JP2008287219A5 - - Google Patents
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- Publication number
- JP2008287219A5 JP2008287219A5 JP2008047585A JP2008047585A JP2008287219A5 JP 2008287219 A5 JP2008287219 A5 JP 2008287219A5 JP 2008047585 A JP2008047585 A JP 2008047585A JP 2008047585 A JP2008047585 A JP 2008047585A JP 2008287219 A5 JP2008287219 A5 JP 2008287219A5
- Authority
- JP
- Japan
- Prior art keywords
- fluoride
- sio
- coating
- layer
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims 50
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 31
- 239000011248 coating agent Substances 0.000 claims 27
- 238000000576 coating method Methods 0.000 claims 27
- 229910004298 SiO 2 Inorganic materials 0.000 claims 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 11
- 239000000758 substrate Substances 0.000 claims 11
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims 8
- 238000000034 method Methods 0.000 claims 5
- 239000000377 silicon dioxide Substances 0.000 claims 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 2
- 229910016569 AlF 3 Inorganic materials 0.000 claims 1
- 229910004261 CaF 2 Inorganic materials 0.000 claims 1
- 229910005690 GdF 3 Inorganic materials 0.000 claims 1
- 229910017768 LaF 3 Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US90413207P | 2007-02-28 | 2007-02-28 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015160114A Division JP2015194789A (ja) | 2007-02-28 | 2015-08-14 | レーザシステム用の設計作製フッ化物被覆素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008287219A JP2008287219A (ja) | 2008-11-27 |
| JP2008287219A5 true JP2008287219A5 (enExample) | 2011-04-21 |
Family
ID=39433950
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008047585A Pending JP2008287219A (ja) | 2007-02-28 | 2008-02-28 | レーザシステム用の設計作製フッ化物被覆素子 |
| JP2015160114A Pending JP2015194789A (ja) | 2007-02-28 | 2015-08-14 | レーザシステム用の設計作製フッ化物被覆素子 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015160114A Pending JP2015194789A (ja) | 2007-02-28 | 2015-08-14 | レーザシステム用の設計作製フッ化物被覆素子 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US7961383B2 (enExample) |
| EP (1) | EP1965229A3 (enExample) |
| JP (2) | JP2008287219A (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090244507A1 (en) * | 2008-03-28 | 2009-10-01 | Nikon Corporation | Optical member, light routing unit, and exposure apparatus |
| DE102008042439A1 (de) * | 2008-09-29 | 2010-04-08 | Carl Zeiss Smt Ag | Hochreflektierender dielektrischer Spiegel und Verfahren zu dessen Herstellung, sowie eine Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel |
| US8153241B2 (en) * | 2009-02-26 | 2012-04-10 | Corning Incorporated | Wide-angle highly reflective mirrors at 193NM |
| DE102009017095A1 (de) * | 2009-04-15 | 2010-10-28 | Carl Zeiss Smt Ag | Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv |
| US8369674B2 (en) | 2009-05-20 | 2013-02-05 | General Electric Company | Optimizing total internal reflection multilayer optics through material selection |
| US8335045B2 (en) * | 2010-02-24 | 2012-12-18 | Corning Incorporated | Extending the stability of UV curable adhesives in 193NM laser systems |
| DE102010017106A1 (de) * | 2010-05-27 | 2011-12-01 | Carl Zeiss Laser Optics Gmbh | Spiegel mit dielektrischer Beschichtung |
| US20120307353A1 (en) | 2011-05-31 | 2012-12-06 | Horst Schreiber | DURABLE MgO-MgF2 COMPOSITE FILM FOR INFRARED ANTI-REFLECTION COATINGS |
| US9482790B2 (en) * | 2012-05-31 | 2016-11-01 | Corning Incorporated | Silica-modified-fluoride broad angle anti-reflection coatings |
| DE102012018483B4 (de) * | 2012-09-19 | 2018-02-01 | Qioptiq Photonics Gmbh & Co. Kg | Nichtpolarisierender Strahlteiler |
| US9581742B2 (en) | 2012-11-20 | 2017-02-28 | Corning Incorporated | Monolithic, linear glass polarizer and attenuator |
