JP2009040919A - Thermosetting resin composition, resin film using the same, laminate and prepreg - Google Patents
Thermosetting resin composition, resin film using the same, laminate and prepreg Download PDFInfo
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Abstract
Description
本発明は、熱硬化性樹脂組成物に関し、詳しくは、誘電率および誘電正接に優れた熱硬化性樹脂組成物、及びこれを用いてなる樹脂フィルム、積層板、プリプレグに関する。 The present invention relates to a thermosetting resin composition, and in particular, to a thermosetting resin composition excellent in dielectric constant and dielectric loss tangent, and a resin film, a laminate, and a prepreg using the same.
従来から、熱硬化性樹脂組成物において、誘電率や保存安定性の効果の向上を図ることを目的とした技術が種々提案されている。 Conventionally, various techniques for improving the effect of dielectric constant and storage stability have been proposed in thermosetting resin compositions.
例えば、特許文献1では、低い誘電正接と早い硬化速度を与え、かつ保存安定性に優れるエポキシ樹脂組成物等を提供することを目的として、エポキシ樹脂、活性エステル化合物、硬化促進剤としてイミダゾールと3級アミンである樹脂組成物が開示されている。そして、該文献1には、エポキシ樹脂に対してイミダゾールと3級アミンが0.2〜1.5重量部であると記載されている(特許請求の範囲)。 For example, in Patent Document 1, an epoxy resin, an active ester compound, imidazole and 3 as a curing accelerator are provided for the purpose of providing an epoxy resin composition or the like that provides a low dielectric loss tangent and a fast curing rate and is excellent in storage stability. Resin compositions that are secondary amines are disclosed. And this literature 1 describes that imidazole and a tertiary amine are 0.2-1.5 weight part with respect to an epoxy resin (Claims).
しかし、このような従来の熱硬化性樹脂組成物に対して、更なる誘電率・誘電正接の向上がのぞまれている。
そこで、本発明の目的は、誘電率および誘電正接に優れた熱硬化性樹脂組成物を提供することにある。 Then, the objective of this invention is providing the thermosetting resin composition excellent in the dielectric constant and the dielectric loss tangent.
また、本発明の他の目的は、上記の熱硬化性樹脂組成物、及びこれを用いてなる樹脂フィルム、積層板、プリプレグを提供することにある。 Moreover, the other objective of this invention is to provide said thermosetting resin composition, and a resin film, a laminated board, and a prepreg using this.
本発明者は、鋭意研究の結果、従来技術の問題のような現象は、空気を遮断あるいは低酸素状態で硬化することに起因することを突き止めた。さらに、特定の組成からなる樹脂組成物が、本発明の目的を達成し得ることの知見を得た。本発明は、以下の通りの構成からなる発明を提供するものである。 As a result of diligent research, the present inventor has found that a phenomenon such as a problem in the prior art is caused by blocking air or curing in a low oxygen state. Furthermore, the knowledge that the resin composition which consists of a specific composition can achieve the objective of this invention was acquired. The present invention provides an invention having the following configuration.
1.エポキシ系樹脂と、硬化剤と、硬化促進剤と、有機溶剤とからなる樹脂組成物において、
前記硬化剤が活性エステル型硬化剤を含み、かつ、該活性エステル型硬化剤はエポキシ樹脂100重量部に対し、50〜200重量部であり、
前記硬化促進剤がイミダゾール系化合物およびリン系化合物を含み、かつ、該硬化促進剤の含有量が前記活性エステル型硬化剤100重量部に対して0.8〜10重量部であることを特徴とする、熱硬化性樹脂組成物。
1. In a resin composition comprising an epoxy resin, a curing agent, a curing accelerator, and an organic solvent,
The curing agent contains an active ester type curing agent, and the active ester type curing agent is 50 to 200 parts by weight with respect to 100 parts by weight of the epoxy resin,
The curing accelerator includes an imidazole compound and a phosphorus compound, and the content of the curing accelerator is 0.8 to 10 parts by weight with respect to 100 parts by weight of the active ester type curing agent. A thermosetting resin composition.
2.前記イミダゾール系化合物と前記リン系化合物との重量割合が、1:0.5〜1:1.3であることを特徴とする、前記1に記載の熱硬化性樹脂組成物。 2. 2. The thermosetting resin composition as described in 1 above, wherein a weight ratio of the imidazole compound and the phosphorus compound is 1: 0.5 to 1: 1.3.
3.前記イミダゾール系化合物が、トリアジン環を有することを特徴とする、前記1または2に記載の熱硬化性樹脂組成物。 3. 3. The thermosetting resin composition as described in 1 or 2 above, wherein the imidazole compound has a triazine ring.
4.前記硬化促進剤の合計量が、前記活性エステル型硬化剤の合計量100重量部に対して2.5〜6重量部であることを特徴とする、前記1に記載の熱硬化性樹脂組成物 4). 2. The thermosetting resin composition as described in 1 above, wherein the total amount of the curing accelerator is 2.5 to 6 parts by weight with respect to 100 parts by weight of the total amount of the active ester type curing agent.
