JP2009208852A - Paste application device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a paste application device capable of inhibiting deterioration of application accuracy caused by bending of a stage. <P>SOLUTION: The paste application device includes the stage 2 on which an application object K is placed, an application head for applying a paste to the application object K on the stage 2, a rotary mechanism 8 supporting and rotating the stage 2 in a plane and a plurality of bending prevention member 9 supporting a peripheral portion of the stage 2 while allowing rotation of the stage 2 by the rotary mechanism 8. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a paste application device that applies a paste to an object to be applied.

  Paste applicators are used to manufacture various devices such as liquid crystal display panels. This paste coating apparatus includes a stage (mounting table) on which a coating target is placed and a coating head that applies paste to the coating target on the stage, and the coating target is moved while moving the coating head. A paste is applied to the object, and a predetermined paste pattern is formed on the object to be applied (see, for example, Patent Document 1). In particular, in the manufacture of a liquid crystal display panel, since two substrates are bonded together, the paste application device has a sealing property such as a sealing agent and the like so as to surround the display area of the liquid crystal display panel with respect to the substrate that is the application target. An adhesive paste is applied.

Among paste application apparatuses, a paste application apparatus has been developed in which a stage is formed to be rotatable in a horizontal plane by a rotation mechanism. The rotation mechanism includes a plurality of R guides that support the stage and guide the rotation direction. These R guides are arranged on a circumference centered on the center of the stage, and support the stage so as to be rotatable along the plane direction. This rotatable stage has become larger with the recent increase in the size of liquid crystal display panels.
JP-A-9-323056

  However, even when the stage (mounting table) is enlarged with an increase in the size of the liquid crystal display panel, the stage is supported by only a plurality of R guides. In particular, the four corners of the stage are bent downward. For this reason, the application | coating precision with respect to the application | coating target object on a stage will fall.

  This invention is made | formed in view of the above, The objective is to provide the paste coating device which can suppress the fall of the coating precision resulting from the bending of a mounting base.

  In the paste application apparatus, the feature according to the embodiment of the present invention is to support a mounting table on which an application target is placed, an application head that applies paste to the application target on the mounting table, and the mounting table. A rotation mechanism that rotates in a plane, and a plurality of deflection preventing members that support the peripheral edge of the mounting table so that the mounting table can be rotated by the rotating mechanism.

  ADVANTAGE OF THE INVENTION According to this invention, the paste application | coating apparatus which can suppress the fall of the application | coating precision resulting from the bending of a mounting base can be provided.

  An embodiment of the present invention will be described with reference to the drawings.

  As shown in FIG. 1, the paste coating apparatus 1 according to the embodiment of the present invention is such that the substrate K as a coating object is in a horizontal state (the surface on which the paste of the substrate K is applied is the X-axis direction shown in FIG. The first coating head 3A for coating a substrate stage 2 placed in a state along the Y-axis direction orthogonal thereto and a paste having sealing properties and adhesive properties such as a sealing agent on the substrate K on the substrate stage 2 respectively. A second coating head 3B, an X-axis moving mechanism 4 that supports the first coating head 3A and the second coating head 3B so as to be movable in the X-axis direction, and moves the X-axis direction along the X-axis direction. A supporting member 5 that supports the moving mechanism 4, a pair of Y-axis moving mechanisms 6A and 6B that support the supporting member 5 so as to be movable in the Y-axis direction and move along the Y-axis direction, and these parts are mounted. The gantry 7 is provided.

  The substrate stage 2 is a mounting table provided on the upper surface of the gantry 7 via a rotation mechanism 8 and a plurality of deflection preventing members 9 (see FIGS. 2 and 3). The substrate stage 2 includes an adsorption mechanism (not shown) that adsorbs the substrate K, and the substrate K is fixed and held on the upper mounting surface by the adsorption mechanism. For example, an air adsorption mechanism is used as the adsorption mechanism. A substrate K such as a glass substrate is placed on the placement surface of the substrate stage 2.

