JP2009175556A - Color filter, method for manufacturing the same, and liquid crystal display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter capable of obtaining an image of high quality by suppressing swelling of a boundary between a black matrix and a colored pixel at a low cost and with an easy method. <P>SOLUTION: The method for manufacturing the color filter includes a step for forming a photosensitive dark color composition layer on a substrate, exposing and developing the photosensitive dark color composition layer, forming a black matrix pattern whose under cut includes -2.0 to 5.0 μm length and baking the pattern to form a black matrix and a colored pattern forming step for forming a photosensitive colored composition layer on a black matrix substrate and performing exposure-development-baking of the photosensitive colored composition layer to form a colored pattern so that the distance in a black matrix width direction of an overlap part overlapping with the black matrix after baking is 2.0 to 9.0 μm. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a color filter, a manufacturing method thereof, and a liquid crystal display device.

The color filter is an essential component for liquid crystal displays and solid-state image sensors.
For example, color filters for liquid crystal displays (LCD) are used for TV applications, and higher image quality is required compared to conventional notebook computers and monitors. In addition, the substrate size has been increased for the production of large-sized TVs, and the demand for improvement in yield and cost reduction has increased.

Regarding the improvement of the image quality, when manufacturing a color filter, there is a problem that the color pattern rises at the boundary between the black matrix and the colored pixels and the color filter does not become flat, resulting in deterioration of the image quality. (For example, see Patent Document 1). The rise of the boundary portion may cause problems such as a decrease in contrast and color unevenness.
For this reason, conventionally, after the pixel is formed, the surface of the color filter is polished or an overcoat layer (hereinafter sometimes referred to as “OC layer”) is formed on the pixel. However, if polishing or formation of the OC layer is performed, the manufacturing process of the color filter increases and the cost increases. In addition, in the case of polishing, adverse effects such as damage to the color filter may occur, and a method capable of omitting the polishing step and the OC layer forming step has been demanded.

On the other hand, attempts have been made to solve the problem of the rising of the boundary portion by reducing the taper angle of the black matrix (see, for example, Patent Document 1 and Patent Document 2).
In Patent Document 2, a coloring composition is further applied only in the black matrix frame by an ink jet method.
JP-A-9-113721 JP 2003-161826 A

However, in the method described in Patent Document 1, there are many steps for obtaining the taper angle on the black matrix, and after applying and drying the photosensitive dark color composition for forming the black matrix on the substrate, a positive resist is further applied. However, it takes time and effort to adjust the developing speed ratio between the photosensitive dark color composition and the positive resist.
If the undercut is increased in order to reduce the taper angle, the development condition dependency of the undercut in development increases. Conversely, if the undercut is not so large, the development condition of the black matrix line width is increased. There is a problem that the dependency becomes large and stable production is difficult in any case.
Furthermore, the effect of suppressing the rise of the colored pattern is insufficient only by adjusting the taper angle of the undercut. Furthermore, this technique is not compatible with large substrates of 1 m × 1 m or more.

  On the other hand, in Patent Document 2, a colored composition is applied to a substrate by an ink jet method to form a colored pattern. It is not suitable for suppressing the swell of the colored pattern at the overlap portion where the and overlap. Rather, at the boundary between the black matrix and the colored pixel, the black matrix is higher than the colored pixel, resulting in a step, the color filter is not flat, and the same image quality degradation problem may occur.

  In view of the above circumstances, the present invention forms a black matrix with high accuracy by a low-cost, simple method without adding steps such as polishing and OC layer installation, and at the boundary between the black matrix and the colored pixels. An object of the present invention is to provide a color filter, a manufacturing method thereof, and a liquid crystal display device capable of obtaining a high-quality image by suppressing the rising of the coloring pattern.

Specific means for achieving the above object are as follows.
<1> A photosensitive dark color composition layer is formed on a substrate using the photosensitive dark color composition, the photosensitive dark color composition layer is exposed, and the photosensitive dark color composition layer after exposure is exposed. Developing, forming a black matrix pattern with an undercut length of −2.0 to 5.0 μm, baking the formed black matrix pattern to form a black matrix, and after baking A photosensitive coloring composition layer is formed on the substrate on which the black matrix is formed using a photosensitive coloring composition, the photosensitive coloring composition layer is exposed, and the photosensitive coloring composition after exposure is exposed. And developing the photosensitive coloring composition layer by baking the black matrix of the overlapped portion overlapping the black matrix after the baking. A color pattern where the distance in the width direction to form a colored pattern such that 2.0～9.0Myuemu, a method of manufacturing a color filter having a.
<2> A color filter manufactured by the method for manufacturing a color filter according to <1>, including an overlap portion where a black matrix and a colored pattern overlap, and the overlap portion in the width direction of the black matrix. It is a color filter whose distance is 2.0 to 9.0 μm.

<3> The distance in the normal line of the substrate between the portion of the surface of the colored pattern farthest from the substrate surface of the overlap portion and the portion other than the overlap portion is 0.50 μm or less. It is a color filter as described in said <2> characterized by the above-mentioned.
<4> A liquid crystal display device comprising the color filter according to <2> or <3>.

  According to the present invention, a black matrix is accurately formed by a low-cost and simple method without adding steps such as polishing and OC layer installation, and the rising of the boundary portion between the black matrix and the colored pixels is suppressed. Thus, it is possible to provide a color filter that can obtain a high-quality image, a manufacturing method thereof, and a liquid crystal display device.

  Hereinafter, the color filter of the present invention, the manufacturing method thereof, and the liquid crystal display device will be described in detail.

<Color filter manufacturing method>
The method for producing a color filter of the present invention includes a black matrix forming step and a colored pattern forming step. If necessary, an overcoat forming step, a liquid crystal alignment auxiliary pattern forming step, a column spacer forming step, etc. A process can be provided and configured.
In any process, the film formation on the glass substrate may be performed by directly applying the photosensitive composition liquid to the glass substrate, or by applying to the temporary support and then transferring to the glass substrate. May be.
Hereinafter, the black matrix forming step and the colored pattern forming step will be described separately.

[Black matrix formation process]
In the present invention, in the black matrix forming step, at least a photosensitive dark color composition layer is formed on a substrate using the photosensitive dark color composition (photosensitive dark color composition layer forming step), and the photosensitive dark color composition is formed. The color composition layer is exposed (exposure process), the photosensitive dark color composition layer after the exposure is developed (development process), and a black matrix having an undercut length of −2.0 to 5.0 μm A black matrix is formed by forming a pattern and baking the formed black matrix pattern (baking process). In addition to the above steps, the black matrix forming step may be provided with other steps as necessary.

-Black matrix-
In the present invention, the black matrix preferably has an optical density (OD value) of 2.0 or more and 8.0 or less, more preferably 2.5 or more, and even more preferably 3.5 to 6.0. When the optical density is 2.0 or more, deterioration of display quality of the display device such as suppression of reduction of contrast can be suppressed.
The optical density referred to here is the ISO Visual transmission optical density. An example of a measuring instrument that can be used for measuring ISO Visual transmission optical density is X-Rite 361T (V) manufactured by Sakata Inx Engineering Co., Ltd.
The black matrix preferably has a line width (length in a direction perpendicular to the longitudinal direction of the black matrix sandwiched between the colored patterns) of 5 to 30 μm from the viewpoint of securing brightness by increasing the aperture ratio. The thickness of the black matrix (the length of the black matrix in the normal direction of the substrate) is from the viewpoint of reducing the rise of the overlap portion where the black matrix and the colored pattern overlap (preferably 0.50 μm or less). 2-2.2 micrometers is preferable, More preferably, it is 0.2-1.6 micrometers, More preferably, it is 0.7-1.3 micrometers. Within this thickness range, the unevenness of the substrate provided with the black matrix, that is, the level difference between the black matrix formation region and the non-formation region is appropriately maintained. Even when formed on top, it can be formed with high accuracy.

-Photosensitive dark color composition layer forming step-
In this step, a photosensitive dark color composition layer is formed on the substrate using the photosensitive dark color composition.
Examples of substrates that can be used in this step include non-alkali glass, soda glass, Pyrex (registered trademark) glass, quartz glass, and those obtained by attaching a transparent conductive film to these substrates, solid-state imaging devices, and the like. For example, a photoelectric conversion element substrate, such as a silicon substrate, may be used. Furthermore, a plastic substrate is also possible. Among these, alkali-free glass is preferable from the viewpoint of chemical resistance and heat resistance. In these substrates, first, a black matrix is formed in a lattice shape so as to isolate each pixel, and colored pixels are formed in the empty portions of the lattice.
Further, if necessary, an undercoat layer may be provided on these substrates in order to improve adhesion with an upper layer, prevent diffusion of substances, or planarize the substrate surface. It is preferable that the substrate is large (generally 1 m or more per side) in that the effects of the present invention are further exhibited.

As a method of forming the photosensitive dark color composition layer on the substrate, for example, there is a method of applying the photosensitive dark color composition on the substrate by coating or the like.
As a method for applying the photosensitive dark color composition on the substrate, various application methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, and screen printing can be applied. Of these, slit coating is preferred from the viewpoints of accuracy and speed. Before performing these coatings, it is preferable to clean the substrate with ultraviolet rays or various cleaning liquids from the viewpoint of improving coating properties.
Moreover, the method of transferring the coating film previously formed on the temporary support by the above application method onto the substrate can also be applied.
Regarding the transfer method, the production methods described in paragraph numbers [0023] and [0036] to [0051] of JP-A-2006-23696 and paragraph numbers [0096] to [0108] of JP-A-2006-47592 are used. It can be suitably used in the present invention.
As a laminator used for transcription, FIG. A laminator described in No. 24 or a laminator described in International Application No. JP2007 / 069312 can be suitably used. High productivity can be obtained by using these laminators.

  The thickness (for example, coating thickness) when the photosensitive dark color composition is applied on the substrate is appropriately adjusted depending on the design value of the thickness of the black matrix to be formed. Is preferred. Generally, 0.2 to 2.2 μm is preferable, 0.2 to 1.6 μm is more preferable, and 0.7 to 1.3 μm is most preferable.

-Exposure process-
In the exposure step, the photosensitive dark color composition layer formed in the photosensitive dark color composition layer forming step is exposed through a predetermined mask pattern, and patterned (in the case of a negative type, light irradiation is performed). Only the coating film portion is cured). As radiation that can be used for exposure, ultraviolet rays such as g-line, h-line, i-line, j-line, and k-line are particularly preferably used. Irradiation dose is preferably 5~500mJ / cm ^2, more preferably 10 to 300 mJ / cm ^2, and most preferably 10~200mJ / cm ^2.
The exposure machine can be a proximity type exposure machine, a mirror projection system, or a stepper system.

-Development process-
Next, by performing an alkali development treatment, for example, when the photosensitive dark color composition is a negative type, the non-light-irradiated part in the exposure may be eluted in an alkaline aqueous solution, leaving only the photocured part. it can.
As the developer, an organic alkali developer, an inorganic alkali developer or a mixture thereof is used.
Examples of the alkali agent used in the developer include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxy. And organic alkali compounds such as tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5.4.0] -7-undecene, and the concentration of these alkaline agents is 0.001 to 0.001. An alkaline aqueous solution diluted with pure water so as to be 10% by mass, preferably 0.01 to 1% by mass, is preferably used as the developer. In the case where a developer composed of such an alkaline aqueous solution is used, it is generally washed (rinsed) with pure water after development. If the rinsing is insufficient, an uncured residue tends to remain and unevenness is likely to occur. In the present invention, it is preferable to perform high-pressure water washing.

  In the present invention, the black matrix pattern is formed so that the length of the undercut is -2.0 to 5.0 [mu] m after the main development step and before the baking step described later. The shape of the black matrix pattern, particularly the undercut shape, can be controlled by the conditions of exposure, development, and pre-baking described later. First, the undercut will be described in detail.

In the black matrix formation process, when developing the photosensitive dark color composition layer after exposure, the surface of the photosensitive dark color composition layer (refers to the surface not in contact with the substrate; hereinafter the same applies to the black matrix) And the back side of the photosensitive dark color composition layer (in contact with the substrate) as compared with the inside of the layer close to the front surface (hereinafter referred to as “photosensitive dark color composition layer upper part”, and the black matrix is also referred to as “black matrix upper part”). Hereinafter referred to as black matrix) and the inside of the layer close to the back surface (hereinafter referred to as “photosensitive dark color composition layer lower part”, and black matrix also referred to as “black matrix lower part”). May go further. At this time, the lower part of the photosensitive dark color composition layer is in a dry state, and when the substrate on which the photosensitive dark color composition layer (black matrix) is formed is cut in the width direction of the black matrix, The shape of the composition layer is, for example, a reverse taper as shown in FIGS. Such a state is called a state with an undercut.
By providing an undercut in the photosensitive dark color composition layer (black matrix), a photosensitive coloring composition is formed on a substrate on which the black matrix is formed (hereinafter also referred to as “black matrix substrate”) in a later step. When a colored pixel is provided by applying an object or the like, the boundary portion between the black matrix and the colored pixel can be made difficult to rise. Thereby, when a color filter is produced and an image is displayed, disorder of liquid crystal alignment and light leakage can be suppressed, and a high-quality image can be obtained.
Hereinafter, the undercut will be described in more detail with reference to the drawings.

