JP2009117496A5 - - Google Patents

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Publication number
JP2009117496A5
JP2009117496A5 JP2007286840A JP2007286840A JP2009117496A5 JP 2009117496 A5 JP2009117496 A5 JP 2009117496A5 JP 2007286840 A JP2007286840 A JP 2007286840A JP 2007286840 A JP2007286840 A JP 2007286840A JP 2009117496 A5 JP2009117496 A5 JP 2009117496A5
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JP
Japan
Prior art keywords
conductor wiring
mounting structure
manufacturing
protruding electrode
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007286840A
Other languages
Japanese (ja)
Other versions
JP2009117496A (en
JP4979542B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2007286840A priority Critical patent/JP4979542B2/en
Priority claimed from JP2007286840A external-priority patent/JP4979542B2/en
Publication of JP2009117496A publication Critical patent/JP2009117496A/en
Publication of JP2009117496A5 publication Critical patent/JP2009117496A5/ja
Application granted granted Critical
Publication of JP4979542B2 publication Critical patent/JP4979542B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (14)

基材に設けた導体配線に電子部品の突起電極を埋没させて電気接続するとともに、前記導体配線は、前記突起電極の少なくとも周辺部が100nm以下の金属微粒子から形成された多孔質体である
実装構造体。
A conductive wiring provided on a base material is electrically connected by burying a protruding electrode of an electronic component, and the conductive wiring is a porous body in which at least a peripheral portion of the protruding electrode is formed of metal fine particles of 100 nm or less <<br/> Mounting structure.
前記突起電極は前記基材と接触している
請求項1記載の実装構造体。
The mounting structure according to claim 1, wherein the protruding electrode is in contact with the base material.
前記導体配線は、前記突起電極との接合部のみ前記導体配線に凸部を有している
請求項1または請求項2記載の実装構造体。
The mounting structure according to claim 1, wherein the conductor wiring has a convex portion on the conductor wiring only at a joint portion with the protruding electrode.
基材に設けた第1導体配線の上に第2導体配線を設け、
第2導体配線に電子部品の突起電極を埋没させて電気接続するとともに、
第2導体配線は多孔質である
実装構造体。
A second conductor wiring is provided on the first conductor wiring provided on the substrate,
The second conductor wiring is electrically connected by burying the protruding electrode of the electronic component,
A mounting structure in which the second conductor wiring is porous.
第2導体配線を、第1導体配線の前記突起電極との接合部のみに設けた
請求項4記載の実装構造体。
The mounting structure according to claim 4, wherein the second conductor wiring is provided only at a joint portion between the first conductor wiring and the protruding electrode.
基材に設けた導体配線に電子部品を実装するに際し、
前記基材に形成した凹部に100nm以下の粒径の金属粒子を含有したペースト材料を前記凹部の高さよりも低く充填して前記導体配線部を形成し、
前記導体配線部の材料が前記凹部から溢れ出ないように前記導電配線部に前記電子部品の突起電極を挿入し、
熱または光のエネルギーにより前記導体配部を硬化させる
実装構造体の製造方法。
When mounting electronic components on the conductor wiring provided on the substrate,
Filling the recess formed in the base material with a paste material containing metal particles having a particle size of 100 nm or less lower than the height of the recess to form the conductor wiring portion,
Insert the protruding electrode of the electronic component into the conductive wiring portion so that the material of the conductive wiring portion does not overflow from the recess,
A method for manufacturing a mounting structure, wherein the conductor arrangement portion is cured by heat or light energy.
前記突起電極が前記基材に接触した状態になるよう前記導電配線部に前記突起電極を挿入する
請求項6記載の実装構造体の製造方法。
The protruding electrode is inserted into the conductive wiring portion so that the protruding electrode is in contact with the substrate.
The manufacturing method of the mounting structure of Claim 6 .
基材に設けた導体配線に電子部品を実装するに際し、
前記基材に形成した凹部にこの凹部の高さよりも低く第1の導体配線部を形成し、
第1の導体配線部の少なくとも一部に100nm以下の粒径の金属粒子を含有したペースト材料を前記凹部から溢れ出ないように塗布して第2の導体配線部を形成し、
第2の導体配線部の材料が前記凹部から溢れ出ないように第2の導体配線部に前記電子部品の突起電極を挿入した後に第2の導体配線部を硬化する
実装構造体の製造方法。
When mounting electronic components on the conductor wiring provided on the substrate,
Forming a first conductor wiring portion lower than the height of the recess in the recess formed in the substrate;
A paste material containing metal particles having a particle size of 100 nm or less is applied to at least a part of the first conductor wiring portion so as not to overflow from the concave portion, thereby forming a second conductor wiring portion,
The manufacturing method of the mounting structure which hardens a 2nd conductor wiring part, after inserting the projection electrode of the said electronic component in a 2nd conductor wiring part so that the material of a 2nd conductor wiring part may not overflow from the said recessed part.
100nm以下の粒径の金属粒子を含有したペースト材料により第1の導体配線部を形成し、第2の導体配線部の材料を塗布する前に第1の導体配線部を硬化させる
請求項8に記載の実装構造体の製造方法。
The first conductor wiring portion is formed of a paste material containing metal particles having a particle size of 100 nm or less, and the first conductor wiring portion is cured before applying the material of the second conductor wiring portion.
The manufacturing method of the mounting structure of Claim 8 .
第2の導体配線部の材料を塗布する前に、第2の導体配線部の領域を開口させたレジスト膜を形成する
請求項7または請求項9に記載の実装構造体の製造方法。
Before applying the material for the second conductor wiring portion, a resist film having an opening in the region of the second conductor wiring portion is formed.
The manufacturing method of the mounting structure of Claim 7 or Claim 9 .
前記凹部をレジスト膜により形成する
請求項6〜請求項10の何れか記載の実装構造体の製造方法。
The recess is formed from a resist film.
The manufacturing method of the mounting structure in any one of Claims 6-10 .
電子部品の実装後に前記レジスト膜を除去する
請求項11に記載の実装構造体の製造方法。
Remove the resist film after mounting electronic components
The manufacturing method of the mounting structure of Claim 11 .
前記金属ナノペースト材料中に1μm以上のサイズの金属粒子を含有たものを使用する請求項6〜請求項11の何れかに記載の実装構造体の製造方法。 The manufacturing method of the mounting structure in any one of Claims 6-11 using what contains the metal particle of a 1 micrometer or more size in the said metal nano paste material. 導体配線における他の部品との接続部に追加導体配線部を形成する工程を付加する
請求項6〜請求項11の何れかに記載の実装構造体の製造方法。
Add a process to form additional conductor wiring at the connection with other parts in conductor wiring
The manufacturing method of the mounting structure in any one of Claims 6-11 .
JP2007286840A 2007-11-05 2007-11-05 Mounting structure and manufacturing method thereof Expired - Fee Related JP4979542B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007286840A JP4979542B2 (en) 2007-11-05 2007-11-05 Mounting structure and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007286840A JP4979542B2 (en) 2007-11-05 2007-11-05 Mounting structure and manufacturing method thereof

