JP2009055006A - Light emitting device, and method of manufacturing the same - Google Patents

Light emitting device, and method of manufacturing the same Download PDF

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JP2009055006A
JP2009055006A JP2008183817A JP2008183817A JP2009055006A JP 2009055006 A JP2009055006 A JP 2009055006A JP 2008183817 A JP2008183817 A JP 2008183817A JP 2008183817 A JP2008183817 A JP 2008183817A JP 2009055006 A JP2009055006 A JP 2009055006A
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light emitting
emitting device
light
conductive wire
metal film
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JP5245594B2 (en
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Masaki Hayashi
林  正樹
Takeshi Okada
雄志 岡田
Koji Kuroda
耕司 黒田
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Nichia Corp
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Nichia Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a light emitting device which effectively suppresses optical absorption by a conductive wire and having a high light emitting extraction efficiency. <P>SOLUTION: A light emitting device 1 has a conductive wire 40 electrically connecting an electrode 12 of a light emitting element 10 and conductive member 30. A surface of the conductive wire 40 is covered with a metal film 70 at a connecting part of at least one of the electrode 12 of the light emitting element 10 and conductive member 30 and the conductive wire 40. At a peak wavelength of a light-emission of the light emitting element 10, a reflection factor of the metal film 70 is higher that of the conductive wire 40. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、発光素子を含む発光装置に関し、特に、発光素子からの発光の取出し効率の高い発光装置に関する。   The present invention relates to a light-emitting device including a light-emitting element, and more particularly to a light-emitting device having high extraction efficiency of light emission from the light-emitting element.

発光装置の取出し効率を高める方法の1つとして、発光素子を実装するパッケージ内の反射率を高めることが積極的に行われている。反射率を高める1つの手段として、発光素子からの発光が照射される面に、金属膜を施すことが知られている(例えば、特許文献1参照)。特許文献1の発光装置では、ヒートシンクの発光素子実装面に銀めっきを施すことにより実装面を光反射部材として使用し、発光素子からの発光の取出し効率を向上させている。   As one of the methods for increasing the extraction efficiency of the light emitting device, increasing the reflectance in the package on which the light emitting element is mounted has been actively performed. As one means for increasing the reflectance, it is known to apply a metal film to a surface irradiated with light emitted from a light emitting element (see, for example, Patent Document 1). In the light emitting device of Patent Document 1, the mounting surface is used as a light reflecting member by applying silver plating to the light emitting element mounting surface of the heat sink, thereby improving the light extraction efficiency of the light emitting element.

発光装置に発光素子を実装する場合には、Cu等の金属板から成るリード電極を備えたパッケージに発光素子をダイボンディングし、Au等の導電ワイヤによって発光素子とリード電極とをワイヤボンディングする。このとき、発光素子に青色発光素子を使用すると、CuやAuが青色光を吸収して発光装置の取出し効率が低下する問題がある。特に、導電ワイヤは発光素子に直接接続され、且つ発光素子の発光面側を横断して張り渡されるため、導電ワイヤの光吸収は無視できない。導電ワイヤを青色光の反射率の高い金属(例えばAg)から形成すれば、導電ワイヤの光吸収を大幅に減少できるが、発光素子の電極及びリード電極との接合性が低く、十分な接合強度が得られない。   When the light emitting element is mounted on the light emitting device, the light emitting element is die-bonded to a package having a lead electrode made of a metal plate such as Cu, and the light emitting element and the lead electrode are wire-bonded with a conductive wire such as Au. At this time, when a blue light emitting element is used as the light emitting element, there is a problem that Cu or Au absorbs blue light and the extraction efficiency of the light emitting device is lowered. In particular, since the conductive wire is directly connected to the light emitting element and stretched across the light emitting surface side of the light emitting element, the light absorption of the conductive wire cannot be ignored. If the conductive wire is formed of a metal having high blue light reflectance (for example, Ag), the light absorption of the conductive wire can be greatly reduced, but the bonding property between the electrode of the light emitting element and the lead electrode is low and sufficient bonding strength is obtained. Cannot be obtained.

半導体装置のワイヤボンディングに使用できる導電ワイヤとして、芯材と、芯材を被覆する被覆材とから成る複合ボンディングワイヤが知られている(例えば、特許文献2〜4参照)。これらの複合ワイヤでは、芯材に高強度の材料を使用して、複合ワイヤの機械的強度を高め、そして被覆材にボンディングしやすい導電材料を使用して、接合強度と導電性を確保している。   As a conductive wire that can be used for wire bonding of a semiconductor device, a composite bonding wire including a core material and a covering material that covers the core material is known (see, for example, Patent Documents 2 to 4). These composite wires use a high-strength material for the core material to increase the mechanical strength of the composite wire, and use a conductive material that is easy to bond to the coating material to ensure bonding strength and conductivity. Yes.

そこで、発光装置に複合ワイヤを使用して、十分な接合強度を維持しつつ導電ワイヤによる光吸収を抑制することが考えられる。例えば、Auから成る芯材をAgから成る被覆材で被覆した複合ワイヤであれば、Auによって接合強度を確保し、Agによって青色光を反射することができる。
特開2006−324438号公報 特開平3−32033号公報 特開平7−66235号公報 特開平10−130882号公報
Therefore, it is conceivable to use a composite wire for the light emitting device to suppress light absorption by the conductive wire while maintaining sufficient bonding strength. For example, in the case of a composite wire in which a core material made of Au is coated with a coating material made of Ag, bonding strength can be ensured by Au and blue light can be reflected by Ag.
JP 2006-324438 A JP-A-3-32033 Japanese Patent Laid-Open No. 7-66235 JP-A-10-130882

複合ワイヤを使用して発光装置を製造した場合、発光装置の光取出し効率が期待されたほどには増加しない、という課題がある。   When a light emitting device is manufactured using a composite wire, there is a problem that the light extraction efficiency of the light emitting device does not increase as much as expected.

複合ワイヤで図14のようにボールボンディングの第1ボンド150を形成する場合、Auから成る芯材142をAgから成る被覆材144で被覆した複合ワイヤ140を使用したとしても、第1ボンド150の表面に被覆部材144が存在しない。これは、第1ボンド150の形成の際に複合ワイヤ140の端部を溶融してボール状にしたとき、芯材142と被覆部材144とが溶融して混合されるためである。図のように、発光素子110の電極112に第1ボンド150を接合すると、第1ボンド150の表面に露出したAuが発光素子110の近傍で光吸収を起こし、光取出し効率を効果的に高めることができない。   When the first bond 150 of the ball bonding is formed with the composite wire as shown in FIG. 14, even if the composite wire 140 in which the core material 142 made of Au is covered with the coating material 144 made of Ag is used, There is no covering member 144 on the surface. This is because the core material 142 and the covering member 144 are melted and mixed when the end portion of the composite wire 140 is melted into a ball shape when the first bond 150 is formed. As shown in the figure, when the first bond 150 is bonded to the electrode 112 of the light emitting element 110, Au exposed on the surface of the first bond 150 causes light absorption in the vicinity of the light emitting element 110, and effectively increases the light extraction efficiency. I can't.

図15に示したボールボンディングの第2ボンド160は、複合ワイヤ140をリード電極130に加熱押圧して接合されるが、その際に押圧部分の被覆材144が剥離して芯材142が露出する可能性もある。   The second bond 160 of the ball bonding shown in FIG. 15 is bonded by heating and pressing the composite wire 140 to the lead electrode 130. At that time, the covering material 144 at the pressing portion is peeled off and the core material 142 is exposed. There is a possibility.

そこで、本発明では、導電ワイヤによる光吸収を効果的に抑制した、発光の取出し効率の高い発光装置及びその製造方法を提供することを目的とする。   Accordingly, an object of the present invention is to provide a light emitting device with high light emission extraction efficiency, in which light absorption by a conductive wire is effectively suppressed, and a manufacturing method thereof.

本発明の発光装置は、発光素子の電極と導電部材とを電気的に接続する導電ワイヤを有する発光装置であって、前記発光素子の電極及び前記導電部材の少なくとも一方と、前記導電ワイヤと、の接合部分における前記導電ワイヤの表面が金属膜で被覆されており、前記発光素子の発光ピーク波長において、前記導電ワイヤの反射率よりも、前記金属膜の反射率が高いことを特徴とする。   The light-emitting device of the present invention is a light-emitting device having a conductive wire that electrically connects an electrode of a light-emitting element and a conductive member, wherein at least one of the electrode of the light-emitting element and the conductive member, the conductive wire, The surface of the conductive wire in the joint portion is covered with a metal film, and the reflectance of the metal film is higher than the reflectance of the conductive wire at the emission peak wavelength of the light emitting element.

この発光装置では、導電ワイヤの接合部分に達した光は、導電ワイヤに比べて反射率の高い金属膜によって反射されるので、導電ワイヤによる光吸収が抑制され、発光装置の光取出し効率を高めることができる。   In this light emitting device, the light reaching the joint portion of the conductive wire is reflected by a metal film having a higher reflectance than the conductive wire, so that light absorption by the conductive wire is suppressed and the light extraction efficiency of the light emitting device is increased. be able to.

また、本発明の発光装置の製造方法は、発光素子の電極と導電部材とを電気的に接続する導電ワイヤを有する発光装置の製造方法であって、前記発光素子の電極と前記導電部材とを前記導電ワイヤで接続するワイヤボンディング工程と、前記発光素子の電極、前記導電部材、及び前記導電ワイヤを電気めっき法により金属膜で被覆する電気めっき工程と、を備えている。   The method for manufacturing a light emitting device of the present invention is a method for manufacturing a light emitting device having a conductive wire for electrically connecting an electrode of a light emitting element and a conductive member, and the electrode of the light emitting element and the conductive member are connected to each other. A wire bonding step of connecting with the conductive wire; and an electroplating step of covering the electrode of the light emitting element, the conductive member, and the conductive wire with a metal film by an electroplating method.

この製造方法ではワイヤボンディング工程後に電気めっき工程を行うので、導電ワイヤの接合部分の表面に金属膜を形成することができる。また、電気めっき法を利用することにより、導体ではない発光素子の表面には金属膜を形成することはなく、発光素子の取出し効率を金属膜により低下させる恐れがない。   In this manufacturing method, since the electroplating step is performed after the wire bonding step, a metal film can be formed on the surface of the joint portion of the conductive wire. Further, by using the electroplating method, a metal film is not formed on the surface of the light-emitting element that is not a conductor, and there is no fear that the extraction efficiency of the light-emitting element is reduced by the metal film.

本発明の発光装置よれば、導電ワイヤによる光の吸収が低減されるので、発光装置の取出し効率を高めることができる。また、本発明の製造方法によれば、導電ワイヤの表面に効率よく金属膜を形成することができる。   According to the light emitting device of the present invention, the light absorption by the conductive wire is reduced, so that the extraction efficiency of the light emitting device can be increased. Moreover, according to the manufacturing method of this invention, a metal film can be efficiently formed on the surface of a conductive wire.

<実施の形態1>
図1及び図2は本実施の形態に係る発光装置1であり、リードフレームをベースとしたパッケージを備えたタイプを例示している。パッケージ20の凹部22に、発光素子10がフェースアップ実装されている。また、パッケージ20には、導電部材として一対のリード電極(第1リード電極30、第2リード電極32)が貫通している。リード電極30、32の一端部は、凹部22内に露出して内部導電部(リード端子)301、321を構成している。また、リード電極30、32の他端部は、パッケージ20を貫通して外部導電部(外部端子)302、322を構成している。発光素子10に形成された一対の電極(図示せず)と、一対のリード端子(第1リード端子301、第2リード端子322)とは、それぞれ導電ワイヤ40によって電気的に接続されている。
<Embodiment 1>
1 and 2 illustrate a light emitting device 1 according to the present embodiment, which is of a type having a package based on a lead frame. The light emitting element 10 is mounted face up in the recess 22 of the package 20. The package 20 has a pair of lead electrodes (first lead electrode 30 and second lead electrode 32) penetrating therethrough as a conductive member. One end portions of the lead electrodes 30 and 32 are exposed in the recess 22 and constitute internal conductive portions (lead terminals) 301 and 321. Further, the other end portions of the lead electrodes 30 and 32 pass through the package 20 and constitute external conductive portions (external terminals) 302 and 322. A pair of electrodes (not shown) formed on the light emitting element 10 and a pair of lead terminals (first lead terminal 301 and second lead terminal 322) are electrically connected by a conductive wire 40, respectively.

図3は、発光素子10の電極12と導電ワイヤ40との接合部分(図2の符号B)を拡大した断面図であり、図4は第1リード端子301と導電ワイヤ40との接合部分(図2の符号C)を拡大した断面図である。   FIG. 3 is an enlarged cross-sectional view of a joint portion (reference numeral B in FIG. 2) between the electrode 12 and the conductive wire 40 of the light-emitting element 10, and FIG. 4 is a joint portion between the first lead terminal 301 and the conductive wire 40 ( It is sectional drawing to which the code | symbol C) of FIG. 2 was expanded.

