JP2009136754A - Cleaning tank/device - Google Patents

Cleaning tank/device Download PDF

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JP2009136754A
JP2009136754A JP2007315016A JP2007315016A JP2009136754A JP 2009136754 A JP2009136754 A JP 2009136754A JP 2007315016 A JP2007315016 A JP 2007315016A JP 2007315016 A JP2007315016 A JP 2007315016A JP 2009136754 A JP2009136754 A JP 2009136754A
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cleaning
tank
cleaning tank
rough
finishing
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Kazuo Kobayashi
一雄 小林
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Nidec Instruments Corp
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Nidec Sankyo Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a multi-stage cleaning tank which is of a simple construction and can upgrade the cleanness of an object to be cleaned. <P>SOLUTION: This cleaning tank 3 comprises a finish-cleaning tank 17 which receives the supply of a cleaning fluid for cleaning the object to be cleaned 2 and finish-cleans the object 2, a rough-cleaning tank 18 which receives the inflow of the cleaning fluid overflowing the finish-cleaning tank 17 and rough-cleans the object 2, and an overflow tank 19 into which the cleaning fluid overflowing the rough-cleaning tank 18, flows. The finish-cleaning tank 17 is of an almost rectangular box-type and constructed in the way that the cleaning fluid overflows in the entire circumferential direction. In addition, the rough-cleaning tank 18 is of an almost rectangular box-type and constructed in the way that the cleaning fluid overflows in one direction. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、各種の被洗浄物を洗浄するための洗浄槽およびこの洗浄槽を備える洗浄装置に関する。   The present invention relates to a cleaning tank for cleaning various objects to be cleaned and a cleaning apparatus including the cleaning tank.

従来から、電子部品や金属部品等の各種の部品(ワーク)の製造工程では、洗浄槽を用いてワークの洗浄処理が行われている。この種の洗浄槽として、ワークの洗浄を行うための第一の洗浄槽および第二の洗浄槽を有する多段式の洗浄槽が知られている(たとえば、特許文献1参照)。   Conventionally, in a manufacturing process of various parts (workpieces) such as electronic parts and metal parts, a work cleaning process is performed using a cleaning tank. As this type of cleaning tank, a multi-stage cleaning tank having a first cleaning tank and a second cleaning tank for cleaning a workpiece is known (see, for example, Patent Document 1).

この特許文献1に記載の洗浄槽では、第一の洗浄槽に給水管から洗浄水が供給され、第一の洗浄槽から溢れ出した洗浄水が第二の洗浄槽に流れ込む。また、第二の洗浄槽から溢れ出した洗浄水は別の槽へ流れ込む。また、特許文献1に記載の第一の洗浄槽は略立方体の箱状に形成されており、第一の洗浄槽の一側面を構成する仕切板の上から溢れ出した洗浄水が第二の洗浄槽へ流れ込む。同様に、特許文献1に記載の第二の洗浄槽も略立方体の箱状に形成されており、第二の洗浄槽の一側面を構成する仕切板の上から溢れ出した洗浄水が別の槽へ流れ込む。   In the cleaning tank described in Patent Document 1, cleaning water is supplied from the water supply pipe to the first cleaning tank, and the cleaning water overflowing from the first cleaning tank flows into the second cleaning tank. Moreover, the washing water overflowing from the second washing tank flows into another tank. Moreover, the 1st washing tank of patent document 1 is formed in the substantially cubic box shape, and the washing water which overflowed from the partition plate which comprises one side of the 1st washing tank is 2nd. Flow into the washing tank. Similarly, the 2nd washing tank of patent documents 1 is also formed in the shape of a substantially cubic box, and the washing water which overflowed from the partition plate which constitutes one side of the 2nd washing tank is another. Flow into the tank.

特開2001−54766号公報JP 2001-54766 A

特許文献1に記載の多段式の洗浄槽では、一般に、洗浄水が供給される第一の洗浄槽でワークの仕上洗浄が行われる。しかしながら、この洗浄槽では、第一の洗浄槽の一側面を構成する仕切板の上から溢れ出した洗浄水が第二の洗浄槽へ流れ込む。そのため、第一の洗浄槽の一側面側にはワークを洗浄した後の塵埃等がたまりにくいが、仕切板に対向する第一の洗浄槽の他側面側(特に角部)には、塵埃等がたまりやすくなる。そのため、特許文献1に記載の洗浄槽では、高い洗浄度が要求されるワークの洗浄が困難となる。   In the multistage cleaning tank described in Patent Document 1, generally, the workpiece is finish-cleaned in the first cleaning tank to which cleaning water is supplied. However, in this cleaning tank, the cleaning water overflowing from the partition plate constituting one side of the first cleaning tank flows into the second cleaning tank. For this reason, dust or the like after cleaning the workpiece is difficult to collect on one side of the first cleaning tank, but dust or the like is present on the other side (particularly the corner) of the first cleaning tank facing the partition plate. It becomes easy to accumulate. Therefore, in the cleaning tank described in Patent Document 1, it is difficult to clean a workpiece that requires a high degree of cleaning.

そこで、本発明の課題は、簡易な構成で、被洗浄物の洗浄度を向上させることが可能な多段式の洗浄槽およびこの洗浄槽を備える洗浄装置を提供することにある。   SUMMARY OF THE INVENTION An object of the present invention is to provide a multistage cleaning tank capable of improving the degree of cleaning of an object to be cleaned and a cleaning apparatus including the cleaning tank with a simple configuration.

上記の課題を解決するため、本発明の洗浄槽は、被洗浄物を洗浄するための洗浄液が供給されるとともに被洗浄物の仕上洗浄を行うための仕上洗浄槽と、仕上洗浄槽から溢れ出す洗浄液が流れ込むとともに被洗浄物の粗洗浄を行うための粗洗浄槽と、粗洗浄槽から溢れ出す洗浄液が流れ込むオーバーフロー槽とを備え、仕上洗浄槽は、箱状に形成されるとともに、洗浄液が全周方向へ溢れ出すように構成され、粗洗浄槽は、略直方体または略立方体の箱状に形成されるとともに、洗浄液が1方向へ溢れ出すように構成されていることを特徴とする。   In order to solve the above-described problems, the cleaning tank of the present invention is supplied with a cleaning liquid for cleaning the object to be cleaned and overflows from the finishing cleaning tank for performing the final cleaning of the object to be cleaned, and the finishing cleaning tank. The cleaning liquid flows in and the rough cleaning tank for rough cleaning of the object to be cleaned and the overflow tank in which the cleaning liquid overflowing from the rough cleaning tank flows are formed. The rough cleaning tank is configured to overflow in the circumferential direction, and the rough cleaning tank is formed in a substantially rectangular parallelepiped or substantially cubic box shape, and is configured to overflow the cleaning liquid in one direction.

本発明の洗浄槽では、仕上洗浄を行う仕上洗浄槽は、洗浄液が全周方向へ溢れ出すように構成されている。そのため、仕上洗浄槽には、被洗浄物を洗浄した後の塵埃がたまりにくくなる。その結果、本発明では、被洗浄物の洗浄度を向上させることが可能になる。また、本発明の洗浄槽では、高い洗浄度が要求されない粗洗浄槽は、洗浄液が1方向へ溢れ出すように構成されている。そのため、本発明では、洗浄槽の構成を簡素化することが可能になり、洗浄槽を小型化することが可能になる。このように、本発明の洗浄槽では、簡易な構成で、被洗浄物の洗浄度を向上させることが可能になる。   In the cleaning tank of the present invention, the finishing cleaning tank for performing the finishing cleaning is configured such that the cleaning liquid overflows in the entire circumferential direction. Therefore, it becomes difficult for the finishing washing tank to collect dust after washing the object to be washed. As a result, in the present invention, it becomes possible to improve the degree of cleaning of the object to be cleaned. In the cleaning tank of the present invention, the rough cleaning tank that does not require a high degree of cleaning is configured so that the cleaning liquid overflows in one direction. Therefore, in the present invention, the configuration of the cleaning tank can be simplified, and the cleaning tank can be downsized. Thus, in the cleaning tank of the present invention, it is possible to improve the degree of cleaning of an object to be cleaned with a simple configuration.

