JP2009517633A - 真空計用ダイヤフラム装置 - Google Patents
真空計用ダイヤフラム装置 Download PDFInfo
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- JP2009517633A JP2009517633A JP2008541564A JP2008541564A JP2009517633A JP 2009517633 A JP2009517633 A JP 2009517633A JP 2008541564 A JP2008541564 A JP 2008541564A JP 2008541564 A JP2008541564 A JP 2008541564A JP 2009517633 A JP2009517633 A JP 2009517633A
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- 238000004804 winding Methods 0.000 claims abstract description 22
- 238000001914 filtration Methods 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 5
- 238000000034 method Methods 0.000 description 21
- 230000008569 process Effects 0.000 description 17
- 239000000463 material Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 239000002245 particle Substances 0.000 description 6
- 239000011295 pitch Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 5
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45557—Pulsed pressure or control pressure
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/0007—Fluidic connecting means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/06—Means for preventing overload or deleterious influence of the measured medium on the measuring device or vice versa
- G01L19/0609—Pressure pulsation damping arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/16—Vacuum gauges by measuring variation of frictional resistance of gases
- G01L21/24—Vacuum gauges by measuring variation of frictional resistance of gases using rotating members; Vacuum gauges of the Langmuir type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Measuring Fluid Pressure (AREA)
- Optical Measuring Cells (AREA)
Abstract
Description
図2には、隔膜真空計15と、該真空計に配置された、渦巻き状のダイヤフラムないし螺旋状のダイヤフラムとして形成されたスクリューダイヤフラム20を擁した本発明によるダイヤフラム装置25とからなる本発明による真空計ユニットの断面が表されている。真空計15は第1のフラットな円形ケーシング部1と、第2のフラットな円形ケーシング部4とからなり、これら両者の間に隔膜2が周縁封止されて配置されている。隔膜2は、
参照真空を保持するためのゲッタールーム12と連結路13を経て連通した参照真空ルームが前記両者の間に形成されるように、第1のケーシング部1からやや離間して配置されている。隔膜2と第2のケーシング部4との間の反対側の隔膜側には、好ましくは中央で第2のケーシング部4を貫いて穴およびつなぎ管5を経てダイヤフラム装置25と連通する真空測定ルーム9が形成されている。ここで、前記ダイヤフラム装置もまた被測定真空チャンバと連通結合可能な接続孔22を有している。この場合、スクリューダイヤフラム20は管体14の内部に配置されており、スクリューダイヤフラム20の巻き山21が管体14の内壁に密接して、巻き山21のこの頂部領域に少なくとも粒子通過阻止封止、ただし好適にはできるだけ、好ましくは被測定圧力範囲内のシーリングが生ずるようにして配置されている。
14が腐食性プロセス条件に対してできるだけ優れた耐性を有する材料から製造されていると共に、さらに分解によって不純物が生成されることがないようにするのが有利である。コスト低下と特別な材料特性のいっそう容易な達成を図るため、管体14および/またはダイヤフラム20の露出面は適切な保護材料でコーティングされてもよい。一定のケースにあっては、これらの材料が真空計15の隔膜2の材料に適合されるのも有利である。
Claims (12)
- ダイヤフラム(7)を包囲するダイヤフラムケーシング(6)を備えた真空計(15)用ダイヤフラム装置であって、前記ダイヤフラムケーシング(6)は真空計(15)と連通するための出口孔(16)と被測定対象チャンバと連通するための接続孔(22)とを有し、前記ダイヤフラム(7)は前記双方の孔(16,22)の間に配置されているように構成したダイヤフラム装置において、
