JP2009537310A - 透明構造体を形成するための着色マスキング - Google Patents
透明構造体を形成するための着色マスキング Download PDFInfo
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- JP2009537310A JP2009537310A JP2009511055A JP2009511055A JP2009537310A JP 2009537310 A JP2009537310 A JP 2009537310A JP 2009511055 A JP2009511055 A JP 2009511055A JP 2009511055 A JP2009511055 A JP 2009511055A JP 2009537310 A JP2009537310 A JP 2009537310A
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- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
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- 229910052763 palladium Inorganic materials 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003009 phosphonic acids Chemical group 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
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- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
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- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
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- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
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- 239000005061 synthetic rubber Substances 0.000 description 1
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/437,923 US20070269750A1 (en) | 2006-05-19 | 2006-05-19 | Colored masking for forming transparent structures |
| PCT/US2007/011734 WO2007136656A2 (en) | 2006-05-19 | 2007-05-16 | Colored masking for forming transparent structures |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009537310A true JP2009537310A (ja) | 2009-10-29 |
| JP2009537310A5 JP2009537310A5 (enExample) | 2011-06-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009511055A Withdrawn JP2009537310A (ja) | 2006-05-19 | 2007-05-16 | 透明構造体を形成するための着色マスキング |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20070269750A1 (enExample) |
| EP (1) | EP2018596A2 (enExample) |
| JP (1) | JP2009537310A (enExample) |
| TW (1) | TW200813490A (enExample) |
| WO (1) | WO2007136656A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011505589A (ja) * | 2007-11-20 | 2011-02-24 | イーストマン コダック カンパニー | 選択的領域堆積と組み合わせて着色マスクを使用する方法 |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7687205B2 (en) * | 2006-06-15 | 2010-03-30 | The Boeing Company | Photolithographic method and apparatus employing a polychromatic mask |
| TWI308800B (en) * | 2006-10-26 | 2009-04-11 | Ind Tech Res Inst | Method for making thin film transistor and structure of the same |
| US7972898B2 (en) * | 2007-09-26 | 2011-07-05 | Eastman Kodak Company | Process for making doped zinc oxide |
| US8173355B2 (en) * | 2007-11-20 | 2012-05-08 | Eastman Kodak Company | Gradient colored mask |
| US8221964B2 (en) * | 2007-11-20 | 2012-07-17 | Eastman Kodak Company | Integrated color mask |
| US8153352B2 (en) * | 2007-11-20 | 2012-04-10 | Eastman Kodak Company | Multicolored mask process for making display circuitry |
| US8062693B2 (en) * | 2008-09-22 | 2011-11-22 | Sunpower Corporation | Generation of contact masks for inkjet printing on solar cell substrates |
| US8409911B2 (en) * | 2009-02-24 | 2013-04-02 | Sunpower Corporation | Methods for metallization of solar cells |
| DE102009033762A1 (de) * | 2009-07-17 | 2011-01-27 | Leonhard Kurz Stiftung & Co. Kg | Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper |
| US20110048505A1 (en) * | 2009-08-27 | 2011-03-03 | Gabriela Bunea | Module Level Solution to Solar Cell Polarization Using an Encapsulant with Opened UV Transmission Curve |
| US8377738B2 (en) | 2010-07-01 | 2013-02-19 | Sunpower Corporation | Fabrication of solar cells with counter doping prevention |
| US20120104103A1 (en) * | 2010-10-29 | 2012-05-03 | Nxp B.V. | Integrated pcb uhf rfid matching network/antenna |
