JP2009161421A - スラリー排出ダクト構造を有する結晶成長炉 - Google Patents
スラリー排出ダクト構造を有する結晶成長炉 Download PDFInfo
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- JP2009161421A JP2009161421A JP2008249902A JP2008249902A JP2009161421A JP 2009161421 A JP2009161421 A JP 2009161421A JP 2008249902 A JP2008249902 A JP 2008249902A JP 2008249902 A JP2008249902 A JP 2008249902A JP 2009161421 A JP2009161421 A JP 2009161421A
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- eaves
- crystal growth
- growth furnace
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- silicon slurry
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B28/00—Production of homogeneous polycrystalline material with defined structure
- C30B28/04—Production of homogeneous polycrystalline material with defined structure from liquids
- C30B28/06—Production of homogeneous polycrystalline material with defined structure from liquids by normal freezing or freezing under temperature gradient
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
- Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Abstract
【解決手段】シリコンスラリー91が漏れて結晶成長炉のるつぼから排出され、台板の周囲に沿って支持ポストまで流れ落ちるのを防ぐように、細長い軒板4に沿って軒樋5のV字状溝へと下方向に流れるため、支持ポストは破損せず、るつぼは倒れず、シリコンスラリー91は氾濫しない。炉の下側本体には、シリコンスラリー91が支持ポストの近くまで流れないように、大量に漏れ出すシリコンスラリー91を収容する受入皿6が追加で設けられる。
【選択図】図5
Description
複数の軒素子は、搭載フレームの下板の縁部周囲に設けられる。軒樋は、下側本体の内部で、複数の軒素子の下に対応して配置される。したがって、高温シリコンスラリーが漏れて搭載フレームのるつぼから流出する場合、シリコンスラリーはまず、シリコンスラリーが台板の周辺に沿って支持ポストまで流れ落ちるのを防ぎ、支持ポストが侵食されて分解される、あるいはるつぼとシリコンスラリーの氾濫に流れ落ちるのを防ぐために、細長い軒板に沿って誘導されて、軒樋のV字状溝へと流れ落ちる。
Claims (13)
- 上側本体および下側本体を含み、密閉炉室を一緒に形成するように前記下側本体が前記上側本体の下に装着される炉本体と、前記炉本体の前記炉室内に配置され、台板が複数の支持ポストによって下側本体に固定されるように台板と複数の支持ポストを含む支持台と、前記台板上に配置され、下板および複数の側板を含み、前記側板は前記下板を囲み前記下板の上に立ち、内部空間を共に形成し、前記下板は前記支持台の前記台板よりも寸法が大きく、前記台板を超えて延在する縁部で囲まれる外周を有する搭載フレームと、前記搭載フレームの前記下板の縁部周囲に設けられる複数の軒素子と、前記下側本体内で、前記複数の軒素子の下に対応して配置される1セットの軒樋と、前記炉本体の前記炉室内に収容され、前記台板および前記搭載フレームを含み、外縁で囲まれ、前記軒素子と前記軒樋間に配置される下隔壁を含み、前記外縁が下方向で前記軒樋に対応する加熱室とを備える、スラリー排出ダクト構造を有する結晶成長炉。
- 前記複数の軒素子は4つの細長い軒板を含み、前記搭載フレームの前記下板は正方形のグラファイト板であり、前記4つの細長い軒板は前記下板の縁部の側部に固定され、そこから傾斜する請求項1に記載の結晶成長炉。
- サーモブレイクセンサワイヤが前記1セットの軒樋に配置される請求項1に記載の結晶成長炉。
- 複数の固着手段は、前記軒樋に前記サーモブレイクセンサワイヤを固定するように、前記1セットの軒樋の内部に配列される請求項3に記載の結晶成長炉。
- 軒樋は内縁および外縁を含み、前記内縁は前記外縁より高く、側面が前記外縁から傾斜する請求項1に記載の結晶成長炉。
- 前記1セットの軒樋は互いに接続される複数のV字状溝を含む請求項1に記載の結晶成長炉。
- 前記下側本体の底部内で、前記複数の軒素子および前記1セットの軒樋に対応してその下に、前記支持台の前記複数の支持ポストから遠く離れて配置される受入皿をさらに備える請求項1に記載の結晶成長炉。
- 前記受入皿は正方形の内縁および湾曲した外縁を含む請求項7に記載の結晶成長炉。
- 前記受入皿は、前記受入皿の底部に配置されるサーモスタットをさらに含む請求項7に記載の結晶成長炉。
- 前記サーモスタットはサーモカップルを有する請求項9に記載の結晶成長炉。
- 前記受入皿は少なくとも1つの銅製受入皿を含む請求項7に記載の結晶成長炉。
- 前記下隔壁は、周囲に斜面を設けられた上面を有し、前記斜面は上方向で前記軒素子に対応する請求項1に記載の結晶成長炉。
- 前記下隔壁は複数の孔とスリーブをさらに含み、前記複数のスリーブはそれぞれ各自の前記複数の孔を貫通し、前記支持ポストは前記複数のスリーブに収容される請求項12に記載の結晶成長炉。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW097100177A TW200930851A (en) | 2008-01-03 | 2008-01-03 | Crystal growth furnace having guiding structure for overflow slurry |
TW097100177 | 2008-01-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009161421A true JP2009161421A (ja) | 2009-07-23 |
JP4856683B2 JP4856683B2 (ja) | 2012-01-18 |
Family
ID=40785991
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2008249902A Expired - Fee Related JP4856683B2 (ja) | 2008-01-03 | 2008-09-29 | スラリー排出ダクト構造を有する結晶成長炉 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8066814B2 (ja) |
