JP2009523325A - 基板キャリヤをパージするための方法及び装置 - Google Patents
基板キャリヤをパージするための方法及び装置 Download PDFInfo
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H01L21/67017—Apparatus for fluid treatment
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67353—Closed carriers specially adapted for a single substrate
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- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0396—Involving pressure control
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Abstract
【選択図】 図2
Description
Claims (24)
- 密閉でき且つ少なくとも1つの基板を収容するように適応された包囲体と、
上記包囲体へ通じていて、基板キャリヤが閉じられている間に上記包囲体へのガスの流れを許容するように適応された第1のポートと、
を備えた基板キャリヤ。 - 上記包囲体は、気密に密閉されるように適応される、請求項1に記載の基板キャリヤ。
- 上記包囲体は、外圧より高い内圧を含むように適応される、請求項1に記載の基板キャリヤ。
- 上記第1のポートは、フィルタを含む、請求項1に記載の基板キャリヤ。
- 上記第1のポートは、ガス源が上記第1のポートに対して密閉されるように適応された第1のシールを含む、請求項1に記載の基板キャリヤ。
- 上記第1のポートは、第2のシールを含む、請求項5に記載の基板キャリヤ。
- 上記第2のシールは、上記第1のシールを取り囲むように配設される、請求項6に記載の基板キャリヤ。
- 上記第2のシールは、上記第1のシールの周りに同心的に配設される、請求項6に記載の基板キャリヤ。
- 上記第1のポートは、上記基板キャリヤのドアに配設される、請求項5に記載の基板キャリヤ。
- 上記第2のシールは、真空源に対して密閉され且つ上記基板キャリヤのドアに真空力を加えられるように適応される、請求項9に記載の基板キャリヤ。
- 上記ドアに加えられる上記真空力は、上記第1のポートを通して上記基板キャリヤ内へガスが流されることにより生成される力に対抗するように適応される、請求項10に記載の基板キャリヤ。
- 第2のポートを更に含み、上記第2のポートは、ガスを上記基板キャリヤから流出できるように適応され、上記第2のポートは、排気チャネルを上記第2のポートに対して密閉できるように適応された第1のシールを含む、請求項1に記載の基板キャリヤ。
- 上記第2のポートは、更に、上記第2のポートの上記第1のシールの周りに配設された第2のシールを含み、上記第2のシールは、真空源に対して密閉され、且つ上記基板キャリヤの上記第2のポートの上記第1のシールの周りの領域へ真空力を加えられるようにして、上記第1のポートを通して上記基板キャリヤ内へガスを流すことにより生成される力に対抗するように適応される、請求項12に記載の基板キャリヤ。
- ロードポートにおいて、
基板キャリヤを開放するため上記基板キャリヤのドアに結合するように適応されたプレートを備え、
上記プレートは、上記プレートの第1の側部において上記基板キャリヤのドアにおける第1のポートに結合し且つ上記プレートの第2の側部においてガス源に結合するように適応された第1の開口を含み、
上記ロードポートは、上記プレートにおける上記第1の開口を通して上記基板キャリヤへのガスの流れを許容するように適応される、
ロードポート。 - 真空源を更に含み、
上記プレートは、更に、第2の開口を含み、
上記第2の開口は、上記プレートの上記第2の側部において上記真空源に結合され、上記第2の開口は、上記第1の開口の周りに配設された空間が上記プレートの上記第1の側部において排気されるように配設され、上記空間は、上記第1の開口を上記第1のポートに対して密閉する第1のシール及び上記第1のシールの周りに配設され上記第2の開口を上記第1のポートに対して密閉する第2のシールによって画成される、
請求項14に記載のロードポート。 - 排気チャネルを更に含み、
上記プレートは、更に、上記プレートの上記第2の側部において上記排気チャネルに結合され且つ上記プレートの上記第1の側部において上記基板キャリヤの第2のポートに結合される第3の開口を含む、
請求項14に記載のロードポート。 - 基板キャリヤの外側の圧力よりも高い圧力を上記基板キャリヤの内側に生成するように上記基板キャリヤへガスを流すステップと、
ドア開口を通して上記基板キャリヤからガスが流れ出るようにするため上記基板キャリヤのドアを開放するステップと、
を備えた方法。 - 上記ガスを流すステップは、上記ガスを密閉された基板キャリヤへ流す段階を含む、請求項17に記載の方法。
- 上記ガスを流すステップは、上記ガスを上記基板キャリヤの上記ドアに配設された第1のポートを通して上記基板キャリヤへ流す段階を含む、請求項17に記載の方法。
- 上記ガスを第1のポートを通して上記基板キャリヤへ流す段階は、上記ガスが上記基板キャリヤへ流れることによって生成される力に対抗するように上記ドアに真空力を加える手順を含む、請求項19に記載の方法。
- 上記基板キャリヤの上記ドアに配設された第2のポートを通して上記基板キャリヤから空気を排出することを更に含む、請求項19に記載の方法。
- 基板を収容している閉じた基板キャリヤ内へ不活性ガスを流すステップと、
上記基板キャリヤから空気を排出するステップと、
上記空気が上記不活性ガスにより実質的に置換されたときに、上記基板キャリヤを密閉するステップと、
を備えた方法。 - 基板を収容している閉じた基板キャリヤから空気を排出するステップと、
上記基板キャリヤから空気が実質的に除去されたときに、上記基板キャリヤを密閉するステップと、
を備えた方法。 - 上記基板キャリヤの外側の圧力より高い圧力を上記基板キャリヤの内側に生成するように上記閉じた基板キャリヤへガスを流すステップと、
上記基板キャリヤを開放するステップと、
を更に備えた、請求項23に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US75815206P | 2006-01-11 | 2006-01-11 | |
US60/758,152 | 2006-01-11 | ||
PCT/US2007/000722 WO2007082031A2 (en) | 2006-01-11 | 2007-01-11 | Methods and apparatus for purging a substrate carrier |
Publications (3)
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JP2009523325A true JP2009523325A (ja) | 2009-06-18 |
