JP2008255301A - Fingerprint-proof photocurable composition, fingerprint-proof film, and optical display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a fingerprint-proof photocurable composition capable of improving the fingerprint-proof property of the optical display device surface by an extremely simple process such as coating. <P>SOLUTION: The fingerprint-proof photocurable composition is a (A) polyether skeleton-containing urethane resin including a ≥3C alkylene oxide. The polyether skeleton-containing urethane resin has a structure represented by the formula: -NH-COO-X-R (wherein X is a polyether skeleton, and R is H or CH<SB>3</SB>). The average molecular weight of the polyether skeleton portion (in the case a plurality of polyether skeleton portions are included in a molecule, it may be the average molecular weight of the sum of the plurality of the polyether skeleton portions) is 1,000 or more. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention is formed from a photocurable composition capable of imparting fingerprint resistance to transparent substrates such as various transparent plastic films, transparent plastic plates and glass, and this fingerprint-resistant photocurable composition. The present invention relates to a fingerprint-resistant film having a coating layer.

  In recent years, liquid crystal display devices (liquid crystal displays) are used in various fields such as computers, word processors, televisions, mobile phones, portable information terminal devices, and portable game devices. In addition, so-called touch panel displays having a mechanism for operating devices by pressing the display on the screen are rapidly spreading. Such touch panel displays include, for example, bank ATMs, vending machines, personal digital assistants (PDAs), copiers, facsimiles, game machines, museums, department stores, and other guidance display devices, car navigation, multimedia Widely used in stations (multifunctional terminals installed in convenience stores), mobile phones, railway vehicle monitoring devices, and the like.

  For such optical display devices such as liquid crystal display devices and touch panel displays, fingerprint marks are not made on the surface of these optical display devices, or even if fingerprint marks are attached, they can be easily wiped off. Fingerprint resistance is required. These optical display devices are also required to have scratch resistance that does not leave scratch marks due to use. In particular, touch panel displays are operated by touching the display surface with a finger, so that a lot of fingerprint traces due to lipid components such as sebum adhere to the surface, and this fingerprint trace adheres to the visibility and operability of the device terminal. There is a problem of preventing.

  As a method for improving antifouling properties such as fingerprint resistance on the surface of an optical display device, a method for improving the antifouling property (water / oil repellency) of the surface by applying silicon oil or fluoropolymer has been proposed. ing. However, since this method only applies the antifouling agent to the surface, the antifouling agent can be removed immediately and the antifouling effect does not last long, that is, the antifouling durability is inferior. On the other hand, there is also a method of improving antifouling properties such as fingerprint resistance by providing a coating layer using a coating composition containing additives such as silicon oil and fluoropolymer. However, these additives are generally called soft blocks, and also have the property of imparting flexibility to the resin. And there exists a fault that mechanical strength, such as the surface hardness of a coating layer, will fall by adding these.

  In JP 2004-230562 A (Patent Document 1), at least one surface of a transparent substrate film is made of a cured product of an ionizing radiation sensitive resin composition, and the contact angle of water on the surface is 70 ° or less. Thus, a hard coat film characterized by providing a hard coat layer that is surface-treated with an alkaline aqueous solution is described (claim 1). This hard coat film is prepared by once curing the applied composition by ultraviolet irradiation or the like and then surface-treating it with an alkaline aqueous solution. Since this method requires further surface treatment after providing the hard coat layer, the number of steps is increased and is complicated.

  In JP-A-2006-43919 (Patent Document 2), a base film is bonded to an energy ray-curable hard coat composition layer formed on a release film having an average surface roughness Ra of 0.1 μm or less, A method for producing a hard coat film is described, wherein after heating, the energy ray curable hard coat composition layer is cured by irradiating an energy ray to form a hard coat layer in close contact with the base film. (Claim 1). This hard coat film is improving the fingerprint wiping property by using a base film having a smooth surface. The hard coat film is characterized in that the hard coat layer is provided in a state of being sandwiched between the release film and the base film. Therefore, this manufacturing method also requires a preparation process for sandwiching the hard coat layer, and the manufacturing process is complicated.

  Japanese Unexamined Patent Application Publication No. 2007-34027 (Patent Document 3) describes a display surface material having an uneven surface (Claim 1). The uneven surface of the surface agent is formed by applying an alumina sol solution and then immersing it in warm water (claim 2). As described herein, this surface material also requires a post-treatment process such as dipping, and its manufacturing process is complicated.

JP 2004-230562 A JP 2006-43919 A JP 2007-34027 A

  The present invention solves the above-mentioned conventional problems, and the object of the present invention is to improve the fingerprint resistance of the surface of the optical display device by a very simple process such as coating. It is to provide a sex composition.

The present invention
(A) A polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, wherein the polyether skeleton-containing urethane resin has the following formula:

[Wherein, X represents a polyether skeleton, and R represents H or CH ₃ . ]
The average molecular weight of the polyether skeleton portion is 1000 or more (provided that when there are a plurality of polyether skeleton portions in the molecule, the average molecular weight may be the sum of the plurality of polyether skeleton portions) And a polyether skeleton-containing urethane resin, which is a fingerprint-resistant photocurable composition, which achieves the above object.

The fingerprint-resistant photocurable composition includes (A) a polyether skeleton-containing urethane resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator.
This (A) polyether skeleton-containing urethane resin is a polyether skeleton-containing urethane resin obtained by addition reaction of a polyether polyol containing (a) isocyanate and (b) an alkylene oxide having 3 or more carbon atoms. Is preferred.

