JP2009291905A - Polishing method and apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a polishing method and apparatus with simple structure, surely polishing a test piece surface precisely and in parallel with respect to a bottom face of a test piece fixing pedestal. <P>SOLUTION: A supporting tool 2 is fixed by clamping members 4 such as bolts to a surface of a center portion of a rotatably disposed shaft of a rotary polisher 1, so as to concentrically dispose a circular through-hole 3 made in a center portion of the support tool 2 with the surface of the center portion of the rotatably disposed shaft of the rotary polisher 1. The test piece fixing pedestal 6 which is cylindrical and has the test piece fixed on the upper surface (one end surface) thereof can be inserted into the circular through-hole 3 of the supporting tool 2. Furthermore, the polisher 1 is rotated and the upper face (surface) of the test piece is polished, while a pressing and rotating restraining means 7 holds the test piece fixing pedestal 6 inserted into the circular through-hole 3 of the supporting tool 2 so as to press the test piece with predetermined pressing force against the surface of the center portion of the polisher 1, and also restrains the test piece fixing pedestal 6 from rotating. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a polishing method and apparatus.

  In recent years, in the fields of electrical and electronics, communications, etc., the performance and sophistication of materials have been remarkably increased. As one of the technologies that support the enhancement and sophistication of these materials, crystal grain boundaries and microscopic area near the crack tip It is important to measure the hardness and Young's modulus of the surface, thin film, oxide film on the surface of the material, laminated film, or ion-implanted layer with high accuracy at the nanoscopic level. A micro indentation test apparatus is used which can measure the surface hardness by pushing into a surface.

  In the micro indentation test apparatus, the sample is fixed to the upper surface (one end surface) of the sample fixing base in advance with an adhesive, and the sample fixing base on which the sample is fixed is set in the test apparatus. The indenter is pushed into the sample surface with a minute load, but if the parallelism between the bottom surface (other end surface) of the sample fixing base and the top surface (surface) of the sample is not accurately measured, There is a possibility that an error may occur and the accuracy may be reduced.

  For this reason, conventionally, a separate support device for supporting the bottom surface of the sample fixing base with respect to the rotary polishing disk of the polishing device is prepared, and the bottom surface of the sample fixing base is covered. Polishing the upper surface of a sample as an abrasive in parallel has been performed.

Examples of the general technical level of a thin plate polishing apparatus include Patent Documents 1 and 2.
JP-A-10-76460 JP 2002-79460 A

  However, as described above, if a separate support device is provided to support the rotating polishing disk of the polishing apparatus so that the bottom surface of the sample fixing base as the base for fixing the material to be polished is maintained in parallel, the support It is inevitable that the equipment will become large, and it will be difficult to maintain the parallelism between the rotary polishing machine and the bottom surface of the sample fixing base accurately, although the support equipment will be large, which will increase the cost. Also had the disadvantage of being connected.

  In view of such a situation, the present invention intends to provide a polishing method and apparatus capable of accurately and accurately polishing the surface of a material to be polished with respect to the end surface of the base for fixing the material to be polished with a simple structure. Is.

  According to the present invention, a support jig is fixed to the surface of the axial center of a rotary polishing machine so that the circular through hole is concentrically arranged, and the support jig is cylindrical and can be fitted into the circular through hole. A polishing material fixing pedestal having a polishing material fixed to an end face is fitted so that the polishing material is pressed against the surface of the axial center of the rotary polishing disk with a required pressing force, and the polishing material fixing pedestal is inserted. The present invention relates to a polishing method characterized in that the rotary polishing disk is rotated in a state where it is constrained not to rotate.

On the other hand, the present invention comprises a rotating polishing machine disposed rotatably,
A support jig fixed so that a circular through hole drilled in a central portion is concentrically disposed on a surface of an axial center portion of the rotary polishing machine;
A base for fixing a material to be polished, in a cylindrical shape that can be fitted into the circular through hole of the support jig, and a material to be polished fixed to one end surface;
The pedestal for fixing the workpiece to be inserted into the circular through hole of the support jig is held so that the workpiece is pressed against the surface of the axial center of the rotary polishing machine with a required pressing force, and the workpiece is fixed. The present invention relates to a polishing apparatus comprising: a press rotation restraining means for restraining the pedestal from rotating.

