JPS63277227A - Resin composition for laminated board - Google Patents

Resin composition for laminated board

Info

Publication number
JPS63277227A
JPS63277227A JP11272487A JP11272487A JPS63277227A JP S63277227 A JPS63277227 A JP S63277227A JP 11272487 A JP11272487 A JP 11272487A JP 11272487 A JP11272487 A JP 11272487A JP S63277227 A JPS63277227 A JP S63277227A
Authority
JP
Japan
Prior art keywords
methyl group
formula
group
glycidyl compound
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11272487A
Other languages
Japanese (ja)
Inventor
Haruo Tomita
冨田 春生
Kazuhide Fujimoto
和秀 藤本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP11272487A priority Critical patent/JPS63277227A/en
Publication of JPS63277227A publication Critical patent/JPS63277227A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0326Organic insulating material consisting of one material containing O

Abstract

PURPOSE:To obtain the titled composition, consisting essentially of a specific compound, butadiene polymer, epoxy resin compound and radical polymerization initiator and having excellent heat resistance and dielectric characteristics. CONSTITUTION:The aimed composition containing (A) a compound having one or more epoxy groups and one or more (meth)acrylamidomethyl groups, (B) butadiene polymer having 1,000-20,000 number-average molecular weight and >=50% butadiene units of the polymer chain consisting of 1,2-bonds, (C) a curing agent for epoxy resins and (D) a radical polymerization initiator as principal components. Furthermore, the component (A) is preferably a glycidyl compound expressed by formula I (Ar<1> is 6-20C aromatic hydrocarbon having one or more glycidyloxy groups; R is H or CH3; n is 1-4) or formula II (Ar<2> is 6-14C aromatic hydrocarbon having one or more N,N-diglycidylamino groups; R is H or CH3; n is 1-3).

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は耐熱性及び誘電特性に優れた積層板用樹脂組成
物に関するものである。
DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a resin composition for laminates that has excellent heat resistance and dielectric properties.

「従来技術と問題点」 従来、産業用のプリント回路基板の材料としては、主と
してエポキシ樹脂とガラスクロスの組み合わせによる積
層板が用いられている。
"Prior Art and Problems" Conventionally, laminates made of a combination of epoxy resin and glass cloth have been mainly used as materials for industrial printed circuit boards.

近年、電子素子の高速化、高密度実装化に伴い使用され
るプリント回路基板に対して、耐熱性の向上、誘電特性
の向上が求められるようになってきているが、従来用い
られているエポキシ樹脂とガラスクロスの組み合わせで
は、誘電特性の向上には限界がある。
In recent years, there has been a demand for improved heat resistance and dielectric properties for printed circuit boards used as electronic devices become faster and more densely packaged. There is a limit to the improvement of dielectric properties with the combination of resin and glass cloth.

一方、ポリイミド樹脂とガラスクロスの組み合わせで得
られる基板も知られており、エポキシ樹脂とガラスクロ
スの基板より誘電特性は改善されるものの、誘電率を4
.0以下にすることは困難である0通常用いられるE−
ガラスの代わりに石英ガラスを用いると、誘電率を下げ
ることはできるが、石英ガラスは高価であるうえ硬度が
高いため、ドリルによる穴あけ加工が困難である欠点を
有している。
On the other hand, a substrate obtained by combining polyimide resin and glass cloth is also known, and although the dielectric properties are improved compared to the substrate of epoxy resin and glass cloth, the dielectric constant is 4.
.. It is difficult to reduce the value to 0 or less. 0 Usually used E-
If quartz glass is used instead of glass, the dielectric constant can be lowered, but quartz glass is expensive and has a high hardness, so it has the disadvantage that drilling with a drill is difficult.

また、低誘電率の樹脂としてはフッ素樹脂が知られてい
るが、フッ素樹脂は耐熱性が低く、プリント回路基板と
して使用した場合、高密度実装できない、多層化できな
い等の欠点を有している。
In addition, fluororesin is known as a resin with a low dielectric constant, but fluororesin has low heat resistance, and when used as a printed circuit board, it has drawbacks such as not being able to be mounted in high density or multilayered. .

