JP2009258195A - Proximity exposure device, substrate moving method for proximity exposure device, and method of manufacturing display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To alleviate a load applied on a guide by using a linear motor, and to speedily move a substrate without deteriorating the moving performance of a moving stage and without lowering the rigidity of the stage, in a proximity exposure device which exposes the large-sized substrate. <P>SOLUTION: Plate-like needles 42 incorporated with coils of even numbers of linear motors is fitted to a side surface of a second stage (16) which extends in a Y direction (or in an X direction), and plate-like stators 41 incorporated with magnets of even numbers of the linear motors are fitted to a first stage (14) while extending in the Y direction (or in the X direction) facing the same direction with the needles 42 of the linear motors, and the second stage (16) is moved along a second guide (15) using even numbers of the linear motors which have the stators 41 and needles 42 disposed facing the same lateral direction in right-left symmetrical relation to move a substrate 1 in the Y direction (or in the X direction). <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a proximity exposure apparatus that exposes a substrate using a proximity method in manufacturing a display panel substrate such as a liquid crystal display device, a substrate moving method of the proximity exposure apparatus, and a display panel using the same. The present invention relates to a substrate manufacturing method, and more particularly, to a proximity exposure apparatus that moves a large substrate in the XY directions to position the substrate, a substrate moving method for the proximity exposure apparatus, and a display panel substrate manufacturing method using them. .

  Manufacturing of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, and the like of liquid crystal display devices used as display panels is performed using photolithography using an exposure apparatus. This is performed by forming a pattern on the substrate by a technique. As an exposure apparatus, a projection system that projects a photomask (hereinafter referred to as “mask”) pattern onto a substrate using a lens or a mirror, and a small gap (proximity gap) between the mask and the substrate. There is a proximity method in which a mask pattern is provided and transferred to a substrate. The proximity method is inferior in pattern resolution performance to the projection method, but the configuration of the irradiation optical system is simple, the processing capability is high, and it is suitable for mass production.

  In recent years, in the manufacture of various substrates for display panels, a relatively large substrate is prepared in order to cope with an increase in size and a variety of sizes, and one or a plurality of substrates can be selected from one substrate depending on the size of the display panel. Manufactures display panel substrates. In this case, in the proximity method, if one surface of the substrate is to be exposed at once, a mask having the same size as the substrate is required, and the cost of the expensive mask is further increased. In view of this, the mainstream method is to divide and expose one surface of a substrate into a plurality of shots while using a mask that is relatively smaller than the substrate and moving the substrate stepwise in the XY direction by a moving stage.

  Conventionally, in a proximity exposure apparatus, a feed screw such as a ball screw has been used to move a substrate in the XY directions. However, as the size of the display panel becomes larger, the larger the substrate, the stronger the demand for moving the substrate at high speed and high accuracy, and the conventional moving stage using a feed screw moves the substrate. There was a limit to the improvement of speed and accuracy.

As a mechanism to replace the feed screw, a linear motor using a stator having a magnet or a coil and a mover having a coil or a magnet has been developed. The stator and the mover are installed so that they do not come into contact with each other through a slight gap. When a current is passed through the coil, a thrust (Lorentz) is applied to the mover from the coil current and the magnetic field of the magnet according to Fleming's left-hand rule. Force) works. Since the stator and the mover are non-contact and free from friction, high-speed and high-precision movement is possible. As a projection type exposure apparatus using such a linear motor, there are those described in Patent Document 1 and Patent Document 2.
JP-A-10-127035 JP 2004-215419 A

  The exposure apparatuses described in Patent Document 1 and Patent Document 2 are reduction projection type exposure apparatuses used for exposure of relatively small objects such as semiconductor wafers. In such an apparatus having a short stage moving distance, a coil is built in the stator side of the linear motor and a magnet is built in the mover side. Since the magnet is lighter than the coil, high acceleration can be obtained. On the other hand, in a proximity exposure apparatus that exposes a large substrate, when the movement distance of the stage is long and a linear motor is used, it is better to incorporate a magnet on the stator side and a coil on the mover side. It can be configured at a lower cost.

  FIG. 9 is a diagram showing an example of a proximity exposure apparatus using a linear motor. The chuck 10 on which the substrate 1 is mounted is moved in the X direction (the horizontal direction in FIG. 9) and the Y direction (the depth direction in FIG. 9) by the moving stage. A mask 2 is held by a mask holder 20 above the substrate 1 mounted on the chuck 10. An irradiation optical system (not shown) is disposed above the mask 2 held by the mask holder 20. At the time of exposure, exposure light from the irradiation optical system passes through the mask 2 and is irradiated onto the substrate 1, whereby the pattern of the mask 2 is transferred to the surface of the substrate 1 and a pattern is formed on the substrate 1.