図3に図示した接合部分は、ボールボンディングの第1ボンド50である。ここで本実施の形態では、第1ボンド50の表面及び発光素子10の電極12の表面が金属膜70で被覆されている点で、従来の複合ワイヤ140を使用した場合の第1ボンド150及び発光素子110の電極112とは異なっている。このようにして、本発明の発光装置1では、導電ワイヤ40による光の吸収を抑えている。   The bonding portion illustrated in FIG. 3 is a first bond 50 of ball bonding. Here, in the present embodiment, the surface of the first bond 50 and the surface of the electrode 12 of the light emitting element 10 are covered with the metal film 70. It is different from the electrode 112 of the light emitting element 110. Thus, in the light emitting device 1 of the present invention, light absorption by the conductive wire 40 is suppressed.

第1ボンド50は、導電ワイヤ40の端部を溶融してボール状にした後に電極12に押圧して接合されているので、ボールをつぶしたような形状になっている。第1ボンド50の表面は、金属膜70によって被覆されている。   Since the first bond 50 is bonded to the electrode 12 after melting the end of the conductive wire 40 to form a ball, the first bond 50 is shaped like a crushed ball. The surface of the first bond 50 is covered with a metal film 70.

本発明の発光装置1では、金属膜70の反射率、特に発光素子10の発光ピーク波長における金属膜70の反射率を、導電ワイヤ40の反射率よりも高く設定している。これによって、第1ボンド50に届いた光が金属膜70により反射され、その反射光は発光装置から取り出すことができるので、発光装置の光取出し効率が向上する。すなわち、本発明の発光装置1は、第1ボンド50での光の吸収を減少させると共に、吸収されなかった光を反射して発光装置1から取り出すことができる。その2つの作用により、発光装置1の光取出し効率が向上する。また、金属膜70が導電ワイヤ40の表面にも被覆されていれば、発光装置1の光取出し効率がさらに向上するので好ましい。特に、金属膜70が発光素子10の電極12の表面から、第1ボンド50の表面及び接合面54の外縁56を経て導電ワイヤ40の表面まで、連続的に被覆されているとより好ましい。連続した金属膜70が形成されると、発光素子10の電極12が金属膜70よりも発光素子10の光を吸収しやすい場合には、電極12による光吸収が減少して発光装置1の光取出し効率がより向上する。また、連続した金属膜70が第1ボンド50と電極12との接合面54の外縁56を被覆するので、接合面54の接合強度が補強されて、導電ワイヤ40の剥離防止できる傾向にある。   In the light emitting device 1 of the present invention, the reflectance of the metal film 70, particularly the reflectance of the metal film 70 at the light emission peak wavelength of the light emitting element 10 is set higher than the reflectance of the conductive wire 40. Thereby, the light reaching the first bond 50 is reflected by the metal film 70, and the reflected light can be extracted from the light emitting device, so that the light extraction efficiency of the light emitting device is improved. That is, the light emitting device 1 of the present invention can reduce the absorption of light by the first bond 50 and can reflect the light that has not been absorbed and extract it from the light emitting device 1. Due to these two actions, the light extraction efficiency of the light emitting device 1 is improved. Further, it is preferable that the metal film 70 is also coated on the surface of the conductive wire 40 because the light extraction efficiency of the light emitting device 1 is further improved. In particular, it is more preferable that the metal film 70 is continuously covered from the surface of the electrode 12 of the light emitting element 10 to the surface of the conductive wire 40 through the surface of the first bond 50 and the outer edge 56 of the bonding surface 54. When the continuous metal film 70 is formed, when the electrode 12 of the light emitting element 10 absorbs light of the light emitting element 10 more easily than the metal film 70, light absorption by the electrode 12 is reduced and the light of the light emitting device 1 is reduced. The extraction efficiency is further improved. Further, since the continuous metal film 70 covers the outer edge 56 of the bonding surface 54 between the first bond 50 and the electrode 12, the bonding strength of the bonding surface 54 is reinforced, and the conductive wire 40 tends to be prevented from peeling off.

図4に図示した接合部分は、ボールボンディングの第2ボンド60である。ここで本実施の形態では、端面62及び第2ボンド60の表面が金属膜70に被覆されて導電ワイヤが露出していない点が、従来の複合ワイヤを使用した場合の第2ボンド160と異なっている。このように、第2ボンド60において、通常は露出される端面62を含め、接合部分全体が金属膜70で覆われているので、導電ワイヤ40による光の吸収を抑えつつ、光を反射して発光装置1から取り出すことができる。   4 is a second bond 60 of ball bonding. Here, in the present embodiment, the surface of the end face 62 and the second bond 60 is covered with the metal film 70 and the conductive wire is not exposed, which is different from the second bond 160 in the case where the conventional composite wire is used. ing. As described above, in the second bond 60, the entire bonding portion including the end face 62 that is normally exposed is covered with the metal film 70, so that light is reflected while suppressing light absorption by the conductive wire 40. It can be taken out from the light emitting device 1.

第2ボンド60は、連続した導電ワイヤ40の所定位置を第1リード端子301に加熱押圧して接合し、その後に導電ワイヤ40を、接合部分の近傍で且つ第1ボンド50より遠位側で切断して形成される。そのため、第1ボンド50とは異なり、第2ボンド60の導電ワイヤ40は押しつぶされて変形している。また、導電ワイヤ40の端部61が第2ボンド60から突出し、端面62が形成される。   The second bond 60 is bonded by heating and pressing a predetermined position of the continuous conductive wire 40 to the first lead terminal 301, and then the conductive wire 40 is positioned near the bonded portion and distal to the first bond 50. It is formed by cutting. Therefore, unlike the first bond 50, the conductive wire 40 of the second bond 60 is crushed and deformed. Further, the end portion 61 of the conductive wire 40 protrudes from the second bond 60, and the end face 62 is formed.

本発明の発光装置1では、発光素子10の発光ピーク波長における金属膜70の反射率を、導電ワイヤ40の反射率よりも高く設定している。これによって、第2ボンド60に届いた光が金属膜70により反射され、その反射光は発光装置から取り出すことができるので、発光装置の光取出し効率が向上する。すなわち、本発明の発光装置1は、第2ボンド60での光の吸収を減少させると共に、吸収されなかった光を反射して発光装置1から取り出すことができる。その2つの作用により、発光装置1の光取出し効率が向上する。また、金属膜70が導電ワイヤ40の表面にも被覆されていれば、発光装置1の光取出し効率がさらに向上するので好ましい。特に、金属膜70が発光素子10の電極12の表面から、第2ボンド50の接合面64の外縁66を経て導電ワイヤ40の表面まで、連続的に被覆されているとより好ましい。連続した金属膜70が第2ボンド60と第1リード端子301との接合面64の外縁66を被覆するので、接合面54の接合強度が補強されて、導電ワイヤ40の剥離防止できる傾向にある。   In the light emitting device 1 of the present invention, the reflectance of the metal film 70 at the light emission peak wavelength of the light emitting element 10 is set higher than the reflectance of the conductive wire 40. Thereby, the light reaching the second bond 60 is reflected by the metal film 70, and the reflected light can be extracted from the light emitting device, so that the light extraction efficiency of the light emitting device is improved. That is, the light emitting device 1 of the present invention can reduce the absorption of light by the second bond 60 and can reflect the light that has not been absorbed and extract it from the light emitting device 1. Due to these two actions, the light extraction efficiency of the light emitting device 1 is improved. Further, it is preferable that the metal film 70 is also coated on the surface of the conductive wire 40 because the light extraction efficiency of the light emitting device 1 is further improved. In particular, it is more preferable that the metal film 70 is continuously covered from the surface of the electrode 12 of the light emitting element 10 to the surface of the conductive wire 40 through the outer edge 66 of the bonding surface 64 of the second bond 50. Since the continuous metal film 70 covers the outer edge 66 of the bonding surface 64 between the second bond 60 and the first lead terminal 301, the bonding strength of the bonding surface 54 is reinforced, and the conductive wire 40 tends to be prevented from peeling off. .

以上のように、本発明の発光装置1では、導電ワイヤ40の端面62を金属膜70で被覆して、端面62での光吸収を減少して発光装置1の発光効率を向上させることができる。すなわち、図15のような従来の発光装置において、複合ワイヤ140の端面162が露出して発光素子からの光が吸収されていた点を解決できる。   As described above, in the light emitting device 1 of the present invention, the end face 62 of the conductive wire 40 is covered with the metal film 70, and light absorption at the end face 62 can be reduced to improve the light emission efficiency of the light emitting device 1. . That is, in the conventional light emitting device as shown in FIG. 15, the end face 162 of the composite wire 140 is exposed and the light from the light emitting element is absorbed.

また、図3及び図4のように、金属膜70を、第1ボンド50と電極12との接合面54、及び導電ワイヤ40と第1リード端子301との接合面64には形成しない形態にすれば、第1ボンド50及び第2ボンド60の接合強度を通常のワイヤボンディングと同等に高くすることができる。   Further, as shown in FIGS. 3 and 4, the metal film 70 is not formed on the bonding surface 54 between the first bond 50 and the electrode 12 and the bonding surface 64 between the conductive wire 40 and the first lead terminal 301. By doing so, the bonding strength of the first bond 50 and the second bond 60 can be made as high as that of normal wire bonding.

発光装置1に使用する発光素子10が発光波長400nm〜530nmのものであると、取出し効率の向上率が顕著である。これは、一般的な導電ワイヤ40やリード電極30、32の材料に、波長400nm〜530nm(青紫〜緑)の光に対する吸収率の高い金属(例えばCuやAu)が使用されているので、金属膜70によって被覆することによる光吸収の減少量が顕著になるからである。この光取出し効率向上の効果は、青色発光素子を励起源とした他の色の発光装置、例えば青色発光ダイオードと黄色蛍光体とを組み合わせた白色発光装置などにも有効である。   When the light emitting element 10 used in the light emitting device 1 has a light emission wavelength of 400 nm to 530 nm, the improvement rate of the extraction efficiency is remarkable. This is because a metal (for example, Cu or Au) having a high absorptance with respect to light having a wavelength of 400 nm to 530 nm (blue purple to green) is used as the material of the general conductive wire 40 and the lead electrodes 30 and 32. This is because the amount of decrease in light absorption due to coating with the film 70 becomes significant. The effect of improving the light extraction efficiency is also effective for light emitting devices of other colors using a blue light emitting element as an excitation source, such as a white light emitting device combining a blue light emitting diode and a yellow phosphor.

上述のように、金属膜70に使用する金属材料は、発光素子10からの光に対する反射率の高いものが利用されるが、特に、反射率が80%以上の材料であれば、一般的に入手可能な材料で且つ光取出し効率が十分に向上できるので好ましい。具体的には、Ag又はAg合金が好適である。Ag又はAg合金は可視光の波長領域全般において反射率が高く、発光素子10の発光色によらず適用しやすい。また、入手しやすく、金属膜70の形成も容易である利点もある。反射率の点ではAgが適しており、硫化等による変色への耐性の点ではAg合金が適している。   As described above, as the metal material used for the metal film 70, a material having a high reflectance with respect to the light from the light emitting element 10 is used. In particular, a material having a reflectance of 80% or more is generally used. This is preferable because it is an available material and the light extraction efficiency can be sufficiently improved. Specifically, Ag or an Ag alloy is preferable. Ag or an Ag alloy has a high reflectance in the entire visible light wavelength region, and is easy to apply regardless of the light emission color of the light emitting element 10. Further, there are advantages that it is easy to obtain and the metal film 70 can be easily formed. Ag is suitable in terms of reflectance, and an Ag alloy is suitable in terms of resistance to discoloration due to sulfuration or the like.

金属膜70に、化学反応により変色する材料(例えばAg)を使用する場合には、コーティング膜を用いて金属膜70の変色を防止するのが好ましい。金属膜70の変色による光吸収の急激な増加が抑制されるので、発光装置1は、長期間にわたって高い取出し効率を維持できる。   When a material (for example, Ag) that changes color due to a chemical reaction is used for the metal film 70, it is preferable to prevent the color change of the metal film 70 using a coating film. Since a rapid increase in light absorption due to the discoloration of the metal film 70 is suppressed, the light emitting device 1 can maintain high extraction efficiency over a long period.

金属膜70の変色の主な原因は、有機ガスや水分を含んだ外気が、パッケージ20の外側からパッケージ20の凹部22内に侵入して、金属膜70と接触することである。外気は、パッケージ20とリードフレーム30、32との隙間を通って、パッケージ20と封止樹脂90との隙間を通って、及び/又は封止樹脂90を透過して、凹部22内に侵入する。そこで、変色を抑える1つの方法では、金属膜70の表面をコーティング膜で被覆して、金属膜70を外気から遮断する。また、別の方法では、パッケージ20及び封止樹脂90の表面92をコーティング膜で被覆して、外気がパッケージ20の凹部22に侵入するのを抑制する。   The main cause of the discoloration of the metal film 70 is that outside air containing organic gas and moisture enters the recess 22 of the package 20 from the outside of the package 20 and comes into contact with the metal film 70. The outside air enters the recess 22 through the gap between the package 20 and the lead frames 30 and 32, through the gap between the package 20 and the sealing resin 90, and / or through the sealing resin 90. . Therefore, in one method of suppressing discoloration, the surface of the metal film 70 is covered with a coating film to block the metal film 70 from the outside air. In another method, the package 20 and the surface 92 of the sealing resin 90 are covered with a coating film to prevent outside air from entering the recess 22 of the package 20.