以上、要するに、積層板用の樹脂として、耐熱性に優れ
た低誘電率の樹脂が求められているが、かかる要請を十
分に満足させる樹脂は未だ提供されていないのが実情で
ある。
In summary, there is a demand for a resin with excellent heat resistance and a low dielectric constant as a resin for laminates, but the reality is that no resin has yet been provided that fully satisfies this demand.

「問題点を解決するための手段」 本発明の目的は、耐熱性に優れ、低誘電率の積層板用樹
脂組成物を得ることにある。
"Means for Solving the Problems" An object of the present invention is to obtain a resin composition for a laminate that has excellent heat resistance and a low dielectric constant.

本発明者らは、前記目的を達成するための組成物につい
て鋭意検討を行ったところ、特定の化合物を組み合わせ
た樹脂組成物がかかる目的を達成し得ることを見出し、
本発明に到達した。
The present inventors conducted intensive studies on compositions for achieving the above object, and found that a resin composition in which specific compounds were combined could achieve the object,
We have arrived at the present invention.

即ち、本発明は下記の(A)、(B)、(C)及び(D
)成分を主成分として含育してなる積層板用樹脂組成物
; (A>少なくとも1個のエポキシ基と少なくとも1個の
アクリルアミドメチル基又はメタクリルアミドメチル基
を有する化合物、 (B)数平均分子量が1000乃至20000であり、
重合体鎖のブタジェン単位の50%以上が1.2−結合
からなるブタジェンポリマー、(C)エポキシ樹脂硬化
剤、 (D)ラジカル重合開始剤 を内容とするものである。
That is, the present invention provides the following (A), (B), (C) and (D)
) component as a main component; (A> compound having at least one epoxy group and at least one acrylamide methyl group or methacrylamide methyl group; (B) number average molecular weight is 1000 to 20000,
It contains a butadiene polymer in which 50% or more of the butadiene units in the polymer chain are 1,2-bonds, (C) an epoxy resin curing agent, and (D) a radical polymerization initiator.

本発明の目的とするところの耐熱性番よ、上δ己(A)
、(B)、(C)及びCD)成分のうちの<A)成分に
より、また低誘電率しよ(B)成分Gこより付与される
が、(A>成分と(B)成分i;!(D)成分のラジカ
ル重合開始剤の作用Gこより重合反応中に結合されて一
体化した架橋構造(本となるため、各々の特性が十分に
発揮される。更番こ(C)成分のエポキシ樹脂硬化剤は
、(A)成分のエポキシ基の架橋反応を行わしめ、積層
キ反用の樹脂として好適な特性、例えばガラスとの)妾
着性、銅箔との接着性を与える。即ち(A)、CB)、
(C)及び(D)成分を組み合わせることにより、はじ
めて耐熱性と誘電特性に優れ、且つ積層板(こ好適な樹
脂組成物を得ることができる。
The heat resistance number, which is the object of the present invention, is the upper δ self (A).
, (B), (C), and CD) components, and the (B) component G gives a low dielectric constant, but the (A> component and the (B) component i;! The effect of the radical polymerization initiator (D) is due to the cross-linked structure (bonded into an integrated structure) during the polymerization reaction, so that the characteristics of each component are fully exhibited.Epoxy component (C) The resin curing agent performs a crosslinking reaction of the epoxy group in component (A), and provides properties suitable for a resin for lamination, such as adhesion with glass and adhesion with copper foil. A), CB),
By combining components (C) and (D), it is possible to obtain a resin composition that has excellent heat resistance and dielectric properties, and is suitable for a laminate.

本発明の(A)成分の少なくとも1個のエポキシ基と少
なくとも1個のアクリルアミドメチル又はメタクリルア
ミドメチル基とを有する化合物としでは特に限定されな
いが、下記一般式(I)又は(n)で表されるグリシジ
ル化合物が本発明の目的に特に好適である。
The compound having at least one epoxy group and at least one acrylamide methyl or methacrylamide methyl group as component (A) of the present invention is not particularly limited, but is represented by the following general formula (I) or (n). Glycidyl compounds are particularly suitable for the purposes of the present invention.

