JP2009036925A - Exposure device, exposure method, and manufacturing method of display panel substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To effectively suppress the deflection of a mask due to the gravity. <P>SOLUTION: A chuck 10 holds a substrate 1 horizontally by vacuum chucking the undersurface of the substrate 1. A mask holder having a plurality of independent holder portions 24a and 24b for holding the periphery of a mask 2 holds the mask 2 such that it face the substrate 1 held by the chuck 10. A curvature is given to the mask 2 in a direction opposite to the deflection due to its gravity by tilting the holder portions 24a and 24b for holding the periphery of the mask 2. This curvature counteracts the deflection of the mask 2 due to the gravity, and the deflection of the mask 2 can be effectively suppressed. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that performs exposure of a substrate, an exposure method, and a method of manufacturing a display panel substrate using the same in manufacturing a display panel substrate such as a liquid crystal display device.

  Manufacturing of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, and the like of liquid crystal display devices used as display panels is performed using photolithography using an exposure apparatus. This is performed by forming a pattern on the substrate by a technique. As an exposure apparatus, a projection system that projects a photomask (hereinafter referred to as “mask”) pattern onto a substrate using a lens or a mirror, and a small gap (proximity gap) between the mask and the substrate. There is a proximity method in which a mask pattern is provided and transferred to a substrate. The proximity method is inferior in pattern resolution performance to the projection method, but the configuration of the irradiation optical system is simple, the processing capability is high, and it is suitable for mass production.

  In an exposure apparatus for a large substrate, exposure is generally performed with the substrate placed horizontally. In this case, the mask is held by the mask holder so as to face the substrate above the substrate, and the mask is deflected by gravity. When the mask is bent, the pattern is not baked uniformly on the substrate.

Conventionally, in order to reduce the deflection of the mask, for example, as described in Patent Document 1, the vicinity of the two sides of the mask is supported from below, and the edges of the two sides of the mask are pressed from above, thereby There was a method of mechanically correcting the deflection. In recent years, for example, as described in Patent Document 2, a method of suppressing the deflection of the mask by providing a negative pressure chamber on the upper surface of the mask and applying a negative pressure that cancels out the mass per unit area to the mask is also performed. It has been broken.
JP 2001-109160 A JP 2003-131388 A

  In recent years, the larger the substrate with the larger display panel, the larger the mask, and the greater the deflection of the mask due to gravity. Even if the mask is enlarged, the pattern printing accuracy required at the time of exposure is the same as the conventional one, and it is necessary to keep the pattern printing accuracy by suppressing the deflection of the mask below a predetermined level. However, according to the conventional method, as the mask becomes larger and the deflection becomes larger, the deflection of the mask cannot be sufficiently suppressed.

  In recent years, as the demand for display panels has increased, the size of substrates has diversified, and masks of various sizes have been used. Conventionally, in order to expose substrates of different sizes, it has been necessary to replace the mask holder of the exposure apparatus in accordance with the size of the mask. And it was necessary to suppress the deflection of the magnitude | size which changes with the magnitude | sizes of a mask.

  An object of the present invention is to effectively suppress the deflection of the mask due to gravity. Furthermore, an object of the present invention is to effectively suppress the deflection of the mask even when the magnitude of the deflection due to the gravity of the mask is different. Another object of the present invention is to produce a high-quality substrate by uniformly baking a pattern.

  An exposure apparatus according to the present invention is an exposure apparatus that includes a chuck that holds a substrate horizontally and a mask holder that holds the mask facing the substrate held by the chuck, and is configured to print a mask pattern onto the substrate. The holder has a plurality of independent holder portions for holding the peripheral portion of the mask, and includes an adjusting means for inclining the holder portion and bending the mask in a direction opposite to the deflection due to gravity. The exposure method of the present invention is an exposure method in which the substrate is held horizontally, the mask is held facing the substrate by the mask holder, and the mask pattern is printed on the substrate. The holder is divided into a plurality of independent holder parts, and the holder part is inclined so that the mask is bent in the direction opposite to the bending due to gravity. The deflection due to the gravity of the mask is canceled by the bending in the opposite direction, and the deflection of the mask is effectively suppressed.