  A stage base 11 is disposed below the mask holder 20, and an X guide 13 extending in the X direction is provided on the stage base 11. The moving stage includes an X stage 14, a Y guide 15, a Y stage 16, a θ stage 17, and a chuck support 19. The X stage 14 is mounted on an X guide 13 provided on the stage base 11 and moves in the X direction along the X guide 13. A Y guide 15 extending in the Y direction is provided on the X stage 14. The Y stage 16 is mounted on a Y guide 15 provided on the X stage 14 and moves in the Y direction along the Y guide 15. The θ stage 17 is mounted on the Y stage 16 and rotates in the θ direction. The chuck support 19 is mounted on the θ stage 17 and supports the chuck 10.

  In this example, a linear motor comprising a plate-like stator 41 with a built-in magnet and a plate-like mover 42 with a built-in coil is used to move the Y stage 16 in the Y direction. 41 and the mover 42 are arranged so as to face each other vertically. The stator 41 of the linear motor is attached to the upper surface of the X stage 14 so as to extend in the Y direction. The mover 42 of the linear motor is attached to the lower surface of the Y stage 16 so as to face the stator 41. When the stator 41 and the mover 42 of the linear motor are arranged vertically facing each other as in this example, the Y guide 15 is moved up and down by the magnetic attraction force generated between the stator 41 and the mover 42. There is a problem that a load is applied in the direction.

  FIG. 10 is a view showing another example of a proximity exposure apparatus using a linear motor. In this example, two linear motors are used to move the Y stage 16 in the Y direction, and the stator 41 and the movable element 42 of each linear motor are faced in the horizontal direction so that the two linear motors are symmetrical. It is arranged. The stator 41 of each linear motor is attached by being extended to the Y direction while standing on the X stage 14 by each stator attachment base 43. The mover 42 of each linear motor is attached to the Y stage 16 so as to face the stator 41 of the linear motor by a common mover mounting base 44. The Y guide 15 is provided on a table 45 provided on the X stage 14. The magnetic attractive forces generated by the linear motors cancel each other, and the load on the Y guide 15 is reduced. However, in the case where the stator 41 and the mover 42 of the linear motor are arranged upright between the X stage 14 and the Y stage 16 as in this example, the space for arranging the stator 41 and the mover 42 is provided. In order to ensure the above, a table 45 is required. For this reason, there is a problem that the center of gravity of the moving stage becomes high and the motion performance of the moving stage is lowered.

  FIG. 11 is a view showing still another example of a proximity exposure apparatus using a linear motor. In this example, a groove is provided in the X stage 14 in order to secure a space for arranging the stator 41 and the mover 42 of the linear motor, as compared with the example shown in FIG. The stator 41 of each linear motor is attached by being extended in the Y direction in a state of being standing in a groove provided in the X stage 14 by each stator attachment base 43. The mover 42 of each linear motor is attached to the Y stage 16 so as to face the stator 41 of the linear motor by a common mover mounting base 44. The Y guide 15 is provided on the X stage 14, and the base 45 of FIG. Even if the linear motor stator 41 and the movable element 42 are arranged so as to face each other in the horizontal direction, if the linear motor stator 41 and the movable element 42 are arranged in the groove of the X stage 14, the center of gravity of the moving stage is high. It is possible to prevent the movement performance of the moving stage from being lowered. However, when a groove is provided in the X stage 14 as in this example, there is a problem that the rigidity of the X stage 14 is lowered. Further, if the X stage 14 is made thicker in order to increase the rigidity, there is a problem that the weight of the moving stage is increased and the motion performance of the moving stage is lowered.

  An object of the present invention is to use a linear motor to reduce the load on a guide in a proximity exposure apparatus that performs exposure of a large substrate, and to move the substrate without reducing the motion performance and rigidity of the moving stage. This is done at high speed and with high accuracy. It is another object of the present invention to manufacture a high-quality substrate with high throughput by accurately performing pattern printing at short intervals.