1 and 2 are cross-sectional views showing a black matrix substrate in a state where an undercut is present in the black matrix (photosensitive dark color composition layer).
As shown in FIG. 1, the length a of the undercut is the photosensitive dark color composition among the one end P in the width direction of the photosensitive dark color composition layer 4 and the lower part of the photosensitive dark color composition layer 4. The distance between the layer 4 and the portion Q where the photosensitive dark color composition is absent and which is farthest from the one end P in the width direction is obtained. The portion farthest from the one end P in the width direction is not limited to the contact point between the surface of the photosensitive dark color composition layer 4 and the substrate 2 as shown in FIG. For example, as shown in FIG. 2, when an intermediate portion between the upper end (surface) and the lower end (bottom surface) in the thickness direction of the photosensitive dark color composition layer 4 is removed, the length a of the undercut is a. Is the distance from the one end P to the portion R of the photosensitive dark color composition layer 4 that is the farthest away from the one end P in the width direction.

Contrary to the formation of the undercut described above, the development progress at the lower end in the thickness direction may be delayed as compared with the upper end at an early stage of the development progress process. At this time, the lower part of the photosensitive dark color composition layer protrudes from the upper part of the photosensitive dark color composition layer, and the substrate on which the photosensitive dark color composition layer (black matrix) is formed is replaced with the width of the black matrix. When cut in the direction, the shape of the photosensitive dark color composition layer is tapered (regular trapezoidal shape).
In the present invention, the state in which the lower part of the photosensitive dark color composition layer projects in the width direction from the one end of the upper part of the photosensitive dark color composition layer is defined as an undercut being negative (-). . Further, the length of the negative undercut is an extended portion of the photosensitive dark color composition layer from one end of the upper portion of the photosensitive dark color composition layer, and is the furthest away from the one end in the width direction. The distance to the part.

  The length of the undercut is preferably −2.0 to 5.0 μm, more preferably −2.0 to 4.0 μm, from the viewpoint of reducing the line width and the developer temperature dependency of the undercut. 5-3.0 μm is most preferred.

  In order to form the black matrix with high accuracy, it is important to appropriately adjust the exposure and development conditions. By changing the development conditions, the line width and the undercut length can be adjusted. Conceptually, the amount of undercut can be increased as development is performed under conditions that are slightly stronger than those commonly used. However, under strong development conditions, the amount of undercut may change greatly due to slight variations in process conditions. Also, chipping is likely to occur when the development conditions change in a stronger direction. Therefore, it is necessary to set exposure and development conditions in a more stable direction.

  Preferred exposure conditions in the method for producing a color filter of the present invention will be described. If only the surface of the photosensitive dark color composition layer (for example, a black resist layer) is cured, the control of the undercut amount by the development condition control may become unstable. For this reason, it is preferable that the ratio of the j and k lines is lower than that of the i, h, and g lines so as not to adversely affect the degree of cure of the entire layer.

Next, preferable development conditions will be described. Since the formation of the undercut portion is highly sensitive to the development state, particularly the liquid temperature, the liquid concentration, and the liquid fatigue level, it is desirable that the development system maintain a constant liquid temperature, liquid concentration, and liquid fatigue level.
As a method of keeping the liquid concentration and liquid fatigue level constant, for example, a method of automatically replenishing a new liquid or a replenisher while monitoring the liquid concentration, or a replenishment of a new liquid or a replenisher every time or a certain number of sheets is processed. And the like. The liquid temperature is preferably set to a temperature close to the ambient environmental temperature in order to suppress temperature fluctuations. Specifically, 20-30 degreeC is preferable, 21-27 degreeC is more preferable, and 22-25 degreeC is the most preferable.
In addition, the shower pressure in washing is preferably 0.01 to 0.5 MPa, preferably 0.05 to 0.4 MPa, from the viewpoint of preventing chipping of the photosensitive dark color composition layer (for example, black matrix). 0.05 to 0.3 MPa is more preferable.

-Bake process-
Next, the black matrix pattern is subjected to a heat treatment called baking (post-baking). Bake is a heat treatment after development for complete curing of the photosensitive dark color composition, and usually a heat curing treatment at 150 to 260 ° C. is performed.
The baking temperature is preferably 150 to 260 ° C, more preferably 180 to 260 ° C, and most preferably 200 to 250 ° C. The baking time is preferably 10 to 150 minutes, more preferably 15 to 120 minutes, further preferably 20 to 90 minutes, and most preferably 20 to 60 minutes.
By baking the photosensitive dark color composition layer in the above condition range, when the colored pixels are formed on the substrate on which the black matrix is formed, the rise of the overlap portion between the black matrix and the colored pixels is suppressed. Can do.

  The baking process is carried out continuously or batchwise by using a heating means such as a hot plate, a convection oven (hot air circulation dryer) or a high-frequency heater so that the photosensitive dark color composition layer after development is in the above condition. It can be done with a formula.

-Other processes-
In the black matrix forming step in the present invention, a pre-baking step may be added after the photosensitive dark color composition layer forming step and before the exposing step, or after the developing step. Before the baking (post-baking) step, a step of curing the formed black matrix by exposure may be included if necessary.

[Colored pattern forming step]
In the present invention, in the coloring pattern forming step, at least a photosensitive coloring composition layer is formed using a photosensitive coloring composition on a substrate on which a photosensitive dark color composition layer (black matrix) after baking is formed. Forming (photosensitive coloring composition layer forming step), exposing the photosensitive coloring composition layer (coloring layer exposure step), developing the photosensitive coloring composition layer after exposure (coloring layer developing step), By baking the developed photosensitive colored composition layer (colored layer baking step), the distance in the black matrix width direction of the overlapped portion overlapping the black matrix after the baking is 2.0 to 9.0 μm. A colored pattern is formed so that
In the present invention, the layer thickness of the photosensitive coloring composition layer is preferably thinner from the viewpoint of suppressing the rise of the overlapping portion. Specifically, 1.8 to 2.8 μm is preferable, and 1.8 to 2.5 μm is more preferable.
In addition to the above steps, the coloring pattern forming step may further include other steps such as a pre-baking step as necessary.
First, the “overlap” will be described.

-Overlap-
When a photosensitive coloring composition is applied on a substrate on which a black matrix is formed to form a colored pattern (colored pixels), photosensitive coloring is performed so that no gap is formed between the black matrix and the colored pixels. It is common to form a colored pixel by slightly covering (overlapping) the photosensitive coloring composition with the black matrix so that the composition and the black matrix overlap. In the present invention, a high-quality color filter or liquid crystal display device can be obtained by adjusting the distance of the overlap portion to 2.0 to 9.0 μm in addition to the above-described undercut.
The “distance of the overlap portion” refers to the distance in the black matrix width direction of the overlap portion where the color pattern formed using the photosensitive coloring composition layer and the black matrix overlap. This will be described in more detail with reference to the drawings.

FIG. 3 shows a case where a photosensitive coloring composition layer 6 is formed on a substrate 2 on which a black matrix 4 is formed by applying a photosensitive coloring composition to form the black matrix 4 and the photosensitive coloring composition layer 6. It is a fragmentary sectional view of the color filter which shows the state in which the overlap part 8 which overlapped was formed. Here, the overlap portion 8 is a region of distance b, and the distance b of the overlap portion 8 is the outermost end S on the side facing the photosensitive coloring composition layer 6 in the width direction of the black matrix 4; It can be determined as the distance in the width direction of the black matrix 4 between the photosensitive coloring composition layer 6 provided so as to overlap the black matrix 4 and the outermost end T located on the black matrix 4.
Actually, the distance b of the overlap portion 8 can be obtained by cutting the color filter in a direction perpendicular to the longitudinal direction of the pattern of the black matrix 4 and measuring from the cross section.

In the present invention, the distance of the overlap portion is 2.0 to 9.0 μm from the viewpoint of reducing the rise of the overlap portion (preferably 0.50 μm or less), but 2.0 to 8.0 μm. Is more preferable, and 2.0 to 7.0 μm is most preferable.
Further, by setting the distance of the overlap portion to 12 μm or less, it is possible to stably manufacture the color filter and the display device on a large substrate (one side of 1 m or more).

The overlap distance can be adjusted by changing the exposure pattern position of the photosensitive coloring composition layer and the development conditions. Specifically, the amount of overlap can be reduced as the amount of overlap of the exposure pattern with the black matrix is reduced. The weaker the development conditions, for example, the lower the development temperature or the shorter the development time. The overlap amount can be increased as much as possible.
More specifically, in order to set the overlap portion distance to 2.0 to 9.0 μm, it is preferable to set the distance at which the exposure pattern and the black matrix overlap to 2.0 to 9.0 μm. The development temperature is preferably 20 to 35 ° C, more preferably 21 to 30 ° C, and most preferably 22 to 26 ° C. Furthermore, the development time is preferably 20 to 120 seconds, more preferably 25 to 80 seconds, and most preferably 35 to 75 seconds.

As a preferable combination of each of the above conditions, the distance between the exposure pattern and the black matrix is 2.0 to 9.0 μm, the development temperature is 20 to 35 ° C., and the development time is 20 to 120 seconds. A combination is preferred.
A more preferable combination is a combination in which the distance at which the exposure pattern and the black matrix overlap is 2.0 to 8.0 μm, the development temperature is 21 to 30 ° C., and the development time is 25 to 80 seconds. .
The most preferable combination is a combination in which the distance at which the exposure pattern and the black matrix overlap is 2.0 to 7.0 μm, the development temperature is 22 to 26 ° C., and the development time is 35 to 75 seconds. .

  As described above, in the overlap portion between the black matrix and the photosensitive coloring composition layer, the photosensitive coloring composition is covered with the black matrix so that the black matrix and the photosensitive coloring composition layer partially overlap each other. , That part will be raised. By reducing the degree of the bulge of the overlap portion, it is possible to suppress disorder of liquid crystal alignment and light leakage, and a high quality image can be obtained. The rise of the overlap portion will be described with reference to the drawings.

FIG. 4 shows that a photosensitive coloring composition layer is formed by applying a photosensitive coloring composition on the substrate 2 on which the black matrix 4 is formed, and is exposed and developed to form a coloring pattern 6. 4 is a partial cross-sectional view of a color filter showing a state in which a bulge is generated in an overlap portion 8 where 4 and a colored pattern 6 overlap.
More specifically, the “degree of swell of the overlap portion” means the surface of the substrate 2 of the overlap portion 8 (the surface of the substrate 2 in contact with the black matrix 4 or the color pattern 6 among the surfaces of the color pattern 6). ) And the distance in the normal line of the substrate between the portion farthest from the substrate and the flat surface portion other than the overlap portion 8. In other words, the “degree of swell of the overlap portion” is the normal line of the substrate between the surface of the substrate 2 and the portion of the surface of the colored pattern 6 that is farthest from the surface of the substrate 2 of the overlap portion 8. The distance e is obtained by subtracting the distance d at the normal line of the substrate between the surface of the substrate 2 and the portion of the surface of the colored pattern 6 other than the overlap portion 8 from the distance c.

Hereinafter, the rise of the overlap portion will be referred to as “horn” for the sake of convenience, and the distance e will be referred to as “horn height”. The height of the horn is preferably 0.5 μm or less, more preferably 0.4 μm or less, and most preferably 0.3 μm or less in terms of obtaining a high-quality image.
The height of the horn can be adjusted by appropriately setting the above-described undercut length, the distance of the overlap portion, and the thickness of the black matrix.

A preferable combination of the length of the undercut, the distance of the overlap portion, and the thickness of the black matrix is such that the length of the undercut is −2.0 to 5.0 μm, and the distance of the overlap portion is 2. The thickness is preferably 0 to 9.0 μm, and the thickness of the black matrix is preferably 0.2 to 2.2 μm.
A more preferable combination is that the length of the undercut is −2.0 to 4.0 μm, the distance of the overlap portion is 2.0 to 8.0 μm, and the thickness of the black matrix is 0.2 to The thickness is set to 1.6 μm.
The most preferable combination is that the length of the undercut is -1.5 to 3.0 μm, the distance of the overlap portion is 2.0 to 7.0 μm, and the thickness of the black matrix is 0.7 to The thickness is set to 1.3 μm.
Next, various steps performed in the colored pattern forming step in the present invention will be described.

-Photosensitive coloring composition layer formation process-
In the photosensitive coloring composition layer forming step, the photosensitive coloring composition layer is formed using the photosensitive coloring composition on the substrate on which the photosensitive dark color composition layer (black matrix) after baking is formed. .
As a method for forming the photosensitive coloring composition layer on the substrate on which the black matrix is formed, a method similar to the method for forming the photosensitive dark composition layer on the substrate, that is, a coating method or a transfer method is used. be able to.
Among them, the method of applying the photosensitive coloring composition to the front surface of the substrate on which the black matrix is formed with a slit coater or the like is preferable because the effects of the present invention can be exhibited well.
The layer thickness of the photosensitive coloring composition layer is preferably 0.5 to 3.0 μm in order to obtain a sufficient color reproduction region and sufficient panel luminance, and in the range of 1.0 to 2.5 μm. More preferably.