  Furthermore, the exposure apparatus of the present invention has a mechanism in which the adjusting means changes the angle at which the holder portion is inclined. In the exposure method of the present invention, the angle at which the holder portion is inclined is changed according to the amount of deflection of the mask due to gravity. Even if the magnitude of the deflection of the mask due to gravity is different, it is possible to change the curvature applied to the mask by changing the angle at which the holder portion is inclined.

  Furthermore, the exposure apparatus of the present invention includes support means for supporting one holder portion at at least three points, and the adjustment means has a mechanism for adjusting the height of the points supported by the support means. The exposure method of the present invention supports one holder part at at least three points and adjusts the height of each point to incline the holder part or change the angle at which the holder part is inclined. . With a simple configuration, the holder part is inclined or the angle at which the holder part is inclined is changed.

  Furthermore, the exposure apparatus of the present invention comprises a moving means that moves while holding the holder portion, and the adjusting means has a mechanism for adjusting the angle of the moving means. Further, the exposure method of the present invention is provided with moving means for holding and moving the holder part, and adjusting the angle of the moving means to incline the holder part or change the angle to incline the holder part. . When exposing substrates of different sizes, the holder unit is moved by the moving means according to the size of the mask. There is no need to replace the mask holder in accordance with the size of the mask as in the prior art, and the masks of different sizes can be easily replaced in a short time. Then, the holder portion is tilted or the angle at which the holder portion is tilted is changed by a simple operation of adjusting the angle of the moving means.

  The method for producing a display panel substrate according to the present invention involves exposing the substrate using any one of the above exposure apparatuses or exposure methods. By using the above exposure apparatus or exposure method, the deflection of the mask is suppressed, so that the pattern is burned uniformly and a high-quality substrate is manufactured.

  According to the exposure apparatus and the exposure method of the present invention, the mask holder is divided into a plurality of independent holder parts that hold the peripheral part of the mask, the holder part is inclined, and the mask is bent in the direction opposite to the deflection due to gravity. Therefore, the deflection of the mask due to gravity can be canceled out by bending in the reverse direction, and the deflection of the mask can be effectively suppressed.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, the deflection of the mask can be effectively suppressed by changing the angle at which the holder portion is inclined, even if the deflection due to the gravity of the mask is different. it can.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, the holder portion can be inclined with a simple configuration by supporting one holder portion at at least three points and adjusting the height of each point. Alternatively, the angle at which the holder part is inclined can be changed.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, the moving unit that holds and moves the holder unit is provided, the angle of the moving unit is adjusted, the holder unit is tilted, or the angle at which the holder unit is tilted is set. By changing, the masks of different sizes can be easily exchanged in a short time, and the holder part can be inclined or the holder part can be inclined by a simple operation of adjusting the angle of the moving means. The angle can be changed.

  According to the method for manufacturing a display panel substrate of the present invention, the deflection of the mask can be suppressed, so that a high-quality substrate can be manufactured by uniformly baking the pattern.

  FIG. 1 is a view showing the schematic arrangement of an exposure apparatus according to an embodiment of the present invention. This embodiment shows an example of a proximity type exposure apparatus. The exposure apparatus includes a chuck 10, a stage 11, a holder frame 20, a mask holder, a holder unit support device, a holder unit moving device, and an adjustment mechanism. In addition to the above, the exposure apparatus includes an exposure light source, a supply unit that supplies the substrate 1 to the chuck 10, a recovery unit that recovers the substrate 1 from the chuck 10, a temperature control unit that manages the temperature in the apparatus, and the like. However, in this embodiment, portions not directly related to the invention are omitted.

  A substrate 1 to be exposed is mounted on a chuck 10. The chuck 10 vacuum-sucks the lower surface of the substrate 1 to hold the substrate 1 horizontally. A mask 2 is held above the substrate 1 by a mask holder. The mask holder includes a plurality of independent holder portions 24 a and 24 b that hold the peripheral portion of the mask 2, and holds the mask 2 facing the substrate 1 held by the chuck 10. The holder part 24a is attached to the holder frame 20 by a holder part support device described later. The holder 24b is movably attached to the holder frame 20 by a holder moving device described later.

  The stage 11 moves in the XY direction, rotates in the θ direction, and moves and tilts in the Z direction while mounting the chuck 10. The substrate 1 is aligned by the movement of the stage 11 in the XY direction and the rotation in the θ direction. Further, the gap between the mask 2 and the substrate 1 is adjusted by the movement and tilt of the stage 11 in the Z direction.