  According to the above polishing method and apparatus, the material to be polished is fixed with the material to be polished fixed to one end surface with respect to the support jig fixed so that the circular through hole is concentrically arranged on the surface of the axial center portion of the rotary polishing disk. By simply inserting the pedestal so that the material to be polished is pressed against the surface of the axial center of the rotary polishing machine with the required pressing force, the parallelism between the rotary polishing machine and the end surface of the base for fixing the polishing material is accurately maintained. When the rotating polishing disk is rotated in a state where the pedestal for fixing the material to be polished is prevented from rotating, the surface of the material to be polished is parallel to the end surface of the pedestal for fixing the material to be polished. As a result, unlike a separate support device that supports the rotating polishing disk so that the end surface of the pedestal for fixing the material to be polished is kept parallel, a large support device is not provided. Cost up.

In the polishing apparatus, the support jig is
A base frame fixed to the surface of the axial center of the rotary polishing machine;
And a support attachment that is detachably fitted to the base frame body and has a circular through hole formed in the center thereof. In this case, a plurality of supports having different inner diameters, that is, the diameters of the circular through holes are different. If you prepare attachments, you can simply replace them as needed, without replacing the entire support jig, and use the base frame as a common component to mount multiple bases with different outer diameters. Can also be supported.

  Further, in the polishing apparatus, a polishing liquid supply hole extending from the outer surface side into the circular through hole is formed in the support jig, and the polishing liquid container is filled with the polishing liquid. Since the polishing liquid in the polishing liquid container is supplied between the surface of the rotary polishing disk and the material to be polished through the circular through hole from the polishing liquid supply hole, The action of the chemical components contained in the polishing liquid is effective in increasing the mechanical polishing efficiency due to the relative movement between the rotary polishing disk and the material to be polished and promptly obtaining a smooth polished surface.

Furthermore, in the polishing apparatus, the pressing rotation restraining means is
A fixedly arranged column member;
An arm member attached to the tip of the column member so as to be rotatable about an axis extending in a direction perpendicular to the axis of the rotary polishing disc;
A pressing member attached to the distal end of the arm member and fixed to the other end surface of the base for fixing the material to be polished;
An elastic member that urges the arm member in a direction to press the object to be pressed against the surface of the axial center of the rotary polishing disk via the pressing member and the base for fixing the object to be polished. Then, the arm member is urged by the urging force of the elastic member, and the pressing member and the material to be polished are fixed by rotating with respect to the column member about an axis extending in a direction perpendicular to the axis of the rotary polishing disk. Through the pedestal, the material to be polished is pressed against the surface of the axial center portion of the rotary polishing disk with an appropriate pressing force, and the surface of the material to be polished can be stably polished.

  According to the polishing method and apparatus of the first and second aspects of the present invention, the surface of the material to be polished can be accurately polished parallel to the end surface of the base for fixing the material to be polished with a simple structure. An excellent effect can be achieved.

  According to the polishing apparatus of claim 3 of the present invention, in addition to the above effect, the base frame body can be shared without replacing the entire support jig only by replacing a plurality of support attachments having different diameters of the circular through holes. As a component, it is possible to achieve an excellent effect of being able to cope with a plurality of polishing material fixing bases having different outer diameters.

  According to the polishing apparatus of claim 4 of the present invention, in addition to the above effect, the mechanical polishing efficiency is increased by the relative motion between the rotary polishing disk and the material to be polished by the action of the chemical component contained in the polishing liquid. Therefore, an excellent effect that a smooth polished surface can be obtained quickly can be obtained.

  According to the polishing apparatus of claim 5 of the present invention, in addition to the above effect, the material to be polished is applied to the surface of the axial center portion of the rotary polishing disk with an appropriate pressing force via the pressing member and the base for fixing the material to be polished. It is possible to exert an excellent effect that the surface of the material to be polished can be stably polished.

