JP2009514774A5 - - Google Patents

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Publication number
JP2009514774A5
JP2009514774A5 JP2008540074A JP2008540074A JP2009514774A5 JP 2009514774 A5 JP2009514774 A5 JP 2009514774A5 JP 2008540074 A JP2008540074 A JP 2008540074A JP 2008540074 A JP2008540074 A JP 2008540074A JP 2009514774 A5 JP2009514774 A5 JP 2009514774A5
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JP
Japan
Prior art keywords
molecules
mixtures
total
range
material according
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JP2008540074A
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English (en)
Japanese (ja)
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JP2009514774A (ja
JP5224286B2 (ja
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Priority claimed from US11/348,956 external-priority patent/US20070105703A1/en
Priority claimed from US11/583,619 external-priority patent/US7635658B2/en
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Publication of JP2009514774A publication Critical patent/JP2009514774A/ja
Publication of JP2009514774A5 publication Critical patent/JP2009514774A5/ja
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Publication of JP5224286B2 publication Critical patent/JP5224286B2/ja
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JP2008540074A 2005-11-07 2006-11-01 デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法 Active JP5224286B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US73452705P 2005-11-07 2005-11-07
US60/734,527 2005-11-07
US11/348,956 US20070105703A1 (en) 2005-11-07 2006-02-06 Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
US11/348,956 2006-02-06
US11/583,619 US7635658B2 (en) 2005-11-07 2006-10-19 Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
US11/583,619 2006-10-19
PCT/US2006/042768 WO2007053733A1 (en) 2005-11-07 2006-11-01 Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012287644A Division JP2013075827A (ja) 2005-11-07 2012-12-28 デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法

Publications (3)

Publication Number Publication Date
JP2009514774A JP2009514774A (ja) 2009-04-09
JP2009514774A5 true JP2009514774A5 (enExample) 2010-07-01
JP5224286B2 JP5224286B2 (ja) 2013-07-03

Family

ID=37745897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008540074A Active JP5224286B2 (ja) 2005-11-07 2006-11-01 デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法

Country Status (5)

Country Link
US (2) US7635658B2 (enExample)
EP (1) EP1963234B1 (enExample)
JP (1) JP5224286B2 (enExample)
KR (1) KR101363182B1 (enExample)
WO (1) WO2007053733A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7928026B2 (en) * 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
KR101306150B1 (ko) * 2005-10-24 2013-09-10 삼성전자주식회사 탑 코팅 막용 고분자, 탑 코팅 용액 조성물 및 이를 이용한 이머젼 리소그라피 공정
JP2013075827A (ja) * 2005-11-07 2013-04-25 Corning Inc デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
CN101730667B (zh) * 2007-05-09 2013-03-27 康宁股份有限公司 Oh、od含量低的玻璃
US8062986B2 (en) * 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
US20090056381A1 (en) * 2007-08-30 2009-03-05 Mueller Michael A Fused silica article loaded with deuterium and method of making
US8268740B2 (en) * 2008-02-07 2012-09-18 Corning Incorporated Halide free glasses having low OH, OD concentrations
US8218593B2 (en) * 2008-07-24 2012-07-10 Alliant Techsystems Inc. Optical devices comprising doped glass materials, laser systems including such optical devices, and methods of forming such optical devices and laser systems
US8263511B2 (en) * 2008-12-31 2012-09-11 Corning Incorporated High purity fused silica with low absolute refractive index
US8176752B2 (en) * 2009-07-23 2012-05-15 Corning Incorporated Silica glass with saturated induced absorption and method of making
KR20120055564A (ko) * 2009-08-19 2012-05-31 아사히 가라스 가부시키가이샤 TiO₂를 함유하는 실리카 유리 및 EUV 리소그래피용 광학 부재
US8596094B2 (en) * 2009-10-21 2013-12-03 Corning Incorporated Synthetic silica glass with uniform fictive temperature
JP5765050B2 (ja) * 2011-05-11 2015-08-19 富士通セミコンダクター株式会社 フォトマスク及びその製造方法
WO2014073389A1 (ja) * 2012-11-08 2014-05-15 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
JP2017216389A (ja) * 2016-06-01 2017-12-07 信越石英株式会社 紫外線smd型led素子の気密封止用シリカガラス部材
JP6789011B2 (ja) * 2016-07-01 2020-11-25 信越石英株式会社 紫外線led用石英ガラス部材の製造方法
KR102337364B1 (ko) * 2016-06-01 2021-12-09 신에쯔 세끼에이 가부시키가이샤 자외선smd형 led소자의 기밀봉지용 석영유리 부재 및 자외선led용 석영유리 부재의 제조방법
JP7103292B2 (ja) * 2019-03-29 2022-07-20 三菱ケミカル株式会社 合成シリカガラス粉