5.さらに無機充填剤を含有することを特徴とする、前記1に記載の熱硬化性樹脂組成物。 5). The thermosetting resin composition as described in 1 above, further comprising an inorganic filler.
6.前記無機充填剤が、層状ケイ酸塩および/またはシリカであることを特徴とする、前記5に記載の熱硬化性樹脂組成物。 6). 6. The thermosetting resin composition as described in 5 above, wherein the inorganic filler is a layered silicate and / or silica.
7.前記1〜6の何れかに記載の熱硬化性樹脂組成物中の有機溶剤を揮発させる処理を行い、フィルム状に形成されてなることを特徴とする、樹脂フィルム。 7. The resin film formed by performing the process which volatilizes the organic solvent in the thermosetting resin composition in any one of said 1-6, and forming in a film form.
8.導電層を形成してなることを特徴とする、積層板。 8). A laminate comprising a conductive layer.
9.前記1〜6の何れかに記載の熱硬化性樹脂組成物を、基材に含浸し、有機溶剤を揮発させてなることを特徴とする、プリプレグ。 9. A prepreg obtained by impregnating a base material with the thermosetting resin composition according to any one of 1 to 6 above and volatilizing an organic solvent.
10.前記1〜6の何れかに記載の前記樹脂組成物、前記7に記載の樹脂フィルム、または、前記9のプリプレグの何れかに、導電層を形成してなることを特徴とする、積層板。 10. A laminate comprising a conductive layer formed on any of the resin composition according to any one of 1 to 6, the resin film according to 7 or the prepreg according to 9.
本発明によれば、誘電率および誘電正接に優れた熱硬化性樹脂組成物、及びこれを用いてなる樹脂フィルム、積層板、プリプレグが提供される。 ADVANTAGE OF THE INVENTION According to this invention, the thermosetting resin composition excellent in the dielectric constant and dielectric loss tangent, and the resin film, laminated board, and prepreg which use this are provided.
以下、本発明の熱硬化性樹脂組成物について、好ましい実施形態に基づいて詳細に説明する。 本発明の組成物は、既述のように、エポキシ系樹脂と、硬化剤と、硬化促進剤と、有機溶剤とからなる樹脂組成物において、
前記硬化剤が活性エステル型硬化剤を含み、かつ、該活性エステル型硬化剤はエポキシ樹脂100重量部に対し、50〜200重量部であり、
前記硬化促進剤がイミダゾール系化合物およびリン系化合物を含み、かつ、該硬化促進剤の含有量が前記活性エステル型硬化剤100重量部に対して0.8〜10重量部であることを特徴とする。
Hereinafter, the thermosetting resin composition of the present invention will be described in detail based on preferred embodiments. As described above, the composition of the present invention is a resin composition comprising an epoxy resin, a curing agent, a curing accelerator, and an organic solvent.
The curing agent contains an active ester type curing agent, and the active ester type curing agent is 50 to 200 parts by weight with respect to 100 parts by weight of the epoxy resin,
The curing accelerator includes an imidazole compound and a phosphorus compound, and the content of the curing accelerator is 0.8 to 10 parts by weight with respect to 100 parts by weight of the active ester type curing agent. To do.
本発明の組成物は、このように、特に活性エステル型硬化剤に対し(エポキシ樹脂に対しても)、硬化促進剤の量を通常より多く配合することにより、誘電率、誘電正接などの電気特性が向上する。
なお、ここでいう通常とは、例えば先述の特許文献1においては、実施例に記載されている硬化促進剤の量を指す。
In this way, the composition of the present invention, in particular with respect to the active ester type curing agent (also with respect to the epoxy resin), blends more curing accelerators than usual, so that the electrical properties such as dielectric constant and dielectric loss tangent are increased. Improved characteristics.
In addition, the normal here refers to the quantity of the hardening accelerator described in the Example in the above-mentioned patent document 1, for example.
本発明に用いられる硬化促進剤は、イミダゾール系化合物およびリン系化合物を含むものであるが、その配合割合は、イミダゾール系化合物とリン系化合物との重量割合が、十分な硬化性と保存安定性の両立の点で、1:0.5〜1:1.3であることが好ましく、1:0.6〜1:1.1であることがさらに好ましい。 The curing accelerator used in the present invention contains an imidazole compound and a phosphorus compound, but the mixing ratio of the weight ratio of the imidazole compound and the phosphorus compound is sufficient for both curability and storage stability. In this point, it is preferably 1: 0.5 to 1: 1.3, and more preferably 1: 0.6 to 1: 1.1.