  2 and 3, the rotation mechanism 8 supports the substrate stage 2, and uses the center of the substrate stage 2 as the rotation center T as a horizontal plane (the Y axis perpendicular to the X-axis direction shown in FIGS. 2 and 3). It is a mechanism that rotates within a plane along the axial direction. The rotation mechanism 8 is constituted by a plurality of guide members 8a such as an R guide for guiding the substrate stage 2 in the rotation direction (θ direction shown in FIG. 2). These guide members 8a are positioned below the substrate stage 2 so as to support the substrate stage 2, and are provided on the upper surface of the gantry 7, and further, two circles centered on the rotation center T (an inner circle C1 and an outer circle C2). Are arranged on the circumference of each. Each guide member 8a includes a guide rail 8a1 having an arcuate curvature and a plurality of blocks 8a2 respectively provided on the guide rail 8a1 so as to be movable along the guide rail 8a1. The substrate stage 2 is fixed and placed on each block 8a2 of the guide member 8a. Such a rotation mechanism 8 rotates the substrate stage 2 in the θ direction along each guide member 8a by a drive source (not shown) such as a drive motor.

  Each deflection preventing member 9 is a member that supports the peripheral portion of the substrate stage 2 so that the rotation mechanism 8 can rotate the substrate stage 2. These deflection preventing members 9 are provided on the upper surface of the gantry 7 so as to support a plurality of corner portions, for example, four corners, of the substrate stage 2 as peripheral portions. In particular, each deflection preventing member 9 is disposed so as to support a region from the peripheral edge of the substrate stage 2 to each guide member 8a (each guide member 8a located on the circumference of the outer circle C2). ing.

  As shown in FIG. 4, the deflection preventing member 9 includes a cross roller bearing 9 a attached to the lower surface of the substrate stage 2, an X axis direction along the plane direction of the cross roller bearing 9 a and an X axis direction along the plane direction. And a roller ring moving mechanism 9b for moving in the Y-axis direction orthogonal to. With this structure, when the substrate stage 2 rotates in the θ direction, the deflection preventing member 9 that supports the substrate stage 2 does not prevent the substrate stage 2 from rotating in the θ direction. Can rotate smoothly.

  The cross roller bearing 9a has an inner ring 9a1 on the inner side and an outer ring 9a2 provided on the outer periphery of the inner ring 9a1 so as to be rotatable with respect to the inner ring 9a1. The inner ring 9a1 is fixed to the roller ring moving mechanism 9b by a fixing member N1 such as a screw. The outer ring 9a2 is fixed to the substrate stage 2 by a fixing member N2 such as a screw.

  The roller ring moving mechanism 9b includes a first moving mechanism 9b1 that moves the cross roller bearing 9a in the Y-axis direction and a second moving mechanism 9b2 that moves the first moving mechanism 9b1 in the X-axis direction. In this case, the Y-axis direction is the first direction, and the X-axis direction is the second direction. The second moving mechanism 9b2 is provided on the upper surface of the gantry 7, the first moving mechanism 9b1 is provided on the second moving mechanism 9b2, and the cross roller bearing 9a is provided on the first moving mechanism 9b1. ing. The first moving mechanism 9b1 includes a rail R1 that extends linearly in the Y-axis direction, and a block B1 that is provided on the rail R1 so as to be movable along the rail R1. The inner ring 9a1 of the cross roller bearing 9a is fixed to the block B1. The second moving mechanism 9b2 includes a rail R2 extending linearly in the X-axis direction, and a block B2 provided on the rail R2 so as to be movable along the rail R2. The rail R1 of the first moving mechanism 9b1 is fixed to the block B2.

  In addition, in the deflection preventing member 9 (for example, the left deflection preventing member 9 shown in FIG. 3) adjacent to the deflection preventing member 9 shown in FIG. 4 (the right deflection preventing member 9 shown in FIG. 3), the roller ring moving mechanism 9b. As shown in FIG. 3, the first moving mechanism 9b1 that moves the cross roller bearing 9a in the X-axis direction and the second moving mechanism 9b2 that moves the first moving mechanism 9b1 in the Y-axis direction are configured. Yes. In this case, the X-axis direction is the first direction, and the Y-axis direction is the second direction. Thus, in the adjacent bending prevention member 9, the direction in which the first moving mechanism 9b1 moves the cross roller bearing 9a is different, and further, the direction in which the second moving mechanism 9b2 moves the first moving mechanism 9b1 is different. ing. With this structure, each deflection preventing member 9 is reliably prevented from obstructing the rotation of the substrate stage 2 in the θ direction, so that the substrate stage 2 can rotate smoothly and stably in the θ direction.