  (A) Polyether skeleton-containing urethane resin comprises (a ′) polyisocyanate, (b) polyether polyol containing alkylene oxide having 3 or more carbon atoms, and (c) hydroxyl group and photopolymerizable group-containing monomer. A polyether skeleton-containing urethane resin obtained by addition reaction, provided that the polyether skeleton-containing urethane resin has the following formula:

[Wherein, X represents a polyether skeleton, and R represents H or CH ₃ . ]
It is preferable that it is a polyether skeleton containing urethane resin on condition that it has the structure shown by these.

  In addition, (b) the polyether polyol containing an alkylene oxide having 3 or more carbon atoms used in the preparation of the polyether skeleton-containing urethane resin has an HLB value (Davis method) of less than 6 in the skeleton portion of the polyol. Is preferred.

  Furthermore, it is preferable that the repeating number of (b) the polyether polyol containing alkylene oxide having 3 or more carbon atoms used in the preparation of the (A) polyether skeleton-containing urethane resin is 12 to 52.

  Further, (A) the polyether skeleton-containing urethane resin is subjected to an addition reaction of (a) 1 to 50% by weight of an isocyanate and (b) 99 to 50% by weight of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. It is preferable that it is a polyether skeleton containing urethane resin obtained by this.

  The (A) polyether skeleton-containing urethane resin comprises (a ′) 1 to 40% by weight of a polyisocyanate, (b) 94 to 30% by weight of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms, and (c It is preferably a polyether skeleton-containing urethane resin obtained by addition reaction of 5 to 30% by weight of a hydroxyl group and photopolymerizable group-containing monomer.

The present invention also provides a fingerprint-resistant photocurable composition comprising (A) a polyether skeleton-containing urethane resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator;
This (A) polyether skeleton-containing urethane resin is a polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, and (a ′) a polyisocyanate and (b) an alkylene oxide having 3 or more carbon atoms. There is also provided a fingerprint-resistant photocurable composition prepared by addition reaction of a containing polyether polyol. It is preferable that the HLB value (Davis method) of the skeleton part of the polyol of the polyether polyol containing (b) an alkylene oxide having 3 or more carbon atoms is less than 6.

In the above fingerprint-resistant photocurable composition,
(A) Polyether skeleton-containing urethane resin 0.1 to 30% by weight,
(B) 50-99.8 wt% of photopolymerizable polyfunctional compound, and (C) 0.1-20 wt% of photopolymerization initiator.
(However, the above component weight% is based on the solid weight in the composition, and the total solid weight of each component is 100 weight%.)
Is preferably included.

  The present invention also provides a fingerprint-resistant film having a transparent substrate and a coating layer, wherein the coating layer is a coating layer formed by the fingerprint-resistant photocurable composition. To do.

  The present invention also provides an optical display device in which a coating layer formed of the above fingerprint-resistant photocurable composition is used as the outermost layer of the display.

  By using the fingerprint-resistant photocurable composition of the present invention, a coating layer having excellent fingerprint resistance can be more easily provided on the surface of an optical display device or the like. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention has excellent transparency and is very suitable for use on the surface of an optical display device or the like. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention further has excellent scratch resistance and surface film hardness. Even if the coating layer obtained by the fingerprint-resistant photocurable composition of the present invention is a single layer, it has excellent fingerprint resistance, high scratch resistance and surface film hardness. Since the fingerprint-resistant photocurable composition of the present invention is photocurable, there is an advantage that a coating layer having such excellent performance can be more easily formed on the surface of an optical display device. Therefore, by using the fingerprint-resistant photocurable composition of the present invention, a coating layer excellent in production efficiency and manufacturing cost and a fingerprint-resistant film having this coating layer can be formed. Furthermore, this coating layer has the advantage that fingerprint resistance can be maintained for a long period of time and is excellent in fingerprint resistance durability.

  The fingerprint-resistant photocurable composition of the present invention is characterized by containing (A) a polyether skeleton-containing urethane resin.

(A) Polyether skeleton-containing urethane resin (A) The polyether skeleton-containing urethane resin in the present invention is a polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, and is an average of the polyether skeleton portions. It is a urethane resin having a molecular weight of 1000 or more. And when this (A) polyether frame | skeleton containing urethane resin is contained in a photocurable composition, the outstanding fingerprint resistance will be expressed. The “polyether skeleton-containing urethane resin” in the present specification includes a polymer having a repeating unit and a so-called oligomer having 2 to 10 repeating units.

  The polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms (A) has the following formula:

It is resin which has the structure shown. In the formula, “X” represents a polyether skeleton, and “R” represents H or CH ₃ . An example of a polyether skeleton represented by “X” is an alkylene oxide having 3 or more carbon atoms. Another example of the polyether skeleton represented by “X” is a block polyether skeleton composed of alkylene oxide and ethylene oxide having 3 or more carbon atoms.

  In the (A) polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, the average molecular weight of the polyether skeleton portion is 1000 or more. However, when the (A) polyether skeleton-containing urethane resin has a plurality of polyether skeleton portions in the molecule, the average molecular weight may be an average molecular weight obtained by adding the plurality of polyether skeleton portions. That is, the (A) polyether skeleton-containing urethane resin contained in the photocurable composition of the present invention is characterized by having a molecular weight of a certain value or more.

  In one embodiment of the present invention, (A) a polyether skeleton-containing urethane resin can be prepared by addition reaction of (a) an isocyanate and (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. .

