JP2009181764A - Method for manufacturing plasma display member - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing PDP members of high light emission efficiency easily and efficiently. <P>SOLUTION: A method for manufacturing PDP members includes steps of: forming a light-transmissive wall-like structure on a substrate; applying a photosensitive paste containing organic components containing a photosensitive organic component and inorganic components to the wall-like structure, drying thereof; exposing only the top surface of the wall-like structure through a photomask, developing thereof; and thus forming a photosensitive paste pattern on the side of the wall-like structure. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a member for a plasma display.

  A plasma display panel (hereinafter referred to as “PDP”) generates plasma discharge between the anode and cathode electrodes facing each other in a discharge space provided between a front plate and a back plate, and is enclosed in the discharge space. Display is performed by irradiating a phosphor provided in the discharge space with ultraviolet rays having a very short wavelength such as 147 nm and 172 nm generated from a discharge gas such as a mixed gas of Xe-Ne. In addition, partition walls (also referred to as barriers or ribs) are provided in order to suppress the spread of the discharge to a certain area and perform display in a prescribed cell, and at the same time, ensure a uniform discharge space. As the shape of the partition wall, a stripe shape or a lattice shape having a width of about 20 to 120 μm and a height of 50 to 250 μm is generally used.

  An alternating current (AC) type PDP generally has a structure as shown in FIG. That is, the front plate 1 has a configuration in which a transparent electrode (scan electrode 3 and sustain electrode 4), a bus electrode 5, a transparent dielectric layer 6, and a MgO protective film 7 are formed on a glass substrate 2. The back plate 8 has a structure in which an address electrode 10, a dielectric layer 11, barrier ribs 12, and phosphors (a red phosphor 13, a green phosphor 14, and a blue phosphor 15) are formed on a glass substrate 9. In front plate 1, scan electrode 3 and bus electrode 5, and sustain electrode 4 and bus electrode 5 are laminated and electrically connected. By applying an alternating pulse voltage to the stacked body of the scan electrode 3 and the bus electrode 5 and the stacked body of the sustain electrode 4 and the bus electrode 5 positioned adjacent to the stacked body, discharge starts from the gap between the transparent electrodes. The surface light emission is performed while maintaining the surface discharge on the surface of the protective film. Light generated by exciting phosphors (red phosphor 13, green phosphor 14, and blue phosphor 15) formed on back plate 8 by ultraviolet rays generated by this discharge is used as display light.

  When a conventional PDP is made high-definition, there is a problem that the light emission efficiency (luminance with respect to the input power to a constant light emission area) is likely to decrease. This is because it is difficult to secure the discharge gap, the discharge area is reduced, and the like. First, the discharge space is reduced by reducing the size of the cells with higher definition, while the distance between the electrodes between adjacent cells is set to a certain value or more to prevent discharge interference with the adjacent cells. Since it cannot be made very large, it tends to be a discharge in a very small region, and since the discharge form is a surface discharge, a positive column with high generation efficiency of ultraviolet rays is not generated, and the discharge mode is restricted to a negative glow. . Therefore, since the ultraviolet ray generation efficiency is low, the light emission efficiency of display light from the phosphor tends to be low. In particular, in a high-definition PDP for high-vision applications and the like, the distance between the discharge site, the barrier ribs, and the phosphor is relatively short, and charged particles such as ions and electrons are easily diffused, thereby further narrowing the discharge region. The fact that the discharge form is a surface discharge is that the generated ultraviolet rays are also irradiated in the direction of the front plate 1 where no phosphor is formed, and most of them are not used for excitation of the phosphor and generation of display light. This also causes a decrease in luminous efficiency.

  Further, the front plate 1 is required to have a charge accumulation function at the time of selecting a display pixel and a display light transmission function. Therefore, the transparent dielectric layer 6 having a thickness of 20 to 50 μm is formed. The visible light transmittance of the transparent dielectric layer 6 is about 70 to 80%, a part of the display light is absorbed, and not all is used as a display, and a loss occurs. From the standpoint of display light transmission, the presence of transparent electrodes (scan electrodes 3 and sustain electrodes 4) made of ITO or the like present on the front plate 1 is also hindered.

  Furthermore, since the discharge region is limited to the vicinity of the transparent electrode, it has been difficult to efficiently generate ultraviolet rays. Further, the front plate 1 having the above-described configuration has many manufacturing processes, which causes a decrease in yield and an increase in cost.

As described above, the major problems of the PDP are high luminous efficiency and low cost. In order to solve this problem, a counter discharge type PDP has been proposed (Patent Document 1). In the counter discharge type PDP described in Patent Document 1, a portion corresponding to a partition is formed into a lattice-like thick film ceramic sheet, and a back plate on which a writing electrode, a partition and a phosphor are formed, and a partition and a phosphor are formed. It has a three-layer structure in which a thick film ceramic sheet is sandwiched between front plates. A sustain electrode is formed in the thick film ceramic sheet, and a counter discharge is aimed at improving luminous efficiency. However, high-definition of the thick film ceramic sheet is difficult due to the process. In addition, since the electrode gap (= discharge gap) is long, the discharge start voltage becomes high, and a higher withstand voltage IC than before is required, which increases the cost of the drive circuit, the back plate, the thick film ceramic sheet, There is a problem that accuracy is required for alignment of the front plate, resulting in a decrease in yield and an increase in cost.
On the other hand, a counter discharge type PDP having an electrode inside a partition wall of a back plate has been proposed (see Patent Document 2). The PDP described in Patent Document 2 uses an electrode formed inside the partition wall as a display electrode, for example, so that a gap between the electrodes can be made large and becomes closer to a discharge mode with a positive column. The efficiency can be increased, and as a result, the luminous efficiency of display light from the phosphor can be increased. Moreover, since it is a counter discharge between the electrodes which exist in the inside of the partition which provided the fluorescent substance on the surface, an ultraviolet-ray is efficiently utilized for excitation of a fluorescent substance. Furthermore, since there is no need to provide a dielectric layer or a transparent electrode on the front plate, there is little loss due to absorption in the front plate.
As a method for forming such a partition with a built-in electrode, Patent Document 2 describes a photolithography method using a known photosensitive electrode paste. However, in the method using a known photosensitive electrode paste, since the light transmittance of the photosensitive electrode paste coating layer is small, the film thickness that can be photocured by one exposure is reduced, and the discharge area of the counter discharge is widened. Has a problem that the coating and exposure must be repeated several times.
In order to solve this problem, Patent Documents 3 and 4 increase the thickness of the electrode layer with a built-in partition using pattern printing or a filling method. However, these methods have a problem that the number of processes is large and high definition cannot be coped with.
JP 2004-235042 A (pages 5 to 8) JP 2004-241379 A (pages 10 to 11) JP 2006-269412 A JP 2007-103359 A

  The present invention focuses on the above-mentioned problems of the prior art and provides a method for easily producing a member for PDP having high luminous efficiency.

