JP2008514545A5 - - Google Patents
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- JP2008514545A5 JP2008514545A5 JP2007534868A JP2007534868A JP2008514545A5 JP 2008514545 A5 JP2008514545 A5 JP 2008514545A5 JP 2007534868 A JP2007534868 A JP 2007534868A JP 2007534868 A JP2007534868 A JP 2007534868A JP 2008514545 A5 JP2008514545 A5 JP 2008514545A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- precursor
- copper
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002887 superconductor Substances 0.000 claims description 76
- 239000000758 substrate Substances 0.000 claims description 67
- 238000004519 manufacturing process Methods 0.000 claims description 24
- 239000010408 film Substances 0.000 description 204
- OZAIFHULBGXAKX-UHFFFAOYSA-N precursor Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 198
- 239000010410 layer Substances 0.000 description 178
- 239000010949 copper Substances 0.000 description 160
- 239000000243 solution Substances 0.000 description 155
- 229910052802 copper Inorganic materials 0.000 description 98
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 94
- 229910052751 metal Inorganic materials 0.000 description 79
- 239000002184 metal Substances 0.000 description 79
- 229910021521 yttrium barium copper oxide Inorganic materials 0.000 description 75
- 239000000543 intermediate Substances 0.000 description 60
- 229910052788 barium Inorganic materials 0.000 description 52
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium(0) Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 48
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 47
- 229910052723 transition metal Inorganic materials 0.000 description 47
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 46
- 230000036961 partial Effects 0.000 description 44
- 150000003624 transition metals Chemical class 0.000 description 40
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 38
- 238000000034 method Methods 0.000 description 38
- 229910052760 oxygen Inorganic materials 0.000 description 38
- 239000001301 oxygen Substances 0.000 description 38
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 38
- 150000001342 alkaline earth metals Chemical class 0.000 description 32
- XBDQKXXYIPTUBI-UHFFFAOYSA-N propionic acid Chemical compound CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 30
- 239000000463 material Substances 0.000 description 28
- 235000002639 sodium chloride Nutrition 0.000 description 28
- 239000011780 sodium chloride Substances 0.000 description 28
- -1 Y123 Chemical class 0.000 description 27
- 238000010438 heat treatment Methods 0.000 description 25
- 239000000203 mixture Substances 0.000 description 25
- 239000000956 alloy Substances 0.000 description 23
- 239000007789 gas Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 22
- 238000005755 formation reaction Methods 0.000 description 22
- 229910045601 alloy Inorganic materials 0.000 description 21
- 229910052759 nickel Inorganic materials 0.000 description 21
- 239000000523 sample Substances 0.000 description 21
- 239000002904 solvent Substances 0.000 description 19
- BQCADISMDOOEFD-UHFFFAOYSA-N silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 17
- 229910052709 silver Inorganic materials 0.000 description 17
- 239000004332 silver Substances 0.000 description 17
- 229910052727 yttrium Inorganic materials 0.000 description 17
- 229910052761 rare earth metal Inorganic materials 0.000 description 16
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 229910052804 chromium Inorganic materials 0.000 description 13
- 239000011651 chromium Substances 0.000 description 13
- 150000003839 salts Chemical class 0.000 description 13
- 229910000314 transition metal oxide Inorganic materials 0.000 description 12
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 12
- 239000000654 additive Substances 0.000 description 11
- 230000000996 additive Effects 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 11
- VYZAMTAEIAYCRO-UHFFFAOYSA-N chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 11
- 230000001965 increased Effects 0.000 description 11
- 150000002739 metals Chemical class 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 11
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 235000019260 propionic acid Nutrition 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 239000002105 nanoparticle Substances 0.000 description 9
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 8
- 230000002950 deficient Effects 0.000 description 8
- 229910044991 metal oxide Inorganic materials 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- 239000011593 sulfur Substances 0.000 description 8
- 229910020203 CeO Inorganic materials 0.000 description 7
- 229910052684 Cerium Inorganic materials 0.000 description 7