| WO2015070254A1 (en) * | 2013-11-11 | 2015-05-14 | General Plasma, Inc. | Multiple layer anti-reflective coating |
| DE102013020353A1 (de) * | 2013-12-05 | 2015-06-11 | Jenoptik Optical Systems Gmbh | Polarisationssystem |
| US9696467B2 (en) * | 2014-01-31 | 2017-07-04 | Corning Incorporated | UV and DUV expanded cold mirrors |
| US10295707B2 (en) * | 2014-02-27 | 2019-05-21 | Corning Incorporated | Durability coating for oxide films for metal fluoride optics |
| CN104020517A (zh) * | 2014-05-21 | 2014-09-03 | 利达光电股份有限公司 | 一种超硬消反光防水防油薄膜 |
| EP3317886A4 (en) * | 2015-06-30 | 2019-07-24 | Jaiswal, Supriya | COATINGS FOR EXTREME ULTRAVIOLETTE AND SOFT X-RAY OPTICS |
| DE102015218763A1 (de) | 2015-09-29 | 2017-03-30 | Carl Zeiss Smt Gmbh | Reflektives optisches Element |
| WO2018013757A2 (en) | 2016-07-14 | 2018-01-18 | Corning Incorporated | Methods of reducing surface roughness of reflectance coatings for duv mirrors |
| TWI746673B (zh) | 2016-12-15 | 2021-11-21 | 台灣積體電路製造股份有限公司 | 鰭式場效電晶體裝置及其共形傳遞摻雜方法 |
| CN113474951B (zh) * | 2019-02-25 | 2024-12-13 | 西默有限公司 | 用于深紫外光源的光学元件 |
| CN110441844A (zh) * | 2019-06-24 | 2019-11-12 | 东莞理工学院 | 一种10 kW半导体激光器用高反膜及其制备方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4693933A (en) * | 1983-06-06 | 1987-09-15 | Ovonic Synthetic Materials Company, Inc. | X-ray dispersive and reflective structures and method of making the structures |
| US5850309A (en) * | 1996-03-27 | 1998-12-15 | Nikon Corporation | Mirror for high-intensity ultraviolet light beam |
| JP3799696B2 (ja) * | 1996-12-02 | 2006-07-19 | 株式会社ニコン | エキシマレーザー用ミラー |
| US6295164B1 (en) * | 1998-09-08 | 2001-09-25 | Nikon Corporation | Multi-layered mirror |
| DE10080898T1 (de) * | 1999-03-29 | 2001-06-28 | Nikon Corp | Mehrschicht-Antireflexionsfilm, optisches Element und Reduktionsprojektionsbelichtungsapparat |
| JP2001011602A (ja) * | 1999-04-28 | 2001-01-16 | Nikon Corp | フッ化物薄膜及びその製造方法及び光学薄膜及び光学素子 |
| JP4118008B2 (ja) | 1999-10-29 | 2008-07-16 | 株式会社ニデック | 多層膜反射ミラー |
| US7261957B2 (en) * | 2000-03-31 | 2007-08-28 | Carl Zeiss Smt Ag | Multilayer system with protecting layer system and production method |
| JP2002014202A (ja) * | 2000-06-30 | 2002-01-18 | Nikon Corp | 光学薄膜、光学素子及び露光装置 |
| WO2003009015A1 (en) | 2001-07-18 | 2003-01-30 | Nikon Corporation | Optical element having lanthanum fluoride film |
| JP2004085975A (ja) * | 2002-08-28 | 2004-03-18 | Japan Aviation Electronics Industry Ltd | 酸化物多層膜光学素子およびその製造方法 |
| JP2004260080A (ja) | 2003-02-27 | 2004-09-16 | Nikon Corp | 紫外域用反射ミラー及びそれを用いた投影露光装置 |
| DE10309084A1 (de) * | 2003-03-03 | 2004-09-16 | Carl Zeiss Smt Ag | Reflektives optisches Element und EUV-Lithographiegerät |
| JP2004309766A (ja) * | 2003-04-07 | 2004-11-04 | Canon Inc | 光学素子、及びその製造方法 |
| US8149381B2 (en) * | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
| US7460206B2 (en) * | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| US7193228B2 (en) * | 2004-03-10 | 2007-03-20 | Cymer, Inc. | EUV light source optical elements |
| JP2005345826A (ja) * | 2004-06-03 | 2005-12-15 | Canon Inc | 光学素子、光学装置、成膜方法、成膜装置及びデバイス製造方法 |
| US20060262389A1 (en) * | 2005-05-23 | 2006-11-23 | Christoph Zaczek | Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the same |
| US7242843B2 (en) * | 2005-06-30 | 2007-07-10 | Corning Incorporated | Extended lifetime excimer laser optics |
-
2008
- 2008-02-25 EP EP08003333A patent/EP1965229A3/en not_active Ceased
- 2008-02-26 US US12/072,427 patent/US7961383B2/en active Active
- 2008-02-28 JP JP2008047585A patent/JP2008287219A/ja active Pending
-
2011
- 2011-05-04 US US13/100,481 patent/US20110206859A1/en not_active Abandoned
-
2015
- 2015-08-14 JP JP2015160114A patent/JP2015194789A/ja active Pending
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