JP2009115646A - Evaluation method, evaluation device, and manufacturing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an evaluation device capable of evaluating a property of an uppermost surface. <P>SOLUTION: This evaluation device includes a light emitting part 10 for emitting a prescribed light at a prescribed angle toward a laminated base material S formed with a thin film F having an anisotropic dielectric constance or polarizability on a surface of a base material M, a photodetecting part 20 for detecting the light transmitted through the laminated base material S, and an evaluation part 30 for evaluating a surface state in a thin film F side of the base material M, using light intensity information of the light detected by the photodetecting part 20. The thin film F interacts with a molecule constituting the surface state in a thin film F side of the base material M or an atomic group constituting one part of the molecule, in the laminated base material S, to express an optical action in response to the surface state in the thin film F side of the base material M, and information reflected with the surface state in the thin film F side of the base material M is included thereby in the light intensity information of the light receiving the optical action expressed by the thin film F. The property of the uppermost surface of the base material M is evaluated by this manner, based on the light intensity information containing the information reflected with the surface state in the thin film F side of the base material M. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an evaluation method and an evaluation apparatus for evaluating the properties of the outermost surface of a base material, and a manufacturing apparatus including an evaluation unit thereof.

  By rubbing the substrate surface and bringing the liquid crystal into contact with the rubbed substrate surface, the alignment of the liquid crystal can be controlled. However, since it is not easy to stabilize the alignment constraint action on the liquid crystal by rubbing with good reproducibility, the optical anisotropy of the substrate formed by rubbing is measured, and the alignment constraint action on the liquid crystal is determined from the measured value. For example, Patent Document 1 proposes an apparatus for manufacturing a liquid crystal element while evaluating whether or not the performance of the period is satisfied.

  FIG. 9 shows a schematic configuration of a manufacturing apparatus 100 having the same configuration as the manufacturing apparatus described in Patent Document 1. The manufacturing apparatus 100 measures and evaluates the base material feeding device 110 that feeds the base material M, the rubbing device 120 that performs rubbing on one surface of the base material M, and the optical characteristics (retardation) of the base material M. An evaluation device 130, a coating device 140 that applies liquid crystal onto the surface of the base material M after rubbing, and a control device 150 that controls the rubbing device 120 based on the evaluation result of the evaluation device 130 are provided. The evaluation device 130 includes a light emitting unit 131 and a light detecting unit 132 that are disposed to face each other with the base material M before rubbing therebetween, and a light emitting unit 133 and a light that are disposed to face each other with the base material M after rubbing interposed therebetween. A detection unit 134 and an evaluation unit 135 are included.

  In this manufacturing apparatus 100, in the evaluation apparatus 130, polarized light is emitted from the light emitting unit 131 toward the base material M before rubbing, and the light that has passed through the base material M is detected by the light detection unit 132. The output 132 is input to the evaluation unit 135. Further, in the evaluation device 130, polarized light is emitted from the light emitting unit 133 toward the base material M after rubbing, the light that has passed through the base material M is detected by the light detecting unit 134, and the output of the light detecting unit 134 is output. Input to the evaluation unit 135. Subsequently, in the evaluation unit 135, the size of the retardation of the base material M introduced by rubbing is derived based on the output from the light detection unit 132 and the output from the light detection unit 134, and according to the size. Then, a control signal for controlling the operating condition of the rubbing device 120 is generated in the control device 150, and the control signal is output to the rubbing device 120. Thereafter, in the rubbing apparatus 120, rubbing is performed under an operation condition according to a control signal from the evaluation unit 135. Thus, in this manufacturing apparatus 100, feedback control is applied to the rubbing apparatus 120 based on the optical characteristics before and after the rubbing, and the operating conditions of the rubbing apparatus 120 are set so that the alignment constraint action on the liquid crystal satisfies the expected performance. Fine adjustment.

Japanese Patent No. 2988146

  By the way, the alignment restraint on the liquid crystal by rubbing is an action expressed by the outermost surface of the rubbed substrate. On the other hand, the optical anisotropy of the substrate is not necessarily determined only by the properties of the outermost surface. Actually, when the surface of the polyimide thin film provided on the glass substrate is rubbed in one direction and an alignment action on the liquid crystal is introduced, the optical anisotropy of the polyimide film has a depth of about 10 nm to 20 nm from the surface. It has been reported that this happens. In addition, when this rubbed surface is touched, the alignment action is impaired, but even in such a case, the optical anisotropy may not be changed. From these facts, the extremely shallow region of the 10 nm depth inside and outside of the polyimide layer introduced with anisotropy bears the alignment action, and the measurement of optical anisotropy shows the properties of the outermost surface such as the alignment action. There is a problem that it is insufficient as a method of detecting and evaluating.

  The present invention has been made in view of such problems, and an object of the present invention is to provide an evaluation method and an evaluation apparatus capable of evaluating the properties of the outermost surface, and a manufacturing apparatus including the evaluation apparatus. .

The evaluation method of the present invention includes the following steps (A1) to (A3).
(A1) Attachment step for attaching a predetermined molecular group on the surface of the sample (A2) Predetermined light is emitted at a predetermined angle toward the adhesion region of the molecular group, and the light passing through the attachment region is reflected by the attachment region Detection process for detecting the scattered light or the light scattered in the attached region (A3) Evaluation process for evaluating the surface state of the sample using the light intensity information of the light detected in the detection process

The evaluation apparatus of the present invention has the following configurations (B1) to (B4).
(B1) Attachment device for attaching a predetermined molecular group on the surface of the sample (B2) Light emitting part (B3) for emitting predetermined light toward the attachment region of the molecular group at a predetermined angle Light passing through the attachment region , A light detection unit for detecting light reflected by the adhesion region or light scattered by the adhesion region (B4) Evaluation unit for evaluating the surface state of the sample using light intensity information of the light detected by the light detection unit

  In the evaluation method and the evaluation apparatus of the present invention, a predetermined molecular group is attached on the surface of the sample to be evaluated, and the optical response of the composite system of the sample and the molecular group is measured. For example, when a molecule group M that selectively adsorbs to a specific chemical species X and a molecule group M that exhibits fluorescence at a characteristic wavelength is attached to the sample surface, the molecule group M adsorbed on the sample surface emits light. The optical response of the fluorescence intensity (scattered light intensity) is measured. Here, since the fluorescence intensity is proportional to the amount of adsorption of the molecular group M on the sample surface, the amount of the chemical species X on the sample surface can be evaluated by measuring the fluorescence intensity. Further, when the molecular group N that takes a specific orientation with respect to the direction of the chemical species Y when attached to the specific chemical species Y is attached on the sample surface, the molecular group N attached on the sample surface The optical response of transmitted light intensity, reflected light intensity or scattered light intensity is measured. Here, since the transmitted light intensity, reflected light intensity, and scattered light intensity change according to the orientation of the molecular group N attached on the sample surface, the sample is measured by measuring the transmitted light intensity, reflected light intensity, or scattered light intensity. It becomes possible to evaluate the direction of the chemical species Y on the surface.

