JP2009536354A5 - - Google Patents

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Publication number
JP2009536354A5
JP2009536354A5 JP2009509605A JP2009509605A JP2009536354A5 JP 2009536354 A5 JP2009536354 A5 JP 2009536354A5 JP 2009509605 A JP2009509605 A JP 2009509605A JP 2009509605 A JP2009509605 A JP 2009509605A JP 2009536354 A5 JP2009536354 A5 JP 2009536354A5
Authority
JP
Japan
Prior art keywords
data
calibration sample
calibration
sample
reflectance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009509605A
Other languages
English (en)
Japanese (ja)
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JP2009536354A (ja
Filing date
Publication date
Priority claimed from US11/418,827 external-priority patent/US7282703B2/en
Priority claimed from US11/418,846 external-priority patent/US7511265B2/en
Application filed filed Critical
Priority claimed from PCT/US2007/010003 external-priority patent/WO2007130295A2/en
Publication of JP2009536354A publication Critical patent/JP2009536354A/ja
Publication of JP2009536354A5 publication Critical patent/JP2009536354A5/ja
Pending legal-status Critical Current

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JP2009509605A 2006-05-05 2007-04-25 比反射率測定法を用いて反射率計を精密に校正する方法と装置 Pending JP2009536354A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/418,827 US7282703B2 (en) 2004-08-11 2006-05-05 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
US11/418,846 US7511265B2 (en) 2004-08-11 2006-05-05 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
PCT/US2007/010003 WO2007130295A2 (en) 2006-05-05 2007-04-25 Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement

Publications (2)

Publication Number Publication Date
JP2009536354A JP2009536354A (ja) 2009-10-08
JP2009536354A5 true JP2009536354A5 (https=) 2010-06-17

Family

ID=38668211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009509605A Pending JP2009536354A (ja) 2006-05-05 2007-04-25 比反射率測定法を用いて反射率計を精密に校正する方法と装置

Country Status (3)

Country Link
JP (1) JP2009536354A (https=)
KR (1) KR20090008454A (https=)
WO (1) WO2007130295A2 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7126131B2 (en) 2003-01-16 2006-10-24 Metrosol, Inc. Broad band referencing reflectometer
US8564780B2 (en) 2003-01-16 2013-10-22 Jordan Valley Semiconductors Ltd. Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces
US7663097B2 (en) * 2004-08-11 2010-02-16 Metrosol, Inc. Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
US7804059B2 (en) 2004-08-11 2010-09-28 Jordan Valley Semiconductors Ltd. Method and apparatus for accurate calibration of VUV reflectometer
US7511265B2 (en) * 2004-08-11 2009-03-31 Metrosol, Inc. Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
US20080129986A1 (en) 2006-11-30 2008-06-05 Phillip Walsh Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations
US8867041B2 (en) 2011-01-18 2014-10-21 Jordan Valley Semiconductor Ltd Optical vacuum ultra-violet wavelength nanoimprint metrology
US8565379B2 (en) 2011-03-14 2013-10-22 Jordan Valley Semiconductors Ltd. Combining X-ray and VUV analysis of thin film layers
GB2533589A (en) * 2014-12-22 2016-06-29 Ndc Infrared Eng Ltd Measurement of porous film
JP2022147223A (ja) * 2021-03-23 2022-10-06 大塚電子株式会社 光学測定システム、光学測定方法および測定プログラム
KR20230014949A (ko) 2021-07-22 2023-01-31 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3751643A (en) * 1972-05-23 1973-08-07 Ibm System for performing spectral analyses under computer control
US4029419A (en) * 1975-10-10 1977-06-14 International Business Machines Corporation Textile color analyzer calibration
JPH0521566A (ja) * 1991-07-12 1993-01-29 Dainippon Screen Mfg Co Ltd 半導体結晶におけるイオン注入量測定方法
US5408322A (en) * 1993-04-26 1995-04-18 Materials Research Corporation Self aligning in-situ ellipsometer and method of using for process monitoring
JP2001165628A (ja) * 1999-12-13 2001-06-22 Sharp Corp 膜厚測定装置
US6525829B1 (en) * 2001-05-25 2003-02-25 Novellus Systems, Inc. Method and apparatus for in-situ measurement of thickness of copper oxide film using optical reflectivity
US7126131B2 (en) * 2003-01-16 2006-10-24 Metrosol, Inc. Broad band referencing reflectometer

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