  The proximity exposure apparatus of the present invention includes a chuck for holding a substrate, a mask holder for holding a mask, a stage base disposed below the mask holder, and an X direction (or Y direction) provided on the stage base. A first guide extending along the first guide, a first stage moving along the first guide, a second guide provided on the first stage and extending in the Y direction (or X direction), and a second guide And a second stage that moves the substrate, a first stage that moves the first stage, and a second stage that moves the second stage. The second moving means has an even number of linear motors composed of a plate-like stator with a built-in magnet and a plate-like mover with a built-in coil. The mover is the second It is attached to the side of the stage that extends in the Y direction (or X direction), and the stator of each linear motor is attached to the first stage so that it faces the mover of the linear motor and extends in the Y direction (or X direction). The even number of linear motors are arranged symmetrically with the stator and the mover facing in the lateral direction.

  In the proximity exposure apparatus of the present invention, the substrate moving method includes disposing a stage base below a mask holder for holding a mask, and providing a first guide extending in the X direction (or Y direction) on the stage base, A first stage moving in the X direction (or Y direction), a second guide provided on the first stage extending in the Y direction (or X direction), and a second stage moving in the Y direction (or X direction) A chuck is mounted on a moving stage having two stages, a substrate is held by the chuck, and a plate-like movable element incorporating a coil of an even number of linear motors is connected to the second stage in the Y direction (or X direction). A plate-shaped stator that contains an even number of linear motor magnets is attached to the side that extends to the first stage, facing the linear motor mover, and extended in the Y direction (or X direction). The second stage is moved along the second guide by using an even number of linear motors in which the stator and the mover face each other in the lateral direction and are symmetrically arranged. Or movement in the X direction).

  A first stage moving in the X direction (or Y direction), a second guide provided on the first stage extending in the Y direction (or X direction), and a second stage moving in the Y direction (or X direction) A chuck is mounted on a moving stage having two stages, a substrate is held by the chuck, and an even number of linear motors in which a stator and a movable element are arranged symmetrically facing each other in the lateral direction, The second stage is moved along the guide 2 to move the substrate in the Y direction (or X direction), so that the magnetic attractive forces generated by the linear motors cancel each other, The applied load is reduced. Then, a plate-like mover with a built-in coil of each linear motor is attached to a side surface extending in the Y direction (or X direction) of the second stage, and a plate-like stator with a built-in magnet of each linear motor is attached. Since it is attached to the first stage so as to face the mover of the linear motor and extend in the Y direction (or X direction), the stator and mover of the linear motor are placed between the first stage and the second stage. There is no need to provide a stand for securing the space for placement. For this reason, the center of gravity of the moving stage does not increase, and the movement performance of the moving stage does not deteriorate. Moreover, it is not necessary to provide a groove in the first stage, and the rigidity of the first stage does not decrease.

  Furthermore, in the proximity exposure apparatus of the present invention, the stage base has a groove extending in the X direction (or Y direction), and the first moving means has a plate-like stator having a built-in magnet and a coil. It has an even number of linear motors consisting of a plate-shaped mover, and the stator of each linear motor is installed in the X direction (or Y direction) in a standing state in the groove of the stage base. A motor mover is mounted on the first stage so as to face the stator of the linear motor, and an even number of linear motors are arranged symmetrically with the stator and mover facing laterally. It is a thing.

  Further, the substrate moving method of the proximity exposure apparatus according to the present invention provides a plate-like stator in which a groove extending in the X direction (or Y direction) is provided in the stage base and an even number of linear motor magnets are built in. A plate-like mover with an even number of linear motor coils built in the state of standing up in the groove and oriented in the X direction (or Y direction). The first stage is moved along the first guide by using an even number of linear motors in which the stator and the movable element are arranged symmetrically with the stator and the mover facing each other in the lateral direction. It moves in the X direction (or Y direction).

  Using an even number of linear motors in which the stator and the mover face each other in the lateral direction and are arranged symmetrically, the first stage is moved along the first guide to move the substrate in the X direction (or Therefore, the magnetic attractive forces generated by the linear motors cancel each other, and the load on the first guide is reduced. Then, a groove extending in the X direction (or Y direction) is provided in the stage base, and a plate-shaped stator having a built-in magnet of even number of linear motors is erected in the groove of the stage base in the X direction (or Y A plate-shaped mover with a built-in coil of even number of linear motors is attached to the first stage so that it faces the stator of the linear motor, so that the stage base and the first stage It is not necessary to provide a stand for securing a space for arranging the stator and mover of the linear motor between them, and the overall height of the apparatus can be suppressed.