前記ダイヤフラムケーシング(6,14)は管体(14)であり、前記ダイヤフラム(7,20)は螺旋巻き山(21)を有するスクリューダイヤフラムとして形成され、前記螺旋巻き山のフランクの外径は前記ダイヤフラムケーシング(14)の内壁に密接し、前記螺旋巻き山のフランクの前記外径と前記内壁との間のガス漏通を阻止してガスの流れを基本的に前記螺旋巻き山に沿った通路に強制誘導し、かつ、前記出口孔(16)は前記管体(14)の一端に配置され、前記接続孔(22)は前記管体の反対側の他端に配置され、前記スクリューダイヤフラム(20)は軸方向目視方向において前記ダイヤフラム装置(25)が前記双方の孔(16,22)の間で光学的に密であるように形成されていることを特徴とするダイヤフラム装置。 - 前記スクリューダイヤフラム(20)は少なくとも1.5回巻きの巻き山(21)を有することを特徴とする請求項1記載のダイヤフラム装置。
- 前記スクリューダイヤフラム(20)は多条ねじ(20)として形成されていることを特徴とする請求項2記載のダイヤフラム装置。
- 前記スクリューダイヤフラム(20)は角ねじ(20)として形成されていることを特徴とする請求項1〜3のいずれか1項に記載のダイヤフラム装置。
- 前記スクリューダイヤフラム(20)は棒状コア(23)を有し、該棒状コア周りに前記螺旋巻き山が配置されていることを特徴とする請求項1〜4のいずれか1項に記載のダイヤフラム装置。
- 前記スクリューダイヤフラム(20)の長さ(l)は該スクリューダイヤフラムの外径(2r)よりも大きいことを特徴とする請求項1〜5のいずれか1項に記載のダイヤフラム装置。
- 前記管体(14)は前記接続孔(22)に接続フランジ(8)を有し、該接続フランジは好ましくは前記管体(14)と一体に形成されていることを特徴とする請求項1〜6のいずれか1項に記載のダイヤフラム装置。
- 前記出口孔(16)の領域に円形の、好ましくは濾過ダイヤフラム(30)として形成されたフラットダイヤフラム(30)が配置されていることを特徴とする請求項1〜7のいずれか1項に記載のダイヤフラム装置。
- 前記フラットダイヤフラム(30)は前記スクリューダイヤフラム(20)に固定されていることを特徴とする請求項8記載のダイヤフラム装置。
- 前記フラットダイヤフラムはその周縁に、前記管体(14)の内壁に定着するための保持板(33)を有することを特徴とする請求項9記載のダイヤフラム装置。
- 前記スクリューダイヤフラム(20)は前記管体(14)に挿脱可能に形成されていることを特徴とする請求項1〜10のいずれか1項に記載のダイヤフラム装置。
- 前記ダイヤフラム装置(14,20,25)は前記出口孔(16)を介して真空計(15)とくに隔膜真空計、好ましくは容量型隔膜真空計または光学式隔膜真空計に連通結合されていることを特徴とする請求項1〜11のいずれか1項に記載のダイヤフラム装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1876/05 | 2005-11-25 | ||
CH01876/05A CH697766B1 (de) | 2005-11-25 | 2005-11-25 | Blendenanordnung für eine Vakuummesszelle. |
PCT/CH2006/000637 WO2007059640A1 (de) | 2005-11-25 | 2006-11-13 | Blendenanordnung für eine vakuummesszelle |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009517633A true JP2009517633A (ja) | 2009-04-30 |
JP4976411B2 JP4976411B2 (ja) | 2012-07-18 |
Family
ID=35788623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008541564A Active JP4976411B2 (ja) | 2005-11-25 | 2006-11-13 | ダイヤフラム装置を有する真空計 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7443169B2 (ja) |
JP (1) | JP4976411B2 (ja) |
KR (1) | KR101403275B1 (ja) |
CN (1) | CN101313204B (ja) |
CH (1) | CH697766B1 (ja) |
DE (1) | DE112006003162B4 (ja) |
WO (1) | WO2007059640A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016090237A (ja) * | 2014-10-29 | 2016-05-23 | 株式会社テイエルブイ | センサ装置 |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008058406A1 (de) * | 2006-11-13 | 2008-05-22 | Inficon Gmbh | Vakuummembranmesszelle und verfahren zur herstellung einer derartigen messzelle |
DE112008001459A5 (de) * | 2007-06-19 | 2010-05-12 | Inficon Gmbh | Vakuummesszellenanordnung mit Heizung |
US20100233353A1 (en) * | 2009-03-16 | 2010-09-16 | Applied Materials, Inc. | Evaporator, coating installation, and method for use thereof |
GB2489191A (en) | 2010-10-14 | 2012-09-26 | Rolls Royce Plc | Pressure indicator with an inlet pipe having a path length greater than its nominal length |
GB201017351D0 (en) | 2010-10-14 | 2010-11-24 | Rolls Royce Plc | Pressure indicator |