  Embodiments of the present invention will be described below with reference to the accompanying drawings.

  1 to 3 show an example of an embodiment of the present invention, and a circular shape in which a support jig 2 is drilled in the center of a surface of a shaft center portion of a rotary polishing disk 1 that is rotatably arranged. The sample 5 as a material to be polished is fixed to the circular through hole 3 of the support jig 2 in a cylindrical shape and on the upper surface (one end surface) so that the through holes 3 are concentrically arranged. The sample fixing base 6 as the base for fixing the material to be polished is fixed, and the sample fixing base 6 is inserted into the circular through hole 3 of the support jig 2 by the press rotation restraining means 7. Is held so that the sample 5 is pressed against the surface of the axial center portion of the rotary polishing machine 1 with a required pressing force, and the rotary polishing machine 1 is rotated while the sample fixing base 6 is restrained from rotating. The upper surface (surface) of the sample 5 is configured to be polished.

  In the case of the illustrated example, the rotating polishing disk 1 is formed by attaching a polishing pad 1b such as polishing paper or polishing cloth to the surface of a rotating disk main body 1a that is rotationally driven by a driving device (not shown) such as a motor. It has the composition which becomes.

  Further, as shown in FIG. 2, the support jig 2 has an outer diameter shape in which a smaller-diameter disk is superimposed on a larger-diameter disk, and the circular through hole is formed in the axial center portion thereof. 3 and a mounting hole 8 for the fastening member 4 (see FIG. 1) is formed in the outer peripheral portion of the large-diameter disk portion. A polishing liquid supply hole 9 extending from the outer surface side into the circular through-hole 3 is formed, and a polishing liquid container 10 containing the polishing liquid is set in the polishing liquid supply hole 9. The polishing liquid is for increasing the mechanical polishing efficiency due to the relative movement between the rotary polishing disk 1 and the sample 5 by the action of chemical components contained in the polishing liquid, and for obtaining a smooth polished surface quickly. It is.

  Further, the pressing rotation restraining means 7 extends an arm member 7b in a direction perpendicular to the axial center of the rotary polishing disc 1 at the tip of a column member 7a fixedly disposed on a gantry or the like (not shown) of the polishing apparatus. It is attached so as to be rotatable about a shaft 7c, and the bottom surface of the sample fixing base 6 is attached to the tip of the arm member 7b (however, this bottom surface as the other end surface is turned upside down as shown in FIG. Therefore, the pressing member 7d fixed to the upper side) is attached via a plurality of finger-type rod-like bodies 7e, and the sample 5 is rotationally polished via the pressing member 7d and the sample fixing base 6. An elastic member 7f such as a tension spring that biases the arm member 7b in a direction to be pressed against the surface of the axial center of the panel 1 is provided so as to span between the column member 7a and the arm member 7b. is doing. The pressing member 7d is a disk-like member having substantially the same diameter as the sample fixing pedestal 6. For example, a moderately elastic member such as a rubber plate is used, and the bottom surface of the sample fixing pedestal 6 ( Although it adheres to the other end surface), it is possible to use not only the adhesion but also a mechanism for gripping the sample fixing base 6.

  Next, the operation of the illustrated example will be described.

  When configured as described above, the sample fixing pedestal 6 in which the sample 5 is fixed to one end surface of the support jig 2 fixed so that the circular through holes 3 are concentrically arranged on the surface of the axial center portion of the rotary polishing disk 1. Is simply inserted so that the sample 5 is pressed against the surface of the axial center portion of the rotary polishing machine 1 with a required pressing force, so that the parallelism between the rotary polishing machine 1 and the bottom surface of the sample fixing base 6 is accurately maintained. When the rotating polishing disk 1 is rotated in a state where the sample fixing base 6 is restrained from rotating, the upper surface (surface) of the sample 5 is parallel to the bottom surface of the sample fixing base 6. Polished. Incidentally, as shown in FIG. 3, even if the sample 5 is obliquely adhered to the upper surface (one end surface) of the sample fixing base 6 with an adhesive, the upper surface (front surface) of the sample 5 is not affected by the sample fixing base 6. There is no problem because it is polished in parallel with the bottom surface.

