JP2009531526A - 施用可能な硬化樹脂 - Google Patents
施用可能な硬化樹脂 Download PDFInfo
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- JP2009531526A JP2009531526A JP2009503018A JP2009503018A JP2009531526A JP 2009531526 A JP2009531526 A JP 2009531526A JP 2009503018 A JP2009503018 A JP 2009503018A JP 2009503018 A JP2009503018 A JP 2009503018A JP 2009531526 A JP2009531526 A JP 2009531526A
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0083—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising electro-conductive non-fibrous particles embedded in an electrically insulating supporting structure, e.g. powder, flakes, whiskers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/16—Solid spheres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Automation & Control Theory (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
本願は、2006年3月28日に出願された米国特許仮出願No.60/786,633の優先権の利益を主張するものであり、その明細書の記載は参照により本明細書の記載の一部とする。
Claims (44)
- 熱界面及び/又はEMIシールドとして用いるための配合物を処理する方法であって、
前記配合物に剪断力を適用し、それにより前記配合物の粘度を調節し、前記配合物を施用可能にすること、
を含み、然も、前記配合物は、粒状充填剤成分と予備硬化したゲル成分との混合物である、方法。 - 配合物が、全重量に基づき20〜80%のゲル及び充填剤成分を含む、請求項1に記載の方法。
- 充填剤成分が、0.25〜250mm(約0.01〜10in)の平均粒径を有する、請求項1に記載の方法
- 配合物を、第一と第二の表面の中間にある間隙を満たすのに用いる、請求項1に記載の方法。
- 配合物が、間隙の大きさを変えるために施用可能である、請求項1に記載の方法。
- 間隙が、約0.25mm(又は、0.010〜0.120inの範囲内)の厚さを有する、請求項5に記載の方法。
- 間隙が熱的間隙である、請求項4に記載の方法。
- 熱的間隙が、熱伝導性である充填剤成分を有する配合物で満たされる、請求項7に記載の方法。
- 充填剤成分が、少なくとも約20W/m・Kの熱伝導度を有する、請求項8に記載の方法。
- 充填剤成分を、酸化物、窒化物、炭化物、二硼化物、黒鉛、及び金属粒子、及びそれらの混合物からなる群より選択される、請求項8に記載の方法。
- 配合物が、0.7W/m・Kの熱伝導度を有する、請求項1に記載の方法。
- 配合物が、約7.5×106cpsの粘度を有する、請求項1に記載の方法。
- 配合物が、約−50℃の最低温度から約150℃の最高温度の範囲の作動温度を有する、請求項1に記載の方法。
- 配合物が、2.25の比重を有する、請求項1に記載の方法。
- 配合物が、150℃で24時間後に、熱重量分析(TGA)による測定で約0.2%の重量損失を示す、請求項1に記載の方法。
- 配合物が、約10cc/分の流量を有する、請求項1に記載の方法。
- 配合物が、約6%の抽出可能シリコーンを有する、請求項1に記載の方法。
- 配合物が、10ミルで、約1000Vac/ミルの絶縁耐力を有する、請求項1に記載の方法。
- 配合物が、約1×1014Ωcmの体積抵抗率を有する、請求項1に記載の方法。
- 配合物が、室温で18カ月の保存寿命を有する、請求項1に記載の方法。
- 間隙が、EMI遮蔽間隙であり、充填剤成分が電気伝導性である、請求項4に記載の方法。
- 配合物が、約10MHz〜約10GHzの周波数範囲に亙って、少なくとも約60dBのEMI遮蔽効果を示す、請求項1に記載の方法。
- 重合体ゲル成分が、シリコーン重合体を含む、請求項1に記載の方法。
- 改良された熱及びEMI制御を具えた集積回路を実装する方法であって、
剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすること;
前記配合物を、集積回路上に施用し、熱及びEMI制御層を与えること;
を含み、然も、前記配合物が、予備硬化したゲル成分と粒状充填剤成分との混合物である、方法。 - 改良された、熱及びEMI制御のための集積回路実装方法であって、
剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすること;
を含み、然も、前記配合物が、予備硬化したゲル成分と粒状充填剤成分との混合物である、方法。 - 改良されたEMI遮蔽及び熱制御材料であって、
剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすること;
を含み、然も、前記配合物が、予備硬化したゲル成分と粒状充填剤成分との混合物である、方法を実施することにより製造された材料。 - 改良された熱及び/又は電気伝導性密封材であって、
剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすること;
を含み、然も、前記配合物が、予備硬化したゲル成分と粒状充填剤成分との混合物である、方法を実施することにより製造された密封材。 - EMI遮蔽及び熱制御組立体において、
第一領域を有する第一表面;
前記第一表面とは反対側の、第二領域を有する第二表面;及び
前記第一と第二の表面の中間にあり、それらの間に熱及び/又は電気伝導性通路を与える熱及び/又は電気伝導性界面;
を含み、然も、前記界面が、
剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすること;
を含み、然も、前記配合物が、予備硬化したゲル成分と粒状充填剤成分との混合物である、方法を実施することにより製造された熱及び/又は電気伝導性配合物を含む組立体。 - 配合物が完全に硬化されており、それにより自動化施用のための混合と硬化過程の必要性が除かれている、請求項28に記載の組立体。
- 重合体ゲル成分がシリコーン重合体を含む、請求項28に記載の組立体。
- 重合体ゲル成分がシリコーン樹脂である、請求項30に記載の組立体。
- 配合物のために選択された樹脂が、前記配合物の施用性を可能にする架橋構造を有する、請求項31に記載の組立体。
- 樹脂が、分岐鎖籠型オリゴシロキサン構造により形成された種類のシリコーン材料である、請求項32に記載の組立体。
- 適用中、配合物がポンプで送られ、剪断される、請求項28に記載の組立体。
- ポンプによる送出及び剪断により、配合物に剪断力が作用し、それによりその粘度が低下する、請求項34に記載の組立体。
- 配合物が、流動し易くなるか、又は粘性が少なくなることにより剪断力に反応し、それによりその粘度の低下がもたらされる、請求項35に記載の組立体。
- 配合物が、粘弾的性質を有する、請求項28に記載の組立体。
- 配合物が、その粘弾的性質により、剪断力を除去するとその元の粘度に戻ることができる、請求項37に記載の組立体。
- 配合物をディスペンサーから、任意選択的に/好ましくは7.5×106cpsの供給粘度でポンプにより送り、それにより配合物を1.5×106cpsに剪断する、請求項35に記載の組立体。
- 配合物が、非珪素材料を含む、請求項28に記載の組立体。
- 非珪素材料が、エポキシ、アクリル等からなる群より選択される、請求項40に記載の組立体。
- 非珪素材料が、シリコーンゲルの粘弾的性質を持たない、請求項40に記載の組立体。
- 方法が、剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすることを含む、請求項28に記載の組立体。
- EMI遮蔽及び熱制御組立体において、
第一領域を有する第一表面;
前記第一表面とは反対側の、第二領域を有する第二表面;及び
前記第一と第二の表面の中間に介在させた改良された熱及び/又は電気伝導性密封材;
を含み、然も、前記密封材が、
剪断力の適用により配合物の粘度を低下させ、それにより前記配合物を施用可能にすること;
を含み、然も、前記配合物が、予備硬化したゲル成分と粒状充填剤成分との混合物である、方法を実施することにより製造されたものである組立体。
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KR102177502B1 (ko) * | 2013-11-20 | 2020-11-11 | 삼성에스디아이 주식회사 | 전자 소자 보호용 통합 실리콘, 이를 이용한 회로 모듈 및 이의 제조 방법 |
US10744736B2 (en) | 2015-06-12 | 2020-08-18 | Neograf Solutions, Llc | Graphite composites and thermal management systems |
CN106832941A (zh) * | 2015-11-10 | 2017-06-13 | 李聪 | 一种抗震电缆的绝缘树脂 |
KR102359198B1 (ko) | 2016-03-31 | 2022-02-07 | 네오그라프 솔루션즈, 엘엘씨 | 노이즈 억제 조립체 |
US11411263B2 (en) * | 2019-03-06 | 2022-08-09 | Laird Technologies, Inc. | Thermal management and/or EMI mitigation materials including coated fillers |
CN115279825A (zh) * | 2019-12-19 | 2022-11-01 | 汉高股份有限及两合公司 | 含有反应性稀释剂的无硅酮热界面材料 |
WO2023070254A1 (zh) | 2021-10-25 | 2023-05-04 | 高柏科技股份有限公司 | 双层热界面材料结构、其制造方法及具有其之电池装置 |
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