The manufacturing apparatus of this invention is an apparatus which manufactures the optical element using a base material, Comprising: Each structure of the following (C1)-(C5) is provided.
(C1) Attachment device for attaching a predetermined molecular group on the surface of the substrate (C2) Light passing through the light emitting part (C3) attachment region for emitting predetermined light at a predetermined angle toward the attachment region of the molecular group Light detection unit (C4) for detecting light, light reflected by the adhesion region, or light scattered by the adhesion region (C4) Surface state on the molecular group side of the substrate using light intensity information detected by the light detection unit Control unit for deriving control parameters based on the evaluation result by the evaluation unit (C5) evaluation unit

  In the manufacturing apparatus of the present invention, when manufacturing an optical element using a base material, a predetermined molecular group is attached on the surface of the base material to be evaluated, and the optical response of the base material and the composite system of the molecular group is measured. Is done. For example, when a molecule group M that selectively adsorbs to a specific chemical species X and a molecule group M that exhibits fluorescence at a characteristic wavelength is attached to the substrate surface, the molecule group M adsorbed on the substrate surface. The optical response of the fluorescence intensity (scattered light intensity) emitted from is measured. Here, since the fluorescence intensity is proportional to the amount of adsorption of the molecular group M on the substrate surface, the amount of the chemical species X on the substrate surface can be evaluated by measuring the fluorescence intensity. In addition, when a molecular group N that takes a specific orientation relative to the direction of the chemical species Y when attached to the specific chemical species Y is attached on the substrate surface, the molecular groups attached on the substrate surface The optical response of N transmitted light intensity, reflected light intensity or scattered light intensity is measured. Here, the transmitted light intensity, the reflected light intensity, and the scattered light intensity change according to the orientation of the molecular group N attached on the surface of the substrate, so that by measuring the transmitted light intensity, reflected light intensity, or scattered light intensity, It becomes possible to evaluate the direction of the chemical species Y on the substrate surface.

  According to the evaluation method and the evaluation apparatus of the present invention, the predetermined molecular group is attached on the sample surface, and the optical response of the composite system of the sample and the molecular group is measured. Light intensity information including information reflecting the state can be obtained. Thereby, the property of the outermost surface of a sample can be evaluated.

  According to the manufacturing apparatus of the present invention, when manufacturing an optical element using a base material, a predetermined molecular group is attached on the surface of the base material to be evaluated, and the optical response of the composite system of the base material and the molecular group Therefore, it is possible to obtain light intensity information including information reflecting the surface state of the substrate on the molecular group side. As a result, the properties of the outermost surface of the base material can be evaluated, and therefore, using the control parameters derived based on the evaluation results, for example, the optical characteristics of the optical element manufactured thereafter can be determined from the expected performance. It is possible to appropriately adjust the manufacturing conditions so as not to deviate.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 shows a schematic configuration of an evaluation apparatus 1 according to an embodiment of the present invention. The evaluation apparatus 1 includes a light emitting unit 10 that emits predetermined light toward a measurement target, a light detection unit 20 that detects light that has passed through the measurement target from among the light emitted from the light emission unit 10, and an evaluation. The unit 30 is provided. In the evaluation apparatus 1, the measurement target is inserted between the light emitting unit 10 and the light detecting unit 20.

  FIG. 1 illustrates the case where the laminated substrate S in which the thin film F is formed on the surface of the base material M is arranged with the thin film F facing the light source 11 side. In the present embodiment, the substrate M corresponds to a specific example of the “sample” of the present invention, and the thin film F corresponds to a specific example of the “molecular group” of the present invention configured in a film shape. The laminated substrate S corresponds to a specific example of the “surface-attached sample” of the present invention.

  The light emitting unit 10 includes a light source 11, a polarizer 12, a Faraday modulator 13, and a λ / 4 wavelength plate 14 arranged in this order on the optical path of light emitted from the light source 11, and is directed toward a measurement target. Thus, the polarized light having a predetermined polarization characteristic is emitted at a predetermined angle (for example, at an incident angle of 0 degree). The light detection unit 20 includes an analyzer 21 and a light detector 22 arranged in this order on the optical path of light that has passed through the measurement target.

  In addition, between the light source 11 and the polarizer 12, between the polarizer 12 and the Faraday modulator 13, between the Faraday modulator 13 and the λ / 4 wavelength plate 14, and the λ / 4 wavelength plate 14 and the measurement target. Optical components such as lenses may be inserted between the measurement target and the analyzer 21 and between the analyzer 21 and the photodetector 22.

  Here, the light source 11 is a surface light source configured to include a light emitting element that emits non-polarized light, such as a halogen lamp or a xenon lamp, and a lens that collimates light from the light emitting element.

  The polarizer 12 is made of, for example, a photonic crystal in which materials having different refractive indexes are periodically overlapped, and has an optical axis in one direction in the light incident side surface of the polarizer 12. It functions as a polarization separation element that transmits a linearly polarized light component having a photoelectric field that vibrates in a direction parallel to the optical axis and blocks the linearly polarized light that vibrates in a direction orthogonal to the optical axis.

  The Faraday modulator 13 includes, for example, a glass material such as quartz glass or borosilicate glass, and a coil that can apply a magnetic field to the glass material in a direction parallel to the optical axis AX of the light source 11. It has the function of rotating the polarization plane of linearly polarized light that has passed through the polarizer 12 by applying a magnetic field.

  The λ / 4 wavelength plate 14 is made of, for example, a photonic crystal having a structure similar to that of the polarizer 12, is perpendicular to the incident direction of light to the λ / 4 wavelength plate 14, and passes through the Faraday modulator 13. It has an optical axis (either one of the slow axis S and the fast axis F) inclined by 45 degrees with respect to the average polarization plane of light, and the linearly polarized light that has passed through the Faraday modulator 13 is converted into circularly polarized light. Function as a phase difference plate. That is, the λ / 4 wavelength plate 14 forms a circularly polarizing plate together with the polarizer 12 and the Faraday modulator 13.

  The analyzer 21 is made of, for example, a photonic crystal having the same structure as that of the polarizer 12, has an optical axis in a direction perpendicular to the incident direction of light to the analyzer 21, and passes through the measurement target. On the other hand, it functions as a polarization separation element that transmits linearly polarized light that vibrates in a direction parallel to the optical axis and blocks linearly polarized light that vibrates in a direction crossing the optical axis. Here, the optical axis of the analyzer 21 may face any direction in the plane, but, for example, faces the direction orthogonal to the optical axis of the polarizer 12.

  The photodetector 22 is composed of, for example, a semiconductor photodetector, and converts light into a current signal. This current signal includes light intensity information of the light detected by the photodetector 22, and passes through a current-voltage conversion circuit, a signal amplification circuit, a filter circuit, an AD (Analog-Digital) conversion circuit, and the like (not shown) and the evaluation unit 30. Is output.