  The method for producing a display panel substrate according to the present invention exposes a substrate using any one of the above-described proximity exposure apparatuses, or removes the substrate using any one of the above-described proximity exposure apparatuses. Positioning and exposure of the substrate are performed. Since the movement of the substrate is performed at high speed and with high accuracy, pattern printing is performed with high accuracy at short intervals, and a high quality substrate is manufactured with high throughput.

  According to the proximity exposure apparatus and the substrate moving method of the proximity exposure apparatus of the present invention, the first stage moving in the X direction (or Y direction), the Y direction (or X direction) provided on the first stage. ) A chuck is mounted on a moving stage having a second guide extending in the direction Y and a second stage moving in the Y direction (or X direction), the substrate is held by the chuck, and an even number of linear motor coils are incorporated. The plate-shaped movable element is attached to the side surface of the second stage extending in the Y direction (or X direction), and the plate-shaped stator containing the magnets of an even number of linear motors is linearly connected to the first stage. Using the even number of linear motors in which the stator and the mover are arranged symmetrically facing each other in the lateral direction, the second and second linear motors are mounted in the Y direction (or X direction). The moth In a proximity exposure apparatus that performs exposure of a large substrate by moving the second stage along the substrate and moving the substrate in the Y direction (or X direction), the linear motor is used to It is possible to move the substrate in the Y direction (or X direction) at high speed and with high accuracy without reducing the load applied to the second guide and reducing the motion performance and rigidity of the moving stage.

  Furthermore, according to the proximity exposure apparatus and the substrate moving method of the proximity exposure apparatus of the present invention, a plate-like shape in which a groove extending in the X direction (or Y direction) is provided in the stage base and an even number of linear motor magnets are incorporated. Is mounted in the X direction (or Y direction) with the stator standing up in the groove of the stage base, and a plate-like mover incorporating coils of an even number of linear motors is attached to the first stage. The first stage is mounted along the first guide using an even number of linear motors that are mounted so as to face the stator of the linear motor, and the stator and mover face each other in the lateral direction and are symmetrically arranged. In a proximity exposure apparatus that exposes a large substrate by moving the substrate in the X direction (or Y direction), the linear guide is used to engage the first guide. Load and reduce the, suppress the total height of the device, the movement in the X direction of the substrate (or the Y-direction) can be performed at high speed and with high accuracy.

  According to the method for manufacturing a display panel substrate of the present invention, the substrate can be moved at high speed and with high accuracy, so that pattern printing is performed with high accuracy at short intervals, and a high-quality substrate is manufactured with high throughput. be able to.

  FIG. 1 is a top view of a proximity exposure apparatus according to an embodiment of the present invention. FIG. 2 is a side view of the proximity exposure apparatus according to the embodiment of the present invention. The proximity exposure apparatus includes a chuck 10, a stage base 11, an X guide 13, a moving stage, a mask holder 20, a plurality of linear motors, stator mounting bases 33 and 43, and a mover mounting base 34. . In addition to these, the exposure apparatus includes an irradiation optical system that irradiates exposure light, a carry-in unit that carries in the substrate 1, a carry-out unit that carries out the substrate 1, a temperature control unit that manages the temperature in the apparatus, and the like. Yes.

  Note that the XY directions in the embodiments described below are examples, and the X direction and the Y direction may be interchanged.

  In FIG. 2, a mask holder 20 that holds the mask 2 is installed above the exposure position where the substrate 1 is exposed. The mask holder 20 holds the periphery of the mask 2 by vacuum suction. An irradiation optical system (not shown) is disposed above the mask 2 held by the mask holder 20. At the time of exposure, exposure light from the irradiation optical system passes through the mask 2 and is irradiated onto the substrate 1, whereby the pattern of the mask 2 is transferred to the surface of the substrate 1 and a pattern is formed on the substrate 1.

  A stage base 11 is disposed below the mask holder 20. The stage base 11 is composed of a plurality of bases 11a and 11b. An X guide 13 extending in the X direction is provided on the stage base 11. The chuck 10 is moved between a load / unload position on the base 11a and an exposure position on the base 11b along the X guide 13 by a moving stage described later. 1 and 2 show a state where the chuck 10 is at the exposure position. The substrate 1 is mounted on the chuck 10 by a loading unit (not shown) at a load / unload position on the base 11a, and is recovered from the chuck 10 by a loading unit (not shown). The chuck 10 holds the substrate 1 by vacuum suction.

