JP2009283537A - Substrate-ousing container - Google Patents

Substrate-ousing container Download PDF

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JP2009283537A
JP2009283537A JP2008131724A JP2008131724A JP2009283537A JP 2009283537 A JP2009283537 A JP 2009283537A JP 2008131724 A JP2008131724 A JP 2008131724A JP 2008131724 A JP2008131724 A JP 2008131724A JP 2009283537 A JP2009283537 A JP 2009283537A
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semiconductor wafer
container
container body
contact
support
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Satoshi Odajima
智 小田嶋
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate-housing container which houses a semiconductor wafer having a diameter of 450 mm or larger, and is able to properly support the semiconductor wafer, even if it is bent by a large amount. <P>SOLUTION: The substrate-housing container includes a container body 10, which is a front-open box that houses a semiconductor wafer 1 having a diameter of 450 mm, and a lid which is fitted in an open front-face portion of the container body 10. Support pieces 15 for the semiconductor wafer 1 are disposed on both the internal sides of the container body 10 which are to face each other, and a support pin 17 is attached by post-attachment to a cutout 16 of each of the support pieces 15, with the support pin being in contact with the internal area 3, excluding the periphery 2 of the back face of the semiconductor wafer 1. Contacting walls 18 for the semiconductor wafer 1, situated at the rear of the support pieces 15, are formed respectively at the rear of internal both sides of the container body 10, and contact portions 19 of the butting walls, that come into contact with the periphery 2 of the semiconductor wafer 1, serve as a contact area 20, in which a plurality of irregularities 21 are formed into an array form, to hold the periphery 2 of the semiconductor wafer 1 in the contact area 20. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、φ450mm以上の半導体ウェーハを収納する基板収納容器に関するものである。   The present invention relates to a substrate storage container for storing a semiconductor wafer having a diameter of 450 mm or more.

薄く丸い半導体ウェーハは、φ200mmや300mmが主流であるが、多数のICチップを獲得する観点からφ450mmの開発が検討され、これに伴い、φ450mm用の基板収納容器についても世界中で議論され、規格化・標準化が進行しつつある。係るφ450mmの半導体ウェーハを収納する基板収納容器は、φ300mmの半導体ウェーハを収納するタイプ(特許文献1、2参照)に準じ、容器本体の正面部が開口したフロントオープンボックスに成形され、容器本体の内部両側には、半導体ウェーハ用の支持片が複数対設される。
特開2002−347061号公報 特開平06−112304号公報
For thin and round semiconductor wafers, φ200mm and 300mm are the mainstream. However, development of φ450mm has been studied from the viewpoint of obtaining a large number of IC chips, and accordingly, substrate storage containers for φ450mm have been discussed all over the world. And standardization are progressing. The substrate storage container for storing the φ450 mm semiconductor wafer is formed into a front open box in which the front portion of the container body is opened in accordance with the type (see Patent Documents 1 and 2) that stores the φ300 mm semiconductor wafer. A plurality of support pieces for semiconductor wafers are provided on both sides of the interior.
JP 2002-347061 A Japanese Patent Laid-Open No. 06-112304

ところで、φ450mmの半導体ウェーハは、φ300mmの半導体ウェーハと比較すると、多数のICチップを得ることができるものの、半導体の製造工程が進むにつれ、上下方向に大きく不規則に撓み易くなるという特徴がある。したがって、φ450mmの半導体ウェーハを収納する基板収納容器には、例えφ450mmの半導体ウェーハが上下方向に大きく撓んだとしても、半導体ウェーハを確実に支持するため、支持片とは別の支持機構が新たに設置されることが望ましい。   By the way, a semiconductor wafer having a diameter of 450 mm can obtain a larger number of IC chips than a semiconductor wafer having a diameter of 300 mm. However, as the semiconductor manufacturing process proceeds, the semiconductor wafer has a feature that it is easily bent in a large and irregular direction. Therefore, a substrate support container for storing a φ450 mm semiconductor wafer has a new support mechanism that is separate from the support piece in order to reliably support the semiconductor wafer even if the φ450 mm semiconductor wafer is greatly bent in the vertical direction. It is desirable to be installed in

本発明は上記に鑑みなされたもので、直径が450mm以上の半導体ウェーハを収納する際、半導体ウェーハが大きく撓んだとしても、半導体ウェーハを適切に支持することのできる基板収納容器を提供することを目的としている。   The present invention has been made in view of the above, and provides a substrate storage container that can appropriately support a semiconductor wafer even when the semiconductor wafer is greatly bent when storing a semiconductor wafer having a diameter of 450 mm or more. It is an object.

