JP2008257170A5 - - Google Patents
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- Publication number
- JP2008257170A5 JP2008257170A5 JP2007261034A JP2007261034A JP2008257170A5 JP 2008257170 A5 JP2008257170 A5 JP 2008257170A5 JP 2007261034 A JP2007261034 A JP 2007261034A JP 2007261034 A JP2007261034 A JP 2007261034A JP 2008257170 A5 JP2008257170 A5 JP 2008257170A5
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- pattern
- resist
- film
- forming method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 15
- -1 t-butylphenyl Chemical group 0.000 claims 7
- 239000002585 base Substances 0.000 claims 5
- ARARQWKFKMWCDL-UHFFFAOYSA-N 1-nitro-2-[(2-nitrophenyl)methoxymethyl]benzene Chemical compound [O-][N+](=O)C1=CC=CC=C1COCC1=CC=CC=C1[N+]([O-])=O ARARQWKFKMWCDL-UHFFFAOYSA-N 0.000 claims 4
- 239000000654 additive Substances 0.000 claims 4
- 230000000996 additive effect Effects 0.000 claims 4
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- 239000003929 acidic solution Substances 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 2
- FLJPGEWQYJVDPF-UHFFFAOYSA-L caesium sulfate Chemical compound [Cs+].[Cs+].[O-]S([O-])(=O)=O FLJPGEWQYJVDPF-UHFFFAOYSA-L 0.000 claims 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 claims 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 230000007261 regionalization Effects 0.000 claims 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims 2
- YDHDFLBUNCPWPV-UHFFFAOYSA-M (2-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.CC(C)(C)C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YDHDFLBUNCPWPV-UHFFFAOYSA-M 0.000 claims 1
- OTJFQRMIRKXXRS-UHFFFAOYSA-N (hydroxymethylamino)methanol Chemical compound OCNCO OTJFQRMIRKXXRS-UHFFFAOYSA-N 0.000 claims 1
- VLLPVDKADBYKLM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VLLPVDKADBYKLM-UHFFFAOYSA-M 0.000 claims 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims 1
- QIWIDNUJJJVWRE-UHFFFAOYSA-N 1-nitro-2-(1,1,2,2,3,3,4,4,4-nonafluorobutoxymethyl)benzene Chemical compound [O-][N+](=O)C1=CC=CC=C1COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F QIWIDNUJJJVWRE-UHFFFAOYSA-N 0.000 claims 1
- MRVWHLPJWCPBHX-UHFFFAOYSA-N 1-nitro-2-(propan-2-yloxymethyl)benzene Chemical compound CC(C)OCC1=CC=CC=C1[N+]([O-])=O MRVWHLPJWCPBHX-UHFFFAOYSA-N 0.000 claims 1
- GNBXIWJVLHCHFY-UHFFFAOYSA-N 1-nitro-2-(trifluoromethoxymethyl)benzene Chemical compound [O-][N+](=O)C1=CC=CC=C1COC(F)(F)F GNBXIWJVLHCHFY-UHFFFAOYSA-N 0.000 claims 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical group OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 claims 1
- ITBPIKUGMIZTJR-UHFFFAOYSA-N [bis(hydroxymethyl)amino]methanol Chemical compound OCN(CO)CO ITBPIKUGMIZTJR-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 229920005601 base polymer Polymers 0.000 claims 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 claims 1
- 230000018109 developmental process Effects 0.000 claims 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 claims 1
- 229940043276 diisopropanolamine Drugs 0.000 claims 1
- 229940043279 diisopropylamine Drugs 0.000 claims 1
- ORPDKMPYOLFUBA-UHFFFAOYSA-M diphenyliodanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ORPDKMPYOLFUBA-UHFFFAOYSA-M 0.000 claims 1
- SBQIJPBUMNWUKN-UHFFFAOYSA-M diphenyliodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C=1C=CC=CC=1[I+]C1=CC=CC=C1 SBQIJPBUMNWUKN-UHFFFAOYSA-M 0.000 claims 1
- 229940102253 isopropanolamine Drugs 0.000 claims 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 claims 1
- XMYQHJDBLRZMLW-UHFFFAOYSA-N methanolamine Chemical compound NCO XMYQHJDBLRZMLW-UHFFFAOYSA-N 0.000 claims 1
- 229940087646 methanolamine Drugs 0.000 claims 1
- CYQYCASVINMDFD-UHFFFAOYSA-N n,n-ditert-butyl-2-methylpropan-2-amine Chemical compound CC(C)(C)N(C(C)(C)C)C(C)(C)C CYQYCASVINMDFD-UHFFFAOYSA-N 0.000 claims 1
- CATWEXRJGNBIJD-UHFFFAOYSA-N n-tert-butyl-2-methylpropan-2-amine Chemical compound CC(C)(C)NC(C)(C)C CATWEXRJGNBIJD-UHFFFAOYSA-N 0.000 claims 1
- XTQCVIMYMUTLFT-UHFFFAOYSA-N nitro trifluoromethanesulfonate Chemical compound [O-][N+](=O)OS(=O)(=O)C(F)(F)F XTQCVIMYMUTLFT-UHFFFAOYSA-N 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 claims 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 claims 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007261034A JP4927678B2 (ja) | 2007-03-13 | 2007-10-04 | パターン形成方法 |
| US12/029,944 US7943285B2 (en) | 2007-03-13 | 2008-02-12 | Pattern formation method |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007063171 | 2007-03-13 | ||
| JP2007063171 | 2007-03-13 | ||
| JP2007261034A JP4927678B2 (ja) | 2007-03-13 | 2007-10-04 | パターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008257170A JP2008257170A (ja) | 2008-10-23 |
| JP2008257170A5 true JP2008257170A5 (enExample) | 2010-09-30 |
| JP4927678B2 JP4927678B2 (ja) | 2012-05-09 |
Family
ID=39980764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007261034A Expired - Fee Related JP4927678B2 (ja) | 2007-03-13 | 2007-10-04 | パターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4927678B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010135624A (ja) * | 2008-12-05 | 2010-06-17 | Tokyo Electron Ltd | 半導体装置の製造方法 |
| JP5515459B2 (ja) | 2009-07-06 | 2014-06-11 | ソニー株式会社 | 半導体デバイスの製造方法 |
| JP2011066120A (ja) * | 2009-09-16 | 2011-03-31 | Toppan Printing Co Ltd | パターン形成方法およびパターン形成体 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63170917A (ja) * | 1987-01-09 | 1988-07-14 | Nec Corp | 微細パタ−ンの形成方法 |
| KR100669862B1 (ko) * | 2000-11-13 | 2007-01-17 | 삼성전자주식회사 | 반도체 장치의 미세패턴 형성방법 |
| JP5000250B2 (ja) * | 2006-09-29 | 2012-08-15 | 東京応化工業株式会社 | パターン形成方法 |
| JP5106020B2 (ja) * | 2007-02-08 | 2012-12-26 | パナソニック株式会社 | パターン形成方法 |
| JP2008227465A (ja) * | 2007-02-14 | 2008-09-25 | Renesas Technology Corp | 半導体装置の製造方法 |
-
2007
- 2007-10-04 JP JP2007261034A patent/JP4927678B2/ja not_active Expired - Fee Related
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