JP2009288656A - Color filter and method of manufacturing the same, and liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter which suppresses irregular orientation of liquid crystals and improves contrast when the filter is used for a liquid crystal display device. <P>SOLUTION: The color filter includes a resin black matrix 12 as a lattice pattern on a substrate 10 for segmenting the substrate 10 into a plurality of pixels, and stripe color patterns 20R, 20G, 20B. The color patterns include, at least partially, a portion where each stripe line is continuously provided over a group of linearly arrayed pixels in a plurality of pixels; each line has a group of overlapping portions O<SB>X</SB>on a resin black matrix 12 in a direction orthogonal to the direction of the line and also has a group of overlapping portions O<SB>Y</SB>and pattern edges on the resin black matrix 12 in a direction parallel to the line direction; and in a single pixel in the pixel group, the height h<SB>Y</SB>from the color pattern surface to the color pattern surface in the overlapping portion O<SB>Y</SB>is lower by at least 0.1 μm than the height h<SB>X</SB>from the color pattern surface to the color pattern surface in the overlapping portion O<SB>X</SB>. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a color filter, a manufacturing method thereof, and a liquid crystal display device.

The color filter is an essential component for liquid crystal display devices and solid-state imaging devices.
For example, for color filters for liquid crystal display devices (liquid crystal displays; LCDs), liquid crystal displays are used for TV applications, and higher image quality is required compared to conventional notebook computers and monitor applications. ing. In addition, the substrate size has been increased for the production of large-sized TVs, and the demand for improvement in yield and cost reduction has increased.

Regarding the improvement of the image quality, when manufacturing a color filter, there is a problem that the color pattern rises at the boundary between the black matrix and the colored pixels and the color filter is not flattened, resulting in deterioration of the image quality. (For example, see Patent Document 1). The rise of the boundary portion may cause problems such as a decrease in contrast and color unevenness.
For this reason, conventionally, after the pixel is manufactured, the surface of the color filter is polished or an overcoat layer (hereinafter sometimes referred to as “OC layer”) is formed on the pixel. However, if polishing or formation of the OC layer is performed, the manufacturing process of the color filter increases and the cost increases. In addition, in the case of polishing, adverse effects such as damage to the color filter may occur, and a method capable of omitting the polishing step and the OC layer forming step has been demanded.

On the other hand, attempts have been made to solve the problem of the rising of the boundary portion by reducing the taper angle of the black matrix (see, for example, Patent Document 1 and Patent Document 2).
In Patent Document 2, a coloring composition is applied only in the black matrix frame by an ink jet method.
JP-A-9-113721 JP 2003-161826 A

However, in the method described in Patent Document 1, there are many steps for obtaining the taper angle in the black matrix, and after applying and drying the photosensitive dark color composition for forming the black matrix on the substrate, a positive resist is further applied. However, it takes time and effort to adjust the development speed ratio between the photosensitive dark color composition and the positive resist. In addition, only the adjustment of the taper angle is insufficient in suppressing the rise of the colored pattern. Furthermore, this technique is not compatible with large substrates (for example, large substrates having a substrate size of 1 m × 1 m or more).
On the other hand, in Patent Document 2, a colored composition is applied to a substrate by an ink jet method to form a colored pattern. Therefore, a black matrix and a colored pattern that are generated when the colored pattern is formed by applying or transferring the colored composition. It is not suitable for suppressing the swell of the colored pattern in the overlapping part (overlapping part). Rather, at the boundary between the black matrix and the colored pixel, the black matrix is higher than the colored pixel, resulting in a step, the color filter is not flat, and the same image quality degradation problem may occur.

This invention is made | formed in view of the above, and makes it a subject to achieve the following objectives.
That is, the present invention, when used in a liquid crystal display device, suppresses the alignment disorder of the liquid crystal and improves the contrast, and the color filter can be reduced without adding a process such as polishing or setting an overcoat layer. An object of the present invention is to provide a color filter manufacturing method that can be manufactured by a simple and cost-effective method, and a liquid crystal display device having high contrast.

Specific means for achieving the above object are as follows.
<1> On the substrate, at least a resin black matrix that is a lattice pattern with a film thickness of 0.5 μm to 2.0 μm and a colored pattern that is a stripe pattern with a film thickness of 1.0 μm to 3.0 μm are included. The resin black matrix divides the substrate into a plurality of pixels, and at least a part of the coloring pattern is a resin black matrix on a pixel group in which each column is linearly arranged and between the pixels in the pixel group. together are continuously provided over the top, each column has a group of overlapping portion O _X on the direction of the resin black matrix which is perpendicular to the direction of said column, and a direction parallel to the direction of resin in the column has a group and a pair of pattern edge of the overlapping portion O _Y on the black matrix, when tried with the one pixel of the pixel group arranged in the straight line, coloring path of the pixel Motonai The height h _Y of the overlapping portion O _Y which is adjacent to the pixel for over down surface with respect to the height h _X of the overlap portion O _X adjacent to the pixel for color pattern surface of the pixel Motonai, lower than 0.1μm It is a color filter characterized by this.

Of <2> the overlapping portion O _Y, the length in the direction perpendicular to the direction of the row, a color filter according to <1>, wherein the at 2μm or more 10μm or less.
<3> The color filter according to <1> or <2>, wherein a cross-sectional shape of an end portion of the coloring pattern is a rectangle or a tapered shape having a taper length of 10 μm or less.
<4> The color filter according to any one of <1> to <3>, wherein a cross-sectional shape of an end portion of the resin black matrix is a rectangle or a tapered shape having a taper length of 10 μm or less. .

<5> A method for producing the color filter according to any one of <1> to <4>, wherein a resin black matrix forming step of forming a resin black matrix that is a lattice pattern on a substrate; On the substrate on which the resin black matrix is formed, a photosensitive coloring composition layer is formed using the photosensitive coloring composition, the formed photosensitive coloring composition layer is subjected to pattern exposure, and the pattern-exposed photosensitive property is exposed. And a colored pattern forming step of forming a colored pattern by developing the colored composition layer.

<6> The photosensitive coloring composition layer is formed by applying a photosensitive coloring composition on a substrate on which the resin black matrix is formed, prebaking, and forming the photosensitive coloring composition layer after the prebaking. In the cross section taken along a plane perpendicular to the pattern edge of the resin black matrix and perpendicular to the substrate, the surface of the photosensitive coloring composition layer is 0. The point S close to the 1 μm substrate has a position in the direction parallel to the substrate surface negative with respect to the resin black matrix forming region side and the resin black matrix non-forming region side with respect to the position of the pattern edge closest to the point S. When it is positive, the color filter manufacturing method according to <5>, wherein the color filter is in a range of −2 μm to +10 μm.

<7> A liquid crystal display device comprising the color filter according to any one of <1> to <4>.

  According to the present invention, when used in a liquid crystal display device, a color filter capable of suppressing the alignment disorder of the liquid crystal and improving the contrast, a color filter manufacturing method capable of manufacturing the color filter by a low-cost and simple method, and a high A liquid crystal display device having contrast can be provided.

  Hereinafter, the color filter of the present invention and the production method thereof, the photosensitive coloring composition which is the material of the colored pattern in the present invention, the photosensitive dark color composition which is the material of the resin black matrix in the present invention, and the liquid crystal display of the present invention The apparatus will be described.

≪Color filter≫
The color filter of the present invention has, on the substrate, a resin black matrix that is a lattice pattern with a film thickness of 0.5 μm to 2.0 μm, a colored pattern that is a stripe pattern with a film thickness of 1.0 μm to 3.0 μm, And the resin black matrix partitions the substrate into a plurality of pixels, and at least a part of the coloring pattern is on the pixel group in which each column of the coloring pattern is arranged in a straight line and the pixel group. have together provided continuously over the resin black matrix between pixels, a group of overlapping portion O _X on the direction of the resin black matrix in which each row is orthogonal to the direction of said column in, and the column It has a direction and a group and a pair of pattern edge of the overlapping portion O _Y over in a direction parallel to the resin black matrix, one pixel of the pixel group arranged in the straight line Nitsu When was Itemi, the height h _Y of the overlapping portion O _Y which is adjacent to the pixel for color pattern surface of the pixel Motonai is, the height h of the overlapping portion O _X adjacent to the pixel for color pattern surface of the pixel Motonai It is characterized by being 0.1 μm or more lower than _X.

In general, in a color filter having a structure in which a colored pattern has an overlapping portion on a black matrix, when the level difference in the overlapping portion is high, disorder of the alignment of liquid crystal deteriorates when the color filter is used in a liquid crystal display device. , The contrast decreases.
In particular, when the colored pattern is a stripe pattern, among the steps of the colored pattern, near a pair of pattern edges parallel to the stripe (for example, among the four sides of a square pixel, parallel to the pattern edge of the colored pattern). The influence of the two sides) is large.
Therefore, by adopting the color filter according to the configuration of the present invention, it is possible to reduce the step of the colored pattern at the boundary portion between the overlapping portion _OY and the pixel adjacent to the pair of pattern edges. For this reason, by using the color filter of the present invention for a liquid crystal display device, the alignment disorder of the liquid crystal can be suppressed and the contrast can be improved.
Furthermore, the color filter of the present invention can be produced by a low-cost and simple method without providing steps such as polishing and overcoat layer installation. The method for producing the color filter of the present invention will be described later.

In the present invention, the positional relationship of the pattern such as the colored pattern and the resin black matrix represents the positional relationship as viewed from the substrate normal direction pattern forming surface side unless otherwise specified (in the section, etc.).
In the present invention, “film thickness” and “height” of a pattern such as a colored pattern or a resin black matrix represent the thickness and height in the normal direction of the substrate.
In the present invention, the “cross section” of a pattern such as a colored pattern or a resin black matrix is a plane perpendicular to the substrate and perpendicular to the pattern edge and cut when the pattern is cut.
In the present invention, the “pattern edge” refers to a boundary line between a pattern and a base on which the pattern is formed (for example, a substrate or a resin black matrix) when viewed from the substrate normal direction pattern forming surface side.
For example, in FIG. 1A, the pattern edges of the colored patterns 20R, 20G, and 20B are lines indicated by solid lines, and in FIG. 2A, the pattern edge of the resin black matrix 12 is indicated by a solid line. Is a line.

In the present invention, the upper end of the pattern is the point farthest from the substrate in the substrate normal direction in the pattern end cross section, and the furthest away from the center of the pattern in the direction parallel to the substrate surface. (For example, the pattern upper end T in FIGS. 3 to 6 described later).
Further, the pattern lower end means a point in contact with the ground on the pattern surface in the pattern end section (for example, pattern lower end E1 in FIGS. 3 to 6 described later).
When the cross section of the pattern end is tapered, the pattern edge when viewed from the normal pattern forming surface side of the substrate coincides with the lower end of the cross section of the pattern end (the colored pattern in FIG. 1C). The pattern edges of 20G are the pattern lower end E1 and the pattern lower end E2.

  In the present invention, the direction (for example, arrow Y in FIG. 1) parallel to each column of the colored pattern when viewed from the substrate normal direction pattern forming surface side is referred to as “Y direction”, “column (direction)”. Or “longitudinal direction”. Further, when viewed from the substrate normal direction colored pattern forming surface side, a direction (for example, an arrow X in FIG. 1) orthogonal to each column of the colored pattern is expressed as “X direction”, “row (direction)”, or “ Sometimes referred to as “lateral direction”.

Hereinafter, an example of the color filter of the present invention will be described with reference to FIGS. However, the present invention is not limited to the following example.
1A is a plan view of a color filter 100 according to an example of the present invention, FIG. 1B is a cross-sectional view taken along line AA in FIG. 1A, and FIG. FIG. 2 is a cross-sectional view taken along line BB in FIG.
FIG. 2A is a plan view of a substrate 110 with a resin black matrix in which only the resin black matrix is formed on the substrate in the middle of manufacturing the color filter 100 of FIG. 2B is a cross-sectional view taken along the line AA in FIG. 2A, and FIG. 2C is a cross-sectional view taken along the line BB in FIG. 2A.

  As shown in FIGS. 1A to 1C, in the color filter 100, a resin black matrix 12 that is a lattice pattern and a colored pattern that is a stripe pattern (red pattern 20R, green pattern) are formed on a substrate 10. 20G and blue pattern 20B). Here, the film thickness of the resin black matrix 12 is 0.5 μm to 2.0 μm, and the film thicknesses of the red pattern 20R, the green pattern 20G, and the blue pattern 20B are 1.0 μm to 3.0 μm, respectively.

The resin black matrix 12 divides the substrate 10 into a plurality of pixels (dotted line portions in the color filter 100 in FIG. 1A, pixels 14 in the substrate 110 with the resin black matrix in FIG. 2A). It is a lattice pattern. That is, the resin black matrix 12 has a lattice pattern having a plurality of openings which are pixels 14.
Here, the pattern area of the lattice pattern includes a stripe pattern in the X direction (horizontal direction) (hereinafter also referred to as “horizontal stripe”) and a stripe pattern in the Y direction (vertical direction) (hereinafter referred to as “vertical stripe”). There is no particular limitation as long as it is a region including a composite region.
In the resin black matrix 12 of FIG. 1A and FIG. 2A, in addition to the composite region, the resin black matrix 12 is adjacent to the stripe pattern in the X direction and the stripe pattern in the Y direction and corresponds to one corner of the pixel 14. At a position, a TFT light-shielding pattern 13 protruding toward the inside of the pixel 14 is provided. For this reason, the shape of the pixel 14 is a shape in which one corner of a rectangle is recessed.
Here, the TFT light shielding pattern 13 is a light shielding pattern for shielding light from a TFT (thin film transistor) in an active matrix substrate provided as a counter substrate of the color filter 100. However, the TFT light shielding pattern 13 may be omitted depending on the device design, and as a result, the pixel shape may be rectangular.

  Further, in FIGS. 1A to 1C, when one column (for example, the green pattern 20G) of the colored patterns is viewed, the pixel group and the pixel group arranged in a straight line among the plurality of pixels. Are continuously provided on the resin black matrix between the pixels. Here, “provided continuously over” refers to a state in which the pattern edge is not provided and is provided as one pattern.

Further, as shown in FIG. 1A, the green pattern 20G is formed on the resin black matrix in the direction (X direction) orthogonal to the direction (Y direction) of the green pattern 20G (that is, on the horizontal stripe). the group of overlapping portion O _X, on the resin black matrix in a direction parallel to the direction of the row (Y direction) (i.e., on the vertical stripes) groups and a pair of pattern edge of the overlapping portion O _Y, Each has.
That is, the green pattern 20G is, after covering the pixel 14 over the entire surface, and further includes an overlapping portion O _X and the overlapped portion O _Y over the resin black matrix 12, and a pair on the resin black matrix pattern Patterning is performed to have edges (pattern lower end E1 and pattern lower end E2).
The color filter 100 has the same configuration for the other columns than the green pattern 20G.

In the color filter 100 of FIG. 1A, the dotted line portion (the portion corresponding to the pixel 14 in FIG. 2A) of the green pattern 20G becomes a green pixel, and the dotted line portion (FIG. 2) of the red pattern 20R. A portion corresponding to the pixel 14 in (a) is a red pixel, and a dotted line portion (portion corresponding to the pixel 14 in FIG. 2A) of the blue pattern 20B is a blue pixel.
In the color filter 100, as shown in FIG. 1A, the longitudinal direction of the pixels and the stripe direction of the colored patterns 20R, 20G, and 20B are arranged in parallel.

FIG. 1B is a cross-sectional view including one row of the resin black matrix in the X direction (that is, one overlapping portion O _X ).
As shown in FIG. 1B, the resin black matrix 12 has a taper shape at both ends of the pattern, which will be described later. It is parallel to the substrate surface.
On the other hand, the green pattern 20G is provided continuously (without a pattern edge) from the pixel to the resin black matrix 12.
Further, the surface of the green pattern 20G on the resin black matrix 12 (that is, the overlapping portion O _X ) is raised at a height h _{X when} viewed from the surface of the green pattern 20G in the pixel. Specifically, the green pattern 20G of the surface of the pixel, and, some of the green pattern 20G of the surface of the overlapped portion O _X, both are parallel to the substrate surface, while the latter to the former, the substrate normal It is separated by from the substrate height h _X for direction.