本発明においては上記課題を解決するため、直径が450mm以上の半導体ウェーハを収納する容器本体を正面部の開口したフロントオープンボックスに構成したものであって、
容器本体の内部における半導体ウェーハの周縁部と接触する接触領域に、半導体ウェーハの周縁部を保持する複数の凹凸を並べて形成したことを特徴としている。
In the present invention, in order to solve the above-mentioned problem, a container main body for storing a semiconductor wafer having a diameter of 450 mm or more is configured as a front open box having an open front portion,
A plurality of projections and depressions for holding the peripheral edge of the semiconductor wafer are formed side by side in a contact region in contact with the peripheral edge of the semiconductor wafer inside the container body.

なお、容器本体の内部背面に、半導体ウェーハの周縁部後端に接触する弾性片を取り付け、この弾性片により、半導体ウェーハを容器本体の正面部方向に付勢することが好ましい。   In addition, it is preferable to attach the elastic piece which contacts the peripheral edge rear end of a semiconductor wafer to the inner back surface of a container main body, and to urge a semiconductor wafer to the front part direction of a container main body with this elastic piece.

また、容器本体の内部両側に、半導体ウェーハ用の支持片をそれぞれ設けて各支持片には切り欠きを形成し、この切り欠きに、半導体ウェーハの裏面の周縁部を除く内側領域に接触する支持ピンを後付けし、
容器本体の内部両側の後方に、支持片の後方に位置する半導体ウェーハ用の突き当て壁をそれぞれ設けてその半導体ウェーハに接触する接触部を接触領域とすることが好ましい。
Also, support pieces for the semiconductor wafer are provided on both sides inside the container body, and a notch is formed in each support piece, and the notch is supported in contact with the inner region excluding the peripheral edge of the back surface of the semiconductor wafer. After attaching the pin,
It is preferable to provide a contact portion for contacting the semiconductor wafer by providing abutting walls for the semiconductor wafer positioned at the rear of the support piece on both rear sides of the inside of the container body.

ここで、特許請求の範囲における半導体ウェーハは、容器本体に単数複数の必要枚数が収納される。この容器本体は、必要に応じ、透明、半透明、不透明に構成される。また、容器本体と支持片とは、樹脂を含む成形材料を用いて一体成形されるのが一般的である。弾性片は、板バネが主ではあるが、樹脂製やゴム製のリテーナ等でも良い。   Here, the required number of semiconductor wafers is stored in the container main body in the claims. The container body is configured to be transparent, translucent, or opaque as required. Further, the container body and the support piece are generally integrally molded using a molding material containing a resin. The elastic piece is mainly a leaf spring, but may be a resin or rubber retainer.

本発明によれば、直径が450mm以上の半導体ウェーハは、容器本体に収納されると、周縁部が接触領域の凹凸に支持される。すなわち、半導体ウェーハの周縁部は、凹凸の凹部に嵌め入れられたり、強く接触したり、複数の凸部に挟まれる。   According to the present invention, when a semiconductor wafer having a diameter of 450 mm or more is accommodated in the container body, the peripheral portion is supported by the unevenness of the contact area. That is, the peripheral edge of the semiconductor wafer is fitted into a concave / convex concave portion, is in strong contact, or is sandwiched between a plurality of convex portions.

本発明によれば、容器本体の内部における半導体ウェーハの周縁部と接触する接触領域に、半導体ウェーハの周縁部を保持する複数の凹凸を並べて形成するので、直径が450mm以上の半導体ウェーハを収納する際、半導体ウェーハが大きく撓んだとしても、半導体ウェーハを適切に支持することができるという効果がある。   According to the present invention, a plurality of projections and depressions for holding the peripheral edge of the semiconductor wafer are formed side by side in the contact area in contact with the peripheral edge of the semiconductor wafer inside the container body, so that a semiconductor wafer having a diameter of 450 mm or more is stored. At this time, even if the semiconductor wafer is greatly bent, the semiconductor wafer can be appropriately supported.