? (CL”’CCNil  CHx+1−Ar’  CI
)(式中、Ar’ はグリシジルオキシ基を少なくとも
1つ以上有する炭素数6〜20の芳香族炭化水素基を、
Rは水素原子またはメチル基を表し、nは1〜4の整数
である) ? (CL−C−C−NH−CHa−T−Ar”  (II
)(式中、Ar”はN、N−ジグリシジルアミノ基を少
なくとも1つ以上有する炭素数6〜14の芳香族炭化水
素を表し、Rは水素原子またはメチル基であり、nは1
〜3の整数である) 本発明のグリシジル化合物(I)は、特開昭60−13
0580記載の方法により製造することができる0例え
ば、出発物質として2.6−キシレノールとN−メチロ
ール(メタ)アクリルアミドを用いた場合、下記構造式
(III)(式中、Rは水素原子またはメチル基である
)で表されるグリシジル化合物を得ることができる。
? (CL"'CCNil CHx+1-Ar' CI
) (wherein, Ar' is an aromatic hydrocarbon group having 6 to 20 carbon atoms having at least one glycidyloxy group,
R represents a hydrogen atom or a methyl group, and n is an integer from 1 to 4)? (CL-C-C-NH-CHa-T-Ar” (II
) (wherein, Ar" represents an aromatic hydrocarbon having 6 to 14 carbon atoms having at least one N,N-diglycidylamino group, R is a hydrogen atom or a methyl group, and n is 1
The glycidyl compound (I) of the present invention is disclosed in Japanese Patent Application Laid-Open No. 60-13
For example, when 2,6-xylenol and N-methylol (meth)acrylamide are used as starting materials, the following structural formula (III) (wherein R is a hydrogen atom or methyl A glycidyl compound represented by the group ) can be obtained.

また、本発明のグリシジル化合物(II)は、特訓昭6
1−88456記載の方法により製造することができる
。特に原料のアミン類としてで表される化合物を用いる
と、下記一般式(■)(式中、Rは水素原子又はメチル
基であり、mは0〜2の整数である)で表されるグリシ
ジル化合物を得ることができる。
Moreover, the glycidyl compound (II) of the present invention is
It can be produced by the method described in No. 1-88456. In particular, when using compounds represented by as raw material amines, glycidyl represented by the following general formula (■) (wherein R is a hydrogen atom or a methyl group, and m is an integer of 0 to 2) compound can be obtained.

本発明の(B)成分であるブタジェンポリマーの数平均
分子量は1000〜20000の範囲である。1000
未満であると耐熱性が不足し、20000を越えると(
A)成分との混合が困難となる0重合体鎖中のブタジェ
ン単位の50%以上は1,2−結合であることが好まし
く、50%未満では耐熱性が不足する。望ましくは85
%以上が1.2−結合となっているべきである0本発明
で用いる(A)成分と(B)成分の比率は重量比で20
j80〜8.0 : 20であり、より好ましくは40
:60〜60 : 40である。
The number average molecular weight of the butadiene polymer which is component (B) of the present invention is in the range of 1,000 to 20,000. 1000
If it is less than 20,000, the heat resistance will be insufficient, and if it is more than 20,000 (
It is preferable that 50% or more of the butadiene units in the polymer chain are 1,2-bonds, which makes it difficult to mix with component A), and if it is less than 50%, the heat resistance will be insufficient. Preferably 85
The ratio of components (A) and (B) used in the present invention is 20% by weight.
j80-8.0: 20, more preferably 40
:60-60 :40.