Publications (3)

Publication Number Publication Date
JP2009117496A JP2009117496A (en) 2009-05-28
JP2009117496A5 true JP2009117496A5 (en) 2010-09-24
JP4979542B2 JP4979542B2 (en) 2012-07-18

Family

ID=40784316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007286840A Expired - Fee Related JP4979542B2 (en) 2007-11-05 2007-11-05 Mounting structure and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP4979542B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6076114B2 (en) * 2013-02-08 2017-02-08 オリンパス株式会社 Semiconductor device, solid-state imaging device, and manufacturing method of semiconductor device
JP2018197830A (en) * 2017-05-25 2018-12-13 スタンレー電気株式会社 Transparent panel having light emitting function
JP7223946B2 (en) * 2019-03-15 2023-02-17 パナソニックIpマネジメント株式会社 Electronic device and its manufacturing method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5234049U (en) * 1975-09-01 1977-03-10
JPS5714470U (en) * 1980-06-30 1982-01-25
JPH06209151A (en) * 1993-01-12 1994-07-26 Sumitomo Bakelite Co Ltd Manufacture of printed-wiring board
JP2001203229A (en) * 2000-01-18 2001-07-27 Seiko Epson Corp Semiconductor device and manufacturing method thereof, and circuit substrate and electronic apparatus
EP1223612A4 (en) * 2000-05-12 2005-06-29 Matsushita Electric Ind Co Ltd Semiconductor device mounting circuit board, method of producing the same, and method of producing mounting structure using the same
JP2005051204A (en) * 2003-07-16 2005-02-24 Matsushita Electric Ind Co Ltd Module for mounting electrical component and method for manufacturing the same
WO2006033402A1 (en) * 2004-09-24 2006-03-30 Nihon University Method for manufacturing ceramic electronic component
JP4510649B2 (en) * 2005-01-20 2010-07-28 パナソニック株式会社 WIRING BOARD, MULTILAYER BOARD AND ELECTRONIC COMPONENT MOUNTING METHOD

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