FIG. 1C is a cross-sectional view including two columns of the resin black matrix in the Y direction and one column of the green pattern 20G.
In FIG. 1C, the two resin black matrices 12 are both tapered at both ends of the pattern, and the upper surface at the center of the pattern is parallel to the substrate surface.
The green pattern 20G is provided so that the center portion is located on the pixel and both end portions are located on the resin black matrix 12 (that is, the overlapping portion O _Y ). Further, the lower end E1 of the pattern at one end of the green pattern 20G is positioned on the resin black matrix 12 on the right side in FIG. 1C, and the lower end E2 of the pattern at the other end of the green pattern 20G is the resin on the left side in FIG. Located on the black matrix 12.
The surface of the green pattern 20G in the pixel is parallel to the substrate surface in the pixel, but is curved on the resin black matrix 12 (that is, the overlapping portion O _Y ).
Further, the surface of the green pattern 20G on the resin black matrix 12 (that is, the overlapping portion O _Y ) is raised at a height h _{Y when} viewed from the surface of the green pattern 20G in the pixel. Specifically, with respect to the green pattern 20G surface within the pixel, the highest point of the green pattern 20G surface of the overlapping portion O _Y (refer to a point farthest from the substrate. Hereinafter the same.) Is, the height h _Y about the substrate normal direction Just away from the substrate.

In the present invention, when viewed in one pixel in the pixel group, the height h _Y of the overlapping portion O _Y adjacent to the pixel with respect to the colored pattern surface in the pixel is equal to the colored pattern surface in the pixel. It is necessary that the height h _X of the overlapping portion O _X adjacent to the pixel is lower by 0.1 μm or more.
That is, between the h _X and h _Y is made up the relationship of the following equation 1. Here, both h _X and h _Y are 0 μm or more.

h _Y −h _X ≦ −0.1 μm Formula 1

By the h _X and h _Y satisfy the relationship of formula 1, the step of coloring pattern adjacent to the overlapping portion O _Y is reduced, when using the color filter 100 on the liquid crystal display device, alignment of the liquid crystal disturbance And the contrast can be improved.

In the present invention, in particular, as a color filter 100 shown in FIG. 1, if the direction of a row in the longitudinal direction and the colored pattern of pixels are parallel, occupied by Y direction component of the overlapping portion O _Y in the pixel periphery Since the ratio increases, the alignment disorder of the liquid crystal can be suppressed more effectively, and the contrast can be improved more effectively.
From the above viewpoint, the shape of the pixel is preferably a rectangle or a substantially rectangular shape (for example, a shape in which at least one corner of the rectangle is recessed) whose longitudinal direction is the Y direction, and among them, the longitudinal direction (Y direction) It is preferable that the ratio [longitudinal direction / width direction] of the width direction (X direction) is a rectangle of 120/100 or more or a substantially rectangular shape.

The example of the color filter of the present invention has been described above with reference to FIGS. 1 to 2, but the color filter in the present invention is not limited to the above example.
For example, in the color filter 100, the color of the color pattern is three, but the color of the color pattern may be a single color, two colors, or four or more colors.
In addition, although one column and one pixel of the coloring pattern have been described by taking the green pattern and the green pixel as an example, other color patterns (for example, a red pattern, a blue pattern, a red pixel, a blue pixel, etc.) And may have a green pixel shape.
Further, it is not necessary that all the colored patterns in the color filter have the shape like the green pattern 20G. In some of the colored patterns, each row in the part has a shape like the green pattern 20G. It only has to be.
It should be noted that the effect of improving the contrast is high if the pixel has a high visibility (green pixel in the case of a pixel composed of red, green, and blue pixels) and has this shape.

  Hereinafter, the coloring pattern, the resin black matrix, the substrate, and others will be described.

<Coloring pattern>
The color filter of the present invention has a colored pattern which is a stripe pattern. The said coloring pattern can be suitably formed using the below-mentioned photosensitive coloring composition, for example.

The film thickness of the colored pattern needs to be 1.0 μm to 3.0 μm.
Here, the “film thickness of the coloring pattern” refers to the thickness of the coloring pattern in the pixel.
When the film thickness is less than 1.0 μm, the step at the periphery of the pixel that overlaps with the black matrix is steep and light is lost, which tends to cause display unevenness. Further, when the film thickness exceeds 3.0 μm, the film thickness uniformity of the color layer in a large area tends to deteriorate.
Furthermore, to reduce the height h _Y of the overlapping portion O _Y, wherein Formula 1 and more from effectively standpoint to establish such a relationship, it is preferable that the thickness of the colored pattern is 1.5~2.5μm .

(Overlapping part)
Figure 3 shows a state of the enlarged vicinity of the overlapping portion O _Y of FIG. 1 (c).
As shown in FIG. 3, the green pattern 20G has an overlapping portion O _Y of length L _o of the X-direction on the resin black matrix 12. Green pattern 20G of the surface, although in a pixel is parallel to the substrate surface, the overlapping portion O _Y raised curved in, descends through the pattern upper T is the point furthest away from the substrate (approaching substrate ) The pattern lower end E1 is in contact with the surface of the resin black matrix 12.

In the present invention, the length L _o of the overlapping portion O _Y is determined as the distance in the X direction between the pattern edge and the resin black matrix pattern edge of the color pattern in the above polymerization becomes part O _Y. In particular, as shown in FIG. 3, when the cross-sectional shape of the cross-sectional shape and the resin black matrix end portion of the colored pattern end are both tapered shape, the pattern bottom E1 color pattern in the above polymerization becomes part O _Y and resin black It is determined as the distance in the X direction from the lower end of the matrix pattern.
The length L _o in the X direction of the overlapping portion O _Y is not particularly limited. However, from the viewpoint of reducing the height h _Y and more effectively establishing the relationship of Formula 1, the length L _o is 2 μm or more and 10 μm or less. It is preferable that it is 2 μm or more and 8 μm or less.

The “height h _Y of the overlapping portion O _Y with respect to the colored pattern surface in the pixel” in the present invention is the height in the substrate normal direction of the highest point of the colored pattern surface in the overlapping portion O _{Y as} viewed from the colored pattern surface in the pixel. Means. The same applies to the “height h _X of the overlapping portion O _X with respect to the surface of the colored pattern in the pixel”.
For example, as shown in FIG. 3, if it contains a pattern upper T in the overlapping portion O _Y, the height h _Y is the height from the colored patterned surface in the pixel to the color pattern upper T.
In the present invention, the height h _Y of the overlapping portion O _Y which is adjacent to the pixel from a colored patterned surface in the pixel may be referred to as "horn height".
The height h _Y (horn height) in the present invention is not particularly limited, but is 0.6 μm or less from the viewpoint of more effectively suppressing the disorder of alignment of the liquid crystal and improving the contrast more effectively. Is preferably 0.5 μm or less.

(Cross sectional shape of pattern edge)
In the color filter of the present invention, the cross-sectional shape of the pattern end of the colored pattern is not particularly limited, and may be any shape such as a rectangle, a taper shape, an undercut shape, etc., but the height h From the viewpoint of reducing _Y and more effectively establishing the relationship of Formula 1, it is preferably rectangular or tapered.
Further, the colored pattern end section is more preferably rectangular or a taper shape with a taper length of 10 μm or less, more preferably a taper shape with a taper length of 10 μm or less, and a taper shape with a taper length of 1 μm or more and 5 μm or less. It is particularly preferred.
Hereinafter, “taper shape”, “taper length”, “rectangle”, and “undercut shape” will be described.

~ Tapered type ~
In the present invention, the “tapered shape” of the pattern end section is a shape called a forward taper shape, and specifically, a shape that satisfies both of the following two conditions in the pattern end section.

(Condition 1) In the cross section of the pattern end, the pattern lower end is located on the outer side of the pattern (side away from the pattern center) in the direction parallel to the substrate surface when viewed from the upper end of the pattern.
(Condition 2) In the cross section of the pattern end, all of the intermediate portion between the pattern upper end and the pattern lower end of the line corresponding to the pattern surface is located between the pattern upper end and the pattern lower end in the direction parallel to the substrate surface. thing.

In the present invention, the cross-sectional shape of the end portion of the green pattern 20G in FIG. 3 is included in the taper shape. Other examples in which the cross-sectional shape of the green pattern end is tapered are shown in FIGS.
When the cross-sectional shape of the pattern end is a taper shape, the pattern edge viewed from the substrate normal direction pattern forming surface side corresponds to the lower end of the pattern in the pattern cross section.

In the present invention, when the cross-sectional shape of the pattern end is a taper shape, the distance between the pattern upper end and the pattern lower end in the direction parallel to the substrate surface is referred to as a taper length.
For example, as shown in FIGS. 3 to 5, the green pattern 20G, 22G, the 24G, taper length _{L c} is the distance in the direction parallel to the substrate surface with the pattern upper T and the pattern bottom E1.
The preferable range of the taper length is as described above.
In FIGS. 3-5, but is shorter than the length L _o of the taper length L _c is overlapped portion O _Y, the present invention is not limited to this relationship, a taper length L _c is overlapped portion O _Y It may be longer than the length _Lo .

~ Rectangle ~
In the present invention, the “rectangular shape” with respect to the cross section of the pattern end means the pattern upper end T, the pattern lower end E1, and the pattern upper end T and the pattern lower end E1 among the lines corresponding to the pattern surface, as in the green pattern 26G shown in FIG. And the intermediate portion is in a position overlapping in the direction parallel to the substrate surface.
When the cross-sectional shape of the pattern end is a rectangle, the pattern edge viewed from the substrate normal direction pattern forming surface side corresponds to the pattern upper end and pattern lower end in the pattern cross section.

~ Undercut type ~
In the present invention, the “undercut shape” for the pattern end cross section is a shape that is also referred to as an inverted taper shape, and refers to a shape that is not included in the taper shape or the rectangle. For example, the shape etc. which have the part protruded in the shape of an eaves in the cross section of a pattern edge part are mentioned.

FIG. 7 to FIG. 9 show examples in which the green pattern end section has an “undercut shape”.
The green pattern 28G in FIG. 7 has a pattern end cross section in which the pattern lower end E1 as viewed from the pattern upper end T is located on the center side of the pattern in the direction parallel to the substrate surface. not filled.
The green pattern 30G and the green pattern 32G in FIGS. 8 and 9 are such that the pattern lower end E1 is located outside the pattern in the direction parallel to the substrate surface when viewed from the pattern upper end T. Satisfies. However, a part of the intermediate portion between the pattern upper end T and the pattern lower end E1 among the lines corresponding to the pattern surface is deviated from the pattern upper end to the pattern lower end in the direction parallel to the substrate surface. “Condition 2” is not satisfied.

  When the cross-sectional shape of the pattern edge is an undercut shape and satisfies only the above-described condition 1, the pattern edge viewed from the substrate normal direction pattern forming surface side corresponds to the lower end of the pattern in the pattern cross-section. . When only the above condition 1 is not satisfied (that is, when only the above condition 2 is satisfied), the pattern edge viewed from the substrate normal direction pattern forming surface side corresponds to the upper end of the pattern in the pattern section. To do.

(Color film thickness ratio)
In the present invention, said from the viewpoint of more effectively reducing the height h _Y, there may be a "color film thickness ratio" as represented by the following formula 2 is important.

Color film thickness ratio (%) = (thickness of the colored pattern in the thickness / pixel color pattern in the overlap portion _{O Y)} × 100 ... Formula 2

In Equation 2, the thickness of the colored pattern in the overlap portion O _Y, the distance of the substrate normal direction to the highest point of the colored patterned surface in the overlap portion O _Y from color pattern bottom E1.
In particular, as shown in FIG. 3, when including the overlapping portion O _Y in the colored pattern upper T is the distance of the substrate normal direction from the colored pattern lower end E1 to the colored pattern upper T.
Wherein from the viewpoint of reducing the height _{h Y} more effectively, color film thickness ratio is preferably 30% to 100%, more preferably 50% to 90%.

<Resin black matrix>
The color filter of the present invention has a resin black matrix that is a lattice pattern.
In the present invention, “resin black matrix” refers to a black matrix made of a material containing resin. The resin black matrix is suitably formed using, for example, a photosensitive dark color composition described later.

The optical density (OD value) of the resin black matrix in the present invention is not particularly limited, but is preferably 2.0 or more and 8.0 or less, more preferably 3.0 or more, and still more preferably 4.0 or more and 6.0 or less. More preferably. When the optical density is 2.0 or more, deterioration of display quality of the display device such as suppression of reduction of contrast can be suppressed.
The optical density referred to here is the ISO Visual transmission optical density. An example of a measuring instrument that can be used to measure the ISO Visual transmission optical density is X-Rite 361T (V) manufactured by Sakata Inx Engineering Co., Ltd.

  The line width of the resin black matrix in the present invention is preferably 5 to 30 μm from the viewpoint of ensuring brightness by increasing the aperture ratio.

The film thickness of the resin black matrix needs to be 0.5 μm to 2.0 μm as described above.
If the film thickness is less than 0.5 μm, it is difficult to increase the OD value, and the light shielding property tends to deteriorate. On the other hand, when the film thickness exceeds 2.0 μm, the color layer surface has a steep inclination when the color layers are laminated, and light leakage due to poor alignment of the liquid crystal tends to occur.
Furthermore, to reduce the height h _Y of the overlapped portion O _Y color pattern, the formula 1 and more from effectively standpoint to establish such a relationship, the thickness of the resin black matrix 0.8~1.5μm It is preferable that

Further, in the color filter of the present invention, the cross-sectional shape of the pattern end portion of the resin black matrix is not particularly limited, and is rectangular, tapered (for example, the cross-sectional shape of the resin black matrix 12 end portion in FIGS. 1 to 9), undercut shape, etc., what may be a shape, but reduces the height h _Y, wherein formula 1 and more from effectively standpoint to establish such a relationship, be rectangular or tapered shape preferable.
The definition of the cross-sectional shape (rectangular shape, taper shape, undercut shape) and taper length of the pattern end portion of the resin black matrix is the same as in the case of the colored pattern.
In FIGS. 1-9 show a taper length at the pattern end portion of the resin black matrix 12 in L _B.

In addition, from the viewpoint of reducing the height h _Y and more effectively establishing the relationship of Formula 1, the end cross section of the resin black matrix is more preferably rectangular or tapered with a taper length of 10 μm or less. A taper shape with a taper length of 10 μm or less is more preferable, and a taper shape with a taper length of 2 μm or more and 8 μm or less is particularly preferable.

<Board>
As the substrate in the present invention, for example, non-alkali glass, soda glass, Pyrex (registered trademark) glass, quartz glass, and those obtained by attaching a transparent conductive film to these, solid-state imaging devices, etc. Examples of the photoelectric conversion element substrate used include a silicon substrate. Furthermore, a plastic substrate is also possible. Among these, alkali-free glass is preferable from the viewpoint of chemical resistance and heat resistance. In these substrates, first, a black matrix is formed in a lattice shape so as to isolate each pixel, and colored pixels are formed in a portion where the lattice is vacant (hereinafter also referred to as “opening” or “pixel”). .
Further, if necessary, an undercoat layer may be provided on these substrates in order to improve adhesion with an upper layer, prevent diffusion of substances, or planarize the substrate surface. It is preferable that the substrate is large (generally 1 m or more per side) in that the effects of the present invention are further exhibited.

<Others>
In addition to the above-described elements (resin black matrix, coloring pattern, and substrate), the color filter of the present invention includes known elements such as transparent electrode films (for example, ITO films), columnar spacers, alignment control projection patterns, It may be configured.
Further, as described above, the color of the colored pattern (colored pixel) in the color filter is more preferably three or more colors. Especially, it is especially preferable that it is three colors of R (red), G (green), and B (blue).
The color filter of the present invention is applied to display devices for various uses such as televisions, personal computers, industrial and medical monitors, liquid crystal projectors, game machines, mobile terminals such as mobile phones, digital cameras, and car navigation systems. it can.

≪Color filter manufacturing method≫
Although there is no limitation in particular as a method of manufacturing the color filter of this invention, the manufacturing method of the color filter of this invention demonstrated below is suitable.
That is, the color filter manufacturing method of the present invention is a method of manufacturing the above-described color filter of the present invention, wherein a resin black matrix forming step of forming a resin black matrix that is a lattice pattern on a substrate; A photosensitive coloring composition layer forming step of forming a photosensitive coloring composition layer using a photosensitive coloring composition on a substrate on which a resin black matrix is formed, and pattern exposure of the formed photosensitive coloring composition layer And a developing step of developing the pattern-exposed photosensitive coloring composition layer to form a colored pattern.

<Resin black matrix formation process>
The resin black matrix forming step is a step of forming a resin black matrix on the substrate.
The black matrix forming step includes at least a photosensitive dark color composition layer forming step of forming a photosensitive dark color composition layer on a substrate using the photosensitive dark color composition, and the photosensitive dark color composition layer. It is preferable to have an exposure process for exposing the film and a development process for developing the photosensitive dark color composition layer after the exposure to form a black matrix pattern.
In addition to the above steps, the resin black matrix forming step may be provided with other steps such as a baking step (a pre-bake step or a post-bake step) as necessary.
In the following description, “resin black matrix” may be simply referred to as “black matrix”.

-Photosensitive dark color composition layer forming step-
In this step, a photosensitive dark color composition layer is formed on the substrate using the photosensitive dark color composition. The substrate is as described above.

