JP2009117416A5 - - Google Patents
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- Publication number
- JP2009117416A5 JP2009117416A5 JP2007285378A JP2007285378A JP2009117416A5 JP 2009117416 A5 JP2009117416 A5 JP 2009117416A5 JP 2007285378 A JP2007285378 A JP 2007285378A JP 2007285378 A JP2007285378 A JP 2007285378A JP 2009117416 A5 JP2009117416 A5 JP 2009117416A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- protective insulating
- electric element
- element device
- electric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims 15
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007285378A JP5262069B2 (ja) | 2007-11-01 | 2007-11-01 | 電気素子デバイス及び電気素子デバイスの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007285378A JP5262069B2 (ja) | 2007-11-01 | 2007-11-01 | 電気素子デバイス及び電気素子デバイスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009117416A JP2009117416A (ja) | 2009-05-28 |
| JP2009117416A5 true JP2009117416A5 (enExample) | 2010-11-04 |
| JP5262069B2 JP5262069B2 (ja) | 2013-08-14 |
Family
ID=40784257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007285378A Expired - Fee Related JP5262069B2 (ja) | 2007-11-01 | 2007-11-01 | 電気素子デバイス及び電気素子デバイスの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5262069B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011048925A1 (en) * | 2009-10-21 | 2011-04-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| US9252279B2 (en) * | 2011-08-31 | 2016-02-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| CN110660816B (zh) * | 2018-06-29 | 2022-06-10 | 京东方科技集团股份有限公司 | 一种平板探测器 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62130560A (ja) * | 1985-12-03 | 1987-06-12 | Fujitsu Ltd | 密着型イメ−ジセンサの構造 |
| JPH0745806A (ja) * | 1993-08-03 | 1995-02-14 | Matsushita Electron Corp | 固体撮像装置およびその製造方法 |
| JP3430759B2 (ja) * | 1995-11-24 | 2003-07-28 | ソニー株式会社 | 固体撮像装置の製造方法及び固体撮像装置 |
| JP3587131B2 (ja) * | 2000-05-24 | 2004-11-10 | カシオ計算機株式会社 | フォトセンサアレイおよびその製造方法 |
| JP2004200490A (ja) * | 2002-12-19 | 2004-07-15 | Casio Comput Co Ltd | 撮像装置及びその駆動方法 |
| JP4974500B2 (ja) * | 2004-09-15 | 2012-07-11 | 株式会社半導体エネルギー研究所 | 半導体装置、モジュール及び電子機器 |
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2007
- 2007-11-01 JP JP2007285378A patent/JP5262069B2/ja not_active Expired - Fee Related