本発明において、粗洗浄槽の内部に仕上洗浄槽が配置されていることが好ましい。このように構成すると、洗浄槽を小型化しやすくなる。   In the present invention, it is preferable that a finishing cleaning tank is disposed inside the rough cleaning tank. If comprised in this way, it will become easy to miniaturize a washing tank.

本発明において、洗浄槽は、略直方体または略立方体の箱状に形成されるとともに、仕上洗浄槽から溢れ出す洗浄液が流れ込み、粗洗浄槽に向かって洗浄液が溢れ出す中間洗浄槽をさらに備えることが好ましい。このように構成すると、中間洗浄槽を用いて、被洗浄物の洗浄度をさらに向上させることが可能になる。   In the present invention, the cleaning tank is formed in a substantially rectangular parallelepiped or substantially cubic box shape, and further includes an intermediate cleaning tank in which the cleaning liquid overflowing from the finishing cleaning tank flows and the cleaning liquid overflows toward the rough cleaning tank. preferable. If comprised in this way, it will become possible to further improve the washing | cleaning degree of a to-be-cleaned object using an intermediate | middle washing tank.

本発明において、粗洗浄槽の内部に中間洗浄槽が配置され、中間洗浄槽の内部に仕上洗浄槽が配置されていることが好ましい。このように構成すると、被洗浄物の洗浄度を向上させるために、中間洗浄槽が使用される場合であっても、洗浄槽を小型化することが可能になる。また、洗浄液が多方向へ溢れ出すように中間洗浄槽を構成することが可能になるため、中間洗浄槽に、被洗浄物を洗浄した後の塵埃がたまりにくくなる。   In the present invention, it is preferable that an intermediate cleaning tank is disposed inside the rough cleaning tank, and a finishing cleaning tank is disposed inside the intermediate cleaning tank. If comprised in this way, in order to improve the washing | cleaning degree of a to-be-washed | cleaned object, even if it is a case where an intermediate washing tank is used, it becomes possible to miniaturize a washing tank. Further, since the intermediate cleaning tank can be configured so that the cleaning liquid overflows in multiple directions, the dust after the object to be cleaned is not easily collected in the intermediate cleaning tank.

また、上記の課題を解決するため、本発明の洗浄槽は、被洗浄物を洗浄するための洗浄液が供給されるとともに被洗浄物の仕上洗浄を行うための仕上洗浄槽と、仕上洗浄槽から溢れ出す洗浄液が流れ込むとともに被洗浄物の粗洗浄を行うための粗洗浄槽と、粗洗浄槽から溢れ出す洗浄液が流れ込むオーバーフロー槽とを備え、仕上洗浄槽は、洗浄液が全周方向へ溢れ出すように構成されるとともに、粗洗浄槽は、洗浄液が所定方向のみに溢れ出すように構成されていることを特徴とする。   Further, in order to solve the above-described problems, the cleaning tank of the present invention is supplied with a cleaning liquid for cleaning an object to be cleaned and a finish cleaning tank for performing a final cleaning of the object to be cleaned, and a finish cleaning tank. It has a rough cleaning tank for washing the overflowing cleaning liquid and performing rough cleaning of the object to be cleaned, and an overflow tank for flowing the cleaning liquid overflowing from the rough cleaning tank, so that the cleaning liquid overflows in all directions. The rough cleaning tank is configured so that the cleaning liquid overflows only in a predetermined direction.

本発明の洗浄槽では、仕上洗浄を行う仕上洗浄槽は、洗浄液が全周方向へ溢れ出すように構成されている。そのため、仕上洗浄槽には、被洗浄物を洗浄した後の塵埃がたまりにくくなり、その結果、本発明では、被洗浄物の洗浄度を向上させることが可能になる。また、本発明では、高い洗浄度が要求されない粗洗浄槽は、洗浄液が所定方向のみに溢れ出すように構成されている。そのため、本発明では、洗浄槽の構成を簡素化することが可能になり、洗浄槽を小型化することが可能になる。   In the cleaning tank of the present invention, the finishing cleaning tank for performing the finishing cleaning is configured such that the cleaning liquid overflows in the entire circumferential direction. Therefore, the dust after the object to be cleaned is less likely to collect in the finishing cleaning tank. As a result, in the present invention, the degree of cleaning of the object to be cleaned can be improved. In the present invention, the rough cleaning tank that does not require a high degree of cleaning is configured such that the cleaning liquid overflows only in a predetermined direction. Therefore, in the present invention, the configuration of the cleaning tank can be simplified, and the cleaning tank can be downsized.

本発明の洗浄槽は、粗洗浄槽で洗浄された後の被洗浄物を仕上洗浄槽で洗浄する洗浄装置に用いることができる。この洗浄装置では、簡易な構成で、被洗浄物の洗浄度を向上させることが可能になる。   The cleaning tank of the present invention can be used in a cleaning apparatus that cleans an object to be cleaned after being cleaned in a rough cleaning tank in a finishing cleaning tank. In this cleaning apparatus, it is possible to improve the degree of cleaning of an object to be cleaned with a simple configuration.

本発明において、洗浄装置は、オーバーフロー槽から排出される洗浄液を仕上洗浄槽へ供給する循環経路を備えることが好ましい。このように構成すると、洗浄液を再利用することができ、被洗浄物の洗浄コストを低減することができる。   In the present invention, the cleaning device preferably includes a circulation path for supplying the cleaning liquid discharged from the overflow tank to the finishing cleaning tank. If comprised in this way, a washing | cleaning liquid can be reused and the washing | cleaning cost of a to-be-cleaned object can be reduced.

以上のように、本発明にかかる洗浄槽および洗浄装置では、簡易な構成で、被洗浄物の洗浄度を向上させることが可能になる。   As described above, the cleaning tank and the cleaning apparatus according to the present invention can improve the degree of cleaning of an object to be cleaned with a simple configuration.

以下、本発明の実施の形態を図面に基づいて説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(洗浄装置の概略構成)
図1は、本発明の実施の形態にかかる洗浄装置1の概略構成を説明するための概略図である。
(Schematic configuration of the cleaning device)
FIG. 1 is a schematic diagram for explaining a schematic configuration of a cleaning apparatus 1 according to an embodiment of the present invention.

本形態の洗浄装置1は、電子部品、金属部品、プリント配線基板あるいはガラス基板等の各種の被洗浄物2(以下、ワーク2とする。)を洗浄処理するための装置である。たとえば、洗浄装置1は、ワーク2となるカメラのレンズ駆動機構等を洗浄処理するための装置である。   The cleaning apparatus 1 of this embodiment is an apparatus for cleaning various kinds of objects to be cleaned 2 (hereinafter referred to as workpieces 2) such as electronic parts, metal parts, printed wiring boards, and glass substrates. For example, the cleaning device 1 is a device for cleaning a lens driving mechanism of a camera that becomes the workpiece 2.

この洗浄装置1は、図1に示すように、ワーク2を洗浄液に浸漬するための洗浄槽3を下端側に有する本体部4と、本体部4の内部へ洗浄液の蒸気を供給するための蒸気発生槽5と、洗浄槽3の上端側に取り付けられ洗浄液の蒸気を冷却して液化させるための冷却器6と、冷却器6で液化された洗浄液を回収して水と分離するための水分離槽7と、洗浄槽3から排出される洗浄液を循環させて再利用するための循環経路9とを備えている。   As shown in FIG. 1, the cleaning device 1 includes a main body 4 having a cleaning tank 3 on the lower end side for immersing the workpiece 2 in the cleaning liquid, and steam for supplying the cleaning liquid vapor to the inside of the main body 4. The generation tank 5, the cooler 6 attached to the upper end side of the cleaning tank 3 for cooling and liquefying the vapor of the cleaning liquid, and the water separation for recovering the cleaning liquid liquefied by the cooler 6 and separating it from the water A tank 7 and a circulation path 9 for circulating and reusing the cleaning liquid discharged from the cleaning tank 3 are provided.