以下に、コーティング膜の被覆例を、図を参照しながら詳述する。
図5〜図8は、金属膜(図示せず)の表面をコーティング膜72で被覆する例を示している。これらの例では、金属膜の変色を防止する効果だけでなく、金属膜のマイグレーションの発生を抑制できる効果も期待できる。よって、金属膜がマイグレーションを起こしやすい金属材料(例えばAgやAg合金等)から形成されている場合でも、短絡による発光装置1の故障を低減できると期待される。
Below, the coating example of a coating film is explained in full detail, referring a figure.
5 to 8 show examples in which the surface of a metal film (not shown) is covered with a coating film 72. In these examples, not only the effect of preventing discoloration of the metal film but also the effect of suppressing the occurrence of migration of the metal film can be expected. Therefore, even when the metal film is formed of a metal material that easily causes migration (for example, Ag or Ag alloy), it is expected that failure of the light-emitting device 1 due to a short circuit can be reduced.

図5に示す発光装置1では、コーティング膜72は、金属膜(図示せず)を直接被覆している。これにより、金属膜を外気から遮断できる。この発光装置1は、発光素子10がコーティング膜72に被覆されていないので、発光素子10の発光がコーティング膜72による影響(吸収や反射)を受けない。よって、光の取り出し効率が低下しない点で有利である。   In the light emitting device 1 shown in FIG. 5, the coating film 72 directly covers a metal film (not shown). Thereby, a metal film can be interrupted | blocked from external air. In the light emitting device 1, since the light emitting element 10 is not covered with the coating film 72, the light emission of the light emitting element 10 is not affected (absorption or reflection) by the coating film 72. Therefore, it is advantageous in that the light extraction efficiency does not decrease.

図6に示す発光装置1のコーティング膜72は、さらに発光素子10の表面も被覆している。この発光装置1は、発光素子10を外気から遮断できるので、発光素子10が劣化しにくい点で有利である。コーティング膜72は、発光素子10の発光波長における透過率が高い(例えば70%以上)材料から形成するのが望ましい。なお、図6では、パッケージ20の凹部22の底面221から露出したパッケージ20の一部(リード端子301、321の間から露出している)や、ブリード防止壁24はコーティング膜72で被覆されていないが、それらをコーティング膜72で被覆してもよい。   The coating film 72 of the light emitting device 1 shown in FIG. 6 further covers the surface of the light emitting element 10. Since the light emitting device 1 can block the light emitting element 10 from the outside air, it is advantageous in that the light emitting element 10 is hardly deteriorated. The coating film 72 is preferably formed from a material having a high transmittance (for example, 70% or more) at the emission wavelength of the light emitting element 10. In FIG. 6, a part of the package 20 exposed from the bottom surface 221 of the recess 22 of the package 20 (exposed from between the lead terminals 301 and 321) and the bleed prevention wall 24 are covered with a coating film 72. However, they may be covered with the coating film 72.

図7に示す発光装置1のコーティング膜72は、さらにパッケージ20の凹部22の内面(側面222)も被覆している。つまり、コーティング膜72は、凹部22の内面と、リード端子301、321の表面とに渡って連続的に被覆されている。これにより、パッケージ20の凹部22の側面222と、リード端子301、321との境界23は、コーティング膜72で覆われる。よって、外気が、パッケージ20とリード電極30、32との界面に侵入しても、パッケージ20の凹部22内に侵入することを防止できる。   The coating film 72 of the light emitting device 1 shown in FIG. 7 also covers the inner surface (side surface 222) of the recess 22 of the package 20. That is, the coating film 72 is continuously covered over the inner surface of the recess 22 and the surfaces of the lead terminals 301 and 321. As a result, the boundary 23 between the side surface 222 of the recess 22 of the package 20 and the lead terminals 301 and 321 is covered with the coating film 72. Therefore, even if outside air enters the interface between the package 20 and the lead electrodes 30 and 32, it can be prevented from entering the recess 22 of the package 20.

図8に示す発光装置1のコーティング膜72は、さらにパッケージ20の上面26、パッケージ20の外面28、及びパッケージ20の外部に露出した外部端子302、322も被覆している。つまり、コーティング膜72は、パッケージ20の外面28と外部端子302、322の表面とに渡って連続的に被覆されている。これにより、パッケージ20の外面28と外部端子302、322との境界29は、コーティング膜72で覆われる。よって、外気が、境界29から、パッケージ20とリード電極30、32との界面に侵入することを防止できる。
図8では、外部端子302、322の表面の一部がコーティング膜72により被覆されている、すなわち、外部端子302、322の表面の残りの部分はコーティング膜72で被覆されていない。しかしながら、外部端子302、322の表面全体をコーティング膜72で覆うこともできる。このとき、コーティング膜72の膜厚は、発光装置を実装するのに問題のない厚さである5μm以下、より好ましくは3μm以下に設定するのが良い。
The coating film 72 of the light emitting device 1 shown in FIG. 8 further covers the upper surface 26 of the package 20, the outer surface 28 of the package 20, and the external terminals 302 and 322 exposed to the outside of the package 20. That is, the coating film 72 is continuously covered over the outer surface 28 of the package 20 and the surfaces of the external terminals 302 and 322. As a result, the boundary 29 between the outer surface 28 of the package 20 and the external terminals 302 and 322 is covered with the coating film 72. Therefore, it is possible to prevent outside air from entering the interface between the package 20 and the lead electrodes 30 and 32 from the boundary 29.
In FIG. 8, a part of the surface of the external terminals 302 and 322 is covered with the coating film 72, that is, the remaining part of the surface of the external terminals 302 and 322 is not covered with the coating film 72. However, the entire surface of the external terminals 302 and 322 can be covered with the coating film 72. At this time, the thickness of the coating film 72 is preferably set to 5 μm or less, more preferably 3 μm or less, which is a thickness with which there is no problem in mounting the light emitting device.

図9は、封止樹脂90の表面92をコーティング膜72で被覆する例を示している。例えばガス透過性のある封止樹脂(例えばシリコーン樹脂)90を用いた場合でも、金属膜(図示せず)を外気から遮断できる。特に、図9に示すように、コーティング膜72が、封止樹脂90の表面92だけでなく、パッケージ20の上面26まで連続して覆っているのが好ましい。これにより、外気が、境界94から、封止樹脂90とパッケージ20との界面に侵入することを防止できる。なお、コーティング膜72は、発光素子10の発光波長における透過率が高い(例えば70%以上)材料から形成するのが望ましい。
さらに、図8と同様に、コーティング膜72が、パッケージ20の外面28と外部端子302、322の表面とに渡って連続的に被覆されているのが好ましい。これにより、外気が、境界29から、パッケージ20とリード電極30、32との界面に侵入することを防止できる。
なお、図8の発光装置1と同様に、図9の発光装置1も、外部端子302、322の表面全体をコーティング膜72で覆うこともできる。このとき、コーティング膜72の膜厚は、発光装置を実装するのに問題のない厚さである5μm以下、より好ましくは3μm以下に設定するのが良い。
FIG. 9 shows an example in which the surface 92 of the sealing resin 90 is covered with the coating film 72. For example, even when a gas-permeable sealing resin (for example, silicone resin) 90 is used, the metal film (not shown) can be shielded from the outside air. In particular, as shown in FIG. 9, it is preferable that the coating film 72 continuously covers not only the surface 92 of the sealing resin 90 but also the upper surface 26 of the package 20. Thereby, it is possible to prevent outside air from entering the interface between the sealing resin 90 and the package 20 from the boundary 94. The coating film 72 is preferably formed from a material having a high transmittance (for example, 70% or more) at the emission wavelength of the light emitting element 10.
Further, as in FIG. 8, it is preferable that the coating film 72 is continuously coated over the outer surface 28 of the package 20 and the surfaces of the external terminals 302 and 322. This prevents outside air from entering the interface between the package 20 and the lead electrodes 30 and 32 from the boundary 29.
As with the light emitting device 1 in FIG. 8, the light emitting device 1 in FIG. 9 can also cover the entire surface of the external terminals 302 and 322 with the coating film 72. At this time, the thickness of the coating film 72 is preferably set to 5 μm or less, more preferably 3 μm or less, which is a thickness with which there is no problem in mounting the light emitting device.

本発明の光取出し効果の向上は、複数の発光素子10を備えた構成において、より効果的である。発光素子10の数が多くなると、使用される導電ワイヤ40の全長が長くなるので、導電ワイヤ40の被覆による光吸収の抑制がより効果的になるからである。   The improvement of the light extraction effect of the present invention is more effective in the configuration including the plurality of light emitting elements 10. This is because when the number of the light emitting elements 10 is increased, the entire length of the conductive wire 40 to be used is increased, so that the suppression of light absorption by the coating of the conductive wire 40 becomes more effective.

以下に、本実施の形態の発光装置1の製造工程について説明する。
(1.パッケージ20の成形)
図10に示すように、金属箔を切り抜き加工して作製したリードフレーム34に複数のパッケージ20を形成する。リードフレーム34には、第1リード端子301及び第2リード端子322の組みが複数形成されている。パッケージ20は、一組のリード端子301、321を内包するように形成される。樹脂から成るパッケージ20では、リードフレーム34をパッケージ20用の金型に挟持し、モールド成形等の樹脂成形法によってパッケージ20を成形する。
Below, the manufacturing process of the light-emitting device 1 of this Embodiment is demonstrated.
(1. Molding of package 20)
As shown in FIG. 10, a plurality of packages 20 are formed on a lead frame 34 produced by cutting a metal foil. A plurality of sets of first lead terminals 301 and second lead terminals 322 are formed on the lead frame 34. The package 20 is formed so as to enclose a pair of lead terminals 301 and 321. In the package 20 made of resin, the lead frame 34 is sandwiched between molds for the package 20, and the package 20 is molded by a resin molding method such as molding.

(2.ダイボンディング工程)
次に、第2リード端子321に発光素子10をダイボンディングする。ダイボンディングには、例えば、Au−Snなどのハンダ材料、又はシリコーン、変性シリコーン接着剤等の適切なダイボンド材が使用される。図1のように第2リード端子321上にブリード防止壁24を備えていると、粘度の低いダイボンド材が第2リード端子321全体に広がるのを防止できる。
(2. Die bonding process)
Next, the light emitting element 10 is die-bonded to the second lead terminal 321. For die bonding, for example, a solder material such as Au—Sn, or an appropriate die bonding material such as silicone or a modified silicone adhesive is used. If the bleed prevention wall 24 is provided on the second lead terminal 321 as shown in FIG. 1, it is possible to prevent the die bond material having a low viscosity from spreading over the entire second lead terminal 321.

(3.ワイヤボンディング工程)
ダイボンディングされた発光素子10とリード端子301、321とを、導電ワイヤ40でワイヤボンディングする。図1に例示した発光素子10は、発光面側に一対の電極が形成されており、各電極とリード端子301、321の各々とを導電ワイヤ40で接続する。ワイヤボンディングの方法としては、ボールボンディングやウェッジボンディングが利用できる。ボールボンディングの場合には、図1〜図4のように、発光素子10の電極12に第1ボンド50を接合し、リード端子301、321に第2ボンド60を接合するのが一般的である。
(3. Wire bonding process)
The die-bonded light emitting element 10 and the lead terminals 301 and 321 are wire-bonded with the conductive wire 40. In the light emitting element 10 illustrated in FIG. 1, a pair of electrodes is formed on the light emitting surface side, and each electrode and each of the lead terminals 301 and 321 are connected by a conductive wire 40. As a method of wire bonding, ball bonding or wedge bonding can be used. In the case of ball bonding, as shown in FIGS. 1 to 4, the first bond 50 is generally bonded to the electrode 12 of the light emitting element 10, and the second bond 60 is bonded to the lead terminals 301 and 321. .