  In the present embodiment, the gap between the mask 2 and the substrate 1 is adjusted by the stage 11, but the mask is obtained by moving and tilting the holder frame 20 to which the holder portions 24a and 24b are attached in the Z direction. The gap between the substrate 2 and the substrate 1 may be aligned.

  FIG. 2 is a top view of the holder frame. FIG. 3 is a bottom view of the holder frame. The holder frame 20 includes frames 21a and 21b and plates 22a and 22b. The frames 21a and 21b are I-shaped sections, and as shown in FIG. 2, the two frames 21a and the two frames 21b are combined to form a square frame. As shown in FIG. 3, two substantially U-shaped plates 22a and two rectangular plates 22b are attached to the bottom surface of the rectangular frame formed by the frames 21a and 21b.

  In FIG. 3, the plates 22a are attached to the left and right sides of a rectangular frame indicated by a broken line, and a part of the plate 22a protrudes to the inside of the rectangular frame. The plate 22b is sandwiched between two plates 22a and is attached to the top and bottom of a rectangular frame indicated by a broken line, and a part of the plate 22b protrudes toward the inside and outside of the rectangular frame. A square opening is formed inside the quadrangular frame by a portion where the plate 22a projects to the inside of the quadrangular frame and a portion where the plate 22b projects to the inside of the quadrangular frame.

  FIG. 4 is a side view of the holder frame as seen in the direction indicated by arrow D in FIG. FIG. 5 is a side view of the holder frame viewed in the direction indicated by arrow E in FIG. A plate material is attached to the side surface of the quadrangular frame formed by the frames 21a and 21b so as to cover the I-shaped cross section, and the side surface of the shape itself cannot be seen. As shown in FIGS. 4 and 5, a reinforcing plate 23 is attached to a portion where the plate 22 b protrudes to the outside of the rectangular frame.

  FIG. 6 is a top view of the holder frame to which the holder portion is attached. FIG. 7 is a bottom view of the holder frame to which the holder portion is attached. As shown in FIG. 7, the holder portion 24 a is attached to the lower surface of the plate 22 a by a holder portion support device including a support arm 31 and a support block 33. The holder unit support device supports one holder unit 24a at four points, and the heights of the four points that support the holder unit 24a are adjusted by an adjustment mechanism described later. In the present embodiment, the holder support device supports one holder part 24a at four points. However, the present invention is not limited to this, and one holder part 24a may be supported at least at three points. .

  As shown in FIGS. 6 and 7, the holder portion 24 b is movably attached to the lower surface of the plate 22 b by a holder portion moving device including a guide base 41, a rail 42, and a linear guide 43. The holder part moving device moves while holding the holder part 24b, and the angle of the holder part moving device is adjusted by an adjusting mechanism described later. In FIG. 7, most of the holder part moving device is located above the holder part 24 b and is indicated by a broken line.

  The holder part 24b is sandwiched between two holder parts 24a, and a rectangular opening through which exposure light passes is formed inside the opening formed by the plate 22a and the plate 22b by the holder part 24a and the holder part 24b. . As shown in FIG. 7, the rectangular mask 2 is attached to the holder portions 24 a and 24 b so as to cover the opening, and the holder portions 24 a and 24 b hold the peripheral portions of the four sides of the rectangular mask 2.

  FIG. 8 is a cross-sectional view taken along a line AA in FIG. In the present embodiment, the height of the four points at which the holder support device supports the holder 24a is adjusted by an adjustment mechanism described later, and the holder 24a is inclined by an angle α with respect to the horizontal. FIG. 9 is a cross-sectional view taken along the line BB in FIG. In the present embodiment, the angle of the holder part moving device that holds and moves the holder part 24b is adjusted by an adjusting mechanism described later, and the holder part 24b is inclined by an angle β with respect to the horizontal. By inclining the holder portions 24a and 24b in this manner, the mask 2 is curved in the direction opposite to the deflection due to gravity. Due to this curvature, the deflection of the mask 2 due to gravity is canceled, and the deflection of the mask 2 is effectively suppressed.

  Hereinafter, details of the holder support device, the holder moving device, and the adjustment mechanism according to the present embodiment will be described. FIG. 10 is a top view of the holder supporting device, the holder moving device, and the adjusting mechanism viewed from the state in which the holder frame is removed from FIG. FIG. 11A is a cross-sectional view of the FF portion in FIG. 10, and FIG. 11B is a side view of the holder support device and the adjustment mechanism as seen in the direction indicated by the arrow G in FIG.

