JP2008311665A - 光起電力シリコンウェファ上に導体路を形成する方法 - Google Patents

光起電力シリコンウェファ上に導体路を形成する方法 Download PDF

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Publication number
JP2008311665A
JP2008311665A JP2008157077A JP2008157077A JP2008311665A JP 2008311665 A JP2008311665 A JP 2008311665A JP 2008157077 A JP2008157077 A JP 2008157077A JP 2008157077 A JP2008157077 A JP 2008157077A JP 2008311665 A JP2008311665 A JP 2008311665A
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JP
Japan
Prior art keywords
layer
transfer layer
transfer
stamping foil
foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008157077A
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English (en)
Japanese (ja)
Other versions
JP2008311665A5 (enExample
Inventor
Ulrich Schindler
ウーリッヒ シンドラー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonhard Kurz Stiftung and Co KG
Original Assignee
Leonhard Kurz Stiftung and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leonhard Kurz Stiftung and Co KG filed Critical Leonhard Kurz Stiftung and Co KG
Publication of JP2008311665A publication Critical patent/JP2008311665A/ja
Publication of JP2008311665A5 publication Critical patent/JP2008311665A5/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Photovoltaic Devices (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2008157077A 2007-06-14 2008-06-16 光起電力シリコンウェファ上に導体路を形成する方法 Pending JP2008311665A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007027998A DE102007027998A1 (de) 2007-06-14 2007-06-14 Heißprägen von Leiterbahnen auf Photovoltaik-Silizium-Wafer

Publications (2)

Publication Number Publication Date
JP2008311665A true JP2008311665A (ja) 2008-12-25
JP2008311665A5 JP2008311665A5 (enExample) 2011-07-28

Family

ID=39832343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008157077A Pending JP2008311665A (ja) 2007-06-14 2008-06-16 光起電力シリコンウェファ上に導体路を形成する方法

Country Status (4)

Country Link
US (1) US20080308150A1 (enExample)
EP (1) EP2003698A3 (enExample)
JP (1) JP2008311665A (enExample)
DE (1) DE102007027998A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009010372A (ja) * 2007-06-14 2009-01-15 Leonhard Kurz Stiftung & Co Kg 構造物の熱刻印
WO2015145886A1 (ja) * 2014-03-25 2015-10-01 パナソニックＩｐマネジメント株式会社 電極パターンの形成方法及び太陽電池の製造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1397536B1 (it) * 2008-09-25 2013-01-16 Smart Res Societa Per Azioni Dispositivo di identificazione a radiofrequenza
FR2945151B1 (fr) * 2009-04-30 2011-04-29 Commissariat Energie Atomique Procede de fixation d'un composant electronique sur un produit
DE102009026149A1 (de) * 2009-07-10 2011-01-27 Eppsteinfoils Gmbh & Co.Kg Verbundsystem für Photovoltaik-Module
US8563351B2 (en) * 2010-06-25 2013-10-22 Taiwan Semiconductor Manufacturing Co., Ltd. Method for manufacturing photovoltaic device
DE102014104510B4 (de) * 2014-03-31 2019-02-07 Gottfried Wilhelm Leibniz Universität Hannover Verfahren zum Fügen und Einrichtung zum Fügen einer Anordnung unter Verwendung des Verfahrens
CN104009124B (zh) * 2014-06-13 2018-09-18 苏州苏大维格光电科技股份有限公司 太阳能电池超精细电极转移薄膜、制备方法及其应用方法
DE102015112909B3 (de) * 2015-08-05 2017-02-09 Leonhard Kurz Stiftung & Co. Kg Verfahren und Vorrichtung zum Herstellen einer Mehrschichtfolie
GB202107490D0 (en) * 2021-05-26 2021-07-07 Foilco Ltd Electro-conductive transfer films