  In order to solve the above problems, the present invention has the following configuration. That is, the present invention forms a wall-like structure having translucency on a substrate, applies a photosensitive paste containing an organic component containing a photosensitive organic component and an inorganic component between the wall-like structures, and is dried. A method for producing a display member, wherein a photosensitive paste layer is formed on a side surface of a wall-shaped structure by exposing only the upper surface of the wall-shaped structure through a photomask and then developing.

  According to the present invention, it is possible to provide a method for easily producing a PDP member having high luminous efficiency.

As a result of intensive studies on a method for producing a display member such as a PDP having high luminous efficiency at a low cost, the inventors have found that this can be achieved by the production method described below. That is, the present invention forms a wall-like structure having translucency on a substrate, applies a photosensitive paste containing an organic component containing a photosensitive organic component and an inorganic component between the wall-like structures, and is dried. It is important to form a photosensitive paste layer on the side surface of the wall-shaped structure by developing only after exposing the upper surface of the wall-shaped structure through a photomask.
FIG. 2 is a flowchart schematically showing the method for manufacturing a display member of the present invention.
Hereinafter, although the manufacturing method of the member for a display of this invention is demonstrated along the process of (a)-(d) shown in FIG. 2, this invention is not limited to this.

First, in step (a), partition walls 12 (translucent partition wall pattern) are formed on the glass substrate 2. Examples of the method for manufacturing the partition include a sand blast method, a mold transfer method, a printing method, and a photolithography method.
Next, in step (b), a photosensitive paste mainly composed of a photosensitive organic component and an inorganic component, which will be described later, is applied between the partition walls 12 and dried to form the photosensitive paste layer 16. As a method for applying the photosensitive paste, dispenser application, screen printing, or the like can be used.
Next, in step (c), only the upper surface of the partition wall 12 is exposed using an exposure negative photomask 17, and the photosensitive paste layer on the side surface of the partition wall is exposed using scattered light in the partition wall 12. Then, the photosensitive paste layer exposure part 18 is formed. As the exposure apparatus, a stepper exposure machine, a proximity exposure machine or the like can be used.
Next, in step (d), the photosensitive paste layer 16 is developed to form a partition that requires the photosensitive paste pattern 19 on the side surface of the partition 12. Development is usually performed by dipping, spraying, brushing, or the like. As the developer, an organic solvent or an alkaline aqueous solution in which an organic component in the photosensitive paste can be dissolved can be used. As the alkaline aqueous solution, sodium hydroxide, sodium carbonate, potassium hydroxide aqueous solution, aminoethanol aqueous solution or the like can be used.
The line width of the photosensitive paste pattern can be controlled by the light transmittance of the partition wall 12, the exposure amount in the step (c) and the light transmittance of the photosensitive paste layer, and the height depends on the height of the partition wall 12. Can be determined.
As the partition wall material in the step (a), a material made of a known organic component and inorganic component may be used, but the partition wall after pattern formation needs to have translucency. Here, having translucency means that at least one total light transmittance of light having wavelengths of 365 nm (i-line), 405 nm (h-line), and 436 (g-line) is 40% or more. Here, the total light transmittance of the partition wall can be obtained by preparing a coating film having the same thickness as the partition wall height using the material used for the partition wall and measuring the total light transmittance of the coating film using a spectrophotometer. . Use of an inorganic component and an organic component having a refractive index close to each other improves the straight light transmission of the partition wall, and allows a photosensitive paste pattern to be formed up to the bottom surface of the partition wall.
The photosensitive paste in the step (b) is a reaction such as photocrosslinking, photopolymerization, photodepolymerization, and photo-denaturation by irradiating the coating film after coating and drying with actinic rays. A paste whose chemical structure is changed and development with a developer becomes possible. The photosensitive paste used in the present invention includes an inorganic component and an organic component containing at least one photosensitive organic component selected from a photosensitive monomer, a photosensitive oligomer, and a photosensitive polymer as essential components. Other organic components include a polymerization initiator, an organic solvent, and if necessary, a non-photosensitive polymer component, an antioxidant, an organic dye, a sensitizer, a sensitizer, a plasticizer, a thickener, and a dispersion. Additive components such as additives and suspending agents can be used. As the inorganic component of the photosensitive paste used in the present invention, low-softening point glass, filler, metal, metal oxide and the like can be used. Here, the low softening point glass powder refers to a glass powder having a load softening temperature in the range of 400 to 600 ° C. By including a low softening point glass powder, a pattern made of an inorganic component can be formed by sintering after forming a photosensitive paste pattern. When the load softening temperature is in this range, there is no deformation of the pattern during sintering, and the meltability is also appropriate. The filler is added to improve pattern strength and firing shrinkage, and refers to inorganic particles that hardly melt and flow even at the firing temperature. Specifically, it refers to an inorganic particle that does not have a softening temperature, a melting point, or a decomposition temperature at 600 ° C. or lower and exists as a solid at 600 ° C.
When the photosensitive paste protrudes from between the barrier rib patterns to the top of the barrier rib pattern at the time of coating in the step (b), the exposure line width of the photomask for exposure 17 is narrowed to affect the influence of the photosensitive paste layer on the top. Although exposure can be performed without receiving, it is more preferable that the photosensitive paste does not protrude from the top of the partition wall in order to widen the margin of the exposure line width.

FIG. 3 is a flowchart schematically showing a method for producing a PDP member using the present invention.
Hereinafter, although the manufacturing method of the member for PDP of this invention is demonstrated along the process of (e)-(p) shown in FIG. 3, this invention is not limited to this. In the example described below, the base barrier rib paste layer is provided before the first barrier rib pattern is formed so that the electrode does not contact the substrate. However, when the electrode is provided below the barrier rib, What is necessary is just to form a 1st partition pattern directly on a glass substrate, without providing a partition paste layer.
First, in step (e), a photosensitive barrier rib paste is applied on the glass substrate 2 and dried to form a base barrier rib paste layer 20. Here, the glass substrate 2 may be composed of a single glass substrate, or in the case of a PDP substrate having a configuration as shown in FIG. 4 described later, a conductive metal such as silver on the glass substrate. Alternatively, the address electrode 10 and the dielectric layer 11 mainly composed of low dielectric glass may be formed. When the address electrode and the dielectric layer are formed by baking using a paste composed of an organic component and an inorganic component, the address electrode 10 and the dielectric layer 11 that have been baked in advance may be formed. The precursor of the address electrode 10 and the precursor of the dielectric layer 11 may be provided.
The photosensitive partition paste used in the present invention contains at least one kind of photosensitive organic component selected from a low softening point glass, a photosensitive monomer, a photosensitive oligomer, and a photosensitive polymer as essential components. Other organic components include polymerization initiators, organic solvents, and if necessary, fillers, non-photosensitive polymer components, antioxidants, organic dyes, sensitizers, sensitizers, plasticizers, thickeners. Additive components such as an agent, a dispersant, and a suspending agent can be used. The photosensitive partition paste used in the present invention, particularly the photosensitive partition paste used for the base partition paste layer, is preferably an alkali-developable photosensitive partition paste layer. Here, in the case of exposure using a negative mask, the alkali developability is a neutral aqueous system having a pH of 6 to 8 but soluble in an alkaline aqueous developer having a pH of 9 to 14 in a state before exposure. On the other hand, those which have the property that they do not dissolve in the developer, but do not dissolve in any of the alkaline aqueous developer having a pH of 9 to 14 and the neutral aqueous developer having a pH of 6 to 8 after exposure. Point to. The photosensitive barrier rib paste used for the base barrier rib paste layer is an alkali-developable photosensitive barrier rib paste, and the photosensitive barrier rib paste layer used for forming the first barrier rib pattern described later is a water-developable photosensitive barrier rib paste layer. The electrodes can be provided only on the side surfaces of the first barrier rib pattern.