(4.電気めっき工程)
図11に示すように、発光素子10を実装したリードフレーム34を、パッケージ20ごと電気めっき用のめっき液80に浸漬する。めっき液80中に配置した対向電極82と、リードフレーム34との間に電源装置84から電圧を印加して電気めっきを行う。全てのリード電極30、32がリードフレーム34を介して電気的に接続されているので、リードフレーム34と対向電極82との間に電圧を印加すれば、リード電極30、32とを等電位できる。さらに、リード電極30、32のリード端子301、321にワイヤボンドされた導電ワイヤ40や、導電ワイヤ40が接続された発光素子10の電極12も、リード端子301、321と等電位になる。よって、1つのパッケージ20に備えられた発光素子10の電極12、リード電極30、32及び前記導電ワイヤ40等の部材(以後、これらの部材を総称して「通電部材」と称する)に、同時に電気めっきを施すことができる。1つのパッケージ20に複数の発光素子10を備えている場合も、全ての導電ワイヤ40及び全ての発光素子10の電極12に、同時に電気めっきを施すことができる。また、リードフレーム34で接続された全てのリード電極30、32を等電位にできるので、リードフレーム34で接続された複数のパッケージ20に備えられた通電部材を、全て同時に電気めっきを施すことができる。
なお、図10のように複数のパッケージ20がリードフレーム34によって連結されているので、図11のようにリードフレーム34の端部を支持して、複数のパッケージ20を同時にめっき液80に浸漬できる。
(4. Electroplating process)
As shown in FIG. 11, the lead frame 34 on which the light emitting element 10 is mounted is immersed in a plating solution 80 for electroplating together with the package 20. Electroplating is performed by applying a voltage from the power supply device 84 between the counter electrode 82 disposed in the plating solution 80 and the lead frame 34. Since all the lead electrodes 30 and 32 are electrically connected via the lead frame 34, the potential of the lead electrodes 30 and 32 can be made equal by applying a voltage between the lead frame 34 and the counter electrode 82. . Furthermore, the conductive wire 40 wire-bonded to the lead terminals 301 and 321 of the lead electrodes 30 and 32 and the electrode 12 of the light emitting element 10 to which the conductive wire 40 is connected are also equipotential with the lead terminals 301 and 321. Accordingly, the electrodes 12 of the light emitting element 10, the lead electrodes 30 and 32, and the conductive wires 40 included in one package 20 (hereinafter, these members are collectively referred to as “current-carrying members”) simultaneously. Electroplating can be applied. Even when a plurality of light emitting elements 10 are provided in one package 20, all the conductive wires 40 and the electrodes 12 of all the light emitting elements 10 can be electroplated simultaneously. In addition, since all the lead electrodes 30 and 32 connected by the lead frame 34 can be equipotential, all the current-carrying members provided in the plurality of packages 20 connected by the lead frame 34 can be electroplated simultaneously. it can.
Since the plurality of packages 20 are connected by the lead frame 34 as shown in FIG. 10, the ends of the lead frame 34 can be supported and the plurality of packages 20 can be immersed in the plating solution 80 simultaneously as shown in FIG. .

以下に電気めっきについて詳述する。
通電部材に金属膜70をめっきする工程は、(1)通電部材の表面を酸・アルカリにより活性化処理する過程、(2)目的とする金属膜70の組成に適合しためっき液80を調製する過程、(3)通電部材及び対向電極82をめっき液80に浸漬する過程、(4)通電部材と対向電極82とを電源を介して電気的に接続し、通電部材が陰極に、対向電極82が陽極になるように電圧を印加する過程、を含む。
The electroplating will be described in detail below.
The step of plating the current-carrying member with the metal film 70 includes (1) a process of activating the surface of the current-carrying member with acid / alkali, and (2) preparing a plating solution 80 suitable for the composition of the target metal film 70. (3) A process of immersing the energizing member and the counter electrode 82 in the plating solution 80, (4) electrically connecting the energizing member and the counter electrode 82 via a power source, the energizing member serving as the cathode, and the counter electrode 82 Applying a voltage so that becomes an anode.

特に、(4)の過程では、短時間の通電によるストライクめっきと、金属膜70が所定膜厚になるまで通電する電気めっきを順次行うのが好ましい。ストライクめっきを行うことにより、密着性の良い緻密な金属粒子を析出させることができるので、剥離しにくく均質な金属膜70をえることができる。   In particular, in the process of (4), it is preferable to sequentially perform strike plating by energization for a short time and electroplating for energization until the metal film 70 reaches a predetermined thickness. By performing strike plating, dense metal particles having good adhesion can be deposited, and thus a uniform metal film 70 that is difficult to peel off can be obtained.

本発明では、金属膜70の形成を電気めっきで行うことにより、通電部材に選択的に金属膜70を形成することができる。つまり、図11のような構成による電気めっき法であれば、発光素子10には電位が生じないので、発光素子10の表面に金属膜70が形成されない。これにより、通電部材の全表面を、連続した金属膜70で容易に被覆することができるので、本発明の金属膜70の形成に最適である。   In the present invention, the metal film 70 can be selectively formed on the current-carrying member by forming the metal film 70 by electroplating. That is, in the electroplating method having the configuration as shown in FIG. 11, since no potential is generated in the light emitting element 10, the metal film 70 is not formed on the surface of the light emitting element 10. Thereby, the entire surface of the current-carrying member can be easily covered with the continuous metal film 70, which is optimal for forming the metal film 70 of the present invention.

Ag及びAg合金から成る金属膜70を形成するのに適しためっき液80のめっき条件を以下に例示する。
(Ag金属膜) Ag膜めっき液80を建浴し、電気めっきを行う。
(Ag−Au金属膜) 共析比率(質量比)が[Ag:Au=99.9〜60:0.1〜40]となるようにAg−Au合金膜用めっき液80を建浴し、電気めっきを行う。
(Ag−In金属膜) 共析比率(質量比)が[Ag:In=99.9〜95:0.1〜5]となるようにAg−In合金膜用めっき液80を建浴し、電気めっきを行う。
(Ag−Pd金属膜) 共析比率(質量比)が[Ag:Pd=99.9〜89:0.1〜11]となるようにAg−Pd合金膜用めっき液80を建浴し、電気めっきを行う。
(Ag−Pt金属膜) 共析比率(質量比)が[Ag:Pt=99.9〜89:0.1〜11]となるようにAg−Pt合金膜用めっき液80を建浴し、電気めっきを行う。
The plating conditions of the plating solution 80 suitable for forming the metal film 70 made of Ag and an Ag alloy will be exemplified below.
(Ag metal film) An Ag film plating solution 80 is erected and electroplated.
(Ag—Au metal film) The plating solution 80 for the Ag—Au alloy film was constructed so that the eutectoid ratio (mass ratio) was [Ag: Au = 99.9-60: 0.1-40], Perform electroplating.
(Ag—In metal film) The plating solution 80 for the Ag—In alloy film was constructed so that the eutectoid ratio (mass ratio) was [Ag: In = 99.9 to 95: 0.1 to 5], Perform electroplating.
(Ag—Pd metal film) The plating solution 80 for the Ag—Pd alloy film is constructed so that the eutectoid ratio (mass ratio) is [Ag: Pd = 99.9 to 89: 0.1 to 11]. Perform electroplating.
(Ag—Pt metal film) The plating solution 80 for the Ag—Pt alloy film was constructed so that the eutectoid ratio (mass ratio) was [Ag: Pt = 99.9 to 89: 0.1 to 11]. Perform electroplating.

(5.封止工程)
電気めっきにより金属膜70を形成した後、パッケージ20の凹部22を封止樹脂90によって封止する。封止部材90は、ポッティング、印刷、トランスファーモールド等の公知の技術によって凹部22に充填した後に硬化させる。封止部材90には、光拡散材や蛍光物質などを含有させることができる。
(5. Sealing process)
After the metal film 70 is formed by electroplating, the recess 22 of the package 20 is sealed with a sealing resin 90. The sealing member 90 is cured after filling the recess 22 by a known technique such as potting, printing, transfer molding or the like. The sealing member 90 can contain a light diffusing material or a fluorescent material.

(6.カットフォーミング工程)
図11のX−Xに沿ってリードフレーム34を切断して、個々の発光装置1に分離する(カット過程)。パッケージ20より外側に突出した外部端子302、322を、図2のようにパッケージ20の外形に沿って折り曲げる(フォーミング過程)。こうして本発明の発光装置1が得られる。
(6. Cut forming process)
The lead frame 34 is cut along XX in FIG. 11 and separated into individual light emitting devices 1 (cut process). The external terminals 302 and 322 protruding outward from the package 20 are bent along the outer shape of the package 20 as shown in FIG. 2 (forming process). Thus, the light emitting device 1 of the present invention is obtained.

次に、各構成部材について詳述する。
(発光素子10)
発光素子10は、半導体発光素子が利用でき、いわゆる発光ダイオード、レーザーダイオードと呼ばれる素子などが好適である。たとえば、基板上に、InN、AlN、GaN、InGaN、AlGaN、InGaAlN等の窒化物半導体、III−V族化合物半導体、II−VI族化合物半導体等、種々の半導体によって、活性層を含む半導体層の積層構造が形成されたものが挙げられる。基板としては、C面、A面、R面のいずれかを主面とするサファイア(A1)やスピネル(MgA12)のような絶縁性基板、またSiC(6H、4H、3C)、シリコン、ZnS、ZnO、GaAs、ダイヤモンド;LiNbO、NdGaO等の酸化物基板、窒化物半導体基板(GaN、AlN等)等が挙げられる。半導体の構造としては、MIS接合、PIN接合、PN接合等のホモ構造、ヘテロ結合あるいはダブルヘテロ結合のものが挙げられる。また、半導体活性層を量子効果が生ずる薄膜に形成させた単一量子井戸構造、多重量子井戸構造としてもよい。活性層には、Si、Ge等のドナー不純物及び/又はZn、Mg等のアクセプター不純物がドープされる場合もある。得られる発光素子の発光波長は、半導体の材料、混晶比、活性層のInGaNのIn含有量、活性層にドープする不純物の種類を変化させる等によって、紫外領域から赤外領域まで変化させることができる。
発光素子10の形状は特に限定されず、たとえば、円形、楕円形、多角形又はこれに近い形状のものを利用することができる。
Next, each component will be described in detail.
(Light emitting element 10)
As the light emitting element 10, a semiconductor light emitting element can be used, and an element called a light emitting diode or a laser diode is preferable. For example, a semiconductor layer including an active layer is formed on a substrate by various semiconductors such as a nitride semiconductor such as InN, AlN, GaN, InGaN, AlGaN, and InGaAlN, a III-V compound semiconductor, and a II-VI compound semiconductor. The thing in which the laminated structure was formed is mentioned. As a substrate, an insulating substrate such as sapphire (A1 2 O 3 ) or spinel (MgA 12 O 4 ) having any one of C-plane, A-plane and R-plane as its main surface, and SiC (6H, 4H, 3C). ), silicon, ZnS, ZnO, GaAs, diamond, an oxide substrate such as LiNbO 3, NdGaO 3, such a nitride semiconductor substrate (GaN, AlN, etc.). Examples of the semiconductor structure include homostructures such as MIS junctions, PIN junctions, and PN junctions, heterojunctions, and double heterojunctions. Alternatively, the semiconductor active layer may have a single quantum well structure or a multiple quantum well structure in which a thin film in which a quantum effect is generated is formed. The active layer may be doped with donor impurities such as Si and Ge and / or acceptor impurities such as Zn and Mg. The emission wavelength of the resulting light-emitting element can be changed from the ultraviolet region to the infrared region by changing the semiconductor material, the mixed crystal ratio, the In content of InGaN in the active layer, the type of impurities doped in the active layer, etc. Can do.
The shape of the light emitting element 10 is not particularly limited, and for example, a circular shape, an elliptical shape, a polygonal shape, or a shape close thereto can be used.

1つの発光装置1には、1個又は複数の発光素子10を備えることができる。本実施の形態では発光装置1は長方形の発光素子10を6個備えており、長方形の長辺方向に3個、短辺方向に2個配列している。複数の発光素子10を配列するときには、発光素子10に接続した導電ワイヤ40が、他の発光素子10の発光面上を通過しないように、発光素子10の並びをずらして配置するのが好ましい。   One light emitting device 1 can include one or a plurality of light emitting elements 10. In the present embodiment, the light emitting device 1 includes six rectangular light emitting elements 10, and three are arranged in the long side direction and two are arranged in the short side direction. When arranging a plurality of light emitting elements 10, it is preferable to arrange the light emitting elements 10 so that the conductive wires 40 connected to the light emitting elements 10 do not pass over the light emitting surfaces of the other light emitting elements 10.

(通電部材)
本発明における通電部材には、発光素子10の電極、半導体素子(例えばツェナーダイオード、受光素子など)の電極、リード電極30、32等が含まれ、発光装置には少なくともいずれかの部材が備えられる。本実施の形態では、発光素子10の電極12と、第1リード電極30及び第2リード電極32とを備えている。
(Conductive member)
The energizing member in the present invention includes an electrode of the light emitting element 10, an electrode of a semiconductor element (for example, a Zener diode, a light receiving element, etc.), lead electrodes 30, 32, and the like, and the light emitting device is provided with at least one member. . In the present embodiment, the electrode 12 of the light emitting element 10, the first lead electrode 30 and the second lead electrode 32 are provided.

(第1リード電極30、第2リード電極32)
第1リード電極30、第2リード電極32は、鉄、リン青銅、銅合金等の電気良導体を用いて構成することができる。また、発光素子10からの光の反射率を向上させるため、発光素子10を実装する前に、リード電極30、32の表面に銀、アルミニウム、銅や金等の金属めっきを施すこともできる。また、リード電極30、32の表面の反射率を向上させるため、平滑にすることが好ましい。
(First lead electrode 30, second lead electrode 32)
The 1st lead electrode 30 and the 2nd lead electrode 32 can be comprised using electrical good conductors, such as iron, phosphor bronze, and a copper alloy. In addition, in order to improve the reflectance of light from the light emitting element 10, the surface of the lead electrodes 30 and 32 can be subjected to metal plating such as silver, aluminum, copper or gold before the light emitting element 10 is mounted. Moreover, in order to improve the reflectance of the surface of the lead electrodes 30 and 32, it is preferable to make it smooth.

