JP2009094150A - Planar coil and method of manufacturing the same - Google Patents

Planar coil and method of manufacturing the same Download PDF

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JP2009094150A
JP2009094150A JP2007261075A JP2007261075A JP2009094150A JP 2009094150 A JP2009094150 A JP 2009094150A JP 2007261075 A JP2007261075 A JP 2007261075A JP 2007261075 A JP2007261075 A JP 2007261075A JP 2009094150 A JP2009094150 A JP 2009094150A
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film substrate
pattern
area
planar coil
folded
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Genshu To
元珠 竇
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To enable the formation of a planar coil with a single layer pattern, and to enable a large reduction of the manufacturing cost without requiring a lamination process and via formation. <P>SOLUTION: An insulating film substrate 11 on one surface of which a first pattern 15 is formed in a first zone 13 and a second pattern 16 is formed in a second zone 14 is prepared, the film substrate 11 is folded along a bend line L, the first pattern 15 in the first zone 13 and the second pattern 16 in the second zone 14 are so opposed that they form a closed region in a plan view with the insulating film substrate 11 being interposed between them, and respective layers of the film substrate 11 are bonded together and fixed. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、電子回路に搭載されるインダクタ部品の一つである平面コイル及びその製造方法に関する。   The present invention relates to a planar coil which is one of inductor components mounted on an electronic circuit and a method for manufacturing the same.

現在、電子回路には電子部品の一つとしてインダクタ部品が多く用いられており、インダクタ部品として平面コイルが様々な用途に利用されている。   At present, many inductor components are used as electronic components in electronic circuits, and planar coils are used for various applications as inductor components.

従来の平面コイルの構成例を図10(a)(b)に示す。同図(a)は平面図であり、同図(b)は断面図である。シート状の素体1の略中央にスルーホール部2を設け、このスルーホール部2の外周方向にコイル3を、このコイル3の最外周部に端子3A、3Bを、コイル3を構成する平面コイル3AA、3BB間にビア4を、それぞれ素体1内に形成し、素体1の上面、下面及びスルーホール部2の内周面には磁性体層5を形成して構成している。上層の平面コイル3AAは端子3Aからスルーホール部2へ向かう方向(内周方向)へ渦巻状に巻回し、この平面コイル3AAの最内周部と下層の平面コイル3BBの最内周部とをビア4により接続し、この平面コイル3BBを端子3Bへ向かう方向(外周方向)へ渦巻状に巻回してコイル3を構成している(例えば、特許文献1参照)。   An example of the configuration of a conventional planar coil is shown in FIGS. FIG. 2A is a plan view, and FIG. 2B is a cross-sectional view. A through-hole portion 2 is provided at substantially the center of the sheet-like element body 1, the coil 3 is disposed in the outer peripheral direction of the through-hole portion 2, the terminals 3 A and 3 B are disposed on the outermost peripheral portion of the coil 3, and the plane constituting the coil 3 Vias 4 are respectively formed in the element body 1 between the coils 3AA and 3BB, and a magnetic layer 5 is formed on the upper and lower surfaces of the element body 1 and the inner peripheral surface of the through-hole portion 2. The upper planar coil 3AA is spirally wound in a direction (inner circumferential direction) from the terminal 3A toward the through-hole portion 2, and the innermost circumferential portion of the planar coil 3AA and the innermost circumferential portion of the lower planar coil 3BB are wound. The planar coil 3BB is spirally wound in the direction toward the terminal 3B (periphery direction) by connecting via the via 4, and the coil 3 is configured (see, for example, Patent Document 1).

以上のように構成された平面コイルを製造する場合、フォトリソグラフ技術を用いて基板上に複数層に亘りパターニングを繰り返し、スルーホールの内面にメッキを施すといった積層工程を経て最終製品を得ていた。
特開2007−227729号公報
When manufacturing a planar coil configured as described above, the final product was obtained through a lamination process in which patterning was repeated over a plurality of layers on a substrate using photolithography technology and plating was performed on the inner surface of the through hole. .
JP 2007-227729 A

しかしながら、特許文献1に記載された平面コイルの製造方法は、多層基板を用いて複雑な積層工程を経て平面コイルを製造しているので、製造工程が多く、コストが高くなるといった問題があった。   However, the method for manufacturing a planar coil described in Patent Document 1 has a problem in that the planar coil is manufactured through a complicated stacking process using a multilayer substrate, so that there are many manufacturing processes and the cost is increased. .

本発明は、かかる点に鑑みてなされたものであり、単層パターンで平面コイルを形成できると共に、積層工程およびビア形成が不要で、製造コストを大幅に削減可能な平面コイル及びその製造方法を提供することを目的とする。   The present invention has been made in view of the above points, and provides a planar coil and a manufacturing method thereof that can form a planar coil with a single-layer pattern, can eliminate a lamination process and via formation, and can greatly reduce manufacturing costs. The purpose is to provide.

本発明の平面コイルは、折り畳み可能で絶縁性を有するフィルム基板と、前記フィルム基板の一方の面に形成された導体パターンとを備え、前記フィルム基板のパターン形成領域を少なくとも1回折り畳み、2層以上に折り畳まれたフィルム基板の各層に形成された各導体パターンを平面視で閉領域が形成されるように対向させたことを特徴とする。   The planar coil of the present invention includes a foldable and insulating film substrate and a conductor pattern formed on one surface of the film substrate, and the pattern formation region of the film substrate is folded at least once and two layers are formed. Each conductor pattern formed in each layer of the film substrate folded as described above is opposed to form a closed region in plan view.

この構成によれば、導体パターンが平面視で閉領域を形成する平面コイルがフィルム基板を折り畳むことにより容易に作製できるので、積層工程およびビア形成を排除でき、コストダウンを図ることができる。   According to this configuration, since the planar coil in which the conductor pattern forms a closed region in a plan view can be easily manufactured by folding the film substrate, the laminating process and via formation can be eliminated, and the cost can be reduced.