  The chuck 10 is mounted on a moving stage. The moving stage includes an X stage 14, a Y guide 15, a Y stage 16, a θ stage 17, and a chuck support 19. The X stage 14 is mounted on an X guide 13 provided on the stage base 11 and moves in the X direction along the X guide 13. On the X stage 14, a Y guide 15 extending in the Y direction (the depth direction in FIG. 2) is provided. The Y stage 16 is mounted on a Y guide 15 provided on the X stage 14 and moves in the Y direction along the Y guide 15. The θ stage 17 is mounted on the Y stage 16 and rotates in the θ direction. The chuck support 19 is mounted on the θ stage 17 and supports the chuck 10.

  As the X stage 14 moves in the X direction, the chuck 10 is moved between the load / unload position on the base 11a and the exposure position on the base 11b. At the exposure position on the base 11b, the X stage 14 is moved in the X direction and the Y stage 16 is moved in the Y direction, whereby the substrate 1 held by the chuck 10 is stepped in the XY direction. The substrate 1 is positioned during exposure by moving the X stage 14 in the X direction, moving the Y stage 16 in the Y direction, and rotating the θ stage 17 in the θ direction. Further, the gap between the mask 2 and the substrate 1 is adjusted by moving and tilting the mask holder 20 in the Z direction by a Z-tilt mechanism (not shown).

  In the present embodiment, the gap between the mask 2 and the substrate 1 is adjusted by moving and tilting the mask holder 20 in the Z direction. However, the chuck 10 is provided with a Z-tilt mechanism on the moving stage. The gap between the mask 2 and the substrate 1 may be adjusted by moving and tilting in the Z direction.

  Hereinafter, a substrate moving method of the proximity exposure apparatus of the present embodiment will be described. FIG. 3 is a front view of a proximity exposure apparatus according to an embodiment of the present invention. In the present embodiment, two linear motors are used as the first moving means for moving the X stage 14. Each linear motor includes a plate-like stator 31 with a built-in magnet and a plate-like mover 32 with a built-in coil.

  In FIG. 3, the stage base 11 is provided with a groove extending in the X direction (the depth direction in FIG. 3). Stator mounting bases 33 extending in the X direction are respectively attached to the left and right corners of the groove of the stage base 11. A stator 31 of each linear motor is attached to each stator attachment base 33. The stator 31 of each linear motor is attached by being extended in the X direction by a stator attachment base 33 while standing in a groove provided in the stage base 11. On the other hand, a mover mounting base 34 having a T-shaped cross section is mounted on the lower surface of the X stage 14. The mover 32 of each linear motor is attached to the left and right side surfaces of the mover attachment base 34. The mover 32 of each linear motor is attached to the X stage 14 so as to face the stator 31 of the linear motor by a common mover mounting base 34. The two linear motors are arranged symmetrically with the stator 31 and the movable element 32 facing in the lateral direction.

  The X stage 14 is moved along the X guide 13 by using two linear motors in which the stator 31 and the mover 32 are arranged symmetrically in the lateral direction so that the substrate moves in the X direction. I do. The magnetic attractive forces generated by the linear motors cancel each other, and the load on the X guide 13 is reduced. Then, a groove extending in the X direction is provided in the stage base 11, and a plate-like stator 31 having a built-in magnet of each linear motor is extended and attached in the X direction while standing in the groove of the stage base 11. Since the plate-like movable element 32 including the motor coil is attached to the X stage 14 so as to face the stator 31 of the linear motor, the linear motor stator 31 and the X-stage 14 are arranged between the stage base 11 and the X stage 14. There is no need to provide a stand for securing a space for placing the mover 32, and the overall height of the apparatus can be suppressed.

  FIG. 4 is an enlarged view of a part of FIG. FIG. 5 is a diagram illustrating a state in which the stator mounting base and the mover mounting base of FIG. 4 are viewed from below. 4 and 5, two roller holders 35 are attached to the bottom surface of the mover mounting base 34. As shown in FIG. 5, two rollers 36 are rotatably attached to each roller holder 35. Each roller holder 35 is made of an elastic material, urges each two rollers 36 toward each stator mounting base 33, and presses each two rollers 36 against each stator mounting base 33. Yes. Each of the two rollers 36 rotates as the X stage 14 moves while being in contact with each stator mounting base 33.

