JP2009514774A5 - - Google Patents
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- JP2009514774A5 JP2009514774A5 JP2008540074A JP2008540074A JP2009514774A5 JP 2009514774 A5 JP2009514774 A5 JP 2009514774A5 JP 2008540074 A JP2008540074 A JP 2008540074A JP 2008540074 A JP2008540074 A JP 2008540074A JP 2009514774 A5 JP2009514774 A5 JP 2009514774A5
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73452705P | 2005-11-07 | 2005-11-07 | |
| US60/734,527 | 2005-11-07 | ||
| US11/348,956 US20070105703A1 (en) | 2005-11-07 | 2006-02-06 | Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same |
| US11/348,956 | 2006-02-06 | ||
| US11/583,619 US7635658B2 (en) | 2005-11-07 | 2006-10-19 | Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same |
| US11/583,619 | 2006-10-19 | ||
| PCT/US2006/042768 WO2007053733A1 (en) | 2005-11-07 | 2006-11-01 | Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012287644A Division JP2013075827A (ja) | 2005-11-07 | 2012-12-28 | デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009514774A JP2009514774A (ja) | 2009-04-09 |
| JP2009514774A5 true JP2009514774A5 (enExample) | 2010-07-01 |
| JP5224286B2 JP5224286B2 (ja) | 2013-07-03 |
Family
ID=37745897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008540074A Active JP5224286B2 (ja) | 2005-11-07 | 2006-11-01 | デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7635658B2 (enExample) |
| EP (1) | EP1963234B1 (enExample) |
| JP (1) | JP5224286B2 (enExample) |
| KR (1) | KR101363182B1 (enExample) |
| WO (1) | WO2007053733A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7928026B2 (en) * | 2005-06-30 | 2011-04-19 | Corning Incorporated | Synthetic silica material with low fluence-dependent-transmission and method of making the same |
| KR101306150B1 (ko) * | 2005-10-24 | 2013-09-10 | 삼성전자주식회사 | 탑 코팅 막용 고분자, 탑 코팅 용액 조성물 및 이를 이용한 이머젼 리소그라피 공정 |
| JP2013075827A (ja) * | 2005-11-07 | 2013-04-25 | Corning Inc | デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法 |
| US7964522B2 (en) * | 2006-08-31 | 2011-06-21 | Corning Incorporated | F-doped silica glass and process of making same |
| US20080268201A1 (en) * | 2007-04-27 | 2008-10-30 | Richard Michael Fiacco | Low OH glass for infrared applications |
| CN101730667B (zh) * | 2007-05-09 | 2013-03-27 | 康宁股份有限公司 | Oh、od含量低的玻璃 |
| US8062986B2 (en) * | 2007-07-27 | 2011-11-22 | Corning Incorporated | Fused silica having low OH, OD levels and method of making |
| US20090056381A1 (en) * | 2007-08-30 | 2009-03-05 | Mueller Michael A | Fused silica article loaded with deuterium and method of making |
| US8268740B2 (en) * | 2008-02-07 | 2012-09-18 | Corning Incorporated | Halide free glasses having low OH, OD concentrations |
| US8218593B2 (en) * | 2008-07-24 | 2012-07-10 | Alliant Techsystems Inc. | Optical devices comprising doped glass materials, laser systems including such optical devices, and methods of forming such optical devices and laser systems |
| US8263511B2 (en) * | 2008-12-31 | 2012-09-11 | Corning Incorporated | High purity fused silica with low absolute refractive index |
| US8176752B2 (en) * | 2009-07-23 | 2012-05-15 | Corning Incorporated | Silica glass with saturated induced absorption and method of making |
| KR20120055564A (ko) * | 2009-08-19 | 2012-05-31 | 아사히 가라스 가부시키가이샤 | TiO₂를 함유하는 실리카 유리 및 EUV 리소그래피용 광학 부재 |
| US8596094B2 (en) * | 2009-10-21 | 2013-12-03 | Corning Incorporated | Synthetic silica glass with uniform fictive temperature |
| JP5765050B2 (ja) * | 2011-05-11 | 2015-08-19 | 富士通セミコンダクター株式会社 | フォトマスク及びその製造方法 |
| WO2014073389A1 (ja) * | 2012-11-08 | 2014-05-15 | Hoya株式会社 | マスクブランクの製造方法および転写用マスクの製造方法 |
| JP2017216389A (ja) * | 2016-06-01 | 2017-12-07 | 信越石英株式会社 | 紫外線smd型led素子の気密封止用シリカガラス部材 |
| JP6789011B2 (ja) * | 2016-07-01 | 2020-11-25 | 信越石英株式会社 | 紫外線led用石英ガラス部材の製造方法 |
| KR102337364B1 (ko) * | 2016-06-01 | 2021-12-09 | 신에쯔 세끼에이 가부시키가이샤 | 자외선smd형 led소자의 기밀봉지용 석영유리 부재 및 자외선led용 석영유리 부재의 제조방법 |