  As the photosensitive polymer, an alkali-soluble polymer can be preferably used. This is because, since the photosensitive polymer has alkali solubility, an alkaline aqueous solution can be used as a developing solution instead of an organic solvent having an environmental problem. As the alkali-soluble polymer, an acrylic copolymer can be preferably used. An acrylic copolymer is a copolymer containing at least an acrylic monomer as a copolymerization component.

Examples of the non-photosensitive polymer component include cellulose compounds such as methyl cellulose and ethyl cellulose, and high molecular weight polyethers. The photosensitive monomer is a compound containing a carbon-carbon unsaturated bond.
After preparing the above various components so as to have a predetermined composition, the mixture can be homogeneously mixed and dispersed with a three roller or kneader to produce a photosensitive partition paste. As a coating method, methods such as screen printing, bar coater, roll coater, die coater, and blade coater can be used. The coating thickness can be adjusted by the number of coatings, the screen plate mesh, and the paste viscosity. Drying is performed using a hot air dryer, an infrared dryer, or the like, and the drying temperature and time can be adjusted by the solvent and coating thickness of the paste used.
Next, in the step (f), the above-mentioned base partition wall paste layer 20 is exposed with an optimal exposure amount using an exposure photomask 21 to form a base partition wall paste layer exposure portion 22. The exposure may be performed by a mask exposure method using a photomask, as is performed by a general photolithography method. As the photomask to be used, either a negative type or a positive type is selected depending on the type of the photosensitive organic component. Alternatively, a method of directly drawing with a laser beam in the ultraviolet region without using a photomask may be used. As the exposure apparatus, a stepper exposure machine, a proximity exposure machine or the like can be used. The optimum exposure amount here means an exposure amount when the pattern shape becomes a rectangle or a trapezoid without peeling or meandering after development. The rectangle means the same width at the top and the bottom, and the trapezoid means that the width at the bottom is larger than the width at the top.
Next, in step (g), a photosensitive barrier rib paste is applied and dried on the underlying barrier rib paste layer 20 and the underlying barrier rib paste layer exposure part 22 to form a first barrier rib paste layer 23.
As the photosensitive barrier rib paste of the first barrier rib paste layer 23, the same one as that of the underlying barrier rib paste layer 20 can be used. However, in order to increase the dissolution contrast with the underlying barrier rib paste layer in the step (i), it will be described later. By using a binder polymer that is soluble in water, the photosensitive partition paste is water developable, that is, soluble in a neutral aqueous developer before exposure, and insoluble in a neutral aqueous developer after exposure. It is preferable to do. The neutral aqueous developer refers to water or an aqueous solution having a pH in the range of 6-8.
As the water-soluble polymer, an acrylic copolymer having an ethylenically unsaturated group and a carboxyl group at the side chain or terminal is preferably used. Such a polymer has both photocuring properties and binder properties, and an ethylenically unsaturated group is added to an acrylic copolymer formed by copolymerizing an unsaturated carboxylic acid and an ethylenically unsaturated compound. It can manufacture by adding to. Preference is given to those having an ethylenically unsaturated group and a carboxyl group in the side chain.
Although it does not specifically limit as an ethylenically unsaturated compound polymerized as a monomer component of the acrylic copolymer which can be developed with water, Unsaturated carboxylic acid and the polyhydric alcohol and ethylenic represented by the following General formula (1) It is preferable to include a compound containing a monoester with an unsaturated carboxylic acid. In order to impart water developability to the coating film of the photosensitive glass paste, the binder polymer must have a certain level of water solubility. In order to give water solubility to the binder polymer, there is a method of introducing a hydrophilic site such as polyamide or polyether into the skeleton, but the coating film of the paste containing an inorganic component using these as a binder polymer swells, but is sufficient Since water solubility is not exhibited and a development residue remains, a good pattern cannot be obtained. Therefore, it is possible to impart sufficient water solubility to the binder polymer by introducing a water-soluble substituent such as a hydroxyl group or a carboxyl group into the side chain portion instead of the skeleton of the binder polymer.

Also, if a paste containing a hydrophilic resin selected from polyether and polyester is used, the adhesion to the substrate will be high, and even in severe development environments such as spray development, pattern processing will be performed without peeling the exposed area. It is known that it can be done. Usually, in an extreme development environment in which a photosensitive coating film for water development is exposed and then spray development is performed using an alkaline developer, the exposed area is peeled off. If a photosensitive acrylic resin having a hydroxyl group is used, high development resistance can be obtained without adding an anti-peeling compound as a separate component, and exposure area peeling can be prevented even in a development environment using an alkaline developer. Is possible.
Examples of the polyhydric alcohol include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, 1,3-propanediol, glycerin, polyglycerin, 1,3-butanediol, 1,4-butanediol, , 2-propanediol, neopentyl glycol, pentaerythritol, dipentaerythritol, trimethylolpropane, ditrimethylolpropane, trimethylolethane, 1,2-pentanediol, 1,4-pentanediol, 1,5-pentanediol, Examples include 2,4-pentanediol, 1,2,6-hexanetriol, cyclohexanedimethanol and the like. Examples of the ethylenically unsaturated carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof. Therefore, an ester of a polyhydric alcohol and an ethylenically unsaturated carboxylic acid represents an esterified product formed by a combination of the above polyhydric alcohol compound and an ethylenically unsaturated carboxylic acid.
In the present invention, an unsaturated acid such as an unsaturated carboxylic acid is added as a component of the copolymer in order to introduce a carboxyl group into the side chain or terminal of the acrylic copolymer. Specific examples of the carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof.
Examples of other copolymerizable components that can be polymerized with the copolymerized component include methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, sec-butyl acrylate, isobutyl acrylate, tert-butyl acrylate, n- Pentyl acrylate, cyclohexyl acrylate, 2-ethylhexyl acrylate, allyl acrylate, butoxyethyl acrylate, dicyclopentanyl acrylate, dicyclopentenyl acrylate, glycidyl acrylate, heptadecafluorodecyl acrylate, 2-hydroxyethyl acrylate, isobonyl Acrylate, 2-hydroxypropyl acrylate, isodexyl acrylate, isooctyl acrylate, lauryl acrylate Relate, stearyl acrylate, phenoxyethyl acrylate, 2-methoxyethyl acrylate, octafluoropentyl acrylate, trifluoroethyl acrylate, acrylamide, aminoethyl acrylate, phenyl acrylate, benzyl acrylate, phenoxyethyl acrylate, 1-naphthyl acrylate, 2-naphthyl acrylate , Thiophenol acrylate, benzyl mercaptan acrylate, a monomer in which 1 to 5 of the aromatic ring hydrogen atoms are substituted with chlorine or bromine, or styrene, p-methylstyrene, o-methylstyrene, m- Methyl styrene, chlorinated styrene, brominated styrene, α-methyl styrene, chlorinated α-methyl styrene, brominated α-methyl styrene, chloromethyl Styrene, hydroxy styrene, carboxymethyl styrene, vinyl naphthalene, vinyl anthracene, vinyl carbazole, and those that were changed to methacrylate acrylate of the above compounds. In this invention, these can be used 1 type or in combination of 2 or more types.