  The evaluation unit 30 measures the retardation (birefringence phase difference) of the measurement target using the light intensity information of the light detected by the photodetector 22. And this evaluation part 30 evaluates the orientation state of the surface by the side of the thin film F of the base material M, for example by contrasting the magnitude | size of the retardation of the laminated substrate S with a predetermined reference value.

  For example, when the retardation of the composite system of the base material M and the thin film F obtained by measurement (hereinafter simply referred to as “retardation of the laminated substrate S”) is equal to or larger than a predetermined reference value, The orientation state of the surface of the base material M on the thin film F side is good, and it is determined that the orientation restraining action of the base material M on the liquid crystal satisfies the desired performance. Moreover, when the retardation of the laminated substrate S is smaller than a predetermined reference value, the alignment state of the surface of the base material M on the thin film F side is not so good, and the alignment restraining action on the liquid crystal of the base material M is the expected performance. It is determined that there is a possibility that it may not be satisfied. And the control parameter according to the determination result is produced | generated.

  Moreover, this evaluation part 30 can also derive | lead-out the difference of both, when each of two types of retardation of to-be-measured object is measured. For example, when the retardation of the multilayer substrate S shown in FIG. 1 and the retardation of the base material M shown in FIG. 2 is measured, the value obtained by subtracting the retardation of the base material M from the retardation of the multilayer substrate S (hereinafter, simply “ When the difference is equal to or close to a predetermined reference value, the alignment state of the surface of the base material M on the thin film F side is good, and the liquid crystal of the base material M is obtained. It is determined that the orientation restraining action on the film satisfies the desired performance. Further, when the difference is significantly smaller than a predetermined reference value, the alignment state of the surface of the base material M on the thin film F side is not so good, and the orientation restraining action of the base material M on the liquid crystal may not satisfy the desired performance. Judge that there is sex. And the control parameter according to the determination result and the magnitude | size of a difference is produced | generated.

  By the way, the thin film F is formed by depositing a large number of molecular aggregates (molecular groups) having anisotropy of dielectric constant or polarizability, for example. In the case of evaluating the anisotropy of the surface of the base material M using a material having anisotropy of dielectric constant or polarizability, there is no lower limit in principle in the thickness of the thin film F, and there is no noise factor and sensitivity. In the case of increasing the thickness, the thickness of the thin film F can be less than the monomolecular layer.

  Hereinafter, the thickness of the thin film F in the case of using ellipsometry having a transmission arrangement that is relatively less affected by multiple interference of light and has high reliability for anisotropy measurement will be described.

  Considering that the lower detection limit of the phase difference that is relatively easy to realize is a retardation value of about 0.002 nm, the product (d × Δn) of the thickness d of the thin film F and the birefringence Δn is 0.002 nm. It should be several times larger. In order to enable evaluation with as little deposition as possible, it is desirable to use a material having a large birefringence Δn as the material of the thin film F. An example of a material that can be deposited at a temperature at which the substrate M is not damaged and has a large birefringence Δn is liquid crystal. In 5CB (pentyl, cyano, biphenyl), which is one of the liquid crystals often used for experiments, the birefringence Δn is about 0.3. Therefore, in order to satisfy d × Δn> 0.002, the thickness is required. d needs to be larger than 0.002 / 0.3 = 0.666 nm. Therefore, it can be evaluated if the thickness is at a monomolecular layer level of 0.1 nm.

  In the case where liquid crystal is used as the material of the thin film F, the first molecular layer in contact with the interface with the substrate M in the thin film F generally has many alignment defects, and the liquid crystal molecules become defective with each other as they move away from the interface. As a result, the average refractive index anisotropy value of the thin film F is usually increased. In order to measure a large phase difference by utilizing such a defect repairing action, it is preferable that the thickness of the thin film F is made somewhat thicker than that of the monomolecular layer. However, the effect of improving the alignment of the liquid crystal molecules by increasing the thickness of the thin film F is remarkable in the range of about 50 nm from the interface, and the alignment of the liquid crystal molecules is completed at a thickness of about 100 nm. There is no benefit in increasing the thickness beyond 100 nm.

  In addition, when the thin film F is deposited to a thickness exceeding 100 nm, it is not easy to maintain and manage the entire thickness of the thin film F, and the thin film F can be removed from a desired region to its periphery. There is a possibility that the base material M may be contaminated by spreading to a portion other than the desired region. Therefore, also from such a viewpoint, it is preferable to reduce the thickness of the thin film F to 100 nm or less.

  Further, in the manufacturing process, there is a case where a post-process for supplying liquid crystal onto the surface of the thin film F is refrained. In such a case, the liquid crystal is supplied in a post-process rather than using 5CB as a material for the thin film F. The use of the same liquid crystal is superior in that it can avoid the mixing of different liquid crystals. Some practical liquid crystal materials do not have a birefringence Δn that is as large as 5 CB. In this case, it is desirable that the thickness of the thin film F be evaluated to be thicker than when 5 CB is used. .

  The base material M includes a transparent substrate and an orientation control thin film (not shown) formed on the surface of the transparent substrate on the thin film F side. The transparent substrate is made of, for example, a glass substrate. The orientation control thin film is made of, for example, polyimide. At least on the surface of the orientation control thin film opposite to the transparent substrate and in the vicinity thereof, anisotropy (in-plane difference) Direction).

  Here, the in-plane anisotropy means that at least the surface of the orientation control thin film opposite to the transparent substrate and the molecule constituting the molecule or a part of the molecule are in the plane of the orientation control thin film. The in-plane anisotropy can be expressed by, for example, rubbing, ultraviolet irradiation, oblique ion beam irradiation or stretching.

  Further, when a layer containing molecules having anisotropy of dielectric constant or polarizability is brought into contact with the surface having in-plane anisotropy in the orientation control thin film, the layer is included in the orientation control thin film. It interacts with the molecules constituting the outermost surface on the opposite side of the transparent substrate or the atomic group constituting a part of the molecule, and the state of the outermost surface of the orientation control thin film opposite to the transparent substrate (specifically, And an optical action corresponding to the orientation state of the molecule or the atomic group constituting a part of the molecule that has interacted with the material having anisotropy of dielectric constant or polarizability.

  That is, between the retardation of the laminated substrate S in which the thin film F is brought into contact with the surface of the base material M on the orientation control thin film side and the orientation state of the outermost surface of the base material M on the thin film F side (outermost surface of the orientation control thin film). Has a strong correlation, and when the orientation state of the outermost surface of the base material M on the thin film F side is good, the retardation of the laminated substrate S is significantly larger than the retardation of the base material M alone (that is, The retardation of the substrate M is amplified by the thin film F). Therefore, it is possible to accurately estimate the orientation state of the outermost surface of the base material M on the thin film F side from the size of the retardation of the multilayer substrate S. Therefore, using the retardation of the laminated substrate S obtained when the alignment state of the outermost surface of the base material M on the thin film F side is good as a reference value, the reference value is compared with the measured retardation of the laminated substrate S ( For example, it is possible to determine the quality of the alignment state of the outermost surface of the base material M by determining the magnitude relationship between the reference value and the measured retardation of the laminated substrate S).