(A) The isocyanate used in the preparation of the polyether skeleton-containing urethane resin (a) may be a monoisocyanate having one NCO group in the molecule, and has two or more NCO groups in the molecule. Polyisocyanate may be used.
As a specific example of monoisocyanate, for example,
Examples include methyl isocyanate, ethyl isocyanate, propyl isocyanate, isopropenyl isocyanate, phenyl isocyanate, tolyl isocyanate, and naphthyl isocyanate. Furthermore, unsaturated bond-containing isocyanates such as (meth) acryloyl isocyanate, (meth) acryloyloxyethyl isocyanate, 1,1-bis (acryloyloxymethyl) ethyl isocyanate, dimethylmeta-isopropenylbenzyl isocyanate can also be used.
As specific examples of polyisocyanates, for example,
Aromatic diisocyanates such as tolylene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), p-phenylene diisocyanate, and naphthalene diisocyanate;
C3-C12 aliphatic diisocyanates such as hexamethylene diisocyanate (HMDI), 2,2,4-trimethylhexane diisocyanate, and lysine diisocyanate;
1,4-cyclohexane diisocyanate (CDI), isophorone diisocyanate (IPDI), 4,4′-dicyclohexylmethane diisocyanate (hydrogenated MDI), methylcyclohexane diisocyanate, isopropylidene dicyclohexyl-4,4′-diisocyanate, and 1,3- Diisocyanatomethylcyclohexane (hydrogenated XDI), hydrogenated TDI, 2,5- or 2,6-bis (isocyanatomethyl) -bicyclo [2.2.1] heptane (also referred to as norbornane diisocyanate), etc. An alicyclic diisocyanate having 5 to 18 carbon atoms, such as
Aliphatic diisocyanates having aromatic rings such as xylylene diisocyanate (XDI), tetramethylxylylene diisocyanate (TMXDI), and the like; Dimer) and isocyanurate (trimer) and the like).
These may be used alone or in combination of two or more.

  In the present invention, it is preferable to use (a ′) polyisocyanate as (a) isocyanate. (A ′) By preparing a (A) polyether skeleton-containing urethane resin using polyisocyanate, it becomes possible to prepare a urethane resin having both a polyether skeleton and a photopolymerizable group, or a polymer having a higher degree of polymerization. It becomes possible to obtain an ether skeleton-containing urethane resin, which makes it possible to obtain better fingerprint resistance. In the present specification, “(a) isocyanate” includes both monoisocyanate and polyisocyanate.

(A) The polyether polyol containing the alkylene oxide (C) having 3 or more carbon atoms used for the preparation of the polyether skeleton-containing urethane resin is a polyhydric alcohol having a polyether skeleton. And this (b) polyether polyol is on condition that an alkylene oxide which has 3 or more carbon atoms is contained in the polyether skeleton. That is, polyethylene glycol is not included in (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. Examples of the “alkylene oxide having 3 or more carbon atoms” include propylene oxide represented by —O—CH ₂ —CH (CH ₃ ) —, tetramethylene oxide represented by —O— (CH ₂ ) ₄ —, — _{O-CH 2 -CH (CH 2} Cl) - 3- chloro-propylene oxide represented by, etc., and the like alkylene oxide having 3 to 4 carbon atoms. The “alkylene oxide having 3 or more carbon atoms” is more preferably propylene oxide, and even more preferably isopropylene oxide.

  The polyether skeleton-containing urethane resin (A) used in the present invention has an average molecular weight of 1000 or more in the polyether skeleton portion. That is, in the preparation of the (A) polyether skeleton-containing urethane resin, it is prepared by using a polyether polyol containing (b) an alkylene oxide having 3 or more carbon atoms having an average molecular weight of 1000 or more. By preparing the (A) polyether skeleton-containing urethane resin using the (b) polyether polyol having an average molecular weight of 1000 or more, the affinity for the lipid component is improved, thereby providing excellent fingerprint resistance. It will be. In addition, since the urethane bond density | concentration falls when the average molecular weight of (b) polyether polyol becomes large too much, it is unpreferable. (B) The average molecular weight of the polyether polyol is preferably 3000 or less from the viewpoint of urethane bond concentration and workability during blending and coating. In the preparation of (A) polyether skeleton-containing urethane resin, when (b) polyether polyol is used for the purpose of introducing a plurality of polyether skeletons represented by the above formula into the resin, The average molecular weight of the polyether skeleton portion means the sum of average molecular weights of “XR” portions in a plurality of polyether polyol skeletons contained in the resin.

  (A) A polyether polyol containing an alkylene oxide having 3 or more carbon atoms used for the preparation of a polyether skeleton-containing urethane resin has an HLB value of the skeleton portion of the polyol measured by the Davis method of less than 6. It is preferable that it is less than 5. The lower limit of the HLB value is preferably −2. The HLB value is a physical property value representing the degree of hydrophilicity and lipophilicity. Typical methods for calculating the HLB value include the Griffin method and the Davis method. In the present specification, the HLB value calculated by the Davis method is used as the HLB value of the skeleton portion of the polyol. (A) (B) used for the preparation of a polyether skeleton-containing urethane resin (b) obtained by having an HLB value of a skeleton portion of a polyol of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms is less than 6 (A ) The affinity of the polyether skeleton-containing urethane resin with respect to the lipid component is improved, whereby excellent fingerprint resistance can be obtained.