As a method of forming the photosensitive dark color composition layer on the substrate, for example, there is a method of applying the photosensitive dark color composition on the substrate by coating or the like.
Examples of the method for applying the photosensitive dark color composition on the substrate include slit coating (hereinafter also referred to as “slit coating (method)”), ink jet method, spin coating (hereinafter referred to as “spin coating (method)” and “spin”. Various application methods such as coating (method) ”, cast coating, roll coating, and screen printing can be applied. Of these, slit coating is preferred from the viewpoints of accuracy and speed. Before performing these coatings, it is preferable to clean the substrate with ultraviolet rays or various cleaning liquids from the viewpoint of improving coating properties.
Moreover, the method of transferring the coating film previously formed on the temporary support by the above application method onto the substrate can also be applied.
Regarding the transfer method, the production methods described in JP-A-2006-23696, paragraph numbers [0023] and [0036] to [0051] and JP-A-2006-47592, paragraphs [0096] to [0108] are used. It can be suitably used in the present invention.
As a laminator used for transcription, FIG. A laminator described in No. 24 or a laminator described in International Application No. JP2007 / 069312 can be suitably used. High productivity can be obtained by using these laminators.

  The thickness (for example, coating thickness) when the photosensitive dark color composition is applied onto the substrate is appropriately adjusted depending on the design value of the thickness of the black matrix to be formed. 0.0 μm is preferable, and 0.8 to 1.5 μm is more preferable.

-Exposure process-
In the exposure step, the photosensitive dark color composition layer formed in the photosensitive dark color composition layer forming step is exposed through a predetermined mask pattern, and patterned (in the case of a negative type, a light-irradiated coating). Only the film part is cured). As radiation that can be used for exposure, ultraviolet rays such as g-line, h-line, and i-line are particularly preferably used. Irradiation dose is preferably 5~500mJ / cm ^2, more preferably 10 to 300 mJ / cm ^2, and most preferably 10~200mJ / cm ^2.
The exposure machine can be a proximity type exposure machine, a mirror projection system, or a stepper system.

-Development process-
Next, by performing an alkali development treatment, for example, when the photosensitive dark color composition is a negative type, the non-light-irradiated part in the exposure may be eluted in an alkaline aqueous solution, leaving only the photocured part. it can.
As the developer, an organic alkali developer, an inorganic alkali developer or a mixture thereof is used.
Examples of the alkali agent used in the developer include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxy. And organic alkaline compounds such as tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, and the concentration of these alkaline agents is 0.001 to 0.001. An alkaline aqueous solution diluted with pure water so as to be 10% by mass, preferably 0.01 to 1% by mass, is preferably used as the developer. In the case where a developer composed of such an alkaline aqueous solution is used, it is generally washed (rinsed) with pure water after development.

In the present invention, the lower end is located at −3.0 to +3.0 μm with respect to the upper end in the photosensitive dark color composition layer after the main development step and before the baking step described later. Thus, it is preferable to form a black matrix pattern.
Here, “the lower end is located at −3.0 to +3.0 μm with respect to the upper end in the photosensitive dark color composition layer” means that the formed black matrix pattern is perpendicular to the pattern edge of the pattern. And in the cross section of the one end part of this pattern when it cut | disconnects in a surface perpendicular | vertical to a substrate surface, it points out being the following states.
That is, the position of the lower end of the black matrix pattern in the direction parallel to the substrate surface is negative on the center side of the pattern and positive on the outer side of the pattern (side away from the center) with respect to the upper end of the pattern. It means that it exists in the range of -3.0- + 3.0 micrometers.
For example, a positive value is obtained when the above-mentioned “condition 1” is satisfied.
The definitions of “upper part” and “lower part” of the photosensitive dark color composition layer or black matrix pattern will be described later.
The cross-sectional shape of the black matrix pattern, particularly the cross-sectional shape of the end portion, can be controlled by the conditions of exposure, development, and pre-baking described later. First, the cross-sectional shape of the end portion of the black matrix pattern after the development process will be described in detail.

  In the black matrix forming step, when developing the photosensitive dark color composition layer after exposure, the surface of the photosensitive dark color composition layer (refers to the surface not in contact with the substrate; hereinafter, the black matrix is also referred to similarly). ), And the inside of the layer within 1/3 of the thickness (the length of the photosensitive dark color composition layer in the normal direction of the substrate) (hereinafter referred to as “the upper part of the photosensitive dark color composition layer”). Similarly, with respect to the black matrix, within one-third of the thickness of the surface of the black matrix is referred to as “black matrix upper portion” development, and the back surface of the photosensitive dark color composition layer (surface in contact with the substrate). Hereinafter, the black matrix is also referred to as “the back side of the black matrix”, and the inner part of the layer within 2/3 of the thickness of the photosensitive dark color composition layer from the back side (hereinafter “photosensitive”). When the development of the black matrix is also referred to as “black matrix lower part”), the cross-sectional shape of the photosensitive dark color composition layer is, for example, As shown in FIG. 10, it has a substantially vertical shape (a shape close to a rectangle).

  On the other hand, compared with the development of the surface of the photosensitive dark color composition layer and the upper part of the photosensitive dark color composition layer, there is an excess or deficiency in the development of the back surface of the photosensitive dark color composition layer and the photosensitive dark color composition. May occur. When the development is excessive, the lower part of the photosensitive dark color composition layer is in a vacant state, and the substrate on which the photosensitive dark color composition layer (black matrix) is formed is cut in the width direction of the black matrix. The cross-sectional shape of the photosensitive dark color composition layer is, for example, an undercut shape (reverse taper shape) as shown in FIG. On the other hand, when the development is insufficient, the lower part of the photosensitive dark color composition layer protrudes, and the substrate on which the photosensitive dark color composition layer (black matrix) is formed is cut in the width direction of the black matrix. In this case, the cross-sectional shape of the photosensitive dark color composition layer is, for example, a tapered shape (forward tapered shape) as shown in FIG.

If the reverse taper as shown in FIG. 11 is large after the main development step and before the baking step described later, the upper protruding portion is likely to be missing in the development step, and the black matrix has a planar shape defect. Therefore, the reverse taper is preferably 3 μm or less, that is, the lower end is located at −3.0 to 0 μm with respect to the upper end in the photosensitive dark color composition layer. In addition, when the forward taper is large as shown in FIG. 12, the residue is likely to be left in the portion where the photosensitive dark color composition layer is to be removed due to insufficient development, and therefore the forward taper is 3 μm or less. It is desirable that the lower end is located at 0 to 3.0 μm with respect to the upper end in the photosensitive dark color composition layer. Therefore, the most desirable shape is a shape in which the end portion of the photosensitive dark color composition layer is substantially vertical as shown in FIG. After the development, as described above, it is preferable that the shape becomes a substantially vertical shape, and heat is sagged during the subsequent post-baking to have an arcuate cross-sectional shape.
Actually, there is some variation due to process variations, etc., and the shape of the photosensitive dark color composition layer after development is a cross-sectional shape in which the lower end is located at −3.0 to +3.0 μm with respect to the upper end. If there is no problem, a cross-sectional shape in which the lower end is located at −2.0 to +2.0 μm with respect to the upper end is desirable.

In order to make the end of the photosensitive dark color composition layer perpendicular to the shape shown in FIG. 10 after the main development step and before the baking step described later, the development conditions can be adjusted appropriately. It is important, and the cross-sectional shape can be adjusted by changing the development conditions. Conceptually, the reverse taper is obtained when the development is performed under a slightly stronger condition than the commonly used development conditions, and the forward taper is obtained when the development is performed under a slightly weaker condition.
Stronger conditions are higher temperature, longer time, higher flow rate, higher shower pressure, etc. Conversely, weaker conditions are lower temperature, shorter time, lower flow rate, lower shower pressure, etc. Among them, adjustment of temperature and time is particularly important.

Specifically, the development temperature is preferably 20 to 35 ° C., more preferably 20 to 30 ° C., from the viewpoint that the cross-sectional shape can be adjusted with high accuracy. The development time is preferably 20 to 120 seconds, and more preferably 30 to 70 seconds.
Among these, a preferable combination of the development temperature and the development time is, for example, 40 to 70 seconds at a temperature of 23 ° C. and 30 to 60 seconds at a temperature of 25 ° C.
The shower pressure is preferably from 0.01 to 0.5 MPa, preferably from 0.05 to 0.3 MPa, and preferably from 0.1 to 0.3 MPa from the viewpoint of preventing the black matrix from being chipped.

  Moreover, in order to adjust the cross-sectional shape more finely, it is preferable to add a pre-bake process described later to the black matrix forming process.

-Bake process-
Next, the black matrix pattern is subjected to a heat treatment called baking (post-baking). Bake is a heat treatment after development for complete curing of the photosensitive dark color composition, and usually a heat curing treatment at 150 to 260 ° C. is performed.
The baking temperature is preferably 150 to 260 ° C, more preferably 180 to 260 ° C, and most preferably 200 to 240 ° C. The baking time is preferably 10 to 150 minutes, more preferably 20 to 120 minutes, and most preferably 30 to 90 minutes.
By baking the photosensitive dark color composition layer end having a vertical cross-sectional shape close to that shown in FIG. 10 in the above condition range after the main development step, the cross-sectional shape is close to an arc as shown in FIG. The shape can be adjusted. This is because the photosensitive dark color composition after development is heated by baking, and before the photosensitive dark color composition is completely cured, the viscosity is once lowered so that the edge portion has surface tension. The shape as described above is formed by being rounded and then cured.

  The ease of rounding of the edge due to heating after development (hereinafter sometimes referred to as “thermal sag”) also varies depending on the composition of the photosensitive dark color composition, prebaking, exposure, and development conditions. In general, the composition ratio of the photosensitive dark color composition is more likely to cause heat sagging as the concentration of the light shielding agent is lower than that of the binder polymer described later, and more difficult to heat sagging as the concentration of the light shielding agent is higher. For example, when the post-baking film thickness is 1.4 μm, a light-shielding agent concentration at which OD (optical density of the black matrix) is 4.1 can be suitably used. Compared with this, when the film thickness after baking is 1.0 μm and the shading agent concentration is OD 4.1, it is difficult for heat sagging to occur.

Another means for causing thermal sag is to devise the monomer composition. For example, as described in JP-A No. 2004-163917, it is possible to suitably use a monomer by mixing a trifunctional or higher functional monomer and a bifunctional monomer.
In addition, as the pre-bake temperature and time are shorter and shorter, heat sag is easier, and as the length is higher and longer, heat sag is harder. It is easy to do, and there is a tendency that the stronger it is, the more difficult it is to sag. In addition, the post-baking temperature is slightly low and it tends to sag when it is applied for a long time, and the temperature is high and it tends to be difficult to sag when it is applied for a short time.

FIG. 13 shows an example of the cross-sectional shape of the black matrix after baking.
In FIG. 13, the point where the arc starts from the flat black matrix surface (that is, the upper end of the black matrix) is P point, and the end of the black matrix (that is, the lower end of the black matrix) is Q point.
The distance in the direction parallel to the substrate surface from point P to point Q is the aforementioned “taper length”. A preferable range of the taper length is as described above.

FIG. 14 is a cross-sectional view when colored pixels are formed on a substrate on which the black matrix of FIG. 13 is formed. As described above, the swell of the overlap portion between the black matrix and the colored pixel (that is, the height h _Y ) can be suppressed.

  The baking process is carried out continuously or batchwise by using a heating means such as a hot plate, a convection oven (hot air circulation dryer) or a high-frequency heater so that the photosensitive dark color composition layer after development is in the above condition. It can be done with a formula.

-Other processes-
In the black matrix forming step in the present invention, a pre-baking step may be added after the photosensitive dark color composition layer forming step and before the exposing step, or after the developing step. Before the baking (post-baking) step, a step of curing the formed black matrix by exposure may be included if necessary.

(Pre-baking process)
As described above, in order to adjust the cross-sectional shape after development of the black matrix, it is preferable to appropriately adjust the pre-bake conditions in addition to adjusting the exposure and development conditions in the black matrix formation step. In the black matrix forming step of the present invention, the taper tends to be reverse tapered when performed at a low temperature and forward tapered when performed at a high temperature, compared to pre-baking conditions that are usually used.
Specifically, when prebaking with a hot plate, the prebaking temperature is preferably 65 to 120 ° C. By setting the temperature to 65 ° C. or higher, it is possible to prevent the photosensitive dark color composition layer from being peeled off during the development process. By setting the temperature to 120 ° C. or lower, development of the lower portion of the photosensitive dark color composition layer proceeds. It can be in a state to do. More preferably, it is 70-100 degreeC, and 75-90 degreeC is the most preferable. The pre-bake time is preferably 50 to 300 seconds, more preferably 90 to 200 seconds, and most preferably 100 to 180 seconds. By performing pre-baking in the above condition range, the cross-sectional shape after development of the photosensitive dark color composition layer can be easily adjusted.
In addition, prebaking can also be performed in an oven, and also in this case, the cross-sectional shape after development can be adjusted by appropriately setting prebaking conditions equivalent to those described above.

<Coloring pattern formation process>
In the colored pattern forming step in the present invention, at least a photosensitive colored composition layer is formed on the substrate on which the resin black matrix is formed using a photosensitive colored composition (photosensitive colored composition layer forming step). Then, the formed photosensitive coloring composition layer is subjected to pattern exposure (coloring layer exposure step), and the pattern-exposed photosensitive coloring composition layer is developed (coloring layer development step) to form a colored pattern which is a stripe pattern. It is a process to do.
Furthermore, from the viewpoint of forming the cross-sectional shape of the end portion of the colored pattern into a tapered shape, it is preferable to form the colored pattern by baking after the developing step (baking step).

-Photosensitive coloring composition layer formation process-
In the photosensitive coloring composition layer forming step, the photosensitive coloring composition layer is formed using the photosensitive coloring composition on the substrate on which the resin black matrix is formed.
As a method for forming the photosensitive coloring composition layer on the substrate on which the resin black matrix is formed, the same method as the method for forming the photosensitive dark color composition layer on the substrate, that is, a coating method or a transfer method is used. Can be used.
Among them, the method of applying the photosensitive coloring composition to the front surface of the substrate on which the black matrix is formed with a slit coater or the like is preferable because the effects of the present invention can be exhibited well.
The layer thickness of the photosensitive coloring composition layer is preferably in the range of 1.0 to 3.0 μm, in order to obtain a sufficient color reproduction region and a sufficient panel luminance. More preferably, it is in the range of 5 μm.

-Colored layer exposure process-
In the colored layer exposure step, the photosensitive colored composition layer is exposed.
The exposure treatment of the photosensitive coloring composition layer can be performed in the same manner as the exposure step of the photosensitive dark color composition layer. When forming a colored pattern of multiple colors, each color is exposed through a predetermined mask pattern of each color, and the photosensitive colored composition layer of each color irradiated with light is patterned (in the case of a negative type, cured). can do.

-Pre-baking process-
Also in the colored pattern forming step, after the photosensitive colored composition layer forming step and before the colored layer exposing step, a step of pre-baking the photosensitive colored composition layer in order to dry the photosensitive colored composition ( It is preferable to provide a colored layer prebaking step).
60-140 degreeC is preferable and, as for the prebaking temperature of the photosensitive coloring composition layer, 80-120 degreeC is more preferable. The pre-bake time is preferably 30 to 300 seconds, more preferably 80 to 200 seconds.

Further, from the viewpoint of reducing the height h _Y and more effectively establishing the relationship of the formula 1, the shape of the surface of the photosensitive coloring composition layer after pre-baking may be important.
For example, as shown in FIG. 15, in the cross section when the pre-baked photosensitive coloring composition layer 40 is cut along a plane perpendicular to the pattern edge of the resin black matrix 12 and perpendicular to the substrate 10, the photosensitive coloring composition layer 40. Of the composition layer surface 42, the position of the point S close to the 0.1 μm substrate in the substrate normal direction with respect to the point R farthest from the substrate 10 may be important.
For example, the position in the direction parallel to the substrate surface of the point S is negative the resin black matrix forming region side position of the pattern edge E _B nearest the resin black matrix in the point S as a reference (0) (−), When the resin black matrix non-formation region side is positive (+), it is preferably in the range of −2 μm to +10 μm.
Such a shape can be suitably obtained, for example, by setting the taper length of the resin black matrix to 10 μm or less (more preferably from 1 μm to 5 μm).

-Colored layer exposure process-
In the colored layer exposure step, the photosensitive colored composition layer is exposed.
The exposure treatment of the photosensitive coloring composition layer can be performed in the same manner as the exposure step of the photosensitive dark color composition layer. When forming a colored pattern of multiple colors, each color is exposed through a predetermined mask pattern of each color, and the photosensitive colored composition layer of each color irradiated with light is patterned (in the case of a negative type, cured). can do.