-Colored layer exposure process-
In the colored layer exposure step, the photosensitive colored composition layer is exposed.
The exposure treatment of the photosensitive coloring composition layer can be performed in the same manner as the exposure step of the photosensitive dark color composition layer. When forming a colored pattern of multiple colors, it is exposed for each color through a predetermined mask pattern of each color, and the photosensitive colored composition layer of each color irradiated with light is patterned (in the case of a negative type, it is cured) )can do.

-Colored layer development process-
In the colored layer developing step, the photosensitive colored composition layer after exposure is developed.
The development processing of the photosensitive coloring composition layer after the exposure can be performed in the same manner as described in the description of the development process of the photosensitive dark composition layer, and the developer described in the development process is preferable. Can be used.
As the development conditions, in order to adjust the distance of the overlap portion and the height of the horn generated in the overlap portion between the black matrix and the colored pixels, the photosensitive coloring composition is used under the development conditions described in the description of the overlap. It is preferred to develop the layer.

-Colored layer baking process-
In the colored layer baking step, the developed photosensitive colored composition layer is baked.
The method for baking the photosensitive coloring composition layer after development can be the same method as the baking step for baking the photosensitive dark color composition layer described above.
When forming a colored pattern of a plurality of hues such as RGB three hues, the formation of the photosensitive coloring composition layer, exposure, development, and baking may be repeated for the desired number of hues, or for each hue. After the formation of the photosensitive coloring composition layer, exposure, and development, the entire hue may be finally baked. As a result, a color filter including a colored pixel having a black matrix and a desired hue is manufactured.

-Other processes-
Also in the colored pattern forming step, after the photosensitive colored composition layer forming step and before the colored layer exposing step, a step of pre-baking the photosensitive colored composition layer in order to dry the photosensitive colored composition ( A colored layer prebaking step) may be provided.
60-140 degreeC is preferable and, as for the prebaking temperature of the photosensitive coloring composition layer, 80-120 degreeC is more preferable. The pre-bake time is preferably 30 to 300 seconds, more preferably 80 to 200 seconds.
Next, the photosensitive coloring composition used for the manufacturing method of the color filter of this invention and the photosensitive dark color composition are demonstrated in detail.

<Photosensitive coloring composition>
The photosensitive coloring composition used for forming the coloring pattern of the color filter of the present invention is a radiation-sensitive composition (for example, in the case of a negative type, a radiation-sensitive composition that is cured by light), and (A -1) It preferably contains a colorant, (B) a binder polymer, (C-1) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent. Other additives such as a dispersant and a surfactant may be included.
In the present invention, it is preferable to adjust the physical properties of the photosensitive coloring composition for forming the colored pattern so as to suppress the thickness of the portion overlapping the formed black matrix. For example, the liquid viscosity is preferably low, and the liquid flowability in the drying process is preferably high.

-(A-1) Colorant-
As the colorant, a dye / pigment system can be appropriately selected. The pigment used as the colorant may be an inorganic pigment or an organic pigment, but preferably has a high transmittance. In view of the above, it is preferable to use one having a particle size as small as possible. The average particle size is preferably 10 to 100 nm, more preferably 10 to 50 nm. In the photosensitive coloring composition used in the present invention, by using a polymer dispersing agent described later, even when the size of the coloring agent is small, the pigment dispersibility and dispersion stability are improved. Even if the thickness is small, a colored pixel having excellent color purity can be formed.

  Examples of the inorganic pigment that can be used as a colorant for forming a colored pattern (colored pixel) include metal compounds represented by metal oxides, metal complex salts, and the like. Specifically, iron, cobalt, aluminum, cadmium And metal oxides such as lead, copper, titanium, magnesium, chromium, zinc, and antimony, and composite oxides of the above metals.

Moreover, as an organic pigment, for example,
CI Pigment Yellow 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199; CI Pigment Orange 36, 38, 43, 71; CI Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270;
CI pigment violet 19, 23, 32, 37, 39;
CI Pigment Blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
CI Pigment Green 7, 36, 37;
CI Pigment Brown 25, 28;
CI Pigment Black 1
Etc.

Although it does not specifically limit in this invention, The following pigment is more preferable.
CI Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185;
CI Pigment Orange 36, 71;
CI Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264;
CI pigment violet 19, 23, 37;
CI Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
CI Pigment Green 7, 36, 37;

These organic pigments can be used alone or in various combinations in order to increase color purity. Specific examples of combinations are shown below.
For example, as a pigment for the red phase (R), an anthraquinone pigment, perylene pigment, diketopyrrolopyrrole pigment alone or at least one of them, a bisazo yellow pigment, an isoindoline yellow pigment, a quinophthalone yellow pigment or A mixture with a perylene-based red pigment can be used. For example, as an anthraquinone pigment, C.I. I. Pigment red 177, and perylene pigments include C.I. I. Pigment red 155, C.I. I. Pigment Red 224, and diketopyrrolopyrrole pigments include C.I. I. Pigment red 254, and C.I. I. Mixing with Pigment Yellow 139 is preferred. The mass ratio of the red pigment to the yellow pigment is preferably 100: 5 to 100: 50 from the viewpoint of obtaining sufficient color purity and suppressing deviation from the NTSC target hue. In particular, the mass ratio is optimally in the range of 100: 10 to 100: 30. In addition, in the case of the combination of red pigments, it can adjust according to chromaticity.

  In addition, as a pigment for the green phase (G), a halogenated phthalocyanine pigment alone or a mixture thereof with a bisazo yellow pigment, quinophthalone yellow pigment, azomethine yellow pigment or isoindoline yellow pigment may be used. Can be used. For example, C.I. I. Pigment Green 7, 36, 37 and C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180 or C.I. I. Mixing with Pigment Yellow 185 is preferred. The mass ratio of the green pigment to the yellow pigment is preferably 100: 5 to 100: 150 from the viewpoint of obtaining sufficient color purity and suppressing deviation from the NTSC target hue. The mass ratio is particularly preferably in the range of 100: 30 to 100: 120.

  As the pigment for the blue phase (B), a phthalocyanine pigment can be used alone or a mixture thereof with a dioxazine purple pigment can be used. For example, C.I. I. Pigment blue 15: 6 and C.I. I. Mixing with pigment violet 23 is preferred. The mass ratio of the blue pigment and the purple pigment is preferably 100: 0 to 100: 50, more preferably 100: 5 to 100: 30.

  The content of (A-1) the colorant (pigment) in the photosensitive coloring composition layer used in the present invention is preferably 25 to 75% by mass with respect to the total solid content (mass) of the composition. 32 to 70% by mass is more preferable. (A-1) When the content of the colorant (pigment) is within the above range, the color density is sufficient and it is effective to ensure excellent color characteristics.

-(B) Binder polymer-
The photosensitive coloring composition of the present invention preferably contains a binder polymer for the purpose of improving film properties and imparting development properties. The following alkali-soluble resins can be used as the binder polymer.
The alkali-soluble resin used in the present invention is a linear organic polymer, and at least one molecule in a molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as a main chain). It can be appropriately selected from alkali-soluble resins having a group that promotes alkali solubility (for example, carboxyl group, phosphoric acid group, sulfonic acid group, hydroxyl group, etc.).

More preferable as the alkali-soluble resin are polymers having a carboxylic acid in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957. Methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, croton as described in JP-A Nos. 59-53836 and 59-71048. Acrylic polymers such as acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, acidic cellulose derivatives having a carboxylic acid in the side chain, and polymers having a hydroxyl group with an acid anhydride added The thing of a copolymer is mentioned.
The acid value is preferably in the range of 10 to 200 mgKOH / g, preferably 30 to 180 mgKOH / g, and more preferably 50 to 150 mgKOH / g.

As a specific structural unit of the alkali-soluble resin, a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is particularly suitable. Examples of other monomers copolymerizable with the (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, and vinyl compounds. Here, the hydrogen atom of the alkyl group and the aryl group may be substituted with a substituent.
Examples of the alkyl (meth) acrylates and aryl (meth) ^{_{acrylate, CH 2 = C (R 1}} ) (COOR 3) [wherein, ^{R 1} represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, ^{R 3} Represents an alkyl group having 1 to 8 carbon atoms or an aralkyl group having 6 to 12 carbon atoms. Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, octyl (meth) ) Acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, tolyl (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, hydroxyalkyl (meth) acrylate (alkyl is an alkyl group having 1 to 8 carbon atoms) ), Hydroxyglycidyl methacrylate, tetrahydrofurfuryl methacrylate and the like.

A resin having a polyalkylene oxide chain in the molecular side chain is also preferable. The polyalkylene oxide chain may be a polyethylene oxide chain, a polypropylene oxide chain, a polytetramethylene glycol chain, or a combination thereof, and the terminal is a hydrogen atom or a linear or branched alkyl group.
1-20 are preferable and, as for the repeating unit of a polyethylene oxide chain and a polypropylene oxide chain, 2-12 are more preferable. Acrylic copolymers having a polyalkylene oxide chain in these side chains include, for example, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, poly (ethylene glycol-propylene glycol) mono (meth) acrylate, and the like. These OH group alkyl-blocked compounds such as methoxypolyethylene glycol mono (meth) acrylate, ethoxypolypropylene glycol mono (meth) acrylate, methoxypoly (ethylene glycol-propylene glycol) mono (meth) acrylate and the like are used as copolymerization components. An acrylic copolymer.

As the vinyl compound, CH ₂ = CR ¹ R ² [wherein R ¹ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R ² represents an aromatic hydrocarbon ring having 6 to 10 carbon atoms. . Specific examples include styrene, α-methylstyrene, vinyl toluene, acrylonitrile, vinyl acetate, N-vinyl pyrrolidone, polystyrene macromonomer, polymethyl methacrylate macromonomer, and the like.
Other monomers that can be copolymerized can be used singly or in combination of two or more. Among these, benzyl (meth) acrylate / (meth) acrylic acid copolymers and multi-component copolymers composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers are preferable.

As already described, the acrylic resin has an acid value in the range of 20 to 200 mgKOH / g. When the acid value is 200 or less, it is possible to prevent the acrylic resin from being excessively soluble in alkali and narrowing the appropriate development range (development latitude). On the other hand, if it is 20 or more, the solubility in alkali is unlikely to be reduced, so that it is possible to prevent the development time from being prolonged.
In addition, the weight average molecular weight Mw (polystyrene conversion value measured by GPC method) of the acrylic resin is used to realize a viscosity range in which the photosensitive coloring composition can be easily used in the process such as coating, and the film strength is secured. Therefore, it is preferably 2,000 to 100,000, more preferably 3,000 to 50,000.

  In order to improve the crosslinking efficiency of the photosensitive coloring composition in the present invention, a resin having a polymerizable group in an alkali-soluble resin may be used alone or in combination with an alkali-soluble resin having no polymerizable group. A polymer containing a group, a (meth) acryl group, an aryloxyalkyl group or the like in the side chain is useful. The alkali-soluble resin having a polymerizable double bond can be developed with an alkali developer, and is further provided with photocurability and thermosetting. Examples of polymers containing these polymerizable groups are shown below, but are not limited to the following as long as each molecule contains an alkali-soluble group such as a COOH group and an OH group and a carbon-carbon unsaturated bond. .

(1) Urethane modification obtained by reacting an isocyanate group and an OH group in advance, leaving one unreacted isocyanate group and reacting at least one (meth) acryloyl group with an acrylic resin containing a carboxyl group A polymerizable double bond-containing acrylic resin, (2) an unsaturated group-containing acrylic resin obtained by a reaction between an acrylic resin containing a carboxyl group and a compound having both an epoxy group and a polymerizable double bond in the molecule,
(3) Acid pendant type epoxy acrylate resin,
(4) A polymerizable double bond-containing acrylic resin obtained by reacting an acrylic resin containing an OH group with a dibasic acid anhydride having a polymerizable double bond.
Among the above, the resins (1) and (2) are particularly preferable.

As a specific example, a copolymer of an OH group such as 2-hydroxyethyl acrylate, a COOH group such as methacrylic acid, and a monomer such as an acrylic or vinyl compound copolymerizable with these, an OH group A compound obtained by reacting an epoxy ring having reactivity with a compound having a carbon-carbon unsaturated bond group (for example, a compound such as glycidyl acrylate) can be used. In the reaction with the OH group, a compound having an acid anhydride, an isocyanate group, or an acryloyl group in addition to the epoxy ring can be used.
Further, a compound obtained by reacting an unsaturated carboxylic acid such as acrylic acid with a compound having an epoxy ring described in JP-A-6-102669 and JP-A-6-1938 is saturated or unsaturated polybasic. A reaction product obtained by reacting an acid anhydride can also be used.

Examples of compounds having both an alkali solubilizing group such as a COOH group and an intercarbon unsaturated group include, for example, Dynal NR series (manufactured by Mitsubishi Rayon Co., Ltd.); Photomer 6173 (COOH group-containing Polyurethane acrylic oligomer, Diamond Shamrock Co., Ltd.). Ltd.); Biscote R-264, KS resist 106 (both manufactured by Osaka Organic Chemical Industry Co., Ltd.); Cyclomer P series, Plaxel CF200 series (both manufactured by Daicel Chemical Industries, Ltd.); Ebecryl 3800 (Daicel) And UCB Co., Ltd.).
As addition amount of alkali-soluble resin, it is preferable that it is the range of 3-30 mass% in the total solid of a photosensitive coloring composition layer, and 5-20 mass% is more preferable.