洗浄装置1で使用される洗浄液は、揮発性を有する有機溶剤であり、たとえば、HFC(ハイドロフルオロカーボン)やHFE(ハイドロフルオロエーテル)、HCFC(ハイドロクロロフルオロカーボン)等のフッ素系溶剤、ジクロロメタンやトリクロロエチレン等の塩素系溶剤、あるいは、1−ブロモプロパン等の臭素系溶剤である。本形態の洗浄装置1では、洗浄液としてHFEが使用されている。   The cleaning liquid used in the cleaning apparatus 1 is a volatile organic solvent such as a fluorine-based solvent such as HFC (hydrofluorocarbon), HFE (hydrofluoroether), or HCFC (hydrochlorofluorocarbon), dichloromethane, trichloroethylene, or the like. Or a bromine solvent such as 1-bromopropane. In the cleaning apparatus 1 of this embodiment, HFE is used as the cleaning liquid.

本体部4は、略直方体の中空の箱状に形成されており、上述のように、下端側に洗浄槽3を備えている。本体部4の上面には、本体部4内にワーク2を搬入し、かつ、本体部4内からワーク2を搬出するための開口部15が形成されている。また、上下方向における本体部4の略中間位置(すなわち、洗浄槽3の上方)には、蒸気発生槽5で発生した洗浄液の蒸気を用いてワーク2を蒸気洗浄するための蒸気洗浄空間16が形成されている。   The main body 4 is formed in a substantially rectangular parallelepiped hollow box shape, and includes the cleaning tank 3 on the lower end side as described above. On the upper surface of the main body portion 4, an opening 15 for carrying the workpiece 2 into the main body portion 4 and carrying out the workpiece 2 from the main body portion 4 is formed. Further, a steam cleaning space 16 for steam cleaning the workpiece 2 using steam of the cleaning liquid generated in the steam generation tank 5 is provided at a substantially intermediate position of the main body 4 in the vertical direction (that is, above the cleaning tank 3). Is formed.

洗浄槽3は、ワーク2を洗浄液に浸漬して仕上洗浄を行うための仕上洗浄槽17と、ワーク2を洗浄液に浸漬して粗洗浄を行うための粗洗浄槽18と、粗洗浄槽18から溢れ出した洗浄液が流れ込むオーバーフロー槽19とを備えている。仕上洗浄槽17の底面側には、浸漬されたワーク2を超音波を用いて洗浄するための超音波振動子20が配置され、粗洗浄槽18の底面側には、浸漬されたワーク2を超音波を用いて洗浄するための超音波振動子21が配置されている。また、オーバーフロー槽19の底面には、循環経路9の一端側が接続され、仕上洗浄槽17の底面には、循環経路9の他端側が接続されている。この洗浄槽3の詳細な構成については後述する。   The cleaning tank 3 includes a finish cleaning tank 17 for performing the final cleaning by immersing the work 2 in the cleaning liquid, a rough cleaning tank 18 for performing the rough cleaning by immersing the work 2 in the cleaning liquid, and the rough cleaning tank 18. And an overflow tank 19 into which the overflowing cleaning liquid flows. An ultrasonic vibrator 20 for cleaning the immersed work 2 using ultrasonic waves is disposed on the bottom surface side of the finish cleaning tank 17, and the immersed work 2 is disposed on the bottom surface side of the rough cleaning tank 18. An ultrasonic transducer 21 for cleaning using ultrasonic waves is disposed. Further, one end side of the circulation path 9 is connected to the bottom surface of the overflow tank 19, and the other end side of the circulation path 9 is connected to the bottom surface of the finish cleaning tank 17. The detailed configuration of the cleaning tank 3 will be described later.

蒸気発生槽5の内部には、洗浄液を温めて気化させるためのヒータ22が配置されている。また、蒸気発生槽5の上端側には、配管23の一端側が接続されている。配管23の他端側は蒸気洗浄空間16に接続されている。すなわち、蒸気発生槽5の上端側は、配管23を介して蒸気洗浄空間16に接続されており、ヒータ22によって気化された洗浄液は、蒸気洗浄空間16に供給される。なお、本形態では、粗洗浄槽18から洗浄液が蒸気発生槽5に流れ込んで、蒸気発生槽5に洗浄液が補充される。   A heater 22 for warming and evaporating the cleaning liquid is disposed inside the steam generation tank 5. Further, one end side of the pipe 23 is connected to the upper end side of the steam generation tank 5. The other end side of the pipe 23 is connected to the steam cleaning space 16. That is, the upper end side of the steam generation tank 5 is connected to the steam cleaning space 16 via the pipe 23, and the cleaning liquid vaporized by the heater 22 is supplied to the steam cleaning space 16. In this embodiment, the cleaning liquid flows from the rough cleaning tank 18 into the steam generation tank 5, and the steam generation tank 5 is replenished with the cleaning liquid.

冷却器6は、たとえば、ペルチェ素子であり、本体部4の上端側の周囲(具体的には、蒸気洗浄空間16の上端の周囲)を囲むように配置されている。この冷却器6は、本体部4の、蒸気洗浄空間16の上端側の内壁を冷却する。そのため、蒸気洗浄空間16内の洗浄液の蒸気は、冷却器6によって冷却され液化されて蒸気洗浄空間16の上端側の内壁につく。本形態の洗浄装置1では、蒸気洗浄空間16の上端側の内壁についた液体状の洗浄液は、その後、水分離槽7に流れ込む。   The cooler 6 is a Peltier element, for example, and is disposed so as to surround the periphery on the upper end side of the main body 4 (specifically, the periphery of the upper end of the steam cleaning space 16). The cooler 6 cools the inner wall of the main body 4 on the upper end side of the steam cleaning space 16. Therefore, the steam of the cleaning liquid in the steam cleaning space 16 is cooled and liquefied by the cooler 6 and is attached to the inner wall on the upper end side of the steam cleaning space 16. In the cleaning apparatus 1 of the present embodiment, the liquid cleaning liquid attached to the inner wall on the upper end side of the steam cleaning space 16 flows into the water separation tank 7 thereafter.

また、冷却器6が蒸気洗浄空間16の上端側の内壁を冷却するため、蒸気洗浄空間16は上側に行くほど蒸気密度が下がる。したがって、後述のように、蒸気洗浄が行われた後のワーク2が冷却器6の内周側まで上昇すると、蒸気密度の低い領域に入るため、結果としてワーク2が乾燥することになる。すなわち、冷却器6は、洗浄液の蒸気を冷却して液化させる機能に加え、ワーク2を乾燥させる機能を果たしている。   Further, since the cooler 6 cools the inner wall on the upper end side of the steam cleaning space 16, the steam density decreases as the steam cleaning space 16 moves upward. Therefore, as will be described later, when the workpiece 2 after the steam cleaning is performed rises to the inner peripheral side of the cooler 6, the workpiece 2 enters a region having a low vapor density, and as a result, the workpiece 2 is dried. That is, the cooler 6 has a function of drying the workpiece 2 in addition to a function of cooling and liquefying the vapor of the cleaning liquid.

なお、冷却器6は、上端部近傍の空気も冷却するため、内壁が飽和水蒸気圧温度以下になると空気中に含まれる水分も内壁に結露する。結露して内壁に付着した水滴は、洗浄液と同様に内壁に沿って流れ落ちて水分離槽7に流れ込む。   In addition, since the cooler 6 also cools the air near the upper end, moisture contained in the air also condenses on the inner wall when the inner wall falls below the saturated water vapor pressure temperature. The water droplets which have condensed and adhered to the inner wall flow down along the inner wall and flow into the water separation tank 7 in the same manner as the cleaning liquid.

水分離槽7は、水の比重と洗浄液の比重との違いを利用して、水と洗浄液とを分離する。この水分離槽7では、冷却器6で液化された洗浄液等が上面側から流れ込み、底面から水と分離された洗浄液が排出される。なお、水分離槽7から排出される洗浄液はオーバーフロー槽19に流れ込む。   The water separation tank 7 separates water and the cleaning liquid by utilizing the difference between the specific gravity of water and the specific gravity of the cleaning liquid. In the water separation tank 7, the cleaning liquid liquefied by the cooler 6 flows from the upper surface side, and the cleaning liquid separated from the water is discharged from the bottom surface. The cleaning liquid discharged from the water separation tank 7 flows into the overflow tank 19.