-Colored layer development process-
In the colored layer developing step, the photosensitive colored composition layer after exposure is developed.
The development processing of the photosensitive coloring composition layer after the exposure can be performed in the same manner as described in the description of the development process of the photosensitive dark composition layer, and the developer described in the development process is preferable. Can be used.
As the development conditions, the development described in the description of the development process of the photosensitive dark color composition layer in order to adjust the distance of the overlap portion and the height of the horn generated in the overlap portion between the black matrix and the colored pixel. It is preferable to develop the photosensitive coloring composition layer under conditions.

-Colored layer baking process-
In the colored layer baking step, the developed photosensitive colored composition layer is baked.
The method for baking the photosensitive coloring composition layer after development can be the same method as the baking step for baking the photosensitive dark color composition layer described above.

When forming a colored pattern of a plurality of hues such as RGB three hues, the formation of the photosensitive coloring composition layer, exposure, development, and baking may be repeated as many times as desired, or for each hue. After the formation, exposure, and development of the photosensitive coloring composition layer, all the hues may be finally baked. As a result, a color filter including a colored pixel having a black matrix and a desired hue is manufactured.
Next, the photosensitive coloring composition used for the manufacturing method of the color filter of this invention and the photosensitive dark color composition are demonstrated.

≪Photosensitive coloring composition≫
The photosensitive coloring composition used for forming the coloring pattern of the color filter of the present invention is a radiation-sensitive composition (for example, in the case of a negative type, a radiation-sensitive composition that is cured by light), and (A -1) It preferably contains a colorant, (B) a binder polymer, (C-1) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent. Other additives such as a dispersant and a surfactant may be included.

-(A-1) Colorant-
As the colorant, a dye / pigment system can be appropriately selected. The pigment used as the colorant may be an inorganic pigment or an organic pigment, but preferably has a high transmittance. In view of the above, it is preferable to use one having a particle size as small as possible. The average particle size is preferably 10 to 100 nm, more preferably 10 to 50 nm. In the photosensitive coloring composition used in the present invention, by using a polymer dispersing agent described later, even when the size of the coloring agent is small, the pigment dispersibility and dispersion stability are improved. Even if the thickness is small, a colored pixel having excellent color purity can be formed.

  Examples of the inorganic pigment that can be used as a colorant for forming a colored pattern (colored pixel) include metal compounds represented by metal oxides, metal complex salts, and the like. Specifically, iron, cobalt, aluminum, cadmium And metal oxides such as lead, copper, titanium, magnesium, chromium, zinc, and antimony, and composite oxides of the above metals.

Moreover, as an organic pigment, for example,
C. I. Pigment Yellow 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199; I. Pigment orange 36, 38, 43, 71; C.I. I. Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270;
C. I. Pigment violet 19, 23, 32, 37, 39; C.I. I. Pigment Blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
C. I. Pigment green 7, 36, 37;
C. I. Pigment brown 25, 28;
C. I. Pigment Black 1
Etc.

Although it does not specifically limit in this invention, The following pigment is more preferable.
C. I. Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185;
C. I. Pigment orange 36, 71;
C. I. Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264;
C. I. Pigment violet 19, 23, 37;
C. I. Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
C. I. Pigment green 7, 36, 37;

These organic pigments can be used alone or in various combinations in order to increase color purity. Specific examples of combinations are shown below.
For example, as red (R) pigments, anthraquinone pigments, perylene pigments, diketopyrrolopyrrole pigments alone or at least one of them, bisazo yellow pigments, isoindoline yellow pigments, quinophthalone yellow pigments or perylenes A mixture with a red pigment can be used. For example, as an anthraquinone pigment, C.I. I. Pigment red 177, and perylene pigments include C.I. I. Pigment red 155, C.I. I. Pigment Red 224, and diketopyrrolopyrrole pigments include C.I. I. Pigment red 254, and C.I. I. Mixing with Pigment Yellow 139 is preferred. The mass ratio of the red pigment to the yellow pigment is preferably 100: 5 to 100: 50 from the viewpoint of obtaining sufficient color purity and suppressing deviation from the NTSC target hue. In particular, the mass ratio is optimally in the range of 100: 10 to 100: 30. In addition, in the case of the combination of red pigments, it can adjust according to chromaticity.

  In addition, as the green (G) pigment, a halogenated phthalocyanine pigment is used alone, or a mixture thereof with a bisazo yellow pigment, a quinophthalone yellow pigment, an azomethine yellow pigment or an isoindoline yellow pigment is used. be able to. For example, C.I. I. Pigment Green 7, 36, 37 and C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180 or C.I. I. Mixing with Pigment Yellow 185 is preferred. The mass ratio of the green pigment to the yellow pigment is preferably 100: 5 to 100: 150 from the viewpoint of obtaining sufficient color purity and suppressing deviation from the NTSC target hue. The mass ratio is particularly preferably in the range of 100: 30 to 100: 120.

  As the blue (B) pigment, a phthalocyanine pigment can be used alone, or a mixture of this with a dioxazine purple pigment can be used. For example, C.I. I. Pigment blue 15: 6 and C.I. I. Mixing with pigment violet 23 is preferred. The mass ratio of the blue pigment and the purple pigment is preferably 100: 0 to 100: 50, more preferably 100: 5 to 100: 30.

  The content of (A-1) the colorant (pigment) in the photosensitive coloring composition layer used in the present invention is preferably 25 to 75% by mass with respect to the total solid content (mass) of the composition. 32 to 70% by mass is more preferable. (A-1) When the content of the colorant (pigment) is within the above range, the color density is sufficient and it is effective to ensure excellent color characteristics.

-(B) Binder polymer-
The photosensitive coloring composition of the present invention preferably contains a binder polymer for the purpose of improving film properties and imparting development properties. The following alkali-soluble resins can be used as the binder polymer.
The alkali-soluble resin used in the present invention is a linear organic polymer, and at least one molecule in a molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as a main chain). It can be appropriately selected from alkali-soluble resins having a group that promotes alkali solubility (for example, carboxyl group, phosphoric acid group, sulfonic acid group, hydroxyl group, etc.).

More preferable as the alkali-soluble resin are polymers having a carboxylic acid in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957. Methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, croton as described in JP-A Nos. 59-53836 and 59-71048. Acrylic polymers such as acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, acidic cellulose derivatives having a carboxylic acid in the side chain, and polymers having a hydroxyl group with an acid anhydride added The thing of a copolymer is mentioned.
The acid value is preferably in the range of 10 to 200 mgKOH / g, preferably 30 to 180 mgKOH / g, and more preferably 50 to 150 mgKOH / g.

As a specific structural unit of the alkali-soluble resin, a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is particularly suitable. Examples of other monomers copolymerizable with the (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, and vinyl compounds. Here, the hydrogen atom of the alkyl group and the aryl group may be substituted with a substituent.
Examples of the alkyl (meth) acrylates and aryl (meth) ^{_{acrylate, CH 2 = C (R 1}} ) (COOR 3) [wherein, ^{R 1} represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, ^{R 3} Represents an alkyl group having 1 to 8 carbon atoms or an aralkyl group having 6 to 12 carbon atoms. Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, octyl (meth) ) Acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, tolyl (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, hydroxyalkyl (meth) acrylate (alkyl is an alkyl group having 1 to 8 carbon atoms) ), Hydroxyglycidyl methacrylate, tetrahydrofurfuryl methacrylate and the like.

A resin having a polyalkylene oxide chain in the molecular side chain is also preferable. The polyalkylene oxide chain may be a polyethylene oxide chain, a polypropylene oxide chain, a polytetramethylene glycol chain, or a combination thereof, and the terminal is a hydrogen atom or a linear or branched alkyl group.
1-20 are preferable and, as for the repeating unit of a polyethylene oxide chain and a polypropylene oxide chain, 2-12 are more preferable. Acrylic copolymers having a polyalkylene oxide chain in these side chains include, for example, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, poly (ethylene glycol-propylene glycol) mono (meth) acrylate, and the like. These OH group alkyl-blocked compounds such as methoxypolyethylene glycol mono (meth) acrylate, ethoxypolypropylene glycol mono (meth) acrylate, methoxypoly (ethylene glycol-propylene glycol) mono (meth) acrylate and the like are used as copolymerization components. An acrylic copolymer.

As the vinyl compound, CH ₂ = CR ¹ R ² [wherein R ¹ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R ² represents an aromatic hydrocarbon ring having 6 to 10 carbon atoms. . Specific examples include styrene, α-methylstyrene, vinyl toluene, acrylonitrile, vinyl acetate, N-vinyl pyrrolidone, polystyrene macromonomer, polymethyl methacrylate macromonomer, and the like.
Other monomers that can be copolymerized can be used singly or in combination of two or more. Among these, benzyl (meth) acrylate / (meth) acrylic acid copolymers and multi-component copolymers composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers are preferable.

As described above, the alkali-soluble resin preferably has an acid value in the range of 10 to 200 mgKOH / g. When the acid value is 200 or less, the solubility in alkali is not excessively increased, and the appropriate development range (development latitude) can be prevented from being narrowed. On the other hand, if it is 10 or more, the solubility in alkali is unlikely to be reduced, so that the development time can be prevented from being prolonged.
In addition, the weight average molecular weight Mw (polystyrene conversion value measured by GPC method) of the alkali-soluble resin is used in order to realize a viscosity range in which the photosensitive coloring composition can be easily used in the process such as coating, and the film strength is also increased. In order to ensure, it is preferable that it is 2,000-100,000, More preferably, it is 3,000-50,000.

  In order to improve the crosslinking efficiency of the photosensitive coloring composition in the present invention, a resin having a polymerizable group in an alkali-soluble resin may be used alone or in combination with an alkali-soluble resin having no polymerizable group. A polymer containing a group, a (meth) acryl group, an aryloxyalkyl group or the like in the side chain is useful. The alkali-soluble resin having a polymerizable double bond can be developed with an alkali developer, and is further provided with photocurability and thermosetting. Examples of polymers containing these polymerizable groups are shown below, but are not limited to the following as long as each molecule contains an alkali-soluble group such as a COOH group and an OH group and a carbon-carbon unsaturated bond. .

(1) Urethane modification obtained by reacting an isocyanate group and an OH group in advance, leaving one unreacted isocyanate group and reacting at least one (meth) acryloyl group with an acrylic resin containing a carboxyl group A polymerizable double bond-containing acrylic resin, (2) an unsaturated group-containing acrylic resin obtained by a reaction between an acrylic resin containing a carboxyl group and a compound having both an epoxy group and a polymerizable double bond in the molecule,
(3) Acid pendant type epoxy acrylate resin,
(4) A polymerizable double bond-containing acrylic resin obtained by reacting an acrylic resin containing an OH group with a dibasic acid anhydride having a polymerizable double bond.
Among the above, the resins (1) and (2) are particularly preferable.

As a specific example, a copolymer of an OH group such as 2-hydroxyethyl acrylate, a COOH group such as methacrylic acid, and a monomer such as an acrylic or vinyl compound copolymerizable with these, an OH group A compound obtained by reacting an epoxy ring having reactivity with a compound having a carbon-carbon unsaturated bond group (for example, a compound such as glycidyl acrylate) can be used. In the reaction with the OH group, a compound having an acid anhydride, an isocyanate group, or an acryloyl group in addition to the epoxy ring can be used.
Further, a compound obtained by reacting an unsaturated carboxylic acid such as acrylic acid with a compound having an epoxy ring described in JP-A-6-102669 and JP-A-6-1938 is saturated or unsaturated polybasic. A reaction product obtained by reacting an acid anhydride can also be used.

Examples of compounds having both an alkali solubilizing group such as a COOH group and an intercarbon unsaturated group include, for example, Dynar NR series (manufactured by Mitsubishi Rayon Co., Ltd.); Ltd .; Biscort R-264, KS resist 106 (both manufactured by Osaka Organic Chemical Industry Co., Ltd.); Cyclomer P series, Plaxel CF200 series (both manufactured by Daicel Chemical Industries, Ltd.); Ebecryl 3800 (Daicel) And UCB Co., Ltd.).
As addition amount of alkali-soluble resin, it is preferable that it is the range of 3-30 mass% in the total solid of a photosensitive coloring composition layer, and 5-20 mass% is more preferable.

In preparing the photosensitive coloring composition, it is preferable to add the following epoxy resin as a binder polymer in addition to the alkali-soluble resin. Examples of the epoxy resin include compounds having two or more epoxy rings in the molecule, such as bisphenol A type, cresol novolac type, biphenyl type, and alicyclic epoxy compound.
For example, as bisphenol A type, Epototo YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-1059, YDF-8170, YDF-170 and the like ( As described above, manufactured by Toto Kasei Co., Ltd.), Denacol EX-1101, EX-1102, EX-1103, etc. (above, manufactured by Nagase Kasei Co., Ltd.), Plaxel GL-61, GL-62, G101, G102 (above, Daicel) In addition, bisphenol F type and bisphenol S type epoxy resins similar to these can also be used.

  Epoxy acrylates such as Ebecryl 3700, 3701, and 600 (manufactured by Daicel UC Corporation) can also be used. Examples of the cresol novolak type include Epototo YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704, etc. (above, manufactured by Toto Kasei Co., Ltd.), Denacol EM-125, etc. The biphenyl type is 3,5,3 ′, 5′-tetramethyl-4,4′-diglycidylbiphenyl, and the alicyclic epoxy compounds are Celoxide 2021, 2081, 2083, 2085, Epolide GT-301, GT -302, GT-401, GT-403, EHPE-3150 (above, manufactured by Daicel Chemical Industries, Ltd.), Santo Tote ST-3000, ST-4000, ST-5080, ST-5100, etc. (above, Toto Kasei Co., Ltd.) ), Epiclon 430, 673, 695, 850S, 4 32 (manufactured by Dainippon Ink and Chemicals Inc.) and the like. 1,1,2,2-tetrakis (p-glycidyloxyphenyl) ethane, tris (p-glycidyloxyphenyl) methane, triglycidyltris (hydroxyethyl) isocyanurate, o-phthalic acid diglycidyl ester, terephthalic acid diester In addition, glycidyl esters such as Epototo YH-434 and YH-434L, which are amine-type epoxy resins, and glycidyl esters obtained by modifying dimer acid in the skeleton of bisphenol A-type epoxy resins can also be used.

Among these, “molecular weight / number of epoxy rings” is preferably 100 or more, and more preferably 130 to 500. If the “molecular weight / number of epoxy rings” is small, the curability is high, and the shrinkage during curing is large.
Specific preferred compounds include Epototo YD-115, 118T, 127, YDF-170, YDPN-638, YDPN-701, Plaxel GL-61, GL-62, 3,5,3 ', 5'-tetramethyl. -4,4 'diglycidyl biphenyl, celoxide 2021, 2081, epolide GT-302, GT-403, EHPE-3150, etc. are mentioned.

-(C-1) polymerizable compound-
The photosensitive coloring composition used in the present invention preferably contains (C-1) a polymerizable compound.
The polymerizable compound that can be used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and is a compound having at least one terminal ethylenically unsaturated bond, preferably two or more. To be elected. Such a compound group is widely known in the industrial field, and can be used without any particular limitation in the present invention. These have chemical forms such as monomers, prepolymers, i.e. dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxyl group, amino group or mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and a monofunctional or A dehydration condensation reaction product with a polyfunctional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or In addition, a substitution reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, isocyanuric acid There are EO-modified triacrylate and the like.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

  Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate. Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.

  Examples of other esters include aliphatic alcohol esters described in JP-B-51-47334 and JP-A-57-196231, JP-A-59-5240, JP-A-59- Those having an aromatic skeleton described in Japanese Patent No. 5241 and JP-A-2-226149, those containing an amino group described in JP-A-1-165613, and the like are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Specific examples of amide monomers of aliphatic polyvalent amine compounds and unsaturated carboxylic acids include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexamethylene bis. -Methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, xylylene bismethacrylamide and the like. Examples of other preferable amide monomers include those having a cyclohexylene structure described in JP-B No. 54-21726.

  In addition, urethane-based addition polymerizable compounds produced by using an addition reaction of isocyanate and hydroxyl group are also suitable, and specific examples thereof include, for example, one molecule described in JP-B-48-41708. A vinyl urethane containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxyl group represented by the following general formula (V) to a polyisocyanate compound having two or more isocyanate groups. Compounds and the like.

^{_{CH 2 = C (R 4)}} COOCH 2 CH (R 5) OH (V)
(However, R ⁴ and R ⁵ each independently represent H or CH _3. )

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, JP-B-2-16765, JP-B-58-49860, JP-B-56- Urethane compounds having an ethylene oxide skeleton described in JP 17654, JP-B 62-39417, and JP-B 62-39418 are also suitable. Furthermore, by using addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238. Can obtain a photopolymerizable composition having an excellent photosensitive speed.

