JP2008515230A5 - - Google Patents

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Publication number
JP2008515230A5
JP2008515230A5 JP2007534654A JP2007534654A JP2008515230A5 JP 2008515230 A5 JP2008515230 A5 JP 2008515230A5 JP 2007534654 A JP2007534654 A JP 2007534654A JP 2007534654 A JP2007534654 A JP 2007534654A JP 2008515230 A5 JP2008515230 A5 JP 2008515230A5
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JP
Japan
Prior art keywords
beam parameter
slow transition
signal
parameter adjustment
burst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007534654A
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English (en)
Japanese (ja)
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JP2008515230A (ja
JP5264173B2 (ja
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Publication date
Priority claimed from US10/953,249 external-priority patent/US7116695B2/en
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Publication of JP2008515230A publication Critical patent/JP2008515230A/ja
Publication of JP2008515230A5 publication Critical patent/JP2008515230A5/ja
Application granted granted Critical
Publication of JP5264173B2 publication Critical patent/JP5264173B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007534654A 2004-09-28 2005-09-19 レーザ出力光パルスビームパラメータ遷移補正システム Active JP5264173B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/953,249 US7116695B2 (en) 2004-09-28 2004-09-28 Laser output light pulse beam parameter transient correction system
US10/953,249 2004-09-28
PCT/US2005/033753 WO2006036675A1 (fr) 2004-09-28 2005-09-19 Systeme de correction de transitoires de parametre de faisceau d'impulsions lumineuses d'emission laser

Publications (3)

Publication Number Publication Date
JP2008515230A JP2008515230A (ja) 2008-05-08
JP2008515230A5 true JP2008515230A5 (fr) 2008-11-06
JP5264173B2 JP5264173B2 (ja) 2013-08-14

Family

ID=36119225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007534654A Active JP5264173B2 (ja) 2004-09-28 2005-09-19 レーザ出力光パルスビームパラメータ遷移補正システム

Country Status (3)

Country Link
US (1) US7116695B2 (fr)
JP (1) JP5264173B2 (fr)
WO (1) WO2006036675A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IES20020709A2 (en) * 2002-09-02 2004-03-10 Intune Technologies Ltd Method for optimising non-linear laser control effects
US7525638B2 (en) * 2005-03-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20120008653A1 (en) * 2010-07-09 2012-01-12 Ipg Photonics Corporation Laser System with Dynamically Stabilized Transient Wavelength and Method of Operating Same
JP5755068B2 (ja) * 2011-07-27 2015-07-29 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
JP5832581B2 (ja) * 2014-04-28 2015-12-16 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
US10833471B2 (en) 2017-11-17 2020-11-10 Cymer, Llc Lithography system bandwidth control
US11803126B2 (en) * 2019-07-23 2023-10-31 Cymer, Llc Method of compensating wavelength error induced by repetition rate deviation
WO2022157897A1 (fr) * 2021-01-21 2022-07-28 ギガフォトン株式会社 Procédé de commande de système laser, système laser et procédé de fabrication de dispositif électronique
WO2022201467A1 (fr) * 2021-03-25 2022-09-29 ギガフォトン株式会社 Dispositif laser à gaz et procédé de fabrication de dispositif électronique
CN117426030A (zh) * 2021-07-29 2024-01-19 极光先进雷射株式会社 放电激励型激光装置的控制方法、放电激励型激光装置和电子器件的制造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3413510B2 (ja) * 1995-09-27 2003-06-03 株式会社小松製作所 レーザ装置
US5982800A (en) * 1997-04-23 1999-11-09 Cymer, Inc. Narrow band excimer laser
US6192064B1 (en) * 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US6621846B1 (en) * 1997-07-22 2003-09-16 Cymer, Inc. Electric discharge laser with active wavelength chirp correction
US6529531B1 (en) * 1997-07-22 2003-03-04 Cymer, Inc. Fast wavelength correction technique for a laser
US6317447B1 (en) * 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
US6078599A (en) * 1997-07-22 2000-06-20 Cymer, Inc. Wavelength shift correction technique for a laser
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6034978A (en) * 1999-05-12 2000-03-07 Cymer, Inc. Gas discharge laser with gas temperature control
US6532247B2 (en) * 2000-02-09 2003-03-11 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
US6650666B2 (en) * 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver
JP4877692B2 (ja) * 2001-03-21 2012-02-15 株式会社小松製作所 注入同期式又はｍｏｐａ方式のレーザ装置
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6735225B2 (en) * 2001-06-07 2004-05-11 Lambda Physik Ag Chirp compensation method and apparatus
JP3839736B2 (ja) * 2002-02-25 2006-11-01 株式会社小松製作所 半導体露光光源用狭帯域エキシマレーザ装置
KR100545294B1 (ko) * 2002-05-10 2006-01-24 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 디바이스 제조방법, 성능측정방법,캘리브레이션 방법 및 컴퓨터 프로그램
JP3771876B2 (ja) * 2002-07-03 2006-04-26 日本電信電話株式会社 マルチキャリア光源

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