循環経路9は、図1に示すように、洗浄槽3(具体的には、オーバーフロー槽19)から排出される洗浄液を仕上洗浄槽17に向かって送るポンプ30と、仕上洗浄槽17に向かって送られる洗浄液をろ過して洗浄液に含まれる塵埃等の不純物を取り除くフィルター31とを備えている。また、循環経路9は、オーバーフロー槽19に接続される配管33と、仕上洗浄槽17に接続される配管34とを備えている。   As shown in FIG. 1, the circulation path 9 has a pump 30 for sending the cleaning liquid discharged from the cleaning tank 3 (specifically, the overflow tank 19) toward the finishing cleaning tank 17, and toward the finishing cleaning tank 17. And a filter 31 that removes impurities such as dust contained in the cleaning liquid by filtering the cleaning liquid sent. The circulation path 9 includes a pipe 33 connected to the overflow tank 19 and a pipe 34 connected to the finish cleaning tank 17.

配管33の一端側はソケット(図示省略)を介してオーバーフロー槽19の底面に接続され、配管33の他端側には配管34の一端側が接続されている。また、配管34の他端側はソケット(図示省略)を介して仕上洗浄槽17の底面に接続されている。ポンプ30は、配管33の途中に配置され、フィルター31は、配管34の途中に配置されている。   One end side of the pipe 33 is connected to the bottom surface of the overflow tank 19 via a socket (not shown), and one end side of the pipe 34 is connected to the other end side of the pipe 33. The other end side of the pipe 34 is connected to the bottom surface of the finishing cleaning tank 17 via a socket (not shown). The pump 30 is disposed in the middle of the pipe 33, and the filter 31 is disposed in the middle of the pipe 34.

ワーク2は、本体部4内に設置されるワーク保持治具(図示省略)に保持された状態で、本体部4内を移動する。すなわち、ワーク保持治具は、本体部4内に設置される移動機構(図示省略)に接続されており、本体部4内において少なくとも上下方向および図1の左右方向へ移動する。   The work 2 moves in the main body 4 while being held by a work holding jig (not shown) installed in the main body 4. That is, the workpiece holding jig is connected to a moving mechanism (not shown) installed in the main body 4 and moves in the main body 4 at least in the vertical direction and in the horizontal direction in FIG.

以上のように構成された洗浄装置1では、まず、粗洗浄槽18の中にワーク2を浸漬して、ワーク2の粗洗浄を行う。具体的には、超音波振動子21を駆動して、ワーク2の超音波洗浄を行う。その後、ワーク2を仕上洗浄槽17の中に浸漬して、ワーク2の仕上洗浄を行う。具体的には、超音波振動子20を駆動して、ワーク2の超音波洗浄を行う。その後、蒸気洗浄空間16でワーク2の蒸気洗浄を行う。その後、ワーク2を冷却器6の内周側まで移動させて、ワーク2の乾燥を行う。   In the cleaning apparatus 1 configured as described above, first, the workpiece 2 is immersed in the rough cleaning tank 18 to perform rough cleaning of the workpiece 2. Specifically, the ultrasonic vibrator 21 is driven to perform ultrasonic cleaning of the workpiece 2. Thereafter, the workpiece 2 is immersed in the finish cleaning tank 17 to perform finish cleaning of the workpiece 2. Specifically, the ultrasonic vibrator 20 is driven to perform ultrasonic cleaning of the workpiece 2. Thereafter, the workpiece 2 is subjected to steam cleaning in the steam cleaning space 16. Thereafter, the work 2 is moved to the inner peripheral side of the cooler 6 to dry the work 2.

(洗浄槽の構成)
図2は、図1に示す洗浄槽3の平面図である。
(Structure of washing tank)
FIG. 2 is a plan view of the cleaning tank 3 shown in FIG.

本形態の洗浄槽3は、上述のように、仕上洗浄に使用される仕上洗浄槽17と粗洗浄に使用される粗洗浄槽18とオーバーフロー槽19とを備えている。   As described above, the cleaning tank 3 of the present embodiment includes the finish cleaning tank 17 used for finish cleaning, the rough cleaning tank 18 used for rough cleaning, and the overflow tank 19.

仕上洗浄槽17は、図1、図2に示すように、上面が開口する略直方体の箱状に形成されている。本形態では、端部同士を当接させた状態で本体部4の底面に溶接されて固定された4枚の側板51によって仕上洗浄槽17が形成されている。また、当接する側板51の端部同士は互いに溶接されて固定されている。この側板51の高さは、本体部4の側面を構成する4枚の側板52の高さよりも低くなっている。なお、側板51の下端部の両側(仕上洗浄槽17の内側と外側との両側)が本体部4の底面に溶接されても良いし、側板51の下端部の片側のみが本体部4の底面に溶接されても良い。   As shown in FIGS. 1 and 2, the finish cleaning tank 17 is formed in a substantially rectangular parallelepiped box shape whose upper surface is open. In this embodiment, the finish cleaning tank 17 is formed by four side plates 51 which are welded and fixed to the bottom surface of the main body 4 in a state where the ends are in contact with each other. Moreover, the edge parts of the side plate 51 which contact | abut is mutually welded and fixed. The height of the side plate 51 is lower than the height of the four side plates 52 constituting the side surface of the main body 4. Note that both sides of the lower end portion of the side plate 51 (both inside and outside of the finish cleaning tank 17) may be welded to the bottom surface of the main body portion 4, or only one side of the lower end portion of the side plate 51 is the bottom surface of the main body portion 4. It may be welded to.

粗洗浄槽18は、図1、図2に示すように、上面が開口する略直方体の箱状に形成されている。本形態では、4枚の側板52のうちの3枚の側板52と、図2の上下方向において対向配置される2枚の側板52に端部を当接させた状態で本体部4の底面に溶接されて固定された1枚の側板53とによって粗洗浄槽18が形成されている。具体的には、図2の上下方向に配置される2枚の側板52および図2の右方向に配置される1枚の側板52と、側板53とによって粗洗浄槽18が形成されている。また、側板53の端部は側板52に溶接されて固定されている。この側板53の高さは、側板51の高さよりも低くなっている。なお、側板53の下端部の両側(粗洗浄槽18の内側と外側との両側)が本体部4の底面に溶接されても良いし、側板53の下端部の片側のみが本体部4の底面に溶接されても良い。   As shown in FIGS. 1 and 2, the rough cleaning tank 18 is formed in a substantially rectangular parallelepiped box shape whose upper surface is open. In this embodiment, the three side plates 52 of the four side plates 52 and the two side plates 52 arranged opposite to each other in the vertical direction in FIG. The rough cleaning tank 18 is formed by one side plate 53 which is fixed by welding. Specifically, the rough cleaning tank 18 is formed by the two side plates 52 arranged in the vertical direction in FIG. 2, the one side plate 52 arranged in the right direction in FIG. 2, and the side plate 53. Further, the end portion of the side plate 53 is fixed to the side plate 52 by welding. The height of the side plate 53 is lower than the height of the side plate 51. Note that both sides of the lower end portion of the side plate 53 (both sides inside and outside the rough cleaning tank 18) may be welded to the bottom surface of the main body portion 4, or only one side of the lower end portion of the side plate 53 is the bottom surface of the main body portion 4. It may be welded to.

オーバーフロー槽19は、図1、図2に示すように、上面が開口する細長い略直方体の箱状に形成されている。本形態では、図2の上下方向に配置される2枚の側板52および図2の左方向に配置される1枚の側板52と、側板53とによってオーバーフロー槽19が形成されている。すなわち、オーバーフロー槽19は、粗洗浄槽18に隣接するように配置されている。   As shown in FIGS. 1 and 2, the overflow tank 19 is formed in an elongated, substantially rectangular parallelepiped box shape whose upper surface is open. In this embodiment, the overflow tank 19 is formed by the two side plates 52 arranged in the vertical direction in FIG. 2, the one side plate 52 arranged in the left direction in FIG. 2, and the side plate 53. That is, the overflow tank 19 is disposed adjacent to the rough cleaning tank 18.