本発明に使用される(C)成分であるエポキシ樹脂硬化
剤としては、一般に知られている各種の硬化剤が使用で
きるが、例示すれば無水フタル酸、無水テトラヒドロフ
タル酸、無水へキサヒドロフタル酸、無水トリメリット
酸、無水ピロメリット酸、無水クロレンディフク酸、無
水ベンゾフェノンテトラカルボン酸等の酸無水物、4.
4′−ジアミノジフェニルメタン、4.4′−ジアミノ
ジフェニルスルホン、メタフェニレンジアミン、パラフ
ェニレンジアミン等の芳香族ジアミン、ジエチレントリ
アミン、トリエチレンテトラミン、テトラエチレンペン
タミン、ビス(ヘキサメチレン)トリアミン、メンセン
ジアミン、イソホロンジアミン、メタキシリレンジアミ
ン等の脂肪族ポリアミン、イミダゾール、2−エチル−
4−メチルイミダゾール、2−フェニルイミダゾール、
1−ベンジル−2−メチルイミダゾール、2−ウンデシ
ルイミダゾール等のイミダゾール類、ジシアンジアミド
、三フッ化ホウ素のアミン錯体があげられる。
As the epoxy resin curing agent which is the component (C) used in the present invention, various commonly known curing agents can be used, but examples include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride. 4. acids, acid anhydrides such as trimellitic anhydride, pyromellitic anhydride, chlorendifucic anhydride, benzophenonetetracarboxylic anhydride;
Aromatic diamines such as 4'-diaminodiphenylmethane, 4,4'-diaminodiphenylsulfone, metaphenylenediamine, paraphenylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, bis(hexamethylene)triamine, menthendiamine, Aliphatic polyamines such as isophorone diamine and metaxylylene diamine, imidazole, 2-ethyl-
4-methylimidazole, 2-phenylimidazole,
Examples include imidazoles such as 1-benzyl-2-methylimidazole and 2-undecylimidazole, dicyandiamide, and amine complexes of boron trifluoride.

硬化剤の使用量は、硬化剤の種類によって異なるが、例
えば酸無水物ではエポキシ基に対して0゜5〜1.5当
量が望ましい。
The amount of curing agent used varies depending on the type of curing agent, but for example, in the case of an acid anhydride, it is preferably 0.5 to 1.5 equivalents relative to the epoxy group.

本発明においては、必要に応じてエポキシ樹脂の硬化促
進剤を添加してもよい、Vl化促進剤としては、一般に
知られているものが任意に使用できる0例示すれば、ベ
ンジルジメチルアミン、2゜4.6−トリス(ジメチル
アミノメチル)フェノール等の第三級アミン類、2−エ
チル−4−メチルイミダゾール、N−ベンジルイミダゾ
ール等のイミダゾール類、三フフ化ホウ素−アミン錯体
、尿素類、ホスフィン類、金属塩類等があげられる。
In the present invention, a curing accelerator for the epoxy resin may be added as required. As the Vl conversion accelerator, any commonly known one can be used. Examples include benzyl dimethylamine, 2 4. Tertiary amines such as 6-tris(dimethylaminomethyl)phenol, imidazoles such as 2-ethyl-4-methylimidazole and N-benzylimidazole, boron trifluoride-amine complexes, ureas, phosphine metal salts, etc.

硬化促進剤の使用量は、所望の硬化速度が得られるよう
に調節されるべきであるが、通常、組成物中に0.01
〜5重量%添加される。
The amount of curing accelerator used should be adjusted to obtain the desired curing rate, but typically 0.01
~5% by weight is added.

本発明の(D)成分であるラジカル重合開始剤としては
、一般にラジカル重合の開始剤として知られているもの
が任意に使用できるが、その中でも有機過酸化物が特に
適している0例示すればt−ブチルハイドロパーオキサ
イド、キュメンハイドロパーオキサイド、ジ−t−ブチ
ルパーオキサイド、ジクミルパーオキサイド、ペイシイ
ルバーオキサイド、【−ブチルパーオキシベンゾエート
等があげられる。ラジカル重合開始剤の使用量としては
、特に限定されないが通常、組成物に対して0.1〜2
0重量%の範囲で使用される。
As the radical polymerization initiator which is component (D) of the present invention, any initiator generally known as a radical polymerization initiator can be used, but among them, organic peroxides are particularly suitable. Examples include t-butyl hydroperoxide, cumene hydroperoxide, di-t-butyl peroxide, dicumyl peroxide, peroxide, and [-butyl peroxybenzoate. The amount of the radical polymerization initiator used is not particularly limited, but is usually 0.1 to 2
It is used in a range of 0% by weight.