  Further, from the retardation of the laminated substrate S obtained when the outermost surface orientation state of the base material M on the thin film F side is good, the base obtained when the outermost surface orientation state of the orientation control thin film in the base material M is good. By reducing the retardation of the material M alone, the influence of the in-plane anisotropy of the portion other than the outermost surface in the orientation control thin film of the base material M can be almost eliminated. Therefore, from the retardation of the laminated substrate S obtained when the alignment state of the outermost surface on the thin film F side of the substrate M is good, the group obtained when the alignment state of the outermost surface of the alignment control thin film in the substrate M is good. Using the value (difference) obtained by subtracting the retardation of the material M alone as a reference value, the reference value and the value (difference) obtained by subtracting the retardation of the base material M alone from the measured retardation of the laminated substrate S By comparing (for example, determining the magnitude relationship between the reference value and the value (difference) obtained by subtracting the retardation of the base material M alone from the measured retardation of the laminated substrate S), the outermost surface of the base material M It is possible to determine the quality of the orientation state.

  Using the difference in this way is particularly effective when the bulk portion of the base material M has optical anisotropy as well as the orientation control thin film provided on the surface layer of the thin film F. As such an example, a case where an A plate type retardation plate is used as the base material M can be mentioned. Even if the retardation value of the base material M having a relatively thick retardation, for example, 30 nm or more, fluctuates by only 1%, the fluctuation is 0.3 nm or more. This is not a negligible amount with respect to the contribution to the total retardation caused by the thin film F. Therefore, obtaining the retardation of the base material M not provided with the thin film F in advance and paying attention to the difference precisely knows the magnitude of the contribution of the thin film F, that is, the anisotropy of the base material M surface reflected therein. This is a very effective device in light of the purpose of this embodiment to know sex information precisely.

  From the above, the evaluation apparatus 1 according to the present embodiment measures the optical characteristics of the laminated substrate S in which the thin film F having dielectric constant or polarizability anisotropy is formed on one surface of the base material M. Therefore, light intensity information including information reflecting the surface state of the thin film side F1 of the base material M can be obtained. Thereby, the property of the outermost surface of the base material M can be evaluated.

[Modification]
In the above embodiment, the light detection unit 20 detects light that has passed through the measurement target from among the light from the emission unit 10, but for example, as shown in FIGS. The light emitted from the emitting unit 10 may be reflected or detected from the surface of the laminated substrate S on the thin film F side or the surface of the base material M on the orientation control thin film side. In particular, when the base material M is opaque, it is effective to use reflected light or scattered light. When the reflected light is detected by the light detector 22, the property of the outermost surface of the base material M can be evaluated by the thin film F, as in the case where the transmitted light is detected by the light detector 22. Further, when scattered light is detected by the photodetector 22, the transparency of the thin film F can be evaluated.

  Moreover, in the said embodiment, although the quality of the orientation control effect | action given to the orientation state of the outermost surface of the base material M or the orientation of the liquid crystal etc. which the outermost surface touches it was determined, the evaluation apparatus 1 of the said embodiment is It is possible to apply to the evaluation of various characteristics depending on the surface state of the outermost surface of the substrate M. The characteristics depending on the surface state of the outermost surface of the substrate M include, for example, water repellency, adhesiveness, gas permeability, abrasion resistance, weather resistance, moisture resistance stability, and light resistance stability. Depending on the property to be evaluated, the light emitted from the light emitting unit 10 does not need to be polarized light, and it is preferable to adjust the characteristics of the light emitted from the light emitting unit 10 as necessary.

[Example]
Table 1 shows retardation of various samples A1, A2, A3, B1, B2, B3, C1, C2, and C3 measured using the evaluation apparatus 1 of the above embodiment. In addition, the retardation corresponding to “after spin coating” in Table 1 is a retardation measured after forming a polyimide thin film using a spin coating method. The retardation corresponding to “after rubbing” is the retardation measured after rubbing the polyimide thin film on quartz glass. The retardation corresponding to “after contamination” is a retardation measured after the surface of the rubbed polyimide thin film is soiled with a finger. The retardation corresponding to “after deposition” depends on the sample, but on the surface of the polyimide thin film subjected to intentional contamination treatment after spin coating in sample C1, after rubbing in sample A1, and after rubbing in sample B1, It is the retardation measured after vapor-depositing liquid crystal (5CB: pentyl * cyano * biphenyl). The retardation corresponding to “the amount of change before and after deposition” is determined from the retardation value after “deposition” above, and the retardation value measured after the last treatment among the treatment operations for the sample preceding the deposition (that is, “ This is a value obtained by subtracting the retardation value written immediately above “after deposition”.

  Each sample in Table 1 was manufactured as follows. First, a common structure for each sample was formed. Specifically, nine pieces of square quartz glass having a thickness of 1 mm and a side of 30 mm are prepared, and after applying polyamic acid on each quartz glass using a spin coating method, the polyamic acid is applied. By firing the quartz glass, a polyimide thin film was formed on each quartz glass.

  Next, in sample A1, the polyimide thin film on the quartz glass is rubbed to give in-plane anisotropy to the surface of the polyimide thin film and the vicinity thereof, and then the liquid crystal (on the surface of the rubbed polyimide thin film ( 5CB: pentyl, cyano, biphenyl) was deposited to form a liquid crystal thin film.

  In samples A2 and A3, the polyimide thin film on the quartz glass was rubbed to give in-plane anisotropy to the surface of the polyimide thin film and the vicinity thereof, and then beads having a diameter of 3 μm were sprayed on the surface. The cells were assembled so that the rubbed surfaces of the A3 faces each other with beads interposed therebetween, and the same liquid crystal as the deposited liquid crystal was injected into the cell to form a liquid crystal layer having a thickness of 3 μm.

  In sample B1, the polyimide thin film on the quartz glass is rubbed to give in-plane anisotropy to the surface of the polyimide thin film and the vicinity thereof, and then the surface of the polyimide thin film to which in-plane anisotropy is given is touched with a finger. It was touched and stained, and liquid crystal (5CB: pentyl, cyano, biphenyl) was evaporated on the surface to form a liquid crystal thin film.

  In samples B2 and B3, the polyimide thin film on the quartz glass was rubbed, and in-plane anisotropy was imparted to the surface of the polyimide thin film and the vicinity thereof, and then the surface of the rubbed polyimide thin film was touched with a finger. After soiling, beads having a diameter of 3 μm are spread on the surface, and the cells are assembled so that the rubbed surfaces of B2 and B3 are opposed to each other with the beads interposed therebetween, and liquid crystal (5CB: pentyl) is formed in the cell. (Cyano-biphenyl) was injected to form a liquid crystal layer having a thickness of 3 μm.