  The holder unit support device that supports the holder unit 24 a includes a support arm 31, a ball receiver 32 a, a support block 33, an adjustment bolt 35, a lock nut 36, a ball 37, a plain washer 38, and a screw 39. The adjustment mechanism for adjusting the height of the point that supports the holder part 24 a of the holder part support device includes a screw hole 34, an adjustment bolt 35, and a lock nut 36.

  In FIG. 11A, the holder portion 24 a holds the peripheral portion of the mask 2 by vacuum suction using the suction groove 25. A substantially L-shaped support arm 31 is attached to the holder portion 24a with the L-shape inverted. A ball receiver 32 a is embedded in the lower surface of the arm portion extending in the lateral direction of the support arm 31 with the head facing down. The head of the ball receiver 32a is processed flat.

  In FIG. 11B, a substantially U-shaped support block 33 is attached to a plate 22a indicated by a broken line. In FIG. 11A, a threaded hole 34 is formed in the bottom of the support block 33. An adjustment bolt 35 is screwed into the screw hole 34 and is fixed by a lock nut 36. A conical depression indicated by a broken line is formed in the head of the adjustment bolt 35. A ball 37 is placed in this recess, and the ball 37 contacts the head of the ball receiver 32a and supports the holder portion 24a to which the support arm 31 is attached with a point.

  In addition to the screw hole 34, a through hole that is not threaded is provided at the bottom of the support block 33. A screw 39 is inserted into the through hole via a plain washer 38, and the screw 39 is screwed into a screw hole 40 provided in an arm portion extending in the lateral direction of the support arm 31. The screw 39 is for preventing the ball 37 from being detached from the head of the ball receiver 32a due to vibration or the like.

  In the adjustment by the adjustment mechanism, the screw 39 is first loosened in advance. Then, the lock nut 36 is loosened, the screw amount of the adjusting bolt 35 screwed into the screw hole 34 is changed, the height of the ball 37 is raised and lowered, and the height of the point supporting the holder portion 24a is adjusted. Then, the lock nut 36 is tightened to fix the adjustment bolt 35. After the adjustment, the screw 39 is tightened again.

  12A is a cross-sectional view of the H-H portion of FIG. 10, and FIG. 12B is a side view of the holder portion supporting device and the adjusting mechanism viewed in the direction indicated by the arrow J in FIG. The difference from FIG. 11 is that a ball receiver 32b is used instead of the ball receiver 32a shown in FIG. A groove having a V-shaped cross section indicated by a broken line in FIGS. 12A and 12B is formed in the head of the ball receiver 32b. By disposing the groove in the direction indicated by the arrow J in FIG. 10, the movement of the holder part 24a can be limited and the holder part 24a can be positioned in the direction orthogonal to the groove. In FIG. 10, the holder portion 24a is supported at four points by the holder portion supporting device. However, the positioning using the ball receiver 32b shown in FIG. 12 is performed only at one point of the H-H portion. Good. The same applies to the other holder portion 24a.

  13 is a cross-sectional view taken along the line CC in FIG. The holder part moving device that moves while holding the holder part 24 b includes a guide base 41, a rail 42, and a linear guide 43. The adjustment mechanism for adjusting the angle of the holder unit moving device includes a screw hole 44, an adjustment bolt 45, a lock nut 46, a spherical washer 47, a flat washer 48, a screw 49, and a screw hole 50. .

  In FIG. 13, the holder portion 24 b holds the peripheral portion of the mask 2 by vacuum suction using the suction grooves 25. A linear guide 43 is attached to the holder portion 24b. The linear guide 43 is movable along a rail 42 attached to the guide base 41. In order to expose substrates having different sizes, there is a high demand for using masks having different vertical or horizontal sizes. In the present embodiment, when using masks having different vertical or horizontal sizes, the holder unit 24b is moved by the holder unit moving device in accordance with the size of the mask 2. There is no need to replace the mask holder in accordance with the size of the mask as in the prior art, and the masks of different sizes can be easily replaced in a short time.