The Davis method, which is one of the methods for calculating the HLB value of the skeleton portion of the polyol, is a method of calculating from the following formula using a constant (group number) specific to each functional group.
HLB value of the skeleton part of the polyol = 7 + (total number of hydrophilic groups) + (total number of lipophilic groups)

  (A) The polyether polyol containing an alkylene oxide having 3 or more carbon atoms used for the preparation of a polyether skeleton-containing urethane resin is a polyalkylene having 12 to 52 repeating alkylene oxides having 3 or more carbon atoms. It is preferable to use an ether polyol, and it is more preferable to use a polyether polyol having a repeating number of 15 to 35. By using the polyether polyol having the above repeating number, the affinity for the lipid component is improved, and more excellent fingerprint resistance can be obtained.

  The (b) polyether polyol containing an alkylene oxide having 3 or more carbon atoms may be a polyhydric alcohol containing an alkylene oxide unit having 3 or more carbon atoms. That is, (b) Polyethylene oxide (EO) -polypropylene oxide (PO) -block which is a polyhydric alcohol containing an alkylene oxide unit having 3 or more carbon atoms and an ethylene oxide unit in addition to polypropylene glycol or the like as the polyether polyol. Polymers, specifically EO-PO-EO glycol (terminal EO glycol) and PO-EO-PO glycol (terminal PO glycol) can also be used for the preparation of (A) a polyether skeleton-containing urethane resin. (B) When the polyethylene oxide-polypropylene oxide-block polymer as described above is used as the polyether polyol, the number of polypropylene oxide repetitions is preferably 12 to 52. Further, the EO% in the polyethylene oxide-polypropylene oxide block polymer is preferably 40% or less.

  In the preparation of the (A) polyether skeleton-containing urethane resin of the present invention, the polyether polyol containing (a) isocyanate and (b) alkylene oxide having 3 or more carbon atoms is in a state in which no free NCO group remains. That is, (a) the NCO group of the isocyanate is used in a molar equivalent ratio such that (b) the OH group of the polyether polyol containing an alkylene oxide having 3 or more carbon atoms reacts. (A) In the preparation of a polyether skeleton-containing urethane resin, when only (a) an isocyanate and (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms are used, (a) 1 to 50% by weight of isocyanate and (B) It is preferable to polymerize 99 to 50% by weight of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms.

  (A) In another embodiment of the preparation of the polyether skeleton-containing urethane resin, in addition to the isocyanate component and the polyether polyol component, (c) a hydroxyl group and a photopolymerizable group-containing monomer may be used. In the preparation of the (A) polyether skeleton-containing urethane resin, the (A) polyether skeleton-containing urethane resin obtained by using the (c) hydroxyl group and photopolymerizable group-containing monomer has a photopolymerizable group, As a result, a fingerprint-resistant photocurable composition that is superior in durability against fingerprints can be obtained.

  (A) a polyether skeleton-containing urethane resin having such a photopolymerizable group includes (a ′) polyisocyanate, (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms, and (c) a hydroxyl group and It can be obtained by addition reaction of a photopolymerizable group-containing monomer. However, the polyether skeleton-containing urethane resin thus obtained has the following formula:

[Wherein, X represents a polyether skeleton, and R represents H or CH ₃ . ]
Provided that it has the structure That is, in the case where (a ′) polyisocyanate, (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms, and (c) a hydroxyl group and a photopolymerizable group-containing monomer are subjected to an addition reaction, It is required that (a ′) polyisocyanate and (b) alkylene oxide having 3 or more carbon atoms undergo an addition reaction.

  (C) The monomer containing a hydroxyl group and a photopolymerizable group may be a monofunctional photopolymerizable monomer having one photopolymerizable group, and having two or more photopolymerizable groups. It may be a monomer. Here, examples of the photopolymerizable group include an unsaturated double bond group. Examples of the monofunctional photopolymerizable monomer include hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, and the like. Examples of polyfunctional photopolymerizable monomers include glycerin di (meth) acrylate, pentaerythritol tri (meth) acrylate, ditrimethylolpropane tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, and sorbitol penta (meth) acrylate. Is mentioned.

(A) In the preparation of the polyether skeleton-containing urethane resin, when (c) a hydroxyl group and photopolymerizable group-containing monomer is used, (a ′) polyisocyanate is used as the isocyanate. By preparing (A) a polyether skeleton-containing urethane resin using (a ′) polyisocyanate, a urethane resin having both a polyether skeleton and a photopolymerizable group can be prepared. By using the thus obtained (A) polyether skeleton-containing urethane resin, it is possible to obtain a fingerprint-resistant photocurable composition excellent in fingerprint resistance and fingerprint resistance durability. In the fingerprint-resistant photocurable composition of the present invention, (a ′) polyisocyanate, (b) polyether polyol containing alkylene oxide having 3 or more carbon atoms, and (c) hydroxyl group and photopolymerizable group-containing monomer are added. From the viewpoint of fingerprint resistance, fingerprint resistance durability, surface hardness, etc., it is more preferable to use (A) polyether skeleton-containing urethane resin having an average molecular weight of the polyether skeleton portion of 1000 or more obtained by reacting. preferable.