  Other examples include polyester acrylates, epoxy resins and (meth) described in JP-A-48-64183, JP-B-49-43191 and JP-B-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as epoxy acrylates reacted with acrylic acid. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337, JP-B-1-40336, and vinylphosphonic acid-based compounds described in JP-A-2-25493. Etc. can also be mentioned. In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

About these polymerizable compounds, the details of usage such as the structure, single use or combination, addition amount, etc. can be arbitrarily set according to the performance design of the final photosensitive material. For example, it is selected from the following viewpoints.
From the viewpoint of sensitivity, a structure having a large unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, in order to increase the strength of the colored image portion, that is, the photosensitive coloring composition layer, those having three or more functionalities are preferable, and further, different functional numbers and different polymerizable groups (for example, acrylic ester, methacrylic ester, A method of adjusting both sensitivity and strength by using a styrene compound or a vinyl ether compound) is also effective. From the viewpoint of curing sensitivity, it is preferable to use a compound containing two or more (meth) acrylic acid ester structures, more preferably a compound containing three or more, and most preferably a compound containing four or more. preferable. Moreover, it is preferable to contain an EO modified body from a viewpoint of hardening sensitivity and the developability of an unexposed part. Moreover, it is preferable to contain a urethane bond from a viewpoint of hardening sensitivity and exposure part intensity | strength.
In addition, for the compatibility and dispersibility with other components (for example, binder polymer, initiator, colorant (pigment, dye, etc.) in the photosensitive coloring composition layer, the selection and use method of the addition polymerization compound is as follows. For example, compatibility may be improved by using a low-purity compound or using two or more compounds in combination, and selecting a specific structure for the purpose of improving adhesion to the substrate. There is also a possibility.

  From the above viewpoints, bisphenol A diacrylate, modified bisphenol A diacrylate EO, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate Acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxy D (I) Isocyanurate, pentaerythritol tetraacrylate EO modified product, dipentaerythritol hexaacrylate EO modified product, etc. are mentioned as preferable ones. Also, as commercially available products, urethane oligomer UAS-10, UAB-140 (Sanyo Kokusaku Pulp Co., Ltd.) Manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, and AI-600 (manufactured by Kyoeisha) are preferred.

  Among them, bisphenol A diacrylate EO modified product, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, pentaerythritol tetraacrylate EO modified product, Dipentaerythritol hexaacrylate EO modified products such as DPHA (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (Kyoeisha) Manufactured) is more preferable.

  (C-1) The content of the polymerizable compound is preferably 5 to 55% by mass and preferably 10 to 50% by mass in the total solid content in the photosensitive coloring composition layer of the present invention. More preferably, it is 15-45 mass%.

-(D) Photopolymerization initiator-
The photosensitive coloring composition of the present invention preferably contains (D) a photopolymerization initiator.
The photopolymerization initiator is a compound that is decomposed by light and starts and accelerates the polymerization of the polymerizable compound (C-1), and preferably has an absorption in a wavelength region of 300 to 500 nm. Moreover, the said photoinitiator can be used individually or in combination of 2 or more types.

  Examples of the photopolymerization initiator include organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, hexa Examples thereof include arylbiimidazole compounds, organic boric acid compounds, disulfonic acid compounds, oxime ester compounds, onium salt compounds, and acylphosphine (oxide) compounds.

Specific examples of organic halogenated compounds include Wakabayashi et al., “Bull Chem. Soc.
Japan 42, 2924 (1969), U.S. Pat. No. 3,905,815, JP-B 46-4605, JP-A 48-36281, JP-A 55-3070, JP JP 60-239736, JP 61-169835, JP 61-169837, JP 62-58241, JP 62-212401, JP 63-70243 JP, 63-298339, M .; P. Hutt “Journal of Heterocyclic Chemistry” 1 (No 3), (1970) ”, and the oxazole compound and s-triazine compound substituted with a trihalomethyl group.

  As the s-triazine compound, more preferably, an s-triazine derivative in which at least one mono-, di-, or trihalogen-substituted methyl group is bonded to the s-triazine ring, specifically, for example, 2,4,6- Tris (monochloromethyl) -s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6- Bis (trichloromethyl) -s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichloro Methyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloro) Methyl) -s-triazine, 2- (3,4-epoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl)- s-triazine, 2- [1- (p-methoxyphenyl) -2,4-butadienyl] -4,6-bis (trichloromethyl) -s-triazine, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (pi-propyloxystyryl) -4,6-bis (trichloromethyl)- s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-natoxynaphthyl) -4,6-bis (trichloromethyl) s-triazine, 2-phenylthio-4,6-bis (trichloromethyl) -s-triazine, 2-benzylthio-4,6-bis (trichloromethyl) -s-triazine, 4- (o-bromo-pN) , N- (diethoxycarbonylamino) -phenyl) -2,6-di (trichloromethyl) -s-triazine, 2,4,6-tris (dibromomethyl) -s-triazine, 2,4,6-tris (Tribromomethyl) -s-triazine, 2-methyl-4,6-bis (tribromomethyl) -s-triazine, 2-methoxy-4,6-bis (tribromomethyl) -s-triazine, etc. It is done.

  Examples of the oxydiazole compound include 2-trichloromethyl-5-styryl-1,3,4-oxodiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3,4-oxodiazole, 2- Examples include trichloromethyl-5- (naphth-1-yl) -1,3,4-oxodiazole, 2-trichloromethyl-5- (4-styryl) styryl-1,3,4-oxodiazole, and the like. .

  Examples of the carbonyl compound include benzophenone, Michler ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone and other benzophenone derivatives, 2,2-dimethoxy-2 -Phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenylketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy -1- (p-dodecylphenyl) ketone, 2-methyl-1- (4 ′-(methylthio) phenyl) -2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1- (4-mol Forinophenyl) -butanone-1,2,4,6 trimethylbenzoyl-diphenyl-phosphine oxide, 1,1,1-trichloromethyl- (p-butylphenyl) ketone, 2-benzyl-2-dimethylamino-4 -Acetophenone derivatives such as morpholinobyrophenone, thioxanthone derivatives such as thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, Examples thereof include benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate.

  Examples of the ketal compound include benzyl dimethyl ketal and benzyl-β-methoxyethyl ethyl acetal.

  Examples of the benzoin compound include m-benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, methyl o-benzoylbenzoate and the like.

  Examples of the acridine compound include 9-phenylacridine, 9-pyridylacridine, 9-pyrazinylacridine, 1,2-di (9-acridinyl) ethane, 1,3-di (9-acridinyl) propane, 1,4- Di (9-acridinyl) butane, 1,5-di (9-acridinyl) pentane, 1,6-di (9-acridinyl) hexane, 1,7-di (9-acridinyl) heptane, 1,8-di ( 9-acridinyl) octane, 1,9-di (9-acridinyl) nonane, 1,10-di (9-acridinyl) decane, 1,11-di (9-acridinyl) undecane, 1,12-di (9- Acridinyl) dodecane and other di (9-acridinyl) alkanes.

  Examples of the organic peroxide compound include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert-butylperoxide). Oxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroper Oxide, 1,1,3,3-tetramethylbutyl hydroperoxide, tert-butylcumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, 2 , -Oxanoyl peroxide, oxalic acid peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate , Dimethoxyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tert-butyl peroxyacetate, tert-butyl peroxypivalate, tert-butyl peroxyneodecanoate, tert- Butyl peroxyoctanoate, tert-butyl peroxylaurate, tersyl carbonate, 3,3 ′, 4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3 ′, 4,4 -Tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3 ', 4,4'-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxydihydrogen diphthalate), And carbonyldi (t-hexylperoxydihydrogen diphthalate).

  Examples of the azo compound include azo compounds described in JP-A-8-108621.

  Examples of the coumarin compound include 3-methyl-5-amino-((s-triazin-2-yl) amino) -3-phenylcoumarin, 3-chloro-5-diethylamino-((s-triazin-2-yl). ) Amino) -3-phenylcoumarin, 3-butyl-5-dimethylamino-((s-triazin-2-yl) amino) -3-phenylcoumarin, and the like.

  Examples of the azide compound include organic azide compounds described in U.S. Pat. No. 2,848,328, U.S. Pat. No. 2,852,379 and U.S. Pat. No. 2,940,553, 2,6-bis (4-azidobenzylidene) -4-ethyl. And cyclohexanone (BAC-E).

  Examples of the metallocene compound include JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2-4705, Various titanocene compounds described in JP-A-5-83588, such as di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, Di-cyclopentadienyl-Ti-bis-2,4-di-fluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, di- -Cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,4,5,6-pentaph Orofen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4,6-trifluoropheny -1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4 , 5,6-pentafluorophen-1-yl, iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109, and the like.

  As the hexaarylbiimidazole compound, for example, JP-B-6-29285, US Pat. Nos. 3,479,185, 4,311,783, 4,622,286, etc. And, specifically, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-bromophenyl) )) 4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 ′ -Bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) biidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5 '-Tetraphenylbi Dazole, 2,2′-bis (o-nitrophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-methylphenyl) -4,4 ′, 5 Examples include 5′-tetraphenylbiimidazole, 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, and the like.

  Examples of the organic borate compound include, for example, JP-A-62-143044, JP-A-62-1050242, JP-A-9-188865, JP-A-9-188686, and JP-A-9-188710. Publications, JP 2000-131837 A, JP 2002-107916 A, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, and Kunz, Martin “Rad Tech '98. Proceeding April 19 -22, 1998, Chicago ”etc., organic boron sulfonium complexes or organic boron described in JP-A-6-157623, JP-A-6-175564, and JP-A-6-175561. Oxosulfonium complex, JP-A-6-175554 JP, JP-A-6-175553, organoboron iodonium complex, JP-A-9-188710, organoboron phosphonium complex, JP-A-6-348011, JP-A-7-128785, JP Specific examples include organoboron transition metal coordination complexes such as 7-140589, JP-A-7-306527, and JP-A-7-292014.

  Examples of the disulfone compound include compounds described in JP-A No. 61-166544 and Japanese Patent Application No. 2001-132318.

  Examples of oxime ester compounds include J.M. C. S. Perkin II (1979) 1653-1660), J. MoI. C. S. Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, JP-A 2000-66385, JP-A 2000-80068, JP-T 2004-534797 And the compounds described. Specific examples include Irgacure OXE-01 and OXE-02 manufactured by Ciba Specialty Chemicals.

  Examples of onium salt compounds include S.I. I. Schlesinger, Photogr. Sci. Eng. 18, 387 (1974), T .; S. Diazonium salts described in Bal et al, Polymer, 21, 423 (1980), ammonium salts described in US Pat. No. 4,069,055, JP-A-4-365049, etc., US Pat. No. 4,069 , 055, 4,069,056, phosphonium salts described in European Patent Nos. 104,143, U.S. Pat. Nos. 339,049, 410,201. And iodonium salts described in JP-A-2-150848 and JP-A-2-296514.

  The iodonium salt that can be suitably used in the present invention is a diaryl iodonium salt, and is preferably substituted with two or more electron donating groups such as an alkyl group, an alkoxy group, and an aryloxy group from the viewpoint of stability. . In addition, as another preferable form of the sulfonium salt, an iodonium salt in which one substituent of the triarylsulfonium salt has a coumarin or an anthraquinone structure and absorption at 300 nm or more is preferable.

Examples of the sulfonium salt that can be suitably used in the present invention include European Patent Nos. 370,693, 390,214, 233,567, 297,443, and 297. No. 4,442, U.S. Pat. Nos. 4,933,377, 161,811, 410,201, 339,049, 4,760,013 No. 4,734,444, No. 2,833,827, German Patent No. 2,904,626, No. 3,604,580, No. 3,604 Examples thereof include sulfonium salts described in each specification of No. 581. From the viewpoint of stability, it is preferably substituted with an electron-withdrawing group. The electron withdrawing group preferably has a Hammett value greater than zero. Preferred electron-withdrawing groups include halogen atoms and carboxylic acids.
Other preferable sulfonium salts include sulfonium salts in which one substituent of the triarylsulfonium salt has a coumarin or anthraquinone structure and absorbs at 300 nm or more. As another preferable sulfonium salt, a sulfonium salt in which the triarylsulfonium salt has an allyloxy group or an arylthio group as a substituent and has absorption at 300 nm or more can be mentioned.

Moreover, as an onium salt compound, J.M. V. Crivello et al, Macromolecules, 10 (6), 1307 (1977), J. MoI. V. Crivello
et al, J. et al. Polymer Sci. , Polymer Chem. Ed. , 17, 1047 (1979), a selenonium salt described in C.I. S. Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988), and onium salts such as arsonium salts.

  Examples of the acylphosphine (oxide) compound include Irgacure 819, Darocur 4265, Darocur TPO and the like manufactured by Ciba Specialty Chemicals.

  (D) As a photopolymerization initiator, from the viewpoint of exposure sensitivity, a trihalomethyltriazine compound, a benzyldimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene Compound, oxime compound, triallylimidazole dimer, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound and derivatives thereof, cyclopentadiene-benzene-iron complex and salt thereof, halomethyloxadiazole compound, 3 -Compounds selected from the group consisting of aryl-substituted coumarin compounds are preferred.

  More preferred are trihalomethyltriazine compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, oxime compounds, triallylimidazole dimers, onium compounds, benzophenone compounds, acetophenone compounds, and trihalo compounds. Most preferred is at least one compound selected from the group consisting of a methyltriazine compound, an α-aminoketone compound, an oxime compound, a triallylimidazole dimer, and a benzophenone compound.

  (D) It is preferable that content of a photoinitiator is 0.1-20 mass% with respect to the total solid in a photosensitive coloring composition layer, More preferably, it is 0.5-15 mass%, Especially it is. Preferably it is 1-10 mass%. Within this range, good sensitivity and pattern formability can be obtained.

-(E) Solvent-
The photosensitive coloring composition used in the present invention can generally be prepared using a solvent.
Solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, lactic acid Ethyl, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. 3-oxypropionic acid alkyl esters (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate), methyl 2-oxypropionate, -2-oxypropionic acid alkyl esters such as ethyl oxypropionate and propyl 2-oxypropionate (for example, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, 2-ethoxypropion) Acid methyl, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, 2-ethoxy-2-methyl As well as methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, 1,3-butanediol diacetate, etc .;

  Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol mono Ethyl ether acetate, propylene glycol monopropyl ether acetate, diethylene glycol diethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, propylene Glycol n-propyl ether acetate, propylene glycol diacetate, propylene glycol n-butyl ether acetate, propylene glycol phenyl ether, propylene glycol phenyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol n-propyl ether acetate, dipropylene glycol n -Butyl ether acetate, tripropylene glycol mono n-butyl ether, tripropylene glycol methyl ether acetate, etc .;

Ketones such as acetone, methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone;
Alcohols such as ethanol, isopropyl alcohol, propylene glycol methyl ether, propylene glycol mono n-propyl ether, propylene glycol mono n-butyl ether,
Aromatic hydrocarbons such as toluene, xylene and the like can be mentioned.

Among these, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate Butyl carbitol acetate, propylene glycol methyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate and the like are suitable.
You may use a solvent in combination of 2 or more types besides using it independently.

-Other additives-
In addition to the above components, various known additives can be used in the photosensitive coloring composition used in the present invention depending on the purpose.
Hereinafter, such additives will be described.

(Dispersant)
The photosensitive coloring composition in the present invention preferably contains a polymer dispersant. The polymer dispersant is preferably a resin having a weight average molecular weight in the range of 3,000 to 100,000. Furthermore, it is preferable that an acid value is 20-300 mg / g. Hereinafter, such a specific polymer dispersant may be simply referred to as “dispersion resin”.
In the present invention, the dispersing resin is a pigment dispersing agent mentioned as the colorant (A-1) or a photosensitive dark color composition for forming a black matrix, which will be described later. It is a compound that can function as a dispersant.
Since the dispersion resin needs to have a specific acid value, it is preferably a polymer compound having an acidic group.

  Examples of the polymer skeleton of the polymer compound include polymers or copolymers of vinyl monomers, ester polymers, ether polymers, urethane polymers, amide polymers, epoxy polymers, silicone polymers, and modified products thereof. Or a copolymer [for example, a polyether / polyurethane copolymer, a copolymer of a polyether / vinyl monomer polymer, etc. (any of a random copolymer, a block copolymer, and a graft copolymer) Good). At least one selected from the group consisting of vinyl monomers, selected from the group consisting of polymers or copolymers of vinyl monomers, ester polymers, ether polymers, urethane polymers, and modified products or copolymers thereof. At least one kind is more preferable, and a polymer or copolymer of vinyl monomers is particularly preferable.