  Returning to FIG. 1, the first coating head 3 </ b> A and the second coating head 3 </ b> B each have a storage cylinder 3 a such as a syringe that stores the paste, and a nozzle 3 b that communicates with the storage cylinder 3 a and discharges the paste. Yes. The first coating head 3A and the second coating head 3B are connected to a gas supply unit (both not shown) via a gas supply tube or the like. The first coating head 3 </ b> A and the second coating head 3 </ b> B respectively discharge the paste inside the nozzle 3 b with the gas supplied into the housing cylinder 3 a. As the paste, a paste having a sealing property and an adhesive property is used. However, the paste is not limited to this. For example, a paste having either a sealing property or an adhesive property or a paste having other properties is used. You may make it use.

  Such a first coating head 3A is provided in the X-axis moving mechanism 4 via the first Z-axis moving mechanism 10A. Similarly, the second coating head 3B is also provided in the X-axis movement mechanism 4 via the second Z-axis movement mechanism 10B. The first Z-axis moving mechanism 10A is a moving mechanism that supports the first coating head 3A and moves it in the Z-axis direction orthogonal to the horizontal plane. Similarly, the second Z-axis moving mechanism 10B is also a moving mechanism that supports the second coating head 3B and moves it in the Z-axis direction. For example, a feed screw mechanism or the like is used as the first Z-axis moving mechanism 10A and the second Z-axis moving mechanism 10B. The first Z-axis moving mechanism 10A and the second Z-axis moving mechanism 10B are attached with imaging units 11A and 11B for imaging the alignment mark of the substrate K on the substrate stage 2, respectively. A positional shift of the substrate K with respect to the substrate stage 2 is detected by imaging by the imaging units 11A and 11B. For example, a CCD camera or the like is used as the imaging units 11A and 11B.

  The X axis moving mechanism 4 is provided on the front surface of the support member 5. The X-axis moving mechanism 4 supports the first coating head 3A and the second coating head 3B so as to be movable in the X-axis direction, and supports the first coating head 3A and the second coating head 3B in the X-axis direction. That is, it is a moving mechanism that moves along the support member 5. As the X-axis moving mechanism 4, a linear motor mechanism, a feed screw mechanism, or the like is used.

  The support member 5 is a column that supports the X-axis moving mechanism 4, that is, the first coating head 3A and the second coating head 3B. The support member 5 is formed by extending in a direction crossing the moving direction, for example, a direction orthogonal to the moving direction. Further, the support member 5 is formed in a rectangular parallelepiped shape, for example, and is provided in parallel to the mounting surface of the substrate stage 2. Such a support member 5 is moved in the Y-axis direction by the pair of Y-axis moving mechanisms 6A and 6B, and positions the first coating head 3A and the second coating head 3B at positions facing the mounting surface of the substrate stage 2. .

  The pair of Y-axis moving mechanisms 6A and 6B are respectively provided on the upper surface of the gantry 7 so as to sandwich the substrate stage 2 from both sides. These Y-axis moving mechanisms 6A and 6B are moving mechanisms that support both ends of the extending direction so that the supporting member 5 can move in the Y-axis direction and move the supporting member 5 in the Y-axis direction. These Y-axis moving mechanisms 6A and 6B are provided with a support member 5 spanning them. For example, a linear motor mechanism or a feed screw mechanism is used as the pair of Y-axis moving mechanisms 6A and 6B.

  The gantry 7 is a gantry that is installed on the floor and supports the substrate stage 2 and the pair of Y-axis moving mechanisms 6A and 6B at a predetermined height position from the floor. The upper surface of the gantry 7 is formed in a flat shape, and a pair of Y-axis moving mechanisms 6A and 6B are placed on the upper surface of the gantry 7, and the substrate stage 2 is provided with the rotation mechanism 8 and each deflection preventing member. 9 is placed. In such a gantry 7, a control unit (not shown) for controlling each unit is provided. This control unit includes a microcomputer that centrally controls each unit, and a storage unit that stores application information regarding paste application, various programs, and the like. The application information includes information on a predetermined application pattern, discharge pressure, movement speed (drawing speed), and the like.