  In sample C1, the polyimide thin film on the quartz glass is not rubbed (nothing is applied to the surface of the polyimide thin film), and the liquid crystal (5CB: pentyl cyano biphenyl) is formed on the surface of the polyimide thin film. ) Was deposited to form a liquid crystal thin film.

  In samples C2 and C3, the polyimide thin film on the quartz glass is not rubbed (without touching the surface of the polyimide thin film), and beads having a diameter of 3 μm are scattered on the surface. The cells were assembled so that the rubbed surfaces of C3 were opposed to each other with beads interposed therebetween, and liquid crystal (5CB: pentyl, cyano, biphenyl) was injected into the cell to form a liquid crystal layer having a thickness of 3 μm. .

  In the cells made from Samples A2 and A3, the cells were transparent, and it was possible to observe how the liquid crystals in the cells were aligned. In the cell made from Samples B2 and B3, it is possible to observe a state in which the white turbid portion and the transparent portion in the cell are mixed, and the liquid crystal in the cell is only partially aligned. did it. Moreover, in the cell made from samples C2 and C3, it was cloudy in the whole cell, and it was possible to observe a state in which the liquid crystal in the cell was not aligned at all.

  From Table 1, the retardation of each sample before rubbing is a value between 0.002 nm and 0.006 nm, which is almost the same as the retardation reading limit in the evaluation apparatus 1 of the above embodiment. all right. That is, before rubbing, each sample did not show retardation.

  In addition, from Table 1, after rubbing, samples A1, A2, A3, B1, B2, B3 showed retardation, but also after rubbing the surface of the rubbed polyimide thin film with a finger, It was found that Samples B1, B2, and B3 exhibited almost the same retardation as when the surface of the polyimide thin film was not soiled with a finger. On the other hand, when the liquid crystal was injected into the cell after rubbing the surface of the rubbed polyimide thin film with a finger, in Samples B2 and B3, only a part of the liquid crystal in the cell was aligned as described above. . From this, it was found that the quality of the surface state of the rubbed polyimide thin film could not be determined only by measuring the retardation after rubbing the surface of the rubbed polyimide thin film with a finger. . This is because the in-plane anisotropy formed on the polyimide thin film by rubbing is also formed on the deep part of the polyimide thin film that is deeper than the surface. It seems that even if touched and soiled, it was hardly affected.

  Table 1 also shows that sample A1 shows a larger retardation after liquid crystal deposition than before liquid crystal deposition, but sample B1 shows almost the same retardation as before liquid crystal deposition. Further, it was found that the retardation difference of the sample A1 was larger by one digit or more than the retardation difference of the sample B1 before and after the liquid crystal deposition. This seems to be because the deposited liquid crystal molecules were deposited by aligning the directions of the molecular axes following the in-plane anisotropy formed on the outermost surface of the polyimide thin film by rubbing. Also, since the retardation of the liquid crystal thin film deposited on the finger-stained surface is small and the orientation of the liquid crystal layer is insufficient, the deposited liquid crystal molecules are extremely sensitive to detecting the difference in the state of the outermost surface. I can say that. From this, in the evaluation apparatus 1 of the above embodiment, the retardation of the polyimide thin film subjected to the rubbing is measured by measuring the retardation after the liquid crystal deposition or by measuring the retardation difference before and after the liquid crystal deposition. It was found that it is possible to reliably determine whether the product is good or bad.

  Since the quartz glass substrate used here was selected to have a small retardation per se, the retardation value after the liquid crystal deposition showed a clear correlation with the quality of the alignment action. However, when using a substrate having a size that the retardation of the substrate itself cannot be ignored, such as a stretched plastic substrate, it is not possible to determine whether the orientation of the polyimide thin film surface is good or bad by examining the difference in retardation before and after the liquid crystal deposition. Judgment can be made.

[Application example]
Next, the case where the evaluation apparatus 1 of the said embodiment is applied to the manufacturing apparatus of the optical element provided with the base material M is demonstrated.

  FIG. 5 shows a schematic configuration of the manufacturing apparatus 3 provided with the evaluation apparatus 1 of the above embodiment. The manufacturing apparatus 3 rubs the evaluation apparatus 1, the base material feeding unit 40 that feeds out the base material M (pre-processing substrate), and one surface of the base material M fed from the base material feeding unit 40. From the rubbing part 50, a liquid crystal thin film F1 (thin film) is formed by depositing liquid crystal on the surface of the rubbed base material M (processed substrate), and the rubbed base material M and the liquid crystal thin film F1. The vapor deposition part 60 which forms the laminated substrate S which becomes this, the application part 70 which apply | coats a liquid crystal on the surface of the liquid crystal thin film F1, and forms the liquid-crystal layer F2 (optical function layer), and the control part 80 are provided.

  Here, the liquid crystal thin film F1 has a thickness of a monomolecular layer or more, preferably has a thickness of 100 nm or less, and more preferably has a thickness of 1 nm or more and 50 nm or less. preferable. If the film thickness is equal to or greater than the monomolecular layer, it is possible to deposit liquid crystals with the molecular axis aligned in accordance with the in-plane anisotropy of the rubbed substrate M, and the film thickness is 100 nm or less. If so, it is possible to deposit the liquid crystal with a small amount of liquid crystal so that the directions of the molecular axes are aligned following the in-plane anisotropy of the rubbed substrate M. If the film thickness is 1 nm or more and 50 nm or less, the film thickness can be easily controlled.

  The liquid crystal layer F2 is formed to be thicker than the liquid crystal thin film F1, and may be composed of a liquid crystal different from the liquid crystal thin film F1, but may be composed of the same liquid crystal as the liquid crystal thin film F1. When the liquid crystal layer F2 is composed of a liquid crystal different from the liquid crystal thin film F1, materials suitable for the liquid crystal thin film F1 and the liquid crystal layer F2 can be selected as appropriate, while the liquid crystal layer F2 is the same as the liquid crystal thin film F1. In the case where the liquid crystal layer F2 is composed of the liquid crystal layer F2, a material different from the liquid crystal layer F2 is not mixed between the base material M and the liquid crystal layer F2. The same optical characteristics can be obtained with certainty. Further, by measuring the retardation of the multilayer substrate S composed of the base material M and the liquid crystal thin film F1, it is possible to easily predict the alignment state of the liquid crystal layer F2 when the liquid crystal layer F2 is formed on the liquid crystal thin film F1. It becomes.

  In this manufacturing apparatus 3, the evaluation apparatus 1 includes a light emitting unit 10A (first light emitting unit) that emits predetermined light toward the rubbed substrate M, and the light emitted from the light emitting unit 10A. A light detection unit 20A (first light detection unit) that detects light that has passed through the rubbed substrate M, and a laminated substrate in which the liquid crystal thin film F1 is formed on the surface of the rubbed substrate M A light emitting portion 10B (second light emitting portion) that emits predetermined light toward S (non-exposed portion), and light that has passed through the laminated base material S (non-exposed portion) among the light from the light emitting portion 10B The light detection part 20B (1st light detection part) which detects this, and the evaluation part 30 are provided.