イミダゾール系化合物としては、特に制限されるものではないが、例えば、トリアジン環を有するもの、シアノ基を有するもの、アルコキシ基を有するもの等が挙げられ、これらの化合物を1種又は2種以上で用いられる。
中でも、誘電率・誘電正接がさらに改良され、金属との密着性も良い点で、トリアジン環を有するもの(トリアジン環含有イミダゾール化合物)が好ましい。
Although it does not restrict | limit especially as an imidazole type compound, For example, what has a triazine ring, what has a cyano group, what has an alkoxy group, etc. are mentioned, These compounds are 1 type (s) or 2 or more types. Used.
Among them, a compound having a triazine ring (triazine ring-containing imidazole compound) is preferable in that the dielectric constant and dielectric loss tangent are further improved and the adhesion to metal is good.
トリアジン環含有イミダゾール化合物としては、具体例として、2,4−ジアミノ−6−(2‘−メチルイミダゾリル)エチル−s−トリアジン、2,4−ジアミノ−6−(2‘−ウンデシルイミダゾリル)エチル−s−トリアジン、2,4−ジアミノ−6−(2‘−メチル−4−メチルイミダゾリル)エチル−s−トリアジン、およびこれらのイソシアヌル酸付加物等が挙げられる。 Specific examples of the triazine ring-containing imidazole compound include 2,4-diamino-6- (2′-methylimidazolyl) ethyl-s-triazine, 2,4-diamino-6- (2′-undecylimidazolyl) ethyl. -S-triazine, 2,4-diamino-6- (2'-methyl-4-methylimidazolyl) ethyl-s-triazine, and their isocyanuric acid adducts.
また、リン系化合物としては、特に制限されるものではないが、例えば、トリフェニルホスフィン、トリo−トリルホスフィン、トリn−ブチルホスフィン、トリフェニルホスファイト等が挙げられ、これらの化合物を1種又は2種以上で用いられる。 In addition, the phosphorus compound is not particularly limited, and examples thereof include triphenylphosphine, tri-o-tolylphosphine, tri-n-butylphosphine, triphenylphosphite, and the like. Or it is used by 2 or more types.
本発明の組成物において、硬化促進剤の含有量は、活性エステル型硬化剤100重量部に対して0.8〜10重量部であるが、0.8重量部未満では硬化が進行しにくくなる。10重量部を越えると硬化促進剤が硬化体中に均一分散しにくくなり、硬化促進剤がブリードアウトしやすくなったり、硬化の均一性が得られなくなったりして、導電層との接着性が低下する。特に硬化が十分に進行し、かつ硬化促進剤が硬化体中に均一分散可能である点では、2.5〜6重量部であることが好ましい。 In the composition of the present invention, the content of the curing accelerator is 0.8 to 10 parts by weight with respect to 100 parts by weight of the active ester curing agent. . When the amount exceeds 10 parts by weight, the curing accelerator is difficult to uniformly disperse in the cured body, and the curing accelerator tends to bleed out or the uniformity of curing cannot be obtained, resulting in adhesion to the conductive layer. descend. In particular, the amount is preferably 2.5 to 6 parts by weight from the viewpoint that curing proceeds sufficiently and the curing accelerator can be uniformly dispersed in the cured body.
本発明の組成物に用いられる硬化剤は、活性エステル型硬化剤を含むものである。活性エステル型硬化剤としては、例えば、特開2002−12650号公報や特開2004−169021号公報に記載されている活性エステル等が挙げられる。 The curing agent used in the composition of the present invention contains an active ester type curing agent. Examples of the active ester type curing agent include active esters described in JP-A Nos. 2002-12650 and 2004-169021.
活性エステル型硬化剤の含有量は、エポキシ樹脂100重量部に対し、50〜200重量部である。特に、高周波における誘電率及び誘電正接を小さくすることができる点で、エポキシ樹脂100重量部に対して、活性エステル型硬化剤を90〜200重量部含むことが望ましい。
当量比で見た場合、エポキシ樹脂のエポキシ当量と活性エステル型硬化剤の当量との比は、1:1.6〜1:4であると、高周波における誘電率及び誘電正接を小さくすることができる。更には、エポキシ当量と活性エステル型硬化剤の当量との比は1:2〜1:3であることが望ましい。
The content of the active ester type curing agent is 50 to 200 parts by weight with respect to 100 parts by weight of the epoxy resin. In particular, it is desirable to contain 90 to 200 parts by weight of an active ester type curing agent with respect to 100 parts by weight of the epoxy resin in that the dielectric constant and dielectric loss tangent at high frequencies can be reduced.
When viewed in terms of equivalent ratio, if the ratio of the epoxy equivalent of the epoxy resin to the equivalent of the active ester type curing agent is 1: 1.6 to 1: 4, the dielectric constant and dielectric loss tangent at high frequencies can be reduced. it can. Furthermore, the ratio of the epoxy equivalent to the equivalent of the active ester type curing agent is preferably 1: 2 to 1: 3.