  When the stage base 11 becomes larger as the substrate becomes larger, it becomes necessary to divide the large stage base into a plurality of bases 11a and 11b for transportation. When the stage base 11 is divided into a plurality of bases 11a and 11b, when the stator 31 and the mover 32 of each linear motor that moves the X stage 14 are disposed facing each other in the lateral direction, the stator 31 is disposed. It becomes difficult to attach at a uniform height across the plurality of bases 11a and 11b, and the height of the stator 31 may vary between the bases 11a and 11b. When the height of the linear motor stator 31 fluctuates, the linear motor mover 32 receives a force to move up and down in accordance with the stator 31, so that a load is applied to the mounting portion of the mover 32. Further, since the gap between the stator 31 and the mover 32 of each linear motor varies and the magnetic attractive force generated by each linear motor varies, a load is applied to the mounting portion of the mover 32.

  In the present embodiment, each of the two rollers 36 urged in the direction of each stator mounting base 33 by each roller holder 35 comes into contact with each stator mounting base 33 to move the X stage 14. The fluctuation of the gap between the stator 31 and the mover 32 of the linear motor is suppressed. Each of the two rollers 36 rotates in contact with each stator mounting base 33 according to the movement of the X stage 14, and when the height of the stator 31 of each linear motor varies, the mover of each linear motor 32 does not hinder vertical movement. The stator 31 of each linear motor that moves the X stage 14 while allowing the mover 32 of each linear motor that moves the X stage 14 to move up and down with a simple configuration using the roller holder 35 and the roller 36. Variation in the gap with the mover 32 is suppressed.

  The gap between the stator 31 and the movable element 32 of each linear motor that moves the X stage 14 while allowing the vertical movement of the movable element 32 of each linear motor that moves the X stage 14 is divided into a plurality of stages. Therefore, even if the height of the stator 31 of each linear motor that moves the X stage 14 fluctuates, the load on the mounting portion of the mover 32 of each linear motor that moves the X stage 14 is reduced. Is done. In addition, since the variation in the magnetic attractive force of each linear motor that moves the X stage 14 is suppressed, the gain adjustment range of each linear motor that moves the X stage 14 is widened.

  FIG. 6 is a top view showing a state where a portion above the Y stage is removed from the proximity exposure apparatus according to the embodiment of the present invention. In the present embodiment, two linear motors are used as the second moving means for moving the Y stage 16. Each linear motor includes a plate-like stator 41 having a built-in magnet and a plate-like movable element 42 having a built-in coil.

  2 and 6, the mover 42 of each linear motor is attached to the side surface of the Y stage 16 that extends in the Y direction (the depth direction in FIG. 2). Stator mounting bases 43 extending in the Y direction are respectively attached to the left and right ends of the upper surface of the X stage 14. The stator 41 of each linear motor is attached to each stator mounting base 43 so as to face the movable element 42 of the linear motor and extend in the Y direction while standing on the X stage 14. The two linear motors are arranged symmetrically with the stator 41 and the movable element 42 facing each other in the lateral direction.

  The Y stage 16 is moved along the Y guide 15 by using two linear motors in which the stator 41 and the mover 42 are arranged symmetrically in the lateral direction so that the substrate moves in the Y direction. I do. The magnetic attractive forces generated by the linear motors cancel each other, and the load on the Y guide 15 is reduced. Then, a plate-like movable element 42 incorporating a coil of each linear motor is attached to a side surface extending in the Y direction of the Y stage 16, and a plate-like stator 41 incorporating a magnet of each linear motor is attached to the X stage 14. Since it is attached so as to face the movable element 42 of the linear motor and extend in the Y direction, it is a base for securing a space for arranging the stator 41 and the movable element 42 of the linear motor between the X stage 14 and the Y stage 16. There is no need to provide. For this reason, the center of gravity of the moving stage does not increase, and the movement performance of the moving stage does not deteriorate. Further, it is not necessary to provide a groove in the X stage 14, and the rigidity of the X stage 14 does not decrease.

  According to the embodiment described above, the chuck is attached to the moving stage having the X stage 14 moving in the X direction, the Y guide 15 provided on the X stage 14 extending in the Y direction, and the Y stage 16 moving in the Y direction. 10, the substrate 1 is held by the chuck 10, and a plate-like movable element 42 incorporating two linear motor coils is attached to the side surface of the Y stage 16 extending in the Y direction, and the magnets of the two linear motors Is mounted on the X stage 14 so as to face the mover 42 of the linear motor and extend in the Y direction so that the stator 41 and the mover 42 face each other in the horizontal direction. The Y stage 16 is moved along the Y guide 15 using the two linear motors disposed on the Y guide 15 to move the substrate 1 in the Y direction. That the load and reduce the, without reducing the maneuverability and rigidity of the movable stage, movement in the Y direction of the substrate 1 can be performed quickly and accurately.