JP2009523325A5 JP2009523325A5 (ja) | 2010-02-25 |
JP5105334B2 JP5105334B2 (ja) | 2012-12-26 |
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JP2008550404A Expired - Fee Related JP5105334B2 (ja) | 2006-01-11 | 2007-01-11 | 基板キャリヤをパージするための方法及び装置 |
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US (3) | US8074597B2 (ja) |
JP (1) | JP5105334B2 (ja) |
KR (1) | KR20080087880A (ja) |
CN (1) | CN101370616B (ja) |
TW (1) | TWI367539B (ja) |
WO (1) | WO2007082031A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10714367B2 (en) | 2014-01-21 | 2020-07-14 | Bum Je WOO | Fume-removing device |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101370616B (zh) | 2006-01-11 | 2011-04-27 | 应用材料股份有限公司 | 一种基材载件、一种装载端口以及一种清洗基材载件的方法 |
US8870512B2 (en) | 2007-10-27 | 2014-10-28 | Applied Materials, Inc. | Sealed substrate carriers and systems and methods for transporting substrates |
US20110084194A1 (en) * | 2009-09-24 | 2011-04-14 | Dgel Sciences | Cassette for biological analysis and method of making thereof |
TWI575631B (zh) | 2011-06-28 | 2017-03-21 | Dynamic Micro Systems | 半導體儲存櫃系統與方法 |
CN103426792A (zh) * | 2012-05-24 | 2013-12-04 | 上海宏力半导体制造有限公司 | 一种密封的n2清洗装置 |
US9412632B2 (en) * | 2012-10-25 | 2016-08-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reticle pod |
CN111508871A (zh) | 2013-08-12 | 2020-08-07 | 应用材料公司 | 具有工厂接口环境控制的基板处理系统、装置和方法 |
KR102226451B1 (ko) * | 2014-09-22 | 2021-03-12 | 에스케이하이닉스 주식회사 | 기판 캐리어 세정장치 및 기판 캐리어의 세정 방법 |
CN111696895A (zh) | 2014-11-25 | 2020-09-22 | 应用材料公司 | 具有基板载体和净化腔室环境控制的基板处理系统、设备和方法 |
JP2018515936A (ja) | 2015-05-22 | 2018-06-14 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 磁気ドア密封を含む、基板キャリアドアアセンブリ、基板キャリア、及び方法 |
US10573545B2 (en) | 2016-06-28 | 2020-02-25 | Murata Machinery, Ltd. | Substrate carrier and substrate carrier stack |
FR3058562B1 (fr) * | 2016-11-07 | 2019-05-10 | Pfeiffer Vacuum | Dispositif et procede de controle de l'etancheite d'une enceinte de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs |
US10741432B2 (en) | 2017-02-06 | 2020-08-11 | Applied Materials, Inc. | Systems, apparatus, and methods for a load port door opener |
US10446428B2 (en) | 2017-03-14 | 2019-10-15 | Applied Materials, Inc. | Load port operation in electronic device manufacturing apparatus, systems, and methods |
DE202019101794U1 (de) * | 2018-06-27 | 2019-10-09 | Murata Machinery, Ltd. | Vorrichtungen zum mindestens einen aus Substrat-Handhabung, Substrat-Lagerung, Substrat-Behandlung und Substrat-Verarbeitung |
US11061417B2 (en) | 2018-12-19 | 2021-07-13 | Applied Materials, Inc. | Selectable-rate bottom purge apparatus and methods |
US11569102B2 (en) | 2020-02-14 | 2023-01-31 | Applied Materials, Inc. | Oxidation inhibiting gas in a manufacturing system |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08203993A (ja) * | 1995-01-24 | 1996-08-09 | Shinko Electric Co Ltd | 可搬式密閉コンテナのガス供給システム |
JPH08330208A (ja) * | 1995-05-30 | 1996-12-13 | Oki Electric Ind Co Ltd | 加熱装置 |
JPH11214479A (ja) * | 1998-01-23 | 1999-08-06 | Tokyo Electron Ltd | 基板処理装置及びその方法並びに基板搬送装置 |
JP2002184831A (ja) * | 2000-12-11 | 2002-06-28 | Hirata Corp | Foupオープナ |
JP2003092345A (ja) * | 2001-07-13 | 2003-03-28 | Semiconductor Leading Edge Technologies Inc | 基板収納容器、基板搬送システム、保管装置及びガス置換方法 |
