CN106965072B - Polishing equipment for ceramic workpiece - Google Patents

Polishing equipment for ceramic workpiece Download PDF

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Publication number
CN106965072B
CN106965072B CN201710255673.5A CN201710255673A CN106965072B CN 106965072 B CN106965072 B CN 106965072B CN 201710255673 A CN201710255673 A CN 201710255673A CN 106965072 B CN106965072 B CN 106965072B
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China
Prior art keywords
polishing
ceramic
ceramic workpiece
clamping
rotary table
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Application number
CN201710255673.5A
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Chinese (zh)
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CN106965072A (en
Inventor
何智安
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Shenzhen Everwin Precision Technology Co Ltd
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Shenzhen Everwin Precision Technology Co Ltd
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0069Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/005Feeding or manipulating devices specially adapted to grinding machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A polishing apparatus for a ceramic workpiece, comprising: the polishing device comprises an upper rotary table, clamping equipment, a brush disc arranged below the upper rotary table, polishing cloth coated on the brush disc, a lower rotary table and a control system, wherein a plurality of clamping equipment are uniformly distributed on the same circumferential surface of the lower rotary table. The polishing equipment has high production efficiency.

Description

Polishing equipment for ceramic workpiece
Technical Field
The application relates to the field of ceramic processing, in particular to polishing equipment for ceramic workpieces.
Background
In the 3C field, especially mobile terminals such as smart phones and wearable devices, along with network upgrade, requirements for receiving capability of terminal antennas are higher and higher, and existing smart phones generally use metal materials to manufacture shells, and the metal materials have obvious shielding problems for antenna signals. After the network is upgraded to 5G, the mobile phone antenna with the metal shell cannot meet the performance requirement, and a new material is needed to solve the above problems.
The ceramic material has high hardness and better glossiness than metal, and has no shielding effect on antenna signals, when the ceramic material is used for manufacturing the shell, the shell needs to be polished, and the existing polishing process can only polish one side of a ceramic workpiece. The existing polishing equipment only needs to clamp again after polishing one side edge when polishing a ceramic workpiece, and the processing efficiency is low.
Disclosure of Invention
In view of this, it is necessary to provide a polishing apparatus for ceramic workpieces to enhance polishing efficiency.
In order to solve the above technical problems, the present application provides a polishing apparatus for ceramic workpieces, comprising:
a circular base;
the clamping devices are uniformly distributed on the same circumferential surface on the circular base, and comprise vertical arms vertically fixed on the circular base, rotating shafts mounted at the upper ends of the vertical arms and extending towards the direction away from the circle center, and clamping devices mounted at the tail ends of the rotating shafts and used for clamping the ceramic workpieces, and the clamping devices can rotate around the rotating shafts by 360 degrees.
Preferably, the end of the clamping device is provided with a holding part, the ceramic workpiece comprises a rear wall, four side walls formed by extending upwards from the edge of the rear wall, and an inner cavity surrounded by the rear wall and the four side walls, and the ceramic workpiece is held on the holding part through the inner cavity.
Preferably, the side surface of the ceramic workpiece is exposed from the outer edge of the clamping device.
Preferably, the clamping device is applied to polishing equipment, the polishing equipment comprises an upper rotary table, a brush disc arranged below the upper rotary table, polishing cloth coated on the brush disc, a lower rotary table and a control system, and the clamping devices are uniformly distributed on the same circumferential surface of the lower rotary table.
Preferably, the upper turntable rotates in a first direction, and the brush tray rotates on the upper turntable in a second direction opposite to the first direction; the lower turntable rotates along the second direction, and the clamping equipment rotates on the lower turntable along the first direction.
Preferably, the upper disc body of the upper rotary disc rotates at a speed of 120-150 r/min; the brush disc rotates at a speed of 6-10 r/min; the lower rotary table rotates at a speed of 20-40 r/min; and the clamping devices on the lower turntable drive the ceramic workpieces arranged on the lower turntable to rotate at the speed of 6-10 r/min.
Preferably, the polishing cloth on the brush disc of the upper rotary disc is pressed down by 2-3mm relative to the side surface of the ceramic workpiece.