  Further, according to the embodiment described above, the stage base 11 is provided with a groove extending in the X direction, and the plate-like stator 31 incorporating the magnets of the two linear motors is erected in the groove of the stage base 11. In this state, the plate-like movable element 32 having two linear motor coils built in is attached to the X stage 14 so as to face the stator 31 of the linear motor, and the stator 31 and the movable element 32 are attached. By moving the X stage 14 along the X guide 13 and moving the substrate 1 in the X direction by using two linear motors arranged symmetrically in the lateral direction. The load applied to the guide 13 can be reduced, the overall height of the apparatus can be suppressed, and the substrate 1 can be moved in the X direction at high speed and with high accuracy.

  Further, according to the embodiment described above, the stage base 11 is divided into a plurality of parts, and each linear moving the X stage 14 while allowing the movable element 32 of each linear motor moving the X stage 14 to move up and down. Even if the height of the stator 31 of each linear motor that moves the X stage 14 fluctuates by suppressing the fluctuation of the gap between the stator 31 and the mover 32 of the motor, each linear that moves the X stage 14. It is possible to reduce the load applied to the mounting portion of the motor mover 32. In addition, the gain adjustment range of each linear motor that moves the X stage 14 can be widened to improve the positioning performance of the substrate 1 in the X direction.

  Further, according to the embodiment described above, the plurality of stator mounting bases 33 are mounted on the stage base 11, the mover mounting base 34 is mounted on the lower surface of the X stage 14, and the plurality of roller holders 35 are mounted on the mover. Attached to the base 34, the rollers 36 are attached to the respective roller holders 35. The respective rollers 36 are urged toward the respective stator attachment bases 33 by the respective roller holders 35, so that the respective rollers 36 are respectively attached to the respective stator attachment bases. By moving the X stage 14 in a simple configuration using the roller holder 35 and the roller 36 while allowing the mover 32 of each linear motor that moves the X stage 14 to move up and down, Variations in the gap between the stator 31 and the mover 32 of the linear motor can be suppressed.

  In the embodiment described above, two linear motors are used as the first moving means for moving the X stage 14, but the present invention is not limited to this, and a stator and a mover of each linear motor. And the even number of linear motors may be arranged symmetrically. Similarly, in the above-described embodiment, two linear motors are used as the second moving means for moving the Y stage 16, but the present invention is not limited to this, and the stator and the movable part of each linear motor are movable. The even number of linear motors may be arranged symmetrically with the child facing in the lateral direction.

  The substrate is exposed using the proximity exposure apparatus of the present invention, or the substrate is positioned by using the substrate moving method of the proximity exposure apparatus of the present invention, and the substrate is exposed, thereby moving the substrate at high speed. In addition, since it can be performed with high accuracy, pattern printing can be performed with high accuracy at short intervals, and a high-quality substrate can be manufactured with high throughput.

  For example, FIG. 7 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device. In the thin film formation step (step 101), a thin film such as a conductor film or an insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on the substrate by sputtering, plasma chemical vapor deposition (CVD), or the like. In the resist coating process (step 102), a photosensitive resin material (photoresist) is applied by a roll coating method or the like to form a photoresist film on the thin film formed in the thin film forming process (step 101). In the exposure step (step 103), the mask pattern is transferred to the photoresist film using a proximity exposure apparatus, a projection exposure apparatus, or the like. In the development step (step 104), a developer is supplied onto the photoresist film by a shower development method or the like to remove unnecessary portions of the photoresist film. In the etching process (step 105), a portion of the thin film formed in the thin film formation process (step 101) that is not masked by the photoresist film is removed by wet etching. In the stripping step (step 106), the photoresist film that has finished the role of the mask in the etching step (step 105) is stripped with a stripping solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the substrate.

  FIG. 8 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device. In the black matrix forming step (step 201), a black matrix is formed on the substrate by processing such as resist coating, exposure, development, etching, and peeling. In the colored pattern forming step (step 202), a colored pattern is formed on the substrate by a dyeing method, a pigment dispersion method, a printing method, an electrodeposition method, or the like. This process is repeated for the R, G, and B coloring patterns. In the protective film forming step (step 203), a protective film is formed on the colored pattern, and in the transparent electrode film forming step (step 204), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  In the TFT substrate manufacturing process shown in FIG. 7, in the exposure process (step 103), in the color filter substrate manufacturing process shown in FIG. 8, in the black matrix forming process (step 201) and the colored pattern forming process (step 202). In this exposure process, the proximity exposure apparatus or the substrate moving method of the proximity exposure apparatus of the present invention can be applied.