  (A) In preparation of the polyether skeleton-containing urethane resin, (a ′) polyisocyanate, (b) polyether polyol containing alkylene oxide having 3 or more carbon atoms, and (c) hydroxyl group and photopolymerizable group-containing monomer, (B) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms and (c) a hydroxyl group and light so that no free NCO group remains. It is used in such a molar equivalent ratio that all the OH groups of the polymerizable group-containing monomer react. In this case, (a ′) 1 to 40% by weight of polyisocyanate, (b) 94 to 30% by weight of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms, and (c) a hydroxyl group and a photopolymerizable group-containing monomer 5 to 5%. It is preferred to polymerize 30% by weight.

  Another embodiment of the fingerprint-resistant photocurable composition of the present invention includes (A) a polyether skeleton-containing urethane resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator. The anti-fingerprint photocurable composition, wherein the (A) polyether skeleton-containing urethane resin is a polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, (a ′) a polyisocyanate and (B) An anti-fingerprint photocurable composition prepared by addition reaction of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. In this case, (b) the HLB value (Davis method) of the skeleton portion of the polyol of the polyether polyol containing an alkylene oxide having 3 or more carbon atoms is preferably less than 6.

  This (A) polyether skeleton-containing urethane resin is a polyether skeleton-containing urethane resin prepared by addition reaction of (a ′) a polyisocyanate and (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. It is. The average molecular weight of the polyether polyol containing (b) the alkylene oxide having 3 or more carbon atoms used in the preparation of the polyether skeleton-containing urethane resin may be less than 1000. This (A) polyether skeleton-containing urethane resin is prepared without using (a ') polyisocyanate and (c) a hydroxyl group and photopolymerizable group-containing monomer. Therefore, each of two or more (b) polyether polyols reacts with a plurality of isocyanate groups of (a ′) polyisocyanate, whereby (b) the average molecular weight of the polyether polyol is less than 1000 The molecular weight of the resulting (A) polyether skeleton-containing urethane resin is large enough to exhibit fingerprint resistance, for example, the total average molecular weight of a plurality of polyether skeleton portions contained in the molecule is 1000 This is because of the above. In this case, it is preferable that the HLB value (Davis method) of one skeleton portion of the polyol of (b) polyether polyol is less than 6. The average molecular weight of the polyether polyol containing (b) an alkylene oxide having 3 or more carbon atoms is more preferably 700 or more.

  The reason why excellent fingerprint resistance is obtained by including the above polyether skeleton-containing urethane resin is not limited by theory, but is a hydrophobic alkylene oxide having 3 or more carbon atoms and hydrophilicity. By including a certain urethane bond in the molecule, it is considered that the affinity of the resulting coating layer for the lipid component is improved, thereby improving the fingerprint resistance.

(B) Photopolymerizable polyfunctional compound The fingerprint-resistant photocurable composition of the present invention is characterized by containing (A) a polyether skeleton-containing urethane resin. And what is called a coating-film formation component can be especially used without a restriction | limiting, if it is a photocurable component. Such a fingerprint-resistant photocurable composition preferably contains (B) a photopolymerizable polyfunctional compound. (B) The photopolymerizable polyfunctional compound acts as a coating film forming component. And (B) When photopolymerizable polyfunctional compound is contained, the photocurability of a fingerprint-resistant photocurable composition will improve, and the mechanical strength of the coating layer obtained will increase. (B) The photopolymerizable polyfunctional compound is a compound having two or more photopolymerizable groups in one molecule. (B) As the photopolymerizable polyfunctional compound, a compound having two or more (meth) acryloyl groups in the molecule can be used. (B) As the photopolymerizable polyfunctional compound, a compound having three or more (meth) acryloyl groups is preferable. The (B) photopolymerizable polyfunctional compound may be a monomer or an oligomer as long as it is a compound having two or more (meth) acryloyl groups.

  Monomers include alkylene glycol di (meth) acrylates such as ethylene glycol di (meth) acrylate and propylene glycol di (meth) acrylate; diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, dipropylene glycol di ( Low molecular weight polyalkylene glycol di (meth) acrylates such as (meth) acrylates and tripropylene glycol di (meth) acrylates or their modified alkylene oxides; trimethylolpropane tri (meth) acrylate, pentaerythritol di or tri or tetra (meth) Such as acrylate, ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol penta or hexa (meth) acrylate. Orupori (meth) acrylate or an alkylene oxide modified product; and isocyanuric acid alkylene oxide modified product of di- or tri (meth) acrylate.

  Examples of the oligomer include oligomers such as polyester (meth) acrylate, epoxy (meth) acrylate, and acrylic (meth) acrylate. In addition, these oligomers that can be used as the photopolymerizable polyfunctional compound (B) preferably have a number average molecular weight of 300 to 5,000, and more preferably 500 to 3,000. If it is greater than 5,000, the viscosity becomes high and handling may be difficult.

  These (B) photopolymerizable polyfunctional compounds may be used individually by 1 type, and may use 2 or more types together.

  (B) As the photopolymerizable polyfunctional compound, it is preferable to use a monomer having three or more photopolymerizable groups in one molecule. By using such a monomer, the mechanical strength of the resulting coating layer can be further increased. Preferred examples of the photopolymerizable polyfunctional compound (B) include pentaerythritol triacrylate, trimethylolpropane EO-modified triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and the like.

  (B) The photopolymerizable polyfunctional compound is preferably used in an amount of about 50 to 99.8% by weight (solid content weight ratio) based on the solid content weight of the fingerprint-resistant photocurable composition. (B) When the amount of the photopolymerizable polyfunctional compound is less than 50% by weight, physical strength such as scratch resistance and surface film hardness may be deteriorated.