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57193092A (en) * 1981-04-22 1982-11-27 Irion & Vosseler Transfer foil and method of transferring with same
JPH08307054A (ja) * 1995-03-03 1996-11-22 Dainippon Printing Co Ltd 多層プリント配線板およびその製造方法
JPH11208194A (ja) * 1998-01-27 1999-08-03 Toyo Screen Insatsu Kk 転写用印刷物
JP2000506679A (ja) * 1996-03-15 2000-05-30 エヴァーグリーン ソーラー，インコーポレイテッド 太陽電池にラップアラウンド電気接点を形成する方法
JP2001520807A (ja) * 1997-03-25 2001-10-30 エバーグリーン ソーラー，インコーポレイテッド 太陽電池の反射防止コーティングおよび金属化を提供するためのデカールおよび方法
JP2008544555A (ja) * 2005-06-24 2008-12-04 コナルカ テクノロジーズ インコーポレイテッド 電極の調製方法
JP2009511308A (ja) * 2005-10-17 2009-03-19 レオンハード クルツ シュティフトゥング ウント コー． カーゲー 多層体およびその製造方法

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DE3036260A1 (de) * 1980-09-26 1982-04-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung von elektrischen kontakten an einer silizium-solarzelle
US4396690A (en) * 1981-05-04 1983-08-02 Diamond Shamrock Corporation Device for the simultaneous production of electricity and thermal energy from the conversion of light radiation
US5063658A (en) 1987-07-08 1991-11-12 Leonard Kurz Gmbh & Co. Embossing foil and a method of making
US5078820A (en) * 1988-03-25 1992-01-07 Somar Corporation Method and apparatus for pressure sticking a thin film to a base plate
US5277734A (en) 1991-11-07 1994-01-11 Fred Bayer Holdings Inc. Electrically conductive circuit sheet and method and apparatus for making same
US6280552B1 (en) * 1999-07-30 2001-08-28 Microtouch Systems, Inc. Method of applying and edge electrode pattern to a touch screen and a decal for a touch screen
NL1016779C2 (nl) * 2000-12-02 2002-06-04 Cornelis Johannes Maria V Rijn Matrijs, werkwijze voor het vervaardigen van precisieproducten met behulp van een matrijs, alsmede precisieproducten, in het bijzonder microzeven en membraanfilters, vervaardigd met een dergelijke matrijs.
US7964439B2 (en) * 2002-12-20 2011-06-21 The Trustees Of Princeton University Methods of fabricating devices by transfer of organic material
US8222072B2 (en) * 2002-12-20 2012-07-17 The Trustees Of Princeton University Methods of fabricating devices by low pressure cold welding
EP1965438A3 (en) * 2005-08-12 2009-05-13 Cambrios Technologies Corporation Nanowires-based transparent conductors

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57193092A (en) * 1981-04-22 1982-11-27 Irion & Vosseler Transfer foil and method of transferring with same
JPH08307054A (ja) * 1995-03-03 1996-11-22 Dainippon Printing Co Ltd 多層プリント配線板およびその製造方法
JP2000506679A (ja) * 1996-03-15 2000-05-30 エヴァーグリーン ソーラー，インコーポレイテッド 太陽電池にラップアラウンド電気接点を形成する方法
JP2001520807A (ja) * 1997-03-25 2001-10-30 エバーグリーン ソーラー，インコーポレイテッド 太陽電池の反射防止コーティングおよび金属化を提供するためのデカールおよび方法
JPH11208194A (ja) * 1998-01-27 1999-08-03 Toyo Screen Insatsu Kk 転写用印刷物
JP2008544555A (ja) * 2005-06-24 2008-12-04 コナルカ テクノロジーズ インコーポレイテッド 電極の調製方法
JP2009511308A (ja) * 2005-10-17 2009-03-19 レオンハード クルツ シュティフトゥング ウント コー． カーゲー 多層体およびその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009010372A (ja) * 2007-06-14 2009-01-15 Leonhard Kurz Stiftung & Co Kg 構造物の熱刻印
WO2015145886A1 (ja) * 2014-03-25 2015-10-01 パナソニックＩｐマネジメント株式会社 電極パターンの形成方法及び太陽電池の製造方法
JPWO2015145886A1 (ja) * 2014-03-25 2017-04-13 パナソニックＩｐマネジメント株式会社 電極パターンの形成方法及び太陽電池の製造方法
US9786809B2 (en) 2014-03-25 2017-10-10 Panasonic Intellectual Property Management Co., Ltd. Method of forming electrode pattern and method of manufacturing solar cell

Also Published As

Publication number Publication date
US20080308150A1 (en) 2008-12-18
EP2003698A2 (de) 2008-12-17
DE102007027998A1 (de) 2008-12-18
EP2003698A3 (de) 2008-12-24

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