Preferably, in the polishing process, after polishing of one side edge of the ceramic workpiece is completed, the control system controls the clamping device to rotate 90 degrees around the rotating shaft until polishing of four side edges of the ceramic workpiece is completed.
According to the polishing equipment for the ceramic workpiece, the rotating shaft capable of driving the ceramic workpiece to rotate in the 360-degree direction is arranged on the clamp, so that the four sides of the ceramic workpiece can be machined at one time, and in the machining process, clamping is not needed again, so that the efficiency is greatly improved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the application and are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the application and do not constitute a limitation on the application.
FIG. 1 is a perspective view of a ceramic workpiece of the present application;
FIG. 2 is a perspective view of the polishing apparatus of the present application;
FIG. 3 is a perspective view of an upper turntable of the polishing apparatus of the present application;
FIG. 4 is a perspective view of the clamping device of the polishing apparatus of the present application mounted to the lower turntable;
FIG. 5 is a perspective view of a clamping apparatus of the polishing apparatus of the present application;
fig. 6 is a perspective view of a jig of the polishing apparatus of the present application.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the technical solutions of the present application will be clearly and completely described below with reference to specific embodiments of the present application and corresponding drawings. It will be apparent that the described embodiments are only some, but not all, embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
Referring to fig. 1, a ceramic workpiece 10 for processing according to the present application is a smart phone casing, and includes a rear wall 11, four side walls 13 extending upward from edges of the rear wall 11, and an inner cavity 12 defined by the rear wall and the four side walls 13. The four side walls 13 are formed with arc corners 14 at positions adjacent to each other. In a specific embodiment, the ceramic workpiece 10 may be a center for a smart phone, i.e. comprising four side walls 13, but not the rear wall 11.
Referring to fig. 2 to 6, the clamping device 30 for polishing ceramic workpieces according to the present application is applied to a polishing device, and the polishing device includes a lower turntable 20, a clamping device 30 disposed on the lower turntable 20, an upper turntable 40 disposed above the clamping device 30, and a control system. The upper rotary disc 40 and the lower rotary disc 20 are both in circular structures, and the upper rotary disc 40 comprises an upper disc body 41, a plurality of brush discs 42 arranged below the upper disc body 41 and polishing cloth 43 coated on the brush discs 42. The brush plate 42 is rotatable on the upper plate 41 in a direction opposite to the rotation direction of the upper plate 41. The polishing cloth 43 may be made of the following materials: the rubber wire pad has low cost, general polishing effect and small removal amount and is used for a rough polishing process; the polishing pad has the advantages of higher cost, small removal amount, good polishing effect and higher finish, and is used for a fine polishing process; the pig brush has the advantages of higher cost, quick removal, short service life and general polishing effect, and is used for a rough polishing process; carpet dragging-low cost, small removal amount, and mainly increased smoothness, and is used for a fine polishing process; the fiber pad has low cost, quick removal, long service life and poor polishing effect, and is used for rough polishing process. The polishing cloth 43 is made of flexible material and can be easily deformed.
The clamping devices 30 are circular and uniformly distributed on the lower turntable 20, namely, the clamping devices 30 are distributed on circumferences with the same radius of the lower turntable 20. The clamping device 30 comprises a circular base 31 which can rotate relative to the lower turntable 20, and a plurality of clamps 32 which are fixed on the circumference of a certain radius of the circular base 31. The fixture 32 includes a vertical arm 321 vertically fixed on the circular base 31, a rotating shaft 322 installed at the upper end of the vertical arm 321 and extending away from the center of the circle, a clamping device 323 installed at the end of the rotating shaft 322, and a holding portion 324 disposed at the end of the clamping device 323 and used for fixing the ceramic workpiece 10, where the clamping device 323 can rotate around the rotating shaft 322 by three hundred sixty degrees under the control of the control system. The ceramic workpiece 10 is fixed on the holding portion 324 of the holding device 323, so that the ceramic workpiece 10 is perpendicular to the circular base 31, and the four side walls 13 of the ceramic workpiece 10 are exposed from the outer edge of the holding device 323.