また本発明は、上記平面コイルにおいて、前記フィルム基板は、直線状の境界線を挟んで隣接した第1の区域及び第2の区域に前記導体パターンが形成され、前記フィルム基板の一部であって前記第1及び第2の区域とは異なる第3の区域を、前記第1の区域の導体パターンと前記第2の区域の導体パターンとの間に挟み込んで前記フィルム基板を折り畳んでいることを特徴とする。   According to the present invention, in the planar coil, the film substrate is a part of the film substrate in which the conductor pattern is formed in a first area and a second area adjacent to each other across a linear boundary line. The film substrate is folded by sandwiching a third area different from the first and second areas between the conductor pattern of the first area and the conductor pattern of the second area. Features.

この構成によれば、フィルム基板の一部であって第1及び第2の区域とは異なる第3の区域を、第1の区域の導体パターンと第2の区域の導体パターンとの間に挟み込んで絶縁するので、第1の区域及び第2の区域の背面(導体パターン非形成面)を外側に露出させるように折り畳むことができ、導体パターンが外部に露出しない状態にすることができる。   According to this configuration, a third area that is a part of the film substrate and is different from the first and second areas is sandwiched between the conductor pattern of the first area and the conductor pattern of the second area. Therefore, the back surface of the first area and the second area (the surface on which the conductor pattern is not formed) can be folded so as to be exposed to the outside, so that the conductor pattern is not exposed to the outside.

上記平面コイルにおいて、前記フィルム基板を複数回折り畳み、3層以上に折り畳まれたフィルム基板の各層に形成された導体パターンを平面視で閉領域が形成されるように対向させることもできる。これにより、平面コイルを構成する導体パターンが多層に重ねられるので、磁力線密度を高くすることができる。   In the planar coil, the film substrate may be folded a plurality of times, and the conductive patterns formed on each layer of the film substrate folded into three or more layers may be opposed to each other so that a closed region is formed in plan view. Thereby, since the conductor pattern which comprises a planar coil is piled up in a multilayer, a magnetic force line density can be made high.

上記平面コイルにおいて、前記導体パターンによる閉領域がフィルム長手方向に複数個直列に接続された構成としても良い。   In the planar coil, a plurality of closed regions by the conductor pattern may be connected in series in the film longitudinal direction.

本発明の平面コイルの製造方法は、一方の面に導体パターンが形成された絶縁性のフィルム基板を準備し、前記フィルム基板のパターン形成領域を少なくとも1回折り畳んで、2層以上に折り畳まれたフィルム基板の各層に形成された各導体パターンを平面視で閉領域が形成されるように対向させ、2層以上に折り畳まれたフィルム基板の各層を接合して固定することを特徴とする。   In the planar coil manufacturing method of the present invention, an insulating film substrate having a conductor pattern formed on one surface is prepared, and the pattern formation region of the film substrate is folded at least once and folded into two or more layers. Each conductive pattern formed on each layer of the film substrate is opposed to form a closed region in plan view, and the layers of the film substrate folded into two or more layers are joined and fixed.

本発明は、上記平面コイルの製造方法において、前記フィルム基板は、直線状の境界線を挟んで隣接した第1の区域及び第2の区域に前記導体パターンが形成され、前記フィルム基板の一部であって前記第1及び第2の区域とは異なる第3の区域を、前記第1の区域の導体パターンと前記第2の区域の導体パターンとの間に挟み込んだ状態で前記フィルム基板を折り畳み、前記第1及び第2の区域の導体パターンを第3の区域で絶縁することを特徴とする。   In the method for manufacturing a planar coil according to the present invention, the film substrate is formed such that the conductor pattern is formed in a first area and a second area adjacent to each other across a linear boundary line, and a part of the film substrate is formed. The film substrate is folded in a state where a third area different from the first and second areas is sandwiched between the conductor pattern of the first area and the conductor pattern of the second area. The conductor patterns in the first and second areas are insulated in the third area.

本発明によれば、単層パターンで平面コイルを形成できると共に、積層工程およびビア形成が不要で、製造コストを大幅に削減することができる。   According to the present invention, a planar coil can be formed with a single layer pattern, and a laminating process and via formation are not required, and the manufacturing cost can be greatly reduced.

以下、本発明の実施の形態に係る平面コイル及びその製造方法について図面を参照して詳細に説明する。   Hereinafter, a planar coil and a manufacturing method thereof according to an embodiment of the present invention will be described in detail with reference to the drawings.