In preparing the photosensitive coloring composition, it is preferable to add the following epoxy resin as a binder polymer in addition to the alkali-soluble resin. Examples of the epoxy resin include compounds having two or more epoxy rings in the molecule, such as bisphenol A type, cresol novolac type, biphenyl type, and alicyclic epoxy compound.
For example, as bisphenol A type, Epototo YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-10
59, YDF-8170, YDF-170 etc. (above, manufactured by Toto Kasei Co., Ltd.), Denacol EX-1101, EX-1102, EX-1103 etc. (above, produced by Nagase Kasei Co., Ltd.), Plaxel GL-61, GL-62, G101, G102 (manufactured by Daicel Chemical Industries, Ltd.) and the like, and bisphenol F type and bisphenol S type epoxy resins similar to these can also be mentioned. .

Epoxy acrylates such as Ebecryl 3700, 3701, and 600 (above, manufactured by Daicel UC Corporation) can also be used. Examples of the cresol novolak type include Epototo YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704, etc. (above, manufactured by Tohto Kasei Co., Ltd.), Denacol EM-125, etc. The biphenyl type is 3,5,3 ′, 5′-tetramethyl-4,4 ′
-Examples of alicyclic epoxy compounds such as diglycidylbiphenyl include Celoxide 2021, 2081, 2083, 2085, Epolide GT-301, GT-302, GT-401, GT-403, EHPE-3150 (above, Daicel Chemical Industries ( Santo Tote ST-3000, ST-4000, ST-5080, ST-5100, etc. (above, manufactured by Toto Kasei Co., Ltd.), Epiclon 430, 673, 695, 850S, 4032 (above, large) Nippon Ink Chemical Co., Ltd.). Also 1, 1, 2, 2
-Tetrakis (p-glycidyloxyphenyl) ethane, tris (p-glycidyloxyphenyl) methane, triglycidyltris (hydroxyethyl) isocyanurate, o-phthalic acid diglycidyl ester, terephthalic acid diglycidyl ester, and other amine-type epoxy Epototoy YH-434 and YH-434L which are resins, glycidyl ester in which dimer acid is modified in the skeleton of bisphenol A type epoxy resin, and the like can also be used.

Among these, “molecular weight / number of epoxy rings” is preferably 100 or more, and more preferably 130 to 500. If the “molecular weight / number of epoxy rings” is small, the curability is high, and the shrinkage during curing is large.
Specific preferred compounds include Epototo YD-115, 118T, 127, YDF-170, YDPN-638, YDPN-701, Plaxel GL-61, GL-62, 3,5,3 ', 5'-tetramethyl. -4,4 'diglycidyl biphenyl, celoxide 2021, 2081, epolide GT-302, GT-403, EHPE-3150, etc. are mentioned.

-(C-1) polymerizable compound-
The photosensitive coloring composition used in the present invention preferably contains (C-1) a polymerizable compound.
The polymerizable compound that can be used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and is a compound having at least one terminal ethylenically unsaturated bond, preferably two or more. To be elected. Such a compound group is widely known in the industrial field, and can be used without any particular limitation in the present invention. These have chemical forms such as monomers, prepolymers, i.e. dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxyl group, amino group or mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and a monofunctional or A dehydration condensation reaction product with a polyfunctional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or In addition, a substitution reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, isocyanuric acid There are EO-modified triacrylate and the like.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

  Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate. Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.

  Examples of other esters include aliphatic alcohol esters described in JP-B-51-47334 and JP-A-57-196231, JP-A-59-5240, JP-A-59- Those having an aromatic skeleton described in Japanese Patent No. 5241 and JP-A-2-226149, those containing an amino group described in JP-A-1-165613, and the like are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Specific examples of amide monomers of aliphatic polyvalent amine compounds and unsaturated carboxylic acids include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexamethylene bis. -Methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, xylylene bismethacrylamide and the like. Examples of other preferable amide monomers include those having a cyclohexylene structure described in JP-B No. 54-21726.

  In addition, urethane-based addition polymerizable compounds produced by using an addition reaction of isocyanate and hydroxyl group are also suitable, and specific examples thereof include, for example, one molecule described in JP-B-48-41708. A vinyl urethane containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxyl group represented by the following general formula (V) to a polyisocyanate compound having two or more isocyanate groups. Compounds and the like.

^{_{CH 2 = C (R 4)}} COOCH 2 CH (R 5) OH (V)
(However, R ⁴ and R ⁵ each independently represent H or CH _3. )

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, JP-B-2-16765, JP-B-58-49860, JP-B-56- Urethane compounds having an ethylene oxide skeleton described in JP 17654, JP-B 62-39417, and JP-B 62-39418 are also suitable. Furthermore, by using addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238. Can obtain a photopolymerizable composition having an excellent photosensitive speed.

  Other examples include polyester acrylates, epoxy resins and (meth) described in JP-A-48-64183, JP-B-49-43191 and JP-B-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as epoxy acrylates reacted with acrylic acid. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337, JP-B-1-40336, and vinylphosphonic acid compounds described in JP-A-2-25493 Etc. can also be mentioned. In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

About these polymerizable compounds, the details of usage such as the structure, single use or combination, addition amount, etc. can be arbitrarily set according to the performance design of the final photosensitive material. For example, it is selected from the following viewpoints.
From the viewpoint of sensitivity, a structure having a large unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, in order to increase the strength of the colored image portion, that is, the photosensitive coloring composition layer, those having three or more functionalities are preferable, and further, different functional numbers and different polymerizable groups (for example, acrylic ester, methacrylic ester, A method of adjusting both sensitivity and strength by using a styrene compound or a vinyl ether compound) is also effective. From the viewpoint of curing sensitivity, it is preferable to use a compound containing two or more (meth) acrylic acid ester structures, more preferably a compound containing three or more, and most preferably a compound containing four or more. preferable. Moreover, it is preferable to contain an EO modified body from a viewpoint of hardening sensitivity and the developability of an unexposed part. Moreover, it is preferable to contain a urethane bond from a viewpoint of hardening sensitivity and exposure part intensity | strength.
In addition, for the compatibility and dispersibility with other components (for example, binder polymer, initiator, colorant (pigment, dye, etc.) in the photosensitive coloring composition layer, the selection and use method of the addition polymerization compound is as follows. For example, compatibility may be improved by using a low-purity compound or using two or more compounds in combination, and selecting a specific structure for the purpose of improving adhesion to the substrate. There is also a possibility.

  From the above viewpoints, bisphenol A diacrylate, modified bisphenol A diacrylate EO, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate Acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxy D (I) Isocyanurate, pentaerythritol tetraacrylate EO modified product, dipentaerythritol hexaacrylate EO modified product, etc. are mentioned as preferable ones. Also, as commercially available products, urethane oligomer UAS-10, UAB-140 (Sanyo Kokusaku Pulp Co., Ltd.) Manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, and AI-600 (manufactured by Kyoeisha) are preferred.

  Among them, bisphenol A diacrylate EO modified product, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, pentaerythritol tetraacrylate EO modified product, Dipentaerythritol hexaacrylate EO modified products such as DPHA (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (Kyoeisha) Manufactured) is more preferable.

  (C-1) The content of the polymerizable compound is preferably 5 to 55% by mass and preferably 10 to 50% by mass in the total solid content in the photosensitive coloring composition layer of the present invention. More preferably, it is 15-45 mass%.

-(D) Photopolymerization initiator-
The photosensitive coloring composition of the present invention preferably contains (D) a photopolymerization initiator.
The photopolymerization initiator is a compound that is decomposed by light and starts and accelerates the polymerization of the polymerizable compound (C-1), and preferably has an absorption in a wavelength region of 300 to 500 nm. Moreover, the said photoinitiator can be used individually or in combination of 2 or more types.

  Examples of the photopolymerization initiator include organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, hexa Examples thereof include arylbiimidazole compounds, organic boric acid compounds, disulfonic acid compounds, oxime ester compounds, onium salt compounds, and acylphosphine (oxide) compounds.

Specific examples of organic halogenated compounds include Wakabayashi et al., “Bull Chem. Soc.
Japan 42, 2924 (1969), U.S. Pat. No. 3,905,815, JP-B 46-4605, JP-A 48-36281, JP-A 55-3070, JP JP 60-239736, JP 61-169835, JP 61-169837, JP 62-58241, JP 62-212401, JP 63-70243 JP, 63-298339, M .; P. Hutt “Journal of Heterocyclic Chemistry” 1 (No 3), (1970) ”, and the oxazole compound and s-triazine compound substituted with a trihalomethyl group.

  As the s-triazine compound, more preferably, an s-triazine derivative in which at least one mono-, di-, or trihalogen-substituted methyl group is bonded to the s-triazine ring, specifically, for example, 2,4,6- Tris (monochloromethyl) -s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6- Bis (trichloromethyl) -s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichloro Methyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloro) Methyl) -s-triazine, 2- (3,4-epoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl)- s-triazine, 2- [1- (p-methoxyphenyl) -2,4-butadienyl] -4,6-bis (trichloromethyl) -s-triazine, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (pi-propyloxystyryl) -4,6-bis (trichloromethyl)- s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-natoxynaphthyl) -4,6-bis (trichloromethyl) s-triazine, 2-phenylthio-4,6-bis (trichloromethyl) -s-triazine, 2-benzylthio-4,6-bis (trichloromethyl) -s-triazine, 4- (o-bromo-pN) , N- (diethoxycarbonylamino) -phenyl) -2,6-bis (trichloromethyl) -s-triazine, 2,4,6-tris (dibromomethyl) -s-triazine, 2,4,6-tris (Tribromomethyl) -s-triazine, 2-methyl-4,6-bis (tribromomethyl) -s-triazine, 2-methoxy-4,6-bis (tribromomethyl) -s-triazine, etc. It is done.

  Examples of the oxydiazole compound include 2-trichloromethyl-5-styryl-1,3,4-oxodiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3,4-oxodiazole, 2- Examples include trichloromethyl-5- (naphth-1-yl) -1,3,4-oxodiazole, 2-trichloromethyl-5- (4-styryl) styryl-1,3,4-oxodiazole, and the like. .

  Examples of the carbonyl compound include benzophenone, Michler ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone and other benzophenone derivatives, 2,2-dimethoxy-2 -Phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenylketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy -1- (p-dodecylphenyl) ketone, 2-methyl-1- (4 ′-(methylthio) phenyl) -2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1- (4-mol Forinophenyl) -butanone-1,2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, 1,1,1-trichloromethyl- (p-butylphenyl) ketone, 2-benzyl-2-dimethylamino- Acetophenone derivatives such as 4-morpholinobutyrophenone, thioxanthone derivatives such as thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone And benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate.

  Examples of the ketal compound include benzyl dimethyl ketal and benzyl-β-methoxyethyl ethyl acetal.

  Examples of the benzoin compound include m-benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, methyl o-benzoylbenzoate and the like.

  Examples of the acridine compound include 9-phenylacridine, 9-pyridylacridine, 9-pyrazinylacridine, 1,2-di (9-acridinyl) ethane, 1,3-di (9-acridinyl) propane, 1,4- Di (9-acridinyl) butane, 1,5-di (9-acridinyl) pentane, 1,6-di (9-acridinyl) hexane, 1,7-di (9-acridinyl) heptane, 1,8-di ( 9-acridinyl) octane, 1,9-di (9-acridinyl) nonane, 1,10-di (9-acridinyl) decane, 1,11-di (9-acridinyl) undecane, 1,12-di (9- Acridinyl) dodecane and other di (9-acridinyl) alkanes.

  Examples of the organic peroxide compound include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert-butylperoxide). Oxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroper Oxide, 1,1,3,3-tetramethylbutyl hydroperoxide, tert-butylcumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, 2 , -Oxanoyl peroxide, oxalic acid peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate , Dimethoxyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tert-butyl peroxyacetate, tert-butyl peroxypivalate, tert-butyl peroxyneodecanoate, tert- Butyl peroxyoctanoate, tert-butyl peroxylaurate, tersyl carbonate, 3,3 ′, 4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3 ′, 4,4 -Tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3 ', 4,4'-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxydihydrogen diphthalate), And carbonyldi (t-hexylperoxydihydrogen diphthalate).

  Examples of the azo compound include azo compounds described in JP-A-8-108621.

  Examples of the coumarin compound include 3-methyl-5-amino-((s-triazin-2-yl) amino) -3-phenylcoumarin, 3-chloro-5-diethylamino-((s-triazin-2-yl). ) Amino) -3-phenylcoumarin, 3-butyl-5-dimethylamino-((s-triazin-2-yl) amino) -3-phenylcoumarin, and the like.

  Examples of the azide compound include organic azide compounds described in U.S. Pat. No. 2,848,328, U.S. Pat. No. 2,852,379 and U.S. Pat. No. 2,940,553, 2,6-bis (4-azidobenzylidene) -4-ethyl. And cyclohexanone (BAC-E).