Examples of a method for introducing an acidic group into the polymer skeleton as described above include, for example, a method of copolymerizing a monomer containing an acidic group when polymerizing the polymer skeleton, and the polymer described above. There is a method of introducing a skeleton by polymer reaction after polymerization.
Examples of the monomer containing an acidic group include (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, cinnamic acid, acrylic acid dimer, vinyl benzoic acid, styrene sulfonic acid, 2-acrylamide-2- It is obtained by reacting an alcoholic hydroxyl group-containing monomer such as methylpropanesulfonic acid, mono (meth) acryloyl ethyl phosphate, or 2-hydroxyethyl methacrylate with a cyclic acid anhydride such as maleic anhydride or phthalic anhydride. And monomers.

Furthermore, the polymer compound having an acidic group may further be obtained by copolymerizing a vinyl monomer component.
The vinyl monomer is not particularly limited. For example, (meth) acrylic acid esters, crotonic acid esters, vinyl esters, maleic acid diesters, fumaric acid diesters, itaconic acid diesters, (meth) acrylamides , Vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like are preferable.

  Preferred examples of the “acidic group” include a carboxylic acid group, a sulfonic acid group, a monosulfate group, a phosphoric acid group, a monophosphate group, and a boric acid group. Sulfuric acid ester groups, phosphoric acid groups, and monophosphoric acid ester groups are more preferable, and carboxylic acid groups, sulfonic acid groups, and phosphoric acid groups are particularly preferable.

Moreover, it is also preferable to contain the group which has a basic nitrogen atom for a dispersibility improvement. The group having a basic nitrogen atom is, for example, an amino group (—NH ₂ ), a substituted imino group (—NHR ⁸ or —NR ⁹ R ¹⁰ ; where R ⁸ , R ⁹ , and R ¹⁰ are each Independently, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms), a guanidyl group represented by the following chemical formula (a1), or the following chemical formula Preferred examples include the amidinyl group represented by (a2).

In the chemical formula (a1), R ¹¹ and R ¹² each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms.
In the chemical formula (a2), R ¹³ and R ¹⁴ each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms.

Among these, an amino group (—NH ₂ ), a substituted imino group (—NHR ⁸ , or —NR ⁹ R ¹⁰ ; where R ⁸ , R ⁹ , and R ¹⁰ each independently has 1 to 10 carbon atoms. A guanidyl group represented by the chemical formula (a1) [in the chemical formula (a1), R ¹¹ and R ¹² are each independently an alkyl having 1 to 10 carbon atoms. Represents a group, a phenyl group, or a benzyl group. ] An amidinyl group represented by the chemical formula (a2) [in the chemical formula (a2), R ¹³ and R ¹⁴ each independently represents an alkyl group having 1 to 10 carbon atoms, a phenyl group, or a benzyl group. And the like include groups consisting of 1 to 200 hydrogen atoms and 0 to 20 sulfur atoms, which may be unsubstituted or may further have a substituent.

(Other dispersants)
The photosensitive coloring composition used in the present invention can be used in combination with a conventionally known dispersant (pigment dispersant) in addition to the dispersion resin.

Known dispersants (pigment dispersants) include polymer dispersants [for example, polyamidoamines and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified poly (meth) acrylates, (meth) acrylic types. Copolymers], polyoxyethylene alkyl phosphate esters, polyoxyethylene alkyl amines, alkanol amines, pigment derivatives, and the like.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.

  The polymer dispersant is adsorbed on the surface of the pigment and acts to prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures. On the other hand, the pigment derivative has an effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.

  Specific examples of known dispersants (pigment dispersants) that can be used in the present invention include "Disperbyk-107 (carboxylic acid ester), 130 (polyamide), 161, 162, 163, 164, 165, 166" manufactured by BYK Chemie. , 170 (polymer copolymer) ”,“ EFKA 4047, 4050, 4010, 4165 (polyurethane type), EFKA 4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyesteramide) manufactured by EFKA ), 6220 (fatty acid polyester), 6745 (phthalocyanine derivative), 6750 (azo pigment derivative) "," Ajisper PB821, PB822 "manufactured by Ajinomoto Fine Techno Co., Ltd.," Floren TG-710 (urethane oligomer) "manufactured by Kyoeisha Chemical Co., Ltd., Poly Low No. 50E, No. 300 (acrylic copolymer) ”,“ Dispalon # 7004 (polyetherester), DA-703-50, DA-705, DA-725 ”manufactured by Enomoto Kasei Co., Ltd.,“ “Emulgen 920, 930, 935, 985 (polyoxyethylene nonylphenyl ether)”, “acetamine 86 (stearylamine acetate)”, “Solsperse 5000 (phthalocyanine derivative), 22000 (azo pigment derivative), 13240 (polyester) manufactured by Lubrizol Corporation Amine), 3000, 17000, 27000 (polymer having a functional part at the end), 24000, 28000, 32000, 38500 (graft type polymer) "," Nikkor T106 (polyoxyethylene sorbitan monooleate) "manufactured by Nikko Chemical Co., Ltd. , M YS-IEX (polyoxyethylene monostearate) ”and the like.

  The above-mentioned known dispersants can be used in the range of 10 to 100% by mass, that is, 1/10 to 1/1 (equivalent) with respect to the dispersion resin as necessary.

(Surfactant)
When the pigment concentration is increased, the thixotropy of the coating solution is generally increased. Therefore, film thickness unevenness after the photosensitive colored composition layer (colored layer coating film) is formed by applying or transferring the photosensitive colored composition on the substrate. It is easy to produce. In particular, in the formation of the photosensitive coloring composition layer (colored layer coating film) by the slit coating method, the coating liquid for forming the photosensitive coloring composition layer may be leveled before drying to form a coating film having a uniform thickness. is important. For this reason, it is preferable to contain an appropriate surfactant in the photosensitive coloring composition. Preferred examples of the surfactant include surfactants disclosed in JP-A Nos. 2003-337424 and 11-133600.
Nonionic surfactants, fluorine-based surfactants, silicon-based surfactants, and the like are added as surfactants for improving coating properties.

  Nonionic surfactants include, for example, polyoxyethylene glycols, polyoxypropylene glycols, polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, polyoxypropylene alkyl ethers. Nonionic surfactants such as polyoxypropylene alkyl aryl ethers, polyoxypropylene alkyl esters, sorbitan alkyl esters and monoglyceride alkyl esters are preferred.

Specifically, polyoxyalkylene glycols such as polyoxyethylene glycol and polyoxypropylene glycol; polyoxyalkylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxypropylene stearyl ether and polyoxyethylene oleyl ether; polyoxy Polyoxyethylene aryl ethers such as ethylene octyl phenyl ether, polyoxyethylene polystyryl ether, polyoxyethylene tribenzyl phenyl ether, polyoxyethylene-propylene polystyryl ether, polyoxyethylene nonyl phenyl ether; polyoxyethylene dilaurate , Polyoxyalkylene dialkyl esters such as polyoxyethylene distearate, sorbitan fatty acid Ester, there is nonionic surfactants such as polyoxyalkylene sorbitan fatty acid esters.

  Specific examples of these include, for example, Adeka Pluronic series, Adecanol series i, Tetronic series (above made by ADEKA Co., Ltd.), Emulgen series, Leodole series (above made by Kao Co., Ltd.), Eleminor series, Nonipole Series, Octapole series, Dodecapole series, New Pole series (above Sanyo Kasei Co., Ltd.), Pionein series (above Takemoto Yushi Co., Ltd.), Nissan Nonion series (above Nihon Yushi Co., Ltd.) is there. These commercially available products can be used as appropriate. A preferable HLB value is 8 to 20, more preferably 10 to 17.

As the fluorosurfactant, a compound having a fluoroalkyl or fluoroalkylene group in at least one of the terminal, main chain and side chain can be suitably used.
Specific commercial products include, for example, MegaFuck F142D, F172, F173, F176, F176, F177, F183, 780, 781, R30, R08 (Dainippon Ink Co., Ltd.), Florard FC -135, FC-170C, FC-430, FC-431 (Sumitomo 3M), Surflon S-112, S-113, S-131, S-141, S-145 S-382, SC-101, SC-102, SC-103, SC-104, SC-105, SC-105, SC-106 (manufactured by Asahi Glass Co., Ltd.), Ftop EF351, 352, 801 and 802 (manufactured by JEMCO).

  Examples of the silicone-based surfactant include Torre Silicone DC3PA, DC7PA, SH11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH-190, SH-193, SZ-6032, and SF-8428. DC-57, DC-190 (above, manufactured by Toray Dow Corning Silicone Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4442 (above GE Toshiba Silicone Co., Ltd.).

  These surfactants are preferably used in an amount of 5 parts by mass or less, more preferably 2 parts by mass or less, with respect to 100 parts by mass of the coating liquid for forming the photosensitive coloring composition layer. When the amount of the surfactant is 5 parts by mass or less, surface roughness during coating and drying can be suppressed, and smoothness can be improved.

  In order to promote alkali solubility of the uncured portion and further improve the developability of the photocurable composition, an organic carboxylic acid, preferably a low molecular weight organic carboxylic acid having a molecular weight of 1000 or less is added. be able to. Specifically, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, mesitylene acid; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, Aromatic polycarboxylic acids such as trimesic acid, melophanoic acid, pyromellitic acid; phenylacetic acid Others such as phenoxyacetic acid, methoxyphenoxyacetic acid, hydroatropic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, umberic acid Carboxylic acid is mentioned.

(Alkoxysilane compound)
In the photosensitive coloring composition used in the present invention, an alkoxysilane compound, especially a silane coupling agent, can be used from the viewpoint of improving adhesion to the substrate.
The silane coupling agent preferably has an alkoxysilyl group as a hydrolyzable group that can be chemically bonded to an inorganic material, and (meth) acryloyl or phenyl exhibiting affinity through interaction or bond formation with an organic resin. , Mercapto and epoxysilane, and (meth) acryloylpropyltrimethoxysilane is more preferable among them.
When the silane coupling agent is used, the addition amount is preferably in the range of 0.2 to 5.0% by mass in the total solid content in the photosensitive coloring composition layer used in the present invention. 5-3.0 mass% is more preferable.

(Co-sensitizer)
The photosensitive coloring composition used in the present invention preferably contains a co-sensitizer if desired. In the present invention, the co-sensitizer has functions such as further improving the sensitivity of the sensitizing dye and the initiator to actinic radiation or suppressing inhibition of polymerization of the polymerizable compound by oxygen.
Examples of such cosensitizers include amines such as M.I. R. Sander et al., “Journal of Polymer Society”, Vol. 10, 3173 (1972), Japanese Patent Publication No. 44-20189, Japanese Patent Publication No. 51-82102, Japanese Patent Publication No. 52-134692, Japanese Patent Publication No. 59-138205. , JP-A-60-84305, JP-A-62-18537, JP-A-64-33104, Research Disclosure 33825, and the like. Specific examples include triethanolamine. P-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline and the like.

  Other examples of co-sensitizers include thiols and sulfides such as thiol compounds described in JP-A-53-702, JP-B-55-500806, JP-A-5-142772, No. 56-75643, such as 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, β-mercapto. And naphthalene.

  Other examples of the co-sensitizer include amino acid compounds (eg, N-phenylglycine), organometallic compounds described in JP-B-48-42965 (eg, tributyltin acetate), JP-B 55- Examples include a hydrogen donor described in Japanese Patent No. 34414, a sulfur compound (eg, trithiane) described in Japanese Patent Laid-Open No. 6-308727, and the like.

  The content of these co-sensitizers is in the range of 0.1 to 30% by mass with respect to the mass of the total solid content of the curable composition from the viewpoint of improving the curing rate due to the balance between polymerization growth rate and chain transfer. Preferably, the range of 1-25 mass% is more preferable, and the range of 0.5-20 mass% is still more preferable.

(Polymerization inhibitor)
In the present invention, a small amount of a thermal polymerization inhibitor is added in order to prevent unnecessary thermal polymerization of a compound having an ethylenically unsaturated double bond that can be polymerized during production or storage of the photosensitive coloring composition. Is desirable.
Examples of the thermal polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6). -T-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.

  The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass in the photosensitive coloring composition layer. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition due to oxygen, and it may be unevenly distributed on the surface of the photosensitive layer in the course of drying after coating. . The addition amount of the higher fatty acid derivative is preferably about 0.5% by mass to about 10% by mass of the total composition.

(Plasticizer)
Furthermore, in the present invention, in order to improve the physical properties of the photosensitive coloring composition layer, an inorganic filler, a plasticizer, a fat-sensitizing agent that can improve the ink inking property on the surface of the photosensitive layer, and the like may be added. .
Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. 10 mass% or less can be added with respect to the total mass of the compound which has an ionic unsaturated double bond, and a binder.

  By using the above-described components, the photosensitive coloring composition of the present invention is cured with high sensitivity and has good storage stability. Moreover, the high adhesiveness to a board | substrate is shown. Therefore, the photosensitive coloring composition containing the various components can be preferably used for a color filter.

In addition, the viscosity of the photosensitive coloring composition in the present invention may be important from the viewpoint of reducing the height h _Y and more effectively establishing the relationship of Formula 1.
The preferable viscosity of the photosensitive coloring composition varies depending on the coating method. For example, in the case of slit coating, the viscosity at 25 ° C. is preferably 1.0 × 10 ⁻² Pa · s or less. In the case of spin coating, the viscosity at 25 ° C. is preferably 5.0 × 10 ⁻² Pa · s or less. In the above, the viscosity in 25 degreeC points out the value measured using the Toki Sangyo Co., Ltd. E-type viscosity meter (RE-80L).

<< Photosensitive dark color composition >>
The photosensitive dark color composition used in the present invention contains (A-2) a light-shielding agent, (B) a binder polymer, (C-2) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent. Preferably, other additives such as a dispersant and a surfactant can be contained as required.

-(A-2) Shading agent-
(A-2) Examples of the light-shielding agent include carbon black, titanium black, metal fine particles, metal oxides, and sulfide fine particles in addition to the colorant (A-1). Of these, carbon black is particularly preferred because of its excellent balance between light shielding properties and cost.
These are used singly or in combination as required. For example, carbon black alone, a mixture of organic pigments, and a combination of carbon black and organic pigments.
As a light-shielding material, conventionally, as a black colorant, at least two kinds of pigments have been used in combination so as to shield the visible light region. Examples of these pigments include the pigments described in JP-A-2005-17716 [0038] to [0040] and JP-A-2005-17521 [0080] to [0088]. The formation of the used light shielding layer is disclosed in JP-A-7-271020.
In order to further increase the light shielding effect, in Japanese Patent Laid-Open No. 2000-147240, Japanese Patent Laid-Open No. 2000-143985, Japanese Patent Laid-Open No. 2005-338328, Japanese Patent Laid-Open No. 2006-154849, etc., carbon black, titanium black, or graphite is a suitable light-shielding material. Has been developed as. In the present invention, carbon black is preferable as one of the light shielding materials from the viewpoint of light shielding properties and cost.

  As an example of carbon black, pigment black 7 (carbon black) is preferable. Examples of the carbon black include carbon black # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 970, # 960, # 950, # 900, # 850, MCF88, #M manufactured by Mitsubishi Chemical Corporation. 650, MA600, MA7, MA8, MA11, MA100, MA220, IL30B, IL31B, IL7B, IL11B, IL52B, # 4000, # 4010, # 55, # 52, # 50, # 47, # 45, # 44, # 40 , # 33, # 32, # 30, # 20, # 10, # 5, CF9, # 3050, # 3150, # 3250, # 3750, # 3950, Diamond Black A, Diamond Black N220M, Diamond Black N234, Diamond Black I, Diamond Black LI, Diamond Black II, Diamond Black N33 , Diamond black SH, diamond black SHA, diamond black LH, diamond black H, diamond black HA, diamond black SF, diamond black N550M, diamond black E, diamond black G, diamond black R, diamond black N760M, diamond black LP; company made of carbon black Color black FW200, Color black FW2, Color black FW1, Color black FW18, Color black S170, Color black S160, Special Black6, Special Black5, Special Black4, Special Black4A, Printex U, PrintexV, Printex 140U, Printe 140V, Printex 35; Carbon black REGAL 400, REGAL 400R, REGAL XC72, VULCAN XC72R, MOGUL L, MONARCH 1400, MONARCH 1000, BLACK PEARLS 1400, carbon black 9 SUNBLACK 900, Asahi Carbon 9 960, 970, and the like. Also preferred are those coated with a polymer compound in order to increase the electric resistance. The preferred single particle size of these carbon blacks is 10 to 100 nm, more preferably 10 to 50 nm.

-(C-2) polymerizable compound-
As the polymerizable compound (C-2) polymerizable compound in the photosensitive dark color composition for forming the black matrix, the polymerizable compound (C-1) used in the photosensitive coloring composition is also preferable. The following are particularly preferable.
The polymerizable compound in the photosensitive dark composition is preferably a monomer or oligomer that has two or more ethylenically unsaturated double bonds and undergoes addition polymerization upon irradiation with light. Examples of such monomers and oligomers include compounds having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure. Examples include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) ) Acrylate, trimethylolethane triacrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, di Pentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexane All di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; multifunctional such as trimethylolpropane and glycerin Polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding ethylene oxide or propylene oxide to alcohol and then (meth) acrylated can be mentioned.