本発明の組成物は(A)、(B)、(C)及び(D)成
分を混合し、ガラスクロスに含浸させ積層して熱硬化さ
せることができる。また、ガラスクロスに含浸させたの
ち、熱を加えてB−ステージ化しプリプレグ化したのち
積層し、熱ブレスにより成型することもできる。また必
要に応じ、(A>成分と(B)成分及び(I))成分を
混合し、加熱して部分的に反応させたのち、(C)成分
を加え混合し樹脂組成物とすることも可能で、この方法
は特に(A)成分と(B)成分の相溶性が低い場合に有
効な方法である。
The composition of the present invention can be prepared by mixing components (A), (B), (C), and (D), impregnating glass cloth, laminating the mixture, and heat-curing the mixture. It is also possible to impregnate glass cloth, heat it to B-stage it, make it into a prepreg, and then laminate it and mold it by heat pressing. In addition, if necessary, a resin composition may be prepared by mixing the components (A>, (B), and (I)), heating them to cause a partial reaction, and then adding and mixing the component (C). This method is particularly effective when the compatibility between components (A) and (B) is low.

本発明の樹脂組成物を用いて得られるガラスクロス積層
板は、E−ガラスを用いても誘電率が低く、耐熱性に優
れており、またガラスクロスや銅箔との接着性に優れて
いるため、高周波で作動する電子素子用の基板材料、マ
イクロ通信用の基板材料として好適である。
The glass cloth laminate obtained using the resin composition of the present invention has a low dielectric constant even when E-glass is used, has excellent heat resistance, and has excellent adhesion to glass cloth and copper foil. Therefore, it is suitable as a substrate material for electronic devices operating at high frequencies and a substrate material for microcommunications.

「実施例」 以下、本発明を具体的に実施例に基づいて説明するが、
本発明はこれら実施例のみに限定されるものではない、
尚、以下において「部」は「重量部」を表す。
"Examples" The present invention will be specifically explained based on Examples below.
The present invention is not limited only to these examples.
In addition, in the following, "parts" represent "parts by weight".

実施例I N−(4−グリシジルオキシ−3,5−ジメチルフェニ
ルメチル)アクリルアミド(前記構造式(I[[)でR
が水素原子であるもの、)25部及び1.2−ポリブタ
ジェン(B−3000、日本曹達(株)製、1.2−結
合率90%のポリブタジェン)75部、t−ブチルパー
ベンゾエート0.3部を混合し、100℃で1時間撹拌
しながら部分的に反応させた。これを混合物へとする。
Example I N-(4-glycidyloxy-3,5-dimethylphenylmethyl)acrylamide (R
is a hydrogen atom), 75 parts of 1,2-polybutadiene (B-3000, manufactured by Nippon Soda Co., Ltd., 1.2-polybutadiene with a bonding rate of 90%), and 0.3 parts of t-butyl perbenzoate. The parts were mixed and allowed to react partially with stirring at 100°C for 1 hour. Make this into a mixture.

該混合物A 66.7部、N−(4−グリシジルオキシ
−3,5−ジメチルフェニルメチル)アクリルアミド1
5.8部、無水メチルナジック酸17.5部、1−ベン
ジル−2−メチルイミダゾール0.33部、ジクミルパ
ーオキサイド2.48部を混合し、ガラス板の間に流し
込み、130℃で3時間、その後160℃で2時間加熱
し硬化させ、注型板を作成した。得られた注型板につい
て、加熱変形温度、Tg、誘電率、誘電正接を測定した
。結果を表1に示す。
66.7 parts of the mixture A, 1 part of N-(4-glycidyloxy-3,5-dimethylphenylmethyl)acrylamide
5.8 parts of methylnadic anhydride, 17.5 parts of methylnadic anhydride, 0.33 parts of 1-benzyl-2-methylimidazole, and 2.48 parts of dicumyl peroxide were mixed, poured between glass plates, and heated at 130°C for 3 hours. Thereafter, the mixture was cured by heating at 160° C. for 2 hours to prepare a cast plate. The heating deformation temperature, Tg, dielectric constant, and dielectric loss tangent of the obtained cast plate were measured. The results are shown in Table 1.