JP (1) | JP4856683B2 (ja) |
DE (1) | DE102008025828B9 (ja) |
TW (1) | TW200930851A (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200932963A (en) * | 2008-01-29 | 2009-08-01 | Green Energy Technology Inc | Crystal growing furnace with heating improvement structure |
TW200936823A (en) * | 2008-02-21 | 2009-09-01 | Green Energy Technology Inc | Heating electrode and fastening structure for crystal-growing furnace |
JP5477229B2 (ja) * | 2010-08-26 | 2014-04-23 | 信越半導体株式会社 | 半導体単結晶の製造装置及び製造方法 |
DE102011002960B3 (de) | 2011-01-21 | 2012-04-26 | Osram Ag | Solarsimulator und Verfahren zum Betreiben eines Solarsimulators |
CN102383183B (zh) * | 2011-11-04 | 2013-12-04 | 湖南顶立科技有限公司 | 一种晶体硅铸锭炉 |
CN102492982A (zh) * | 2011-12-13 | 2012-06-13 | 上海九晶电子材料股份有限公司 | 一种单晶炉高温熔料泄漏引导保护装置 |
TWI460319B (zh) * | 2012-12-28 | 2014-11-11 | Sino American Silicon Prod Inc | 長晶裝置及晶體製造方法 |
CN103866384B (zh) * | 2014-03-23 | 2016-01-13 | 山西中电科新能源技术有限公司 | 具有溢流保护功能的多晶硅铸锭炉 |
CN103981570A (zh) * | 2014-06-04 | 2014-08-13 | 高佳太阳能股份有限公司 | 一种多晶硅铸锭炉硅液溢流报警结构 |
CN104451875A (zh) * | 2014-12-10 | 2015-03-25 | 晶科能源有限公司 | 一种铸锭炉 |
CN110129882A (zh) * | 2019-05-30 | 2019-08-16 | 江苏拓正茂源新能源有限公司 | 一种多晶硅铸锭炉的溢流隔离装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02225393A (ja) * | 1989-02-27 | 1990-09-07 | Shin Etsu Handotai Co Ltd | 単結晶引上装置における湯漏れ防止構造 |
JP2001302387A (ja) * | 2000-04-27 | 2001-10-31 | Shin Etsu Handotai Co Ltd | 単結晶引上げ装置の湯漏れ検出器および単結晶引上げ装置ならびに湯漏れ検出方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4018967A1 (de) * | 1990-06-13 | 1991-12-19 | Wacker Chemitronic | Verfahren und vorrichtung zum giessen von siliciumbloecken mit kolumnarstruktur als grundmaterial fuer solarzellen |
US5443034A (en) * | 1994-08-17 | 1995-08-22 | Solec International, Inc. | Method and apparatus for increasing silicon ingot growth rate |
DE29922698U1 (de) * | 1999-04-09 | 2000-03-02 | Franken Maxit Mauermoertel Gmb | Trockenmörtel zur Dünnbettvermörtelung von Hochlochplanziegeln |
WO2001064976A1 (fr) * | 2000-03-03 | 2001-09-07 | Shin-Etsu Handotai Co.,Ltd. | Godet de recuperation de fuites de bain fondu pour appareil de tirage vertical de monocristaux |
WO2010027833A1 (en) * | 2008-08-27 | 2010-03-11 | Bp Corporation North America Inc. | System and method for liquid silicon containment |
-
2008
- 2008-01-03 TW TW097100177A patent/TW200930851A/zh not_active IP Right Cessation
- 2008-05-28 US US12/153,916 patent/US8066814B2/en not_active Expired - Fee Related
- 2008-05-29 DE DE102008025828A patent/DE102008025828B9/de not_active Expired - Fee Related
- 2008-09-29 JP JP2008249902A patent/JP4856683B2/ja not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02225393A (ja) * | 1989-02-27 | 1990-09-07 | Shin Etsu Handotai Co Ltd | 単結晶引上装置における湯漏れ防止構造 |
JP2001302387A (ja) * | 2000-04-27 | 2001-10-31 | Shin Etsu Handotai Co Ltd | 単結晶引上げ装置の湯漏れ検出器および単結晶引上げ装置ならびに湯漏れ検出方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI346155B (ja) | 2011-08-01 |
DE102008025828B4 (de) | 2013-02-21 |
JP4856683B2 (ja) | 2012-01-18 |
US8066814B2 (en) | 2011-11-29 |
US20090175767A1 (en) | 2009-07-09 |
DE102008025828A1 (de) | 2009-07-23 |
DE102008025828B9 (de) | 2013-04-25 |
TW200930851A (en) | 2009-07-16 |
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