An acidic polyfunctional photocurable compound is also a preferred compound. Examples of the acidic polyfunctional photocurable compound include (1) a monomer or oligomer having a hydroxyl group and three or more photocurable functional groups, which is modified with a dibasic acid anhydride to introduce a carboxyl group, (2) Introducing a carboxyl group by adding a compound having a glycidyl group or an isocyanate group and a COOH group to a monomer or oligomer having a hydroxyl group and three or more photocurable functional groups, or (3) three or more Those having a sulfonic acid group introduced by modifying an aromatic compound having a photocurable functional group with concentrated sulfuric acid or fuming sulfuric acid can be used. Moreover, you may use the oligomer which contains the monomer which is an acidic polyfunctional photocurable compound itself as a repeating unit as an acidic polyfunctional photocurable compound.
As an example of an acidic polyfunctional photocurable compound, what is represented by the following general formula (i) and general formula (ii) is preferable. In general formula (i) and general formula (ii), when T or G is an oxyalkylene group, the terminal on the carbon atom side is bonded to R, X, and W.

In general formula (i), R represents a (meth) acryloyloxy group, and X represents a —COOH group or an —OPO ₃ H ₂ group. T represents an oxyalkylene group, wherein the alkylene group has 1 to 4 carbon atoms. n is 0-20.
In general formula (ii), W represents R or X in general formula (i), and 3 or more Ws are R among 6 Ws. G is synonymous with T in the general formula (i). Z represents —O— or —OC═ONH (CH ₂ ) qNHCOO—. p is 0-20 and q is 1-8. A plurality of R, X, T, and G present in one molecule may be the same or different.

  As a commercial item of the acidic polyfunctional photocurable compound represented by general formula (i) and general formula (ii), for example, TO-756 which is a carboxyl group-containing trifunctional acrylate manufactured by Toagosei Co., Ltd., and And TO-1382 which is a carboxyl group-containing pentafunctional acrylate.

  Further, urethane acrylates described in JP-B-48-41708, JP-B-50-6034 and JP-A-51-37193; JP-A-48-64183, JP-B-49-43191 And polyester acrylates described in Japanese Patent Publication No. 52-30490; polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid. Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, the above carboxyl group-containing pentafunctional acrylate, etc. Is preferred. In addition, “polymerizable compound B” described in JP-A-11-133600 can also be mentioned as a preferable example.

  The content of the polymerizable compound (C-2) in the photosensitive dark color composition used for forming the black matrix is 5 to 50% by mass in the total solid content of the photosensitive dark color composition layer. Preferably, it is 7-40 mass%, More preferably, it is 10-35 mass%.

  The (B) binder polymer, (D) polymerization initiator, (E) solvent, and other additives used in the photosensitive dark color composition are the same as those in the above-described photosensitive coloring composition for forming a colored pattern. The preferred content is also the same.

≪Liquid crystal display device≫
The liquid crystal display device of the present invention is a liquid crystal display device provided with the color filter of the present invention. Therefore, a high-quality image can be displayed.
For the spacer, a production method by coating or a production method by transfer can be suitably used. The production method by coating is preferable in that the process is simple. A manufacturing method by transfer is preferable in that the spacer height is uniform. Regarding the production method by transfer, the method described in Japanese Patent Application No. 2007-185797 is particularly preferred.
For the definition of display devices and explanation of each display device, refer to “Electronic Display Devices (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display Devices (Junaki Ibuki, Industrial Books Co., Ltd.) Issue)). The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”.

The present invention is particularly effective for a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention is applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, IPS, OCS, FFS, and R-OCB. Applicable. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".
In addition to the color filter, the liquid crystal display device includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film. The substrate with a light-shielding film of the present invention can be applied to a liquid crystal display device composed of these known members.
For example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, Ltd., issued by CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” (Table Yoshiyoshi) Fuji Chimera Research Institute, published in 2003) ”.

For the backlight, SID meeting Digest 1380 (200
5) (A. Konno et.al), Monthly Display, December 2005 issue 18
-24 pages (Yasuhiro Shima) and 25-30 pages (Takaaki Yagi).
The color filter of the present invention can achieve a high contrast when combined with a conventionally known three-wavelength cold-cathode tube, but by using red, green and blue LED light sources (RGB-LED) as backlights. A liquid crystal display device with high luminance and high color purity and good color reproducibility can be provided.

On the other hand, the performance required for the liquid crystal display device is to improve the response speed of the image. In order to improve the response speed, the liquid crystal alignment speed has been improved. On the other hand, from the structural aspect of the cell, it is necessary to reduce the thickness of the liquid crystal layer in terms of cost reduction. Another technique necessary for reducing the thickness of the liquid crystal layer is to reduce the alignment disorder of the liquid crystal at the boundary between the colored pixels and the black matrix. Therefore, it is required to reduce the bulge (horn) at the boundary between the colored pixel and the black matrix.
A color filter manufactured by the manufacturing method of the color filter of the present invention, since the step of the color pattern in the vicinity of the overlap portion O _Y is small, when used in a liquid crystal display device, it is possible to suppress the alignment disorder of the liquid crystal, the As a result, contrast can be improved.

  As described above, the color filter of the present invention can reduce the disorder of the alignment of the liquid crystal at the overlapping portion, and also improves the visibility when displaying an image. By using the color filter of the present invention in the liquid crystal display device of the present invention, the overlapping portion of each colored pixel with the black matrix can be flattened, and the flatness is improved. In addition, it is not necessary to polish or provide a planarizing layer before laying the transparent electrode ITO, which can contribute to streamlining of the process and cost reduction and mass productivity.

  The present invention will be described more specifically with reference to the following examples. The materials, reagents, ratios, equipment, operations, and the like shown in the following examples can be appropriately changed without departing from the scope of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In the following examples, “%” and “parts” represent “mass%” and “parts by mass” unless otherwise specified, and the molecular weight indicates the weight average molecular weight. “Wt%” represents “mass%”.

[Example 1]
<1. Preparation of photosensitive dark color composition>
-Preparation of carbon black dispersion (K-1)-
A carbon black dispersion (K-1) was prepared according to the following formulation.
・ Carbon black (Color Black FW2 manufactured by Degussa Co., Ltd.) 26.7 parts ・ Dispersant (Disparon DA7500 manufactured by Enomoto Kasei Co., Ltd., acid value 26, amine value 40)
3.3 parts benzyl methacrylate / methacrylic acid (= 72/28 [molar ratio]) copolymer (molecular weight 30,000, 50% by weight solution of propylene glycol monomethyl ether acetate) 10 parts propylene 60 parts of glycol monomethyl ether acetate

  The above components were stirred for 1 hour using a homogenizer under the condition of 3000 rpm. The obtained mixed solution was finely dispersed for 8 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads to obtain a carbon black dispersion (K-1). It was.

  Using the obtained carbon black dispersion liquid (K-1), a photosensitive dark color composition coating liquid CK-1 was prepared according to the formulation shown in Table 1 below. Numerical values in Table 1 indicate mass ratios.

Details of each component in Table 1 are as follows.
Resin solution C-2: benzyl methacrylate / methacrylic acid (= 85/15 molar ratio) copolymer (Mw10000, 50% by mass solution of propylene glycol monomethyl ether acetate)
UV curable resin C-3: trade name Cyclomer P ACA-250 manufactured by Daicel Chemical Industries, Ltd. [Acrylic copolymer having alicyclic, COOH, and acryloyl groups in the side chain, propylene glycol monomethyl ether acetate Solution (solid content: 50% by mass)]
Polymerizable compound C-5: Nippon Kayaku Co., Ltd. KAYARAD DPHA and Nippon Kayaku Co., Ltd. KAYARAD R-684 mixture of 60 to 40 (mass ratio). Initiator C-7: Product Name “OXE-02” Ciba Specialty Chemicals Co., Ltd. Surfactant C-8: Trade name “Megafac R30” Dainippon Ink & Chemicals, Inc. Solvent: PGMEA = propylene glycol monomethyl ether acetate EEP = 3-Ethoxyethyl propionate

<2. Formation of black matrix by coating>
-Photosensitive dark color composition layer forming step-
Using the obtained photosensitive dark color composition CK-1, a black matrix having a lattice pattern similar to the resin black matrix 12 in FIG. 2 was formed on a glass substrate as follows.
First, a film after post-baking using the slit coater (model number HC6000, manufactured by Hirata Kiko Co., Ltd.) on the glass substrate (Corning Millennium 0.7 mm thickness) washed with the photosensitive dark color composition CK-1. Coating was performed at a coating speed of 120 mm / second by adjusting the interval between the slit and the glass substrate and the discharge amount so that the thickness was 1.0 μm.

-Pre-bake process, exposure process-
Next, after heating (prebaking treatment) at 80 ° C. for 120 seconds using a hot plate, a pattern is used at 60 mJ / cm ² using a proximity type exposure machine (model number LE5565A, manufactured by Hitachi High-Technologies Corporation). Exposed.

-Development process-
Then, it developed with the horizontal conveyance type developing device. That is, a 1.0% developer of potassium hydroxide developer CDK-1 (manufactured by FUJIFILM Electronics Materials) (a diluted solution of 1 part by weight of CDK-1 and 99 parts by weight of pure water), 24 The shower pressure was set at 0.15 MPa at 37 ° C., development was performed for 37 seconds, and washing was performed with pure water to obtain a black matrix pattern after development.
Here, for the sample having the same structure as the substrate on which the black matrix pattern after development was formed, a cross-sectional photograph (magnification 5000 times) was taken with an SEM (scanning electron microscope) to confirm the cross-sectional shape. On the other hand, the lower end was a forward tapered shape located at +3.0 μm.
SEM imaging was performed by cutting the black matrix pattern together with the substrate in a direction that bisects the long side of the pixel (width direction of the black matrix pattern) perpendicular to the substrate surface.

-Bake process-
Next, post baking is performed for 40 minutes in a 220 ° C. clean oven to obtain a substrate with a black matrix in which a black matrix which is a lattice pattern (the same lattice pattern as the resin black matrix 12 in FIG. 2) is formed on the substrate. It was.
The obtained black matrix had a pixel opening of 90 μm × 200 μm, a thickness of 1.0 μm, and a pattern line width in the direction parallel to the longitudinal direction of the pixel of 25 μm.
When the optical density (OD) of the completed black matrix was measured using X-Rite 361T (V) (manufactured by Sakata Inx Engineering Co., Ltd.), it was 4.2.

<3. Preparation of photosensitive coloring composition>
-3-1. Preparation of photosensitive coloring composition coating liquid CR-1 for red (R)-
A red (R) dispersion (R-1) was prepared according to the following formulation.
Pigment Red 254 (average particle size 43 nm by SEM observation)
... 11 parts, Pigment Red 177 (average particle size 58 nm by SEM observation)
... 4 parts-Dispersing resin A-3 (described later) ... 5 parts-Dispersant (trade name: Disperbyk-161, manufactured by Big Chemie)
(30% solution of propylene glycol monomethyl ether acetate) 3 parts alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 75/25 [molar ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl Ether acetate solution (solid content: 50% by mass) ... 9 parts ・ Solvent B: Propylene glycol monomethyl ether acetate ... 68 parts

  The above components were stirred for 1 hour using a homogenizer at 3000 rpm. The obtained mixed solution was subjected to fine dispersion treatment for 4 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads, and a red (R) dispersion (R-1). Got. When observed again by SEM, the average particle size was 36 nm.

Using the obtained red (R) dispersion liquid (R-1), a photosensitive coloring composition coating liquid CR-1 for red (R) was prepared according to the following formulation.
-Red (R) dispersion (R-1)-100 parts-Epoxy resin: (trade name EHPE3150, manufactured by Daicel Chemical Industries, Ltd.-2 parts-Polymerizable compound: dipentaerythritol penta-hexaacrylate- 8 parts Polymerization initiator: 4- (o-bromo-pN, N-di (ethoxycarbonylmethyl) amino-phenyl) -2,6-di (trichloromethyl) -s-triazine ... 1 part -Polymerization initiator: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 ... 1 part-Polymerization initiator: Diethylthioxanthone-0.5 part-Polymerization inhibitor : P-methoxyphenol ・ ・ ・ 0.001 part ・ Fluorosurfactant (trade name: Megafac R30, manufactured by Dainippon Ink & Chemicals, Inc.)
・ ・ ・ 0.01 part ・ Nonionic surfactant (trade name: Tetronic R150, manufactured by ADEKA)
・ ・ ・ 0.2 parts ・ Solvent: Propylene glycol n-butyl ether acetate ・ ・ ・ 30 parts ・ Solvent: Propylene glycol monomethyl ether acetate ・ ・ ・ 100 parts A product coating solution CR-1 was obtained.
The viscosity at 25 ° C. of the obtained photosensitive coloring composition coating liquid CR-1 for red (R) was measured using an E-type viscometer (RE-80L) manufactured by Toki Sangyo Co., Ltd. It was 3 × 10 ⁻² Pa · s.

-3-2. Preparation of photosensitive coloring composition coating liquid CG-1 for green (G)
A green (G) dispersion (G-1) was prepared according to the following formulation.
Pigment Green 36 (average particle size 47 nm by SEM observation)
・ ・ ・ 11 parts ・ Pigment Yellow 150 (average particle diameter by SEM observation: 39 nm)
... 7 parts-Dispersing resin A-3 described later ... 5 parts-Dispersant (trade name: Disperbyk-161, 30% solution manufactured by Big Chemie)
... 3 parts ・ Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 85/15 [molar ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl ether acetate solution (solid content: 50 mass%) ) 11 parts ・ Solvent: Propylene glycol monomethyl ether acetate 70 parts

  The above components were stirred for 1 hour using a homogenizer under the condition of 3000 rpm. The obtained mixed solution was finely dispersed for 8 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads, and a green (G) dispersion (G-1 )

Using the obtained green (G) dispersion liquid (G-1), a photosensitive coloring composition coating liquid CG-1 for green (G) was prepared according to the following formulation. When observed again by SEM, the average particle size was 32 nm.
-Green (G) dispersion (G-1) ... 100 parts-Epoxy resin: (trade name EHPE3150, manufactured by Daicel Chemical Industries) ... 2 parts-Polymerizable compound: Dipentaerythritol penta-hexaacrylate ..8 parts Polymerizable compound: Tetra (ethoxy acrylate) of pentaerythritol
... 2 parts-Polymerization initiator: 1,3-bistrihalomethyl-5-benzooxolantolyazine
... 2 parts-Polymerization initiator: 2-Benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 ... 1 part-Polymerization initiator: Diethylthioxanthone ... 0.5 Parts / polymerization inhibitor: p-methoxyphenol 0.001 part / fluorine-based surfactant (trade name: Megafac R08, manufactured by Dainippon Ink & Chemicals, Inc.) 0.02 part / nonionic surfactant (Product name: Emulgen A-60, manufactured by Kao Corporation) 0.5 parts, solvent: propylene glycol monomethyl ether acetate, 120 parts, solvent: propylene glycol n-propyl ether acetate, 30 parts Mixing and stirring were performed to obtain a photosensitive coloring composition coating solution CG-1 for green (G).
The viscosity at 25 ° C. of the obtained green (G) photosensitive coloring composition coating solution CG-1 was measured using an E-type viscometer (RE-80L) manufactured by Toki Sangyo Co., Ltd. It was 3 × 10 ⁻² Pa · s.

− 3-3. Preparation of photosensitive coloring composition coating solution CB-1 for blue (B)
A blue (B) dispersion (B-1) was prepared according to the following formulation.
Pigment Blue 15: 6 (average particle diameter 55 nm by SEM observation)
・ ・ ・ 14 parts ・ Pigment Violet 23 (average particle diameter 61 nm in SEM observation)
... 1 part-Dispersing resin A-3 described later ... 5 parts-Dispersant (trade name: Disperbyk-161, 30% solution manufactured by Big Chemie)
... 3 parts ・ Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 80/20 [molar ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)・ ・ ・ 4 parts ・ Solvent: Propylene glycol monomethyl ether acetate 73 parts

  The above components were stirred for 1 hour using a homogenizer at 3000 rpm. The obtained mixed solution was finely dispersed for 4 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads, and a blue (B) dispersion (B-1 ) When observed again by SEM, the average particle size was 39 nm.