また、硬化剤として、活性エステル型硬化剤のほかに、例えば、フェノール系化合物、酸無水物系化合物、ジシアンジアミド等の公知の硬化剤を用いることもできる。 In addition to the active ester type curing agent, for example, a known curing agent such as a phenol compound, an acid anhydride compound, or dicyandiamide can be used as the curing agent.
本発明の組成物に用いられる熱硬化性樹脂としてのエポキシ系樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールM型エポキシ樹脂、ビフェニル型エポキシ樹脂、ナフタレン型エポキシ樹脂、芳香族アミン型エポキシ樹脂、アミノフェノール型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、アルキルフェノール型エポキシ樹脂などが挙げられる。特に、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビフェニル型エポキシ樹脂が好ましい。 Examples of the epoxy resin as the thermosetting resin used in the composition of the present invention include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol M type epoxy resin, biphenyl type epoxy resin, naphthalene type epoxy resin, aromatic Examples thereof include amine-type epoxy resins, aminophenol-type epoxy resins, dicyclopentadiene-type epoxy resins, and alkylphenol-type epoxy resins. In particular, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene type epoxy resin, and biphenyl type epoxy resin are preferable.
本発明の樹脂組成物は、エポキシ系樹脂以外の樹脂として、ポリビニルアセタール樹脂、フェノキシ樹脂、ポリフェニレンエーテル樹脂などを含有することが出来る。銅貼り積層板に用いた場合に銅貼りとの密着強度に優れる点で、ポリビニルアセタール樹脂が好ましい。ポリビニルアセタール樹脂としては、その分子量が5000〜1000000のものが好ましい。 The resin composition of the present invention can contain a polyvinyl acetal resin, a phenoxy resin, a polyphenylene ether resin, or the like as a resin other than an epoxy resin. A polyvinyl acetal resin is preferable in that it is excellent in adhesion strength with copper bonding when used for a copper-clad laminate. As a polyvinyl acetal resin, that whose molecular weight is 5000-1 million is preferable.
上記ポリビニルアセタール樹脂の製造方法としては、特に限定されるものではないが、例えば、ポリビニルアルコール(PVA)を温水もしくは熱水に溶解し、得られたPVA水溶液を所定の温度(例えば0〜95℃)に保持した状態で、アルデヒドおよび酸触媒を添加し、攪拌しながらアセタール 化反応を進行させ、次いで、反応温度を上げて熟成することにより反応を完結させ、その後、中和、水洗および乾燥の諸工程を経て、粉末状のポリビニルアセタール樹脂を得る方法が挙げられる。 Although it does not specifically limit as a manufacturing method of the said polyvinyl acetal resin, For example, polyvinyl alcohol (PVA) is melt | dissolved in warm water or hot water, The obtained PVA aqueous solution is predetermined temperature (for example, 0-95 degreeC). ) And an aldehyde and an acid catalyst are added, and the acetalization reaction proceeds while stirring, and then the reaction is completed by raising the reaction temperature and aging, followed by neutralization, water washing and drying. The method of obtaining a powdery polyvinyl acetal resin through various processes is mentioned.
上記ポリビニルアセタール樹脂の製造に用いられるアルデヒドとしては、特に限定されるものではないが、例えば、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、n−ブチルアルデヒド、イソブチルアルデヒド、バレルアルデヒド、n−ヘキシルアルデヒド、2−エチルブチルアルデヒド、ベンズアルデヒド、シンナムアルデヒド等が挙げられる。これらのアルデヒドは、単独で用いられても良いし、2種類以上が併用されても良い。 Although it does not specifically limit as aldehyde used for manufacture of the said polyvinyl acetal resin, For example, formaldehyde, acetaldehyde, propionaldehyde, n-butyraldehyde, isobutyraldehyde, valeraldehyde, n-hexyl aldehyde, 2-ethyl Examples include butyraldehyde, benzaldehyde, cinnamaldehyde, and the like. These aldehydes may be used alone or in combination of two or more.
本発明の組成物に用いられる有機溶剤としては、特に制限されるものではないが、例えば、DMF(N,N−ジメチルホルムアミド)、MEK(メチルエチルケトン)、MIBK(メチルイソブチルケトン)、NMP(N−メチル-ピロリドン)、トルエン等が挙げられ、これらの化合物を1種又は2種以上で用いられる。 The organic solvent used in the composition of the present invention is not particularly limited. For example, DMF (N, N-dimethylformamide), MEK (methyl ethyl ketone), MIBK (methyl isobutyl ketone), NMP (N— Methyl-pyrrolidone), toluene and the like, and these compounds may be used alone or in combination.
本発明の組成物は、さらに無機充填剤を含有することが、寸法安定性の向上の点で好ましい。
無機充填剤としては、例えば、層状ケイ酸塩;溶融シリカ、コロイダルシリカ、ヒュームドシリカ、焼成シリカ、沈降シリカ、粉砕シリカ等のシリカ;および水酸化アルミニウム等が挙げられる。
特に、樹脂中での高分散性を実現しやすい点で、層状ケイ酸塩および/またはシリカが好ましい。
The composition of the present invention preferably further contains an inorganic filler from the viewpoint of improving dimensional stability.