  Examples of the metallocene compound include JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2-4705, Various titanocene compounds described in JP-A-5-83588, such as di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, Di-cyclopentadienyl-Ti-bis-2,4-di-fluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, di- -Cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,4,5,6-pentaph Orofen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4,6-trifluoropheny -1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4 , 5,6-pentafluorophen-1-yl, iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109, and the like.

  As the hexaarylbiimidazole compound, for example, JP-B-6-29285, US Pat. Nos. 3,479,185, 4,311,783, 4,622,286, etc. And, specifically, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-bromophenyl) )) 4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 ′ -Bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) biidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5 '-Tetraphenylbi Dazole, 2,2′-bis (o-nitrophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-methylphenyl) -4,4 ′, 5 Examples include 5′-tetraphenylbiimidazole, 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, and the like.

  Examples of the organic borate compound include, for example, JP-A-62-143044, JP-A-62-1050242, JP-A-9-188865, JP-A-9-188686, and JP-A-9-188710. Publications, JP 2000-131837 A, JP 2002-107916 A, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, and Kunz, Martin “Rad Tech '98. Proceeding April 19 -22, 1998, Chicago ”etc., organic boron sulfonium complexes or organic boron described in JP-A-6-157623, JP-A-6-175564, and JP-A-6-175561. Oxosulfonium complex, JP-A-6-175554 JP, JP-A-6-175553, organoboron iodonium complex, JP-A-9-188710, organoboron phosphonium complex, JP-A-6-348011, JP-A-7-128785, JP Specific examples include organoboron transition metal coordination complexes such as 7-140589, JP-A-7-306527, and JP-A-7-292014.

  Examples of the disulfone compound include compounds described in JP-A No. 61-166544 and Japanese Patent Application No. 2001-132318.

  Examples of oxime ester compounds include J.M. C. S. Perkin II (1979) 1653-1660), J. MoI. C. S. Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, JP-A 2000-66385, JP-A 2000-80068, JP-T 2004-534797 And the compounds described. Specific examples include Irgacure OXE-01 and OXE-02 manufactured by Ciba Specialty Chemicals.

  Examples of onium salt compounds include S.I. I. Schlesinger, Photogr. Sci. Eng. 18, 387 (1974), T .; S. Diazonium salts described in Bal et al, Polymer, 21, 423 (1980), ammonium salts described in US Pat. No. 4,069,055, JP-A-4-365049, etc., US Pat. No. 4,069 , 055, 4,069,056, phosphonium salts described in European Patent Nos. 104,143, U.S. Pat. Nos. 339,049, 410,201. And iodonium salts described in JP-A-2-150848 and JP-A-2-296514.

  The iodonium salt that can be suitably used in the present invention is a diaryl iodonium salt, and is preferably substituted with two or more electron donating groups such as an alkyl group, an alkoxy group, and an aryloxy group from the viewpoint of stability. . In addition, as another preferable form of the sulfonium salt, an iodonium salt in which one substituent of the triarylsulfonium salt has a coumarin or an anthraquinone structure and absorption at 300 nm or more is preferable.

Examples of the sulfonium salt that can be suitably used in the present invention include European Patent Nos. 370,693, 390,214, 233,567, 297,443, and 297. No. 4,442, U.S. Pat. Nos. 4,933,377, 161,811, 410,201, 339,049, 4,760,013 No. 4,734,444, No. 2,833,827, German Patent No. 2,904,626, No. 3,604,580, No. 3,604 Examples thereof include sulfonium salts described in each specification of No. 581. From the viewpoint of stability, it is preferably substituted with an electron-withdrawing group. The electron withdrawing group preferably has a Hammett value greater than zero. Preferred electron-withdrawing groups include halogen atoms and carboxylic acids.
Other preferable sulfonium salts include sulfonium salts in which one substituent of the triarylsulfonium salt has a coumarin or anthraquinone structure and absorbs at 300 nm or more. As another preferable sulfonium salt, a sulfonium salt in which the triarylsulfonium salt has an allyloxy group or an arylthio group as a substituent and has absorption at 300 nm or more can be mentioned.

Moreover, as an onium salt compound, J.M. V. Crivello et al, Macromolecules, 10 (6), 1307 (1977), J. MoI. V. Crivello
et al, J. et al. Polymer Sci. , Polymer Chem. Ed. , 17, 1047 (1979), a selenonium salt described in C.I. S. Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988), and onium salts such as arsonium salts.

  Examples of the acylphosphine (oxide) compound include Irgacure 819, Darocur 4265, Darocur TPO and the like manufactured by Ciba Specialty Chemicals.

  (D) As a photopolymerization initiator, from the viewpoint of exposure sensitivity, a trihalomethyltriazine compound, a benzyldimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene Compound, oxime compound, triallylimidazole dimer, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound and derivatives thereof, cyclopentadiene-benzene-iron complex and salt thereof, halomethyloxadiazole compound, 3 -Compounds selected from the group consisting of aryl-substituted coumarin compounds are preferred.

  More preferred are trihalomethyltriazine compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, oxime compounds, triallylimidazole dimers, onium compounds, benzophenone compounds, acetophenone compounds, and trihalo compounds. Most preferred is at least one compound selected from the group consisting of a methyltriazine compound, an α-aminoketone compound, an oxime compound, a triallylimidazole dimer, and a benzophenone compound.

  (D) It is preferable that content of a photoinitiator is 0.1-20 mass% with respect to the total solid in a photosensitive coloring composition layer, More preferably, it is 0.5-15 mass%, Especially it is. Preferably it is 1-10 mass%. Within this range, good sensitivity and pattern formability can be obtained.

-(E) Solvent-
The photosensitive coloring composition used in the present invention can generally be prepared using a solvent.
Solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, lactic acid Ethyl, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. 3-oxypropionic acid alkyl esters (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate), methyl 2-oxypropionate, -2-oxypropionic acid alkyl esters such as ethyl oxypropionate and propyl 2-oxypropionate (for example, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, 2-ethoxypropion) Acid methyl, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, 2-ethoxy-2-methyl Ethyl propionate, etc.), and methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, 1,3-butanediol diacetate and the like;

  Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl Ether acetate, propylene glycol propyl ether acetate, diethylene glycol diethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, propylene glycol n -Propyl ether acetate, propylene glycol diacetate, propylene glycol n-butyl ether acetate, propylene glycol phenyl ether, propylene glycol phenyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol n-propyl ether acetate, dipropylene glycol n-butyl ether Acetate, tripropylene glycol mono n-butyl ether, tripropylene glycol methyl ether acetate and the like;

Ketones such as acetone, methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone;
Alcohols such as ethanol, isopropyl alcohol, propylene glycol methyl ether, propylene glycol mono n-propyl ether, propylene glycol mono n-butyl ether,
Aromatic hydrocarbons such as toluene, xylene and the like can be mentioned.

Among these, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate Butyl carbitol acetate, propylene glycol methyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate and the like are suitable.
You may use a solvent in combination of 2 or more types besides using it independently.

-Other additives-
In addition to the above components, various known additives can be used in the photosensitive coloring composition used in the present invention depending on the purpose.
Hereinafter, such additives will be described.

(Dispersant)
The photosensitive coloring composition in the present invention preferably contains a polymer dispersant. This polymer dispersant is a resin having a weight average molecular weight in the range of 3,000 to 100,000. Furthermore, it is preferable that an acid value is 20-300 mg / g. Hereinafter, such a specific polymer dispersant may be simply referred to as “dispersion resin”.
The dispersing resin in the present invention is a pigment dispersing agent mentioned as the colorant (A-1) or a photosensitive dark color composition for forming a black matrix, which will be described later. It is a compound that can function as a dispersant.
Since the dispersion resin needs to have a specific acid value, it is preferably a polymer compound having an acidic group.

  Examples of the polymer skeleton of the polymer compound include polymers or copolymers of vinyl monomers, ester polymers, ether polymers, urethane polymers, amide polymers, epoxy polymers, silicone polymers, and modified products thereof. Or a copolymer [for example, a polyether / polyurethane copolymer, a copolymer of a polyether / vinyl monomer polymer, etc. (any of a random copolymer, a block copolymer, and a graft copolymer) Good). At least one selected from the group consisting of vinyl monomers, selected from the group consisting of polymers or copolymers of vinyl monomers, ester polymers, ether polymers, urethane polymers, and modified products or copolymers thereof. At least one kind is more preferable, and a polymer or copolymer of vinyl monomers is particularly preferable.

Examples of a method for introducing an acidic group into the polymer skeleton as described above include, for example, a method of copolymerizing a monomer containing an acidic group when polymerizing the polymer skeleton, and the polymer described above. There is a method of introducing a skeleton by polymer reaction after polymerization.
Examples of the monomer containing an acidic group include (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, cinnamic acid, acrylic acid dimer, vinyl benzoic acid, styrene sulfonic acid, 2-acrylamide-2- It is obtained by reacting an alcoholic hydroxyl group-containing monomer such as methylpropanesulfonic acid, mono (meth) acryloyl ethyl phosphate, or 2-hydroxyethyl methacrylate with a cyclic acid anhydride such as maleic anhydride or phthalic anhydride. And monomers.

Furthermore, the polymer compound having an acidic group may further be obtained by copolymerizing a vinyl monomer component.
The vinyl monomer is not particularly limited. For example, (meth) acrylic acid esters, crotonic acid esters, vinyl esters, maleic acid diesters, fumaric acid diesters, itaconic acid diesters, (meth) acrylamides , Vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like are preferable.

  Preferred examples of the “acidic group” include a carboxylic acid group, a sulfonic acid group, a monosulfate group, a phosphoric acid group, a monophosphate group, and a boric acid group. Sulfuric acid ester groups, phosphoric acid groups, and monophosphoric acid ester groups are more preferable, and carboxylic acid groups, sulfonic acid groups, and phosphoric acid groups are particularly preferable.

Moreover, it is also preferable to contain the group which has a basic nitrogen atom for a dispersibility improvement. The group having a basic nitrogen atom is, for example, an amino group (—NH ₂ ), a substituted imino group (—NHR ⁸ or —NR ⁹ R ¹⁰ ; where R ⁸ , R ⁹ , and R ¹⁰ are each Independently, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms), a guanidyl group represented by the following chemical formula (a1), or the following chemical formula Preferred examples include the amidinyl group represented by (a2).

In the chemical formula (a1), R ¹¹ and R ¹² each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms.
In the chemical formula (a2), R ¹³ and R ¹⁴ each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms.

Among these, an amino group (—NH ₂ ), a substituted imino group (—NHR ⁸ , or —NR ⁹ R ¹⁰ ; where R ⁸ , R ⁹ , and R ¹⁰ each independently has 1 to 10 carbon atoms. A guanidyl group represented by the chemical formula (a1) [in the chemical formula (a1), R ¹¹ and R ¹² are each independently an alkyl having 1 to 10 carbon atoms. Represents a group, a phenyl group, or a benzyl group. ] An amidinyl group represented by the chemical formula (a2) [in the chemical formula (a2), R ¹³ and R ¹⁴ each independently represents an alkyl group having 1 to 10 carbon atoms, a phenyl group, or a benzyl group. And the like include groups consisting of 1 to 200 hydrogen atoms and 0 to 20 sulfur atoms, which may be unsubstituted or may further have a substituent.

(Other dispersants)
The photosensitive coloring composition used in the present invention can be used in combination with a conventionally known dispersant (pigment dispersant) in addition to the dispersion resin.

Known dispersants (pigment dispersants) include polymer dispersants [for example, polyamidoamines and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified poly (meth) acrylates, (meth) acrylic types. Copolymers], polyoxyethylene alkyl phosphate esters, polyoxyethylene alkyl amines, alkanol amines, pigment derivatives, and the like.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.

  The polymer dispersant is adsorbed on the surface of the pigment and acts to prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures. On the other hand, the pigment derivative has an effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.

  Specific examples of known dispersants (pigment dispersants) that can be used in the present invention include "Disperbyk-107 (carboxylic acid ester), 130 (polyamide), 161, 162, 163, 164, 165, 166" manufactured by BYK Chemie. , 170 (polymer copolymer) ”,“ EFKA 4047, 4050, 4010, 4165 (polyurethane type), EFKA 4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyesteramide) manufactured by EFKA ), 6220 (fatty acid polyester), 6745 (phthalocyanine derivative), 6750 (azo pigment derivative) "," Ajisper PB821, PB822 "manufactured by Ajinomoto Fine Techno Co., Ltd.," Floren TG-710 (urethane oligomer) "manufactured by Kyoeisha Chemical Co., Ltd., Poly Low No. 50E, No. 300 (acrylic copolymer) ”,“ Dispalon # 7004 (polyetherester), DA-703-50, DA-705, DA-725 ”manufactured by Enomoto Kasei Co., Ltd.,“ “Emulgen 920, 930, 935, 985 (polyoxyethylene nonylphenyl ether)”, “acetamine 86 (stearylamine acetate)”, “Solsperse 5000 (phthalocyanine derivative), 22000 (azo pigment derivative), 13240 (polyester) manufactured by Lubrizol Corporation Amine), 3000, 17000, 27000 (polymer having a functional part at the end), 24000, 28000, 32000, 38500 (graft type polymer) "," Nikkor T106 (polyoxyethylene sorbitan monooleate) "manufactured by Nikko Chemical Co., Ltd. , M YS-IEX (polyoxyethylene monostearate) ”and the like.