The upper disc body 41 of the upper rotary disc 40 of the polishing device rotates along a first direction, and the brush disc 42 positioned below the upper disc body 41 rotates along a second direction opposite to the first direction; the lower turntable 20 rotates in the second direction, and the clamping device 30 drives the clamp 32 to rotate on the lower turntable 20 along the first direction.
The polishing process using the polishing apparatus of the present application is as follows:
s10, fixing a plurality of ceramic workpieces on the lower rotary table through the clamp;
in this step, the ceramic workpiece 10 is fixed on the fixing portion 324 by the fixture 32, and four sides 13 of the ceramic workpiece 10 are exposed from the outer edge of the clamping device 323.
S20, initializing a control system;
in the step, by initializing set parameters, the upper disc body 41 of the upper rotary disc 40 rotates at a speed of 120-150r/min in a first direction; the brush 42 of the upper turntable 40 reversely rotates at a speed of 6-10r/min in a second direction opposite to the first direction; the lower turntable 20 rotates in the second direction at a speed of 20-40 r/min; the clamping devices 30 on the lower turntable 20 drive the ceramic workpieces 10 mounted thereon to rotate at a speed of 6-10r/min in a first direction opposite to the lower turntable 20. The polishing cloth 43 on the brush plate 42 of the upper turntable 40 is required to be pressed down by 2-3mm when contacting the surface of the side edge 13 of the ceramic workpiece, so that the polishing efficiency is improved, and meanwhile, the problem that the side edge of the ceramic workpiece 10 is not a plane but a curved surface is also adapted, namely, the side edge surface of the ceramic workpiece 10 can be completely contacted by the polishing cloth 43 under the condition of pressing down by 2-3mm. At the same time, the four corners 14 of the ceramic workpiece 10 are arc-shaped, and under the condition that the polishing cloth 43 is pressed down by 2-3mm, at least half of the corners 14 along the diagonal line can be contacted and polished by the polishing cloth 43.
S30, starting equipment to polish the ceramic workpiece;
the polishing device is started in this step, so that the upper disc 41, the brush disc 42, the lower turntable 20, and the clamping device 30 rotate according to the set parameters, and this step includes:
s301, a first side edge of four side edges of all ceramic workpieces 10 faces the upper rotary table, the upper rotary table 40 is pressed down, polishing cloth 43 on the upper rotary table 40 contacts the first side edge and is pressed down for 2-3mm, and polishing is carried out for 20-30min;
s302, the control system controls the rotating shaft 322 of the clamping device 30 to drive the clamping device 323 to rotate 90 degrees, so that the second side edge of the ceramic workpiece 10 faces the upper rotary table 40, and step S301 is repeated to polish the second side edge;
s303, the control system controls the rotating shaft 322 of the clamping device 30 to drive the clamping device 323 to rotate 90 degrees again in the same direction, so that the third side edge of the ceramic workpiece 10 faces the upper turntable 40, and the step S301 is repeated to polish the third side edge;
s304, the control system controls the rotating shaft 322 of the clamping device 30 to drive the clamping device 323 to rotate 90 degrees again in the same direction, so that the fourth side edge of the ceramic workpiece 10 faces the upper turntable 40, and the step S301 is repeated to polish the fourth side edge;
the step S30 may further include applying a polishing liquid or polishing paste on the polishing cloth 43, where the polishing liquid or polishing paste is diamond powder, and the particle size of the diamond powder may be selected according to the requirements of rough polishing or fine polishing. Rough polishing can select diamond powder with larger particles, and fine polishing can select diamond powder with smaller particles.
And S40, repeating the step S30, and selecting diamond powder with smaller particles to finely throw the ceramic workpiece 10.
According to the polishing equipment or the polishing method, the plurality of autorotation clamping equipment 30 is arranged on the lower turntable 20, and the plurality of clamps 32 positioned on the same circumference are arranged on the clamping equipment 30, so that polishing processing of up to tens of ceramic workpieces can be completed by one-time processing, meanwhile, the clamps 32 are provided with rotating shafts which drive the ceramic workpieces to rotate in the 360-degree direction, and the four sides of the ceramic workpieces can be processed by one-time processing, and in the processing process, the clamping is not required again, so that the efficiency is greatly improved.
It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article or apparatus that comprises the element.
The foregoing is merely exemplary of the present application and is not intended to limit the present application. Various modifications and variations of the present application will be apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. which come within the spirit and principles of the application are to be included in the scope of the claims of the present application.

