JP2008518759A5 - - Google Patents

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Publication number
JP2008518759A5
JP2008518759A5 JP2007539335A JP2007539335A JP2008518759A5 JP 2008518759 A5 JP2008518759 A5 JP 2008518759A5 JP 2007539335 A JP2007539335 A JP 2007539335A JP 2007539335 A JP2007539335 A JP 2007539335A JP 2008518759 A5 JP2008518759 A5 JP 2008518759A5
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JP
Japan
Prior art keywords
photocatalytic
field emission
anode
cleaner
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007539335A
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English (en)
Japanese (ja)
Other versions
JP5064228B2 (ja
JP2008518759A (ja
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Publication date
Priority claimed from US11/263,638 external-priority patent/US7300634B2/en
Application filed filed Critical
Publication of JP2008518759A publication Critical patent/JP2008518759A/ja
Publication of JP2008518759A5 publication Critical patent/JP2008518759A5/ja
Application granted granted Critical
Publication of JP5064228B2 publication Critical patent/JP5064228B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007539335A 2004-11-03 2005-11-03 光触媒プロセス Expired - Fee Related JP5064228B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US62472404P 2004-11-03 2004-11-03
US60/624,724 2004-11-03
US11/263,638 2005-10-31
US11/263,638 US7300634B2 (en) 2004-11-03 2005-10-31 Photocatalytic process
PCT/US2005/039733 WO2006060103A2 (en) 2004-11-03 2005-11-03 Photocatalytic process

Publications (3)

Publication Number Publication Date
JP2008518759A JP2008518759A (ja) 2008-06-05
JP2008518759A5 true JP2008518759A5 (enrdf_load_stackoverflow) 2012-07-05
JP5064228B2 JP5064228B2 (ja) 2012-10-31

Family

ID=36260538

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007539335A Expired - Fee Related JP5064228B2 (ja) 2004-11-03 2005-11-03 光触媒プロセス

Country Status (5)

Country Link
US (1) US7300634B2 (enrdf_load_stackoverflow)
JP (1) JP5064228B2 (enrdf_load_stackoverflow)
CN (1) CN101048228B (enrdf_load_stackoverflow)
TW (1) TWI344384B (enrdf_load_stackoverflow)
WO (1) WO2006060103A2 (enrdf_load_stackoverflow)

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CA2573428C (en) 2004-07-12 2008-04-01 Cardinal Cg Company Low-maintenance coatings
JP2006082287A (ja) * 2004-09-14 2006-03-30 Fuji Xerox Co Ltd インクジェット記録装置
US20100189223A1 (en) * 2006-02-16 2010-07-29 Steller Micro Devices Digitally addressed flat panel x-ray sources
US20100189222A1 (en) * 2006-02-16 2010-07-29 Steller Micro Devices Panoramic irradiation system using flat panel x-ray sources
US9324535B2 (en) * 2006-02-16 2016-04-26 Stellarray, Incorporaated Self contained irradiation system using flat panel X-ray sources
US20070189459A1 (en) * 2006-02-16 2007-08-16 Stellar Micro Devices, Inc. Compact radiation source
CN100561657C (zh) * 2006-03-31 2009-11-18 清华大学 场发射灯管及其制造方法
US7862910B2 (en) * 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US7824626B2 (en) 2007-09-27 2010-11-02 Applied Nanotech Holdings, Inc. Air handler and purifier
US8440467B2 (en) * 2007-09-28 2013-05-14 William Marsh Rice University Electronic switching, memory, and sensor devices from a discontinuous graphene and/or graphite carbon layer on dielectric materials
CN101465254B (zh) * 2007-12-19 2010-12-08 北京富纳特创新科技有限公司 热发射电子源及其制备方法
CN101556888B (zh) * 2008-04-11 2011-01-05 鸿富锦精密工业(深圳)有限公司 热发射电子源的制备方法
CA2773264A1 (en) * 2009-09-07 2011-03-10 Shingo Ono Vacuum ultraviolet light emitting device
US9242019B2 (en) 2014-03-13 2016-01-26 Stellarray, Incorporated UV pipe
GB201516253D0 (en) * 2015-09-14 2015-10-28 Univ Montfort Rotating contactor reactor
GB2537196B (en) * 2015-10-02 2017-05-10 Mario Michan Juan Apparatus and method for electron irradiation scrubbing
CN106348384A (zh) * 2016-10-18 2017-01-25 兰州交通大学 一种光催化反应装置
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
EP3658030A4 (en) * 2017-07-26 2021-06-30 Shenzhen Xpectvision Technology Co., Ltd. INTEGRATED X-RAY SOURCE
DE102020113351A1 (de) * 2020-05-18 2021-11-18 Dbt Gmbh Elektronenemitterstruktur, Äußerer-Photoeffekt-Emitter, Partikelsammelvorrichtung Tunnel- Flächenemitter halbleiterbasierter Direktemitter, und Flüssigkeitsionisator mit derselben, Verfahren zum Erzeugen von freien Elektronen und Verfahren zum Sammeln von Partikeln
CN114917737A (zh) * 2022-05-18 2022-08-19 中国科学院大学 一种用于二噁英处理的低温等离子体装置
CN119972041A (zh) * 2025-04-14 2025-05-13 河南师范大学 一种TiO2/碳毡光热-催化材料、制备方法及其应用的光热界面蒸发净化装置

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US5600200A (en) * 1992-03-16 1997-02-04 Microelectronics And Computer Technology Corporation Wire-mesh cathode
JPH09253637A (ja) * 1996-03-21 1997-09-30 Matsushita Electric Ind Co Ltd 流体処理装置
CA2384708A1 (en) * 1999-09-09 2001-03-22 Shuji Hamano Catalyst with discharge electrode or carrier
JP3440896B2 (ja) * 1999-09-14 2003-08-25 ダイキン工業株式会社 空気清浄装置
CN1112719C (zh) * 1999-10-12 2003-06-25 葛世潮 场发射等离子体放电发光装置及显示器
US20020070648A1 (en) * 2000-12-08 2002-06-13 Gunnar Forsberg Field emitting cathode and a light source using a field emitting cathode
JP4034083B2 (ja) * 2002-02-18 2008-01-16 有限会社水野建築設計事務所 集合住宅
JP4723786B2 (ja) * 2002-05-23 2011-07-13 株式会社日鮮 生鮮物保存庫内の空気浄化装置
JP2005261988A (ja) 2002-09-20 2005-09-29 Andes Denki Kk 光触媒材料とその製造方法

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