Examples of the inorganic filler include layered silicates; fused silica, colloidal silica, fumed silica, baked silica, precipitated silica, silica such as ground silica; and aluminum hydroxide.
In particular, a layered silicate and / or silica is preferable in that high dispersibility in the resin can be easily realized.
前記無機充填剤として層状ケイ酸塩を用いる場合には、その含有量は、エポキシ樹脂及び硬化剤100重量部に対して、0.05〜7重量部、特に0.1〜4重量部が好ましい。
多すぎると、組成物の粘度が高くなりハンドリング性が悪くなり、少ないと寸法安定性などの機械物性の改善が得られない。
When layered silicate is used as the inorganic filler, the content thereof is preferably 0.05 to 7 parts by weight, particularly 0.1 to 4 parts by weight with respect to 100 parts by weight of the epoxy resin and the curing agent. .
When the amount is too large, the viscosity of the composition becomes high and handling properties are deteriorated. When the amount is too small, improvement in mechanical properties such as dimensional stability cannot be obtained.
前記無機充填剤としてシリカを用いる場合には、その含有量は、エポキシ樹脂及び硬化剤100重量部に対して、10〜75重量部、特に20〜50重量部が好ましい。
多すぎると、誘電率が上昇し、少ないと寸法安定性などの機械物性の改善が得られない。
When silica is used as the inorganic filler, the content thereof is preferably 10 to 75 parts by weight, particularly preferably 20 to 50 parts by weight with respect to 100 parts by weight of the epoxy resin and the curing agent.
When the amount is too large, the dielectric constant increases. When the amount is too small, improvement in mechanical properties such as dimensional stability cannot be obtained.
本発明の樹脂組成物には、その他必要に応じて、有機溶剤以外の溶剤、難燃剤、無機充填材以外の充填剤(例えば、有機充填材、有機無機複合充填材等)、酸化防止剤、着色剤などを添加することができる。 In the resin composition of the present invention, if necessary, a solvent other than an organic solvent, a flame retardant, a filler other than an inorganic filler (for example, an organic filler, an organic-inorganic composite filler, etc.), an antioxidant, Coloring agents and the like can be added.
本発明の樹脂組成物の製造方法、及びその後の硬化方法等は、特に制限されない。 The method for producing the resin composition of the present invention and the subsequent curing method are not particularly limited.
また、ビルドアップ基板の製造方法の一例として以下の方法を挙げることができる。
シート状樹脂積層体から保護シートを剥離した樹脂シートを、ベースとなる回路を形成したFR−4基板にラミネートする(基材シートは剥離する)−硬化する−めっきのための表面処理する−銅めっきする−回路パターンを形成する(レジスト塗布、露光、エッチング)、シート状樹脂積層板をラミネート(あらかじめシート状の積層体にしていない物は塗布し、溶剤を揮発乾燥する)、加熱硬化、(以後、6回繰り返し、多層積層基板を形成する)、最終の加熱硬化を行う。各工程における加熱硬化は、樹脂シートの硬化と同時に、銅めっきのエージングや結晶成長を行うことが出来る。また、硬化した樹脂シート、銅めっき、硬化しようとする樹脂シートとの残応力を低減することも出来る。
Moreover, the following method can be mentioned as an example of the manufacturing method of a buildup board | substrate.
Laminate the resin sheet from which the protective sheet is peeled off from the sheet-shaped resin laminate on the FR-4 substrate on which the base circuit is formed (the base sheet peels off)-cure-surface treatment for plating-copper Plating-forming a circuit pattern (resist coating, exposure, etching), laminating a sheet-like resin laminate (applying a material that has not been made into a sheet-like laminate beforehand, and evaporating and drying the solvent), heat curing, ( Thereafter, the multilayer laminated substrate is formed 6 times repeatedly, and the final heat curing is performed. Heat curing in each step can perform aging of copper plating and crystal growth simultaneously with curing of the resin sheet. Moreover, the residual stress with the cured resin sheet, the copper plating, and the resin sheet to be cured can be reduced.
溶剤を含む樹脂組成物を、ベースとなる基板に塗布する−溶剤を揮発させる−硬化する−めっきのための表面処理する−めっきする−テストパターンを形成する(レジスト塗布、露光、エッチング)、溶剤を含む樹脂組成物を、ベースとなる基板に塗布する(以後、繰り返す)、最終硬化。
ビヤホール、スルーホールの形成は、定法により適宜行って良い。
Applying a resin composition containing a solvent to a base substrate-Volatilizing the solvent-Curing-Surface treatment for plating-Plating-Forming a test pattern (resist coating, exposure, etching), solvent Is applied to a base substrate (hereinafter repeated), and finally cured.