(第1の実施の形態)
図1(a)(b)は第1の実施の形態に係る平面コイルの製造方法を示す工程図である。
図1(a)に示すように、フィルム基板11の一方のフィルム面に平面コイルを形成するための単層パターン12を形成する。フィルム基板11は、絶縁性の可撓性フィルムで構成されている。フィルム基板11の材料として、熱融着温度が導体材料として選択する金属材料よりも低く、自在に折り畳むことができる程度の弾性があり、かつ絶縁性材料として機能するものを用いる。例えば、ポリイミド、液晶ポリマー、又はポリエチレンを用いることができる。フィルム基板11は所定幅で一方向へ伸びる帯状をなしている。単層パターン12は、銀、銅等の金属性材料で形成された導体である。図1(a)に示すように中央を折り曲げ線Lとして上半分を第1の区域13、下半分を第2の区域14として、第1の区域13に折り曲げ線Lから立ち上がる矩形状の第1のパターン15が形成され、第2の区域14に折り曲げ線Lから立ち上がる矩形状の第2のパターン16が形成されている。第1のパターン15と第2のパターン16とは互いに一部重なるように周期が所定量ずれている。そして、折り曲げ線L上に位置する第2のパターン16の脚部16a,16bの先端部を折り曲げ線Lに沿って対向方向へ延出して、上方に隣接して形成された2つの第1のパターン15の対応する各脚部15a,15bの各先端部に接続している。最も左側に形成された第1のパターン15の一端部はシート外周部へ伸びており、最も右側に形成された第2のパターン16の一端部もシート外周部へ伸びている。このように、単層パターン12は第1のパターン15と第2のパターン16の隣接する立ち上がり部を接続して一繋がりの導体パターンを構成している。
(First embodiment)
FIGS. 1A and 1B are process diagrams showing a method of manufacturing a planar coil according to the first embodiment.
As shown in FIG. 1A, a single layer pattern 12 for forming a planar coil is formed on one film surface of a film substrate 11. The film substrate 11 is made of an insulating flexible film. As the material of the film substrate 11, a material having a heat fusion temperature lower than that of the metal material selected as the conductor material, elasticity that can be freely folded, and functioning as an insulating material is used. For example, polyimide, liquid crystal polymer, or polyethylene can be used. The film substrate 11 has a belt shape extending in one direction with a predetermined width. The single layer pattern 12 is a conductor formed of a metallic material such as silver or copper. As shown in FIG. 1A, a rectangular first that rises from the folding line L in the first area 13 with the center half as the folding line L and the upper half as the first area 13 and the lower half as the second area 14. Pattern 15 is formed, and a rectangular second pattern 16 rising from the folding line L is formed in the second area 14. The periods of the first pattern 15 and the second pattern 16 are shifted by a predetermined amount so as to partially overlap each other. Then, the tip ends of the leg portions 16a and 16b of the second pattern 16 positioned on the fold line L are extended in the opposing direction along the fold line L, and the two first first portions formed adjacent to each other upward. The corresponding ends of the leg portions 15a and 15b of the pattern 15 are connected. One end of the first pattern 15 formed on the leftmost side extends to the outer periphery of the sheet, and one end of the second pattern 16 formed on the rightmost side also extends to the outer periphery of the sheet. As described above, the single-layer pattern 12 forms a continuous conductor pattern by connecting the adjacent rising portions of the first pattern 15 and the second pattern 16.

次に、平面コイルの製造方法の手順について説明する。
フィルム基板11の第1の区域13に第1のパターン15を形成すると共に第2の区域14に第2のパターン16を形成する。すなわち、フィルム基板11の一方の面に単層パターン12を形成する。第1及び第2のパターン15、16は同一工程で一度に形成しても良い。
Next, the procedure of the planar coil manufacturing method will be described.
A first pattern 15 is formed in the first area 13 of the film substrate 11 and a second pattern 16 is formed in the second area 14. That is, the single layer pattern 12 is formed on one surface of the film substrate 11. The first and second patterns 15 and 16 may be formed at the same time in the same process.

次に、図2に示すようにしてフィルム基板11のパターン形成領域を折り畳む。第1のパターン15及び第2のパターン16が外側になるように、フィルム基板11を折り曲げ線Lに沿って中央で折り曲げて対向面を重ね合わせ、図1(b)に示すように平面視で導体が閉領域を形成するようにする。   Next, the pattern formation region of the film substrate 11 is folded as shown in FIG. The film substrate 11 is folded at the center along the folding line L so that the first pattern 15 and the second pattern 16 are on the outside, and the opposing surfaces are overlapped, as shown in FIG. The conductor forms a closed region.

図2に折り畳み手順を示す。図2に示すように、一方のフィルム面に平面コイルを形成するための単層パターン12を形成したフィルム基板11を用意する((A))。次に、フィルム基板11を折り曲げ線Lに沿って中央で折り曲げて畳み込む。図2に示すように、第2の区域14の背面(パターン非形成面側)を第1の区域13の背面(パターン非形成面)に互いのフィルム面が接触するまで折り曲げて畳む((B)〜(E))。この結果、第1のパターン15と第2のパターン16との間に第1の区域13及び第2の区域14のフィルム基板11領域が挟まった状態となる。プレス装置を用いて折り曲げられたフィルム基板11をプレスして、この状態のまま加熱して第1の区域13と第2の区域14のフィルム基板11を熱融着させる。このときの加熱温度はフィルム基板11の融着温度以上であるが第1及び第2のパターン15、16は溶融しない温度に調整する。所定時間加熱して第1の区域13及び第2の区域14の背面が完全に熱融着してから冷却して、図1(b)に示す平面コイル20を得た。なお、熱融着法以外にも接着剤を用いて接合することもできる。   FIG. 2 shows the folding procedure. As shown in FIG. 2, a film substrate 11 having a single layer pattern 12 for forming a planar coil on one film surface is prepared ((A)). Next, the film substrate 11 is folded along the folding line L at the center and folded. As shown in FIG. 2, the back surface (non-pattern-formed surface side) of the second area 14 is folded and folded until the film surfaces come into contact with the back surface (non-pattern-formed surface) of the first area 13 ((B ) To (E)). As a result, the film substrate 11 region of the first area 13 and the second area 14 is sandwiched between the first pattern 15 and the second pattern 16. The folded film substrate 11 is pressed using a press device and heated in this state to heat-bond the film substrate 11 in the first area 13 and the second area 14. The heating temperature at this time is equal to or higher than the fusion temperature of the film substrate 11, but the first and second patterns 15 and 16 are adjusted to a temperature at which the film substrate 11 does not melt. The planar coil 20 shown in FIG. 1B was obtained by heating for a predetermined time and cooling after the back surfaces of the first zone 13 and the second zone 14 were completely heat-sealed. In addition, it can also join using an adhesive agent other than the heat sealing | fusion method.

図1(b)に示すように、上記製造方法によって製作された平面コイル20は、平面視で導体(15,16)が閉領域21a〜21gを連続して形成した形状となっている。導体(15,16)が閉領域21a〜21gを形成する平面コイル20は大きなインダクタンス値を持つことができる。   As shown in FIG. 1B, the planar coil 20 manufactured by the above manufacturing method has a shape in which the conductors (15, 16) continuously form the closed regions 21a to 21g in a plan view. The planar coil 20 in which the conductors (15, 16) form the closed regions 21a to 21g can have a large inductance value.