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1145157B (it) * 1981-06-22 1986-11-05 Cselt Centro Studi Lab Telecom Procedimento e dispositivo per la deidrogenazione in linea di preforme per fibre ottiche
US4515612A (en) * 1982-04-19 1985-05-07 At&T Bell Laboratories Method for optical fiber fabrication including deuterium/hydrogen exchange
JPH0678172B2 (ja) * 1983-10-21 1994-10-05 古河電気工業株式会社 光フアイバ−の製造方法
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
GB9210327D0 (en) * 1992-05-14 1992-07-01 Tsl Group Plc Heat treatment facility for synthetic vitreous silica bodies
US5332702A (en) * 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
EP0780707A1 (de) * 1995-12-21 1997-06-25 Heraeus Quarzglas GmbH Bauteil für die Übertragung energiereicher UV-Strahlung und Verfahren zur Herstellung eines solchen Bauteils und seine Verwendung
US6619073B2 (en) * 1996-03-05 2003-09-16 Corning Incorporated Method of increasing the initial transmittance of optical glass
EP0885176A4 (en) * 1996-03-05 1999-03-17 Corning Inc METHOD FOR IMPROVING THE INITIAL TRANSMISSION OF OPTICAL GLASS
JPH10218627A (ja) * 1997-02-05 1998-08-18 Showa Electric Wire & Cable Co Ltd ガラスおよび光ファイバの製造方法
US6174509B1 (en) * 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
CN1235820C (zh) * 1999-04-26 2006-01-11 康宁股份有限公司 低水峰光导纤维及其制造方法
EP1125897B1 (en) * 1999-06-10 2013-05-22 Asahi Glass Company, Limited Synthetic quartz glass and method for preparing the same
CA2310219A1 (en) * 2000-05-29 2001-11-29 Nu-Wave Photonics Inc. Application of deuterium oxide in producing silicon containing and metal containing materials
US6904772B2 (en) * 2000-12-22 2005-06-14 Corning Incorporated Method of making a glass preform for low water peak optical fiber
WO2002055445A2 (en) * 2001-01-12 2002-07-18 Corning Incorporated Optical fiber and preform, method of manufacturing same, and optical component made therefrom
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
EP1441992A1 (en) * 2001-09-27 2004-08-04 Corning Incorporated Improved methods and furnaces for fused silica production
US6928220B2 (en) * 2002-02-01 2005-08-09 Simax Technologies, Inc. Sol-gel-derived optical fiber preform and method of manufacture
US6799440B2 (en) * 2002-02-22 2004-10-05 General Electric Company Optical fiber deposition tube fused in deuterium atmosphere for attenuation improvement
US20040060327A1 (en) * 2002-09-30 2004-04-01 Berkey George E Method for treating an optical fiber preform with deuterium
KR101066281B1 (ko) * 2003-08-29 2011-09-20 코닝 인코포레이티드 알칼리 금속 산화물을 함유하는 광섬유, 및 그 제조 방법및 장치
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
US7506522B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High refractive index homogeneity fused silica glass and method of making same
JP5538679B2 (ja) * 2004-12-30 2014-07-02 コーニング インコーポレイテッド 低い偏光誘起複屈折を有する合成シリカ、同シリカの製造方法および同シリカを含むリソグラフィデバイス

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