  The light emitting units 10A and 10B have the same configuration as the light irradiation unit 10 of the above embodiment, and the light detection units 20A and 20B have the same configuration as the light detection unit 20 of the above embodiment. I have. Further, as shown in FIG. 5, the light emitting unit 10A is directed to the rubbed substrate M before the liquid crystal is deposited on the surface of the substrate M rubbed by the vapor deposition unit 60. For example, as shown in FIGS. 6 and 7 (enlarged perspective view of a portion surrounded by a broken line in FIG. 6), the light emitting portion 10A is formed by vapor deposition. After the liquid crystal is deposited on the surface of the base material M that has been rubbed by the portion 60, the exposed portion of the laminated base material S where the liquid crystal thin film F1 is not formed (the base material M that has been rubbed is exposed). The predetermined light may be emitted toward the portion).

  In addition, the evaluation unit 30 measures the retardation of the base material M subjected to rubbing using the light intensity information of the light detected by the light detection unit 20A, and uses the light intensity information of the light detected by the light detection unit 20B. It is used to measure the retardation of the laminated substrate S. Then, the evaluation unit 30 derives a value (difference) obtained by subtracting the retardation of the base material M subjected to rubbing from the retardation of the laminated substrate S, and the difference is a predetermined reference value (for example, the thin film F1 of the base material M). The retardation of the multilayer substrate S obtained when the orientation state of the outermost surface on the side is good is subtracted from the retardation of the base material M alone obtained when the orientation state of the outermost surface of the orientation control thin film in the base material M is good. When the value is equal to or close to the obtained value (difference)), the alignment state of the surface of the rubbed substrate M is good, and the alignment restraining action on the liquid crystal of the rubbed substrate M is good. Is determined to satisfy the expected performance. When the difference is significantly smaller than a predetermined reference value, the alignment state of the surface of the rubbed substrate M is not so good, and the alignment restraining action on the liquid crystal of the rubbed substrate M is expected. It is determined that there is a possibility that the performance of the system cannot be satisfied. And the control parameter according to the determination result and the magnitude | size of a difference is produced | generated.

  For example, when it is determined that the alignment constraint action on the liquid crystal of the base material M subjected to rubbing satisfies the intended performance, for example, in-plane anisotropy to the base material M before rubbing is performed. A control parameter indicating that the application condition is not changed is generated, and the control parameter is output to the rubbing unit 50. In addition, for example, in the liquid crystal thin film F1, the formation of the liquid crystal layer F2 on the surface of the portion of the liquid crystal thin film F1 that is determined that the alignment restraining action on the liquid crystal of the rubbed substrate M satisfies the desired performance is permitted. A control parameter that means to perform is generated, and the control parameter is output to the coating unit 70.

  Further, for example, when it is determined that there is a possibility that the alignment constraint action on the liquid crystal of the base material M subjected to rubbing may not satisfy the intended performance, for example, the surface to the base material M before the rubbing is performed. A control parameter indicating change information (for example, a change condition and a change amount) of the inner anisotropy application condition is generated, and the control parameter is output to the rubbing unit 50. In addition, for example, in the liquid crystal thin film F1, the liquid crystal layer F2 on the surface of the portion of the liquid crystal thin film F1 that is determined to have a possibility that the alignment restraining action on the liquid crystal of the rubbed base material M may not satisfy the intended performance. A control parameter indicating that the formation is prohibited is generated, and the control parameter is output to the coating unit 70.

  From the above, in the manufacturing apparatus 3 according to this application example, when an optical element using the base material M is manufactured, anisotropy of dielectric constant or polarizability on one surface of the base material M subjected to rubbing Since the optical characteristic of the laminated substrate S on which the liquid crystal thin film F1 having the property is formed is measured, the light intensity information including information reflecting the surface state of the rubbed base material M on the liquid crystal thin film F1 side is included. Can be obtained. As a result, the properties of the outermost surface of the rubbed substrate M can be evaluated, so that the optical characteristics of the optical element to be manufactured thereafter can be determined using the control parameters derived based on the evaluation results. It is possible to appropriately adjust the manufacturing conditions so as not to deviate from the performance of the period.

[Modification of application example]
In the application example, the evaluation unit 30 performs rubbing using the light intensity information of light obtained from the rubbed substrate M and the light intensity information of light obtained from the laminated substrate S. The properties of the outermost surface of the base material M were evaluated. For example, the reference information instead of the light intensity information of the light obtained from the base material M subjected to rubbing and the laminated base material S were obtained. You may make it evaluate the property of the outermost surface of the base material M to which the rubbing was performed using the light intensity information of the obtained light. In this case, the light emitting unit 10A and the light detecting unit 20A provided for acquiring the light intensity information of the light obtained from the rubbed substrate M are not necessary, and as shown in FIG. It is possible to eliminate these.

  Here, as the reference information described above, light that has passed through the reference base material after being irradiated with predetermined light from the light emitting unit 10 at a predetermined angle toward the surface of the reference base material made of the same material as the base material M. It is possible to use light intensity information obtained by detecting the light reflected by the reference substrate or the light scattered by the reference substrate. Further, as the reference information described above, light that has passed through the reference base material after being irradiated with a predetermined light from the light emitting unit 10 at a predetermined angle toward the surface of the reference base material made of the same material as the base material M, It is also possible to use the retardation of the reference substrate derived using the light intensity information obtained by detecting the light reflected by the reference substrate or the light scattered by the reference substrate. In this case, since it is not necessary to derive the retardation of the reference substrate, the amount of calculation can be reduced as compared with using the reference information described above.

  As described above, the surface modification with molecules with polarizability anisotropy typified by liquid crystal molecules evaluates the orientation of the molecules that make up the outermost surface, or the orientation control or orientation restraining effect on the molecular material that it contacts. The target sample is not limited to the rubbing film as described above. It is meaningful to list here the materials which are frequently used in industry and have anisotropy on the surface in order to show the industrially particularly useful application range of the present invention. In particular, the following objects can be considered as materials considered to have anisotropy on the surface.