また、容器本体の内部背面に、半導体ウェーハの周縁部後端に接触する弾性片を取り付け、この弾性片により、半導体ウェーハを容器本体の正面部方向に付勢すれば、半導体ウェーハの取り出しの際、複数の凹凸に半導体ウェーハの周縁部が引っかかることが少ないので、容器本体から半導体ウェーハを円滑に取り出すことができる。   In addition, an elastic piece that contacts the rear end of the peripheral edge of the semiconductor wafer is attached to the inner back surface of the container body, and if the semiconductor wafer is biased toward the front portion of the container body by this elastic piece, the semiconductor wafer can be taken out. Since the peripheral portion of the semiconductor wafer is hardly caught by the plurality of irregularities, the semiconductor wafer can be smoothly taken out from the container body.

以下、図面を参照して本発明に係る基板収納容器の好ましい実施形態を説明すると、本実施形態における基板収納容器は、図1ないし図10に示すように、φ450mmの半導体ウェーハ1を収納するフロントオープンボックスの容器本体10と、この容器本体10の開口した正面部に嵌合される蓋体30とを備え、容器本体10の内部両側に、半導体ウェーハ1用の支持片15を対設して各支持片15の切り欠き16に、半導体ウェーハ1の裏面の周縁部2を除く内側領域3に接触する支持ピン17を後付けし、容器本体10の内部両側の後方に、半導体ウェーハ1用の突き当て壁18を配設してその接触部19を接触領域20とし、この接触領域20に、半導体ウェーハ1の周縁部2を保持する複数の凹凸21を形成するようにしている。   Hereinafter, a preferred embodiment of a substrate storage container according to the present invention will be described with reference to the drawings. The substrate storage container in this embodiment is a front for storing a semiconductor wafer 1 having a diameter of 450 mm as shown in FIGS. An open box container body 10 and a lid body 30 fitted to the open front portion of the container body 10 are provided, and support pieces 15 for the semiconductor wafer 1 are provided on both sides of the container body 10 to face each other. Support pins 17 that come into contact with the inner region 3 excluding the peripheral edge 2 on the back surface of the semiconductor wafer 1 are retrofitted to the notches 16 of the respective support pieces 15, and the protrusions for the semiconductor wafer 1 are located behind both sides inside the container body 10. A contact wall 18 is provided and the contact portion 19 is used as a contact region 20, and a plurality of irregularities 21 for holding the peripheral edge 2 of the semiconductor wafer 1 are formed in the contact region 20.

半導体ウェーハ1は、図6、図7、図9に示すように、例えば薄く(例えば925μm)丸いφ450mmのシリコンタイプからなり、周縁部2に位置合わせや識別用の平面略半円形のノッチが選択的に形成される。この半導体ウェーハ1は、図示しない専用のロボットにより、容器本体10に水平に挿入して収納されたり、取り出される。   As shown in FIGS. 6, 7, and 9, the semiconductor wafer 1 is made of, for example, a thin (for example, 925 μm) round φ450 mm silicon type, and a planar semi-circular notch for alignment and identification is selected at the peripheral portion 2. Formed. The semiconductor wafer 1 is horizontally inserted into the container body 10 and stored or taken out by a dedicated robot (not shown).

容器本体10は、図1、図2、図6ないし図8に示すように、成形用の金型に所定の樹脂を含む成形材料が射出されることにより、25枚の半導体ウェーハ1を上下に並べて整列収納するフロントオープンボックスタイプに射出成形され、開口した正面部に同形の蓋体30がエンドレスのガスケットを介し着脱自在に嵌合されており、必要に応じて搬送用の嵌合保持体11に着脱自在に嵌合される。   As shown in FIGS. 1, 2, 6 to 8, the container body 10 is formed by injecting a molding material containing a predetermined resin into a molding die so that 25 semiconductor wafers 1 are moved up and down. It is injection-molded into a front open box type that is arranged and stored side by side, and a lid 30 of the same shape is detachably fitted to the open front portion through an endless gasket. It is detachably fitted to.

容器本体10を成形する成形材料の所定の樹脂としては、例えば力学的性質、耐熱性、寸法安定性等に優れるポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン、ポリブチレンテレフタレート等があげられる。これらの樹脂には、必要なカーボン、カーボン繊維、金属繊維、カーボンナノチューブ、帯電防止剤、難燃剤等が選択的に添加される。   Examples of the predetermined resin of the molding material for molding the container body 10 include polycarbonate, polyetherimide, polyetheretherketone, polybutylene terephthalate and the like which are excellent in mechanical properties, heat resistance, dimensional stability, and the like. Necessary carbon, carbon fiber, metal fiber, carbon nanotube, antistatic agent, flame retardant and the like are selectively added to these resins.