  Next, the application | coating operation | movement which the above-mentioned paste application | coating apparatus 1 performs is demonstrated.

  First, the substrate K is placed on the substrate stage 2 by a transfer device such as robot handling. At this time, the substrate K is usually placed on the substrate stage 2 at a certain angle in the θ direction with respect to the Y-axis direction. In this case, the Y-axis direction in which the paste on the substrate K is applied is not parallel to the Y-axis direction in which the first application head 3A and the second application head 3B move. Therefore, the paste coating apparatus 1 adjusts the position of the substrate K by rotating the substrate stage 2 by a predetermined angle in the θ direction by the rotation mechanism 8. Thereby, the Y-axis direction in which the paste on the substrate K is applied is parallel to the Y-axis direction in which the first application head 3A and the second application head 3B move. In this position adjustment of the substrate K, the positional deviation of the substrate K relative to the substrate stage 2 is detected by imaging by the imaging units 11A and 11B, and the rotation amount of the substrate stage 2 is obtained based on the positional deviation amount.

  Next, the paste coating apparatus 1 moves the support member 5 in the Y-axis direction by the pair of Y-axis moving mechanisms 6A and 6B, and moves the first coating head 3A and the second coating head 3B by the X-axis moving mechanism 4 in the X-axis direction. The first coating head 3A and the second coating head 3B are opposed to the respective coating start positions of the substrate K on the substrate stage 2. Further, the paste application apparatus 1 moves the first application head 3A and the second application head 3B in the Z-axis direction by the first Z-axis movement mechanism 10A and the second Z-axis movement mechanism 10B, respectively, and moves the first application position from the standby position to the application position. The coating head 3A and the second coating head 3B are positioned respectively.

  Here, the standby position and the application position are height positions with a predetermined gap from the substrate K on the substrate stage 2. The application position is a height position when the first application head 3A and the second application head 3B perform application. The gap formed between the tip of the nozzle 3b and the surface of the substrate K in each of the coating heads 3A and 3B at this time is a size necessary for coating the paste on the surface of the substrate K with a predetermined coating amount. Set to The standby position is a height position when the first coating head 3A and the second coating head 3B do not perform coating, and the gap at this time is much larger than the gap at the coating position.

  Thereafter, the paste coating apparatus 1 uses a pair of Y-axis moving mechanisms while discharging paste from the nozzles 3b of the first coating head 3A and the second coating head 3B based on coating information (discharge pressure, moving speed, etc.). The support member 5 is moved in the Y-axis direction by 6A and 6B, the first coating head 3A and the second coating head 3B are moved in the X-axis direction by the X-axis moving mechanism 4, and the surface of the substrate K on the substrate stage 2 is moved. A paste is applied to form a predetermined paste pattern. Here, the paste patterns (application patterns) formed by the first application head 3A and the second application head 3B are the same, for example, a rectangular frame shape. When the formation of the predetermined paste pattern is completed, the paste application apparatus 1 moves the first application head 3A and the second application head 3B in the Z-axis direction by the first Z-axis movement mechanism 10A and the second Z-axis movement mechanism 10B, The first coating head 3A and the second coating head 3B are respectively positioned from the coating position to the original standby position. The discharge pressure is a gas pressure for discharging the paste in the first coating head 3A and the second coating head 3B from each nozzle 3b, and the moving speed is the nozzle 3b and the substrate K when the paste is applied. Relative movement speed.

  Finally, the paste coating apparatus 1 uses the pair of Y-axis moving mechanisms 6A and 6B to move the support member 5 in the Y-axis direction, that is, the first coating head 3A and the second coating head 3B are mounted on the substrate K on the substrate stage 2. Is moved to a retreat position that does not face the substrate 2 and waits for the replacement of the substrate K on the substrate stage 2. When the replacement of the substrate K is completed, the coating operation including the above-described position adjustment operation of the substrate K is repeated.

