JP2008524634A - レーザアトムプローブ - Google Patents

レーザアトムプローブ Download PDF

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Publication number
JP2008524634A
JP2008524634A JP2007548543A JP2007548543A JP2008524634A JP 2008524634 A JP2008524634 A JP 2008524634A JP 2007548543 A JP2007548543 A JP 2007548543A JP 2007548543 A JP2007548543 A JP 2007548543A JP 2008524634 A JP2008524634 A JP 2008524634A
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JP
Japan
Prior art keywords
sample
laser beam
detector
aperture
atom probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007548543A
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English (en)
Japanese (ja)
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JP2008524634A5 (https=
Inventor
ジョセフ ヘイル バントン
トーマス エフ ケリー
ダニエル アール レンツ
スコット アルバート ウィーナー
Original Assignee
イマゴ サイエンティフィック インストルメンツ コーポレーション
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by イマゴ サイエンティフィック インストルメンツ コーポレーション filed Critical イマゴ サイエンティフィック インストルメンツ コーポレーション
Publication of JP2008524634A publication Critical patent/JP2008524634A/ja
Publication of JP2008524634A5 publication Critical patent/JP2008524634A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • H01J49/164—Laser desorption/ionisation, e.g. matrix-assisted laser desorption/ionisation [MALDI]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/285—Emission microscopes, e.g. field-emission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0004—Imaging particle spectrometry
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2812—Emission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2007548543A 2004-12-21 2005-12-20 レーザアトムプローブ Pending JP2008524634A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63791204P 2004-12-21 2004-12-21
PCT/US2005/046842 WO2006101558A2 (en) 2004-12-21 2005-12-20 Laser atom probes

Publications (2)

Publication Number Publication Date
JP2008524634A true JP2008524634A (ja) 2008-07-10
JP2008524634A5 JP2008524634A5 (https=) 2010-09-02

Family

ID=37024264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007548543A Pending JP2008524634A (ja) 2004-12-21 2005-12-20 レーザアトムプローブ

Country Status (6)

Country Link
US (1) US20100294928A1 (https=)
EP (1) EP1842221A4 (https=)
JP (1) JP2008524634A (https=)
KR (1) KR20070086445A (https=)
CN (1) CN101088137B (https=)
WO (1) WO2006101558A2 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006260780A (ja) * 2005-03-15 2006-09-28 Japan Atomic Energy Agency 超短パルスレーザー集光と高電圧印加の併用による針状サンプル表層のイオン化方法、及びこれを使用した針状サンプル表層の分析方法
JP2007225470A (ja) * 2006-02-24 2007-09-06 Fujitsu Ltd ３次元微細領域元素分析方法
JP2014053192A (ja) * 2012-09-07 2014-03-20 Toshiba Corp アトムプローブ測定装置およびアトムプローブ測定方法
JP2020514942A (ja) * 2018-01-31 2020-05-21 カメカ インストゥルメンツ，インコーポレイテッド 複数の角度からの原子プローブ試料へのエネルギービーム入力

