JP2009160680A5 - - Google Patents
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- Publication number
- JP2009160680A5 JP2009160680A5 JP2007341518A JP2007341518A JP2009160680A5 JP 2009160680 A5 JP2009160680 A5 JP 2009160680A5 JP 2007341518 A JP2007341518 A JP 2007341518A JP 2007341518 A JP2007341518 A JP 2007341518A JP 2009160680 A5 JP2009160680 A5 JP 2009160680A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask blank
- manufacturing
- polishing
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 25
- 238000004519 manufacturing process Methods 0.000 claims 16
- 238000005498 polishing Methods 0.000 claims 11
- 239000011521 glass Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 8
- 239000007788 liquid Substances 0.000 claims 5
- 150000007524 organic acids Chemical class 0.000 claims 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims 3
- 239000006061 abrasive grain Substances 0.000 claims 3
- 239000006096 absorbing agent Substances 0.000 claims 3
- 150000007522 mineralic acids Chemical class 0.000 claims 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 239000008119 colloidal silica Substances 0.000 claims 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims 1
- 239000011976 maleic acid Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 239000011975 tartaric acid Substances 0.000 claims 1
- 235000002906 tartaric acid Nutrition 0.000 claims 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007341518A JP5306644B2 (ja) | 2007-12-29 | 2007-12-29 | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007341518A JP5306644B2 (ja) | 2007-12-29 | 2007-12-29 | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009160680A JP2009160680A (ja) | 2009-07-23 |
| JP2009160680A5 true JP2009160680A5 (https=) | 2011-01-27 |
| JP5306644B2 JP5306644B2 (ja) | 2013-10-02 |
Family
ID=40963873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007341518A Active JP5306644B2 (ja) | 2007-12-29 | 2007-12-29 | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、及び反射型マスクブランクの製造方法、並びに反射型マスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5306644B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5733046B2 (ja) * | 2011-06-16 | 2015-06-10 | 旭硝子株式会社 | 研磨スラリー、およびその調製方法、ならびに、フォトマスク用ガラス基板の研磨方法 |
| KR101921759B1 (ko) * | 2011-09-21 | 2018-11-23 | 호야 가부시키가이샤 | 전사용 마스크의 제조 방법 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3979750B2 (ja) * | 1998-11-06 | 2007-09-19 | 株式会社荏原製作所 | 基板の研磨装置 |
| JP2006011434A (ja) * | 2002-03-29 | 2006-01-12 | Hoya Corp | マスクブランク用基板、マスクブランクおよび転写用マスクの製造方法 |
| US7071105B2 (en) * | 2003-02-03 | 2006-07-04 | Cabot Microelectronics Corporation | Method of polishing a silicon-containing dielectric |
| JP4286168B2 (ja) * | 2004-03-22 | 2009-06-24 | 花王株式会社 | ナノスクラッチを低減する方法 |
| US20060163206A1 (en) * | 2005-01-25 | 2006-07-27 | Irina Belov | Novel polishing slurries and abrasive-free solutions having a multifunctional activator |
| JP2008546214A (ja) * | 2005-06-06 | 2008-12-18 | アドバンスド テクノロジー マテリアルズ，インコーポレイテッド | 集積された化学機械研磨組成物および単一プラテン処理のためのプロセス |
| KR101257133B1 (ko) * | 2005-12-22 | 2013-04-22 | 아사히 가라스 가부시키가이샤 | 마스크 블랭크용 글라스 기판 및 이것을 제조하기 위한연마 방법 |
| JP2007257811A (ja) * | 2006-03-24 | 2007-10-04 | Hoya Corp | 磁気ディスク用ガラス基板の製造方法および磁気ディスクの製造方法 |
| JP2007301721A (ja) * | 2007-08-29 | 2007-11-22 | Kao Corp | 研磨液組成物 |
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2007
- 2007-12-29 JP JP2007341518A patent/JP5306644B2/ja active Active
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