  The above-mentioned known dispersants can be used in the range of 10 to 100% by mass, that is, 1/10 to 1/1 (equivalent) with respect to the dispersion resin as necessary.

(Surfactant)
When the pigment concentration is increased, the thixotropy of the coating solution is generally increased. Therefore, film thickness unevenness after the photosensitive colored composition layer (colored layer coating film) is formed by applying or transferring the photosensitive colored composition on the substrate. It is easy to produce. In particular, in the formation of the photosensitive coloring composition layer (colored layer coating film) by the slit coating method, the coating liquid for forming the photosensitive coloring composition layer may be leveled before drying to form a coating film having a uniform thickness. is important. For this reason, it is preferable to contain an appropriate surfactant in the photosensitive coloring composition. Preferred examples of the surfactant include surfactants disclosed in JP-A Nos. 2003-337424 and 11-133600.
Nonionic surfactants, fluorine-based surfactants, silicon-based surfactants, and the like are added as surfactants for improving coating properties.

  Nonionic surfactants include, for example, polyoxyethylene glycols, polyoxypropylene glycols, polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, polyoxypropylene alkyl ethers. Nonionic surfactants such as polyoxypropylene alkyl aryl ethers, polyoxypropylene alkyl esters, sorbitan alkyl esters and monoglyceride alkyl esters are preferred.

Specifically, polyoxyalkylene glycols such as polyoxyethylene glycol and polyoxypropylene glycol; polyoxyalkylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxypropylene stearyl ether and polyoxyethylene oleyl ether; polyoxy Polyoxyethylene aryl ethers such as ethylene octyl phenyl ether, polyoxyethylene polystyryl ether, polyoxyethylene tribenzyl phenyl ether, polyoxyethylene-propylene polystyryl ether, polyoxyethylene nonylphenyl ether; polyoxyethylene dilaurate , Polyoxyalkylene dialkyl esters such as polyoxyethylene distearate, sorbitan fatty acid ester There are nonionic surfactants such as stealth and polyoxyalkylene sorbitan fatty acid esters.

  Specific examples of these include, for example, Adeka Pluronic series, Adecanol series i, Tetronic series (above ADEKA Co., Ltd.), Emulgen series, Rheodor series (above Kao Co., Ltd.), Eleminor series, Nonipol Series, Octapole series, Dodecapole series, New Pole series (Sanyo Kasei Co., Ltd.), Pionein series (Takemoto Yushi Co., Ltd.), Nissan Nonion series (Nippon Yushi Co., Ltd.), etc. is there. These commercially available products can be used as appropriate. A preferable HLB value is 8 to 20, more preferably 10 to 17.

As the fluorosurfactant, a compound having a fluoroalkyl or fluoroalkylene group in at least one of the terminal, main chain and side chain can be suitably used.
Specific commercial products include, for example, MegaFuck F142D, F172, F173, F176, F176, F177, F183, 780, 781, R30, R08 (Dainippon Ink Co., Ltd.), Florard FC -135, FC-170C, FC-430, FC-431 (Sumitomo 3M), Surflon S-112, S-113, S-131, S-141, S-145 S-382, SC-101, SC-102, SC-103, SC-104, SC-105, SC-105, SC-106 (manufactured by Asahi Glass Co., Ltd.), Ftop EF351, 352, 801 and 802 (manufactured by JEMCO).

  Examples of the silicone-based surfactant include Torre Silicone DC3PA, DC7PA, SH11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH-190, SH-193, SZ-6032, and SF-8428. DC-57, DC-190 (above, manufactured by Toray Dow Corning Silicone Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4442 (above GE Toshiba Silicone Co., Ltd.).

  These surfactants are preferably used in an amount of 5 parts by mass or less, more preferably 2 parts by mass or less, with respect to 100 parts by mass of the coating liquid for forming the photosensitive coloring composition layer. When the amount of the surfactant exceeds 5 parts by mass, surface roughness is likely to occur during coating and drying, and the smoothness tends to deteriorate.

  In order to promote alkali solubility of the uncured portion and further improve the developability of the photocurable composition, an organic carboxylic acid, preferably a low molecular weight organic carboxylic acid having a molecular weight of 1000 or less is added. be able to. Specifically, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, mesitylene acid; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, Aromatic polycarboxylic acids such as trimesic acid, melophanoic acid, pyromellitic acid; phenylacetic acid Others such as phenoxyacetic acid, methoxyphenoxyacetic acid, hydroatropic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, umberic acid Carboxylic acid is mentioned.

(Alkoxysilane compound)
In the photosensitive coloring composition used in the present invention, an alkoxysilane compound, especially a silane coupling agent, can be used from the viewpoint of improving adhesion to the substrate.
The silane coupling agent preferably has an alkoxysilyl group as a hydrolyzable group that can be chemically bonded to an inorganic material, and (meth) acryloyl or phenyl exhibiting affinity through interaction or bond formation with an organic resin. , Mercapto and epoxysilane, and (meth) acryloylpropyltrimethoxysilane is more preferable among them.
When the silane coupling agent is used, the addition amount is preferably in the range of 0.2 to 5.0% by mass in the total solid content in the photosensitive coloring composition layer used in the present invention. 5-3.0 mass% is more preferable.

(Co-sensitizer)
The photosensitive coloring composition used in the present invention preferably contains a co-sensitizer if desired. In the present invention, the co-sensitizer has functions such as further improving the sensitivity of the sensitizing dye and the initiator to actinic radiation or suppressing inhibition of polymerization of the polymerizable compound by oxygen.
Examples of such cosensitizers include amines such as M.I. R. Sander et al., “Journal of Polymer Society”, Vol. 10, 3173 (1972), Japanese Patent Publication No. 44-20189, Japanese Patent Publication No. 51-82102, Japanese Patent Publication No. 52-134692, Japanese Patent Publication No. 59-138205. , JP-A-60-84305, JP-A-62-18537, JP-A-64-33104, Research Disclosure 33825, and the like. Specific examples include triethanolamine. P-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline and the like.

  Other examples of co-sensitizers include thiols and sulfides such as thiol compounds described in JP-A-53-702, JP-B-55-500806, JP-A-5-142772, No. 56-75643, such as 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, β-mercapto. And naphthalene.

  Other examples of the co-sensitizer include amino acid compounds (eg, N-phenylglycine), organometallic compounds described in JP-B-48-42965 (eg, tributyltin acetate), JP-B 55- Examples include a hydrogen donor described in Japanese Patent No. 34414, a sulfur compound (eg, trithiane) described in Japanese Patent Laid-Open No. 6-308727, and the like.

  The content of these co-sensitizers is in the range of 0.1 to 30% by mass with respect to the mass of the total solid content of the curable composition from the viewpoint of improving the curing rate due to the balance between polymerization growth rate and chain transfer. Preferably, the range of 1-25 mass% is more preferable, and the range of 0.5-20 mass% is still more preferable.

(Polymerization inhibitor)
In the present invention, a small amount of a thermal polymerization inhibitor is added in order to prevent unnecessary thermal polymerization of a compound having an ethylenically unsaturated double bond that can be polymerized during production or storage of the photosensitive coloring composition. Is desirable.
Examples of the thermal polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6). -T-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.

  The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass in the photosensitive coloring composition layer. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition due to oxygen, and it may be unevenly distributed on the surface of the photosensitive layer in the course of drying after coating. . The amount of the higher fatty acid derivative added is preferably about 0.5% by mass to about 10% by mass of the total composition.

(Plasticizer)
Furthermore, in the present invention, in order to improve the physical properties of the photosensitive coloring composition layer, an inorganic filler, a plasticizer, a fat-sensitizing agent that can improve the ink inking property on the surface of the photosensitive layer, and the like may be added. .
Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. 10 mass% or less can be added with respect to the total mass of the compound which has an ionic unsaturated double bond, and a binder.

  By using the above-described components, the photosensitive coloring composition of the present invention is cured with high sensitivity and has good storage stability. Moreover, the high adhesiveness to a board | substrate is shown. Therefore, the photosensitive coloring composition containing the various components can be preferably used for a color filter.

<Photosensitive dark color composition>
The photosensitive dark color composition used in the present invention contains (A-2) a light-shielding agent, (B) a binder polymer, (C-2) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent. Preferably, other additives such as a dispersant and a surfactant can be contained as required.

-(A-2) Shading agent-
(A-2) Examples of the light-shielding agent include carbon black, titanium black, metal fine particles, metal oxides, and sulfide fine particles in addition to the colorant (A-1). Of these, carbon black is particularly preferred because of its excellent balance between light shielding properties and cost.
These are used singly or in combination as required. For example, carbon black alone, a mixture of organic pigments, and a combination of carbon black and organic pigments.
As a light-shielding material, conventionally, as a black colorant, at least two kinds of pigments have been used in combination so as to shield the visible light region. Examples of these pigments include the pigments described in JP-A-2005-17716 [0038] to [0040] and JP-A-2005-17521 [0080] to [0088]. The formation of the used light shielding layer is disclosed in JP-A-7-271020.
In order to further increase the light shielding effect, in Japanese Patent Laid-Open No. 2000-147240, Japanese Patent Laid-Open No. 2000-143985, Japanese Patent Laid-Open No. 2005-338328, Japanese Patent Laid-Open No. 2006-154849, etc., carbon black, titanium black, or graphite is a suitable light-shielding material. Has been developed as. In the present invention, carbon black is preferable as one of the light shielding materials from the viewpoint of light shielding properties and cost.

As an example of carbon black, pigment black 7 (carbon black) is preferable. Examples of the carbon black include carbon blacks # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 970, # 960, # 950, # 900, # 850, MCF88, #M manufactured by Mitsubishi Chemical Corporation. 650, MA600, MA7, MA8, MA11, MA100, MA220, IL30B, IL31B, IL7B, IL11B, IL52B, # 4000, # 4010, # 55, # 52, # 50, # 47, # 45, # 44, # 40 , # 33, # 32, # 30, # 20, # 10, # 5, CF9, # 3050, # 3150, # 3250, # 3750, # 3950, Diamond Black A, Diamond Black N220M, Diamond Black N234, Diamond Black I, Diamond Black LI, Diamond Black II, Diamond Black N33 Diamond Black SH, Diamond Black SHA, Diamond Black LH, Diamond Black H, Diamond Black HA, Diamond Black SF, Diamond Black N550M, Diamond Black E, Diamond Black G, Diamond Black R, Diamond Black N760M, Diamond Black LP; Degussa Carbon Black Color
Black FW200, Color Black FW2, Color Black
FW1, Color Black FW18, Color Black S170, Color Black S160, Special Black6, Special Black5, Special Black4, Special BlackU, P 400R, REGAL XC72, VULCAN XC72R, MOGUL L, MONARCH 1400, MONARCH 1000, BLACK PEARLS 1400; carbon black SUNBLACK900, 910, 930, 960, and 970 manufactured by Asahi Carbon Co. Also preferred are those coated with a polymer compound in order to increase the electric resistance. The preferred single particle size of these carbon blacks is 10 to 100 nm, more preferably 10 to 50 nm.

-(C-2) polymerizable compound-
As the polymerizable compound (C-2) polymerizable compound in the photosensitive dark color composition for forming the black matrix, the polymerizable compound (C-1) used in the photosensitive coloring composition is also preferable. The following are particularly preferable.
The polymerizable compound in the photosensitive dark composition is preferably a monomer or oligomer that has two or more ethylenically unsaturated double bonds and undergoes addition polymerization upon irradiation with light. Examples of such monomers and oligomers include compounds having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure. Examples include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) ) Acrylate, trimethylolethane triacrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, di Pentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexane All di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; multifunctional such as trimethylolpropane and glycerin Polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding ethylene oxide or propylene oxide to alcohol and then (meth) acrylated can be mentioned.

An acidic polyfunctional photocurable compound is also a preferred compound. Examples of the acidic polyfunctional photocurable compound include (1) a monomer or oligomer having a hydroxyl group and three or more photocurable functional groups, which is modified with a dibasic acid anhydride to introduce a carboxyl group, (2) Introducing a carboxyl group by adding a compound having a glycidyl group or an isocyanate group and a COOH group to a monomer or oligomer having a hydroxyl group and three or more photocurable functional groups, or (3) three or more Those having a sulfonic acid group introduced by modifying an aromatic compound having a photocurable functional group with concentrated sulfuric acid or fuming sulfuric acid can be used. Moreover, you may use the oligomer which contains the monomer which is an acidic polyfunctional photocurable compound itself as a repeating unit as an acidic polyfunctional photocurable compound.
As an example of an acidic polyfunctional photocurable compound, what is represented by the following general formula (i) and general formula (ii) is preferable. In general formula (i) and general formula (ii), when T or G is an oxyalkylene group, the terminal on the carbon atom side is bonded to R, X, and W.