  A plurality of threaded holes 44 are formed in the plate 22b. An adjustment bolt 45 is screwed into the screw hole 44 and fixed with a lock nut 46. The tip of the adjustment bolt 45 protrudes from the screw hole 44 and contacts a spherical washer 47 embedded in the guide base 41. By using the spherical washer 47, the guide base 41 can be tilted without applying unnecessary stress to the guide base 41. The adjustment bolt 45 is provided with a through hole that is not threaded. A screw 49 is inserted into the through hole via a plain washer 48, and the screw 49 is screwed into a screw hole 50 provided in the guide base 41.

  In the adjustment by the adjustment mechanism, the screw 49 is first loosened in advance. Then, the lock nut 46 is loosened, and the screwing amounts of the adjusting bolts 45 screwed into the screw holes 44 are changed to each other by the plurality of screw holes 44, thereby changing the height at which the tip of the adjusting bolt 45 contacts the spherical washer 47. Adjust the angle of the holder unit moving device. Then, the lock nut 46 is tightened to fix the adjustment bolt 45. After the adjustment, the screw 49 is tightened again.

  In the adjustment mechanism shown in FIGS. 11 to 13, the angle at which the holder portions 24 a and 24 b are inclined can be changed by changing the screwing amounts of the adjustment bolts 35 and 45. Therefore, in the present embodiment, the screwing amounts of the adjustment bolts 35 and 45 are changed in accordance with the magnitude of the deflection of the mask 2 due to gravity, and the angles at which the holder portions 24a and 24b are inclined are changed. Even if the magnitude of the deflection of the mask 2 due to gravity is different, it is possible to change the curvature applied to the mask 2 by changing the angle at which the holder portions 24a and 24b are inclined.

  According to the embodiment described above, the mask holder is divided into a plurality of independent holder parts 24 a and 24 b that hold the peripheral part of the mask 2, and the holder parts 24 a and 24 b are inclined so that the mask 2 is subjected to gravity. By giving the curvature in the direction opposite to the deflection, the deflection due to the gravity of the mask 2 can be canceled by the curvature in the opposite direction, and the deflection of the mask 2 can be effectively suppressed.

  Furthermore, according to the embodiment described above, the deflection of the mask 2 can be effectively suppressed by changing the angle at which the holder portions 24a and 24b are inclined even if the magnitude of the deflection of the mask 2 due to gravity is different. can do.

  Furthermore, according to the embodiment described above, one holder part 24a is supported at at least three points, and the holder part 24a can be inclined with a simple configuration by adjusting the height of each point. Alternatively, the angle at which the holder portion 24a is inclined can be changed.

  Furthermore, according to the embodiment described above, the holder part moving device that holds and moves the holder part 24b is provided, the angle of the holder part moving device is adjusted, the holder part 24b is inclined, or the holder part 24b. By changing the angle of tilting, the masks of different sizes can be easily replaced in a short time, and the holder portion 24b can be tilted with a simple operation of adjusting the angle of the holder portion moving device. Or the angle at which the holder portion 24b is inclined can be changed.

  By performing exposure of the substrate using the exposure apparatus or exposure method of the present invention, the deflection of the mask can be suppressed, so that a high-quality substrate can be manufactured by uniformly baking the pattern.

  For example, FIG. 14 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device. In the thin film formation step (step 101), a thin film such as a conductor film or an insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on a glass substrate by sputtering, plasma chemical vapor deposition (CVD), or the like. In the resist coating process (step 102), a photosensitive resin material (photoresist) is applied by a roll coating method or the like to form a photoresist film on the thin film formed in the thin film forming process (step 101). In the exposure step (step 103), the mask pattern is transferred to the photoresist film using a proximity exposure apparatus, a projection exposure apparatus, or the like. In the development step (step 104), a developer is supplied onto the photoresist film by a shower development method or the like to remove unnecessary portions of the photoresist film. In the etching process (step 105), a portion of the thin film formed in the thin film formation process (step 101) that is not masked by the photoresist film is removed by wet etching. In the stripping step (step 106), the photoresist film that has finished the role of the mask in the etching step (step 105) is stripped with a stripping solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the glass substrate.