  As a result, unlike a separate support device that supports the rotating polishing disk 1 so that the bottom surface of the sample fixing base 6 is kept parallel, it is not necessary to provide a large support device. Up is also avoided.

  In the case of the illustrated example, the support jig 2 is provided with a polishing liquid supply hole 9 extending from the outer surface side into the circular through hole 3, and the polishing liquid is put into the polishing liquid supply hole 9. Since the polishing liquid container 10 is set, the polishing liquid in the polishing liquid container 10 is supplied from the polishing liquid supply hole 9 through the circular through hole 3 between the surface of the rotary polishing disk 1 and the sample 5. In addition, due to the action of chemical components contained in the polishing liquid, the mechanical polishing efficiency due to the relative movement between the rotary polishing disk 1 and the sample 5 is increased, and this is effective in quickly obtaining a smooth polished surface.

  Further, the pressing rotation restricting means 7 is an axis that extends the arm member 7b in a direction perpendicular to the axis of the rotary polishing disc 1 at the tip of a column member 7a fixedly disposed on a gantry or the like (not shown) of the polishing apparatus. A pressing member 7d fixed to the bottom surface of the sample fixing base 6 is attached to the tip of the arm member 7b, and the pressing member 7d and the sample fixing base 6 are attached to the tip of the arm member 7b. An elastic member 7f such as a tension spring that urges the arm member 7b in a direction to press the sample 5 against the surface of the axial center of the rotary polishing disc 1 is interposed between the column member 7a and the arm member 7b. Thus, the arm member 7b is urged by the urging force of the elastic member 7f, and the shaft 7c extends in a direction perpendicular to the axis of the rotary polishing disc 1 with respect to the column member 7a. By rotating around Through the pressure member 7d and the sample fixing base 6, the sample 5 is pressed against the surface of the axial center portion of the rotary polishing disk 1 with an appropriate pressing force, and the surface of the sample 5 can be stably polished. Yes. Further, since the pressing member 7d is made of a moderately elastic member such as a rubber plate, it is effective in absorbing vibration, rotational unevenness, and the like associated with the rotation of the rotary polishing board 1.

  Thus, according to the illustrated example, the upper surface of the sample 5 can be accurately and accurately polished with a simple structure and parallel to the bottom surface of the sample fixing base 6, and the action of the chemical component contained in the polishing liquid can be achieved. Thus, the mechanical polishing efficiency can be increased by the relative movement of the rotary polishing disk 1 and the sample 5, and a smooth polished surface can be obtained quickly. Further, the sample can be obtained via the pressing member 7d and the sample fixing base 6. 5 can be pressed against the surface of the axial center of the rotary polishing machine 1 with an appropriate pressing force, and the surface of the sample 5 can be polished stably.

  4 and 5 show a modification of the supporting jig 2 in an example of an embodiment for carrying out the present invention. In the figure, parts denoted by the same reference numerals as those in FIGS. 1 to 3 represent the same thing. The basic configuration is the same as that shown in FIGS. 1 to 3, but the feature of this example is that the support jig 2 is rotated as shown in FIGS. The base frame 2a is fixed to the surface of the axial center of the polishing disc 1, and the support attachment 2b is detachably fitted to the base frame 2a and has a circular through hole 3 in the center. In the point.

  Since the outer shapes of the base frame 2a and the support attachment 2b of the support jig 2 are both circular, the base frame 2a is provided at a required position in the inner peripheral edge of the stepped hole 11 in which the support attachment 2b is accommodated. A concave groove 12 is provided, and a protruding piece 13 that engages with the circular groove 12 is provided on the support attachment 2b.