なお、第1リード電極30と第2リード電極32の面積(第1リード端子301と第2リード端子321の面積)は、等しくても、又は一方が他方より広くてもよい。例えば図1に示すように、第1リード端子301よりも第2リード端子321を広くして、第2リード端子321に発光素子10をダイボンドしてもよい。なお、第2リード端子321に発光素子10をダイボンドするときに、ダイボンド材が第2リード端子321の全体に広がると、その後のワイヤボンディングで第2リード端子321と導電ワイヤ40との接合が阻害される恐れがある。そこで、第2リード端子321の表面に、ブリード防止壁24(図1及び図2参照)を設けるとよい。ブリード防止壁24をパッケージ20と同じ材料から形成すれば、パッケージ20とブリード防止壁24を同時に形成することができる。   The areas of the first lead electrode 30 and the second lead electrode 32 (the areas of the first lead terminal 301 and the second lead terminal 321) may be equal or one may be wider than the other. For example, as shown in FIG. 1, the second lead terminal 321 may be wider than the first lead terminal 301 and the light emitting element 10 may be die-bonded to the second lead terminal 321. When the light emitting element 10 is die-bonded to the second lead terminal 321, if the die-bonding material spreads over the entire second lead terminal 321, the bonding between the second lead terminal 321 and the conductive wire 40 is hindered by subsequent wire bonding. There is a fear. Therefore, a bleed prevention wall 24 (see FIGS. 1 and 2) may be provided on the surface of the second lead terminal 321. If the bleed prevention wall 24 is formed from the same material as the package 20, the package 20 and the bleed prevention wall 24 can be formed simultaneously.

(導電ワイヤ40)
導電ワイヤ40は、適切なワイヤボンディングが可能であればどのような金属材料から形成することもできるが、ワイヤボンディングの結合力が高く、信頼性の高い発光装置1を得るには、Au、Cu、Al、W及びステンレスから成る群から選択された1種を含む金属材料から形成するのが好ましい。特に、Au又はAu合金は、発光素子30の電極12とのオーミック性が良好で、機械的接続性(ボンディング性)が良好で、そして、電気伝導性及び熱伝導性が良好な金属材料であるので、導電ワイヤ40に好適である。
(Conductive wire 40)
The conductive wire 40 can be formed of any metal material as long as appropriate wire bonding is possible, but in order to obtain the light emitting device 1 having high bonding strength and high reliability, Au, Cu Preferably, it is formed from a metal material including one selected from the group consisting of Al, W, and stainless steel. In particular, Au or an Au alloy is a metal material that has good ohmic properties with the electrode 12 of the light-emitting element 30, good mechanical connectivity (bonding property), and good electrical and thermal conductivity. Therefore, it is suitable for the conductive wire 40.

(パッケージ20)
パッケージ20は、発光素子10等を保護することができるものであれば、どのような材料によって形成されていてもよい。なかでも、セラミックや乳白色の樹脂等、絶縁性及び遮光性を有する材料であることが好ましい。樹脂材料としては、芳香族ポリアミド樹脂等の熱可塑性樹脂や、エポキシ樹脂等の熱硬化樹脂が利用でき、公知の方法(例えば、熱可塑性樹脂は射出成形、熱硬化性樹脂はトランスファー成形など)によって成形できる。
また、パッケージ20は、リードフレームをベースにしたタイプ(例えば、図1及び図2のような表面実装タイプや、砲弾タイプ等が挙げられる)の他に、電極が配線されているセラミック基板や、ガラスエポキシ基板タイプのものが使用できる。
(Package 20)
The package 20 may be formed of any material as long as it can protect the light emitting element 10 and the like. Especially, it is preferable that it is a material which has insulation and light-shielding properties, such as a ceramic and milky white resin. As the resin material, a thermoplastic resin such as an aromatic polyamide resin or a thermosetting resin such as an epoxy resin can be used. By a known method (for example, injection molding for a thermoplastic resin, transfer molding for a thermosetting resin, etc.) Can be molded.
Further, the package 20 is a type based on a lead frame (for example, a surface mount type as shown in FIGS. 1 and 2, a shell type, etc.), a ceramic substrate on which electrodes are wired, A glass epoxy substrate type can be used.

(コーティング膜72)
コーティング膜72には、無機コーティングや有機コーティングを利用できる。無機コーティングとしては、SiOやAl、ZnO、珪酸ガラス、ガラスなどの透過率の高い材料が好ましい。有機コーティングとしては、アクリル樹脂、フッ素樹脂、シリコーン樹脂、変性シリコーン樹脂、エポキシ樹脂、パラキシリレン樹脂などで、光吸収の少ない、耐熱、耐光性の高い樹脂が好ましい。コーティング膜は、塗布、蒸着、ディッピング、噴霧などにより所望の位置に被覆することができる。
(Coating film 72)
The coating film 72 can be an inorganic coating or an organic coating. As the inorganic coating, a material having high transmittance such as SiO 2 , Al 2 O 3 , ZnO, silicate glass, and glass is preferable. As the organic coating, an acrylic resin, a fluororesin, a silicone resin, a modified silicone resin, an epoxy resin, a paraxylylene resin, or the like, which is a resin having low light absorption and high heat resistance and light resistance is preferable. The coating film can be coated at a desired position by application, vapor deposition, dipping, spraying, or the like.

<変形例>
本実施の形態の変形例を図12に示す。この発光装置1は、実装面側から導通可能な発光素子10を使用することにより、発光素子10と第2リード端子321とを導電性のダイボンド材(Agペースト等)で導通し、代わりに発光素子10に接続される導電ワイヤ40の本数を1本にしている点で、実施の形態1と異なる。
<Modification>
A modification of the present embodiment is shown in FIG. The light emitting device 1 uses the light emitting element 10 that can be conducted from the mounting surface side, thereby conducting the light emitting element 10 and the second lead terminal 321 with a conductive die bond material (Ag paste or the like), and emitting light instead. This is different from the first embodiment in that the number of conductive wires 40 connected to the element 10 is one.

図12の発光装置1は、図1の発光装置1と比較して、導電ワイヤ40の本数、ワイヤボンディングの回数、及び導電ワイヤの使用量が半減する。そのため、従来のような金属膜70のない発光装置であっても、導電ワイヤ40等による光吸収が比較的少なかった。しかしながら、本発明のように導電ワイヤ40やリード端子301、321を金属膜70で被覆すれば、導電ワイヤ40による光吸収がさらに減少するので、光取出し効率を向上することができる。   Compared with the light emitting device 1 of FIG. 1, the light emitting device 1 of FIG. 12 halves the number of conductive wires 40, the number of times of wire bonding, and the amount of conductive wires used. Therefore, even in the conventional light emitting device without the metal film 70, the light absorption by the conductive wire 40 or the like was relatively small. However, if the conductive wire 40 and the lead terminals 301 and 321 are covered with the metal film 70 as in the present invention, light absorption by the conductive wire 40 is further reduced, so that the light extraction efficiency can be improved.

<実施の形態2>
図13に示す発光装置1は、実施の形態1と同様に、リードフレームをベースとしたパッケージを備えたタイプである。実施の形態1とは、発光素子10の配置と、導電ワイヤ40の配線と、第1リード電極30及び第2リード電極32の形状とが異なる。さらに、本実施の形態では、発光素子10を実装するために、リード電極とは別の実装部36を備えている。
<Embodiment 2>
The light emitting device 1 shown in FIG. 13 is a type including a package based on a lead frame, as in the first embodiment. The first embodiment is different from the first embodiment in the arrangement of the light emitting element 10, the wiring of the conductive wire 40, and the shapes of the first lead electrode 30 and the second lead electrode 32. Further, in the present embodiment, in order to mount the light emitting element 10, a mounting portion 36 different from the lead electrode is provided.

本実施の形態では、図13のように、隣接する発光素子10間を導電ワイヤ40で接続すて、複数の発光素子10を電気的に直列に接続している。この配線方法は、第1ボンド50と第2ボンド60との途中で、導電ワイヤ40を発光素子10に熱圧着している。本明細書では、このような熱圧着部分を「ステッチボンド68」と称し、ステッチボンド68による導電ワイヤ40の配線形態を「ステッチワイヤ配線」と称する。
図13のようなステッチワイヤ配線は、図1のような配線(本明細書では「三角ループ配線」と称する)に比べて、1素子当たりの導電ワイヤ長が短いので材料コストが低く、また1素子当たりのワイヤボンディング回数(ステッチボンド68も含む)も少ないので製造時間を短縮することができる。
In the present embodiment, as shown in FIG. 13, adjacent light emitting elements 10 are connected by a conductive wire 40, and a plurality of light emitting elements 10 are electrically connected in series. In this wiring method, the conductive wire 40 is thermocompression bonded to the light emitting element 10 in the middle of the first bond 50 and the second bond 60. In the present specification, such a thermocompression bonding portion is referred to as “stitch bond 68”, and the wiring form of the conductive wire 40 using the stitch bond 68 is referred to as “stitch wire wiring”.
Compared to the wiring shown in FIG. 1 (referred to as “triangular loop wiring” in this specification), the stitch wire wiring as shown in FIG. 13 has a lower material cost because the conductive wire length per element is shorter. Since the number of wire bonding per element (including the stitch bond 68) is also small, the manufacturing time can be shortened.

ステッチワイヤ配線では、導電ワイヤ40が発光素子10の発光面上を通る距離が、三角ループ配線に比べて長くなる。そのため、金属膜70により導電ワイヤ40を被覆したときの光吸収の抑制効果が高く、発光装置1の光取出し効率の向上が顕著である。   In the stitch wire wiring, the distance that the conductive wire 40 passes on the light emitting surface of the light emitting element 10 is longer than that of the triangular loop wiring. Therefore, the effect of suppressing light absorption when the conductive wire 40 is covered with the metal film 70 is high, and the improvement of the light extraction efficiency of the light emitting device 1 is remarkable.

なお、本実施の形態では、リード電極30、32とは別体の実装部36を備えており、そこに発光素子10を実装している。この実装部36は、実施の形態1で説明した製造工程の「1.パッケージ20の成形」において、第1リード電極30及び第2リード電極32と共にリードフレーム34に形成し、パッケージ20形成時にその内部に内包され、そして「6.カットフォーミング工程」においてリードフレーム34から分離されて、形成できる。   In the present embodiment, the mounting portion 36 is provided separately from the lead electrodes 30 and 32, and the light emitting element 10 is mounted thereon. The mounting portion 36 is formed on the lead frame 34 together with the first lead electrode 30 and the second lead electrode 32 in “1. Molding of the package 20” in the manufacturing process described in the first embodiment. It can be formed by being included inside and separated from the lead frame 34 in “6. Cut forming process”.

図1及び図13に示した形態の発光装置1について、構成を変更した試料を複数作製して、点灯実験を行う。   With respect to the light-emitting device 1 having the configuration shown in FIGS. 1 and 13, a plurality of samples having different configurations are produced and a lighting experiment is performed.

<A.測定用試料の作製について>
(1.パッケージ20の成形)
測定用試料のパッケージとして、リードフレームタイプと、基板タイプとを作製した。リードフレームタイプのパッケージの場合、銅合金のリードフレームを用い、「リード端子の被覆材料」にAgと記載された試料についてはリードフレームの表面にAg膜を成膜した。パッケージ材料には、熱可塑性樹脂(ポリフタルアミド)を用い、射出成形により成形する。
基板タイプの場合は、電極の配線が形成されているAlのセラミック基板、又はガラスエポキシ基板を用いる。
<A. About preparation of sample for measurement>
(1. Molding of package 20)
As a measurement sample package, a lead frame type and a substrate type were prepared. In the case of the lead frame type package, a copper alloy lead frame was used, and an Ag film was formed on the surface of the lead frame for the sample described as “Aggregating material for lead terminals”. As the package material, a thermoplastic resin (polyphthalamide) is used and molded by injection molding.
In the case of the substrate type, an Al 2 O 3 ceramic substrate or a glass epoxy substrate on which electrode wiring is formed is used.

(2.ダイボンディング工程)
各パッケージに、シリコーン樹脂接着剤、変性シリコーン樹脂接着剤、エポキシ樹脂接着剤などを用いた樹脂接合、または、Au―Snなどの半田材料を用いた金属接合により、発光素子10をダイボンドする。
(2. Die bonding process)
The light emitting element 10 is die-bonded to each package by resin bonding using a silicone resin adhesive, a modified silicone resin adhesive, an epoxy resin adhesive, or the like, or metal bonding using a solder material such as Au—Sn.

(3.ワイヤボンディング工程)
直径25μmの金線ワイヤを用いて、発光素子10とリード端子301、321を通電させる。
(3. Wire bonding process)
The light emitting element 10 and the lead terminals 301 and 321 are energized using a gold wire having a diameter of 25 μm.

