JP2009039624A - スリットコート式塗布方法 - Google Patents
スリットコート式塗布方法 Download PDFInfo
- Publication number
- JP2009039624A JP2009039624A JP2007205839A JP2007205839A JP2009039624A JP 2009039624 A JP2009039624 A JP 2009039624A JP 2007205839 A JP2007205839 A JP 2007205839A JP 2007205839 A JP2007205839 A JP 2007205839A JP 2009039624 A JP2009039624 A JP 2009039624A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- liquid
- coating film
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 316
- 239000011248 coating agent Substances 0.000 claims abstract description 298
- 239000007788 liquid Substances 0.000 claims abstract description 95
- 239000000758 substrate Substances 0.000 claims abstract description 84
- 238000001035 drying Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 12
- 239000012535 impurity Substances 0.000 description 3
- 238000009751 slip forming Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007205839A JP2009039624A (ja) | 2007-08-07 | 2007-08-07 | スリットコート式塗布方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007205839A JP2009039624A (ja) | 2007-08-07 | 2007-08-07 | スリットコート式塗布方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009039624A true JP2009039624A (ja) | 2009-02-26 |
| JP2009039624A5 JP2009039624A5 (enExample) | 2010-09-02 |
Family
ID=40440975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007205839A Withdrawn JP2009039624A (ja) | 2007-08-07 | 2007-08-07 | スリットコート式塗布方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009039624A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100966089B1 (ko) * | 2009-09-07 | 2010-06-28 | (주)둔포기계 | 박막 코팅 장치 |
| JP2013098569A (ja) * | 2011-10-31 | 2013-05-20 | Semes Co Ltd | ノズルユニット、基板処理装置、及び基板処理方法 |
| KR20160019370A (ko) * | 2014-08-11 | 2016-02-19 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치 |
| JP2017183374A (ja) * | 2016-03-29 | 2017-10-05 | アルバック成膜株式会社 | 塗布装置、マスクブランクの製造方法 |
-
2007
- 2007-08-07 JP JP2007205839A patent/JP2009039624A/ja not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100966089B1 (ko) * | 2009-09-07 | 2010-06-28 | (주)둔포기계 | 박막 코팅 장치 |
| JP2013098569A (ja) * | 2011-10-31 | 2013-05-20 | Semes Co Ltd | ノズルユニット、基板処理装置、及び基板処理方法 |
| KR20160019370A (ko) * | 2014-08-11 | 2016-02-19 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치 |
| KR102331827B1 (ko) * | 2014-08-11 | 2021-11-25 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치 |
| JP2017183374A (ja) * | 2016-03-29 | 2017-10-05 | アルバック成膜株式会社 | 塗布装置、マスクブランクの製造方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100712 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100712 |
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| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20110121 |