  In such a paste application device 1, a plurality of deflection preventing members 9 are provided at the corners of the four corners as the peripheral edge of the substrate stage 2. As a result, the portions of the substrate stage 2 that are not supported by the guide members 8a, that is, the four corners of the substrate stage 2, are supported by the deflection preventing members 9, respectively, so that downward deflection of the substrate stage 2 is suppressed. Yes. Therefore, it is possible to suppress a decrease in coating accuracy due to the bending of the substrate stage 2. Note that the arc-shaped guide member 8a such as an R guide needs a certain size to support the substrate stage 2 having a considerable weight and guide it in the θ direction, and the arc-shaped guide member 8a. Cannot be provided so as to support the corners of the substrate stage 2. On the other hand, the degree of freedom of installation of the deflection preventing member 9 is higher than that of the guide member 8a, and it is possible to provide the deflection preventing member 9 so as to support a corner portion which is a part of the peripheral portion of the substrate stage 2. 2 can be reliably suppressed. Further, since each deflection preventing member 9 operates so as not to prevent the rotation of the substrate stage 2 according to the rotation of the substrate stage 2, each deflection preventing member 9 does not prevent the rotation of the substrate stage 2 in the θ direction. 2 can rotate smoothly in the θ direction.

  As described above, according to the embodiment of the present invention, by providing the plurality of deflection preventing members 9 that support the peripheral portion of the substrate stage 2 so that the rotation mechanism 8 can rotate the substrate stage 2, Since the portion of the stage 2 that is not supported by each guide member 8a, that is, the peripheral portion of the substrate stage 2, is supported, it is possible to suppress the downward deflection of the substrate stage 2. Therefore, when the substrate K is placed on the substrate stage 2, the lower surface of the substrate K is easy to come into contact with the entire placement surface of the substrate stage 2, and the substrate K can be reliably adsorbed by an air adsorption mechanism or the like. Therefore, it is possible to prevent the position shift of the substrate K due to the suction failure. Further, it is possible to prevent the surface height of the substrate K from suddenly decreasing at the four corners due to the bending of the substrate stage 2. Thereby, in order to maintain the distance between the tip of the nozzle 3b and the surface of the substrate K at a set value, the paste is applied onto the substrate K while measuring the distance to the surface of the substrate K using a laser displacement meter. Even in such a case, it is prevented that the surface of the substrate K deviates from the measurement range of the laser displacement meter due to an unexpected change in the surface height of the substrate K, and between the tip of the nozzle 3b and the surface of the substrate K. Since the distance can be reliably maintained at the set value, the paste can be applied satisfactorily. Thereby, the fall of the application | coating precision resulting from the bending of the substrate stage 2 can be suppressed, and the quality of the manufactured liquid crystal display panel can be improved.

  Further, since each bending prevention member 9 supports a plurality of corner portions of the substrate stage 2 as peripheral portions, corner portions of the substrate stage 2, for example, four corners are supported, so that the substrate stage 2 is reliably bent. Can be suppressed. In particular, each deflection preventing member 9 supports a region from each guide member 8a (each guide member 8a positioned on the circumference of the outer circle C2) to the periphery of the substrate stage 2 as a peripheral portion. Therefore, the corner portions of the substrate stage 2, for example, the four corners can be reliably supported.

  In addition, each deflection preventing member 9 includes a cross roller bearing 9 a attached to the substrate stage 2, an X axis direction along the plane direction of the cross roller bearing 9 a and a Y axis perpendicular to the X axis direction along the plane direction. Since each of the deflection preventing members 9 does not hinder the rotation of the substrate stage 2 in the θ direction, the substrate stage 2 is smoothly moved in the θ direction. Can rotate. As a result, it is possible to prevent the vibration of the substrate stage 2 and the like, and it is possible to suppress a decrease in the accuracy of position adjustment of the substrate K caused by the vibration of the substrate stage 2 during rotation.