容器本体10の内部背面の略中央には図7や図8に示すように、半導体ウェーハ1の周縁部後端に弾接する複数の板バネ12が棒形の取付片13を介し上下方向に並べて装着され、この可撓性を有する複数の板バネ12が半導体ウェーハ1の容器本体10との直接接触に伴う欠けや割れ等の不具合を防止するよう機能する。   As shown in FIG. 7 and FIG. 8, a plurality of leaf springs 12 elastically contacting the rear end of the peripheral edge of the semiconductor wafer 1 are arranged in the vertical direction through rod-shaped attachment pieces 13 at the center of the inner back surface of the container body 10. The plurality of flexible leaf springs 12 that are mounted function to prevent problems such as chipping and cracking due to direct contact of the semiconductor wafer 1 with the container body 10.

各板バネ12は、上下方向に指向する取付片13から水平方向に伸びる細長い線条に形成され、先端部には半導体ウェーハ1の周縁部後端を保持する保持部14が一体形成されており、容器本体10に蓋体30が嵌合される場合には、撓んで容器本体10の内部背面に接触するとともに、容器本体10から蓋体30が取り外される場合には、元の状態に復帰して半導体ウェーハ1を容器本体10の正面部前方に弾圧付勢するよう機能する。   Each leaf spring 12 is formed in an elongated line extending in the horizontal direction from the mounting piece 13 oriented in the vertical direction, and a holding portion 14 that holds the rear end of the peripheral edge of the semiconductor wafer 1 is integrally formed at the front end portion. When the lid body 30 is fitted to the container body 10, it bends and contacts the inner back surface of the container body 10, and when the lid body 30 is removed from the container body 10, it returns to the original state. Thus, the semiconductor wafer 1 functions to be elastically biased forward of the front portion of the container body 10.

容器本体10の内部、具体的には相対向する内部両側には図7ないし図9に示すように、半導体ウェーハ1の周縁部側方に下方向から対向する一対の支持片15が水平に対設され、この一対の支持片15が容器本体10の上下方向に間隔をおいて複数配列される。各支持片15は、同図に示すように、内側が平面略半円弧形に湾曲した平坦な板形に形成され、内側の前後部に平面半円形あるいは半楕円形等の切り欠き16がそれぞれ切り欠き形成される。   As shown in FIG. 7 to FIG. 9, a pair of support pieces 15 facing from the lower side to the side of the peripheral edge of the semiconductor wafer 1 are horizontally opposed to the inside of the container body 10, specifically, the opposite inner sides. A plurality of the pair of support pieces 15 are arranged at intervals in the vertical direction of the container body 10. As shown in the figure, each support piece 15 is formed in a flat plate shape whose inside is curved in a substantially semicircular arc shape, and a notch 16 such as a plane semicircular shape or a semi-elliptical shape is formed in the front and rear portions inside. Each is notched.

各切り欠き16には、半導体ウェーハ1裏面の周縁部2を除く内側領域3に下方から点接触する支持ピン17が所定の方法、例えば超音波融着法やカシメ等の方法により後から一体化される。各支持ピン17は、図9に示すように、例えばポリエーテルエーテルケトン等からなる成形材料を用い、上部が丸まった短いピン形や断面略茸形に成形されており、半導体ウェーハ1裏面の内側領域3に上部が点接触して半導体ウェーハ1を水平に支持するよう機能する。   In each notch 16, support pins 17 that make point contact from below on the inner region 3 excluding the peripheral edge 2 on the back surface of the semiconductor wafer 1 are integrated later by a predetermined method, for example, an ultrasonic fusion method or a caulking method. Is done. As shown in FIG. 9, each support pin 17 is formed of a molding material made of, for example, polyether ether ketone, and is formed into a short pin shape with a rounded upper portion or a substantially bowl-shaped cross section. The upper part of the region 3 makes point contact and functions to support the semiconductor wafer 1 horizontally.