  When the support jig 2 is divided and formed into a base frame 2a and a support attachment 2b as in the example shown in FIGS. 4 and 5, a plurality of support attachments 2b having different inner diameters (φD), that is, different diameters of the circular through holes 3 are formed. If prepared, the base frame body 2a can be used as a common part to replace a plurality of sample fixing bases 6 having different outer diameters without replacing the entire support jig 2 simply by replacing them as necessary. Can also be supported.

  The polishing method and apparatus of the present invention are not limited to the above-described examples. The outer shape of the support jig 2 is circular as long as the circular through hole 3 is formed in the center thereof. If the outer shape of the base frame 2a and the support attachment 2b of the support jig 2 is a shape other than a circle, it is not limited to an oval, triangle, rectangle, or polygon. 12 and the projecting piece 13 are not particularly required, and if parallelism is required, not only the sample fixing base 6 and the sample 5 for the micro indentation test apparatus but also other polished objects Needless to say, various modifications can be made without departing from the gist of the present invention, such as being applicable to a material fixing base and a material to be polished.

It is a perspective view which shows an example of the form which implements this invention. It is a perspective view which shows a state in which the procedure for fitting the sample fixing base to the support jig and the state in which the sample fixing base is fitted to the support jig in an example of the embodiment of the present invention is partially broken. It is a side view which shows the state in which the sample is adhere | attached diagonally to the base for sample fixation in an example of embodiment which implements this invention. It is a sectional side view which shows the modification of the support jig in an example of embodiment which implements this invention. It is a top view which shows the modification of the supporting jig in an example of embodiment which implements this invention, Comprising: It is the VV arrow equivalent view of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Rotating polisher 1a Rotating disc main body 1b Polishing pad 2 Support jig 2a Base frame 2b Support attachment 3 Circular through-hole 5 Sample (material to be polished)
6 Sample fixing pedestal (polishing material fixing pedestal)
7 Pressing and rotating restraint means 7a Column member 7b Arm member 7c Shaft 7d Pressing member 7e Rod-like body 7f Elastic member 9 Polishing liquid supply hole 10 Polishing liquid container

Claims (5)

  A support jig is fixed on the surface of the axial center of the rotary polishing machine so that the circular through hole is concentrically arranged, and the support jig has a cylindrical shape that can be fitted into the circular through hole and is polished on one end surface. The base for fixing the material to be polished is fitted so that the material to be polished is pressed against the surface of the axial center of the rotary polishing disk with a required pressing force, and the base for fixing the material to be polished is not rotated. A polishing method comprising rotating the rotary polishing disk in a restrained state. A rotating polishing machine disposed rotatably;
A support jig fixed so that a circular through hole drilled in a central portion is concentrically disposed on a surface of an axial center portion of the rotary polishing machine;
A base for fixing a material to be polished, in a cylindrical shape that can be fitted into the circular through hole of the support jig, and a material to be polished fixed to one end surface;
The pedestal for fixing the workpiece to be inserted into the circular through hole of the support jig is held so that the workpiece is pressed against the surface of the axial center of the rotary polishing disc with a required pressing force, and the workpiece is fixed. A polishing apparatus comprising: a press rotation restraining means for restraining the pedestal from rotating. The support jig,
A base frame fixed to the surface of the axial center of the rotary polishing machine;
The polishing apparatus according to claim 2, further comprising a support attachment that is detachably fitted to the base frame body and has a circular through hole formed in a central portion thereof.   4. A polishing liquid supply hole extending from the outer surface side into the circular through hole is formed in the support jig, and a polishing liquid container in which the polishing liquid is placed is set in the polishing liquid supply hole. The polishing apparatus as described. The pressing rotation restraining means;
A fixedly arranged column member;
An arm member attached to the tip of the column member so as to be rotatable about an axis extending in a direction perpendicular to the axis of the rotary polishing disc;
A pressing member attached to the distal end of the arm member and fixed to the other end surface of the base for fixing the material to be polished;
The elastic member which urges | biases the said arm member to the direction which presses the said to-be-polished material to the axial center part surface of a rotary grinding | polishing disk via this pressing member and a to-be-polished material fixing base. The polishing apparatus according to any one of the above.

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