このように本実施の形態によれば、フィルム基板11の一方のフィルム面に平面コイルを形成するための単層パターン12を形成し、フィルム基板11を単層パターン12側とは反対側に折り曲げて接合するだけで、第1のパターン15と第2のパターン16を絶縁材となるフィルム基板11(2層)を介して近接して対向配置でき、平面視で閉領域21a〜21gを形成する平面コイル20を作製することができる。したがって、従来要求された積層工程及びビア形成が不要となり、製造コストを大幅に削減することができる。   As described above, according to the present embodiment, the single layer pattern 12 for forming the planar coil is formed on one film surface of the film substrate 11, and the film substrate 11 is bent to the side opposite to the single layer pattern 12 side. The first pattern 15 and the second pattern 16 can be disposed close to each other via the film substrate 11 (two layers) serving as an insulating material, and the closed regions 21a to 21g are formed in plan view. The planar coil 20 can be produced. Therefore, the conventionally required lamination process and via formation are not required, and the manufacturing cost can be greatly reduced.

(第2の実施の形態)
第2の実施の形態は、平面コイルを構成するパターンをフィルム基板で覆って内蔵する構造を有する。
(Second Embodiment)
The second embodiment has a structure in which a pattern constituting a planar coil is covered with a film substrate and incorporated.

図3(a)(b)は第2の実施の形態に係る平面コイルの製造方法を示す工程図である。なお、図1(a)(b)に示す平面コイルの各部と同一部分には同一符号を付して説明の重複を避ける。   FIGS. 3A and 3B are process diagrams showing a method of manufacturing a planar coil according to the second embodiment. In addition, the same code | symbol is attached | subjected to the same part as each part of the planar coil shown to Fig.1 (a) (b), and duplication of description is avoided.

図3(a)に示すように、フィルム基板11は第1の区域13の上に第3の区域17を形成している。第3の区域17は第1及び第2の区域13、14とほぼ同じ幅に設定されている。   As shown in FIG. 3A, the film substrate 11 forms a third area 17 on the first area 13. The third area 17 is set to have substantially the same width as the first and second areas 13 and 14.

フィルム基板11の第1の区域13に第1のパターン15を形成すると共に第2の区域14に第2のパターン16を形成する。すなわち、フィルム基板11の一方の面に単層パターン12を形成する。   A first pattern 15 is formed in the first area 13 of the film substrate 11 and a second pattern 16 is formed in the second area 14. That is, the single layer pattern 12 is formed on one surface of the film substrate 11.

次に、図4に示す方向及び位置でフィルム基板11を折り畳む。第3の区域17を第1のパターン15の形成面側に折り曲げ線L2に沿って折り曲げ、第3の区域17のフィルム面が第1のパターン15の上面を覆うようにする((A)、(B))。これにより、第1のパターン15は第1の区域13と第3の区域17のフィルム領域で挟まれた状態となる。   Next, the film substrate 11 is folded in the direction and position shown in FIG. The third area 17 is bent along the folding line L2 to the formation surface side of the first pattern 15 so that the film surface of the third area 17 covers the upper surface of the first pattern 15 ((A), (B)). As a result, the first pattern 15 is sandwiched between the film areas of the first area 13 and the third area 17.

次に、第2のパターン16が第3の区域17の背面側に重なるように、フィルム基板11を折り曲げ線L1に沿って折り畳む((C)、(D))。この結果、第1のパターン15と第2のパターン16との間に第3の区域17が配置され、第1のパターン15と第2のパターン16とを外側から第1の区域13と第2の区域14とで挟み込んだ状態となる。プレス装置を用いて上記の如く折り曲げられたフィルム基板11をプレスして、この状態のまま加熱して第1の区域13、第2の区域14及び第3の区域17のフィルム基板11を熱融着させる。所定時間加熱して第1の区域13及び第2の区域14の背面が完全に熱融着したのち冷却して、図3(b)に示す平面コイル20を得た。   Next, the film substrate 11 is folded along the folding line L1 so that the second pattern 16 overlaps the back side of the third area 17 ((C), (D)). As a result, the third area 17 is arranged between the first pattern 15 and the second pattern 16, and the first pattern 15 and the second pattern 16 are moved from the outside to the first area 13 and the second pattern 16. It is in a state of being sandwiched between the areas 14. The film substrate 11 bent as described above is pressed using a pressing device and heated in this state to heat-melt the film substrate 11 in the first zone 13, the second zone 14, and the third zone 17. Put on. The planar coil 20 shown in FIG. 3 (b) was obtained by heating for a predetermined time and cooling after the back surfaces of the first zone 13 and the second zone 14 were completely heat-sealed.

このように本実施の形態によれば、フィルム基板11の折り畳み工程を1つ追加するだけで、コイル導体表面を絶縁性のフィルム基板11で覆った平面コイル20を作製することができ、コイル導体表面が外部に露出しないようにすることができる。   As described above, according to the present embodiment, the planar coil 20 having the coil conductor surface covered with the insulating film substrate 11 can be produced only by adding one folding process of the film substrate 11. It is possible to prevent the surface from being exposed to the outside.

(第3の実施の形態)
第3の実施の形態は、フィルム基板を3重に折り畳んで多層の平面コイルを簡易に作成する例である。
(Third embodiment)
The third embodiment is an example in which a multilayer planar coil is easily created by folding a film substrate in a triple manner.