(4.電気めっき工程)
電気めっき工程は、前処理(水洗)、ストライクめっき(水洗)、本めっき(水洗)、水洗、及び乾燥の順に行う。
(4. Electroplating process)
The electroplating step is performed in the order of pretreatment (water washing), strike plating (water washing), main plating (water washing), water washing, and drying.

(前処理)
前処理では、リード電極30、32等の通電部材の露出面の表面付着汚染物(汚れ、油、汗・指紋、有機物、金属粉等)、表面付着腐食生成物(酸化物、硫化物、不動態皮膜等)、表面吸着物(吸着有機化合物、吸着水分、吸着ガス成分等)を除去して、露出面を活性化する。前処理液にはシアン化カリウム水溶液を使用し、処理液中にリードフレーム34を浸漬する。処理中は前処理液を攪拌装置で攪拌する。処理後に、リードフレーム34を純水の流水で洗浄する。
(Preprocessing)
In the pre-treatment, the surface-attached contaminants (dirt, oil, sweat / fingerprint, organic matter, metal powder, etc.) on the exposed surfaces of the current-carrying members such as lead electrodes 30 and 32, and surface-attached corrosion products (oxides, sulfides, Dynamic surface film, etc.) and surface adsorbed substances (adsorbed organic compounds, adsorbed moisture, adsorbed gas components, etc.) are removed to activate the exposed surface. An aqueous potassium cyanide solution is used as the pretreatment liquid, and the lead frame 34 is immersed in the treatment liquid. During the treatment, the pretreatment liquid is stirred with a stirring device. After the treatment, the lead frame 34 is washed with running pure water.

(ストライクめっき)
ストライクめっきは、Agストライクめっき液を建浴し電気めっきを行う。通電中は、めっき液を攪拌装置で攪拌する。めっき後は、リードフレーム34を純水の流水で、洗浄する。
(Strike plating)
Strike plating is performed by bathing an Ag strike plating solution. During energization, the plating solution is stirred with a stirring device. After the plating, the lead frame 34 is washed with running pure water.

(本めっき)
所望の金属膜又は所望の共析比率の合金膜が得られるように調製されためっき液を使用して本めっきを行う。通電中はめっき液を攪拌装置で攪拌し、膜厚0.1〜10.0μmの金属膜70を形成する。めっき後に、リードフレーム34を純水の流水で洗浄する。
(Main plating)
The main plating is performed using a plating solution prepared so as to obtain a desired metal film or an alloy film having a desired eutectoid ratio. During energization, the plating solution is stirred with a stirrer to form a metal film 70 having a film thickness of 0.1 to 10.0 μm. After the plating, the lead frame 34 is washed with running pure water.

(水洗、乾燥)
めっき完了後のリードフレーム34を純水の流水で洗浄する。その後、エアーブロアーで水滴を除去して乾燥する。
(Washing and drying)
The lead frame 34 after the completion of plating is washed with flowing pure water. Thereafter, water drops are removed with an air blower and dried.

(5.封止工程)
パッケージに封止部材の熱硬化性樹脂を滴下する。熱硬化性樹脂には、シリコーン樹脂100重量部に対して、YAG蛍光体30重量部、光拡散剤として、酸化ケイ素を5重量部含むものを使用し、150℃5時間硬化させる。
(5. Sealing process)
A thermosetting resin as a sealing member is dropped onto the package. As the thermosetting resin, a resin containing 30 parts by weight of YAG phosphor and 5 parts by weight of silicon oxide as a light diffusing agent is used for 100 parts by weight of silicone resin and cured at 150 ° C. for 5 hours.

(6.カットフォーミング工程)
リードフレームより、パッケージを切り離して、発光装置を得る。
(6. Cut forming process)
The package is separated from the lead frame to obtain a light emitting device.

<B.測定用試料の作成条件について>
本実施例では、測定用の試料を作成する際に変更する作成条件を、(1)「リード端子の被覆材料」、(2)「導電ワイヤの材料」(3)「金属膜の材料」、(4)「発光素子の搭載数」、(5)「ワイヤの本数」、(6)「導電ワイヤの配線形態」、(7)「表面処理」、及び(8)「パッケージの種類」の8項目とした。これらの作成条件の内容について簡単に説明する。
<B. About preparation conditions of sample for measurement>
In this example, the preparation conditions to be changed when preparing the measurement sample are (1) “lead terminal coating material”, (2) “conductive wire material” (3) “metal film material”, (4) “Number of mounted light emitting elements”, (5) “Number of wires”, (6) “Wiring form of conductive wire”, (7) “Surface treatment”, and (8) “Type of package” Item. The contents of these creation conditions will be briefly described.

(1)「リード端子の被覆材料」とは、発光素子10を実装する前にリード端子301、321を被覆した場合、その被覆材料を示している。被覆材料には、発光素子10からの発光に対して高反射率を有する金属材料が好適である。
(2)「導電ワイヤの材料」とは、導電ワイヤ40に使用された材料を示している。
(3)「金属膜の材料」とは、本発明の金属膜70を形成している金属材料を示している。なお、表1には、本実施例で使用した「金属膜の材料」の組成比と、各材料の波長450nmの光に対する反射率を示している。
(4)「発光素子の搭載数」とは、1つの発光装置1に搭載された発光素子10の個数である。「発光素子の搭載数」が多いほど、発光装置1の出力も高くなる。
(5)「ワイヤの本数」とは、1つの発光素子10に接続される導電ワイヤ40の本数である。「ワイヤの本数」が1本の発光装置1とは、図12のような発光装置1であり、「ワイヤの本数」が2本の発光装置1とは、図1又は図13のような発光装置1である。
(6)「導電ワイヤの配線形態」とは、発光素子10に接続された導電ワイヤ40の配線形態である。本実施例では、図1のような三角ループ配線、又は図13のようなステッチワイヤ配線のいずれかを使用している。
(7)「表面処理」とは、金属膜70の表面を、例えばコーティング剤等によって処理することである。
(8)「パッケージタイプ」とは、リードフレームタイプと基板タイプのいずれであるかを示している。
(1) “Coating material of lead terminal” indicates a covering material when the lead terminals 301 and 321 are covered before the light emitting element 10 is mounted. As the coating material, a metal material having a high reflectance with respect to light emitted from the light emitting element 10 is suitable.
(2) “Conductive wire material” indicates the material used for the conductive wire 40.
(3) “Material of metal film” indicates a metal material forming the metal film 70 of the present invention. Table 1 shows the composition ratio of the “metal film material” used in this example and the reflectance of each material with respect to light having a wavelength of 450 nm.
(4) “Number of light emitting elements mounted” is the number of light emitting elements 10 mounted on one light emitting device 1. As the “number of mounted light emitting elements” increases, the output of the light emitting device 1 also increases.
(5) “Number of wires” is the number of conductive wires 40 connected to one light emitting element 10. The light-emitting device 1 with one “number of wires” is the light-emitting device 1 as shown in FIG. 12, and the light-emitting device 1 with “two wires” is the light-emitting device as shown in FIG. Device 1.
(6) “Wiring form of the conductive wire” is a wiring form of the conductive wire 40 connected to the light emitting element 10. In this embodiment, either a triangular loop wiring as shown in FIG. 1 or a stitch wire wiring as shown in FIG. 13 is used.
(7) “Surface treatment” is to treat the surface of the metal film 70 with, for example, a coating agent or the like.
(8) “Package type” indicates whether the type is a lead frame type or a substrate type.

Figure 2009055006
Figure 2009055006

全ての測定用試料では、発光素子10として青色発光ダイオード(発光波長λ=453nm)を使用する。   In all measurement samples, a blue light-emitting diode (emission wavelength λ = 453 nm) is used as the light-emitting element 10.

<C.測定用試料の出力測定>
各測定用試料の出力は、測定用試料に400mA通電し、積分球により発光装置の光束を測定して得る。
<C. Output measurement of measurement sample>
The output of each measurement sample is obtained by energizing the measurement sample with 400 mA and measuring the luminous flux of the light emitting device with an integrating sphere.

得られた実験結果について、以下に検討を行う。各測定試料の「出力(%)」は、基準となる発光装置(後述の比較例1)発光装置の出力を100%としたときの、各発光装置の出力の相対値である。   The experimental results obtained are discussed below. “Output (%)” of each measurement sample is a relative value of the output of each light emitting device when the output of the light emitting device as a reference (Comparative Example 1 described later) is 100%.

<1.金属膜70による被覆の効果>
発光装置の作製条件と、金属膜70による被覆の効果との関係を表2にまとめる。実施例1及び3の「リード端子の被覆材料」に(Ag)と記載されているのは、発光素子10の実装前にはリード端子301、321を被覆していないが、その後にAgから成る金属膜70を被覆したことにより、得られた発光装置1のリード端子301、321はAg膜により被覆されていることを意味している。また、比較例4の導電ワイヤは、Au芯材をAg膜で被覆した複合ワイヤを使用しており、「金属膜の材料」に(Ag)と記載されているのは、複合ワイヤがAg膜で被覆されていることを意味している。
<1. Effect of coating with metal film 70>
Table 2 summarizes the relationship between the manufacturing conditions of the light emitting device and the effect of coating with the metal film 70. (Ag) is described in “Lead terminal coating material” in Examples 1 and 3, although the lead terminals 301 and 321 are not covered before the light emitting element 10 is mounted. By covering the metal film 70, it is meant that the lead terminals 301 and 321 of the obtained light emitting device 1 are covered with an Ag film. Further, the conductive wire of Comparative Example 4 uses a composite wire in which an Au core material is coated with an Ag film, and (Ag) is described in “Metal film material” because the composite wire is an Ag film. It means that it is covered with.

表に記載した作成条件以外では、発光素子の搭載数:6個、ワイヤの本数:2本/1素子、導電ワイヤの配線形態:三角ループ配線、表面処理:なし、パッケージの種類:リードフレームタイプ、となっている。   Except for the preparation conditions described in the table, the number of light emitting elements mounted: 6, the number of wires: 2/1 element, conductive wire wiring form: triangular loop wiring, surface treatment: none, package type: lead frame type It has become.

Figure 2009055006
Figure 2009055006

実施例1(金属膜:Ag)と比較例2(金属膜なし)とを比較すると、導電ワイヤ40、リード端子301、321等の通電部材をAg膜により被覆することにより、発光装置1の出力が82%から115%と約1.4倍になっている。また、実施例1と比較例4(Au芯材/Ag膜の複合ワイヤ)とを比較すると、複合ワイヤよりも、Auワイヤをワイヤボンディング後にAg膜で電気めっきするほうが、出力が高くなっている。これは、比較例4では、図14及び図15のように、第1ボンド150、第2ボンド160、及びワイヤの端面162から芯材142が露出して、光を吸収したためであると考えられる。   When Example 1 (metal film: Ag) is compared with Comparative Example 2 (without metal film), the output of the light-emitting device 1 is obtained by covering the conductive members such as the conductive wires 40 and the lead terminals 301 and 321 with the Ag film. Is about 1.4 times from 82% to 115%. Moreover, when Example 1 and Comparative Example 4 (Au core material / Ag film composite wire) are compared, the output is higher when the Au wire is electroplated with an Ag film after wire bonding than with the composite wire. . This is considered to be because, in Comparative Example 4, the core material 142 was exposed from the first bond 150, the second bond 160, and the end face 162 of the wire as shown in FIGS. .

なお、比較例1(リード端子:Ag被覆)と比較例2(リード端子:被覆なし)とを比較すると、前もってリード電極30、32にAg等による金属被覆を施すことにより、発光装置の光取出し効率が高まることがわかる。しかしながら、実施例1(リード端子:被覆なし)と実施例2(リード端子:Ag被覆)とを比較すると、いずれも同等の出力(115%)を示した。これは、実施例1の発光装置では、発光素子の載置後にAg膜70を形成するときに電気めっきにより通電部材全体がAg膜で被覆され、通電部材の1つであるリード端子301、321もAg膜で被覆されるためである。   In comparison between Comparative Example 1 (lead terminal: Ag coated) and Comparative Example 2 (lead terminal: uncoated), the light extraction of the light emitting device can be performed by previously coating the lead electrodes 30 and 32 with metal such as Ag. It turns out that efficiency increases. However, when Example 1 (lead terminal: no coating) and Example 2 (lead terminal: Ag coating) were compared, both showed the same output (115%). This is because, in the light emitting device of Example 1, when the Ag film 70 is formed after the light emitting element is mounted, the entire energizing member is covered with the Ag film by electroplating, and lead terminals 301 and 321 which are one of the energizing members. This is also because it is coated with an Ag film.

また、実施例1(Auワイヤ/Ag膜あり)、実施例3(Cuワイヤ/Ag膜あり)、比較例2(Auワイヤ/Ag膜なし)及び比較例3(Cuワイヤ/Ag膜なし)を比較すると、Ag膜が形成されず導電ワイヤ40が露出している場合には、導電ワイヤ40の種類によって発光装置1の出力が変わる(比較例2:82%、比較例3:80%)。しかしながら、導電ワイヤ40を金属膜70で被覆すると、導電ワイヤ40の材料にかかわらず、高い出力(実施例1及び実施例3:115%)の発光装置1を得ることができる。   Also, Example 1 (with Au wire / Ag film), Example 3 (with Cu wire / Ag film), Comparative Example 2 (without Au wire / Ag film) and Comparative Example 3 (without Cu wire / Ag film) In comparison, when the Ag film is not formed and the conductive wire 40 is exposed, the output of the light emitting device 1 varies depending on the type of the conductive wire 40 (Comparative Example 2: 82%, Comparative Example 3: 80%). However, when the conductive wire 40 is covered with the metal film 70, the light emitting device 1 with high output (Example 1 and Example 3: 115%) can be obtained regardless of the material of the conductive wire 40.

