JP2009193983A - Semiconductor device and manufacturing method thereof - Google Patents
Semiconductor device and manufacturing method thereof Download PDFInfo
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- JP2009193983A JP2009193983A JP2008029917A JP2008029917A JP2009193983A JP 2009193983 A JP2009193983 A JP 2009193983A JP 2008029917 A JP2008029917 A JP 2008029917A JP 2008029917 A JP2008029917 A JP 2008029917A JP 2009193983 A JP2009193983 A JP 2009193983A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 claims abstract description 23
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000853 adhesive Substances 0.000 claims abstract description 10
- 230000001070 adhesive effect Effects 0.000 claims abstract description 10
- 238000010030 laminating Methods 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
本発明は、スタックタイプの半導体装置及びその製造方法に関する。 The present invention relates to a stack type semiconductor device and a method for manufacturing the same.
近年、携帯機器、特に携帯電話市場における小型化の要求に伴い、搭載される半導体装置に対しても小型化が要求されている。この要求を満たすために、複数のデバイスを積層し更に樹脂封止したスタックタイプの半導体装置が開発されている(例えば、特開2001−118877号及び特開2002−222913号参照)。 In recent years, with the demand for miniaturization in portable equipment, particularly in the mobile phone market, miniaturization is also demanded for semiconductor devices to be mounted. In order to satisfy this requirement, a stack type semiconductor device in which a plurality of devices are stacked and further resin-sealed has been developed (see, for example, Japanese Patent Application Laid-Open Nos. 2001-118877 and 2002-222913).
代表的なスタックタイプの半導体装置は、デバイスを支持するデバイス支持領域とデバイスの外周に形成された複数の電極と電気的に接続されるアウターリード端子とを有するフレーム基板上に複数のデバイスが積層され、各デバイスの電極とアウターリード端子とが金線によって連結され、エポキシ樹脂等でパッケージングされて構成されている。
従来のスタックタイプの半導体装置では、金線が下層デバイスのコーナーに接触して断線する恐れがあることから金線はアーチ状に湾曲して接続されており、比較的多くの金線が必要となりコスト高になるという問題がある。 In a conventional stack type semiconductor device, the gold wire is bent and connected in an arch shape because there is a risk that the gold wire contacts the corner of the lower layer device, and a relatively large number of gold wires are required. There is a problem of high costs.
また、アーチ状に湾曲した金線が樹脂でモールドされてパッケージングされるため、外径が比較的大きくなるという問題がある。 Further, since the arch-shaped curved gold wire is molded with resin and packaged, there is a problem that the outer diameter becomes relatively large.
本発明はこのような点に鑑みてなされたものであり、その目的とするところは、リード線が下層のデバイスのコーナーに接触して断線することがなく、且つ小型化可能なスタックタイプの半導体装置及びその製造方法を提供することである。 The present invention has been made in view of the above points, and an object of the present invention is to achieve a stack type semiconductor in which the lead wire does not come into contact with the corner of the underlying device and is disconnected, and can be miniaturized. An apparatus and a method for manufacturing the same are provided.
請求項1記載の発明によると、複数のアウターリード端子を有するフレーム基板上に複数のデバイスが積層されたスタックタイプの半導体装置であって、外周に形成された斜面に電極が配設されたデバイスが絶縁性接着剤を介して該フレーム基板に複数積層されており、斜面に配設された前記電極と前記アウターリード端子とがリード線で接続されていることを特徴とする半導体装置が提供される。 According to the first aspect of the present invention, there is provided a stack type semiconductor device in which a plurality of devices are stacked on a frame substrate having a plurality of outer lead terminals, wherein the electrodes are disposed on the slope formed on the outer periphery. Is laminated on the frame substrate via an insulating adhesive, and the electrode disposed on the slope and the outer lead terminal are connected by a lead wire. The
請求項2記載の発明によると、複数のアウターリード端子を有するフレーム基板上に複数のデバイスを積層するスタックタイプの半導体装置の製造方法であって、デバイスの電極が形成された半導体基板の外周に斜面を形成し、該斜面に沿ってデバイスの電極を折り曲げ、該デバイスを絶縁性接着剤を介して前記フレーム基板に複数個積層し、斜面に配設された前記電極と前記アウターリード端子とをリード線で接続する、各工程を具備したことを特徴とする半導体装置の製造方法が提供される。 According to a second aspect of the present invention, there is provided a manufacturing method of a stack type semiconductor device in which a plurality of devices are stacked on a frame substrate having a plurality of outer lead terminals, and the outer periphery of the semiconductor substrate on which the device electrodes are formed. Forming a slope, bending the electrode of the device along the slope, laminating a plurality of the devices on the frame substrate via an insulating adhesive, and connecting the electrode disposed on the slope and the outer lead terminal Provided is a method of manufacturing a semiconductor device characterized by comprising each step of connecting with lead wires.
本発明によると、外周に形成された斜面に電極が配設されたデバイスを絶縁性接着剤を介してフレーム基板に複数積層し、斜面に配設された電極とアウターリード端子とをリード線で接続して半導体装置を構成したので、リード線が下層のデバイスのコーナーに接触して断線することがないと共に、使用するリード線を少なくできるので、コストの低減を図ることができる。 According to the present invention, a plurality of devices having electrodes disposed on the slope formed on the outer periphery are stacked on the frame substrate via the insulating adhesive, and the electrodes disposed on the slope and the outer lead terminals are connected with the lead wires. Since the semiconductor device is configured by connection, the lead wire does not come into contact with the corner of the lower-layer device, and the lead wire to be used can be reduced, so that the cost can be reduced.