Claims (4)

1. The polishing equipment for the ceramic workpiece is characterized by comprising an upper rotary table, clamping equipment, a brush disc arranged below the upper rotary table, polishing cloth coated on the brush disc, a lower rotary table and a control system, wherein the clamping equipment is uniformly distributed on the same circumferential surface of the lower rotary table;
the clamping equipment comprises:
a circular base;
eight clamps, which are uniformly distributed on the same circumferential surface on the circular base, and comprise a vertical arm vertically fixed on the circular base, a rotating shaft arranged at the upper end of the vertical arm and extending towards the direction far away from the center of the circle, and a clamping device arranged at the tail end of the rotating shaft and used for clamping the ceramic workpiece, wherein the clamping device can rotate 360 degrees around the rotating shaft;
the upper turntable rotates along a first direction, and the brush disc rotates on the upper turntable along a second direction opposite to the first direction; the lower turntable rotates along the second direction, and the clamping equipment rotates on the lower turntable along the first direction;
the upper disc body of the upper rotary disc rotates at the speed of 120-150 r/min; the brush disc rotates at a speed of 6-10 r/min; the lower rotary table rotates at a speed of 20-40 r/min; the clamping devices on the lower turntable drive the ceramic workpieces arranged on the lower turntable to rotate at the speed of 6-10 r/min;
and polishing cloth on the brush disc of the upper rotary disc is pressed down by 2-3mm relative to the side surface of the ceramic workpiece.
2. The polishing apparatus for ceramic workpieces according to claim 1, wherein the holding device is provided with a holding portion at an end thereof, the ceramic workpiece including a rear wall, four side walls extending upward from an edge of the rear wall, and an inner cavity defined by the rear wall and the four side walls, the ceramic workpiece being held on the holding portion through the inner cavity.
3. The polishing apparatus for ceramic workpieces as recited in claim 2, wherein a side surface of said ceramic workpiece is exposed to an outer edge of said holding means.
4. The polishing apparatus for ceramic workpieces according to claim 1, wherein said control system controls said holding means to rotate 90 degrees around said rotation axis until polishing of four sides of said ceramic workpiece is completed, after polishing of one side of said ceramic workpiece is completed during polishing.
CN201710255673.5A 2017-04-19 2017-04-19 Polishing equipment for ceramic workpiece Active CN106965072B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710255673.5A CN106965072B (en) 2017-04-19 2017-04-19 Polishing equipment for ceramic workpiece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710255673.5A CN106965072B (en) 2017-04-19 2017-04-19 Polishing equipment for ceramic workpiece

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Publication Number Publication Date
CN106965072A CN106965072A (en) 2017-07-21
CN106965072B true CN106965072B (en) 2023-09-19

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108115547A (en) * 2017-12-20 2018-06-05 东莞华晶粉末冶金有限公司 A kind of polishing method and polissoir

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008006578A (en) * 2006-05-30 2008-01-17 Toyo Kohan Co Ltd Method of taking out magnetic disk substrate and surface machining apparatus for magnetic disk substrate
JP2009291905A (en) * 2008-06-06 2009-12-17 Ihi Corp Polishing method and apparatus
CN102350660A (en) * 2011-10-19 2012-02-15 杭州祥生砂光机制造有限公司 Deburring brush disc mechanism and deburring method
CN202572098U (en) * 2012-05-07 2012-12-05 宁波晨阳光电科技有限公司 Optical fiber inserting core end face polishing device
CN202640136U (en) * 2012-05-11 2013-01-02 广州遂联自动化设备有限公司 Workpiece assembling and disassembling structure of polishing machine
CN205380527U (en) * 2016-01-13 2016-07-13 广州群创数控机床有限公司 Speed reducer cycloid wheel processing special grinding machine of robot
CN206825179U (en) * 2017-04-19 2018-01-02 深圳市长盈精密技术股份有限公司 For ceramic workpiece polishing clamping apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008006578A (en) * 2006-05-30 2008-01-17 Toyo Kohan Co Ltd Method of taking out magnetic disk substrate and surface machining apparatus for magnetic disk substrate
JP2009291905A (en) * 2008-06-06 2009-12-17 Ihi Corp Polishing method and apparatus
CN102350660A (en) * 2011-10-19 2012-02-15 杭州祥生砂光机制造有限公司 Deburring brush disc mechanism and deburring method
CN202572098U (en) * 2012-05-07 2012-12-05 宁波晨阳光电科技有限公司 Optical fiber inserting core end face polishing device
CN202640136U (en) * 2012-05-11 2013-01-02 广州遂联自动化设备有限公司 Workpiece assembling and disassembling structure of polishing machine
CN205380527U (en) * 2016-01-13 2016-07-13 广州群创数控机床有限公司 Speed reducer cycloid wheel processing special grinding machine of robot
CN206825179U (en) * 2017-04-19 2018-01-02 深圳市长盈精密技术股份有限公司 For ceramic workpiece polishing clamping apparatus

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