1 is a top view of a proximity exposure apparatus according to an embodiment of the present invention. FIG. 1 is a side view of a proximity exposure apparatus according to an embodiment of the present invention. 1 is a front view of a proximity exposure apparatus according to an embodiment of the present invention. It is the figure which expanded a part of FIG. It is a figure which shows the state which looked at the stator attachment base and mover attachment base of FIG. 4 from the bottom. It is a top view which shows the state which removed the part above Y stage from the proximity exposure apparatus by one Embodiment of this invention. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of a liquid crystal display device. It is a flowchart which shows an example of the manufacturing process of the color filter board | substrate of a liquid crystal display device. It is a figure which shows an example of the proximity exposure apparatus using a linear motor. It is a figure which shows the other example of the proximity exposure apparatus using a linear motor. It is a figure which shows the further another example of the proximity exposure apparatus using a linear motor.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate 2 Mask 10 Chuck 11 Stage base 11a, 11b Base 13 X guide 14 X stage 15 Y guide 16 Y stage 17 θ stage 19 Chuck support 20 Mask holder 31, 41 Stator 32, 42 Movable element 33, 43 Stator Mounting bases 34, 44 Mover mounting base 35 Roller holder 36 Roller 45 units

Claims (6)

A chuck for holding a substrate;
A mask holder for holding a photomask;
A stage base disposed below the mask holder;
A first guide provided on the stage base and extending in the X direction (or Y direction);
A first stage that moves along the first guide, a second guide that extends in the Y direction (or X direction) provided on the first stage, and moves along the second guide A moving stage having a second stage and mounting the chuck to move the substrate;
First moving means for moving the first stage;
Second moving means for moving the second stage,
The second moving means has an even number of linear motors composed of a plate-like stator with a built-in magnet and a plate-like mover with a built-in coil, and the mover of each linear motor includes the second mover. The stator of each linear motor is attached to the side surface of the stage extending in the Y direction (or X direction), and the stator of each linear motor faces the mover of the linear motor on the first stage and extends in the Y direction (or X direction). A proximity exposure apparatus in which an even number of linear motors are arranged symmetrically with the stator and the mover facing in the lateral direction. The stage base has a groove extending in the X direction (or Y direction),
The first moving means has an even number of linear motors composed of a plate-like stator with a built-in magnet and a plate-like mover with a built-in coil, and the stator of each linear motor has the stage base The linear motor mover is attached to the first stage so as to face the stator of the linear motor, and is evenly mounted. The proximity exposure apparatus according to claim 1, wherein the linear motor is arranged symmetrically with the stator and the movable element facing each other in the lateral direction. Place the stage base below the mask holder that holds the photomask,
A first guide extending in the X direction (or Y direction) is provided on the stage base,
A first stage moving in the X direction (or Y direction), a second guide provided on the first stage extending in the Y direction (or X direction), and a second stage moving in the Y direction (or X direction) A chuck is mounted on a moving stage having two stages, the substrate is held by the chuck,
A plate-like stator with a built-in coil of even number of linear motors attached to the side surface of the second stage extending in the Y direction (or X direction), and a plate-like stator with built-in magnets of even number of linear motors Are attached to the first stage so as to face the mover of the linear motor and extend in the Y direction (or X direction), and the stator and the mover are arranged symmetrically in the lateral direction. And moving the second stage along the second guide using the linear motor to move the substrate in the Y direction (or X direction). . A groove extending in the X direction (or Y direction) is provided on the stage base,
A plate-like stator with an even number of linear motor magnets built in the X direction (or Y direction) in a standing state in a groove in the stage base, and a plate with an even number of linear motor coils built in A linear mover is attached to the first stage so as to face the stator of the linear motor, and an even number of linear motors in which the stator and the mover are arranged symmetrically in the lateral direction are used. 4. The method of moving a substrate of a proximity exposure apparatus according to claim 3, wherein the substrate is moved in the X direction (or Y direction) by moving the first stage along the first guide. .   A method for manufacturing a display panel substrate, comprising: exposing a substrate using the proximity exposure apparatus according to claim 1.   A method for manufacturing a display panel substrate, wherein the substrate is positioned by using the substrate moving method of the proximity exposure apparatus according to claim 3 or 4, and the substrate is exposed.

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