以下、本発明の実施形態を図面を参照して詳細に説明する。図1(A)を参照すると、シリコン基板等の半導体基板3上に図示しない電子回路が形成され、該電子回路に接続された複数の電極4が外周部に形成された半導体デバイス2の斜視図が示されている。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Referring to FIG. 1A, a perspective view of a
本実施形態では、電極4が形成された半導体基板3の両端部(外周部)3a,3bを研削して三角柱形状に取り除き、デバイス(第1デバイス)2の両端部に図1(B)に示すように斜面6を形成する。次いで、複数の電極4を斜面6に沿って折り曲げる。
In this embodiment, both end portions (outer peripheral portions) 3a and 3b of the semiconductor substrate 3 on which the
このように構成されたデバイス2を図2に示すように複数積層する。即ち、第1デバイス2上にDAF(ダイアタッチフィルム)等の絶縁性接着剤8を介して第2デバイス10を積層し、第2デバイス10上にDAF等の絶縁性接着剤16を介して第3デバイス18を積層して、積層デバイス24を形成する。
A plurality of
第2デバイス10は、第1デバイス2と同様に外周部に形成された斜面14と、斜面14に沿って折り曲げられた複数の電極12を有しており、第3デバイス18も、外周部に形成された斜面22と、斜面22に沿って折り曲げられた複数の電極20を有している。
Similar to the
28はフレーム基板であり、デバイス支持領域30と複数のアウターリード端子32を有している。積層デバイス24をDAF等の絶縁性接着剤26を介して、矢印Aに示すようにフレーム基板28のデバイス支持領域30上に搭載する。
A
次いで、図3に示すように第1、第2、第3デバイス2,10,18の電極4,12,20をリード線34の一端にボンディング接続すると共に、リード線34の他端をアウターリード端子32にボンディング接続することにより、スタックタイプの半導体装置36が完成する。特に図示しないが、半導体装置36は次いで樹脂封止される。
Next, as shown in FIG. 3, the
スタックタイプの半導体装置36は以上詳述したように構成されているので、リード線34が下層のデバイスのコーナーに接触して断線する恐れがないと共に、各電極がデバイスの周辺部に形成された斜面に沿って折り曲げられているので、リード線を少なくすることができ、半導体装置のコストの低減を図ることができる。
Since the stack
2 デバイス(第1デバイス)
3 半導体基板
4,12,20 電極
6,14,22 斜面
8,16,26 絶縁性接着剤
10 第2デバイス
18 第3デバイス
24 積層デバイス
28 フレーム基板
30 デバイス支持領域
32 アウターリード端子
34 リード線
36 スタックタイプの半導体装置
2 devices (first device)
3
Claims (2)
外周に形成された斜面に電極が配設されたデバイスが絶縁性接着剤を介して該フレーム基板に複数積層されており、
斜面に配設された前記電極と前記アウターリード端子とがリード線で接続されていることを特徴とする半導体装置。 A stack type semiconductor device in which a plurality of devices are stacked on a frame substrate having a plurality of outer lead terminals,
A plurality of devices in which electrodes are arranged on the slope formed on the outer periphery are laminated on the frame substrate via an insulating adhesive,
A semiconductor device, wherein the electrode disposed on the slope and the outer lead terminal are connected by a lead wire.
デバイスの電極が形成された半導体基板の外周に斜面を形成し、
該斜面に沿ってデバイスの電極を折り曲げ、
該デバイスを絶縁性接着剤を介して前記フレーム基板に複数個積層し、
斜面に配設された前記電極と前記アウターリード端子とをリード線で接続する、
各工程を具備したことを特徴とする半導体装置の製造方法。 A method of manufacturing a stack type semiconductor device in which a plurality of devices are stacked on a frame substrate having a plurality of outer lead terminals,
A slope is formed on the outer periphery of the semiconductor substrate on which the device electrode is formed,
Bend the electrode of the device along the slope,
Laminating a plurality of the devices on the frame substrate via an insulating adhesive,
Connecting the electrode disposed on the slope and the outer lead terminal with a lead wire;
A method of manufacturing a semiconductor device, comprising each step.
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JP2008029917A JP2009193983A (en) | 2008-02-12 | 2008-02-12 | Semiconductor device and manufacturing method thereof |
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JP2008029917A JP2009193983A (en) | 2008-02-12 | 2008-02-12 | Semiconductor device and manufacturing method thereof |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04247632A (en) * | 1991-02-01 | 1992-09-03 | Fujitsu Ltd | Semiconductor device |
JP2001118887A (en) * | 1999-10-14 | 2001-04-27 | Resuka:Kk | Bonding strength testing device |
JP2004063804A (en) * | 2002-07-29 | 2004-02-26 | Sharp Corp | Semiconductor device, stacked type semiconductor device and manufacturing method thereof |
JP2007134486A (en) * | 2005-11-10 | 2007-05-31 | Toshiba Corp | Stacked semiconductor device and its manufacturing method |
-
2008
- 2008-02-12 JP JP2008029917A patent/JP2009193983A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04247632A (en) * | 1991-02-01 | 1992-09-03 | Fujitsu Ltd | Semiconductor device |
JP2001118887A (en) * | 1999-10-14 | 2001-04-27 | Resuka:Kk | Bonding strength testing device |
JP2004063804A (en) * | 2002-07-29 | 2004-02-26 | Sharp Corp | Semiconductor device, stacked type semiconductor device and manufacturing method thereof |
JP2007134486A (en) * | 2005-11-10 | 2007-05-31 | Toshiba Corp | Stacked semiconductor device and its manufacturing method |
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