| JP7103292B2 (ja) * | 2019-03-29 | 2022-07-20 | 三菱ケミカル株式会社 | 合成シリカガラス粉 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1145157B (it) * | 1981-06-22 | 1986-11-05 | Cselt Centro Studi Lab Telecom | Procedimento e dispositivo per la deidrogenazione in linea di preforme per fibre ottiche |
| US4515612A (en) * | 1982-04-19 | 1985-05-07 | At&T Bell Laboratories | Method for optical fiber fabrication including deuterium/hydrogen exchange |
| JPH0678172B2 (ja) * | 1983-10-21 | 1994-10-05 | 古河電気工業株式会社 | 光フアイバ−の製造方法 |
| US5325230A (en) * | 1989-06-09 | 1994-06-28 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks of synthetic silica glass and method for their production |
| GB9210327D0 (en) * | 1992-05-14 | 1992-07-01 | Tsl Group Plc | Heat treatment facility for synthetic vitreous silica bodies |
| US5332702A (en) * | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
| EP0780707A1 (de) * | 1995-12-21 | 1997-06-25 | Heraeus Quarzglas GmbH | Bauteil für die Übertragung energiereicher UV-Strahlung und Verfahren zur Herstellung eines solchen Bauteils und seine Verwendung |
| US6619073B2 (en) * | 1996-03-05 | 2003-09-16 | Corning Incorporated | Method of increasing the initial transmittance of optical glass |
| EP0885176A4 (en) * | 1996-03-05 | 1999-03-17 | Corning Inc | METHOD FOR IMPROVING THE INITIAL TRANSMISSION OF OPTICAL GLASS |
| JPH10218627A (ja) * | 1997-02-05 | 1998-08-18 | Showa Electric Wire & Cable Co Ltd | ガラスおよび光ファイバの製造方法 |
| US6174509B1 (en) * | 1997-02-11 | 2001-01-16 | Corning Incorporated | Pure fused silica, furnace and method |
| US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
| CN1235820C (zh) * | 1999-04-26 | 2006-01-11 | 康宁股份有限公司 | 低水峰光导纤维及其制造方法 |
| EP1125897B1 (en) * | 1999-06-10 | 2013-05-22 | Asahi Glass Company, Limited | Synthetic quartz glass and method for preparing the same |
| CA2310219A1 (en) * | 2000-05-29 | 2001-11-29 | Nu-Wave Photonics Inc. | Application of deuterium oxide in producing silicon containing and metal containing materials |
| US6904772B2 (en) * | 2000-12-22 | 2005-06-14 | Corning Incorporated | Method of making a glass preform for low water peak optical fiber |
| WO2002055445A2 (en) * | 2001-01-12 | 2002-07-18 | Corning Incorporated | Optical fiber and preform, method of manufacturing same, and optical component made therefrom |
| US6606883B2 (en) * | 2001-04-27 | 2003-08-19 | Corning Incorporated | Method for producing fused silica and doped fused silica glass |
| EP1441992A1 (en) * | 2001-09-27 | 2004-08-04 | Corning Incorporated | Improved methods and furnaces for fused silica production |
| US6928220B2 (en) * | 2002-02-01 | 2005-08-09 | Simax Technologies, Inc. | Sol-gel-derived optical fiber preform and method of manufacture |
| US6799440B2 (en) * | 2002-02-22 | 2004-10-05 | General Electric Company | Optical fiber deposition tube fused in deuterium atmosphere for attenuation improvement |
| US20040060327A1 (en) * | 2002-09-30 | 2004-04-01 | Berkey George E | Method for treating an optical fiber preform with deuterium |
| KR101066281B1 (ko) * | 2003-08-29 | 2011-09-20 | 코닝 인코포레이티드 | 알칼리 금속 산화물을 함유하는 광섬유, 및 그 제조 방법및 장치 |
| US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
| US7506522B2 (en) * | 2004-12-29 | 2009-03-24 | Corning Incorporated | High refractive index homogeneity fused silica glass and method of making same |
| JP5538679B2 (ja) * | 2004-12-30 | 2014-07-02 | コーニング インコーポレイテッド | 低い偏光誘起複屈折を有する合成シリカ、同シリカの製造方法および同シリカを含むリソグラフィデバイス |
-
2006
- 2006-10-19 US US11/583,619 patent/US7635658B2/en active Active
- 2006-11-01 KR KR1020087013869A patent/KR101363182B1/ko not_active Expired - Fee Related
- 2006-11-01 JP JP2008540074A patent/JP5224286B2/ja active Active
- 2006-11-01 EP EP06827356.4A patent/EP1963234B1/en not_active Not-in-force
- 2006-11-01 WO PCT/US2006/042768 patent/WO2007053733A1/en not_active Ceased
-
2009
- 2009-02-13 US US12/370,693 patent/US20090148627A1/en not_active Abandoned
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