JP2009242601A - 有機el用インクの製造方法、及び、有機el用インク、並びに、有機el素子 - Google Patents
有機el用インクの製造方法、及び、有機el用インク、並びに、有機el素子 Download PDFInfo
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- JP2009242601A JP2009242601A JP2008091085A JP2008091085A JP2009242601A JP 2009242601 A JP2009242601 A JP 2009242601A JP 2008091085 A JP2008091085 A JP 2008091085A JP 2008091085 A JP2008091085 A JP 2008091085A JP 2009242601 A JP2009242601 A JP 2009242601A
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- organic
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- organic polymer
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- 238000004519 manufacturing process Methods 0.000 title description 14
- 239000002904 solvent Substances 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims abstract description 20
- 239000010410 layer Substances 0.000 claims abstract description 17
- 239000002861 polymer material Substances 0.000 claims abstract description 17
- 229920000620 organic polymer Polymers 0.000 claims abstract description 16
- 238000000149 argon plasma sintering Methods 0.000 claims abstract description 4
- 239000012044 organic layer Substances 0.000 claims abstract description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 12
- UALKQROXOHJHFG-UHFFFAOYSA-N 1-ethoxy-3-methylbenzene Chemical compound CCOC1=CC=CC(C)=C1 UALKQROXOHJHFG-UHFFFAOYSA-N 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 3
- 239000008096 xylene Substances 0.000 claims description 3
- 238000004090 dissolution Methods 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000003204 osmotic effect Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- WCOYPFBMFKXWBM-UHFFFAOYSA-N 1-methyl-2-phenoxybenzene Chemical compound CC1=CC=CC=C1OC1=CC=CC=C1 WCOYPFBMFKXWBM-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000569 multi-angle light scattering Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Images
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- Electroluminescent Light Sources (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
【解決手段】発光層を含む複数の有機層の少なくとも一層を、有機高分子材料を溶媒に溶解して形成されるインクを塗布することで得る際に、前記溶媒は前記有機高分子材料との光散乱強度法から測定される第2ビリアル係数が1×10-3cm3・mol/g2以上であり、前記溶媒に前記有機高分子材料を溶解にインクを製造することで解決する。
【選択図】図1
Description
20 陽極
30 正孔注入層
40 中間層
50 発光層
60 電子輸送層
70 陰極
Claims (4)
- 発光層を含む複数の有機層の少なくとも一層を、有機高分子材料を溶媒に溶解して形成されるインクを塗布することで得る際に、前記溶媒は前記有機高分子材料との光散乱強度法から測定される第2ビリアル係数が1×10-3cm3・mol/g2以上であり、前記溶媒に前記有機高分子材料を溶解にインクを製造すること
を特徴とするインクの製造方法。 - 溶媒は第2ビリアル係数が1×10-3cm3・mol/g2以上の液体であり、前記溶媒に有機高分子材料を溶解してなること
を特徴とする有機EL素子用インク。 - 前記溶媒は、キシレン、メトキシトルエン、トルエンから選択される液体であることを特徴とする請求項2に記載の有機EL素子用インク。
- 請求項1記載のインクを用いて、湿式法で形成される有機EL素子。
Priority Applications (1)
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---|---|---|---|
JP2008091085A JP5082990B2 (ja) | 2008-03-31 | 2008-03-31 | インクの製造方法、及び、発光高分子インク、並びに、有機el素子 |
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JP2008091085A JP5082990B2 (ja) | 2008-03-31 | 2008-03-31 | インクの製造方法、及び、発光高分子インク、並びに、有機el素子 |
Publications (3)
Publication Number | Publication Date |
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JP2009242601A true JP2009242601A (ja) | 2009-10-22 |
JP2009242601A5 JP2009242601A5 (ja) | 2010-05-13 |
JP5082990B2 JP5082990B2 (ja) | 2012-11-28 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011219579A (ja) * | 2010-04-07 | 2011-11-04 | Lion Corp | 液晶除去用洗浄剤組成物及び液晶パネルの洗浄方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11236446A (ja) * | 1998-02-23 | 1999-08-31 | Jsr Corp | ポリオキサジアゾール誘導体及びその製造方法、並びに有機エレクトロルミネッセンス素子 |
JP2006302637A (ja) * | 2005-04-20 | 2006-11-02 | Konica Minolta Holdings Inc | 有機エレクトロルミネッセンス素子、表示装置及び照明装置 |
JP2007162008A (ja) * | 2005-11-16 | 2007-06-28 | Tokyo Institute Of Technology | 高分子化合物及び高分子発光素子 |
JP2007180463A (ja) * | 2005-12-28 | 2007-07-12 | Seiko Epson Corp | 有機半導体層用組成物、薄膜トランジスタの製造方法、アクティブマトリクス装置の製造方法、電気光学装置の製造方法および電子機器の製造方法 |
JP2007265823A (ja) * | 2006-03-29 | 2007-10-11 | Seiko Epson Corp | 有機el素子の製造方法、有機el素子、及び電子機器 |
JP2009246206A (ja) * | 2008-03-31 | 2009-10-22 | Panasonic Corp | 有機elインク組成物、およびその製造方法 |
-
2008
- 2008-03-31 JP JP2008091085A patent/JP5082990B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11236446A (ja) * | 1998-02-23 | 1999-08-31 | Jsr Corp | ポリオキサジアゾール誘導体及びその製造方法、並びに有機エレクトロルミネッセンス素子 |
JP2006302637A (ja) * | 2005-04-20 | 2006-11-02 | Konica Minolta Holdings Inc | 有機エレクトロルミネッセンス素子、表示装置及び照明装置 |
JP2007162008A (ja) * | 2005-11-16 | 2007-06-28 | Tokyo Institute Of Technology | 高分子化合物及び高分子発光素子 |
JP2007180463A (ja) * | 2005-12-28 | 2007-07-12 | Seiko Epson Corp | 有機半導体層用組成物、薄膜トランジスタの製造方法、アクティブマトリクス装置の製造方法、電気光学装置の製造方法および電子機器の製造方法 |
JP2007265823A (ja) * | 2006-03-29 | 2007-10-11 | Seiko Epson Corp | 有機el素子の製造方法、有機el素子、及び電子機器 |
JP2009246206A (ja) * | 2008-03-31 | 2009-10-22 | Panasonic Corp | 有機elインク組成物、およびその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011219579A (ja) * | 2010-04-07 | 2011-11-04 | Lion Corp | 液晶除去用洗浄剤組成物及び液晶パネルの洗浄方法 |
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