容器本体10の内部両側の後方には図7に示すように、支持片15の後方に位置する半導体ウェーハ1用の突き当て壁18がそれぞれ一体成形され、各突き当て壁18の平面視で先細りの先端部が半導体ウェーハ1の周縁部側方に接触する接触部19に形成される。この接触部19には、半導体ウェーハ1の周縁部側方を支持する複数の凹凸21が間隔をおいて上下方向に配列形成され、この複数の凹凸21が半導体ウェーハ1の撓みにかかわらず、半導体ウェーハ1の周縁部側方を摩擦力により確実に保持したり、半導体ウェーハ1の上下方向へのがたつきを有効に規制する。   As shown in FIG. 7, the abutting walls 18 for the semiconductor wafer 1 located behind the support pieces 15 are integrally formed on the rear sides of both sides of the container main body 10, and taper in a plan view of each abutting wall 18. Is formed at the contact portion 19 that contacts the side of the peripheral edge of the semiconductor wafer 1. In the contact portion 19, a plurality of projections and depressions 21 that support the side of the peripheral edge of the semiconductor wafer 1 are arranged in an up-down direction at intervals, and the plurality of projections and depressions 21 are formed on the semiconductor regardless of the bending of the semiconductor wafer 1. The side edge of the wafer 1 is securely held by frictional force, and the rattling of the semiconductor wafer 1 in the vertical direction is effectively regulated.

複数の凹凸21は、図10に示すように、複数の凹部22と凸部23とが交互に配列され、これら22・23が例えば縦一列、矩形配列、千鳥形等に並設されており、半導体ウェーハ1の周縁部側方に嵌挿されたり、圧接されたり、挟持するよう機能する。凹部22を上下から挟む凸部23は、ブロック形、円錐台形、角錐台形、半球形、半楕球形等に形成され、0.05〜0.3mm程度の大きさとされる。   As shown in FIG. 10, a plurality of concave and convex portions 22 and convex portions 23 are alternately arranged in the plurality of concave and convex portions 21, and these 22 and 23 are arranged in parallel in, for example, a vertical row, a rectangular array, a staggered shape, The semiconductor wafer 1 functions to be inserted into, pressed against, or sandwiched at the side of the peripheral edge of the semiconductor wafer 1. The convex portion 23 sandwiching the concave portion 22 from above and below is formed in a block shape, a truncated cone shape, a truncated pyramid shape, a hemispherical shape, a semi-elliptical spherical shape, and has a size of about 0.05 to 0.3 mm.

容器本体10の底面には、断面略V字形の位置決め具24が間隔をおいて複数配設され、この複数の位置決め具24が図示しない半導体加工装置の位置決めピンに上方から嵌合して容器本体10を位置決めする。   A plurality of positioning tools 24 having a substantially V-shaped cross section are disposed on the bottom surface of the container body 10 at intervals, and the plurality of positioning tools 24 are fitted from above to positioning pins of a semiconductor processing apparatus (not shown). 10 is positioned.

蓋体30は、図1、図2、図6に示すように、容器本体10の開口した正面部に着脱自在に嵌合される筐体31と、この筐体31の開口した表面を覆う表面プレート32とを備え、筐体31の中央部には、収納された半導体ウェーハ1の周縁部前端を接触保持するフロントリテーナ33が設けられる。筐体31の周縁部あるいは裏面周縁部には、容器本体10の正面部内に圧接する弾性変形可能なガスケットが嵌合される。   As shown in FIGS. 1, 2, and 6, the lid 30 includes a housing 31 that is detachably fitted to the opened front portion of the container body 10, and a surface that covers the opened surface of the housing 31. A front retainer 33 is provided in the central portion of the housing 31 to contact and hold the front end of the peripheral edge of the stored semiconductor wafer 1. An elastically deformable gasket that is pressed into the front portion of the container main body 10 is fitted to the peripheral portion or the rear peripheral portion of the casing 31.

上記構成によれば、複数の支持ピン17に支持された半導体ウェーハ1の周縁部側方を凹凸21が摩擦力によりさらに支持するので、いずれかの箇所に半導体ウェーハ1が絶えず支持されることとなり、例え半導体ウェーハ1が上下方向に大きく不規則に撓んだとしても、半導体ウェーハ1を確実に支持することができる。また、容器本体10から蓋体30が取り外されると、板バネ12が半導体ウェーハ1を容器本体10の正面部前方に突き出すので、凹凸21に半導体ウェーハ1の周縁部2が係止されたままの状態が継続することがなく、ロボットにより半導体ウェーハ1を支障なく取り出すことができる。   According to the above configuration, the unevenness 21 further supports the peripheral side of the semiconductor wafer 1 supported by the plurality of support pins 17 by frictional force, so that the semiconductor wafer 1 is continuously supported at any location. Even if the semiconductor wafer 1 bends irregularly greatly in the vertical direction, the semiconductor wafer 1 can be reliably supported. Further, when the lid 30 is removed from the container body 10, the leaf spring 12 protrudes the semiconductor wafer 1 in front of the front portion of the container body 10, so that the peripheral edge 2 of the semiconductor wafer 1 remains locked to the unevenness 21. The state does not continue, and the semiconductor wafer 1 can be taken out by the robot without any trouble.