(C) Photopolymerization initiator The fingerprint-resistant photocurable composition of the present invention preferably contains (C) a photopolymerization initiator. (C) The presence of the photopolymerization initiator improves the polymerizability of the fingerprint-resistant photocurable composition against active energy ray irradiation. Examples of (C) photopolymerization initiators include alkylphenone photopolymerization initiators, acylphosphine oxide photopolymerization initiators, titanocene photopolymerization initiators, and oxime ester polymerization initiators. Examples of alkylphenone photopolymerization initiators include 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, and 2-hydroxy-2-methyl-1-phenyl-propane. -1-one, 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- {4- [4- (2 -Hydroxy-2-methyl-propionyl) -benzyl] phenyl} -2-methyl-propan-1-one, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2- Benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- (dimethylamino) -2-[(4-methylphenyl) methyl 1- [4- (4-morpholinyl) phenyl] -1-butanone and the like. Examples of the acylphosphine oxide photopolymerization initiator include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, and the like. Examples of titanocene-based photopolymerization initiators include bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium. Is mentioned. Examples of the oxime ester polymerization initiator include 1.2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], ethanone, 1- [9-ethyl-6- (2 -Methylbenzoyl) -9H-carbazol-3-yl]-, 1- (0-acetyloxime), oxyphenylacetic acid, 2- [2-oxo-2-phenylacetoxyethoxy] ethyl ester, 2- (2-hydroxy And ethoxy) ethyl ester. Furthermore, hydrogen abstraction initiators such as benzophenone, 2,4,6-trimethylbenzophenone, methyl benzoylbenzoate, 2,4-diethylthioxanthone, 2-ethylanthraquinone, camphorquinone, and the like can be used. These photoinitiators may be used individually by 1 type, and may use 2 or more types together.

  Among the above (C) photopolymerization initiators, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-methyl-1- (4-methylthiophenyl) ) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1 and 2,2-dimethoxy-1,2-diphenylethane-1- On or the like is more preferably used.

  (C) The photopolymerization initiator is preferably used in an amount of 0.1 to 20% by weight (solid content weight ratio) based on the solid content weight of the fingerprint-resistant photocurable composition. (C) When the amount of the photopolymerization initiator is out of the above range, the photocurability may be insufficient and the physical strength may be deteriorated.

Other Components The anti-fingerprint photocurable composition of the present invention can be blended with a compound having one ethylenically unsaturated group, if necessary. By including such a compound, the adhesion, hardness, and flexibility of the resulting coating layer can be adjusted. Examples of the compound having one ethylenically unsaturated group include (meth) acrylate compounds having a cyclic structure such as cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, and tetrahydrofurfuryl (meth) acrylate; 2-hydroxyethyl (meta ) Acrylates, hydroxyalkyl (meth) acrylates such as 2-hydroxypropyl (meth) acrylate; (meth) acrylate compounds of alkoxy oxide adducts of phenols such as phenoxyethyl (meth) acrylate; ethylene glycol mono (meth) acrylate, methoxy Glycol mono (medium) such as ethylene glycol mono (meth) acrylate, tetraethylene glycol mono (meth) acrylate, and tripropylene glycol mono (meth) acrylate. ) Acrylate; N- Binirupidoriron, vinyl compounds such as N- vinyl caprolactam.

  The fingerprint-resistant photocurable composition of the present invention may contain an inorganic filler as necessary. By including an inorganic filler, the scratch resistance of the coating layer and the film hardness of the surface can be further improved. Examples of the inorganic filler that can be used include fine particles of metal or metal oxide. Examples of the metal include Si, Ti, Al, Zn, Zr, In, Sn, and Sb. Specific examples of the inorganic filler include silica, alumina, zirconia, and titania. These inorganic fillers more preferably have an average particle size of about 5 to 50 nm. In addition, when using an inorganic filler, it is preferable to use about 0.1 to 50 weight% with respect to the solid content weight of a fingerprint-proof photocurable composition. When content of an inorganic filler exceeds 50 weight%, there exists a possibility that the film | membrane intensity | strength of the coating layer obtained may become weak.

  The fingerprint-resistant photocurable composition of the present invention may further contain an organic solvent as a dilution solvent, if necessary. Examples of such organic solvents include, for example, aromatic solvents such as toluene and xylene; aliphatic solvents such as hexane, heptane, octane, and mineral spirit; methyl ethyl ketone, acetone, and methyl Ketone solvents such as isobutyl ketone and cyclohexanone; ether solvents such as diethyl ether, isopropyl ether, tetrahydrofuran, dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether, anisole, and phenetole; Esters such as ethyl acetate, butyl acetate, isopropyl acetate, ethylene glycol diacetate Amide solvents such as dimethylformamide, diethylformamide, dimethyl sulfoxide, N-methylpyrrolidone; cellosolv solvents such as methyl cellosolve, ethyl cellosolve, butyl cellosolve; ether ester systems such as propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate Solvents; Alcohol solvents such as methanol, ethanol and propanol; Halogen solvents such as dichloromethane, dichloroethane and chloroform; These solvents may be used alone or in combination.

  The anti-fingerprint photocurable composition of the present invention may further comprise a photopolymerization initiation aid, an antistatic agent, an organic filler, a polymerization inhibitor, an antioxidant, an ultraviolet absorber, a light stabilizer, an antifoaming agent, if necessary. Commonly used additives such as an agent, a leveling agent, and a pigment may be included. Examples of photopolymerization initiation assistants that can be preferably used include ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, dibutylethanolamine, and methyldiethanolamine.