  As a method for introducing an ethylenically unsaturated bond into a side chain, an ethylenically unsaturated compound having a glycidyl group or an isocyanate group, acrylic acid chloride, methacrylic acid with respect to a mercapto group, amino group, hydroxyl group or carboxyl group in the polymer. There is a method in which a carboxylic acid such as chloride, allyl chloride or maleic acid is reacted.

Examples of the ethylenically unsaturated compound having a glycidyl group include glycidyl (meth) acrylate, allyl glycidyl ether, glycidyl ethyl acrylate, crotonyl glycidyl ether, crotonic acid glycidyl ether, and isocrotonic acid glycidyl ether. In particular, glycidyl (meth) acrylate is preferably used.
Examples of the ethylenically unsaturated compound having an isocyanate group include (meth) acryloyl isocyanate and (meth) acryloylethyl isocyanate. Further, the ethylenically unsaturated compound having an glycidyl group or an isocyanate group, acrylic acid chloride, methacrylic acid chloride or allyl chloride is from 0.05 to the total amount of mercapto group, amino group, hydroxyl group and carboxyl group in the polymer. The reaction is preferably carried out at 1 molar equivalent, more preferably 0.1 to 0.8 molar equivalent. If the addition amount is less than 0.05 molar equivalent, the photosensitivity will be poor and pattern formation will be difficult.

  The acid value of the acrylic copolymer having an ethylenically unsaturated group and a carboxyl group at the side chain or terminal obtained by polymerizing the above components is preferably 2 to 50 mgKOH / g. More preferably, it is 5-40 mg / KOH. When the acid value exceeds 50 mgKOH / g, in the presence of glass powder containing zinc or lead, the ion crosslinking density due to the carboxyl group increases, the gelation of the paste is promoted, and the solubility of the unexposed part in the developer is increased. Causes a drop and paste pot life. On the other hand, when the acid value is 2 mgKOH / g or less, the content of the carboxyl group that affects the solubility of the unexposed area is too low, so the solubility of the unexposed area in the developing solution is remarkably lowered, and a high-definition pattern is obtained. It becomes difficult to be.