The formation of the via hole and the through hole may be appropriately performed by a usual method.
本発明の樹脂組成物は、その用途に特に制限されないが、当該組成物の状態のまま又は後述する樹脂フィルム、プリプレグ、積層板等の形態として、例えば、接着剤、半導体封止剤、フィルム状接着剤、層間絶縁材等に用いられる。 The resin composition of the present invention is not particularly limited in its use, but as a form of the resin film, prepreg, laminate, etc. described below or in the state of the composition, for example, an adhesive, a semiconductor sealing agent, a film Used for adhesives, interlayer insulating materials, etc.
また、本発明によれば、前述した熱硬化性樹脂組成物中の有機溶剤を揮発させる処理を行い、フィルム状に形成されてなる樹脂フィルムが提供される。
ここでの処理は、硬化処理又は化学処理等が行われる。
硬化処理とは、硬化反応が十分に反応する温度(たとえば150℃)で、熱硬化性樹脂組成物を30分以上加熱する処理をいう。
化学処理とは、膨潤液および/または粗化液に合計5分以上浸すことで、熱硬化性樹脂組成物の溶剤を溶出させる処理をいう。
Moreover, according to this invention, the process which volatilizes the organic solvent in the thermosetting resin composition mentioned above is performed, and the resin film formed in a film form is provided.
In this process, a curing process or a chemical process is performed.
The curing treatment refers to a treatment in which the thermosetting resin composition is heated for 30 minutes or more at a temperature at which the curing reaction sufficiently reacts (for example, 150 ° C.).
The chemical treatment refers to a treatment for eluting the solvent of the thermosetting resin composition by dipping in a swelling liquid and / or a roughening liquid for a total of 5 minutes or more.
また、本発明によれば、めっき及び銅箔積層からなる導電層を形成してなる積層板が提供される。 Moreover, according to this invention, the laminated board formed by forming the electrically conductive layer which consists of plating and copper foil lamination | stacking is provided.
また、本発明によれば、前述した熱硬化性樹脂組成物を、基材に含浸し、有機溶剤を揮発させてなるプリプレグが提供される。 Moreover, according to this invention, the prepreg formed by impregnating a base material with the thermosetting resin composition mentioned above and volatilizing an organic solvent is provided.
また、本発明によれば、前述した樹脂組成物、樹脂フィルム、または、前述したプリプレグの何れかに、めっき及び銅箔からなる導電層を形成してなる積層板が提供される。 Moreover, according to this invention, the laminated board formed by forming the electrically conductive layer which consists of plating and copper foil in either the resin composition mentioned above, a resin film, or the prepreg mentioned above is provided.
ここで、導電層とは、電気信号を伝達することが可能な層を意味し、金属、導電性樹脂、導電性炭素などが挙げられる。導電層は、回路パターンや端子が形成されていても良い。 Here, the conductive layer means a layer capable of transmitting an electrical signal, and examples thereof include metals, conductive resins, and conductive carbon. The conductive layer may be formed with a circuit pattern or a terminal.
めっきは、銅、金、銀、などを用いることが出来る。形成方法は、公知の手法を採用することが出来、樹脂組成物上に、無電解めっき、あるいは無電解めっきを行い更に電解めっき行い形成される。無電解めっきの前に、プラズマ処理や薬品処理により表面に微細な凹凸形状を付与してもよい。 For the plating, copper, gold, silver, or the like can be used. As a forming method, a known method can be adopted, and the resin composition is formed by electroless plating or electroless plating and further electrolytic plating. Prior to electroless plating, a fine uneven shape may be imparted to the surface by plasma treatment or chemical treatment.
銅箔は、公知の銅箔を用いることが出来る。特に表面に細かな凹凸が形成された粗化銅を用いた場合、樹脂側に銅箔の粗化された面を用いて積層すると密着性に優れる。 As the copper foil, a known copper foil can be used. In particular, when roughened copper having fine irregularities formed on the surface is used, the adhesiveness is excellent when laminated using the roughened surface of the copper foil on the resin side.
積層板を作製する際の積層方法としては、公知の方法を用いることが出来、例えばプレス成形、ロール圧縮成形などが挙げられる。成型に際しては、真空状態で積層しても良い。 A known method can be used as a laminating method for producing the laminated plate, and examples thereof include press molding and roll compression molding. In molding, the layers may be laminated in a vacuum state.
以下に実施例及び比較例を示して、本発明をより具体的に説明する。ただし、これらの実施例によって、本発明は何等制限されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples. However, the present invention is not limited to these examples.
まず、後述の実施例で調整した硬化体についての評価項目、装置と測定法、および判断基準を以下に示す。
〔誘電率誘および電正接(1GHz容量法)〕
アジレント・テクノロジー社製RFインピーダンス/マテリアルアナライザーE4991Aを用いた。サンプルは、厚さ約50μmのフィルム状の硬化体を2cm四方に切断したものを8枚重ねて測定治具に設置し、誘電率および誘電正接を測定した。
First, the evaluation items, apparatus and measurement method, and judgment criteria for the cured product adjusted in Examples described later are shown below.