Fingerprint-resistant photocurable composition The fingerprint-resistant photocurable composition of the present invention comprises at least (A) a polyether skeleton-containing urethane resin, (B) a photopolymerizable polyfunctional compound, and (C) a photopolymerization initiator. contains. And by using the fingerprint-resistant photocurable composition of the present invention, even a single layer is very excellent in fingerprint resistance, and also excellent in scratch resistance, surface film hardness and fingerprint resistance durability. A coating layer can be formed.

  The fingerprint-resistant photocurable composition of the present invention is photocurable. Therefore, when forming a coating layer, it has the advantage that it is not necessary to heat-polymerize. Many optical display devices include a member having a low heat resistance such as a resin film. The fingerprint-resistant photocurable composition of the present invention has an advantage that a coating layer can be satisfactorily formed even for an optical display device and a resin film including such a member having low heat resistance.

  The fingerprint-resistant photocurable composition of the present invention can be prepared by mixing the above components. Moreover, you may use the organic solvent which can be used for dilution as needed at the time of preparation of a composition. In addition, the fingerprint-resistant photocurable composition of the present invention may be used after being diluted or may be used without being diluted.

  As a method for preparing a fingerprint-resistant photocurable composition, for example, (A) a polyether skeleton-containing urethane resin, (B) a photopolymerizable polyfunctional compound, (C) a photopolymerization initiator, and, if necessary, It can be prepared by mixing an additive and an organic solvent.

When the anti-fingerprint photocurable composition of the present invention does not contain a reactive inorganic filler, each component is (A) a polyether skeleton-containing urethane resin 0.1 to 30% by weight,
(B) 50-99.8 wt% of photopolymerizable polyfunctional compound, and (C) 0.1-20 wt% of photopolymerization initiator,
However, it is more preferable that the weight percentage of the above components is included in an amount of 100 wt% based on the solid weight in the composition.

In addition, when the fingerprint-resistant photocurable composition of the present invention contains a reactive inorganic filler, each component is (A) a polyether skeleton-containing urethane resin 0.1 to 30% by weight,
(B) 50-99.7 wt% of photopolymerizable polyfunctional compound,
(C) 0.1-20% by weight of photopolymerization initiator and 0.1-50% by weight of reactive inorganic filler
However, it is more preferable that the weight percentage of the above components is included in an amount of 100 wt% based on the solid weight in the composition.

  The fingerprint-resistant photocurable composition of the present invention preferably contains neither a silicone-based additive nor a fluorine-based additive. While these additives have the effect of improving the water repellency and oil repellency of the resulting coating layer and improving the antifouling property, the improvement of the water repellency and oil repellency repels the oil and fat components adhering to the coating layer. This is because the dirt may be noticeable.

  By using the fingerprint-resistant photocurable composition of the present invention, a fingerprint-resistant film can be easily prepared. This fingerprint-resistant film has a transparent substrate and a coating layer. This coating layer is a layer formed from the above-mentioned fingerprint-resistant photocurable composition, and the presence of this layer exhibits fingerprint resistance.

  Transparent substrates used for preparing the fingerprint-resistant film include various transparent plastic films such as triacetyl cellulose (TAC) film, polyethylene terephthalate (PET) film, diacetyl cellulose film, acetate butyrate cellulose film, polyethersulfone. Films, polyacrylic resin films, polyurethane resin films, polyester films, polycarbonate films, polysulfone films, polyether films, polymethylpentene films, polyetherketone films, (meth) acrylonitrile films, and the like can be used. Polyethylene terephthalate is preferably used as the transparent substrate. In addition, although the thickness of a transparent base material can be selected timely according to a use, generally it is used at about 25-1000 micrometers.

  The coating layer having fingerprint resistance is formed by applying the above-mentioned fingerprint-resistant photocurable composition on a transparent substrate. The application method of the fingerprint-resistant photocurable composition can be selected as appropriate according to the fingerprint-resistant photocurable composition and the state of the coating process, such as dip coating, air knife coating, curtain coating, It can be applied by a roller coating method, a wire bar coating method, a gravure coating method, an extrusion coating method (this method is a method described in US Pat. No. 2,681,294).

  The fingerprint-resistant photocurable composition painted on the transparent substrate is then cured by being exposed to active energy rays, thereby forming a fingerprint-resistant coating layer. The irradiation here is preferably performed for 0.5 to 240 seconds using light having a wavelength of 200 to 500 nm.

  In addition, a coating layer can be formed on the surface of the optical display device by coating the fingerprint-resistant photocurable composition of the present invention on the surface of the optical display device. Examples of the optical display device that can be provided with a coating layer using the fingerprint-resistant photocurable composition of the present invention include a liquid crystal display device, a CRT (CRT) display device, and a touch panel display. By applying the fingerprint-resistant photocurable composition of the present invention to various transparent plastic films, transparent plastic plates and glass used on the surface of these optical display devices, a coating layer is formed on the surface of the optical display device. Can be formed.

  Examples of the coating method for the fingerprint-resistant photocurable composition include a spin coating method, a dip coating method, a gravure coating method, a spray method, a roller method, and a brush coating method. A suitable coating method can be selected in accordance with the type of optical display device to be coated. In the application of the fingerprint-resistant photocurable composition, it is preferable to apply the coating layer so that the resulting coating layer has a thickness of 0.1 to 20 μm.