図5(a)(b)は第3の実施の形態に係る平面コイルの製造方法を示す工程図である。フィルム基板11を第1の区域31〜第5の区域35に分割し、第2の区域32〜第5の区域35の同一フィルム面に単層パターン30が形成されている。第1の区域31にはパターンは形成していない。第2の区域32〜第5の区域35には第1〜第4のパターン36,37,38,39がそれぞれ形成されている。第2の区域32には折り曲げ線L2から下方に立ち上がる矩形状の第1のパターン36が所定周期で連続して形成されている。第1のパターン36は折り曲げ線L2上で中央部付近が開口している。第3の区域33には第1のパターン36と第3のパターン38とを接続する連結導体37a,37bで構成される第2のパターン37が形成されている。第4の区域34には第1のパターン36と同一領域に矩形状をなす第3のパターン38が連続して形成されている。第3のパターン38は第3及び第4の折り曲げ線L3、L4上で中央部付近が開口している。第3の区域33には、第1のパターン36の折り曲げ線L2上の開口部と第3のパターン38の第3の折り曲げ線L3上の開口部とをそれぞれ接続する直線状の連結導体37a,37bが平行に形成されている。第5の区域35には第4の折り曲げ線L4から立ち上がる矩形状をなす第4のパターン39が第3のパターン38からフィルム長手方向に多少ずれた周期で連続して形成されている。第4のパターン39は第4の折り曲げ線L4上で一方の脚部39aが第3のパターン38の開口部の一端38aに接続され、他方の脚部39bが隣接する第3のパターン38の開口部の一端38aに接続されている。このように、フィルム基板11の一方の面に形成された単層パターン30は一繋がりのパターンで形成されると共に、3重に折り畳んだ際には平面視で導体が閉領域30a〜30hを形成するように第1から第4のパターン36,37,38,39を配置している。   FIGS. 5A and 5B are process diagrams showing a method of manufacturing a planar coil according to the third embodiment. The film substrate 11 is divided into a first area 31 to a fifth area 35, and a single layer pattern 30 is formed on the same film surface in the second area 32 to the fifth area 35. No pattern is formed in the first area 31. First to fourth patterns 36, 37, 38, 39 are formed in the second area 32 to the fifth area 35, respectively. In the second area 32, a rectangular first pattern 36 rising downward from the folding line L2 is continuously formed at a predetermined period. The first pattern 36 is open near the center on the folding line L2. In the third area 33, a second pattern 37 composed of connecting conductors 37a and 37b connecting the first pattern 36 and the third pattern 38 is formed. In the fourth area 34, a third pattern 38 having a rectangular shape is continuously formed in the same area as the first pattern 36. The third pattern 38 is open near the center on the third and fourth fold lines L3 and L4. In the third area 33, linear connecting conductors 37a, which connect the opening on the folding line L2 of the first pattern 36 and the opening on the third folding line L3 of the third pattern 38, respectively. 37b is formed in parallel. In the fifth area 35, a fourth pattern 39 having a rectangular shape rising from the fourth fold line L4 is continuously formed with a period slightly shifted from the third pattern 38 in the film longitudinal direction. In the fourth pattern 39, one leg 39a is connected to one end 38a of the opening of the third pattern 38 on the fourth fold line L4, and the other leg 39b is adjacent to the opening of the third pattern 38. Connected to one end 38a. Thus, the single layer pattern 30 formed on one surface of the film substrate 11 is formed as a continuous pattern, and when folded three times, the conductor forms closed regions 30a to 30h in plan view. The first to fourth patterns 36, 37, 38, and 39 are arranged as described above.

以上のように構成される平面コイル30の製造方法は以下の手順による。
まず、フィルム基板11の第2〜第5の区域32〜35に単層パターン30を形成する。単層パターン30は、上記した通り、フィルム基板11を3重に折り畳んだ際に平面視で導体が閉領域30a〜30hを形成する第1から第4のパターン36,37,38,39で構成される。
The method of manufacturing the planar coil 30 configured as described above is according to the following procedure.
First, the single layer pattern 30 is formed in the second to fifth areas 32 to 35 of the film substrate 11. As described above, the single-layer pattern 30 includes the first to fourth patterns 36, 37, 38, and 39 in which the conductors form the closed regions 30a to 30h in plan view when the film substrate 11 is folded three times. Is done.

次に、第1の区域31を第1の折り曲げ線L1でパターン形成面側に折り曲げて第1のパターン36を覆うようにする。次に、第2の折り曲げ線L2でフィルム基板11を1回目の折り曲げ方向と同方向に折り曲げて、第1の区域31の背面を第3の区域33のパターン形成面に重ねる。次に、第3の折り曲げ線L3でフィルム基板11を2回目の折り曲げ方向と同方向に折り曲げて、第2の区域32の背面が第4の区域34のパターン形成面に重なるようにする。次に、第4の折り曲げ線L4でフィルム基板11を3回目の折り曲げ方向と同方向に折り曲げて、第3の区域33の背面が第5の区域35のパターン形成面に重なるようにする。この結果、第1のパターン36と第2のパターン37との間に第1の区域31が配置され、第1のパターン36と第3のパターン38とが第2の区域32のフィルム基板11を挟んで同一位置で対向配置される。さらに、第4のパターン39が第3の区域33のフィルム基板11を挟んで同一位置で対向配置される。したがって、第1から第4のパターン36,37,38,39がそれぞれフィルム基板11を挟んで積層された状態となっている。プレス装置を用いて上記の如く折り曲げられたフィルム基板11をプレスして、この状態のまま加熱してフィルム基板11を熱融着させる。所定時間経過後に冷却して、図5(b)に示す平面コイルを得た。   Next, the first section 31 is bent toward the pattern forming surface along the first fold line L1 so as to cover the first pattern 36. Next, the film substrate 11 is folded in the same direction as the first folding direction along the second folding line L2, and the back surface of the first area 31 is overlapped with the pattern forming surface of the third area 33. Next, the film substrate 11 is folded in the same direction as the second folding direction at the third folding line L3 so that the back surface of the second area 32 overlaps the pattern forming surface of the fourth area 34. Next, the film substrate 11 is folded in the same direction as the third folding direction along the fourth folding line L4 so that the back surface of the third area 33 overlaps the pattern forming surface of the fifth area 35. As a result, the first area 31 is disposed between the first pattern 36 and the second pattern 37, and the first pattern 36 and the third pattern 38 pass through the film substrate 11 in the second area 32. Oppositely arranged at the same position across. Further, the fourth pattern 39 is disposed oppositely at the same position across the film substrate 11 in the third area 33. Therefore, the first to fourth patterns 36, 37, 38, and 39 are stacked with the film substrate 11 interposed therebetween. The film substrate 11 bent as described above is pressed using a press device and heated in this state to heat-bond the film substrate 11. It cooled after predetermined time progress and the planar coil shown in FIG.5 (b) was obtained.