The weight average molecular weight of the acrylic copolymer having an ethylenically unsaturated group and a carboxyl group at the side chain or terminal is preferably 5000 to 20000, more preferably 8000 to 15000. When the molecular weight is less than 5,000, the photosensitive copolymer acts as a binder and weakens the development resistance, so that the exposed portion is peeled off. On the other hand, if the molecular weight is larger than 20000, the development resistance is too high, so that the solubility of the unexposed area is lowered and pattern formation becomes difficult.
Next, in step (h), the first barrier rib paste layer 23 is exposed with the optimal exposure amount using the exposure photomask 17 to form a first barrier rib paste layer exposure portion 24.
Next, in step (i), only the first barrier rib paste layer 23 is developed to form a laminated body including the underlying barrier rib paste layer 20 including the underlying barrier rib paste layer exposure part 22 and the first barrier rib pattern 25. Development is usually performed by dipping, spraying, brushing, or the like. As the developer, an organic solvent, an alkaline aqueous solution, or a neutral aqueous developer that can dissolve the organic components in the photosensitive paste can be used. As the alkaline aqueous solution, sodium hydroxide, sodium carbonate, potassium hydroxide aqueous solution, aminoethanol aqueous solution or the like can be used. However, in order to develop only the first partition paste layer 23, the base partition paste layer 20 is insoluble. For example, an alkali-developable barrier rib paste is used for the base barrier rib paste layer 20, a water-developable photosensitive barrier rib paste is used for the first barrier rib paste layer 23, and a neutral aqueous developer is used as a batch. It is good to develop.
Next, in step (j), a photosensitive electrode paste is applied between the first barrier rib patterns 25 and dried to form a photosensitive electrode paste layer 26. As a coating method, dispenser coating, screen printing, or the like can be used.
As the photosensitive electrode paste used in the present invention, known ones can be used. For example, a photosensitive organic component selected from at least one of a photosensitive monomer, a photosensitive oligomer, and a photosensitive polymer, a polymerization initiator, an organic solvent, and Conductive particles are essential components, and further, binders, UV light absorbers, sensitizers, sensitizers, polymerization inhibitors, plasticizers, thickeners, antioxidants, dispersants, organic or inorganic as necessary. Those containing additive components such as precipitation inhibitors and leveling agents, low softening point glass, and fillers can be used.
Next, in step (k), only the upper surface of the first barrier rib pattern 25 is exposed using the photomask 17 for exposure, and the first barrier rib pattern 25 is utilized using scattered light in the first barrier rib pattern 25. The photosensitive electrode paste on the side surface is exposed to form a photosensitive electrode paste layer exposure portion 27. When the photosensitive electrode paste protrudes from the first barrier rib pattern 25 and is applied to the top of the barrier rib pattern at the time of application, the light transmission applied to the top is reduced by narrowing the exposure line width of the exposure photomask 17. Can be exposed without being affected by a low photosensitive electrode paste layer.
Next, in the step (l), the photosensitive electrode paste layer 26 is developed to form a partition pattern that requires the electrode pattern 28 on the side surface of the first partition pattern 25. In the present invention, since the light transmittance of the photosensitive electrode paste layer is low, the electrode width does not become larger than a certain width due to the exposure amount in the step (k) and the increase or decrease of the line width of the first barrier rib pattern 25. It can also handle narrow partitions. Further, the height of the electrode pattern can be freely changed by changing the height of the first barrier rib pattern 25.
Next, in the step (m), the base barrier rib paste layer 20 including the base barrier rib paste layer exposure part 22 and the first barrier rib pattern 25 that requires the electrode pattern 28 on the side surface formed thereon are covered so as to cover the laminate. The second barrier rib paste layer 29 is formed by applying and drying the conductive barrier rib paste. At this time, in order to make the surface of the second partition paste layer 29 flat, it is preferable that the laminated body covered with the second partition paste layer 29 is not as uneven as possible. As the photosensitive barrier rib paste, a known photosensitive glass paste may be used as in the case of the base barrier rib paste layer 20. In consideration of shrinkage during firing, it is more preferable to use a material containing a urethane compound capable of reducing shrinkage stress. Examples of the urethane compound include compounds represented by the following general formula (1).
_{^{R 1 - (R 4 -R 3}} ) n -R 4 -R 2 (1)
(R ¹ and R ² are selected from the group consisting of a substituent containing an ethylenically unsaturated group, hydrogen, an alkyl group having 1 to 20 carbon atoms, an aryl group, an aralkyl group, and a hydroxyaralkyl group, and the same. R ³ is an alkylene oxide group or alkylene oxide oligomer, R ⁴ is an organic group containing a urethane bond, n is an integer of 1 to 10) such a urethane compound is ethylene oxide Preferably it contains units. More preferably, in the general formula (1), R ⁴ is an oligomer containing an ethylene oxide unit (hereinafter referred to as EO) and a propylene oxide unit (hereinafter referred to as PO), and the EO content in the oligomer Is within the range of 8 to 70% by mass. When the EO content is 70% by mass or less, the flexibility is further improved and the firing stress can be reduced, so that defects can be effectively suppressed. Furthermore, the thermal decomposability is improved, and the firing residue is less likely to occur in the firing step after the partition wall is formed. Moreover, compatibility with other organic components improves because EO content is 8% or more. It is also preferred that the urethane compound has a carbon-carbon double bond. When the carbon-carbon double bond of the urethane compound reacts with the carbon-carbon double bond of another crosslinking agent and is contained in the crosslinked product, polymerization shrinkage can be further suppressed.
As a coating method, a method such as screen printing, a bar coater, a roll coater, a die coater, a blade coater, or the like can be used in the same manner as the coating of the base partition paste layer 20 and the first partition paste layer 23. The coating thickness can be adjusted by the number of coatings, the screen mesh, and the paste viscosity. Drying is performed using a hot air dryer, an infrared dryer, or the like, and the drying temperature and time can be adjusted by the solvent and coating thickness of the paste used.
Next, in the step (n), the obtained laminate is collectively exposed with an optimal exposure amount using the exposure photomask 21 to form the second partition paste layer exposure part 30. Similar to the exposure of the base barrier rib paste layer 20 described above, a mask exposure method using a photomask is generally used, as is performed by a normal photolithography method.
Next, in the step (o), the base barrier rib paste layer 20 and the second barrier rib paste layer 29 are developed, and the base barrier rib pattern 31 and the first barrier rib pattern 25 that requires the electrode pattern 28 on the side surface and the second barrier ribs covering these. A laminated barrier rib pattern 33 including the barrier rib pattern 32 is formed. The development can be performed in the same manner as the development of the laminate composed of the base partition paste layer 20 and the photosensitive electrode paste layer 26 described above, but it is necessary to use a developer that dissolves the unexposed portion of the base partition paste layer 20. There is. As described above, an alkaline aqueous solution or the like is used when the base partition wall paste layer 20 alkali-developable photosensitive partition paste is used.
Next, in step (p), the laminated barrier rib pattern 33 is collectively fired in a baking furnace to form barrier ribs 34 having electrodes therein. The firing atmosphere and temperature vary depending on the type of paste and substrate, but firing is performed in an atmosphere of air, nitrogen, hydrogen, or the like. As the firing furnace, a batch-type firing furnace or a belt-type continuous firing furnace can be used.
As described above, according to the method for manufacturing a PDP member of the present invention, an electrode pattern can be formed which is high in the height direction of the partition wall cross section and narrow in the width direction. Even fine patterns can be handled.
The member for PDP produced using the present invention can be used for both the back plate and the front plate of the PDP. As an example, a preferable configuration in the case where a PDP member produced using the present invention is used as a back plate and an electrode in a partition wall is used as a display (sustain) electrode will be described below. However, the present invention is not limited to this.
FIG. 4 shows a first structural example of a member for PDP manufactured by the manufacturing method of the present invention. In FIG. 4, in order to show the internal structure of the partition, the partition is partially notched (shaded portion).
In the first structural example shown in FIG. 4, the back plate 8 is provided with a stripe-shaped address electrode 10 on a glass substrate 9, and a dielectric layer 11 is provided so as to cover the address electrode.
Further, a partition wall 12 including a main partition wall 32 substantially parallel to the address electrode 10 and an auxiliary partition wall 33 substantially orthogonal to the address electrode 10 is provided on the dielectric layer 11. It has a structure in which striped main electrodes 34 that are substantially orthogonal to each other are provided.
The PDP of the present invention is not a general surface discharge type but a counter discharge type. Therefore, the gap between the electrodes can be increased as compared with the surface discharge type, and the discharge path can be made longer. That is, the generation probability of the positive column is increased, and the ultraviolet ray generation efficiency and the light emission efficiency can be increased. In addition, most of the counter discharge type PDPs so far are counter discharges between the front plate and the back plate, and in order to increase the discharge path length (= interelectrode gap), it is necessary to form higher barrier ribs, The aspect ratio is large, and it is not realistic from the viewpoint of processing accuracy and yield. In addition, when addressing is performed by opposing discharge between the front plate and the back plate, there is a problem that the gap between the electrodes becomes too long, the address voltage becomes high, a high voltage IC is required, and the cost increases. For this reason, the gap between electrodes in the counter discharge type was about 100 to 150 μm.
The interelectrode gap in the structure of the present invention can be set to the same level as the interval between the discharge cells. For example, it is about 0.5 mm in the 42-inch VGA (640 × 480 pixels) class and about 0.3 mm in the XGA (1024 × 768 pixels) class. Therefore, the inter-electrode gap can be increased by 2 to 3 times or more as compared with the conventional counter discharge type without increasing the partition wall. In addition, the interelectrode gap is about 3 to 5 times that of the conventional surface discharge type. That is, it becomes closer to the discharge mode accompanied by the generation of the positive column, and the ultraviolet ray generation efficiency can be increased, that is, the light emission efficiency can be increased. Further, since the counter discharge is performed, the loss of ultraviolet rays to the front plate and the loss of charged particles to the barrier ribs are reduced, so that the luminous efficiency is increased from this viewpoint.
In the conventional discharge type between the front plate and the back plate, the interelectrode gap, the partition wall height, and the discharge space volume could not be changed independently. However, in the structure of the present invention, the interelectrode gap is kept constant. Since the discharge space can be widened by increasing the height of the partition wall, the degree of freedom in cell design for increasing the ultraviolet ray generation efficiency and reducing the diffusion loss of charged particles can be increased without changing the discharge start voltage.
Further, since it is not necessary to form electrodes on the front plate, the transparent dielectric layer and the transparent electrode layer are unnecessary, and the phosphor emission that has been lost by 20 to 30% can be effectively used as display light. Furthermore, since these need not be formed, the front plate production process can be greatly reduced. Further, since no bus electrode is required on the front plate, the aperture ratio of one pixel can be increased. Further, until now, most of the light emitted from the phosphor irradiated to the bus electrode has been absorbed and the display has not been used. However, since this can be used effectively, the luminance can be increased.
When the display electrode layer is a thick film of about 10 μm to 50 μm, for example, the cross-sectional shape of the display (sustain) electrode layer is preferably close to a rectangle. If the cross-sectional shape of the display (sustain) electrode layer is trapezoidal or inverted trapezoidal, the film thickness on the side surfaces of the partition walls, which are dielectric layers, varies, which is not preferable because the discharge may become unstable. Here, the inverted trapezoid means that the top width is larger than the bottom width. In the present invention, since the display (sustain) electrode can be formed in a rectangular shape, stable discharge occurs even when the film thickness is increased.
FIG. 5 shows a second structural example of the member for PDP manufactured by the manufacturing method of the present invention. In FIG. 5, in order to show the internal structure of the partition wall, the partition wall is partially cut away (shaded portion).
As shown in FIG. 5, in the PDP member of the present invention, it is preferable that the electrode has a striped main electrode and an auxiliary electrode protruding from the main electrode in a direction facing each other. Thereby, the discharge start voltage can be lowered and stable discharge can be performed. The discharge start voltage is determined by Paschen's law (V _f = f (p · d), V _f : discharge start voltage, p: discharge gas pressure, d: distance between electrodes). V _f indicates a minimum with respect to the product of p · d. When the electrodes are arranged on the surface and / or inside of the barrier ribs, the distance between the electrodes becomes longer and the discharge start voltage becomes higher than the surface discharge as described above. However, as shown in FIG. By providing the auxiliary electrode protruding in the facing direction, the discharge start voltage can be lowered. This is because by providing the auxiliary electrode, the distance can be partially reduced by the distance between the display electrodes, so that a discharge easily occurs in the gap between the auxiliary electrodes (discharge gap). Connected.
In view of the effect of reducing the discharge start voltage and the stability of the discharge, the gap between the auxiliary electrodes is preferably 50 to 800 μm. More preferably, it is 60-300 micrometers. Even more preferably, it is 70 to 150 μm. When the gap between the auxiliary electrodes is smaller than 50 μm, dielectric breakdown is likely to occur at the gap between the electrodes. Moreover, when larger than 800 micrometers, it becomes difficult to obtain the reduction effect of a discharge start voltage.
The gap between the main electrodes is preferably 100 to 1000 μm although it depends on the size of the discharge cell to be produced. More preferably, it is 150-650 micrometers. If it is smaller than 100 μm, the discharge space becomes too narrow and stable discharge cannot be performed. This is because the discharge starting voltage is too large for practical use when it is larger than 1000 μm.
FIG. 5 shows an auxiliary electrode having a simple slit structure, but one side may be tapered. That is, by providing a taper on the side of the adjacent discharge cell, erroneous discharge of the adjacent non-discharge cell (non-display cell) can be suppressed. In addition, a parallel slit shape is preferable from the viewpoint of uniformity in processing accuracy of the inter-electrode spacing.