- 239000011737 fluorine Substances 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- OYLGJCQECKOTOL-UHFFFAOYSA-L Barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 6
- 102000014961 Protein Precursors Human genes 0.000 description 6
- 108010078762 Protein Precursors Proteins 0.000 description 6
- 229910001632 barium fluoride Inorganic materials 0.000 description 6
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- 230000004907 flux Effects 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 229910052763 palladium Inorganic materials 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 239000010937 tungsten Substances 0.000 description 6
- 229910052720 vanadium Inorganic materials 0.000 description 6
- 229910052726 zirconium Inorganic materials 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 238000007735 ion beam assisted deposition Methods 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 5
- 229910052750 molybdenum Inorganic materials 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 5
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium(0) Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 5
- OFJATJUUUCAKMK-UHFFFAOYSA-N Cerium(IV) oxide Chemical compound [O-2]=[Ce+4]=[O-2] OFJATJUUUCAKMK-UHFFFAOYSA-N 0.000 description 4
- 229910052692 Dysprosium Inorganic materials 0.000 description 4
- 150000004703 alkoxides Chemical class 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910000420 cerium oxide Inorganic materials 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000007607 die coating method Methods 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 150000002910 rare earth metals Chemical class 0.000 description 4
- 230000002829 reduced Effects 0.000 description 4
- 230000001603 reducing Effects 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 239000005751 Copper oxide Substances 0.000 description 3
- 229910052691 Erbium Inorganic materials 0.000 description 3
- 229910052693 Europium Inorganic materials 0.000 description 3
- 229910052688 Gadolinium Inorganic materials 0.000 description 3
- 229910052689 Holmium Inorganic materials 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- 229910052772 Samarium Inorganic materials 0.000 description 3
- 229910052771 Terbium Inorganic materials 0.000 description 3
- 229910052775 Thulium Inorganic materials 0.000 description 3
- 229910052769 Ytterbium Inorganic materials 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 150000001879 copper Chemical class 0.000 description 3
- 229910000431 copper oxide Inorganic materials 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 3
- 230000002708 enhancing Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- 150000002736 metal compounds Chemical group 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 230000001105 regulatory Effects 0.000 description 3
- 239000012266 salt solution Substances 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 229910016036 BaF 2 Inorganic materials 0.000 description 2
- 241000954177 Bangana ariza Species 0.000 description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N Gadolinium Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N Neodymium Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910000943 NiAl Inorganic materials 0.000 description 2
- 239000005092 Ruthenium Substances 0.000 description 2
- VEALVRVVWBQVSL-UHFFFAOYSA-N Strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- YCHAVMRDEZYILG-UHFFFAOYSA-N [O--].[O--].[O--].[Nd+3].[Gd+3] Chemical compound [O--].[O--].[O--].[Nd+3].[Gd+3] YCHAVMRDEZYILG-UHFFFAOYSA-N 0.000 description 2
- DRSUUOIDIPGYDG-UHFFFAOYSA-N [O-2].[La+3].[Mg+2] Chemical compound [O-2].[La+3].[Mg+2] DRSUUOIDIPGYDG-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000003466 anti-cipated Effects 0.000 description 2
- 125000004429 atoms Chemical group 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000003247 decreasing Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910001512 metal fluoride Inorganic materials 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N n-butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 230000001590 oxidative Effects 0.000 description 2
- KJXBRHIPHIVJCS-UHFFFAOYSA-N oxo(oxoalumanyloxy)lanthanum Chemical compound O=[Al]O[La]=O KJXBRHIPHIVJCS-UHFFFAOYSA-N 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 230000000087 stabilizing Effects 0.000 description 2
- 230000003068 static Effects 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- 241001289141 Babr Species 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L Barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 210000004940 Nucleus Anatomy 0.000 description 1
- WROMPOXWARCANT-UHFFFAOYSA-N TFA trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.OC(=O)C(F)(F)F WROMPOXWARCANT-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N Tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 1