また、支持片15に支持ピン17が一体化されるので、半導体ウェーハ1裏面の内側領域3に複数の支持ピン17を適切に接触させることができ、φ450mm用の基板収納容器の規格化・標準化の要件を満たすことができる。また、支持片15と支持ピン17とが一体成形されるのではなく、成形後の支持片15に支持ピン17が後から設けられるので、容器本体10と支持片15の成形の自由度が向上し、これらの一体成形に何ら支障を来たすことがない。   In addition, since the support pins 17 are integrated with the support piece 15, the plurality of support pins 17 can be appropriately brought into contact with the inner region 3 on the back surface of the semiconductor wafer 1, and the standardization / standardization of the substrate storage container for φ450 mm is possible. Can meet the requirements. Further, since the support piece 15 and the support pin 17 are not integrally molded, but the support pin 17 is provided on the molded support piece 15 later, the degree of freedom in molding the container body 10 and the support piece 15 is improved. However, there is no hindrance to these integral moldings.

また、支持ピン17の後付けにより、支持ピン17の材料選定の自由度が著しく高まり、しかも、支持ピン17の高さを個別、かつ容易に調整してロボットの作業を円滑化することが可能になる。さらに、左右の支持片15の後方に突き当て壁18がそれぞれ位置するので、簡易な構成で半導体ウェーハ1の前後方向へのがたつきや位置ずれを抑制防止することが可能になる。   Further, the retrofit of the support pins 17 greatly increases the degree of freedom in selecting the material of the support pins 17, and the height of the support pins 17 can be adjusted individually and easily to facilitate the work of the robot. Become. Furthermore, since the abutting walls 18 are respectively positioned behind the left and right support pieces 15, it is possible to suppress and prevent rattling and displacement in the front-rear direction of the semiconductor wafer 1 with a simple configuration.

なお、上記実施形態ではφ450mmの半導体ウェーハ1を示したが、何らこれに限定されるものではない。例えば、φ450mmを超える大きさの半導体ウェーハ1でも良い。また、容器本体10の天井には、搬送用の複数の螺子孔を穿孔したり、搬送用のフランジを着脱自在に取り付けても良い。また、内側が平面略半円弧形の支持片15を示したが、支持片15を平面視で略雲形定規形等に形成しても良い。   Although the semiconductor wafer 1 having a diameter of 450 mm is shown in the above embodiment, the present invention is not limited to this. For example, the semiconductor wafer 1 having a size exceeding φ450 mm may be used. Further, a plurality of screw holes for conveyance may be drilled in the ceiling of the container body 10 or a flange for conveyance may be detachably attached. In addition, although the support piece 15 having a substantially semicircular arc shape on the inside is shown, the support piece 15 may be formed in a substantially cloud-shaped ruler shape or the like in plan view.

また、容器本体10の内部背面の両側に、半導体ウェーハ1用の突き当て壁18をそれぞれ設けてその半導体ウェーハ1に接触する接触部19を接触領域20とし、この接触領域20に、半導体ウェーハ1の周縁部2を保持する複数の凹凸21を形成することもできる。また、必要に応じ、突き当て壁18の接触部19以外を接触領域20とすることもできる。さらに、蓋体30には、容器本体10に嵌合した蓋体30を施錠する外部操作可能な施錠機構を内蔵することもできる。   Further, abutting walls 18 for the semiconductor wafer 1 are provided on both sides of the inner back surface of the container main body 10, and contact portions 19 that come into contact with the semiconductor wafer 1 are defined as contact regions 20. It is also possible to form a plurality of concaves and convexes 21 that hold the peripheral edge 2. Further, if necessary, the contact area 20 other than the contact portion 19 of the abutting wall 18 can be used. Further, the lid body 30 can incorporate an externally operable locking mechanism for locking the lid body 30 fitted to the container body 10.