  FIG. 15 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device. In the black matrix forming step (step 201), a black matrix is formed on the glass substrate by processes such as resist coating, exposure, development, etching, and peeling. In the colored pattern forming step (step 202), a colored pattern is formed on the glass substrate by a dyeing method, a pigment dispersion method, a printing method, an electrodeposition method, or the like. This process is repeated for the R, G, and B coloring patterns. In the protective film forming step (step 203), a protective film is formed on the colored pattern, and in the transparent electrode film forming step (step 204), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  In the TFT substrate manufacturing process shown in FIG. 14, in the exposure process (step 103), in the color filter substrate manufacturing process shown in FIG. 15, in the black matrix forming process (step 201) and the colored pattern forming process (step 202). In this exposure process, the exposure apparatus or the exposure method of the present invention can be applied.

1 is a diagram showing a schematic configuration of an exposure apparatus according to an embodiment of the present invention. It is a top view of a holder frame. It is a bottom view of a holder frame. FIG. 3 is a side view of the holder frame viewed in a direction indicated by an arrow D in FIG. 2. It is the side view of the holder frame seen in the direction shown by the arrow E of FIG. It is a top view of the holder frame to which the holder part was attached. It is a bottom view of the holder frame to which the holder part was attached. It is sectional drawing of the AA part of FIG. It is sectional drawing of the BB part of FIG. FIG. 7 is a top view of the holder part supporting device, the holder part moving device, and the adjusting mechanism as seen with the holder frame removed from FIG. 6. FIG. 11A is a cross-sectional view of the FF portion in FIG. 10, and FIG. 11B is a side view of the holder support device and the adjustment mechanism as seen in the direction indicated by the arrow G in FIG. 12A is a cross-sectional view of the H-H portion of FIG. 10, and FIG. 12B is a side view of the holder portion supporting device and the adjusting mechanism viewed in the direction indicated by the arrow J in FIG. It is sectional drawing of the CC section of FIG. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of a liquid crystal display device. It is a flowchart which shows an example of the manufacturing process of the color filter board | substrate of a liquid crystal display device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Board | substrate 2 Mask 10 Chuck 11 Stage 20 Holder frame 21a, 21b Frame 22a, 22b Plate 23 Reinforcement plate 24a, 24b Holder part 25 Suction groove 31 Support arm 32a, 32b Ball receiver 33 Support block 34 Screw hole 35 Adjustment bolt 36 Lock nut 37 Ball 38 Plain washer 39 Screw 40 Screw hole 41 Guide base 42 Rail 43 Linear guide 44 Screw hole 45 Adjustment bolt 46 Lock nut 47 Spherical washer 48 Plain washer 49 Screw 50 Screw hole

Claims (10)

An exposure apparatus comprising: a chuck for horizontally holding a substrate; and a mask holder for holding a mask facing the substrate held by the chuck, wherein the mask pattern is printed on the substrate.
The mask holder has a plurality of independent holder parts for holding the peripheral part of the mask,
An exposure apparatus comprising an adjusting means for inclining the holder portion to curve the mask in a direction opposite to the deflection due to gravity.   The exposure apparatus according to claim 1, wherein the adjustment unit includes a mechanism that changes an angle at which the holder portion is inclined. Comprising support means for supporting one holder part at at least three points;
The exposure apparatus according to claim 1, wherein the adjustment unit includes a mechanism that adjusts a height of a point supported by the support unit. A moving means for holding and moving the holder part;
The exposure apparatus according to claim 1, wherein the adjusting unit includes a mechanism that adjusts an angle of the moving unit. An exposure method in which a substrate is held horizontally, a mask is held facing the substrate by a mask holder, and a mask pattern is printed on the substrate,
Dividing the mask holder into a plurality of independent holder parts that hold the peripheral part of the mask,
An exposure method comprising tilting a holder portion to give the mask a curvature in a direction opposite to that caused by gravity.   6. The exposure method according to claim 5, wherein the angle at which the holder portion is inclined is changed in accordance with the amount of deflection due to gravity of the mask.   7. One holder part is supported by at least 3 points | pieces, the height of each point is adjusted, a holder part is inclined, or the angle which inclines a holder part is changed, The claim 6 characterized by the above-mentioned. An exposure method according to 1. A moving means for holding and moving the holder part is provided,
The exposure method according to claim 5 or 6, wherein the angle of the moving means is adjusted to incline the holder part or to change the angle to incline the holder part.   A method for manufacturing a display panel substrate, wherein the substrate is exposed using the exposure apparatus according to any one of claims 1 to 4.   A method for manufacturing a display panel substrate, wherein the substrate is exposed using the exposure method according to any one of claims 5 to 8.

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