JP2005327815A (ja) * | 2004-05-12 | 2005-11-24 | Miraial Kk | 収納容器のガス置換装置およびそれを用いたガス置換方法 |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0555891B1 (en) | 1985-10-24 | 1999-01-20 | Texas Instruments Incorporated | Vacuum processing system and method |
US4995430A (en) | 1989-05-19 | 1991-02-26 | Asyst Technologies, Inc. | Sealable transportable container having improved latch mechanism |
US5169272A (en) | 1990-11-01 | 1992-12-08 | Asyst Technologies, Inc. | Method and apparatus for transferring articles between two controlled environments |
US5538390A (en) | 1993-10-29 | 1996-07-23 | Applied Materials, Inc. | Enclosure for load lock interface |
EP0663686B1 (en) | 1994-01-14 | 1997-06-18 | International Business Machines Corporation | Automatic assembler/disassembler apparatus adapted to pressurized sealable transportable container |
US5482161A (en) | 1994-05-24 | 1996-01-09 | Fluoroware, Inc. | Mechanical interface wafer container |
JPH0846005A (ja) | 1994-07-26 | 1996-02-16 | Takenaka Komuten Co Ltd | ウエーハ移載装置 |
US5740845A (en) | 1995-07-07 | 1998-04-21 | Asyst Technologies | Sealable, transportable container having a breather assembly |
US5810062A (en) * | 1996-07-12 | 1998-09-22 | Asyst Technologies, Inc. | Two stage valve for charging and/or vacuum relief of pods |
US5879458A (en) | 1996-09-13 | 1999-03-09 | Semifab Incorporated | Molecular contamination control system |
US5944857A (en) | 1997-05-08 | 1999-08-31 | Tokyo Electron Limited | Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor |
JP3167970B2 (ja) | 1997-10-13 | 2001-05-21 | ティーディーケイ株式会社 | クリーンボックス、クリーン搬送方法及び装置 |
US6013920A (en) | 1997-11-28 | 2000-01-11 | Fortrend Engineering Coirporation | Wafer-mapping load post interface having an effector position sensing device |
JPH11168135A (ja) | 1997-12-03 | 1999-06-22 | Toshiba Corp | 基板保管装置および基板保管方法 |
US5988233A (en) * | 1998-03-27 | 1999-11-23 | Asyst Technologies, Inc. | Evacuation-driven SMIF pod purge system |
US6398032B2 (en) | 1998-05-05 | 2002-06-04 | Asyst Technologies, Inc. | SMIF pod including independently supported wafer cassette |
NL1009171C2 (nl) | 1998-05-14 | 1999-12-10 | Asm Int | Waferrek voorzien van een gasverdeelinrichting. |
US6719516B2 (en) | 1998-09-28 | 2004-04-13 | Applied Materials, Inc. | Single wafer load lock with internal wafer transport |
JP2000124300A (ja) | 1998-10-14 | 2000-04-28 | Nec Kansai Ltd | ウェーハキャリア |
US6120229A (en) | 1999-02-01 | 2000-09-19 | Brooks Automation Inc. | Substrate carrier as batchloader |
US6042324A (en) | 1999-03-26 | 2000-03-28 | Asm America, Inc. | Multi-stage single-drive FOUP door system |
JP3769417B2 (ja) * | 1999-06-30 | 2006-04-26 | 株式会社東芝 | 基板収納容器 |
WO2001001828A1 (en) | 1999-07-02 | 2001-01-11 | Spi/Semicon | Wafer container |
US6428262B1 (en) | 1999-08-11 | 2002-08-06 | Proteros, Llc | Compact load lock system for ion beam processing of foups |
AU2001273666A1 (en) | 2000-07-07 | 2002-01-21 | Applied Materials, Inc. | Automatic door opener |
TW545693U (en) | 2002-05-15 | 2003-08-01 | Macronix Int Co Ltd | Air inlet structure of vacuum isolating chamber |
US6955197B2 (en) | 2002-08-31 | 2005-10-18 | Applied Materials, Inc. | Substrate carrier having door latching and substrate clamping mechanisms |