このように本実施の形態によれば、フィルム基板11の第2〜第5の区域32〜35に単層パターン30を形成し、フィルム基板11を3重に折り畳むことにより、各閉領域30a〜30hを形成する導体を2重構造にすることができ、磁束密度を高くすることができる。   As described above, according to the present embodiment, the single-layer pattern 30 is formed in the second to fifth areas 32 to 35 of the film substrate 11, and the film substrate 11 is folded three times to thereby form the closed regions 30 a to 30. The conductor forming 30h can have a double structure, and the magnetic flux density can be increased.

次に、平面コイルの形状について変形例を説明する。
図6(a)(b)は導体の閉領域が四角形よりも丸い多角形をなす平面コイルの製造方法を示す図である。フィルム基板11を中央から上下に第1の区域41と第2の区域42とに分割し、第1の区域41に第1のパターン43を形成し、第2の区域42に第2のパターン44を形成する。第1のパターン43は、矩形パターンの各隅を落とすと共に、折り曲げ線L側の端部43a,43bをわずかに内側に屈曲させている。第2のパターン44は隣接する第1のパターン43に跨るようにフィルム長手方向にずらして形成されている。第2のパターン44の折り曲げ線L側の端部44a,44bは対応する2つの第1のパターン43の対応する端部43b,43aに接続している。
Next, modifications of the shape of the planar coil will be described.
FIGS. 6A and 6B are views showing a method for manufacturing a planar coil in which the closed region of the conductor forms a polygon that is rounder than a quadrangle. The film substrate 11 is vertically divided from the center into a first area 41 and a second area 42, a first pattern 43 is formed in the first area 41, and a second pattern 44 is formed in the second area 42. Form. In the first pattern 43, each corner of the rectangular pattern is dropped, and the end portions 43a and 43b on the folding line L side are slightly bent inward. The second pattern 44 is formed so as to be shifted in the film longitudinal direction so as to straddle the adjacent first pattern 43. The end portions 44 a and 44 b on the folding line L side of the second pattern 44 are connected to the corresponding end portions 43 b and 43 a of the two corresponding first patterns 43.

以上のフィルム基板11を折り曲げ線Lに沿って第1の区域41と第2の区域42の背面同士が重なるように折り畳む。プレス装置で加熱して第1の区域41と第2の区域42とを熱融着する。この結果、図6(b)に示すように導体による閉領域45a〜45gが円形に近い形状となる。プレス装置を用いて上記の如く折り曲げられたフィルム基板11をプレスして、この状態のまま加熱してフィルム基板11を熱融着させる。所定時間経過後に冷却して、図6(b)に示す平面コイルを得た。   The film substrate 11 is folded along the folding line L so that the back surfaces of the first area 41 and the second area 42 overlap each other. The first zone 41 and the second zone 42 are heat-sealed by heating with a press device. As a result, as shown in FIG. 6B, the closed regions 45a to 45g made of a conductor have a shape close to a circle. The film substrate 11 bent as described above is pressed using a press device and heated in this state to heat-bond the film substrate 11. It cooled after progress for the predetermined time, and the planar coil shown in FIG.6 (b) was obtained.

図7(a)(b)は導体が形成する閉領域のサイズを小さくするようにした平面コイルの製造方法を示す図である。第1の区域41に形成する第1のパターン46の高さ(フィルム長手方向と直交する方向の寸法)を、第2の区域42に形成する第2のパターン47の半分の高さとする。   FIGS. 7A and 7B are views showing a method for manufacturing a planar coil in which the size of the closed region formed by the conductor is reduced. The height of the first pattern 46 formed in the first area 41 (the dimension in the direction perpendicular to the film longitudinal direction) is half the height of the second pattern 47 formed in the second area 42.

以上のフィルム基板11を折り曲げ線Lに沿って第1の区域41と第2の区域42の背面同士が重なるように折り畳む。プレス装置で加熱して第1の区域41と第2の区域42とを熱融着する。この結果、図7(b)に示すように導体による閉領域48a〜48gが、図1(b)に示す閉領域21a〜21gの約半分の高さの平面コイルが形成される。プレス装置を用いて上記の如く折り曲げられたフィルム基板11をプレスして、この状態のまま加熱してフィルム基板11を熱融着させる。所定時間経過後に冷却して、図7(b)に示す平面コイルを得た。   The film substrate 11 is folded along the folding line L so that the back surfaces of the first area 41 and the second area 42 overlap each other. The first zone 41 and the second zone 42 are heat-sealed by heating with a press device. As a result, as shown in FIG. 7B, closed coils 48a to 48g made of a conductor form a planar coil having a height about half that of the closed regions 21a to 21g shown in FIG. 1B. The film substrate 11 bent as described above is pressed using a press device and heated in this state to heat-bond the film substrate 11. It cooled after progress for the predetermined time, and the planar coil shown in FIG.7 (b) was obtained.