実施例2 実施例1の混合物A 53.3部、N−(4−グリシジ
ルオキシ−3,5−ジメチルフェニルメチル)アクリル
アミド25.7部、無水メチルナジック酸21.0部、
1−ベンジル−2−メチルイミダゾール0.39部、ジ
クミルパーオキサイド2.37部を混合し、実施例1と
同様の方法で注型板を作成した。得られた注型板につい
て、加熱変形温度、Tg、lWt率、誘電正接を測定し
た。結果を表1に示す。
Example 2 53.3 parts of mixture A of Example 1, 25.7 parts of N-(4-glycidyloxy-3,5-dimethylphenylmethyl)acrylamide, 21.0 parts of methylnadic anhydride,
A casting plate was prepared in the same manner as in Example 1 by mixing 0.39 parts of 1-benzyl-2-methylimidazole and 2.37 parts of dicumyl peroxide. The heating deformation temperature, Tg, lWt ratio, and dielectric loss tangent of the obtained cast plate were measured. The results are shown in Table 1.

実施例3 実施例1の混合物A 66.7部、N−(4−グリシジ
ルオキシ−3,5−ジメチルフェニルメチル)アクリル
アミド33.3部、ジシアンジアミド2.0部、3− 
(3,4−ジクロルフェニル)−1゜1−ジメチルウレ
ア2.0部、ジクミルパーオキサイド3.0部を混合し
、実施例1と同様の方法で注型板を作成した。得られた
注型板について、加熱変形温度、Tg、誘電率、誘電正
接を測定した。
Example 3 66.7 parts of mixture A of Example 1, 33.3 parts of N-(4-glycidyloxy-3,5-dimethylphenylmethyl)acrylamide, 2.0 parts of dicyandiamide, 3-
2.0 parts of (3,4-dichlorophenyl)-1°1-dimethylurea and 3.0 parts of dicumyl peroxide were mixed and a casting plate was prepared in the same manner as in Example 1. The heating deformation temperature, Tg, dielectric constant, and dielectric loss tangent of the obtained cast plate were measured.

結果を表1に示す。The results are shown in Table 1.

比較例1 エピビス型エポキシ樹脂(商品名エピコート828、油
化シェルC株)製)100部、無水メチルナジック酸7
9.6部、N、N−ジメチルベンジルアミン0.7部を
混合し、ガラス板の間に流し7込み、140℃で1時間
、その後150℃で15時間加熱し硬化させ注型板を作
成した得られた注型板について、加熱変形温度、Tg、
誘電率、誘電正接を測定した。結果を表4に示す。
Comparative Example 1 100 parts of Epibis type epoxy resin (trade name Epicote 828, manufactured by Yuka Shell C Co., Ltd.), 7 parts of methylnadic anhydride
A cast plate was prepared by mixing 9.6 parts of N,N-dimethylbenzylamine and 0.7 parts of N,N-dimethylbenzylamine, pouring the mixture between glass plates, heating at 140°C for 1 hour, and then heating at 150°C for 15 hours to harden. The heating deformation temperature, Tg,
The dielectric constant and dielectric loss tangent were measured. The results are shown in Table 4.

表   1 実施例4 N−(4−グリシジルオキシ−3,5−ジメチルフェニ
ルメチル)アクリルアミド(前記構造式(III)でR
が水素原子であるもの)25部及び1゜2−ポリブタジ
ェン(+3−3000、日本曹達(株) !> 75 
部、t −ブチルパーベンゾエート0.3部を混合し、
100℃で1時間攪拌しながら部分的に反応させた。こ
れを混合物Aとする。
Table 1 Example 4 N-(4-glycidyloxy-3,5-dimethylphenylmethyl)acrylamide (R in the above structural formula (III)
is a hydrogen atom) and 25 parts of 1゜2-polybutadiene (+3-3000, Nippon Soda Co., Ltd.!> 75
part, 0.3 part of t-butyl perbenzoate,
Partial reaction was allowed to proceed at 100° C. with stirring for 1 hour. This is called mixture A.