In general formula (i), R represents a (meth) acryloyloxy group, and X represents a —COOH group or an —OPO ₃ H ₂ group. T represents an oxyalkylene group, wherein the alkylene group has 1 to 4 carbon atoms. n is 0-20.
In general formula (ii), W represents R or X in general formula (i), and 3 or more Ws are R among 6 Ws. G is synonymous with T in the general formula (i). Z is, -O- or represents _{-OC = ONH (CH 2) qNHCOO-} . p is 0-20 and q is 1-8. A plurality of R, X, T, and G present in one molecule may be the same or different.

  As a commercial item of the acidic polyfunctional photocurable compound represented by general formula (i) and general formula (ii), for example, TO-756 which is a carboxyl group-containing trifunctional acrylate manufactured by Toagosei Co., Ltd., and And TO-1382 which is a carboxyl group-containing pentafunctional acrylate.

  Further, urethane acrylates described in JP-B-48-41708, JP-B-50-6034 and JP-A-51-37193; JP-A-48-64183, JP-B-49-43191 And polyester acrylates described in Japanese Patent Publication No. 52-30490; polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid. Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, the above carboxyl group-containing pentafunctional acrylate, etc. Is preferred. In addition, “polymerizable compound B” described in JP-A-11-133600 can also be mentioned as a preferable example.

  The content of the polymerizable compound (C-2) in the photosensitive dark color composition used for forming the black matrix is 5 to 50% by mass in the total solid content of the photosensitive dark color composition layer. Preferably, it is 7-40 mass%, More preferably, it is 10-35 mass%.

  The (B) binder polymer, (D) polymerization initiator, (E) solvent, and other additives used in the photosensitive dark color composition are the same as those in the above-described photosensitive coloring composition for forming a colored pattern. The preferred content is also the same.

<Color filter>
The color filter of the present invention is a color filter manufactured by the method for manufacturing a color filter of the present invention, and has an overlap portion where a black matrix and a colored pattern overlap, and the distance of the overlap portion in the width direction of the black matrix Is 1.0 to 12 μm.
The color filter of the present invention produced by the method for producing a color filter of the present invention using the photosensitive coloring composition and the photosensitive dark color composition has a low horn height and an appropriate overlap distance. Therefore, high-quality display is possible. It is preferable that the distance of the overlap portion is 1.0 to 12 μm, and the height of the horn is 0.50 μm or less.

<Liquid crystal display device>
The liquid crystal display device of the present invention is a liquid crystal display device provided with the color filter of the present invention. Therefore, a high-quality image can be displayed.
For the spacer, a production method by coating or a production method by transfer can be suitably used. The production method by coating is preferable in that the process is simple. A manufacturing method by transfer is preferable in that the spacer height is uniform. Regarding the production method by transfer, the method described in Japanese Patent Application No. 2007-185797 is particularly preferred.
For the definition of display devices and explanation of each display device, refer to “Electronic Display Devices (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Devices (Junaki Ibuki, Industrial Books Co., Ltd.) Issue)). The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”.

The present invention is particularly effective for a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention is applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, IPS, OCS, FFS, and R-OCB. Applicable. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".
In addition to the color filter, the liquid crystal display device includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film. The substrate with a light-shielding film of the present invention can be applied to a liquid crystal display device composed of these known members.
For example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, Ltd., issued by CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” (Table Yoshiyoshi) Fuji Chimera Research Institute, published in 2003) ”.

For the backlight, SID meeting Digest 1380 (200
5) (A. Konno et.al) and Monthly Display December 2005 issue 18
-24 pages (Yasuhiro Shima) and 25-30 pages (Takaaki Yagi).
The color filter of the present invention can achieve a high contrast when combined with a conventionally known three-wavelength cold-cathode tube, but by using red, green and blue LED light sources (RGB-LED) as backlights. A liquid crystal display device with high luminance and high color purity and good color reproducibility can be provided.

On the other hand, the performance required for the liquid crystal display device is to improve the response speed of the image. In order to improve the response speed, the liquid crystal alignment speed has been improved. On the other hand, from the structural aspect of the cell, it is necessary to reduce the thickness of the liquid crystal layer in terms of cost reduction. Another technique necessary for reducing the thickness of the liquid crystal layer is to reduce the alignment disorder of the liquid crystal at the boundary between the colored pixels and the black matrix. Therefore, it is required to reduce the bulge (horn) at the boundary between the colored pixel and the black matrix.
In the color filter manufactured by the method for manufacturing a color filter of the present invention, a photosensitive dark color composition layer for forming a black matrix is provided with an undercut of −2.0 to 5.0 μm, and a colored pattern (colored pixel) A horn can be made small because the distance of the overlap part of the photosensitive coloring composition layer for formation and a black matrix is 2.0-9.0 micrometers.

  As described above, since the color filter of the present invention has a small horn, it is possible to reduce the disorder of the alignment of the liquid crystal in the overlap portion, and the visibility when displaying an image is improved. By using the color filter of the present invention in the liquid crystal display device of the present invention, the overlapping portion of each colored pixel with the black matrix can be flattened, and when the flatness is good, the liquid crystal layer can be made thin. In addition, it is not necessary to polish or provide a planarizing layer before laying the transparent electrode ITO, which can contribute to streamlining of the process and cost reduction and mass productivity.

  The present invention will be described more specifically with reference to the following examples. The materials, reagents, ratios, equipment, operations, and the like shown in the following examples can be appropriately changed without departing from the scope of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In the following examples, “%” and “parts” represent “mass%” and “parts by mass” unless otherwise specified, and the molecular weight indicates the weight average molecular weight. “Wt%” represents “mass%”.

Example 1
<1. Preparation of photosensitive dark color composition>
-Preparation of carbon black dispersion (K-1)-
A carbon black dispersion (K-1) was prepared according to the following formulation.
・ Carbon black (Color Black FW2 manufactured by Degussa) ・ ・ 26.7 parts ・ Dispersant (Dispalon DA7500 manufactured by Enomoto Kasei Co., Ltd., acid value 26, amine value 40)
... 3.3 parts benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio]) copolymer (molecular weight 30,000, 50% solution of propylene glycol monomethyl ether acetate) ... 10 parts propylene glycol Monomethyl ether acetate 60 parts

  The above components were stirred for 1 hour using a homogenizer under the condition of 3000 rpm. The obtained mixed solution was finely dispersed for 8 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads to obtain a carbon black dispersion (K-1). It was.

  Using the obtained carbon black dispersion liquid (K-1), a photosensitive dark color composition coating liquid CK-1 was prepared according to the formulation shown in Table 1 below. Numerical values in Table 1 indicate mass ratios.

Details of each component in Table 1 are as follows.
Resin solution C-2: benzyl methacrylate / methacrylic acid (= 85/15 molar ratio) copolymer (Mw 10,000, 50 wt% solution of propylene glycol monomethyl ether acetate)
UV curable resin C-3: trade name Cyclomer P ACA-250 manufactured by Daicel Chemical Industries, Ltd. [Acrylic copolymer having alicyclic, COOH, and acryloyl groups in the side chain, propylene glycol monomethyl ether acetate Solution (solid content: 50%)]
Polymerizable compound C-5: trade name TO-1382 manufactured by Toagosei Co., Ltd. (The main component is a monomer having a pentafunctional acryloyl group in which part of the terminal OH group of dipentaerythritol pentaacrylate is substituted with a COOH group. )
・ Initiator C-7: Trade name “OXE-02” Ciba Specialty Chemicals Co., Ltd. ・ Surfactant C-8: Trade name “Megafac R30” Dainippon Ink & Chemicals, Inc. ・ Solvent: PGMEA = Propylene glycol monomethyl ether acetate EEP = 3-Ethoxyethyl propionate

<2. Formation of black matrix by coating>
-Photosensitive dark color composition layer forming step-
The film after post-baking using the slit coater (model number HC6000, made by Hirata Kiko Co., Ltd.) on the glass substrate (Corning Millennium 0.7mm thickness) which washed the photosensitive deep color composition CK-1 obtained. Coating was performed at a coating speed of 120 mm / second by adjusting the interval between the slit and the glass substrate and the discharge amount so that the thickness was 1.1 μm.

-Pre-bake process, exposure process-
Subsequently, after heating (prebaking treatment) at 90 ° C. for 120 seconds using a hot plate, exposure was performed at 60 mJ / cm ² using a proximity type exposure machine (model number LE5565A manufactured by Hitachi High-Technology Corporation).

-Development process-
Then, it developed with the horizontal conveyance type developing device. That is, a 1.0% developer of a potassium hydroxide developer CDK-1 (manufactured by FUJIFILM Electronics Materials Co., Ltd.) (1 part of CDK-1 and 99 parts of pure water diluted at 23 ° C.) Then, the shower pressure was set to 0.10 MPa, development was performed for 55 seconds, and washing with pure water was performed to obtain a black matrix after development. Here, when the line width of the black matrix was measured with a micro length measuring machine, it was 23.4 μm. Moreover, when the cross-sectional photograph was image | photographed with SEM and the length of the undercut was measured, it was 1.0 micrometer.
SEM imaging was performed by cutting the black matrix together with the substrate in the width direction of the black matrix and perpendicular to the substrate surface in the vicinity of the center of the long side of the black matrix. Further, development was carried out by changing the development temperature to 22 ° C. and 24 ° C. (23 ° C. ± 1 ° C.), and the line width and undercut length (undercut amount) under these development conditions were measured. Each difference was made into Δ line width and Δ undercut.

-Bake process-
Next, a post-baking process is performed for 40 minutes in a 220 ° C. clean oven, and a black pixel substrate having a colored pixel formation area of 90 μm × 200 μm, a black matrix thickness of 1.2 μm, and a black matrix line width of about 25 μm Formed.
Using X-Rite 361T (V) (manufactured by Sakata Inx Engineering Co., Ltd.)
The optical density (OD) of the finished black matrix was measured and found to be 4.1.

<3. Preparation of photosensitive coloring composition>
-3-1. Preparation of photosensitive coloring composition coating liquid CR-1 for red (R)-
A red (R) dispersion (R-1) was prepared according to the following formulation.
Pigment Red 254 (average particle diameter 43 nm in SEM observation) 11 parts Pigment Red 177 (average particle diameter 58 nm in SEM observation) 4 parts Dispersion resin A-3 shown below 5 parts・ Dispersant (trade name: Disperbyk-161, manufactured by Big Chemie)
(30% solution of propylene glycol monomethyl ether acetate) 3 parts, alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 75/25 [molar ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl Ether acetate solution (solid content: 50%) ... 9 parts ・ Solvent B: Propylene glycol monomethyl ether acetate ... 68 parts

  The above components were stirred for 1 hour using a homogenizer at 3000 rpm. The obtained mixed solution was subjected to fine dispersion treatment for 4 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads, and a red (R) dispersion (R-1). Got. When observed again by SEM, the average particle size was 36 nm.

Using the obtained red (R) dispersion liquid (R-1), a photosensitive coloring composition coating liquid CR-1 for red (R) was prepared according to the following formulation.
-Red (R) dispersion (R-1)-100 parts-Epoxy resin: (trade name EHPE3150, manufactured by Daicel Chemical Industries, Ltd.-2 parts-Polymerizable compound: Dipentaerythritol penta-hexaacrylate- 8 parts Polymerization initiator: 4- (o-bromo-pN, N-di (ethoxycarbonylmethyl) amino-phenyl) -2,6-di (trichloromethyl) -s-triazine ... 1 part -Polymerization initiator: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 ... 1 part-Polymerization initiator: Diethylthioxanthone-0.5 part-Polymerization inhibitor : P-methoxyphenol ・ ・ ・ 0.001 part ・ Fluorosurfactant (trade name: Megafac R30, manufactured by Dainippon Ink & Chemicals, Inc.)
・ ・ ・ 0.01 part ・ Nonionic surfactant (trade name: Tetronic R150, manufactured by ADEKA)
・ ・ ・ 0.2 parts ・ Solvent: Propylene glycol n-butyl ether acetate ・ ・ ・ 30 parts ・ Solvent: Propylene glycol monomethyl ether acetate ・ ・ ・ 100 parts A product coating solution CR-1 was obtained.

-3-2. Preparation of photosensitive coloring composition coating liquid CG-1 for green (G)
A green (G) dispersion (G-1) was prepared according to the following formulation.
Pigment Green 36 (average particle diameter 47 nm in SEM observation) 11 parts Pigment Yellow 150 (average particle diameter 39 nm in SEM observation) 7 parts Dispersion resin A-3 shown below 5 parts Dispersant (trade name: Disperbyk-161, 30% solution manufactured by Big Chemie)
... 3 parts, alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 85/15 [molar ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl ether acetate solution (solid content: 50%))・ ・ ・ 11 parts ・ Solvent: Propylene glycol monomethyl ether acetate ・ ・ ・ 70 parts

  The above components were stirred for 1 hour using a homogenizer under the condition of 3000 rpm. The obtained mixed solution was finely dispersed for 8 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads, and a green (G) dispersion (G-1 )

Using the obtained green (G) dispersion liquid (G-1), a photosensitive coloring composition coating liquid CG-1 for green (G) was prepared according to the following formulation. When observed again by SEM, the average particle size was 32 nm.
-Green (G) dispersion (G-1) ... 100 parts-Epoxy resin: (trade name EHPE3150, manufactured by Daicel Chemical Industries) ... 2 parts-Polymerizable compound: Dipentaerythritol penta-hexaacrylate .. 8 parts Polymerizable compound: Tetra (ethoxy acrylate) of pentaerythritol 2 parts Polymerization initiator: 1,3-bistrihalomethyl-5-benzooxolantolyazine
... 2 parts-Polymerization initiator: 2-Benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 ... 1 part-Polymerization initiator: Diethylthioxanthone ... 0.5 Part / polymerization inhibitor: p-methoxyphenol 0.001 part / fluorine-based surfactant (trade name: Megafac R08, manufactured by Dainippon Ink & Chemicals, Inc.)
・ ・ ・ 0.02 parts ・ Nonionic surfactant (trade name: Emulgen A-60, manufactured by Kao Corporation) ・ ・ ・ ・ 0.5 parts ・ Solvent: Propylene glycol monomethyl ether acetate 120 parts ・ Solvent: Propylene glycol n-Propyl ether acetate ... 30 parts The above composition was mixed and stirred to obtain a photosensitive coloring composition coating solution CG-1 for green (G).