| US10381720B2 (en) | 2010-12-08 | 2019-08-13 | Nxp B.V. | Radio frequency identification (RFID) integrated circuit (IC) and matching network/antenna embedded in surface mount devices (SMD) |
| US9301397B2 (en) * | 2011-09-30 | 2016-03-29 | 3M Innovative Properties Company | Methods of continuously wet etching a patterned substrate |
| US9821309B2 (en) * | 2012-07-05 | 2017-11-21 | Cornell University | Porous membrane apparatus, method, and applications |
| US9812590B2 (en) | 2012-10-25 | 2017-11-07 | Sunpower Corporation | Bifacial solar cell module with backside reflector |
| US9035172B2 (en) | 2012-11-26 | 2015-05-19 | Sunpower Corporation | Crack resistant solar cell modules |
| US20140170427A1 (en) * | 2012-12-13 | 2014-06-19 | Carestream Health, Inc. | Anticorrosion agents for transparent conductive film |
| US8796061B2 (en) | 2012-12-21 | 2014-08-05 | Sunpower Corporation | Module assembly for thin solar cells |
| US9685571B2 (en) | 2013-08-14 | 2017-06-20 | Sunpower Corporation | Solar cell module with high electric susceptibility layer |
| KR102287813B1 (ko) * | 2014-05-30 | 2021-08-10 | 삼성전자주식회사 | 하드마스크 조성물 및 이를 이용한 패턴의 형성방법 |
| CN104900531A (zh) * | 2015-06-08 | 2015-09-09 | 京东方科技集团股份有限公司 | 一种氧化物薄膜晶体管、阵列基板及制作方法、显示装置 |
| DE102015015452A1 (de) * | 2015-12-02 | 2017-06-08 | Forschungszentrum Jülich GmbH | Verfahren zum Planarisieren von Nanostrukturen |
| CN114649195B (zh) * | 2022-03-10 | 2025-08-15 | 西安应用光学研究所 | 一种光学基底表面ito薄膜的高效去除方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2371746A (en) * | 1942-12-12 | 1945-03-20 | Eastman Kodak Co | Photographic color correction process |
| NL87862C (enExample) * | 1951-08-20 | |||
| BE542578A (enExample) * | 1954-11-05 | |||
| JPS60149025A (ja) * | 1984-01-13 | 1985-08-06 | Seiko Epson Corp | 液晶表示装置 |
| US5314769A (en) * | 1991-04-25 | 1994-05-24 | Nippon Oil Co., Ltd. | Method for producing color filter |
| US5391507A (en) * | 1993-09-03 | 1995-02-21 | General Electric Company | Lift-off fabrication method for self-aligned thin film transistors |
| US6338988B1 (en) * | 1999-09-30 | 2002-01-15 | International Business Machines Corporation | Method for fabricating self-aligned thin-film transistors to define a drain and source in a single photolithographic step |
| GB9927287D0 (en) * | 1999-11-19 | 2000-01-12 | Koninkl Philips Electronics Nv | Top gate thin film transistor and method of producing the same |
| KR100672645B1 (ko) * | 2003-10-02 | 2007-01-23 | 엘지.필립스 엘시디 주식회사 | 컬러필터 기판의 제조방법 |
| US7056834B2 (en) * | 2004-02-10 | 2006-06-06 | Hewlett-Packard Development Company, L.P. | Forming a plurality of thin-film devices using imprint lithography |
| US7259106B2 (en) * | 2004-09-10 | 2007-08-21 | Versatilis Llc | Method of making a microelectronic and/or optoelectronic circuitry sheet |
| US7100510B2 (en) * | 2005-02-09 | 2006-09-05 | Eastman Kodak Company | Method for registering patterns on a web |
-
2006
- 2006-05-19 US US11/437,923 patent/US20070269750A1/en not_active Abandoned
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2007
- 2007-05-16 EP EP07777089A patent/EP2018596A2/en not_active Withdrawn
- 2007-05-16 JP JP2009511055A patent/JP2009537310A/ja not_active Withdrawn
- 2007-05-16 WO PCT/US2007/011734 patent/WO2007136656A2/en not_active Ceased
- 2007-05-18 TW TW096117914A patent/TW200813490A/zh unknown
- 2007-11-20 US US11/986,155 patent/US20080107878A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011505589A (ja) * | 2007-11-20 | 2011-02-24 | イーストマン コダック カンパニー | 選択的領域堆積と組み合わせて着色マスクを使用する方法 |
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| TW200813490A (en) | 2008-03-16 |
| WO2007136656A3 (en) | 2008-07-10 |
| WO2007136656A2 (en) | 2007-11-29 |
| US20070269750A1 (en) | 2007-11-22 |
| EP2018596A2 (en) | 2009-01-28 |
| US20080107878A1 (en) | 2008-05-08 |
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