上述のように、仕上洗浄槽17の底面には循環経路9の他端側の一部が接続されており、オーバーフロー槽19から排出されフィルター31を通過した洗浄液が仕上洗浄槽17に供給される。そのため、ワーク2の洗浄時には、仕上洗浄槽17は洗浄液で満たされている。この洗浄液で満たされた仕上洗浄槽17にさらに洗浄液が供給されると、洗浄液は仕上洗浄槽17から溢れ出す。   As described above, a part of the other end side of the circulation path 9 is connected to the bottom surface of the finish cleaning tank 17, and the cleaning liquid discharged from the overflow tank 19 and passing through the filter 31 is supplied to the finish cleaning tank 17. . Therefore, when cleaning the workpiece 2, the finish cleaning tank 17 is filled with the cleaning liquid. When the cleaning liquid is further supplied to the finishing cleaning tank 17 filled with the cleaning liquid, the cleaning liquid overflows from the finishing cleaning tank 17.

本形態では、図2に示すように、仕上洗浄槽17は、粗洗浄槽18の内部に配置されている。すなわち、仕上洗浄槽17の周囲を囲むように粗洗浄槽18が配置されている。そのため、仕上洗浄槽17から溢れ出す洗浄液は粗洗浄槽18に流れ込む。具体的には、仕上洗浄槽17の洗浄液は、4枚の側板51の上から仕上洗浄槽17の全周方向に溢れ出して、粗洗浄槽18に流れ込む。   In this embodiment, as shown in FIG. 2, the finish cleaning tank 17 is disposed inside the rough cleaning tank 18. That is, the rough cleaning tank 18 is disposed so as to surround the finish cleaning tank 17. Therefore, the cleaning liquid overflowing from the finishing cleaning tank 17 flows into the rough cleaning tank 18. Specifically, the cleaning liquid in the finishing cleaning tank 17 overflows from the four side plates 51 in the entire circumferential direction of the finishing cleaning tank 17 and flows into the rough cleaning tank 18.

仕上洗浄槽17から溢れ出す洗浄液が粗洗浄槽18に流れ込むため、ワーク2の洗浄時には、粗洗浄槽18は洗浄液で満たされている。この洗浄液で満たされた粗洗浄槽18にさらに洗浄液が流れ込むと、洗浄液は粗洗浄槽18から溢れ出す。上述のように、側板53の高さは、側板51の高さよりも低くなっている。そのため、粗洗浄槽18から溢れ出す洗浄液はオーバーフロー槽19に流れ込む。具体的には、図2における粗洗浄槽18の左側面とオーバーフロー槽19の右側面とが共通の側板53によって構成されているため、粗洗浄槽18から溢れ出す洗浄液は側板53の上から図2の左方向に向かって溢れ出して、オーバーフロー槽19に流れ込む。すなわち、本形態では、粗洗浄槽18から1方向に向かって洗浄液が溢れ出す。   Since the cleaning liquid overflowing from the finish cleaning tank 17 flows into the rough cleaning tank 18, the rough cleaning tank 18 is filled with the cleaning liquid when the workpiece 2 is cleaned. When the cleaning liquid further flows into the rough cleaning tank 18 filled with the cleaning liquid, the cleaning liquid overflows from the rough cleaning tank 18. As described above, the height of the side plate 53 is lower than the height of the side plate 51. Therefore, the cleaning liquid overflowing from the rough cleaning tank 18 flows into the overflow tank 19. Specifically, since the left side surface of the rough cleaning tank 18 and the right side surface of the overflow tank 19 in FIG. 2 are configured by a common side plate 53, the cleaning liquid overflowing from the rough cleaning tank 18 is viewed from above the side plate 53. 2 overflows in the left direction and flows into the overflow tank 19. That is, in this embodiment, the cleaning liquid overflows from the rough cleaning tank 18 in one direction.

また、オーバーフロー槽19に流れ込んだ洗浄液はその後、上述のように、循環経路9を介して仕上洗浄槽17に供給される。   Further, the cleaning liquid flowing into the overflow tank 19 is then supplied to the finishing cleaning tank 17 via the circulation path 9 as described above.

(本形態の主な効果)
以上説明したように、本形態では、仕上洗浄を行う仕上洗浄槽17は、洗浄液が全周方向へ溢れ出すように構成されている。そのため、仕上洗浄槽17には、ワーク2を洗浄した後の塵埃がたまりにくくなる。その結果、本形態では、ワーク2の洗浄度を向上させることが可能になる。
(Main effects of this form)
As described above, in this embodiment, the finish cleaning tank 17 that performs finish cleaning is configured such that the cleaning liquid overflows in the entire circumferential direction. Therefore, the dust after cleaning the workpiece 2 is less likely to accumulate in the finish cleaning tank 17. As a result, in this embodiment, it is possible to improve the degree of cleaning of the workpiece 2.

また、本形態では、高い洗浄度が要求されない粗洗浄を行う粗洗浄槽18は、洗浄液が1方向へ溢れ出すように構成されている。そのため、洗浄槽3の構成を簡素化することができ、洗浄槽3を小型化することが可能になる。特に本形態では、粗洗浄槽18の内部に仕上洗浄槽17が配置されているため、図2の左右方向で洗浄槽3を小型化することが可能になる。   In this embodiment, the rough cleaning tank 18 that performs rough cleaning that does not require a high degree of cleaning is configured such that the cleaning liquid overflows in one direction. Therefore, the configuration of the cleaning tank 3 can be simplified, and the cleaning tank 3 can be downsized. In particular, in this embodiment, since the finish cleaning tank 17 is disposed inside the rough cleaning tank 18, the cleaning tank 3 can be downsized in the left-right direction of FIG.

本形態では、洗浄装置1は、オーバーフロー槽19から排出される洗浄液を仕上洗浄槽17へ供給する循環経路9を備えている。そのため、フィルター31によって不純物が取り除かれた洗浄液を再利用することができ、ワーク2の洗浄コストを低減することができる。   In this embodiment, the cleaning device 1 includes a circulation path 9 that supplies the cleaning liquid discharged from the overflow tank 19 to the finishing cleaning tank 17. Therefore, the cleaning liquid from which impurities are removed by the filter 31 can be reused, and the cleaning cost of the workpiece 2 can be reduced.

(洗浄槽の変形例1)
図3は、本発明の実施の形態にかかる洗浄槽3の変形例を示す図であり、(A)は平面図、(B)は(A)のE−E断面の概略を示す断面図である。
(Modification 1 of the washing tank)
FIG. 3: is a figure which shows the modification of the washing tank 3 concerning embodiment of this invention, (A) is a top view, (B) is sectional drawing which shows the outline of the EE cross section of (A). is there.

変形例1にかかる洗浄槽3は、図3に示すように、仕上洗浄槽17、粗洗浄槽18およびオーバーフロー槽19に加え、粗洗浄と仕上洗浄との間にワーク2の中間洗浄を行う中間洗浄槽60を備えている。以下、図3に示す洗浄槽3の構成を簡単に説明する。なお、図3では、上述した形態と同一の構成については同一の符号を付している。   As shown in FIG. 3, the cleaning tank 3 according to the modified example 1 is an intermediate that performs intermediate cleaning of the workpiece 2 between the rough cleaning and the finishing cleaning in addition to the finishing cleaning tank 17, the rough cleaning tank 18, and the overflow tank 19. A cleaning tank 60 is provided. Hereinafter, the configuration of the cleaning tank 3 shown in FIG. 3 will be briefly described. In FIG. 3, the same components as those described above are denoted by the same reference numerals.