In the case of AC type PDP, it is necessary to cover the electrode with an insulating material. However, when an auxiliary electrode is provided, the auxiliary electrode is embedded in the partition wall or formed on the surface of the partition wall in the same manner as the main electrode. Then, it is preferable to coat with an insulating material later. When the auxiliary electrode and the main electrode are arranged on the surface and / or inside of the partition wall, the partition wall shape is preferably a lattice shape or a waffle shape, not a stripe shape. A lattice-like partition wall is more preferable. This is because the auxiliary electrode may be formed inside the partition wall (main partition wall) that partitions the pixels in the horizontal direction and the main electrode may be formed inside the partition wall (auxiliary partition wall) for partitioning the pixels in the vertical direction.
A case where a PDP is manufactured using the PDP member of the present invention, for example, as a back plate will be described below. However, the present invention is not limited to this.
As the back plate and the front plate substrate of the present invention, “PD200” manufactured by Asahi Glass Co., Ltd. and “PP8” manufactured by Nippon Electric Glass Co., Ltd., which are heat resistant glass for PDP, can be used in addition to soda glass.
In the back plate, first, address electrodes are formed in stripes at a pitch of discharge cells on a glass substrate with a metal such as silver, aluminum, chromium or nickel. As a method of forming, after applying a metal paste mainly composed of these metal powder and organic binder by screen printing, or after applying a photosensitive metal paste using a photosensitive organic component as an organic binder, It is possible to use a photosensitive paste method in which pattern exposure is performed using a photomask, unnecessary portions are dissolved and removed in a development step, and further, heated and baked at 400 to 600 ° C. to form an electrode pattern. Also, after depositing a metal such as chrome or aluminum on a glass substrate, apply a resist, pattern exposure and development using a photomask, and then use an etching method to remove unnecessary portions of the metal by etching. Can do. Furthermore, a dielectric layer may be provided on the address electrode layer in order to stabilize discharge.
A partition wall in which the display electrode of the present invention is provided is formed on a glass substrate on which the address electrode is formed. The shape of the partition wall is not particularly limited. However, when the auxiliary electrode is used as shown in FIG. After the partition walls are formed, a partition wall for securing a clearance from the front side substrate may be further provided in order to improve the efficiency of evacuation after panel formation.
A phosphor is formed using a phosphor paste on a glass substrate on which a partition wall in which address electrodes and display electrodes are provided is formed. It can be formed by a photolithography method, a dispenser method, a screen printing method or the like using a photosensitive phosphor paste. The thickness of the phosphor is not particularly limited, but is 10 to 30 μm, more preferably 15 to 25 μm. The phosphor powder is not particularly limited, but the following phosphors are preferable from the viewpoint of light emission intensity, chromaticity, color balance, lifetime, and the like. Blue is an aluminate phosphor activated with divalent europium (for example, BaMgAl ₁₀ O ₁₇ : Eu) or CaMgSi ₂ O ₆ . In the case of green, Zn ₂ SiO ₄ : Mn, YBO ₃ : Tb, BaMg ₂ Al ₁₄ O ₂₄ : Eu, Mn, BaAl 1 ₂ O ₁₉ : Mn, BaMgAl ₁₄ O ₂₃ : Mn are preferable from the viewpoint of panel luminance. More preferably Zn ₂ SiO _4: is Mn. In red, (Y, Gd) BO ₃ : Eu, Y ₂ O ₃ : Eu, YPVO: Eu, and YVO ₄ : Eu are also preferable. More preferred is (Y, Gd) BO ₃ : Eu.
After forming the phosphor, a part or all of the phosphor may be covered with an insulating material. The coating method and the like are the same as those described above for the partition wall coating, but the firing temperature of the layer covering the phosphor should be 550 ° C. or less in order to minimize phosphor degradation. Is preferred. More preferably, it is 510 degrees C or less.
Next, although the front plate of the present invention is ultimately possible only with a glass substrate, a protective film (for example, MgO film) is formed on the glass substrate for the purpose of improving the sputter resistance of the glass substrate surface. Alternatively, a black stripe or a black matrix may be formed for the purpose of improving the bright room contrast. In addition, an address electrode can be formed on the front side for the purpose of improving the address voltage and margin of the display cell.
After sealing the back plate and the front plate, the space formed between the two substrates is evacuated while heating, and then sealed with a discharge gas composed of helium, neon, xenon, or the like. Stop. Xe5-10% -Ne bal. Mixed gas is preferable in terms of both discharge voltage and luminance. In order to increase the generation efficiency of ultraviolet rays, Xe may be further increased to about 30%.