GB201017353D0 (en) | 2010-10-14 | 2010-11-24 | Rolls Royce Plc | Pressure indicator |
KR101353906B1 (ko) * | 2011-08-05 | 2014-01-22 | 김학성 | 배출관 케이스가 결합된 차량용 내압용기 가스감지장치 |
TWI539154B (zh) | 2012-12-19 | 2016-06-21 | 英福康公司 | 雙重偵測殘餘氣體分析器 |
US8997548B2 (en) * | 2013-01-29 | 2015-04-07 | Reno Technologies, Inc. | Apparatus and method for automatic detection of diaphragm coating or surface contamination for capacitance diaphragm gauges |
US10107315B2 (en) | 2013-04-30 | 2018-10-23 | Mks Instruments, Inc. | MEMS pressure sensors with integrated baffles |
MX366646B (es) * | 2014-10-03 | 2019-07-17 | Tlv Co Ltd | Dispositivo sensor. |
EP3109612A1 (en) * | 2015-06-26 | 2016-12-28 | Nina Wojtas | Mems deposition trap for vacuum transducer protection |
CN107475683B (zh) * | 2017-08-23 | 2019-06-18 | 京东方科技集团股份有限公司 | 一种镀膜设备及其检测方法 |
DE102017011360A1 (de) | 2017-12-09 | 2019-06-13 | Heinz Plöchinger | Schutzvorrichtung für Vakuum-Messzellen |
JP7085898B2 (ja) * | 2018-05-25 | 2022-06-17 | 東京エレクトロン株式会社 | ラジカル失活部品及びこれを用いたプラズマ処理装置 |
CN110197784B (zh) * | 2019-05-31 | 2021-07-27 | 江苏鲁汶仪器有限公司 | 一种离子束刻蚀系统的真空测量工具的保护装置 |
CN110132484A (zh) * | 2019-05-31 | 2019-08-16 | 江苏鲁汶仪器有限公司 | 一种离子束刻蚀系统的真空测量工具的保护装置 |
US20210088402A1 (en) * | 2019-09-23 | 2021-03-25 | Arradiance, Llc | Vacuum Gauge Protector for Deposition Systems |
DE102021124531B4 (de) * | 2021-09-22 | 2024-01-18 | GEDIA Gebrüder Dingerkus GmbH | Verfahren zur Herstellung eines Metallbauteils mit Bereichen unterschiedlicher Festigkeit |
CN114264403A (zh) * | 2021-12-03 | 2022-04-01 | 北京晨晶精仪电子有限公司 | 真空规颗粒阻挡结构 |
KR102666912B1 (ko) | 2023-12-20 | 2024-05-17 | 주식회사 파인솔루션 | 압력 센싱을 위한 cdg 장치 |
CN117753836B (zh) * | 2024-02-19 | 2024-04-19 | 烟台大学 | 一种钛合金薄壁件空间成型装置及方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1619444A (en) * | 1926-07-08 | 1927-03-01 | Taylor Doc Gilford | Antichattering device |
US2061949A (en) * | 1935-12-09 | 1936-11-24 | Lapointe Machine Tool Co | Device to absorb pressure fluctuations |
JPS4858172U (ja) * | 1971-11-05 | 1973-07-24 | ||
JPS58101155U (ja) * | 1981-12-29 | 1983-07-09 | 株式会社大阪真空機器製作所 | 真空計用ダストトラツプ |
JPH11173934A (ja) * | 1997-12-12 | 1999-07-02 | Matsushita Electric Works Ltd | 圧力センサ |
WO2004104543A1 (en) * | 2003-05-16 | 2004-12-02 | Mks Instruments, Inc. | Contaminant deposition control baffle with capacitance difference pressure transducer |
JP2008527386A (ja) * | 2005-01-14 | 2008-07-24 | エム ケー エス インストルメンツ インコーポレーテッド | 流れを規定している構成体を持つ静電容量圧力センサ |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2503372A (en) * | 1945-09-07 | 1950-04-11 | Union Carbide & Carbon Corp | High vacuum indicator |
US2512134A (en) * | 1947-10-08 | 1950-06-20 | Gerhard H J Baule | Vacuum testing instrument |
US3168819A (en) * | 1961-03-06 | 1965-02-09 | Gen Electric | Vacuum system |