中間洗浄槽60は、上述の仕上洗浄槽17とほぼ同様に構成されている。すなわち、中間洗浄槽60は、端部同士を当接させた状態で本体部4の底面に溶接されて固定された4枚の側板71によって、上面が開口する略直方体の箱状に形成されている。また、当接する側板71の端部同士は互いに溶接されて固定されている。側板71の高さは、側板51の高さよりも低く、かつ、側板53の高さよりも高くなっている。   The intermediate cleaning tank 60 is configured in substantially the same manner as the finishing cleaning tank 17 described above. That is, the intermediate cleaning tank 60 is formed in a substantially rectangular parallelepiped box shape whose upper surface is opened by four side plates 71 which are welded and fixed to the bottom surface of the main body portion 4 in a state where the end portions are in contact with each other. Yes. Moreover, the edge parts of the side plate 71 which contact | abuts are mutually welded and fixed. The height of the side plate 71 is lower than the height of the side plate 51 and higher than the height of the side plate 53.

図3に示す洗浄槽3では、中間洗浄槽60は、仕上洗浄槽17の周囲を囲むように配置されている。すなわち、中間洗浄槽60の内部に仕上洗浄槽17が配置されている。そのため、仕上洗浄槽17から溢れ出す洗浄液は中間洗浄槽60に流れ込む。具体的には、仕上洗浄槽17の洗浄液は、4枚の側板51の上から仕上洗浄槽17の全周方向に溢れ出して、中間洗浄槽60に流れ込む。   In the cleaning tank 3 shown in FIG. 3, the intermediate cleaning tank 60 is disposed so as to surround the finish cleaning tank 17. That is, the finish cleaning tank 17 is disposed inside the intermediate cleaning tank 60. Therefore, the cleaning liquid overflowing from the finishing cleaning tank 17 flows into the intermediate cleaning tank 60. Specifically, the cleaning liquid in the finishing cleaning tank 17 overflows from the four side plates 51 in the entire circumferential direction of the finishing cleaning tank 17 and flows into the intermediate cleaning tank 60.

また、ワーク2の洗浄時に中間洗浄槽60は洗浄液で満たされているため、中間洗浄槽60に洗浄液が流れ込むと、中間洗浄槽60から洗浄液が溢れ出す。ここで、図3に示す洗浄槽3では、中間洗浄槽60は、粗洗浄槽18の内部に配置され、側板71の高さは側板51の高さよりも低くなっている。そのため、中間洗浄槽60から溢れ出す洗浄液は粗洗浄槽18に流れ込む。具体的には、中間洗浄槽60の洗浄液は、4枚の側板71の上から中間洗浄槽60の全周方向に溢れ出して、粗洗浄槽18に流れ込む。   Further, since the intermediate cleaning tank 60 is filled with the cleaning liquid when the workpiece 2 is cleaned, the cleaning liquid overflows from the intermediate cleaning tank 60 when the cleaning liquid flows into the intermediate cleaning tank 60. Here, in the cleaning tank 3 shown in FIG. 3, the intermediate cleaning tank 60 is disposed inside the rough cleaning tank 18, and the height of the side plate 71 is lower than the height of the side plate 51. Therefore, the cleaning liquid overflowing from the intermediate cleaning tank 60 flows into the rough cleaning tank 18. Specifically, the cleaning liquid in the intermediate cleaning tank 60 overflows from the four side plates 71 in the entire circumferential direction of the intermediate cleaning tank 60 and flows into the rough cleaning tank 18.

なお、粗洗浄槽18からは、上述した形態と同様に洗浄液が1方向へ溢れ出してオーバーフロー槽19に流れ込む。   Note that the cleaning liquid overflows in one direction from the rough cleaning tank 18 and flows into the overflow tank 19 in the same manner as described above.

図3に示す洗浄槽3では、上述した形態以上の効果を得ることができる。すなわち、図3に示す洗浄槽3では、粗洗浄槽18での粗洗浄、中間洗浄槽60での中間洗浄および仕上洗浄槽17での仕上洗浄を行うことになるため、ワーク2の洗浄品質をさらに上げることが可能になる。   In the washing tank 3 shown in FIG. That is, in the cleaning tank 3 shown in FIG. 3, rough cleaning in the rough cleaning tank 18, intermediate cleaning in the intermediate cleaning tank 60, and finish cleaning in the finish cleaning tank 17 are performed. It can be raised further.

また、図3に示す洗浄槽3では、粗洗浄槽18の内部に中間洗浄槽60が配置される構造になっているため、図3の左右方向で洗浄槽3を小型化することが可能になる。また、中間洗浄槽60は、仕上洗浄槽17と同様に、洗浄液が全周方向へ溢れ出すように構成されているため、中間洗浄槽60に塵埃がたまりにくくなる。   In addition, the cleaning tank 3 shown in FIG. 3 has a structure in which the intermediate cleaning tank 60 is disposed inside the rough cleaning tank 18, so that the cleaning tank 3 can be downsized in the left-right direction of FIG. Become. Moreover, since the intermediate cleaning tank 60 is configured so that the cleaning liquid overflows in the entire circumferential direction, like the finishing cleaning tank 17, dust is less likely to accumulate in the intermediate cleaning tank 60.

(洗浄槽の変形例2)
図4は、本発明の実施の形態にかかる洗浄槽3の他の変形例を示す図であり、(A)は平面図、(B)は(A)のF−F断面の概略を示す断面図である。
(Modification 2 of the washing tank)
FIG. 4: is a figure which shows the other modification of the washing tank 3 concerning embodiment of this invention, (A) is a top view, (B) is a cross section which shows the outline of the FF cross section of (A). FIG.

図3に示す洗浄槽3では、仕上洗浄槽17の周囲を囲むように、中間洗浄槽60が配置されている。この他にもたとえば、図4に示す洗浄槽3のように、中間洗浄槽80が仕上洗浄槽17に隣接するように配置されても良い。以下、図4に示す洗浄槽3の構成を簡単に説明する。なお、図4では、上述した形態と同一の構成については同一の符号を付している。また、以下では、図4(A)の上下方向を「前後方向」、図4(A)の左右方向を「左右方向」として、この洗浄槽3の構成を説明する。   In the cleaning tank 3 shown in FIG. 3, an intermediate cleaning tank 60 is disposed so as to surround the finish cleaning tank 17. In addition, for example, as in the cleaning tank 3 shown in FIG. 4, the intermediate cleaning tank 80 may be disposed adjacent to the finishing cleaning tank 17. Hereinafter, the configuration of the cleaning tank 3 shown in FIG. 4 will be briefly described. In FIG. 4, the same components as those described above are denoted by the same reference numerals. In the following, the configuration of the cleaning tank 3 will be described with the vertical direction in FIG. 4A as the “front-rear direction” and the horizontal direction in FIG. 4A as the “left-right direction”.

図4に示す洗浄槽3では、中間洗浄槽80は、上面が開口する略直方体の箱状に形成されている。具体的には、前後方向において対向配置される2枚の側板52に前後端を当接させた状態で本体部4の底面に溶接されて固定された1枚の側板81と、前後方向において対向配置されるとともに右端を側板81に当接させた状態で本体部4の底面に溶接されて固定された2枚の側板82と、2枚の側板82の左端に前後端を当接させた状態で本体部4の底面に溶接されて固定された1枚の側板83とによって中間洗浄槽80は形成されている。すなわち、中間洗浄槽80は、3方向から粗洗浄槽18に囲まれている。また、側板81の前後端は側板52に溶接され、側板82の右端は側板81に溶接され、側板83の前後端は側板82の左端に溶接されている。   In the cleaning tank 3 shown in FIG. 4, the intermediate cleaning tank 80 is formed in a substantially rectangular parallelepiped box shape whose upper surface is open. Specifically, it opposes in the front-rear direction with one side plate 81 welded and fixed to the bottom surface of the main body 4 with the front-rear ends in contact with the two side plates 52 arranged to face each other in the front-rear direction. Two side plates 82 that are arranged and welded and fixed to the bottom surface of the main body 4 with the right end in contact with the side plate 81, and the front and rear ends in contact with the left ends of the two side plates 82 The intermediate cleaning tank 80 is formed by a single side plate 83 that is welded and fixed to the bottom surface of the main body 4. That is, the intermediate cleaning tank 80 is surrounded by the rough cleaning tank 18 from three directions. The front and rear ends of the side plate 81 are welded to the side plate 52, the right end of the side plate 82 is welded to the side plate 81, and the front and rear ends of the side plate 83 are welded to the left end of the side plate 82.

