルブの前記電気光学層に、前記書き込み光パルスの関数としてもたらされる変調は、単調性(monotonic)である、請求項26に記載のコンピュータプログラム。
- 前記画素位置が光学的に安定状態に到達した後に前記画素位置を照射することは、前記選択された書き込みセル電圧の各々をまず印加した後に、応答待機時間を設定することを含む、請求項26に記載のコンピュータプログラム。
- 前記応答待機時間は、前記複数の選択された書き込みセル電圧の各々について一定である、請求項26に記載のコンピュータプログラム。
- 前記光源は、パルス幅によって変調される、請求項26に記載のコンピュータプログラム。
- 前記選択された書き込みセル電圧の各々は、前記画素位置が前記光学的な安定状態に達するのにかかる時間と、前記パルス幅変調された光源パルスのそれぞれによって前記画素位置が照射される時間とを加えた時間にほぼ等しい持続時間印加される、請求項31に記載のコンピュータプログラム。
- 前記光源は、パルス振幅またはデューティサイクルによって変調される、請求項26に記載のコンピュータプログラム。
- 前記選択された書き込みセル電圧を印加することは、書き込みセル画素電圧"On"を前記光書き込み型ライトバルブの第1のバックプレートデータラッチに印加することと、その後の選択された時間において、前記書き込みセル画素電圧"On"を、前記画素位置を画定する電極に出力が接続される第2のデータラッチに転送することを含む、請求項26に記載のコンピュータプログラム。
- 前記順々に印加される選択された書き込みセル電圧は、前記フレーム全体において分散される、請求項26に記載のコンピュータプログラム。
- 前記順々に印加される選択された書き込みセル電圧は、前記フレームの前半部分に制限される、請求項26に記載のコンピュータプログラム。
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JP2015121664A (ja) * | 2013-12-24 | 2015-07-02 | オリンパス株式会社 | 光刺激装置および顕微鏡システム |
US9733461B2 (en) | 2013-12-24 | 2017-08-15 | Olympus Corporation | Photo-stimulator and microscope system |
WO2020145046A1 (ja) * | 2019-01-07 | 2020-07-16 | ソニー株式会社 | 空間光変調システム、空間光変調デバイス及び表示装置 |
US11676550B2 (en) | 2019-01-07 | 2023-06-13 | Sony Group Corporation | Spatial light modulator system, spatial light modulator device, and display apparatus for preventing influences of mechanical operations of a light modulation unit |
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