US5181422A (en) * | 1991-07-30 | 1993-01-26 | Dresser Industries, Inc. | Diaphragm type fluid pressure gauge |
US5271277A (en) * | 1991-12-23 | 1993-12-21 | The Boc Group, Inc. | Capacitance pressure transducer |
US5307684A (en) * | 1992-06-02 | 1994-05-03 | Viatran Corporation | Stop mechanism for a diaphragm pressure transducer |
DE4307378A1 (de) * | 1993-03-09 | 1994-09-15 | Dynamit Nobel Ag | Leckgaskontrolle eines Gas- oder Flüssiggasbehälters |
US5690795A (en) * | 1995-06-05 | 1997-11-25 | Applied Materials, Inc. | Screwless shield assembly for vacuum processing chambers |
KR100545928B1 (ko) * | 1997-12-23 | 2006-01-25 | 어낵시스 발처스 리미티드 | 용량식 진공 측정 셀 |
US6901808B1 (en) * | 2002-02-12 | 2005-06-07 | Lam Research Corporation | Capacitive manometer having reduced process drift |
-
2005
- 2005-11-25 CH CH01876/05A patent/CH697766B1/de not_active IP Right Cessation
-
2006
- 2006-11-13 DE DE112006003162T patent/DE112006003162B4/de not_active Expired - Fee Related
- 2006-11-13 JP JP2008541564A patent/JP4976411B2/ja active Active
- 2006-11-13 CN CN2006800438683A patent/CN101313204B/zh not_active Expired - Fee Related
- 2006-11-13 KR KR1020087015263A patent/KR101403275B1/ko active IP Right Grant
- 2006-11-13 WO PCT/CH2006/000637 patent/WO2007059640A1/de active Application Filing
- 2006-11-21 US US11/602,797 patent/US7443169B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1619444A (en) * | 1926-07-08 | 1927-03-01 | Taylor Doc Gilford | Antichattering device |
US2061949A (en) * | 1935-12-09 | 1936-11-24 | Lapointe Machine Tool Co | Device to absorb pressure fluctuations |
JPS4858172U (ja) * | 1971-11-05 | 1973-07-24 | ||
JPS58101155U (ja) * | 1981-12-29 | 1983-07-09 | 株式会社大阪真空機器製作所 | 真空計用ダストトラツプ |
JPH11173934A (ja) * | 1997-12-12 | 1999-07-02 | Matsushita Electric Works Ltd | 圧力センサ |
WO2004104543A1 (en) * | 2003-05-16 | 2004-12-02 | Mks Instruments, Inc. | Contaminant deposition control baffle with capacitance difference pressure transducer |
JP2008527386A (ja) * | 2005-01-14 | 2008-07-24 | エム ケー エス インストルメンツ インコーポレーテッド | 流れを規定している構成体を持つ静電容量圧力センサ |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016090237A (ja) * | 2014-10-29 | 2016-05-23 | 株式会社テイエルブイ | センサ装置 |
Also Published As
Publication number | Publication date |
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US20070120568A1 (en) | 2007-05-31 |
CH697766B1 (de) | 2009-02-13 |
DE112006003162A5 (de) | 2008-10-02 |
CN101313204B (zh) | 2011-04-13 |
WO2007059640A1 (de) | 2007-05-31 |
KR101403275B1 (ko) | 2014-06-02 |
JP4976411B2 (ja) | 2012-07-18 |
CN101313204A (zh) | 2008-11-26 |
KR20080079284A (ko) | 2008-08-29 |
DE112006003162B4 (de) | 2013-07-18 |
US7443169B2 (en) | 2008-10-28 |
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