図4(B)に示すように、側板81の高さは、側板51の高さよりも低くなっている。側板83の高さは、側板81の高さよりも低くかつ側板53の高さよりも高くなっている。また、側板82の高さは、側板83の高さとほぼ同じになっている。なお、側板82の高さは、側板83の高さより高くても良いし、低くても良い。   As shown in FIG. 4B, the height of the side plate 81 is lower than the height of the side plate 51. The height of the side plate 83 is lower than the height of the side plate 81 and higher than the height of the side plate 53. The height of the side plate 82 is substantially the same as the height of the side plate 83. Note that the height of the side plate 82 may be higher or lower than the height of the side plate 83.

図4に示す洗浄槽3では、側板81は、仕上洗浄槽17よりも左方に配置されており、この洗浄槽3では、仕上洗浄槽17の周囲を囲むように、仕上洗浄槽17用のオーバーフロー槽89が形成されている。そのため、仕上洗浄槽17から溢れ出す洗浄液はオーバーフロー槽89に流れ込む。具体的には、仕上洗浄槽17の洗浄液は、4枚の側板51の上から仕上洗浄槽17の全周方向に溢れ出して、オーバーフロー槽89に流れ込む。   In the cleaning tank 3 shown in FIG. 4, the side plate 81 is arranged on the left side of the finish cleaning tank 17. In the cleaning tank 3, the finish plate 17 is used to surround the finish cleaning tank 17. An overflow tank 89 is formed. Therefore, the cleaning liquid overflowing from the finish cleaning tank 17 flows into the overflow tank 89. Specifically, the cleaning liquid in the finishing cleaning tank 17 overflows from the four side plates 51 in the entire circumferential direction of the finishing cleaning tank 17 and flows into the overflow tank 89.

また、ワーク2の洗浄時にオーバーフロー槽89は洗浄液で満たされているため、オーバーフロー槽89に洗浄液が流れ込むと、オーバーフロー槽89から洗浄液が溢れ出す。具体的には、オーバーフロー槽89内の洗浄液は、側板81の上から左方向に向かって溢れ出して、中間洗浄槽80および粗洗浄槽18に流れ込む。   Moreover, since the overflow tank 89 is filled with the cleaning liquid when the workpiece 2 is cleaned, the cleaning liquid overflows from the overflow tank 89 when the cleaning liquid flows into the overflow tank 89. Specifically, the cleaning liquid in the overflow tank 89 overflows leftward from above the side plate 81 and flows into the intermediate cleaning tank 80 and the rough cleaning tank 18.

さらに、ワーク2の洗浄時に中間洗浄槽80は洗浄液で満たされているため、中間洗浄槽80に洗浄液が流れ込むと、中間洗浄槽80から洗浄液が溢れ出す。具体的には、中間洗浄槽80内の洗浄液は、前後方向および左方向(すなわち、3方向)に向かって側板82、83の上から溢れ出して、粗洗浄槽18に流れ込む。なお、粗洗浄槽18からは、上述した形態と同様に洗浄液が1方向へ溢れ出してオーバーフロー槽19に流れ込む。   Furthermore, since the intermediate cleaning tank 80 is filled with the cleaning liquid when the workpiece 2 is cleaned, the cleaning liquid overflows from the intermediate cleaning tank 80 when the cleaning liquid flows into the intermediate cleaning tank 80. Specifically, the cleaning liquid in the intermediate cleaning tank 80 overflows from above the side plates 82 and 83 in the front-rear direction and the left direction (that is, three directions) and flows into the rough cleaning tank 18. Note that the cleaning liquid overflows in one direction from the rough cleaning tank 18 and flows into the overflow tank 19 in the same manner as described above.

図4に示す洗浄槽3でも上述した形態と同様の効果を得ることができる。また、図4に示す洗浄槽3では、中間洗浄槽80が仕上洗浄槽17に隣接するように配置されている。したがって、ワーク2の洗浄度を向上させるために、中間洗浄槽80が使用される場合であっても、前後方向で洗浄槽3を小型化することが可能になる。さらに、中間洗浄槽80は、洗浄液が3方向へ溢れ出すように構成されているため、中間洗浄槽80に塵埃がたまりにくくなる。   The cleaning tank 3 shown in FIG. 4 can also obtain the same effects as those described above. Further, in the cleaning tank 3 shown in FIG. 4, the intermediate cleaning tank 80 is disposed adjacent to the finishing cleaning tank 17. Therefore, even when the intermediate cleaning tank 80 is used to improve the degree of cleaning of the workpiece 2, the cleaning tank 3 can be downsized in the front-rear direction. Furthermore, since the intermediate cleaning tank 80 is configured so that the cleaning liquid overflows in three directions, dust does not easily accumulate in the intermediate cleaning tank 80.

(他の実施の形態)
上述した形態および変形例は、本発明の好適な形態の一例ではあるが、これに限定されるものではなく本発明の要旨を変更しない範囲において種々変形実施が可能である。
(Other embodiments)
The above-described embodiments and modifications are examples of preferred embodiments of the present invention, but are not limited thereto, and various modifications can be made without departing from the scope of the present invention.

上述した形態および変形例では、仕上洗浄槽17、粗洗浄槽18および中間洗浄槽60、80は、略直方体の箱状に形成されている。この他にもたとえば、仕上洗浄槽17、粗洗浄槽18および/または中間洗浄槽60、80は、略立方体状の箱状に形成されても良い。   In the embodiment and the modification described above, the finish cleaning tank 17, the rough cleaning tank 18, and the intermediate cleaning tanks 60 and 80 are formed in a substantially rectangular parallelepiped box shape. In addition, for example, the finish cleaning tank 17, the rough cleaning tank 18, and / or the intermediate cleaning tanks 60 and 80 may be formed in a substantially cubic box shape.

また、上面から見たときの形状が円形、楕円形、三角形あるいは五角形以上の多角形となるように、仕上洗浄槽17、粗洗浄槽18および/または中間洗浄槽60、80が形成されても良い。この場合には、仕上洗浄槽17は、洗浄液が全周方向へ溢れ出すように構成され、粗洗浄槽18は、洗浄液が所定方向のみに溢れ出すように構成されれば良い。このように構成すれば、上述した形態と同様の効果を得ることができる。   Further, even when the finishing cleaning tank 17, the rough cleaning tank 18, and / or the intermediate cleaning tanks 60 and 80 are formed so that the shape when viewed from above is a circle, an ellipse, a triangle, or a polygon more than a pentagon. good. In this case, the finishing cleaning tank 17 is configured so that the cleaning liquid overflows in the entire circumferential direction, and the rough cleaning tank 18 may be configured so that the cleaning liquid overflows only in a predetermined direction. If comprised in this way, the effect similar to the form mentioned above can be acquired.

上述した形態では、洗浄槽3は、仕上洗浄槽17と粗洗浄槽18との2個の洗浄用の槽を備えている。また、変形例にかかる洗浄槽3は、仕上洗浄槽17と粗洗浄槽18と中間洗浄槽60、80との3個の洗浄用の槽を備えている。この他にもたとえば、洗浄槽3が備える洗浄用の槽の数は4個以上であっても良い。すなわち、洗浄槽3が第1中間洗浄槽および第2中間洗浄槽等の2個以上の中間洗浄槽を備えていても良い。また、上述した形態および変形例では、洗浄槽3はオーバーフロー槽19を備えているが、洗浄槽3はオーバーフロー槽19を備えていなくても良い。   In the embodiment described above, the cleaning tank 3 includes two cleaning tanks, a finishing cleaning tank 17 and a rough cleaning tank 18. In addition, the cleaning tank 3 according to the modification includes three cleaning tanks, that is, a finishing cleaning tank 17, a rough cleaning tank 18, and intermediate cleaning tanks 60 and 80. In addition, for example, the number of cleaning tanks provided in the cleaning tank 3 may be four or more. That is, the cleaning tank 3 may include two or more intermediate cleaning tanks such as a first intermediate cleaning tank and a second intermediate cleaning tank. Moreover, in the form and modification mentioned above, although the washing tank 3 is provided with the overflow tank 19, the washing tank 3 does not need to be provided with the overflow tank 19.

