JP2009076520A - 露光装置 - Google Patents

露光装置 Download PDF

Info

Publication number
JP2009076520A
JP2009076520A JP2007241740A JP2007241740A JP2009076520A JP 2009076520 A JP2009076520 A JP 2009076520A JP 2007241740 A JP2007241740 A JP 2007241740A JP 2007241740 A JP2007241740 A JP 2007241740A JP 2009076520 A JP2009076520 A JP 2009076520A
Authority
JP
Japan
Prior art keywords
liquid
exposure apparatus
flat plate
suction
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2007241740A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009076520A5 (enExample
Inventor
Takashi Chibana
貴史 知花
Kazushi Nakano
一志 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007241740A priority Critical patent/JP2009076520A/ja
Priority to TW097135355A priority patent/TW200929331A/zh
Priority to US12/211,158 priority patent/US20090073399A1/en
Priority to KR1020080090955A priority patent/KR20090030223A/ko
Publication of JP2009076520A publication Critical patent/JP2009076520A/ja
Publication of JP2009076520A5 publication Critical patent/JP2009076520A5/ja
Priority to KR1020100124763A priority patent/KR20110003290A/ko
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007241740A 2007-09-19 2007-09-19 露光装置 Abandoned JP2009076520A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007241740A JP2009076520A (ja) 2007-09-19 2007-09-19 露光装置
TW097135355A TW200929331A (en) 2007-09-19 2008-09-15 Exposure apparatus
US12/211,158 US20090073399A1 (en) 2007-09-19 2008-09-16 Exposure apparatus
KR1020080090955A KR20090030223A (ko) 2007-09-19 2008-09-17 노광장치
KR1020100124763A KR20110003290A (ko) 2007-09-19 2010-12-08 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007241740A JP2009076520A (ja) 2007-09-19 2007-09-19 露光装置

Publications (2)

Publication Number Publication Date
JP2009076520A true JP2009076520A (ja) 2009-04-09
JP2009076520A5 JP2009076520A5 (enExample) 2010-11-04

Family

ID=40454077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007241740A Abandoned JP2009076520A (ja) 2007-09-19 2007-09-19 露光装置

Country Status (4)

Country Link
US (1) US20090073399A1 (enExample)
JP (1) JP2009076520A (enExample)
KR (2) KR20090030223A (enExample)
TW (1) TW200929331A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107561867A (zh) * 2016-06-30 2018-01-09 上海微电子装备（集团）股份有限公司 一种浸没式光刻机和一种浸液流场中气泡去除方法
CN110658686B (zh) * 2018-06-29 2021-07-02 上海微电子装备（集团）股份有限公司 清除装置、光刻设备和光刻方法
CN113189849B (zh) * 2021-04-22 2023-08-11 中国科学院光电技术研究所 一种近场光刻浸没系统及其浸没单元和接口模组

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
CN101487981A (zh) * 2004-10-13 2009-07-22 株式会社尼康 曝光装置、曝光方法及组件制造方法
US7755740B2 (en) * 2007-02-07 2010-07-13 Canon Kabushiki Kaisha Exposure apparatus
US8237911B2 (en) * 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine

Also Published As

Publication number Publication date
KR20110003290A (ko) 2011-01-11
KR20090030223A (ko) 2009-03-24
TW200929331A (en) 2009-07-01
US20090073399A1 (en) 2009-03-19

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