<2.金属膜70の材質>
金属膜70の材質による効果を表3にまとめる。
表に記載した作成条件以外では、リード端子の被覆材料:Ag、導電ワイヤの材料:Au、発光素子の搭載数:6個、ワイヤの本数:2本/1素子、導電ワイヤの配線形態:三角ループ配線、表面処理:なし、パッケージの種類:リードフレームタイプ、となっている。
<2. Material of Metal Film 70>
The effects of the material of the metal film 70 are summarized in Table 3.
Except for the preparation conditions described in the table, lead terminal coating material: Ag, conductive wire material: Au, number of light emitting elements mounted: 6, number of wires: 2/1 element, conductive wire wiring form: triangle Loop wiring, surface treatment: none, package type: lead frame type.

Figure 2009055006
Figure 2009055006

実施例2及び4〜6は、異なる金属材料から金属膜70を形成した発光装置である。表1及び表3を参照すると、反射率の高いAgから金属膜70を形成した実施例2では発光装置の出力が最も高く(115%)、金属材料の反射率の低下に伴って発光装置1の出力が低下する。(実施例4:111、実施例5:110%、実施例6:105%)。ただし、反射率が90%以上の金属材料(実施例4〜6)であれば、金属膜70を備えていない発光装置(比較例1)に比べて、高出力になっている。   Examples 2 and 4 to 6 are light emitting devices in which a metal film 70 is formed from different metal materials. Referring to Table 1 and Table 3, in Example 2 in which the metal film 70 is formed from Ag having a high reflectance, the output of the light emitting device is the highest (115%), and the light emitting device 1 is accompanied by a decrease in the reflectance of the metal material. Output decreases. (Example 4: 111, Example 5: 110%, Example 6: 105%). However, if the reflectance is 90% or more of the metal material (Examples 4 to 6), the output is higher than that of the light emitting device not provided with the metal film 70 (Comparative Example 1).

<3.発光素子10の搭載個数、及び導電ワイヤの本数>
図1のような発光素子1個あたりに2本の導電ワイヤ40を接続する形態と、図12のような発光素子1個あたりに1本の導電ワイヤ40を接続する形態とについて、金属膜70の効果を表4にまとめる。
表中の「出力変化率」とは、「金属膜あり」の発光装置1の出力Pを、「金属膜なし」の発光装置1の出力Pで除したものである。
<3. Number of mounted light emitting elements 10 and number of conductive wires>
A metal film 70 is formed in a form in which two conductive wires 40 are connected per light emitting element as shown in FIG. 1 and a form in which one conductive wire 40 is connected per light emitting element as shown in FIG. Table 4 summarizes the effects.
The “output change rate” in the table is obtained by dividing the output P 2 of the light emitting device 1 “with metal film” by the output P 1 of the light emitting device 1 without “metal film”.

表に記載した作成条件以外では、リード端子の被覆材料:Ag、導電ワイヤの材料:Au、金属膜の材料:Ag、導電ワイヤの配線形態:三角ループ配線、表面処理:なし、パッケージの種類:リードフレームタイプ、となっている。   Except for the preparation conditions listed in the table, lead terminal coating material: Ag, conductive wire material: Au, metal film material: Ag, conductive wire wiring form: triangular loop wiring, surface treatment: none, package type: Lead frame type.

Figure 2009055006
Figure 2009055006

金属膜70を形成することにより、搭載した発光素子1の個数にかかわらず出力の向上がみられた。出力向上の効果は、発光素子1の搭載個数が多いほど高くなった。発光素子1の搭載個数が多くなれば、それに比例して使用される導電ワイヤ40の全長が長くなるので、金属膜70による効果が顕著になったものと考えられる。   By forming the metal film 70, the output was improved regardless of the number of the light emitting elements 1 mounted. The effect of improving the output became higher as the number of mounted light emitting elements 1 increased. If the number of mounted light emitting elements 1 is increased, the total length of the conductive wires 40 used in proportion to the number of the light emitting elements 1 is increased. Therefore, it is considered that the effect of the metal film 70 becomes remarkable.

また、金属膜70を形成することにより、導電ワイヤ40の本数にかかわらず出力の向上がみられた。出力向上の効果は、導電ワイヤ40の本数が多いほど効果が高くなる傾向がある。導電ワイヤ40の本数が増加すれば、導電ワイヤ40の全長も長くなるので、金属膜70による効果が顕著になったものと考えられる。ただし、同じ本数であっても出力向上率が一致しない場合がある。これは、発光素子1とリード端子との配置によって導電ワイヤ40の1本当たりの長さ相違する場合があるので(図1参照)、導電ワイヤ40の本数と、導電ワイヤ40の全長とが完全に比例しないケースがあるためであると推測される。   Further, by forming the metal film 70, the output was improved regardless of the number of the conductive wires 40. The effect of improving the output tends to increase as the number of the conductive wires 40 increases. If the number of the conductive wires 40 is increased, the total length of the conductive wires 40 is also increased. Therefore, it is considered that the effect of the metal film 70 becomes remarkable. However, the output improvement rates may not match even with the same number. This is because the length of each conductive wire 40 may differ depending on the arrangement of the light emitting element 1 and the lead terminal (see FIG. 1), so that the number of the conductive wires 40 and the total length of the conductive wires 40 are completely different. It is assumed that this is because there are cases that are not proportional to.

<4.導電ワイヤの配線形態>
図1のような三角ループ配線と、図12のようなステッチワイヤ配線とについて、金属膜70の効果を表5にまとめる。
<4. Conductive wire wiring configuration>
Table 5 summarizes the effects of the metal film 70 on the triangular loop wiring as shown in FIG. 1 and the stitch wire wiring as shown in FIG.

表に記載した作成条件以外では、リード端子の被覆材料:Ag、導電ワイヤの材料:Au、金属膜の材料:Ag、発光素子の搭載数:6個、ワイヤの本数:2本/1素子、表面処理:なし、パッケージの種類:リードフレームタイプ、となっている。   Except for the production conditions described in the table, the lead terminal coating material: Ag, the conductive wire material: Au, the metal film material: Ag, the number of mounted light emitting elements: 6, the number of wires: 2/1 element, Surface treatment: None, Package type: Lead frame type.

Figure 2009055006
Figure 2009055006

ステッチワイヤ配線は、使用する導電ワイヤ40の全長は短くできるものの、発光素子10の発光面上に張り渡される導電ワイヤ40(すなわち、発光を吸収しやすい位置に配置された導電ワイヤ)の長さが増加するため、金属膜70が形成されていない場合の出力が低くなっている。そのため、ステッチワイヤ配線では、金属膜70を被覆したときの効果が顕著になったものと考えられる。表からわかるように、金属膜70被覆後では、いずれの配線でも遜色ない出力が得られた。   In the stitch wire wiring, although the total length of the conductive wire 40 to be used can be shortened, the length of the conductive wire 40 stretched on the light emitting surface of the light emitting element 10 (that is, the conductive wire arranged at a position where light emission is easily absorbed). Therefore, the output when the metal film 70 is not formed is low. Therefore, it is considered that the effect when the metal film 70 is coated becomes remarkable in the stitch wire wiring. As can be seen from the table, an output comparable to any wiring was obtained after the metal film 70 was coated.

<5.金属膜70表面へのコーティング膜の形成及び合金から成る金属膜70の耐久性効果>
金属膜70の表面にコーティング膜を形成した試料(実施例15及び16)と、金属膜70に銀合金(Ag−Au合金)を使用した試料(実施例6)との耐久性を試験した。比較のために、比較例1(金属膜なし)及び実施例2(Ag膜あり)も試験を行った。試験方法は、85℃で、400mA通電して1000時間点灯した。出力は、積分球により発光装置の光束を測定し、点灯直後(点灯時間0時間)の光束を100%とした。1000時間の点灯試験を行った後の出力低下の程度を比較した。実施例15の無機コーティングにはSiO膜を使用し、有機珪素化合物を滴下加熱して金属膜70の表面に形成した。実施例16の有機コーティングにはエポキシ樹脂を使用し、滴下加熱して金属膜表面に樹脂膜を形成させた。
<5. Formation of coating film on metal film 70 surface and durability effect of metal film 70 made of alloy>
Durability of a sample in which a coating film was formed on the surface of the metal film 70 (Examples 15 and 16) and a sample in which a silver alloy (Ag—Au alloy) was used for the metal film 70 (Example 6) were tested. For comparison, Comparative Example 1 (without metal film) and Example 2 (with Ag film) were also tested. The test method was lighting at 1000 ° C. with a current of 400 mA at 85 ° C. For the output, the luminous flux of the light emitting device was measured with an integrating sphere, and the luminous flux immediately after lighting (lighting time 0 hour) was taken as 100%. The degree of output decrease after a 1000 hour lighting test was compared. An SiO 2 film was used for the inorganic coating of Example 15, and an organic silicon compound was dropped and heated to form the surface of the metal film 70. An epoxy resin was used for the organic coating of Example 16, and the resin film was formed on the surface of the metal film by dropwise heating.

表に記載した作成条件以外では、リード端子の被覆材料:Ag、導電ワイヤの材料:Au、発光素子の搭載数:6個、ワイヤの本数:2本/1素子、導電ワイヤの配線形態:三角ループ配線、パッケージの種類:リードフレームタイプ、となっている。   Other than the preparation conditions described in the table, the lead terminal coating material: Ag, the conductive wire material: Au, the number of light emitting elements mounted: 6, the number of wires: 2/1 element, the wiring form of the conductive wires: triangular Loop wiring, package type: lead frame type.

Figure 2009055006
Figure 2009055006

出力が最も低下したのは、Ag膜70を形成した実施例2で、次いで、金属膜70を形成しなかった比較例1であった。コーティング膜を被覆した試料は、いずれも出力低下を抑制するが、特に無機コーティングによる出力低下を抑制する効果が著しかった。また、銀合金膜を形成した実施例6も、無機コーティングを施した試料と同等に出力低下を抑制する効果が高かった。この結果は、Ag膜が硫化等によって変色して、長期的には出力が大きく低下したためであると考えられる。また、実施例2が比較例1よりも出力の低下が著しかった理由は、比較例1ではリード端子がAg膜で被覆されているのに対して、実施例2はリード端子に加えて導電ワイヤもAg膜で被覆されていることから、Ag膜が変色した場合の出力低下の影響がより顕著に表れたためであると推測される。また、Ag膜にコーティング膜を被覆することにより、硫化等によるAg膜の変色が抑制され、長時間点灯しても出力が低下しにくくなったと考えられる。なお、銀合金は硫化等が起こりにくいため、コーティング膜を被覆していなくても変色が起こらず、出力が殆ど低下しなかったと考えられる。   The output decreased most in Example 2 in which the Ag film 70 was formed, and then in Comparative Example 1 in which the metal film 70 was not formed. All the samples coated with the coating film suppressed the decrease in output, but the effect of suppressing the decrease in output due to the inorganic coating was particularly remarkable. In addition, Example 6 in which the silver alloy film was formed was also highly effective in suppressing the output drop as in the sample with the inorganic coating. This result is considered to be because the Ag film was discolored due to sulfuration or the like, and the output was greatly reduced in the long term. The reason why the output of Example 2 was significantly lower than that of Comparative Example 1 was that the lead terminal was covered with an Ag film in Comparative Example 1, whereas Example 2 was a conductive wire in addition to the lead terminal. Is also covered with the Ag film, it is presumed that the influence of the output decrease when the Ag film is discolored appears more remarkably. Further, it is considered that by coating the Ag film with the coating film, discoloration of the Ag film due to sulfidation or the like is suppressed, and the output is less likely to be lowered even after lighting for a long time. In addition, it is considered that the silver alloy hardly undergoes sulfidation and the like, so that the discoloration did not occur even when the coating film was not coated, and the output was hardly reduced.

<6.パッケージタイプによる効果の相違>
3種類のパッケージタイプ(リードフレーム、セラミック基板、及びガラスエポキシ基板)を使用した場合の金属膜70の効果を表7にまとめる。
表に記載した作成条件以外では、リード端子の被覆材料:Ag、導電ワイヤの材料:Au、発光素子の搭載数:6個、ワイヤの本数:2本/1素子、導電ワイヤの配線形態:三角ループ配線、表面処理:なし、となっている。
<6. Difference in effect by package type>
Table 7 summarizes the effect of the metal film 70 when three types of packages (lead frame, ceramic substrate, and glass epoxy substrate) are used.
Except for the preparation conditions described in the table, lead terminal coating material: Ag, conductive wire material: Au, number of light emitting elements mounted: 6, number of wires: 2/1 element, conductive wire wiring form: triangle Loop wiring, surface treatment: None.