Hereinafter, the present invention will be specifically described with reference to examples. However, the present invention is not limited to this.
(Method for producing photosensitive barrier rib paste)
Each component of the organic component was mixed and dissolved, and then an inorganic component was added and kneaded with three rollers to prepare a paste composed of glass fine particles and the organic component. The paste was defoamed with a centrifugal defoamer. Table 1 shows the composition of the organic components of the produced photosensitive barrier rib paste. A glass powder having a glass transition point of 495 ° C., a softening point of 530 ° C., a thermal expansion coefficient of 75 × 10 ⁻⁷ / ° C., and a density of 2.54 g / cm ³ was used. The details of the organic components in Table 1 are as follows. The photosensitive partition paste 1 is alkali developable, and the photosensitive partition paste 2 is water developable.

(Method for producing photosensitive electrode paste)
Each component of the organic component was dissolved while being heated to 50 ° C., and then conductive particles and glass fine particles were added and kneaded using a kneader. As the conductive particles, silver particles (Finesphere SVND102; manufactured by Nippon Paint Co., Ltd.) were used for the photosensitive electrode paste. Table 1 shows the composition of the organic components of the produced photosensitive electrode paste.
Polymer 1: A product obtained by adding 0.4 equivalent of glycidyl methacrylate to a carboxyl group of a styrene / methyl methacrylate / methacrylic acid copolymer. Alkali developability, weight average molecular weight 43,000, acid value 95.
Polymer 2: A photosensitive acrylic polymer obtained by addition reaction of 0.9 molar equivalent of glycidyl methacrylate to a carboxyl group of a copolymer composed of 30% acrylic acid, 40% methyl methacrylate, and 30% glycerin monoacrylate. Water developability, acid value 10 mgKOH / g, weight average molecular weight 9000.
PDP400: Propylene glycol dimethacrylate IC369: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1
TPA330: Trimethylolpropane triacrylate S20000: Solsperse 20000
γ-BL: gamma butyrolactone (preparation of base substrate)
The photosensitive electrode paste was applied and dried by screen printing on a 5-inch square glass substrate (PD-200; manufactured by Asahi Glass Co., Ltd.), and a coating film having a thickness of 10 μm was obtained after drying. The coating film was exposed at an exposure amount of 300 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 160 μm and a width of 50 μm, and shower-developed with a 0.1 wt% 2-aminoethanol solution for 20 seconds. A pattern was formed. Next, a dielectric paste was applied onto the electrode pattern by screen printing and dried, and after drying, a dielectric layer having a thickness of 10 μm was formed, which was used as a base substrate.
(Electrode pattern width, height measurement)
The auxiliary partition after firing was cut perpendicular to the longitudinal direction, and the cross section was observed using a scanning electron microscope (manufactured by Hitachi, Ltd.) to measure the width and height of the electrodes. Here, the width of the electrode refers to the width in the width direction of the auxiliary partition wall section, and the electrode height refers to the width of the auxiliary partition wall section in the height direction.
(Measurement of relative luminous efficiency)
Luminous efficiency was determined as follows. First, the luminance B (cd / m ² ) of the produced PDP was measured using a colorimeter (CS-1000; manufactured by Minolta). The electric power W (W) applied to the PDP at this time was determined using a digital power meter (2532, manufactured by Yokogawa Electric Corporation). And luminous efficiency (eta) was calculated | required from following Formula.
η = πB · S / W
Here, S is the area (m ² ) of the display part of the manufactured PDP.
The light emission efficiency when the light emission efficiency of Comparative Example 2 was 100 was defined as the relative light emission efficiency.
Example 1
The photosensitive barrier rib paste 1 was applied onto the base substrate using a slit die coater so that the thickness of the base barrier rib paste layer after drying was 75 μm, and dried at 100 ° C. for 60 minutes using a hot air dryer. Next, the underlying barrier rib paste layer is subjected to alignment exposure at an exposure amount of 120 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 90 μm, and then a photosensitive barrier rib using a slit die coater. The paste 2 was applied so that the thickness of the first partition paste layer after drying was 75 μm, and dried at 100 ° C. for 60 minutes using a hot air dryer. Next, the laminated body was subjected to alignment exposure at an exposure amount of 150 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 30 μm, and only the first barrier rib paste layer (photosensitive barrier rib paste 2) was obtained. Shower development was performed for 2 minutes with ultrapure water to form a first partition pattern. Next, a photosensitive electrode paste was applied between the first barrier rib patterns by nozzle application and dried using a hot air dryer.
Next, using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 30 μm, alignment exposure was performed at an exposure amount of 300 mJ / cm ² to expose only the upper surface of the first barrier rib pattern, and 0.1 wt% 2-amino Shower development was performed with an ethanol solution for 1 minute to form a photosensitive electrode paste pattern on the side surface of the first partition pattern. Next, the photosensitive partition paste 1 is applied using a slit die coater so as to cover the laminated pattern so that the thickness of the second partition paste layer after drying is 105 μm, and is heated at 100 ° C. using a hot air dryer. Drying was performed for 60 minutes. The laminate is subjected to alignment exposure at an exposure amount of 250 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 90 μm, and has a stripe pattern with a pitch of 160 μm and a width of 20 μm in the direction perpendicular to the mask. Alignment exposure was performed at an exposure amount of 200 mJ / cm ² using a 5-inch chrome mask. Thereafter, shower development was performed with a 0.2 wt% 2-aminoethanol solution for 4 minutes to form a laminated lattice pattern. The laminated lattice pattern was baked at 590 ° C., and a lattice partition in which two electrode layers having a width of 2 μm and a height of 40 μm were formed in the auxiliary partition was formed.
(Example 2)
The photosensitive barrier rib paste 1 was used in place of the photosensitive barrier rib paste 2 used for the first barrier rib paste layer, and the 0.2 wt% 2-aminoethanol solution was used for the first barrier rib paste layer instead of ultrapure water. Except for this, a grid partition in which two electrode layers having a width of 2 μm and a height of 40 μm were formed in the auxiliary partition was formed in the same manner as in Example 1. Since the unexposed portion of the base barrier rib paste layer was dissolved during the development of the first barrier rib paste layer, the layered pattern of the base barrier rib paste layer and the first barrier rib pattern after development becomes convex, and the second barrier rib paste layer is convex It was formed along. Therefore, the surface of the second partition paste layer was not flat as compared with Example 1, and the finally formed partition was rounded at the top as compared with Example 1.
(Comparative Example 1)
The photosensitive barrier rib paste 1 was applied on the base substrate using a slit die coater so that the thickness of the base barrier rib paste layer after drying was 120 μm, and dried at 100 ° C. for 60 minutes using a hot air dryer. Next, the partition layer was subjected to alignment exposure at an exposure amount of 60 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 130 μm, and a stripe pattern with a pitch of 160 μm and a width of 20 μm in the direction perpendicular to the mask. Alignment exposure was performed at an exposure amount of 50 mJ / cm ² using a 5-inch chrome mask having The photosensitive electrode paste is coated on the screen so that the thickness of the photosensitive electrode paste layer after drying is 10 μm using a screen printer, and then dried at 120 ° C. for 10 minutes using a hot air dryer. Next, alignment exposure was performed on the electrode layer at an exposure amount of 300 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 20 μm. The application and exposure of the photosensitive electrode paste were repeated 10 times under the same conditions as described above, and then shower development was performed for 20 seconds with a 0.1 w% 2-aminoethanol solution to form an electrode pattern on the partition wall layer. Next, the photosensitive partition paste 1 is applied onto the laminate of the partition layer and the electrode pattern using a slit die coater so that the thickness of the first partition paste layer after drying is 50 μm, and using a hot air dryer. Drying was performed at 100 ° C. for 30 minutes. The partition layer is subjected to alignment exposure at an exposure amount of 80 mJ / cm ² using a 5-inch chrome mask having a stripe pattern with a pitch of 480 μm and a width of 130 μm, and has a stripe pattern with a pitch of 160 μm and a width of 20 μm perpendicular to the mask. Using a 5-inch chrome mask, alignment exposure was performed at an exposure amount of 60 mJ / cm ² , and shower development was performed with a 0.1 wt% 2-aminoethanol solution for 4 minutes, thereby forming a laminated pattern. The laminated pattern was baked at 590 ° C. to form a grid partition in which an electrode layer having a width of 20 μm and a height of 20 μm was formed in the auxiliary partition. Although the number of manufacturing processes was greater than in Examples 1 and 2, the built-in electrode height was low. In addition, since the electrode width is larger than those in Examples 1 and 2, the width of the auxiliary partition wall is increased.
(Example 3)
A plasma display was produced by the following procedure. First, the plasma display back plate was prepared by the following procedure. An address electrode pattern was formed on a “PD-200” glass substrate (13 inches) manufactured by Glass Co., Ltd. by a photolithography method using a photosensitive electrode paste. Next, a dielectric layer having a thickness of 20 μm was formed on the glass substrate on which the address electrodes were formed by screen printing. Thereafter, a partition wall in which an electrode layer having a width of 2 μm and a height of 40 μm was formed in the partition wall by the method of Example 1 was formed. Next, a phosphor layer was formed to a thickness of 20 μm by a dispenser method and fired to obtain a back plate.
Next, a 500 nm-thick MgO film was formed on a “PD200” glass substrate by an electron beam evaporation method, and a plasma display front plate was produced. The prepared front plate and back plate are sealed at 450 ° C. using a sealing frit paste mainly composed of PbO, and then xenon-neon containing 5% by volume of xenon is formed in the space formed between the front and back substrates. A panel portion of a plasma display was manufactured by sealing a rare gas of mixed gas at a pressure of 450 mmHg. Further, a plasma display was manufactured by mounting a driver IC for driving. When the fabricated PDP was driven, an image could be displayed without any problem. Compared to Comparative Example 1, the partition wall width was narrow and the height of the main electrode was high, so that the discharge space was expanded and the relative luminous efficiency was 210.
(Comparative Example 2)
A plasma display was produced in the same manner as in Example 3 except that the partition of the back plate was produced by the method of Comparative Example 1. When the fabricated PDP was driven, an image could be displayed without any problem. The relative luminous efficiency was 100.
The evaluation results of Examples 1 to 3 and Comparative Examples 1 and 2 are shown in Table 2.