図8(a)(b)は導体が形成する閉領域が半円状をなす平面コイルの製造方法を示す図である。
図8(a)に示すように、フィルム基板11の下半分の第1の区域41に折り曲げ線L上の直線部が開放した長円状の第1のパターン52を所定間隔で形成する。また、フィルム基板11の上半分の第2の区域42に折り曲げ線L上の一辺が開放した矩形状の第2のパターン51を下側の第1のパターン52に対して略半周期ずらして所定間隔で形成する。
FIGS. 8A and 8B are diagrams showing a method for manufacturing a planar coil in which a closed region formed by a conductor has a semicircular shape.
As shown in FIG. 8A, an oval first pattern 52 in which straight portions on the folding line L are opened is formed at predetermined intervals in the first area 41 of the lower half of the film substrate 11. Further, a rectangular second pattern 51 having one side on the folding line L opened in the second area 42 of the upper half of the film substrate 11 is shifted by a substantially half cycle with respect to the lower first pattern 52 and predetermined. Form at intervals.

次に、折り曲げ線Lを中心にして第1及び第2の区域41,42の背面が重なるようにフィルム基板11を折り畳むことにより、図8(b)に示すように矩形状の第2のパターン51及び長円状の第1のパターン52の曲線部が重なり会い半円形の閉領域53a〜53gが所定間隔で連続する複数の平面コイルが形成される。プレス装置を用いて上記の如く折り曲げられたフィルム基板11をプレスして、この状態のまま加熱してフィルム基板11を熱融着させる。所定時間経過後に冷却して、図8(b)に示す平面コイルを得た。   Next, the film substrate 11 is folded so that the back surfaces of the first and second areas 41 and 42 overlap with each other with the fold line L as the center, thereby forming a rectangular second pattern as shown in FIG. 51 and the curved portions of the oval first pattern 52 overlap to form a plurality of planar coils in which semicircular closed regions 53a to 53g continue at a predetermined interval. The film substrate 11 bent as described above is pressed using a press device and heated in this state to heat-bond the film substrate 11. It cooled after predetermined time progress and the planar coil shown in FIG.8 (b) was obtained.

図9(a)(b)は導体が形成する閉領域が真円をなす平面コイルの製造方法を例示している。図9(a)に示すように、フィルム基板11の上半分の第2の区域42に折り曲げ線L上の直線部が開放した長円状の導体パターン55を所定間隔で形成する。また、フィルム基板11の下半分の第1の区域41に折り曲げ線L上の直線部が開放した長円状の導体パターン54を上側の第2のパターン55に対して略半周期ずらして所定間隔で形成する。   9A and 9B illustrate a method for manufacturing a planar coil in which a closed region formed by a conductor forms a perfect circle. As shown in FIG. 9A, an oval conductor pattern 55 in which straight portions on the folding line L are opened is formed at predetermined intervals in the second area 42 of the upper half of the film substrate 11. In addition, the oval conductor pattern 54 in which the straight line portion on the folding line L is opened in the first area 41 in the lower half of the film substrate 11 is shifted from the second pattern 55 on the upper side by a substantially half cycle to a predetermined interval. Form with.

次に、折り曲げ線Lを中心にして第1及び第2の区域41,42の背面が重なるようにフィルム基板11を折り畳むことにより、図9(b)に示すように長円状の導体パターン及び導体パターンの曲線部が重なり合い円形の閉領域56a〜56dが所定の間隔で連続する複数の平面コイルが形成される。プレス装置を用いて上記の如く折り曲げられたフィルム基板11をプレスして、この状態のまま加熱してフィルム基板11を熱融着させる。所定時間経過後に冷却して、図9(b)に示す平面コイルを得た。   Next, by folding the film substrate 11 so that the back surfaces of the first and second areas 41 and 42 overlap with each other about the fold line L, as shown in FIG. A plurality of planar coils in which the curved portions of the conductor pattern overlap and circular closed regions 56a to 56d continue at a predetermined interval are formed. The film substrate 11 bent as described above is pressed using a press device and heated in this state to heat-bond the film substrate 11. It cooled after progress for the predetermined time, and the planar coil shown in FIG.9 (b) was obtained.

本発明は、電子回路及び小型アンテナ装置のインダクタ部品に適用可能である。   The present invention can be applied to inductor components of electronic circuits and small antenna devices.

(a)第1の実施の形態に係る平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of the planar coil which concerns on 1st Embodiment, (b) The top view which shows the state after bending 第1の実施の形態の平面コイル製造方法における折り曲げ順序を示す説明図Explanatory drawing which shows the bending order in the planar coil manufacturing method of 1st Embodiment (a)第2の実施の形態に係る平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of the planar coil which concerns on 2nd Embodiment, (b) The top view which shows the state after bending 第2の実施の形態の平面コイル製造方法における折り曲げ順序を示す説明図Explanatory drawing which shows the bending order in the planar coil manufacturing method of 2nd Embodiment (a)第3の実施の形態に係る平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of the planar coil which concerns on 3rd Embodiment, (b) The top view which shows the state after bending (a)多角形の閉領域を形成する変形例に係る平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of the planar coil which concerns on the modification which forms a polygonal closed region, (b) The top view which shows the state after bending (a)小サイズの閉領域を形成する変形例に係る平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of the planar coil which concerns on the modification which forms the closed region of small size, (b) The top view which shows the state after bending (a)半円形の高開口平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of a semicircle high opening planar coil, (b) The top view which shows the state after bending (a)円形の高開口平面コイルの製造方法において折り曲げ前の状態を示す平面図、(b)折り曲げ後の状態を示す平面図(A) The top view which shows the state before bending in the manufacturing method of a circular high opening planar coil, (b) The top view which shows the state after bending (a)従来の平面コイルの平面図、(b)従来の平面コイルの断面図(A) Plan view of a conventional planar coil, (b) Cross-sectional view of a conventional planar coil