Figure 2009055006
Figure 2009055006

表7からわかるように、いずれのパッケージタイプでも金属膜70による出力の向上がみられた。   As can be seen from Table 7, the output of the metal film 70 was improved in any package type.

本発明の発光装置は、照明用光源、各種インジケーター用光源、車載用光源、ディスプレイ用光源、液晶のバックライト用光源、センサー用光源、信号機、車載部品、看板用チャンネルレター等、種々の光源に使用することができる。   The light emitting device of the present invention can be used for various light sources such as illumination light sources, various indicator light sources, in-vehicle light sources, display light sources, liquid crystal backlight light sources, sensor light sources, traffic lights, in-vehicle parts, signboard channel letters, and the like. Can be used.

実施の形態1に係る発光装置の上面図である。2 is a top view of the light emitting device according to Embodiment 1. FIG. 図1のA−A線に沿った実施の形態1に係る発光装置の断面図である。It is sectional drawing of the light-emitting device which concerns on Embodiment 1 along the AA line of FIG. 図2の符号Bの部分を拡大した部分拡大断面図である。It is the elements on larger scale which expanded the part of the code | symbol B of FIG. 図2の符号Cの部分を拡大した部分拡大断面図である。It is the elements on larger scale which expanded the part of the code | symbol C of FIG. 実施の形態1に係る発光装置において、コーティング膜の被覆例を説明するための断面図である。FIG. 3 is a cross-sectional view for explaining a coating example of a coating film in the light-emitting device according to Embodiment 1. 実施の形態1に係る発光装置において、コーティング膜の被覆例を説明するための断面図である。FIG. 3 is a cross-sectional view for explaining a coating example of a coating film in the light-emitting device according to Embodiment 1. 実施の形態1に係る発光装置において、コーティング膜の被覆例を説明するための断面図である。FIG. 3 is a cross-sectional view for explaining a coating example of a coating film in the light-emitting device according to Embodiment 1. 実施の形態1に係る発光装置において、コーティング膜の被覆例を説明するための断面図である。FIG. 3 is a cross-sectional view for explaining a coating example of a coating film in the light-emitting device according to Embodiment 1. 実施の形態1に係る発光装置において、コーティング膜の被覆例を説明するための断面図である。FIG. 3 is a cross-sectional view for explaining a coating example of a coating film in the light-emitting device according to Embodiment 1. 実施の形態1に係る発光装置の製造工程を説明する概略上面図である。6 is a schematic top view illustrating a manufacturing process for the light-emitting device according to Embodiment 1. FIG. 実施の形態1に係る発光装置の電気めっき工程を説明する概略断面図である。5 is a schematic cross-sectional view illustrating an electroplating process of the light emitting device according to Embodiment 1. FIG. 実施の形態1に係る発光装置の変形例を示す上面図である。FIG. 6 is a top view illustrating a modification of the light emitting device according to Embodiment 1. 実施の形態2に係る発光装置の上面図である。6 is a top view of a light emitting device according to Embodiment 2. FIG. 従来の発光装置のワイヤボンディングを説明する部分拡大図である。It is the elements on larger scale explaining the wire bonding of the conventional light-emitting device. 従来の発光装置のワイヤボンディングを説明する部分拡大図である。It is the elements on larger scale explaining the wire bonding of the conventional light-emitting device.

符号の説明Explanation of symbols

1 発光装置、 10 発光素子、 12 電極、 20 パッケージ、 30 導電部材(第1リード電極)、 301 内部導電部(第1リード端子)、 302 外部導電部(外部端子)、 32 導電部材(第2リード電極)、 321 内部導電部(第2リード端子)、 322 外部導電部(外部端子)、 40 導電ワイヤ、 50 第1ボンド、 60 第2ボンド、 62 ワイヤ端面、 70 金属膜、 72 コーティング膜。   DESCRIPTION OF SYMBOLS 1 Light emitting device, 10 Light emitting element, 12 electrodes, 20 packages, 30 Conductive member (first lead electrode), 301 Internal conductive part (first lead terminal), 302 External conductive part (external terminal), 32 Conductive member (second Lead electrode), 321 internal conductive part (second lead terminal), 322 external conductive part (external terminal), 40 conductive wire, 50 first bond, 60 second bond, 62 wire end face, 70 metal film, 72 coating film.

Claims (13)

発光素子の電極と導電部材とを電気的に接続する導電ワイヤを有する発光装置であって、
前記発光素子の電極及び前記導電部材の少なくとも一方と、前記導電ワイヤと、の接合部分における前記導電ワイヤの表面が金属膜で被覆されており、
前記発光素子の発光ピーク波長において、前記導電ワイヤの反射率よりも、前記金属膜の反射率が高いことを特徴とする発光装置。
A light-emitting device having a conductive wire that electrically connects an electrode of a light-emitting element and a conductive member,
The surface of the conductive wire at the joint portion between the conductive wire and at least one of the electrode of the light emitting element and the conductive member is covered with a metal film,
The light emitting device, wherein the reflectance of the metal film is higher than the reflectance of the conductive wire at the emission peak wavelength of the light emitting element.
前記金属膜は、前記接合部分において、前記電極の表面又は前記導電部材の表面と、前記導電ワイヤの表面と、に渡って連続的に被覆されていることを特徴とする請求項1に記載の発光装置。   The said metal film is continuously coat | covered over the surface of the said electrode or the surface of the said electrically-conductive member, and the surface of the said electrically conductive wire in the said junction part. Light emitting device. 前記導電ワイヤの少なくとも一方の端部はボール状になっており、
前記ボール状の端部は、つぶれた形状を有している請求項1又は2に記載の発光装置。
At least one end of the conductive wire has a ball shape,
The light emitting device according to claim 1, wherein the ball-shaped end portion has a collapsed shape.
前記導電ワイヤの少なくとも一方の端面が前記金属膜で被覆されている請求項1乃至3のいずれか1項に記載の発光装置。   The light emitting device according to claim 1, wherein at least one end face of the conductive wire is covered with the metal film. 前記金属膜が、Ag合金を含む金属材料又はAgを有することを特徴とする請求項1乃至4のいずれか1項に記載の発光装置。   The light emitting device according to claim 1, wherein the metal film includes a metal material containing Ag alloy or Ag. 前記発光素子の発光ピーク波長が400nm〜530nmであり、
前記導電ワイヤが、Au、Cu、Al、W及びステンレスである群から選択された1種を含む金属材料を有する請求項1乃至5のいずれか1項に記載の発光装置。
The emission peak wavelength of the light emitting element is 400 nm to 530 nm,
The light emitting device according to any one of claims 1 to 5, wherein the conductive wire includes a metal material including one selected from the group consisting of Au, Cu, Al, W, and stainless steel.
前記金属膜の表面が、さらにコーティング膜により被覆されていることを特徴とする請求項1乃至6のいずれか1項に記載の発光装置。   The light emitting device according to claim 1, wherein a surface of the metal film is further covered with a coating film. 前記コーティング膜が、さらに、前記発光素子を被覆していることを特徴とする請求項7に記載の発光装置。   The light emitting device according to claim 7, wherein the coating film further covers the light emitting element. 前記発光装置は、凹部を有するパッケージをさらに有し、
前記導電部材は、前記凹部内で露出された内部導電部、および、前記内部導電部から前記パッケージを貫通して外部に延在された外部導電部、を含み、
前記コーティング膜が、前記凹部の内面と前記内部導電部の表面とに渡って連続的に被覆されていることを特徴とする請求項7又は8に記載の発光装置。
The light emitting device further includes a package having a recess,
The conductive member includes an internal conductive part exposed in the recess, and an external conductive part that extends from the internal conductive part to the outside through the package,
The light emitting device according to claim 7 or 8, wherein the coating film is continuously coated over the inner surface of the recess and the surface of the internal conductive portion.
前記コーティング膜が、前記パッケージの外面と前記外部導電部の表面とに渡って連続的に被覆されていることを特徴とする請求項9に記載の発光装置。   The light emitting device according to claim 9, wherein the coating film is continuously coated over an outer surface of the package and a surface of the external conductive portion. 前記発光装置が、前記発光素子を封止する封止樹脂をさらに含み、
前記封止樹脂の表面が、コーティング膜により被覆されていることを特徴とする請求項1乃至6のいずれか1項に記載の発光装置。
The light emitting device further includes a sealing resin for sealing the light emitting element,
The light emitting device according to claim 1, wherein a surface of the sealing resin is covered with a coating film.
前記コーティング膜は、無機コーティング又は有機コーティングから成ることを特徴とする請求項7乃至11のいずれか1項に記載の発光装置。   The light-emitting device according to claim 7, wherein the coating film is made of an inorganic coating or an organic coating. 発光素子の電極と導電部材とを電気的に接続する導電ワイヤを有する発光装置の製造方法であって、
前記発光素子の電極と前記導電部材とを前記導電ワイヤで接続するワイヤボンディング工程と、
前記発光素子の電極、前記導電部材、及び前記導電ワイヤを電気めっき法により金属膜で被覆する電気めっき工程と、を備えた発光装置の製造方法。
A method of manufacturing a light-emitting device having a conductive wire that electrically connects an electrode of a light-emitting element and a conductive member,
A wire bonding step of connecting the electrode of the light emitting element and the conductive member with the conductive wire;
An electroplating step of covering the electrode of the light emitting element, the conductive member, and the conductive wire with a metal film by an electroplating method.
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US9188321B2 (en) 2010-09-30 2015-11-17 Sharp Kabushiki Kaisha Light-emitting device and lighting device provided with the same
US9263315B2 (en) 2010-03-30 2016-02-16 Dai Nippon Printing Co., Ltd. LED leadframe or LED substrate, semiconductor device, and method for manufacturing LED leadframe or LED substrate
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JP2017126743A (en) * 2016-01-12 2017-07-20 シチズン電子株式会社 LED package
US9773960B2 (en) 2010-11-02 2017-09-26 Dai Nippon Printing Co., Ltd. Lead frame for mounting LED elements, lead frame with resin, method for manufacturing semiconductor devices, and lead frame for mounting semiconductor elements
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JP2021500749A (en) * 2017-10-19 2021-01-07 ルミレッズ リミテッド ライアビリティ カンパニー Luminescent device package

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0353858U (en) * 1989-09-29 1991-05-24
JP2001358168A (en) * 2000-06-12 2001-12-26 Nippon Steel Corp Semiconductor device and its manufacturing method
JP2004088013A (en) * 2002-08-29 2004-03-18 Nichia Chem Ind Ltd Light-emitting device and manufacturing method thereof
JP2006287032A (en) * 2005-04-01 2006-10-19 Nichia Chem Ind Ltd Light emitting device
JP2007067183A (en) * 2005-08-31 2007-03-15 Showa Denko Kk Led package with compound semiconductor light emitting device
JP2007080990A (en) * 2005-09-13 2007-03-29 Showa Denko Kk Light emitting device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0353858U (en) * 1989-09-29 1991-05-24
JP2001358168A (en) * 2000-06-12 2001-12-26 Nippon Steel Corp Semiconductor device and its manufacturing method
JP2004088013A (en) * 2002-08-29 2004-03-18 Nichia Chem Ind Ltd Light-emitting device and manufacturing method thereof
JP2006287032A (en) * 2005-04-01 2006-10-19 Nichia Chem Ind Ltd Light emitting device
JP2007067183A (en) * 2005-08-31 2007-03-15 Showa Denko Kk Led package with compound semiconductor light emitting device
JP2007080990A (en) * 2005-09-13 2007-03-29 Showa Denko Kk Light emitting device

Cited By (38)

* Cited by examiner, † Cited by third party
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US9768360B2 (en) 2009-12-18 2017-09-19 Osram Opto Semiconductors Gmbh Optoelectronic component and method of producing an optoelectronic component
US9508903B2 (en) 2009-12-18 2016-11-29 Osram Opto Semiconductors Gmbh Optoelectronic component and method for producing an optoelectronic component
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US9887331B2 (en) 2010-03-30 2018-02-06 Dai Nippon Printing Co., Ltd. LED leadframe or LED substrate, semiconductor device, and method for manufacturing LED leadframe or LED substrate
US9966517B2 (en) 2010-03-30 2018-05-08 Dai Nippon Printing Co., Ltd. LED leadframe or LED substrate, semiconductor device, and method for manufacturing LED leadframe or LED substrate
US9263315B2 (en) 2010-03-30 2016-02-16 Dai Nippon Printing Co., Ltd. LED leadframe or LED substrate, semiconductor device, and method for manufacturing LED leadframe or LED substrate
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US9306127B2 (en) 2010-08-25 2016-04-05 Nichia Corporation Light emitting device that includes protective film having uniform thickness
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US9087966B2 (en) 2010-08-25 2015-07-21 Nichia Corporation Light emitting device that includes reflective film surface covered with protective film having uniform thickness
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US9490236B2 (en) 2010-09-30 2016-11-08 Sharp Kabushiki Kaisha Light-emitting device and lighting device provided with the same
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