該混合物A 66.7部、N−(4−グリシジルオキシ
−3,5−ジメチルフェニルメチル)アクリルアミド1
5.8部、無水メチルナジック酸17.5部、1−ベン
ジル−2−メチルイミダゾール0.33部、ジクミルパ
ーオキサイド2.48部を混合し、約80℃のホットプ
レート上でガラスクロス(E−ガラス、WE116E1
04BZ、日本紡績(株)製)に含浸させ積層して、1
40℃で2時間プレス成型を行い、その後アフターキュ
アを160℃で2時間行って樹脂含有率50重量%の片
面銅張り積層板を得た。得られた積層板について、銅箔
、ビール強度、Tg、誘電率、誘電正接を測定した。結
果を表2に示す。
66.7 parts of the mixture A, 1 part of N-(4-glycidyloxy-3,5-dimethylphenylmethyl)acrylamide
5.8 parts of methylnadic anhydride, 17.5 parts of methylnadic anhydride, 0.33 parts of 1-benzyl-2-methylimidazole, and 2.48 parts of dicumyl peroxide were mixed, and the mixture was heated with a glass cloth ( E-glass, WE116E1
04BZ (manufactured by Nippon Boseki Co., Ltd.) and laminated, 1
Press molding was performed at 40° C. for 2 hours, and after-curing was performed at 160° C. for 2 hours to obtain a single-sided copper-clad laminate with a resin content of 50% by weight. The copper foil, beer strength, Tg, dielectric constant, and dielectric loss tangent of the obtained laminate were measured. The results are shown in Table 2.

尚、代表的な銅張り積層板としてポリイミド系積層板(
市販品A)、エポキシ系積層板(市販品B)の特性を測
定した結果を参考として表2に示す。
Polyimide laminates (
The results of measuring the properties of commercial product A) and epoxy laminate (commercial product B) are shown in Table 2 for reference.

表    1 「作用・効果」 叙上の通り、本発明は耐熱性に優れ且つ低透電率の積層
板用として好適な樹脂を提供することができる。
Table 1 "Operations and Effects" As described above, the present invention can provide a resin suitable for use in laminates that has excellent heat resistance and low electrical conductivity.

Claims (1)