  The roller ring moving mechanism 9b includes a first moving mechanism 9b1 that moves the cross roller bearing 9a in the Y-axis direction (or X-axis direction), and the first moving mechanism 9b1 in the X-axis direction (or Y-axis direction). Since the second moving mechanism 9b2 to be moved is provided, the roller ring moving mechanism 9b can be constructed with a simple configuration. As a result, cost can be suppressed.

(Other embodiments)
The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the invention.

  For example, in the above-described embodiment, two coating heads are provided as the first coating head 3A and the second coating head 3B. However, the present invention is not limited to this. For example, four or more coating heads are provided. The number is not limited.

  In the above-described embodiment, only one support member 5 is provided. However, the present invention is not limited to this. For example, two or more support members 5 may be provided, and the number is not limited. .

  Furthermore, in the above-described embodiment, a sealing agent having sealing properties and adhesiveness is used as the paste. However, the present invention is not limited to this, and the paste does not necessarily have sealing properties and adhesiveness. You may make it use the paste which has other properties, such as a paste which has only any one of property and adhesiveness.

  In addition, in the above-described embodiment, the substrate stage 2 is fixed, and the support member 5 and the coating heads 3A and 3B are moved to apply the paste to the surface of the substrate K. However, the present invention is not limited to this. Instead, for example, the substrate stage 2 may be configured to be movable in the same direction as the movement direction (Y-axis direction) of the support member 5. In this case, when the substrate K and the coating heads 3A and 3B are relatively moved in the Y-axis direction, if the substrate stage 2 and the support member 5 are moved in directions opposite to each other, only the support member 5 is moved. Compared to the case, the moving speed of the substrate stage 2 and the support member 5 can be halved. For this reason, since the inertial force accompanying the movement of the substrate stage 2 and the support member 5 is reduced, vibrations caused by acceleration or deceleration of the substrate stage 2 and the support member 5 can be reduced. As a result, it is possible to accurately apply the shape of the corners of the paste pattern that changes the direction of application and the start and end of the paste pattern along the Y-axis direction in a desired shape. Panels can be manufactured.

1 is an external perspective view showing a schematic configuration of a paste coating apparatus according to an embodiment of the present invention. It is a top view which shows schematic structure of the rotation mechanism with which the paste application | coating apparatus shown in FIG. 1 is equipped, and a bending prevention member. It is a side view which shows schematic structure of the rotation mechanism with which the paste application | coating apparatus shown in FIG. 1 is equipped, and a bending prevention member. FIG. 4 is a sectional view taken along line AA in FIG. 3.

Explanation of symbols

1 Paste coating device 2 Mounting table (substrate stage)
3A coating head (first coating head)
3B coating head (second coating head)
DESCRIPTION OF SYMBOLS 8 Rotation mechanism 8a Guide member 9 Deflection prevention member 9a Cross roller bearing 9b Roller ring moving mechanism 9b1 First moving mechanism 9b2 Second moving mechanism K Application object (substrate)

Claims (5)

A mounting table on which the application object is mounted;
An application head for applying a paste to the application object on the mounting table;
A rotating mechanism that supports the mounting table and rotates in a plane;
A plurality of deflection preventing members that support the peripheral portion of the mounting table to enable rotation of the mounting table by the rotating mechanism;
A paste coating apparatus comprising:   The paste applying apparatus according to claim 1, wherein the plurality of deflection preventing members respectively support a plurality of corner portions of the mounting table as the peripheral portion. The rotation mechanism is a mechanism that rotates about the center of the mounting table as a rotation center, and includes a plurality of guide members that are arranged on a circumference around the rotation center and guide the mounting table in the rotation direction. And
The paste applying apparatus according to claim 1, wherein the plurality of deflection preventing members respectively support regions between the plurality of guide members and the periphery of the mounting table as the peripheral portion. The plurality of deflection preventing members are:
A cross roller bearing attached to the mounting table;
A roller ring moving mechanism for moving the cross roller bearing in a first direction along a plane direction and a second direction orthogonal to the first direction along the plane direction;
The paste coating apparatus according to claim 1, 2 or 3, wherein The roller ring moving mechanism is
A first moving mechanism for moving the cross roller bearing in the first direction;
A second moving mechanism for moving the first moving mechanism in the second direction;
The paste coating apparatus according to claim 4, further comprising:

Images