[Dielectric constant induction and electrotangent (1 GHz capacity method)]
An RF impedance / material analyzer E4991A manufactured by Agilent Technologies was used. As the sample, eight pieces of a film-like cured body having a thickness of about 50 μm cut into 2 cm squares were stacked and placed on a measuring jig, and the dielectric constant and dielectric loss tangent were measured.
〔銅箔との密着性〕
銅張り積層板を作成し、これを1cm×15cmの大きさに切断したものを5個用意し、260℃の半田浴に30秒間浸し、取り出した。その後、銅めっき表面を観察し、樹脂シートとのはがれ目視で確認した。はがれがある場合は銅箔側に膨れ、あるいは膨れた跡が観察される。
[Adhesion with copper foil]
A copper-clad laminate was prepared, and five pieces obtained by cutting the copper-clad laminate into a size of 1 cm × 15 cm were prepared, immersed in a solder bath at 260 ° C. for 30 seconds, and taken out. Thereafter, the copper plating surface was observed and peeled off from the resin sheet and visually confirmed. In the case where there is peeling, a swelling or trace of swelling is observed on the copper foil side.
以下の各実施例及び比較例で作製した硬化体の評価結果を各例の最後に示す。 The evaluation results of the cured products produced in the following examples and comparative examples are shown at the end of each example.
シリカ(EXR−3、龍森製)98g硬化促進剤としてトリアジン環含有イミダゾール系化合物(2,4−ジアミノ−6−(2’−メチルイミダゾリル−(1’))−エチル−s−トリアジンイソシアヌル酸付加物、2MA−OK、四国化成工業製)1.3gおよびトリフェニルホスフィン(和光純薬工業製)1.3gをDMF316g中に加え、よく混合し、完全に均一な溶液となるまで常温で攪拌した。次に、エポキシ樹脂「HP-7200H(大日本インキ化学工業製)」123gを投入し、完全に均一な溶液となるまで常温で攪拌した。次いで、活性エステル硬化剤(大日本インキ化学工業製、EXB−9451)100gを上記溶液に投入し、完全に均一な溶液となるまで常温で攪拌して、樹脂組成物溶液を調製した。 Silica (EXR-3, manufactured by Tatsumori) 98 g Triazine ring-containing imidazole compound (2,4-diamino-6- (2′-methylimidazolyl- (1 ′))-ethyl-s-triazine isocyanuric acid as a curing accelerator Addition product, 2MA-OK, manufactured by Shikoku Kasei Kogyo Co., Ltd. (1.3 g) and triphenylphosphine (manufactured by Wako Pure Chemical Industries, Ltd.) 1.3 g were added to DMF 316 g, mixed well, and stirred at room temperature until a completely homogeneous solution was obtained. did. Next, 123 g of epoxy resin “HP-7200H (Dainippon Ink and Chemicals)” was added and stirred at room temperature until a completely homogeneous solution was obtained. Then, active ester curing agent (Dainippon Ink and Chemicals Ltd., EXB-9451) and 100g was charged to the above solution and stirred at room temperature until completely homogeneous solution, to prepare a resin composition solution.
上記で得られた樹脂組成物溶液を、離型処理が施された透明なポリエチレンテレフタレート(PET)フィルム(商品名「PET5011 550」、厚み50μm、リンテック社製)にアプリケーターを用いて乾燥後の厚みが50μmとなるように塗工し、100℃12分間ギアオーブン中で乾燥し、180mm×250mm×50μmのフィルム状の樹脂組成物の未硬化物とPETフィルムの積層体を作製した。
次いで、積層体を170℃のギアオーブン中で1時間加熱して、フィルム状の樹脂組成物が半硬化した積層体を作製した。
The resin composition solution obtained above was dried using an applicator on a transparent polyethylene terephthalate (PET) film (trade name “PET5011 550”, thickness 50 μm, manufactured by Lintec Co., Ltd.) subjected to a release treatment. Was dried in a gear oven at 100 ° C. for 12 minutes to prepare a laminate of an uncured resin-like resin composition of 180 mm × 250 mm × 50 μm and a PET film.
Next, the laminate was heated in a gear oven at 170 ° C. for 1 hour to produce a laminate in which the film-like resin composition was semi-cured.