符号の説明Explanation of symbols

11…フィルム基板
12、30…単層パターン
13、31、41…第1の区域
14、32、42…第2の区域
15、36、43、46、52、54…第1のパターン
16、37、44、47、51、55…第2のパターン
17…第3の区域
20…平面コイル
21a〜21g、30a〜30h、45a〜45g、48a〜48g、53a〜53g、56a〜56d…閉領域
33…第3の区域
34…第4の区域
35…第5の区域
38…第3のパターン
39…第4のパターン
40…第5のパターン


DESCRIPTION OF SYMBOLS 11 ... Film substrate 12, 30 ... Single layer pattern 13, 31, 41 ... 1st area 14, 32, 42 ... 2nd area 15, 36, 43, 46, 52, 54 ... 1st pattern 16, 37 , 44, 47, 51, 55 ... second pattern 17 ... third zone 20 ... planar coil 21a-21g, 30a-30h, 45a-45g, 48a-48g, 53a-53g, 56a-56d ... closed region 33 3rd area 34 ... 4th area 35 ... 5th area 38 ... 3rd pattern 39 ... 4th pattern 40 ... 5th pattern


Claims (6)

折り畳み可能で絶縁性を有するフィルム基板と、前記フィルム基板の一方の面に形成された導体パターンとを備え、
前記フィルム基板のパターン形成領域を少なくとも1回折り畳み、2層以上に折り畳まれたフィルム基板の各層に形成された各導体パターンを平面視で閉領域が形成されるように対向させたことを特徴とする平面コイル。
A foldable and insulating film substrate, and a conductor pattern formed on one surface of the film substrate,
The pattern formation region of the film substrate is folded at least once, and each conductor pattern formed on each layer of the film substrate folded into two or more layers is opposed to form a closed region in plan view. Planar coil to do.
前記フィルム基板は、直線状の境界線を挟んで隣接した第1の区域及び第2の区域に前記導体パターンが形成され、前記フィルム基板の一部であって前記第1及び第2の区域とは異なる第3の区域を、前記第1の区域の導体パターンと前記第2の区域の導体パターンとの間に挟み込んで前記フィルム基板を折り畳んでいることを特徴とする請求項1記載の平面コイル。   In the film substrate, the conductor pattern is formed in a first area and a second area adjacent to each other across a linear boundary line, and the film substrate is a part of the film substrate and includes the first and second areas. 2. The planar coil according to claim 1, wherein the film substrate is folded by sandwiching a different third area between the conductor pattern of the first area and the conductor pattern of the second area. . 前記フィルム基板を複数回折り畳み、3層以上に折り畳まれたフィルム基板の各層に形成された導体パターンを平面視で閉領域が形成されるように対向させたことを特徴とする請求項1又は請求項2記載の平面コイル。   The film substrate is folded a plurality of times, and the conductive patterns formed on each layer of the film substrate folded into three or more layers are opposed to each other so that a closed region is formed in a plan view. Item 3. The planar coil according to Item 2. 前記導体パターンによる閉領域がフィルム長手方向に複数個直列に接続されていることを特徴とする請求項1〜請求項3のいずれかに記載の平面コイル。   The planar coil according to any one of claims 1 to 3, wherein a plurality of closed regions by the conductor pattern are connected in series in the film longitudinal direction. 一方の面に導体パターンが形成された絶縁性のフィルム基板を準備し、前記フィルム基板のパターン形成領域を少なくとも1回折り畳んで、2層以上に折り畳まれたフィルム基板の各層に形成された各導体パターンを平面視で閉領域が形成されるように対向させ、2層以上に折り畳まれたフィルム基板の各層を接合して固定することを特徴とする平面コイルの製造方法。   An insulating film substrate having a conductor pattern formed on one surface is prepared, and each conductor formed on each layer of the film substrate folded into at least two layers by folding the pattern formation region of the film substrate at least once A method for producing a planar coil, wherein a pattern is opposed so that a closed region is formed in a plan view, and each layer of a film substrate folded into two or more layers is joined and fixed. 前記フィルム基板は、直線状の境界線を挟んで隣接した第1の区域及び第2の区域に前記導体パターンが形成され、前記フィルム基板の一部であって前記第1及び第2の区域とは異なる第3の区域を、前記第1の区域の導体パターンと前記第2の区域の導体パターンとの間に挟み込んだ状態で前記フィルム基板を折り畳み、前記第1及び第2の区域の導体パターンを第3の区域で絶縁することを特徴とする請求項5記載の平面コイルの製造方法。

In the film substrate, the conductor pattern is formed in a first area and a second area adjacent to each other across a linear boundary line, and the film substrate is a part of the film substrate and includes the first and second areas. The film substrate is folded with a different third area sandwiched between the conductor pattern of the first area and the conductor pattern of the second area, and the conductor pattern of the first and second areas is folded. The method for manufacturing a planar coil according to claim 5, wherein the coil is insulated in the third area.

JP2007261075A 2007-10-04 2007-10-04 Planar coil and method of manufacturing the same Withdrawn JP2009094150A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732606A (en) * 1980-08-05 1982-02-22 Heiwa Denki Kk Coil
JPS61117210A (en) * 1984-11-09 1986-06-04 Nippon Steel Corp Repairing method of refractory lining of immersion pipe
JPH0245903A (en) * 1988-08-05 1990-02-15 Murata Mfg Co Ltd Inductor
JPH09270337A (en) * 1996-03-29 1997-10-14 Fujitsu Denso Ltd Transformer
JP2001148311A (en) * 1999-11-18 2001-05-29 Micron Corp Thin coil

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732606A (en) * 1980-08-05 1982-02-22 Heiwa Denki Kk Coil
JPS61117210A (en) * 1984-11-09 1986-06-04 Nippon Steel Corp Repairing method of refractory lining of immersion pipe
JPH0245903A (en) * 1988-08-05 1990-02-15 Murata Mfg Co Ltd Inductor
JPH09270337A (en) * 1996-03-29 1997-10-14 Fujitsu Denso Ltd Transformer
JP2001148311A (en) * 1999-11-18 2001-05-29 Micron Corp Thin coil

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