The perspective view which shows typically the structure of the conventional alternating current (AC) type | mold plasma display. The flowchart which showed typically the manufacturing method of the member for displays of this invention. The flowchart which showed typically the manufacturing method of the member for displays of this invention. The perspective view which shows the 1st structural example of the member for PDP manufactured by the manufacturing method of this invention typically (partially notched drawing). The perspective view which shows the 2nd structural example of the member for PDP manufactured by the manufacturing method of this invention typically (partially notched drawing).

Explanation of symbols

1: Front plate 2: Glass substrate 3: Scan electrode 4: Sustain electrode 5: Bus electrode 6: Transparent dielectric layer 7: MgO protective film 8: Back plate 9: Glass substrate 10: Address electrode 11: Dielectric layer 12: Partition 13: Red phosphor 14: Green phosphor 15: Blue phosphor 16: Photosensitive paste layer 17: Negative photomask for exposure 18: Photosensitive paste layer Exposure portion 19: Photosensitive paste pattern 20: Base partition paste layer 21: Photomask for exposure 22: Base partition paste layer exposure part 23: First partition paste layer 24: First partition paste layer exposure part 25: First partition pattern 26: Photosensitive electrode paste layer 27: Photosensitive electrode paste layer Exposure unit 28: Electrode pattern 29: Second partition paste layer 30: Second partition paste layer Exposure unit 31: First partition pattern 32: Second partition pattern 33: Built-in electrode Layer partition wall 34: electrode-built partition wall 35: main barrier rib 36: auxiliary barrier rib 37: main electrode 38: the auxiliary electrode

Claims (2)

A light-transmitting wall-like structure is formed on the substrate, a photosensitive paste containing a photosensitive organic component and an inorganic component is applied between the wall-like structures, dried, and passed through a photomask. A method for producing a display member, wherein a photosensitive paste pattern is formed on a side surface of the wall-shaped structure by developing only the upper surface of the wall-shaped structure after exposure. A first barrier rib pattern is formed by applying a photosensitive barrier rib paste comprising an inorganic component including a low softening point glass powder and an organic component including a photosensitive organic component on a substrate, drying, exposing, and developing. A photosensitive electrode paste containing a photosensitive organic component and conductive particles in between is applied and dried, and only the upper surface of the first barrier rib pattern is exposed through a photomask and then developed, so that the side surface of the first barrier rib pattern is developed. An electrode pattern is formed, and a photosensitive barrier rib paste is applied and dried so as to cover the first barrier rib pattern and the electrode pattern formed on the side surface thereof to form a second barrier rib paste layer. Exposure and development are performed to form a laminated barrier rib pattern composed of the first barrier rib pattern, the electrode pattern, and the second barrier rib pattern covering the first barrier rib pattern, and the laminated barrier rib pattern is collectively baked. Method for producing a display member, which comprises forming a partition wall having an electrode therein by.

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