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 230000003064 anti-oxidating Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 230000003078 antioxidant Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 229910001422 barium ion Inorganic materials 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052803 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 230000002860 competitive Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- LZJJVTQGPPWQFS-UHFFFAOYSA-L copper;propanoate Chemical compound [Cu+2].CCC([O-])=O.CCC([O-])=O LZJJVTQGPPWQFS-UHFFFAOYSA-L 0.000 description 1
- 230000001809 detectable Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229940079593 drugs Drugs 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N iso-propanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 235000015110 jellies Nutrition 0.000 description 1
- 239000008274 jelly Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000001737 promoting Effects 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 229910002059 quaternary alloy Inorganic materials 0.000 description 1
- 150000002909 rare earth metal compounds Chemical class 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 231100000488 structural defect Toxicity 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 230000001360 synchronised Effects 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient Effects 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 238000004642 transportation engineering Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 150000003746 yttrium Chemical class 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61528904P | 2004-10-01 | 2004-10-01 | |
| US60/615,289 | 2004-10-01 | ||
| US70383605P | 2005-07-29 | 2005-07-29 | |
| US60/703,836 | 2005-07-29 | ||
| PCT/US2005/035521 WO2006137898A2 (en) | 2004-10-01 | 2005-09-30 | Thick superconductor films with improved performance |
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| JP2008514545A JP2008514545A (ja) | 2008-05-08 |
| JP2008514545A5 true JP2008514545A5 (ko) | 2013-08-22 |
| JP5415696B2 JP5415696B2 (ja) | 2014-02-12 |
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| KR (1) | KR100910601B1 (ko) |
| CN (1) | CN101258618B (ko) |
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| JP5562615B2 (ja) * | 2009-11-24 | 2014-07-30 | 公益財団法人国際超電導産業技術研究センター | 希土類系酸化物超電導線材の製造方法 |
| JP5445982B2 (ja) * | 2009-12-09 | 2014-03-19 | 独立行政法人産業技術総合研究所 | 希土類超電導膜形成用溶液およびその製造方法 |
| JP5273561B2 (ja) * | 2009-12-09 | 2013-08-28 | 独立行政法人産業技術総合研究所 | 超電導膜の製造方法 |
| CN102568694A (zh) * | 2010-12-23 | 2012-07-11 | 吴仕驹 | 高温超导体及其制备方法 |
| CN102255041B (zh) * | 2011-07-13 | 2013-07-03 | 中国科学院电工研究所 | 一种ybco超导薄膜的制备方法 |
| CN102584204A (zh) * | 2012-02-12 | 2012-07-18 | 中国科学院电工研究所 | 一种ybco超导复合薄膜的制备方法 |
| KR20160006829A (ko) | 2014-07-09 | 2016-01-20 | 서울대학교산학협력단 | 초전도체, 초전도 선재, 및 초전도체 형성방법 |
| WO2017035290A1 (en) * | 2015-08-26 | 2017-03-02 | American Superconductor Corporation | Long length high temperature superconducting wires with uniform ion implanted pinning microstructures |
| KR101719266B1 (ko) * | 2016-06-27 | 2017-04-06 | 서울대학교산학협력단 | 초전도체, 초전도 선재, 및 초전도체 형성방법 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH01160857A (ja) * | 1987-12-18 | 1989-06-23 | Mitsui Mining & Smelting Co Ltd | 超伝導セラミックスおよびその製造法 |
| JPH01219019A (ja) * | 1988-02-29 | 1989-09-01 | Nec Corp | 酸化物超伝導体膜の製造方法 |
| US5231074A (en) * | 1990-04-17 | 1993-07-27 | Massachusetts Institute Of Technology | Preparation of highly textured oxide superconducting films from mod precursor solutions |
| AU751092B2 (en) * | 1997-06-18 | 2002-08-08 | Massachusetts Institute Of Technology | Controlled conversion of metal oxyfluorides into superconducting oxides |
| JP4041672B2 (ja) * | 1999-07-23 | 2008-01-30 | アメリカン スーパーコンダクター コーポレイション | 接合高温超伝導性被覆テープ |
| CN1364322A (zh) * | 1999-07-23 | 2002-08-14 | 美国超导公司 | 涂布的导体的厚膜前体 |
| DE60031784T2 (de) * | 1999-07-23 | 2007-09-06 | American Superconductor Corp., Westborough | Verbesserte hochtemperatursupraleiter-beschichtete elemente |
| US6332967B1 (en) | 1999-11-23 | 2001-12-25 | Midwest Research Institute | Electro-deposition of superconductor oxide films |
| JP3548801B2 (ja) * | 2001-03-27 | 2004-07-28 | 独立行政法人産業技術総合研究所 | 特定の金属種に特定の配位子を配位させた金属錯体を含む溶液組成物、希土類超電導膜製造用溶液組成物、特定金属錯体の非結晶固形物、特定の金属種に特定の配位子を配位させた金属錯体を含む溶液の製造方法、希土類超電導膜製造用溶液の製造方法、及び超電導薄膜の形成方法。 |
| JP4771632B2 (ja) * | 2001-10-12 | 2011-09-14 | 富士通株式会社 | 高温超伝導体膜の形成方法 |
| JP3851948B2 (ja) * | 2002-05-10 | 2006-11-29 | 独立行政法人産業技術総合研究所 | 超電導体の製造方法 |
| JP2004155618A (ja) * | 2002-11-07 | 2004-06-03 | Hitachi Ltd | 酸化物系超伝導部材とその製造方法 |
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- 2005-09-30 CN CN2005800389076A patent/CN101258618B/zh active Active
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