Using the obtained blue (B) dispersion liquid (B-1), a blue (B) photosensitive coloring composition coating liquid CB-1 was prepared according to the following formulation.
-Blue (B) dispersion (B-1) ... 100 parts-Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer (= 80/20 [molar ratio] copolymer, molecular weight 30,000), Propylene glycol monomethyl ether acetate solution (solid content: 50% by mass) ... 7 parts / Epoxy resin: (trade name Celoxide 2080, manufactured by Daicel Chemical Industries) ... 2 parts / UV curable resin: (trade name Cyclo Mar P ACA-250 manufactured by Daicel Chemical Industries)
(Acrylic copolymer having alicyclic, COOH and acryloyl groups in the side chain, propylene glycol monomethyl ether acetate solution (solid content: 50% by mass) ... 4 parts Polymerizable compound: Dipentaerythritol penta Hexaacrylate ... 12 parts-Polymerization initiator: 1- (9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl) -1- (o-acetyloxime) ethanone ... 3 Part / polymerization inhibitor: p-methoxyphenol 0.001 part / fluorine-based surfactant (trade name: Megafac R08, manufactured by Dainippon Ink & Chemicals, Inc.)
... 0.02 part, nonionic surfactant (trade name: Emulgen A-60, manufactured by Kao Corporation) ... 1.0 part, solvent: ethyl 3-ethoxypropionate ... 20 parts, solvent: propylene Glycol monomethyl ether acetate: 150 parts The above components were mixed and stirred to obtain a photosensitive coloring composition coating solution CB-1 for blue (B).
The viscosity of the resulting blue (B) photosensitive coloring composition coating solution CB-1 at 25 ° C. was measured using an E-type viscometer (RE-80L) manufactured by Toki Sangyo Co., Ltd. It was 3 × 10 ⁻² Pa · s.

<4. Synthesis of Dispersing Resin A-3>
(1. Synthesis of chain transfer agent A3)
Dipentaerythritol hexakis (3-mercaptopropionate) [DPMP; manufactured by Sakai Chemical Industry Co., Ltd.] (the following compound (33)) 7.83 parts, and having an adsorption site, and a carbon-carbon double bond The following compound (m-6) (4.55 parts) having an aldehyde was dissolved in 28.90 parts of propylene glycol monomethyl ether and heated to 70 ° C. under a nitrogen stream. To this, 0.04 part of 2,2′-azobis (2,4-dimethylvaleronitrile) [V-65, manufactured by Wako Pure Chemical Industries, Ltd.] was added and heated for 3 hours. Furthermore, 0.04 part of V-65 was added and reacted at 70 ° C. for 3 hours under a nitrogen stream. By cooling to room temperature, a 30% solution of the mercaptan compound (chain transfer agent A3) shown below was obtained.

(2. Synthesis of dispersion resin A-3)
A mixed solution of 4.99 parts of a 30% solution of chain transfer agent A3 obtained as described above, 19.0 parts of methyl methacrylate, 1.0 part of methacrylic acid, and 4.66 parts of propylene glycol monomethyl ether, It heated at 90 degreeC under nitrogen stream. While stirring this mixed solution, 0.139 part of dimethyl 2,2′-azobisisobutyrate [V-601, manufactured by Wako Pure Chemical Industries, Ltd.], 5.36 parts of propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate 9 40 parts of the mixed solution was added dropwise over 2.5 hours. After the completion of the dropwise addition, the mixture was reacted at 90 ° C. for 2.5 hours, and then a mixed solution of 0.046 parts of dimethyl 2,2′-azobisisobutyrate and 4.00 parts of propylene glycol monomethyl ether acetate was added, and further 2 hours. Reacted. To the reaction solution, 1.52 parts of propylene glycol monomethyl ether and 21.7 parts of propylene glycol monomethyl ether acetate are added, and cooled to room temperature, whereby a solution of dispersion resin A-3 (polystyrene equivalent weight average molecular weight 24000) (specific dispersion resin) 30% by mass, propylene glycol monomethyl ether 21% by mass, propylene glycol monomethyl ether acetate 49% by mass).
The acid value of this dispersion resin A-3 was 48 mg / g. The structure of dispersion resin A-3 is shown below.

<Production of color filter>
-Photosensitive coloring composition layer formation process-
The resulting red (R) photosensitive coloring composition coating liquid CR-1 was used to form a red pattern having a stripe pattern similar to the red pattern 20R in FIG. The positional relationship is also the same as in FIG.
First, the photosensitive coloring composition coating solution CR-1 for red (R) was applied to the black matrix forming surface side of the substrate with the black matrix. Specifically, as in the case of forming the photosensitive dark color composition layer, the substrate with the slit and the black matrix so that the layer thickness of the photosensitive coloring composition layer (colored pattern) after the post-baking becomes 2.0 μm. The interval and the discharge amount were adjusted, and coating was performed at a coating speed of 120 mm / second.

-Colored layer pre-baking step, colored layer exposure step-
Next, after heating (prebaking treatment) at 100 ° C. for 120 seconds using a hot plate, a pattern at 90 mJ / cm ² using a proximity type exposure machine (model number LE5565A, manufactured by Hitachi High-Technologies Corporation). Exposed.
In the pattern exposure, the overlap between the exposure pattern and the black matrix for (exposure overlap amount), as the red pattern after following baking, the length L _O of the X-direction of the overlapping portion O _Y is 6.0μm A mask pattern and an exposure machine were set.

-Colored layer development process, colored layer baking process-
Thereafter, a 1.0% developer (1 part by mass of CDK-1 and 99 parts by mass of pure water) of a potassium hydroxide developer CDK-1 (manufactured by FUJIFILM Electronics Materials), 25 )), The shower pressure was set to 0.2 MPa, developed for 45 seconds, and washed with pure water.
Next, post-baking was performed in a 220 ° C. clean oven for 30 minutes to form heat-treated red pixels.

  Subsequently, in the said photosensitive coloring composition layer formation process, colored layer prebaking process, colored layer exposure process, colored layer development process, and colored layer baking process, the photosensitive coloring composition coating liquid CR-1 for red (R) is used. The green pattern which is the same stripe pattern as the green pattern 20G in FIG. 1 was formed in the same manner except that the green (G) photosensitive coloring composition coating liquid CG-1 was used (resin black matrix and The positional relationship is also the same as in FIG. Thereafter, the blue pattern in FIG. 1 was similarly obtained except that the photosensitive coloring composition coating liquid CR-1 for red (R) was replaced with the photosensitive coloring composition coating liquid CB-1 for blue (B). A blue pattern, which is a stripe pattern similar to 20B, was formed (the positional relationship with the resin black matrix is also the same as in FIG. 1), and a color filter similar to the color filter 100 shown in FIG. 1 was obtained.

Next, the photosensitive coloring composition coating solution CG-1 for green (G) was applied, and pre-baking was completed in the same manner as the above color filter, to prepare a sample for observing the photosensitive coloring composition layer cross section.
The obtained sample was cut along a plane perpendicular to the pattern edge of the black matrix and perpendicular to the substrate, and an SEM photograph of the cut surface was taken using a scanning electron microscope (5000 times magnification). The composition of the SEM photograph is the same as in FIG.
Based on the obtained SEM photograph, among the lines corresponding to the surface of the green (G) photosensitive coloring composition layer, the position of the point S close to the 0.1 μm substrate in the substrate normal direction with respect to the point R farthest from the substrate Asked.
Position for the direction parallel to the substrate surface at the point S is negative the resin black matrix forming region side position of the pattern edge E _B nearest the resin black matrix in the point S as a reference (0) (-) When the resin black matrix non-formation region side was positive (+), it was +2.0 μm.

<Production of liquid crystal display device>
An ITO (Indium Tin Oxide) transparent electrode was further formed by sputtering on the R pixel, G pixel, B pixel, and black matrix of the color filter obtained above. A columnar photospacer was provided in a portion corresponding to the upper part of the black matrix on the ITO transparent electrode, and an alignment film made of polyimide was further provided thereon.
Separately, an active matrix substrate provided with a TFT (thin film transistor) was prepared as a counter substrate, and an alignment film made of polyimide was provided on the TFT forming surface side.

  After that, a UV curable resin sealant is applied by a dispenser method at a position corresponding to the outer periphery of the black matrix provided so as to surround the colored pixel group of the color filter, and a liquid crystal for TN mode is dropped to form a vacuum state. The substrate was bonded to the counter substrate, and the bonded substrate was irradiated with UV, and then heat treated to cure the sealant. A liquid crystal cell was thus obtained. A polarizing plate HLC2-2518 (manufactured by Sanritz Co., Ltd.) was pasted on both sides of this liquid crystal cell, and then placed on the back surface side of the liquid crystal cell provided with the polarizing plate by constituting a backlight of a cold cathode tube, A liquid crystal display device was obtained.

<Measurement and evaluation>
(Height _{h X} and the height _h Y)
Prepare the sample for measurement of the resulting color filter having the same structure as above, to select the green pixels one pixel in the display screen center part, measuring the height h _Y to the colored patterned surface of the overlapped portion O _Y of colored patterned surface did. Then, for the same pixel, and measuring the height h _X until the colored patterned surface of the overlapped portion O _X from colored patterned surface.
Wherein both the measurement height h _X and the height h _Y, contact surface roughness meter P-10 (manufactured by KLA-Tencor Corporation) was used. More specifically, the direction of FIGS. 1 (a) Medium A-A is the height h _X, wherein the height h _Y in the direction of the center B-B FIG. 1 (a), respectively scan the probe I went.
The measurement results are shown in Table 2.

(Taper length L _B , L _C , etc.)
A sample for measurement having the same structure as the color filter obtained above is prepared, one green pixel is selected at the center of the display screen, and the longitudinal direction of the green pixel is equally divided into two, and the surface is perpendicular to the substrate Then, the measurement sample was cut, and a cross-sectional SEM photograph was taken with a composition as shown in FIG. 3 using a scanning electron microscope (5000 times magnification).
Based on the captured cross-sectional SEM photograph, measuring a black matrix film thickness, taper length _{L B,} the thickness of the green pattern, a taper length _{L C,} a thickness in the length _{L O,} and the overlapping portion _{O Y} of the overlapped portion _{O Y} did. Here, the thickness in the overlap portion O _Y, measured as the distance the substrate normal direction from the colored pattern lower end E1 to the colored pattern upper T.
The measurement results are shown in Table 2.

(Contrast evaluation)
The liquid crystal display device obtained above was energized, and the luminance when displaying all white and the luminance when displaying all black were measured using a color luminance meter (Topcon BM-5A) in a dark room. All the luminances were measured at the center of the display screen of the liquid crystal display device.
The ratio [brightness when displaying all white / brightness when displaying all black] was used as contrast, and the contrast was evaluated based on the following evaluation criteria.

~Evaluation criteria~
A: The contrast was 800 or more.
B: The contrast was 500 or more and less than 800.
C: The contrast was 250 or more and less than 500.
D: The contrast was less than 250.

[Examples 2 to 5, Comparative Example 2]
The film thickness of the resin black matrix, the taper length L _B, the thickness of the green pattern, a taper length L _C, and the length L _O of the overlapped portion O _Y, similarly, except that were changed as shown in Table 2 as in Example 1 Then, a color filter and a liquid crystal display device were produced and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 2.
Specifically, the film thickness of the resin black matrix was changed by adjusting the discharge amount from the slit coater, and the taper length L _B was changed by adjusting the developing time in the developing device.
The thickness change of the green pattern, by adjusting the discharge amount from the slit coater, changes taper length L _C, by adjusting the developing time in the developing device, the overlapping portion O _Y Length L _O was changed by adjusting the exposure time in the exposure apparatus.

[Comparative Example 1]
In the same manner as in Example 1 except that the green (G) photosensitive coloring composition coating liquid CG-1 was changed to the green (G) photosensitive coloring composition coating liquid CG-A shown below, A liquid crystal display device was produced and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 2.

(Preparation of comparative coating solution CG-A)
In the preparation of the photosensitive coloring composition coating solution CG-1 for green (G) in Example 1, the same as the preparation of CG-1 except that the dispersion resin A-3 was changed to the following dispersion resin D-1. Thus, a photosensitive coloring composition coating solution CG-A for green (G) was prepared.
When the viscosity at 25 degreeC of the obtained photosensitive coloring composition coating liquid CG-A for green (G) was measured using the E-type viscosity meter (RE-80L) by Toki Sangyo Co., Ltd., 1 It was 1 × 10 ⁻² Pa · s.

As shown in Table 2, the height h _Y is 0.1 μm or more lower than the height h _X (that is, h _Y −h _X ≦ −0.1 μm). High contrast was obtained in the device.
On the other hand, in Comparative Example 1 and Comparative Example 2 where h _Y −h _X > −0.1 μm, the contrast was lowered.

(A) is a top view which shows an example of the color filter of this invention, (b) is the sectional view on the AA line of (a), (c) is the BB line of (a). It is sectional drawing. (A) is a top view which shows an example of a board | substrate with a resin black matrix, (b) is AA sectional view taken on the line of (a), (c) is a BB line of (a). It is sectional drawing. It is sectional drawing of the coloring pattern edge part which is a taper shape in an example of the color filter of this invention. It is sectional drawing which shows the example of the coloring pattern edge part which is a taper shape. It is sectional drawing which shows the example of the coloring pattern edge part which is a taper shape. It is sectional drawing which shows the example of the coloring pattern edge part which is a rectangle. It is sectional drawing which shows the example of the coloring pattern edge part which is an undercut shape. It is sectional drawing which shows the example of the coloring pattern edge part which is an undercut shape. It is sectional drawing which shows the example of the coloring pattern edge part which is an undercut shape. It is sectional drawing which shows the example of the resin black matrix after the image development near a rectangle. It is sectional drawing which shows the example of the resin black matrix after development which is an undercut type. It is sectional drawing which shows the example of the resin black matrix after the image development which is a taper type. It is sectional drawing which shows the example of the resin black matrix after a post-baking process. It is sectional drawing which shows the example in which the coloring pattern was formed on the board | substrate with a resin black matrix after a post-baking process. It is sectional drawing which shows the example of the photosensitive coloring composition layer after a prebaking.

Explanation of symbols

10 Substrate 12 Resin black matrix 14 Pixel 20R Red pattern 20G, 22G, 24G, 26G, 28G, 30G, 32G Green pattern 20B Blue pattern 40 Photosensitive coloring composition layer 42 after pre-baking Photosensitive coloring composition layer surface

Claims (7)

On the substrate, at least a resin black matrix that is a lattice pattern with a film thickness of 0.5 μm to 2.0 μm and a colored pattern that is a stripe pattern with a film thickness of 1.0 μm to 3.0 μm,
The resin black matrix partitions the substrate into a plurality of pixels,
At least a part of the coloring pattern is continuously provided on the pixel group in which each column is arranged in a straight line and on the resin black matrix between the pixels in the pixel group, and each column has a direction of the column. orthogonal and have a group of overlapping portion O _X on the direction of the resin black matrix, and have a group and a pair of pattern edges of said column direction parallel to the direction of the resin black matrix on the overlapping portion O _Y And
When tried with the one pixel of the pixel group arranged in the straight line, the height h _Y of the overlapping portion O _Y which is adjacent to the pixel for color pattern surface of the pixel Motonai is colored pattern of the pixel Motonai A color filter characterized by being 0.1 μm or more lower than the height h _X of the overlapping portion O _X adjacent to the pixel with respect to the surface. 2. The color filter according to claim 1, wherein the overlapping portion _OY has a length in a direction orthogonal to the direction of the row of 2 μm to 10 μm.   3. The color filter according to claim 1, wherein a cross-sectional shape of an end portion of the coloring pattern is a rectangle or a tapered shape having a taper length of 10 μm or less.   4. The color filter according to claim 1, wherein a cross-sectional shape of an end portion of the resin black matrix is a rectangle or a tapered shape having a taper length of 10 μm or less. A method for producing a color filter according to any one of claims 1 to 4,
A resin black matrix forming step of forming a resin black matrix which is a lattice pattern on the substrate;
On the substrate on which the resin black matrix is formed, a photosensitive coloring composition layer is formed using the photosensitive coloring composition, the formed photosensitive coloring composition layer is subjected to pattern exposure, and the pattern-exposed photosensitive property is exposed. A colored pattern forming step of developing a colored composition layer to form a colored pattern;
The manufacturing method of the color filter which has. The photosensitive coloring composition layer is formed by applying and pre-baking the photosensitive coloring composition on the substrate on which the resin black matrix is formed,
In the cross section when the photosensitive coloring composition layer after the pre-baking is cut by a plane perpendicular to the pattern edge of the resin black matrix and perpendicular to the substrate,
Of the surface of the photosensitive coloring composition layer, the point S closest to the 0.1 μm substrate in the normal direction to the point R farthest from the substrate is the position in the direction parallel to the substrate surface. The resin black matrix formation region side is negative with respect to the position of the pattern edge of the closest resin black matrix, and the resin black matrix non-formation region side is positive, and is within a range of -2 μm to +10 μm. Item 6. A method for producing a color filter according to Item 5.   The liquid crystal display device provided with the color filter of any one of Claims 1-4.