本発明に係る基板収納容器の実施形態を模式的に示す全体斜視説明図である。It is a whole perspective explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態を模式的に示す正面説明図である。It is front explanatory drawing which shows typically embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態を模式的に示す側面説明図である。It is side explanatory drawing which shows typically embodiment of the board | substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態を模式的に示す背面説明図である。It is back explanatory drawing which shows typically embodiment of the board | substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態を模式的に示す底面説明図である。It is bottom explanatory drawing which shows typically embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態を模式的に示す断面説明図である。It is a section explanatory view showing typically an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態における容器本体を模式的に示す断面平面図である。It is a section top view showing typically a container main part in an embodiment of a substrate storage container concerning the present invention. 本発明に係る基板収納容器の実施形態における容器本体を模式的に示す正面説明図である。It is front explanatory drawing which shows typically the container main body in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態における半導体ウェーハと支持ピンとの関係を模式的に示す説明図である。It is explanatory drawing which shows typically the relationship between the semiconductor wafer and support pin in embodiment of the substrate storage container which concerns on this invention. 本発明に係る基板収納容器の実施形態における半導体ウェーハと凹凸との関係を模式的に示す要部拡大説明図である。It is principal part expansion explanatory drawing which shows typically the relationship between the semiconductor wafer and unevenness | corrugation in embodiment of the substrate storage container which concerns on this invention.

符号の説明Explanation of symbols

1 半導体ウェーハ
2 周縁部
3 内側領域
10 容器本体
12 板バネ(弾性片)
15 支持片
16 切り欠き
17 支持ピン
18 突き当て壁
19 接触部
20 接触領域
21 凹凸
22 凹部
23 凸部
30 蓋体
33 フロントリテーナ
DESCRIPTION OF SYMBOLS 1 Semiconductor wafer 2 Peripheral part 3 Inner area | region 10 Container main body 12 Leaf spring (elastic piece)
15 support piece 16 notch 17 support pin 18 abutting wall 19 contact part 20 contact region 21 uneven part 22 concave part 23 convex part 30 lid 33 front retainer

Claims (3)

直径が450mm以上の半導体ウェーハを収納する容器本体を正面部の開口したフロントオープンボックスに構成した基板収納容器であって、
容器本体の内部における半導体ウェーハの周縁部と接触する接触領域に、半導体ウェーハの周縁部を保持する複数の凹凸を並べて形成したことを特徴とする基板収納容器。
A substrate storage container in which a container main body for storing a semiconductor wafer having a diameter of 450 mm or more is configured as a front open box having an opening in a front portion,
A substrate storage container characterized in that a plurality of projections and depressions for holding a peripheral edge of a semiconductor wafer are arranged side by side in a contact region in contact with the peripheral edge of the semiconductor wafer inside the container main body.
容器本体の内部背面に、半導体ウェーハの周縁部後端に接触する弾性片を取り付け、この弾性片により、半導体ウェーハを容器本体の正面部方向に付勢するようにした請求項1記載の基板収納容器。   The substrate storage according to claim 1, wherein an elastic piece contacting the rear end of the peripheral edge of the semiconductor wafer is attached to the inner back surface of the container body, and the semiconductor wafer is biased toward the front portion of the container body by the elastic piece. container. 容器本体の内部両側に、半導体ウェーハ用の支持片をそれぞれ設けて各支持片には切り欠きを形成し、この切り欠きに、半導体ウェーハの裏面の周縁部を除く内側領域に接触する支持ピンを後付けし、
容器本体の内部両側の後方に、支持片の後方に位置する半導体ウェーハ用の突き当て壁をそれぞれ設けてその半導体ウェーハに接触する接触部を接触領域とした請求項1又は2記載の基板収納容器。
Semiconductor wafer support pieces are provided on both sides of the inside of the container body, and notches are formed in each support piece, and support pins that are in contact with the inner region excluding the peripheral edge of the back surface of the semiconductor wafer are formed in the notches. Retrofit,
3. A substrate storage container according to claim 1 or 2, wherein an abutting wall for a semiconductor wafer located behind the support piece is provided behind both sides of the inside of the container body, and a contact portion that contacts the semiconductor wafer is used as a contact area. .
JP2008131724A 2008-05-20 2008-05-20 Substrate-ousing container Pending JP2009283537A (en)

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WO2013183138A1 (en) * 2012-06-07 2013-12-12 ミライアル株式会社 Substrate housing container provided with impact absorbing function

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JPWO2013183138A1 (en) * 2012-06-07 2016-01-21 ミライアル株式会社 Substrate storage container with shock absorption function

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