積層体からPETフィルムを剥離し、半硬化したフィルム状の樹脂組成物を180℃のギアオーブン中で3時間加熱して、フィルム状の硬化体を作製した。
180mm×250mm×50μmのフィルム状の樹脂組成物の未硬化物とPETフィルムの積層体の2枚を、フィルム状の樹脂組成物の未硬化物同士を張り合わせ、片側のPETフィルムを剥離し、PETフィルムが下側になるように、真空プレス機のプレス金型間に設置してある表面が平滑なSUS板上に、置いた。
次いで、180cm×20cm×25μmの粗化銅箔を樹脂シート状に置き、表面が平滑なSUSU板を置き、180℃10MPaで30分間、圧着した。
真空プレス機から取り出した後に、180℃のギヤオーブン中で3時間加熱処理を行い、銅張り積層板を作成した。
フィルム状の硬化体の誘電率3.09、誘電正接0.041
銅箔との密着性 良好・・・5個。
The PET film was peeled from the laminate, and the semi-cured film-shaped resin composition was heated in a gear oven at 180 ° C. for 3 hours to prepare a film-shaped cured body.
Two sheets of an uncured product of a film-shaped resin composition of 180 mm × 250 mm × 50 μm and a laminate of a PET film are bonded to each other, and the uncured product of the film-shaped resin composition is bonded to each other, and the PET film on one side is peeled off. The film was placed on a SUS plate having a smooth surface between the press dies of the vacuum press so that the film was on the lower side.
Next, a 180 cm × 20 cm × 25 μm roughened copper foil was placed on a resin sheet, a SUSU plate with a smooth surface was placed, and pressure-bonded at 180 ° C. and 10 MPa for 30 minutes.
After taking out from the vacuum press, heat treatment was performed in a gear oven at 180 ° C. for 3 hours to prepare a copper-clad laminate.
Dielectric constant of the film-like cured product is 3.09 and the dielectric loss tangent is 0.041.
Good adhesion with copper foil: 5 pieces.
硬化促進剤としてイミダゾール系化合物を(2−フェニルイミダゾールイソシアヌル酸付加物、2PZ−OK、四国化成工業製)とした以外は実施例1と同様にフィルム状の硬化体を作製した。
誘電率3.16、誘電正接0.051
銅箔との密着性 良好・・・5個。
A film-like cured product was prepared in the same manner as in Example 1 except that the imidazole compound (2-phenylimidazole isocyanuric acid adduct, 2PZ-OK, manufactured by Shikoku Kasei Kogyo Co., Ltd.) was used as the curing accelerator.
Dielectric constant 3.16, dielectric loss tangent 0.051
Good adhesion with copper foil: 5 pieces.
(比較例1)
硬化促進剤としてトリアジン環含有イミダゾール系化合物+リン系化合物の合計を0.26g+0.26gとした以外は実施例1と同様にフィルム状の硬化体を作製した。
誘電率3.20、誘電正接0.064
銅箔との密着性 膨れが観察された・・・3個、銅箔と樹脂シートが剥離した・・・2個。
(Comparative Example 1)
A cured film was prepared in the same manner as in Example 1 except that the total of the triazine ring-containing imidazole compound + phosphorus compound was 0.26 g + 0.26 g as a curing accelerator.
Dielectric constant 3.20, dielectric loss tangent 0.064
Adhesion with copper foil: Swelling was observed ... 3, and copper foil and resin sheet were peeled ... 2 pieces.
(比較例2)
硬化促進剤としてトリアジン環含有イミダゾール系化合物+リン系化合物の合計を5.0g+5.0gのみとした以外は実施例1と同様にフィルム状の硬化体を作製した。
誘電率3.14、誘電正接0.051
銅箔との密着性 膨れが観察された・・・5個。
(Comparative Example 2)
A film-like cured product was produced in the same manner as in Example 1 except that the total of the triazine ring-containing imidazole compound + phosphorus compound was only 5.0 g + 5.0 g as a curing accelerator.
Dielectric constant 3.14, dielectric loss tangent 0.051
Adhesion with copper foil Swelling was observed ... 5 pieces.
本発明は、誘電率と誘電正接に優れた熱硬化性樹脂組成物、及びこれを用いてなる樹脂フィルム、積層板、プリプレグとして、産業上の利用可能性を有する。 INDUSTRIAL APPLICABILITY The present invention has industrial applicability as a thermosetting resin composition excellent in dielectric constant and dielectric loss tangent, and as a resin film, laminate, and prepreg using the same.
Claims (10)
前記硬化剤が活性エステル型硬化剤を含み、かつ、該活性エステル型硬化剤はエポキシ樹脂100重量部に対し、50〜200重量部であり、
前記硬化促進剤がイミダゾール系化合物およびリン系化合物を含み、かつ、該硬化促進剤の含有量が前記活性エステル型硬化剤100重量部に対して0.8〜10重量部であることを特徴とする、熱硬化性樹脂組成物。 In a resin composition comprising an epoxy resin, a curing agent, a curing accelerator, and an organic solvent,
The curing agent contains an active ester type curing agent, and the active ester type curing agent is 50 to 200 parts by weight with respect to 100 parts by weight of the epoxy resin,
The curing accelerator includes an imidazole compound and a phosphorus compound, and the content of the curing accelerator is 0.8 to 10 parts by weight with respect to 100 parts by weight of the active ester type curing agent. A thermosetting resin composition.
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