(1) Surface that has undergone a surface rubbing process:
As already mentioned, conventional means in manufacturing liquid crystal display elements.
(2) Stretched polymer sheet or film:
Even when the entire sheet is stretched, a liquid crystal alignment action may be obtained on the surface, and it is considered that the molecular chains on the surface are aligned in the process of stretching.
(3) Surface subjected to polarized light irradiation:
Irradiation with polarized light may cause anisotropy on the surface. When irradiated with polarized ultraviolet light on the surface of an organic substance in which molecular chains are randomly entangled, molecular chains located in the direction of efficiently absorbing polarized light are selectively cut, and as a result, the remaining molecular chains extend in one direction. More things. Such surface processing is also used as a method of forming a liquid crystal alignment film without rubbing.
(4) Surface irradiated with ion beams such as ions from an oblique direction:
Particle beams such as ions are displaced by striking atoms on the surface or stripped from the surface. In particular, in the case of incidence from an oblique direction deviating from the substrate normal line, such an action occurs with in-plane directionality, so that anisotropy is introduced into the surface. This occurs not only on the organic surface but also on the surface of a hard inorganic solid, and may cause microscopic streaking.
(5) Surface subjected to material deposition from an oblique direction:
Silicon oxide (Si-O) obliquely deposited films are used in liquid crystal display devices as alignment films that can withstand high temperatures. Surfaces formed by various thin film deposition methods such as deposition, sputtering, and ion plating are used in this way. In general, when a deposited material is incident obliquely off the normal direction of the substrate, it generally exhibits anisotropy regardless of the material. Since the material supply source (for example, sputtering target) and the substrate of the thin film forming apparatus have a finite size, the substrate is normal even if normal is directed toward the supply source at the center of the substrate and normal incidence is achieved. In the peripheral portion of the thin film, it is not always perpendicular incidence, and a slight oblique incident component which is not intended often causes unexpected anisotropy on the surface of the thin film.
(6) Crystalline surface:
For example, in a sample from which distortion is removed by cleaving a crystal such as silicon or heat treatment after polishing, periodic regular order appears on the surface, and it has anisotropy. In addition, some organic molecules that exhibit electroluminescence (EL) and have application to display elements are crystallized, and their surface properties are important as they affect the light emission efficiency and weather resistance reliability.
(7) Liquid crystal surface:
The surface of the liquid crystal layer also exhibits anisotropy. For example, an additional liquid crystal layer is stacked on the cured liquid crystal coating layer, and each of the retardation plates has different optical anisotropy (for example, the refractive index varies depending on the direction of the photoelectric field in the plane). It may be necessary to know the anisotropy of the surface of the undercoat layer when manufacturing optical functional films that combine A-plates and C-plates with different refractive indices depending on the in-plane and normal direction. .

  As described above, the present invention has been described with the embodiment, the modification, the example, and the application example. However, since the present invention is an analysis method in the first place, the application target of the present invention is adjusted and prepared by a specific method. It is needless to say that the sample is not limited to the sample and an unknown sample is included for the purpose of obtaining information and knowledge about the surface of the sample.

It is a schematic block diagram when a laminated substrate is inserted in the evaluation apparatus which concerns on one embodiment of this invention as a to-be-measured object. It is a schematic block diagram when a base material is inserted as an object to be measured in the evaluation apparatus according to an embodiment of the present invention. It is a schematic block diagram showing the modification of the evaluation apparatus of FIG. It is a schematic block diagram showing the modification of the evaluation apparatus of FIG. It is a schematic block diagram of the manufacturing apparatus to which the evaluation apparatus of FIG. 1 is applied. It is a schematic block diagram showing the modification of the manufacturing apparatus of FIG. It is an enlarged view of the part enclosed with the broken line of FIG. It is a schematic block diagram showing the other modification of the manufacturing apparatus of FIG. It is a schematic block diagram showing an example of the conventional manufacturing apparatus.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1, 2 ... Evaluation apparatus, 3 ... Manufacturing apparatus, 10, 10A, 10B ... Light emission part, 11 ... Light source, 12 ... Polarizer, 13 ... Faraday modulator, 14 ... λ / 4 wavelength plate, 20, 20A, 20B DESCRIPTION OF SYMBOLS ... Photodetection part, 21 ... Analyzer, 22 ... Photodetector, 30 ... Evaluation part, 40 ... Base material feeding part, 50 ... Rubbing part, 60 ... Deposition part, 70 ... Application part, 80 ... Control part, F ... Thin film, F1 ... liquid crystal thin film, F2 ... liquid crystal layer, M ... substrate, S ... laminated substrate.

Claims (36)