上述した形態では、洗浄液として、フッ素系溶剤、塩素系溶剤あるいは臭素系溶剤が使用される洗浄装置1を例に本発明の実施の形態を説明しているが、本発明の洗浄槽3の構成は、洗浄液として、炭化水素系溶剤、純水系溶剤あるいは純水が使用される洗浄装置にも適用可能である。   In the embodiment described above, the embodiment of the present invention has been described by taking the cleaning apparatus 1 in which a fluorine-based solvent, a chlorine-based solvent or a bromine-based solvent is used as the cleaning liquid, but the configuration of the cleaning tank 3 of the present invention is described. Can be applied to a cleaning apparatus in which a hydrocarbon solvent, a pure water solvent or pure water is used as the cleaning liquid.

本発明の実施の形態にかかる洗浄装置の概略構成を説明するための概略図である。It is the schematic for demonstrating schematic structure of the washing | cleaning apparatus concerning embodiment of this invention. 図1に示す洗浄槽の平面図である。It is a top view of the washing tank shown in FIG. 本発明の実施の形態にかかる洗浄槽の変形例を示す図であり、(A)は平面図、(B)は(A)のE−E断面の概略を示す断面図である。It is a figure which shows the modification of the washing tank concerning embodiment of this invention, (A) is a top view, (B) is sectional drawing which shows the outline of the EE cross section of (A). 本発明の実施の形態にかかる洗浄槽の他の変形例を示す図であり、(A)は平面図、(B)は(A)のF−F断面の概略を示す断面図である。It is a figure which shows the other modification of the washing tank concerning embodiment of this invention, (A) is a top view, (B) is sectional drawing which shows the outline of the FF cross section of (A).

符号の説明Explanation of symbols

1 洗浄装置
2 ワーク(被洗浄物)
3 洗浄槽
9 循環経路
17 仕上洗浄槽
18 粗洗浄槽
19 オーバーフロー槽
60、80 中間洗浄槽
1 Cleaning device 2 Workpiece (object to be cleaned)
3 Washing tank 9 Circulation route 17 Finish washing tank 18 Coarse washing tank 19 Overflow tank 60, 80 Intermediate washing tank

Claims (7)

被洗浄物を洗浄するための洗浄液が供給されるとともに前記被洗浄物の仕上洗浄を行うための仕上洗浄槽と、前記仕上洗浄槽から溢れ出す前記洗浄液が流れ込むとともに前記被洗浄物の粗洗浄を行うための粗洗浄槽と、前記粗洗浄槽から溢れ出す前記洗浄液が流れ込むオーバーフロー槽とを備え、
前記仕上洗浄槽は、箱状に形成されるとともに、前記洗浄液が全周方向へ溢れ出すように構成され、
前記粗洗浄槽は、略直方体または略立方体の箱状に形成されるとともに、前記洗浄液が1方向へ溢れ出すように構成されていることを特徴とする洗浄槽。
A cleaning liquid for cleaning the object to be cleaned is supplied and a finishing cleaning tank for performing the final cleaning of the object to be cleaned, and the cleaning liquid overflowing from the finishing cleaning tank flows in and rough cleaning of the object to be cleaned is performed. A rough cleaning tank for performing, and an overflow tank into which the cleaning liquid overflowing from the rough cleaning tank flows,
The finishing cleaning tank is formed in a box shape, and is configured so that the cleaning liquid overflows in the entire circumferential direction.
The rough washing tank is formed in a substantially rectangular parallelepiped or substantially cubic box shape, and is configured so that the washing liquid overflows in one direction.
前記粗洗浄槽の内部に前記仕上洗浄槽が配置されていることを特徴とする請求項1記載の洗浄槽。   The cleaning tank according to claim 1, wherein the finishing cleaning tank is disposed inside the rough cleaning tank. 略直方体または略立方体の箱状に形成されるとともに、前記仕上洗浄槽から溢れ出す前記洗浄液が流れ込み、前記粗洗浄槽に向かって前記洗浄液が溢れ出す中間洗浄槽をさらに備えることを特徴とする請求項1または2記載の洗浄槽。   An intermediate cleaning tank is formed, which is formed in a substantially rectangular parallelepiped or substantially cubic box shape, and further includes an intermediate cleaning tank in which the cleaning liquid overflowing from the finish cleaning tank flows and the cleaning liquid overflows toward the rough cleaning tank. Item 3. A cleaning tank according to item 1 or 2. 前記粗洗浄槽の内部に前記中間洗浄槽が配置され、前記中間洗浄槽の内部に前記仕上洗浄槽が配置されていることを特徴とする請求項3記載の洗浄槽。   The cleaning tank according to claim 3, wherein the intermediate cleaning tank is disposed inside the rough cleaning tank, and the finish cleaning tank is disposed inside the intermediate cleaning tank. 被洗浄物を洗浄するための洗浄液が供給されるとともに前記被洗浄物の仕上洗浄を行うための仕上洗浄槽と、前記仕上洗浄槽から溢れ出す前記洗浄液が流れ込むとともに前記被洗浄物の粗洗浄を行うための粗洗浄槽と、前記粗洗浄槽から溢れ出す前記洗浄液が流れ込むオーバーフロー槽とを備え、
前記仕上洗浄槽は、前記洗浄液が全周方向へ溢れ出すように構成されるとともに、前記粗洗浄槽は、前記洗浄液が所定方向のみに溢れ出すように構成されていることを特徴とする洗浄槽。
A cleaning liquid for cleaning the object to be cleaned is supplied and a finishing cleaning tank for performing the final cleaning of the object to be cleaned, and the cleaning liquid overflowing from the finishing cleaning tank flows in and rough cleaning of the object to be cleaned is performed. A rough cleaning tank for performing, and an overflow tank into which the cleaning liquid overflowing from the rough cleaning tank flows,
The finishing cleaning tank is configured so that the cleaning liquid overflows in the entire circumferential direction, and the rough cleaning tank is configured so that the cleaning liquid overflows only in a predetermined direction. .
請求項1から5いずれかに記載の洗浄槽を備え、前記粗洗浄槽で洗浄された後の前記被洗浄物を前記仕上洗浄槽で洗浄することを特徴とする洗浄装置。   A cleaning apparatus comprising the cleaning tank according to claim 1, wherein the object to be cleaned after being cleaned in the rough cleaning tank is cleaned in the finishing cleaning tank. 前記オーバーフロー槽から排出される前記洗浄液を前記仕上洗浄槽へ供給する循環経路を備えることを特徴とする請求項6記載の洗浄装置。   The cleaning apparatus according to claim 6, further comprising a circulation path for supplying the cleaning liquid discharged from the overflow tank to the finishing cleaning tank.
JP2007315016A 2007-12-05 2007-12-05 Cleaning tank/device Pending JP2009136754A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110061685A1 (en) * 2009-09-15 2011-03-17 Applied Materials, Inc. Method and apparatus for showerhead cleaning
JP2021186736A (en) * 2020-05-29 2021-12-13 義彦 星原 Cleaning device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110061685A1 (en) * 2009-09-15 2011-03-17 Applied Materials, Inc. Method and apparatus for showerhead cleaning
CN102696094A (en) * 2009-09-15 2012-09-26 量子全球技术有限公司 Method and apparatus for showerhead cleaning
US8372211B2 (en) * 2009-09-15 2013-02-12 Quantum Global Technologies, Llc Method and apparatus for showerhead cleaning
US8714166B2 (en) * 2009-09-15 2014-05-06 Quantum Global Technologies, Llc Method and apparatus for showerhead cleaning
JP2021186736A (en) * 2020-05-29 2021-12-13 義彦 星原 Cleaning device
JP7170336B2 (en) 2020-05-29 2022-11-14 義彦 星原 cleaning equipment

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