− 3-3. Preparation of photosensitive coloring composition coating solution CB-1 for blue (B)
A blue (B) dispersion (B-1) was prepared according to the following formulation.
Pigment Blue 15: 6 (average particle diameter 55 nm in SEM observation) 14 parts Pigment Violet 23 (average particle diameter 61 nm in SEM observation) 1 part Dispersion resin A-3 below 5 parts, dispersant (trade name: Disperbyk-161, 30% solution manufactured by Big Chemie)
... 3 parts ・ Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 80/20 [molar ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)・ ・ ・ 4 parts ・ Solvent: Propylene glycol monomethyl ether acetate 73 parts

  The above components were stirred for 1 hour using a homogenizer at 3000 rpm. The obtained mixed solution was finely dispersed for 4 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads, and a blue (B) dispersion (B-1 ) When observed again by SEM, the average particle size was 39 nm.

Using the obtained blue (B) dispersion liquid (B-1), a blue (B) photosensitive coloring composition coating liquid CB-1 was prepared according to the following formulation.
-Blue (B) dispersion (B-1) ... 100 parts-Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer
(= 80/20 [molar ratio] copolymer, molecular weight 30,000), propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)) ... 7 parts Epoxy resin: (trade name Celoxide 2080 Daicel Chemical) (Made by Kogyo Co., Ltd.) ... 2 parts UV curable resin: (trade name Cyclomer P ACA-250 made by Daicel Chemical Industries)
(Acrylic copolymer having alicyclic, COOH and acryloyl groups in the side chain, propylene glycol monomethyl ether acetate solution (solid content: 50% by mass) ... 4 parts Polymerizable compound: Dipentaerythritol penta Hexaacrylate ... 12 parts-Polymerization initiator: 1- (9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl) -1- (o-acetyloxime) ethanone ... 3 parts ・ Polymerization inhibitor: p-methoxyphenol 0.001 part ・ Fluorosurfactant (trade name: Megafac R08, manufactured by Dainippon Ink & Chemicals, Inc.)
... 0.02 part, nonionic surfactant (trade name: Emulgen A-60, manufactured by Kao Corporation) ... 1.0 part, solvent: ethyl 3-ethoxypropionate ... 20 parts, solvent: propylene Glycol monomethyl ether acetate: 150 parts The above components were mixed and stirred to obtain a photosensitive coloring composition coating solution CB-1 for blue (B).

<4. Synthesis of Dispersing Resin A-3>
(1. Synthesis of chain transfer agent A3)
Dipentaerythritol hexakis (3-mercaptopropionate) [DPMP; manufactured by Sakai Chemical Industry Co., Ltd.] (the following compound (33)) 7.83 parts, and having an adsorption site, and a carbon-carbon double bond The following compound (m-6) (4.55 parts) having an aldehyde was dissolved in 28.90 parts of propylene glycol monomethyl ether and heated to 70 ° C. under a nitrogen stream. To this, 0.04 part of 2,2′-azobis (2,4-dimethylvaleronitrile) [V-65, manufactured by Wako Pure Chemical Industries, Ltd.] was added and heated for 3 hours. Furthermore, 0.04 part of V-65 was added and reacted at 70 ° C. for 3 hours under a nitrogen stream. By cooling to room temperature, a 30% solution of the mercaptan compound (chain transfer agent A3) shown below was obtained.

(2. Synthesis of dispersion resin A-3)
A mixed solution of 4.99 parts of a 30% solution of chain transfer agent A3 obtained as described above, 19.0 parts of methyl methacrylate, 1.0 part of methacrylic acid, and 4.66 parts of propylene glycol monomethyl ether, It heated at 90 degreeC under nitrogen stream. While stirring this mixed solution, 0.139 part of dimethyl 2,2′-azobisisobutyrate [V-601, manufactured by Wako Pure Chemical Industries, Ltd.], 5.36 parts of propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate 9 40 parts of the mixed solution was added dropwise over 2.5 hours. After the completion of the dropwise addition, the mixture was reacted at 90 ° C. for 2.5 hours, and then a mixed solution of 0.046 parts of dimethyl 2,2′-azobisisobutyrate and 4.00 parts of propylene glycol monomethyl ether acetate was added, and further 2 hours. Reacted. To the reaction solution, 1.52 parts of propylene glycol monomethyl ether and 21.7 parts of propylene glycol monomethyl ether acetate are added, and cooled to room temperature, whereby a solution (specific dispersion) of the specific dispersion resin A-3 (polystyrene equivalent weight average molecular weight 24000) is obtained. Resin 30% by mass, propylene glycol monomethyl ether 21% by mass, propylene glycol monomethyl ether acetate 49% by mass).
The acid value of this specific dispersion resin A-3 was 48 mgKOH / g. The structure of dispersion resin A-3 is shown below.

<Production of color filter>
-Photosensitive coloring composition layer formation process-
The obtained red (R) photosensitive coloring composition coating liquid CR-1 was applied to the black matrix forming surface side of the black matrix substrate. Specifically, as in the case of forming the photosensitive dark color composition layer, the distance between the slit and the black matrix substrate so that the layer thickness of the photosensitive coloring composition layer after post-baking is about 2.4 μm, Coating was performed at a coating speed of 120 mm / sec by adjusting the discharge amount.

-Colored layer pre-baking step, colored layer exposure step-
Next, after heating (pre-bake treatment) at 100 ° C. for 120 seconds using a hot plate, exposure was performed at 60 mJ / cm ² using a proximity type exposure machine (model number LE5565A manufactured by Hitachi High-Technology Corporation).
In addition, the mask pattern and the exposure machine were set so that the overlap (exposure overlap amount) between the exposure pattern and the black matrix was 4.5 μm.

-Colored layer development process, colored layer baking process-
Thereafter, a 1.0% developer (1 part by mass of CDK-1 and 99 parts by mass of pure water) of a potassium hydroxide developer CDK-1 (manufactured by FUJIFILM Electronics Materials), 25 )), The shower pressure was set to 0.2 MPa, developed for 45 seconds, and washed with pure water.
Next, post-baking was performed in a 220 ° C. clean oven for 30 minutes to form heat-treated red pixels.

  Next, in the photosensitive coloring composition layer forming step, the coloring layer pre-baking step, the coloring layer exposure step, the coloring layer developing step, and the coloring layer baking step, the photosensitive coloring composition coating solution CR-1 for red (R) is used. A green pixel was formed in the same manner except that it was replaced with the blue (B) photosensitive coloring composition coating solution CB-1. Thereafter, a blue pixel was formed in the same manner except that the photosensitive coloring composition coating liquid CR-1 for red (R) was replaced with the photosensitive coloring composition coating liquid CG-1 for green (G). A color filter was obtained.

When the SEM cross-sectional photograph of 10 pixels selected at random was taken and the distance of the overlap between the photosensitive coloring composition layer and the black matrix was measured, the arithmetic average was 4.5 μm.
The SEM cross-sectional photograph was taken by SEM by cutting a cross section perpendicular to the long side direction near the center of the long side of the BM.
In addition, when the height of “Tsun” of 100 randomly selected colored patterns was measured using a contact type surface roughness meter P-10 (manufactured by KLA Tencor), the arithmetic average was 0. .25 μm. As shown in FIG. 5, the height of the horn was measured by moving the stylus 12 in the width direction (A direction) of the black matrix 10 in the vicinity of the center of the lattice long side of the black matrix 10.
In addition, the height of the horn formed by the colored pattern of each color and the black matrix is determined from the surface of the colored pattern farthest from the substrate surface of the overlap portion, and the flat surface portion other than the overlap portion. It was calculated | required as a distance in the normal line of the board | substrate between.

<Production of liquid crystal display device>
An ITO (Indium Tin Oxide) transparent electrode was further formed by sputtering on the R pixel, G pixel, B pixel and black matrix of the color filter obtained above. Separately, a glass substrate was prepared as a counter substrate, and an ITO transparent electrode was similarly formed by sputtering. A columnar photospacer was provided in a portion corresponding to the upper part of the partition on the ITO transparent electrode, and an alignment film made of polyimide was further provided thereon.

  After that, a UV curable resin sealant is applied by a dispenser method at a position corresponding to the outer periphery of the black matrix provided so as to surround the colored pixel group of the color filter, and a TN mode liquid crystal is dropped to form a counter substrate. After the substrates were bonded together and irradiated with UV, the sealant was cured by heat treatment. A liquid crystal cell was thus obtained. A polarizing plate HLC2-2518 (manufactured by Sanritz Co., Ltd.) was pasted on both sides of this liquid crystal cell, and then placed on the back surface side of the liquid crystal cell provided with the polarizing plate by constituting a backlight of a cold cathode tube, A liquid crystal display device was obtained.

-Image quality evaluation of liquid crystal display devices-
The liquid crystal display device was energized and various display images were visually observed and evaluated according to the following evaluation criteria. The results are shown in Table 3 below.
<Evaluation criteria>
A: There is no unevenness and the display feels very vivid and powerful.
○: There is no unevenness and the display feels vivid and powerful.
Δ: There is no unevenness, but the display does not feel forceful ×: There is unevenness or it looks whitish, and it cannot endure viewing.

(Example 2 to Example 9, Comparative Example 1 to Comparative Example 4)
In Example 1, a color filter was produced in the same manner as in Example 1, except that the undercut amount of the black matrix and the overlap amount in the coloring pattern forming step were changed to the values shown in Table 2. Next, a liquid crystal display device was produced in the same manner as in Example 1 using the produced color filter.

  The image quality evaluation was performed in the same manner as in Example 1 for each of the liquid crystal display devices manufactured in Examples 2 to 9 and Comparative Examples 1 to 4. The results are shown in Table 3.

  In Comparative Example 3, white spots such as a gap formed between the black matrix and the pixel occurred, and the color filter was not suitable for subsequent evaluation and display device creation.

In Table 3, the units of undercut amount, overlap amount, horn height, Δ line width, and Δ undercut are all “μm”.
As can be seen from Table 3, the color filters of Examples 1 to 9 have suppressed horn height and display unevenness, and the liquid crystal display device using these color filters has high quality image quality. all right.
In particular, in the color filters of Examples 1 to 9 produced by the manufacturing method of the present invention, display unevenness was suppressed as an unexpected effect.

It is a fragmentary sectional view of a black matrix substrate provided with an undercut. It is a fragmentary sectional view of a black matrix substrate provided with an undercut. It is a fragmentary sectional view of the color filter in which the overlap part was formed. It is a fragmentary sectional view of the color filter which has a horn in an overlap part. It is a conceptual diagram of the measuring method for calculating | requiring the height of a horn. It is sectional drawing of the color filter of this invention.

Explanation of symbols

2 Substrate 4 Black matrix (photosensitive dark color composition layer)
6 Coloring pattern (photosensitive coloring composition layer)
8 Overlap part

Claims (4)

A photosensitive dark color composition layer is formed on a substrate using the photosensitive dark color composition, the photosensitive dark color composition layer is exposed, and the exposed photosensitive dark color composition layer is developed. Forming a black matrix having an undercut length of −2.0 to 5.0 μm and baking the formed black matrix pattern to form a black matrix;
On the substrate on which the black matrix after baking is formed, a photosensitive coloring composition layer is formed using a photosensitive coloring composition, the photosensitive coloring composition layer is exposed, and the photosensitive property after the exposure is exposed. By developing the colored composition layer and baking the developed photosensitive colored composition layer, the distance in the black matrix width direction of the overlapped portion overlapping the black matrix after the baking is 2.0 to 9 A colored pattern forming step of forming a colored pattern to be 0.0 μm;
The manufacturing method of the color filter which has.   2. A color filter manufactured by the method for manufacturing a color filter according to claim 1, wherein the color filter has an overlap portion where a black matrix and a colored pattern overlap, and the distance of the overlap portion in the width direction of the black matrix is 2. A color filter that is 0 to 9.0 μm.   The distance in the normal line of the substrate between the portion of the colored pattern that is farthest from the substrate surface of the overlap portion and the portion other than the overlap portion is 0.50 μm or less. The color filter according to claim 2.   A liquid crystal display device comprising the color filter according to claim 2.