An attachment step of attaching a predetermined molecular group on the surface of the sample;
Detection in which predetermined light is emitted at a predetermined angle toward the adhesion region of the molecular group, and light that has passed through the adhesion region, light reflected by the adhesion region, or light scattered by the adhesion region is detected. Process,
And an evaluation step of evaluating the surface state of the sample using light intensity information of the light detected in the detection step. The evaluation method according to claim 1, wherein the molecular group is an aggregate of a large number of molecules having anisotropy of dielectric constant or polarizability. The evaluation method according to claim 1, wherein the molecular group is an aggregate of a large number of molecules having fluorescence. In the detection step, polarized light having a predetermined polarization characteristic is emitted toward the sample and the adhesion region,
In the evaluation step, the retardation of the composite system of the sample and the molecular group is derived from the light intensity information obtained from the light emitted to the adhesion region, and the orientation state of the surface of the sample based on the retardation of the composite system The evaluation method according to claim 1, wherein: In the detection step, predetermined light is emitted toward the sample at a predetermined angle, and light that has passed through the sample, light reflected by the sample, or light scattered by the sample is detected, and Predetermined light is emitted at a predetermined angle toward the surface-attached sample on which the molecule group is attached on the surface of the sample, light that has passed through the surface-attached sample, light reflected by the surface-attached sample, or the surface The evaluation method according to claim 1, wherein light scattered by the attached sample is detected. In the detection step, the polarized light having a predetermined polarization characteristic is emitted toward the sample and the surface-attached sample,
In the evaluation step, the retardation of the sample is derived using light intensity information obtained from the light emitted to the sample, and the sample and the light are obtained from the light intensity information obtained from the light emitted to the surface-attached sample. The alignment state of the surface of the molecular group side of the sample is evaluated based on the retardation of the sample and the retardation of the complex system after deriving the retardation of the complex system of the molecular group. The evaluation method described. In the detection step, a predetermined light is emitted at a predetermined angle toward a surface-attached sample in which the molecule group is attached to a part of the surface of the sample, and the attached portion of the molecule group is included in the surface-attached sample. Detecting the light passing through, the light reflected by the adhering part, or the light scattered by the adhering part, and the light passing through the exposed part of the surface adhering sample where the molecular group is not attached, the exposure The evaluation method according to claim 1, wherein light reflected by a portion or light scattered by the exposed portion is detected. In the detection step, the polarized light having a predetermined polarization characteristic is emitted toward the surface-attached sample,
In the evaluation step, the retardation of the sample is derived using light intensity information obtained from the light emitted to the exposed portion, and the sample and the light source are obtained from the light intensity information obtained from the light emitted to the attached portion. The alignment state of the surface of the molecular group side of the sample is evaluated based on the retardation of the sample and the retardation of the complex system after deriving the retardation of the complex system of the molecular group. The evaluation method described. In the detection step, a predetermined light is emitted at a predetermined angle toward a surface-attached sample having the molecular group attached on the surface of the sample, and the light that has passed through the surface-attached sample is reflected by the surface-attached sample. Or light scattered by the surface-attached sample,
2. The evaluation method according to claim 1, wherein in the evaluation step, a surface state of the sample on the molecular group side of the sample is evaluated based on light intensity information of light detected in the detection step and reference information. . The reference information is obtained by irradiating a reference sample made of the same material as the sample with predetermined light at a predetermined angle, and then passing through the reference sample, light reflected by the reference sample, or the reference sample. 10. The evaluation method according to claim 9, wherein the evaluation method is light intensity information obtained by detecting light scattered by the light source, or retardation of the reference sample derived using the light intensity information. In the detection step, the polarized light having a predetermined polarization characteristic is emitted toward the surface-attached sample,
In the evaluation step, if necessary, the retardation of the reference sample is derived using the reference information, and the composite system of the sample and the molecular group is obtained from light intensity information obtained from light irradiated on the surface-attached sample. 11. The evaluation method according to claim 10, wherein after the retardation of the sample is derived, the orientation state of the surface of the sample on the molecular group side of the sample is evaluated based on the retardation of the reference sample and the retardation of the composite system. . The evaluation method according to claim 1, wherein in the attaching step, the molecular group is attached on the surface of the sample by vapor deposition. The evaluation method according to claim 1, wherein the molecular group includes liquid crystal. The evaluation method according to claim 1, wherein the molecular group has a thickness equal to or greater than a monomolecular layer. The evaluation method according to claim 1, wherein the molecular group has a thickness of 100 nm or less. The evaluation method according to claim 1, wherein the molecular group has a thickness of 1 nm to 50 nm. The evaluation method according to claim 1, wherein the light emitting unit emits polarized light having a predetermined polarization characteristic. The evaluation method according to claim 17, wherein the polarized light is circularly polarized light. An attachment device for attaching a predetermined group of molecules on the surface of the sample;
A light emitting portion that emits predetermined light at a predetermined angle toward the adhesion region of the molecular group;
A light detection unit that detects light that has passed through the attachment region, light that has been reflected by the attachment region, or light that has been scattered by the attachment region;
An evaluation apparatus comprising: an evaluation unit that evaluates the surface state of the sample using light intensity information of light detected by the light detection unit. The evaluation apparatus according to claim 19, wherein the molecular group is an aggregate of a large number of molecules having anisotropy of dielectric constant or polarizability. The evaluation apparatus according to claim 19, wherein the molecular group is an aggregate of a large number of molecules having fluorescence. The light emitting part is
A first light emitting unit that emits predetermined light at a predetermined angle toward the sample;
A second light emitting unit that emits predetermined light at a predetermined angle toward the surface-attached sample on which the molecular group is attached on the surface of the sample;
The light detection unit is
A first light detection unit for detecting light that has passed through the sample, light reflected by the sample, or light scattered by the sample;
A second light detection unit for detecting light that has passed through the surface-attached sample, light reflected by the surface-attached sample, or light scattered by the surface-attached sample,
The said evaluation part evaluates the surface state by the side of the said molecular group of the said sample using the light intensity information of the light detected by the said 1st light detection part and the said 2nd detection part. The evaluation device described. The sample has an exposed portion to which the molecular group is not attached,
The detection unit detects light that has passed through the attached part of the molecular group, light reflected by the attached part, or light scattered by the attached part, and passes through the exposed part. The evaluation apparatus according to claim 19, further comprising detecting detected light, light reflected by the exposed portion, or light scattered by the exposed portion. The evaluation according to claim 19, wherein the evaluation unit evaluates a surface state of the sample on the molecular group side based on light intensity information of light detected by the light detection unit and reference information. apparatus. An optical element manufacturing apparatus using a substrate,
An attachment device for attaching a predetermined molecular group on the surface of the substrate;
A light emitting portion that emits predetermined light at a predetermined angle toward the adhesion region of the molecular group;
A light detection unit that detects light that has passed through the attachment region, light that has been reflected by the attachment region, or light that has been scattered by the attachment region;
An evaluation unit that evaluates the surface state of the substrate on the molecular group side using light intensity information of light detected by the light detection unit;
And a control unit that derives a control parameter based on an evaluation result by the evaluation unit. The manufacturing apparatus according to claim 25, wherein the molecular group is an aggregate of a large number of molecules having anisotropy of dielectric constant or polarizability. The manufacturing apparatus according to claim 25, wherein the molecular group is an aggregate of a large number of molecules having fluorescence. The light emitting part is
A first light emitting unit that emits predetermined light at a predetermined angle toward the substrate;
A second light emitting unit that emits predetermined light at a predetermined angle toward the surface-attached base material on which the molecular group is attached on the surface of the base material,
The light detection unit is
A first light detection unit for detecting light that has passed through the base material, light reflected by the base material, or light scattered by the base material;
A second light detector for detecting light that has passed through the surface-attached substrate, light reflected by the surface-attached substrate, or light scattered by the surface-attached substrate;
The said evaluation part evaluates the surface state by the side of the said molecular group of the said base material using the light intensity information of the light detected by the said 1st light detection part and the said 2nd detection part. The manufacturing apparatus described in 1. A base material forming part for forming the base material by imparting in-plane anisotropy to one surface of the base material before processing;
The manufacturing apparatus according to claim 28, wherein the control unit controls a condition for imparting in-plane anisotropy to the base material before processing using the control parameter. The said base material formation part provides in-plane anisotropy with respect to the one surface of the said base material before a process by rubbing, ultraviolet irradiation, diagonal ion beam irradiation, or extending | stretching. Manufacturing equipment. Of the surface-attached base material in which the molecular group is attached on the surface of the base material, on the surface on the molecular group side, the film has a dielectric constant or anisotropy of polarizability and is thicker than the thickness of the molecular group An optical functional layer forming part for forming an optical functional layer having
The said control part controls the necessity of formation of the said optical function layer on the surface of the part evaluated by the said evaluation part among the said surface adhesion base materials using the said control parameter, It is characterized by the above-mentioned. Item 26. The manufacturing apparatus according to Item 25. The manufacturing apparatus according to claim 31, wherein the molecular group is made of the same material as the optical functional layer. The optical functional layer forming unit forms the optical functional layer by applying a material containing molecules having anisotropy of dielectric constant or polarizability on the surface of the surface-adhering substrate. Item 32. The manufacturing apparatus according to Item 31. The substrate has an exposed portion to which the molecular group is not attached,
The detection unit detects light that has passed through the attachment part of the molecular group, light reflected by the attachment part, or light scattered by the attachment part, and the exposed part 26. The manufacturing apparatus according to claim 25, wherein the light that has passed, the light reflected by the exposed portion, or the light scattered by the exposed portion is detected. The said evaluation part evaluates the surface state of the said molecular group side of the said base material based on the light intensity information of the light detected by the said light detection part, and reference information. Manufacturing equipment. The manufacturing apparatus according to claim 25, wherein the attachment device attaches the molecular group on the surface of the base material by vapor deposition.

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