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070038089A (ko) * 2004-06-03 2007-04-09 이메이고 사이언티픽 인스트루먼츠 코포레이션 레이저 원자 탐침 방법
WO2008109875A1 (en) * 2007-03-08 2008-09-12 Imago Scientific Instruments Corporation Pulsed laser atom probe and associated methods
FR2932319B1 (fr) * 2008-06-10 2016-10-21 Cameca Dispositif generateur d'impulsions laser a large bande spectrale notamment pour sonde atomique tomographique.
FR2938963B1 (fr) * 2008-11-21 2010-11-12 Cameca Sonde atomique tomographique comportant un generateur electro-optique d'impulsions electriques haute tension.
US8279418B2 (en) 2010-03-17 2012-10-02 Microsoft Corporation Raster scanning for depth detection
JP2012073242A (ja) * 2010-09-23 2012-04-12 Imec レーザーアトムプローブおよびレーザーアトムプローブ分析方法
US20120117696A1 (en) * 2010-11-09 2012-05-10 International Business Machines Corporation Integrated metallic microtip coupon structure for atom probe tomographic analysis
US9111736B2 (en) * 2011-03-11 2015-08-18 Shimadzu Corporation Mass spectrometer
DE102011119164B4 (de) * 2011-11-23 2021-01-21 Westfälische Wilhelms-Universität Münster Verfahren und Vorrichung zur Durchführung der Präparation wenigstens einer Probe für die Atomsonden-Tomographie
US20150041652A1 (en) * 2013-08-12 2015-02-12 Kabushiki Kaisha Toshiba Material inspection apparatus
US9287104B2 (en) * 2013-08-14 2016-03-15 Kabushiki Kaisha Toshiba Material inspection apparatus and material inspection method
US10121636B2 (en) 2014-07-01 2018-11-06 Atomnaut Inc. Systems and methods for using multimodal imaging to determine structure and atomic composition of specimens
CN105710368B (zh) * 2016-03-03 2018-11-23 西安铂力特增材技术股份有限公司 用于逐层制造三维物体的扫描路径规划方法及扫描方法
CN108109895B (zh) * 2016-11-24 2019-10-25 台湾积体电路制造股份有限公司 针状试片、其制备方法以及其分析方法
CN108490632B (zh) 2018-03-12 2020-01-10 Oppo广东移动通信有限公司 激光投射模组、深度相机和电子装置
CA3090811A1 (en) * 2018-03-14 2019-09-19 Biomerieux, Inc. Methods for aligning a light source of an instrument, and related instruments
US11087956B2 (en) * 2018-06-29 2021-08-10 Taiwan Semiconductor Manufacturing Co., Ltd. Detection systems in semiconductor metrology tools
CN109900929B (zh) * 2019-03-18 2021-09-03 南京理工大学 基于matlab的fib制备三维原子探针样品过程的模拟方法
CN111751576B (zh) * 2019-03-27 2023-07-11 台湾积体电路制造股份有限公司 原子探针分析方法、装置及记录媒体
CN113063967B (zh) * 2021-02-18 2023-02-10 上海大学 可实现三维原子探针微尖阵列样品转动的旋转样品台装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061850A (en) * 1990-07-30 1991-10-29 Wisconsin Alumni Research Foundation High-repetition rate position sensitive atom probe
WO2002093615A1 (fr) * 2001-03-26 2002-11-21 Kanazawa Institute Of Technology Sonde atomique a balayage et procede d'analyse utilisant cette sonde atomique a balayage

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US658069A (en) * 1899-10-17 1900-09-18 Frederick H Lewis Method of feeding pulverized fuel.
US4956650A (en) * 1988-08-26 1990-09-11 Ateq Corporation Pattern generation system
US5394741A (en) * 1990-07-11 1995-03-07 Olympus Optical Co., Ltd. Atomic probe microscope
US5440124A (en) * 1994-07-08 1995-08-08 Wisconsin Alumni Research Foundation High mass resolution local-electrode atom probe
US6002127A (en) * 1995-05-19 1999-12-14 Perseptive Biosystems, Inc. Time-of-flight mass spectrometry analysis of biomolecules
GB9719697D0 (en) * 1997-09-16 1997-11-19 Isis Innovation Atom probe
US6970644B2 (en) * 2000-12-21 2005-11-29 Mattson Technology, Inc. Heating configuration for use in thermal processing chambers
JP3902925B2 (ja) * 2001-07-31 2007-04-11 エスアイアイ・ナノテクノロジー株式会社 走査型アトムプローブ
EP1735812A4 (en) * 2004-03-24 2010-06-02 Imago Scient Instr Corp LASER ATOM PROBE
KR20070038089A (ko) * 2004-06-03 2007-04-09 이메이고 사이언티픽 인스트루먼츠 코포레이션 레이저 원자 탐침 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061850A (en) * 1990-07-30 1991-10-29 Wisconsin Alumni Research Foundation High-repetition rate position sensitive atom probe
WO2002093615A1 (fr) * 2001-03-26 2002-11-21 Kanazawa Institute Of Technology Sonde atomique a balayage et procede d'analyse utilisant cette sonde atomique a balayage

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006260780A (ja) * 2005-03-15 2006-09-28 Japan Atomic Energy Agency 超短パルスレーザー集光と高電圧印加の併用による針状サンプル表層のイオン化方法、及びこれを使用した針状サンプル表層の分析方法
JP2007225470A (ja) * 2006-02-24 2007-09-06 Fujitsu Ltd ３次元微細領域元素分析方法
JP2014053192A (ja) * 2012-09-07 2014-03-20 Toshiba Corp アトムプローブ測定装置およびアトムプローブ測定方法
JP2020514942A (ja) * 2018-01-31 2020-05-21 カメカ インストゥルメンツ，インコーポレイテッド 複数の角度からの原子プローブ試料へのエネルギービーム入力

Also Published As

Publication number Publication date
EP1842221A2 (en) 2007-10-10
WO2006101558A2 (en) 2006-09-28
EP1842221A4 (en) 2010-11-24
CN101088137A (zh) 2007-12-12
KR20070086445A (ko) 2007-08-27
US20100294928A1 (en) 2010-11-25
CN101088137B (zh) 2010-05-12
WO2006101558A3 (en) 2007-05-03

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