【特許請求の範囲】 1、下記の(A)、(B)、(C)及び(D)成分を主
成分として含有してなる積層板用樹脂組成物; (A)少なくとも1個のエポキシ基と少なくとも1個の
アクリルアミドメチル基又はメタクリルアミドメチル基
を有する化合物、 (B)数平均分子量が1000乃至20000であり、
重合体鎖のブタジエン単位の50%以上が1,2−結合
からなるブタジエンポリマー、 (C)エポキシ樹脂硬化剤、 (D)ラジカル重合開始剤。 2、(A)成分が下記一般式( I ) ▲数式、化学式、表等があります▼( I ) (式中、Ar^1はグリシジルオキシ基を少なくとも1
個有する炭素数6〜20の芳香族炭化水素基を、Rは水
素原子またはメチル基を表し、nは1〜4の整数である
)で表されるグリシジル化合物である特許請求の範囲第
1項記載の組成物。 3、化合物Aが下記一般式(II) ▲数式、化学式、表等があります▼(II) (式中、Ar^2はN,N−ジグリシジルアミノ基を少
なくとも1つ以上有する炭素数6〜14の芳香族炭化水
素を表し、Rは水素原子またはメチル基であり、nは1
〜3の整数である)で表されるグリシジル化合物である
特許請求の範囲第1項記載の組成物。 4、グリシジル化合物が下記構造式(III) ▲数式、化学式、表等があります▼(III) (式中、Rは水素原子またはメチル基である)で表され
るグリシジル化合物である特許請求の範囲第2項記載の
組成物。 5、グリシジル化合物が下記構造式(IV) ▲数式、化学式、表等があります▼(IV) (式中、Rは水素原子またはメチル基であり、mは0〜
2の整数である)で表されるグリシジル化合物である特
許請求の範囲第3項記載の組成物。 6、(C)成分が、酸無水物系エポキシ樹脂硬化剤、芳
香族ジアミン系エポキシ樹脂硬化剤、脂肪族ポリアミン
系エポキシ樹脂硬化剤、イミダゾール類及びジシアンジ
アミドから選択される少なくとも1種である特許請求の
範囲第1項乃至第5項の各項記載の組成物。 7、(D)成分が有機過酸化物である特許請求の範囲第
1項乃至第6項の各項記載の組成物。
[Claims] 1. A resin composition for a laminate comprising the following components (A), (B), (C) and (D) as main components; (A) at least one epoxy group; and a compound having at least one acrylamide methyl group or methacrylamide methyl group, (B) a number average molecular weight of 1000 to 20000,
A butadiene polymer in which 50% or more of the butadiene units in the polymer chain are 1,2-bonds, (C) an epoxy resin curing agent, and (D) a radical polymerization initiator. 2. (A) component is the following general formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula, Ar^1 represents at least one glycidyloxy group.
Claim 1 is a glycidyl compound having an aromatic hydrocarbon group having 6 to 20 carbon atoms, R represents a hydrogen atom or a methyl group, and n is an integer of 1 to 4. Compositions as described. 3. Compound A has the following general formula (II) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) (In the formula, Ar^2 has at least one N,N-diglycidylamino group and has a carbon number of 6 to 6) 14 aromatic hydrocarbons, R is a hydrogen atom or a methyl group, and n is 1
The composition according to claim 1, which is a glycidyl compound represented by: 4. Claims that the glycidyl compound is a glycidyl compound represented by the following structural formula (III) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (III) (wherein R is a hydrogen atom or a methyl group) The composition according to item 2. 5. The glycidyl compound has the following structural formula (IV) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (IV) (In the formula, R is a hydrogen atom or a methyl group, and m is 0 to
The composition according to claim 3, which is a glycidyl compound represented by: 6. A patent claim in which component (C) is at least one selected from acid anhydride-based epoxy resin curing agents, aromatic diamine-based epoxy resin curing agents, aliphatic polyamine-based epoxy resin curing agents, imidazoles, and dicyandiamide. The composition according to each item of the range 1 to 5. 7. The composition according to each of claims 1 to 6, wherein component (D) is an organic peroxide.
JP11272487A 1987-05-08 1987-05-08 Resin composition for laminated board Pending JPS63277227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11272487A JPS63277227A (en) 1987-05-08 1987-05-08 Resin composition for laminated board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11272487A JPS63277227A (en) 1987-05-08 1987-05-08 Resin composition for laminated board

Publications (1)

Publication Number Publication Date
JPS63277227A true JPS63277227A (en) 1988-11-15

Family

ID=14593946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11272487A Pending JPS63277227A (en) 1987-05-08 1987-05-08 Resin composition for laminated board

Country Status (1)

Country Link
JP (1) JPS63277227A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009040919A (en) * 2007-08-09 2009-02-26 Sekisui Chem Co Ltd Thermosetting resin composition, resin film using the same, laminate and prepreg
JP2012246497A (en) * 2012-09-04 2012-12-13 Sekisui Chem Co Ltd Resin film, laminate plate, and prepreg

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55127418A (en) * 1979-03-24 1980-10-02 Fujitsu Ltd Heat-resistant resin composition and heat-resistant laminated sheet
JPS60258225A (en) * 1984-06-04 1985-12-20 Kanegafuchi Chem Ind Co Ltd Reactive resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55127418A (en) * 1979-03-24 1980-10-02 Fujitsu Ltd Heat-resistant resin composition and heat-resistant laminated sheet
JPS60258225A (en) * 1984-06-04 1985-12-20 Kanegafuchi Chem Ind Co Ltd Reactive resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009040919A (en) * 2007-08-09 2009-02-26 Sekisui Chem Co Ltd Thermosetting resin composition, resin film using the same, laminate and prepreg
JP2012246497A (en) * 2012-09-04 2012-12-13 Sekisui Chem Co Ltd Resin film, laminate plate, and prepreg

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