DE60332644D1 (de) * | 2002-10-25 | 2010-07-01 | Shinetsu Polymer Co | Substratspeicherbehälter |
US20050105997A1 (en) | 2003-09-11 | 2005-05-19 | Englhardt Eric A. | Methods and apparatus for carriers suitable for use in high-speed/high-acceleration transport systems |
US7051870B2 (en) | 2003-11-26 | 2006-05-30 | Applied Materials, Inc. | Suspension track belt |
TW200614411A (en) | 2004-09-04 | 2006-05-01 | Applied Materials Inc | Substrate carrier having reduced height |
US20070141280A1 (en) | 2005-12-16 | 2007-06-21 | Applied Materials, Inc. | Substrate carrier having an interior lining |
CN101370616B (zh) | 2006-01-11 | 2011-04-27 | 应用材料股份有限公司 | 一种基材载件、一种装载端口以及一种清洗基材载件的方法 |
US8870512B2 (en) | 2007-10-27 | 2014-10-28 | Applied Materials, Inc. | Sealed substrate carriers and systems and methods for transporting substrates |
-
2007
- 2007-01-11 CN CN2007800027125A patent/CN101370616B/zh not_active Expired - Fee Related
- 2007-01-11 KR KR1020087019192A patent/KR20080087880A/ko not_active Application Discontinuation
- 2007-01-11 TW TW096101142A patent/TWI367539B/zh not_active IP Right Cessation
- 2007-01-11 US US11/622,300 patent/US8074597B2/en not_active Expired - Fee Related
- 2007-01-11 JP JP2008550404A patent/JP5105334B2/ja not_active Expired - Fee Related
- 2007-01-11 WO PCT/US2007/000722 patent/WO2007082031A2/en active Application Filing
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2011
- 2011-11-02 US US13/287,534 patent/US8601975B2/en not_active Expired - Fee Related
-
2012
- 2012-09-06 US US13/605,927 patent/US8689812B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08203993A (ja) * | 1995-01-24 | 1996-08-09 | Shinko Electric Co Ltd | 可搬式密閉コンテナのガス供給システム |
JPH08330208A (ja) * | 1995-05-30 | 1996-12-13 | Oki Electric Ind Co Ltd | 加熱装置 |
JPH11214479A (ja) * | 1998-01-23 | 1999-08-06 | Tokyo Electron Ltd | 基板処理装置及びその方法並びに基板搬送装置 |
JP2002184831A (ja) * | 2000-12-11 | 2002-06-28 | Hirata Corp | Foupオープナ |
JP2003092345A (ja) * | 2001-07-13 | 2003-03-28 | Semiconductor Leading Edge Technologies Inc | 基板収納容器、基板搬送システム、保管装置及びガス置換方法 |
JP2005327815A (ja) * | 2004-05-12 | 2005-11-24 | Miraial Kk | 収納容器のガス置換装置およびそれを用いたガス置換方法 |
Cited By (4)
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US10714367B2 (en) | 2014-01-21 | 2020-07-14 | Bum Je WOO | Fume-removing device |
US11114325B2 (en) | 2014-01-21 | 2021-09-07 | Bum Je WOO | Fume-removing device |
US11152239B2 (en) | 2014-01-21 | 2021-10-19 | Bum Je WOO | Fume-removing device |
US11201071B2 (en) | 2014-01-21 | 2021-12-14 | Bum Je Woo | Fume-removing device |
Also Published As
Publication number | Publication date |
---|---|
CN101370616B (zh) | 2011-04-27 |
CN101370616A (zh) | 2009-02-18 |
KR20080087880A (ko) | 2008-10-01 |
US20070158183A1 (en) | 2007-07-12 |
US8074597B2 (en) | 2011-12-13 |
TW200737391A (en) | 2007-10-01 |
TWI367539B (en) | 2012-07-01 |
US20120060971A1 (en) | 2012-03-15 |
US20120325328A1 (en) | 2012-12-27 |
JP5105334B2 (ja) | 2012-12-26 |
WO2007082031A3 (en) | 2007-11-15 |
US8689812B2 (en) | 2014-04-08 |
US8601975B2 (en) | 2013-12-10 |
WO2007082031A2 (en) | 2007-07-19 |
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