  The fingerprint-resistant photocurable composition painted on the surface of the optical display device is then cured by exposure to active energy rays, thereby forming a fingerprint-resistant coating layer. The irradiation here is preferably performed for 0.5 to 240 seconds using light having a wavelength of 200 to 500 nm.

  The following examples further illustrate the present invention, but the present invention is not limited thereto. In the examples, “parts” and “%” are based on weight unless otherwise specified.

Production Example 1 Preparation of Polyether Skeleton-Containing Urethane Resin (1) Part by weight of (a) isocyanate, (b) polyether polyol, (c) hydroxyl group and photopolymerizable group-containing monomer shown in Table 2 were added to a reaction vessel. In addition, 1000 ppm of dibutyltin dilaurate as a catalyst, 1000 ppm of hydroquinone as a polymerization inhibitor, and methyl isobutyl ketone (MIBK, used in an amount of 40% solids) as a solvent were added, and 80 ° C. while blowing air. Was mixed for 3 hours to obtain a polyether skeleton-containing urethane resin (1).

Production Example 2 to Production Example 18
Polyether skeleton-containing urethane resins (2) to (18) were obtained in the same manner as in Production Example 1 except that the respective components shown in Tables 2 to 4 were used in the weight parts shown in the table.

Comparative Production Examples 1-6
Polyether skeleton-containing urethane resins (19) to (24) were obtained in the same manner as in Production Example 1 except that the respective components shown in Table 5 were used in the weight parts shown in the table.

In the above Tables 2 to 5,
IPDI: isophorone diisocyanate,
MDI: diphenylmethane diisocyanate,
HMDI: hexamethylene diisocyanate,
PO: polypropylene glycol skeleton,
EO: polyethylene glycol skeleton,
PTMG: polytetramethylene glycol skeleton,
PETA ^* : a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (mixing weight ratio 60:40),
Indicates.
The “number of repetitions of (b)” described in Tables 2 to 5 is a calculated value calculated using the average molecular weight.
The HLB value of the skeleton portion of the polyol (b) described in Tables 2 to 5 is a value calculated by the Davis method using the formula described herein.

Example 1 Preparation of Fingerprint Resistant Photocurable Composition (1) Polyether skeleton-containing urethane resin (1) obtained by Production Example 1 3 parts by weight, mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (mixed weight) Ratio 60:40) 97 parts by weight and 7 parts by weight of 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one were mixed, and the non-volatile fraction was 40 using MIBK as a solvent. It adjusted so that it might become weight%, and the anti-fingerprint photocurable composition was obtained. The obtained composition was bar-coated on a PET film (thickness 100 μm) with a bar coater (No. 12), and the solvent was removed by heating at 80 ° C. for 1 minute so that the dry film thickness was 5 μm. Dried. Thereafter, the coating layer was formed by exposing and curing ultraviolet rays with a high-pressure mercury lamp (120 W / cm) so as to have an energy of 300 mJ / cm ² , thereby obtaining a fingerprint-resistant film.

Examples 2-18 Preparation of Fingerprint Resistant Photocurable Compositions (2)-(18) Instead of the polyether skeleton-containing urethane resin (1) obtained from Production Example 1, it was obtained from Production Examples 2-18. In addition, a fingerprint-resistant photocurable composition was obtained in the same manner as in Example 1 except that 3 parts by weight of the polyether skeleton-containing urethane resins (2) to (18) were used. A coating layer was formed in the same manner as in Example 1 to obtain a fingerprint-resistant film.

Comparative Examples 1-6 Preparation of Photocurable Composition Instead of the polyether skeleton-containing urethane resin (1) obtained from Production Example 1, the polyether skeleton-containing urethane resin obtained from Comparative Production Examples 1-6 (19 ) To (24) A photocurable composition was obtained in the same manner as in Example 1 except that 3 parts by weight were used. Further, a coating layer was formed in the same manner as in Example 1 to obtain a film.

Comparative Example 7
Mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (mixing weight ratio 60:40) 100 parts by weight and 7 parts by weight of 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one Were mixed so that the non-volatile fraction was 40% by weight using MIBK as a solvent to obtain a photocurable composition. Using the obtained composition, a coating layer was formed in the same manner as in Example 1 to obtain a film.

  The samples with the resulting coating layers were evaluated as described below. The results obtained by these evaluation methods are shown in the following table.

Measurement of haze (cloudiness value) and total light transmittance Using a haze meter (manufactured by Suga Test Instruments Co., Ltd.), the sample's diffuse light transmittance (T _d (%)) and the above total light transmittance (T _t (%)) ) And the haze value was calculated. The total light transmittance (%) and haze (%) shown in Tables 6 to 9 are both measured through a PET film portion having a thickness of 100 μm used as a base material for the preparation of the coating layer. Value.

H: Haze (cloudiness value) (%)
T _d : Diffuse transmittance (%)
T _t : Total light transmittance (%)

Oleic acid wiping evaluation (fingerprint resistance)
One drop of oleic acid was dropped on the coating layer of the obtained sample. Then, it was wiped once, 10 times, 20 times and 30 times using a clean wiper. The haze of the sample before and after the evaluation test was measured according to the above, and the Δhaze value was determined. The obtained Δ haze values are shown in the table. It can be said that the smaller the Δhaze value, the better the wiping property of the oil and fat component, that is, the better the fingerprint resistance.

In the coating layer of the evaluation sample obtained resistant SW resistance, a steel wool # 0000, under a load of 1 kg / cm ^s, 10 reciprocating respectively, was 30 reciprocation, 50 reciprocation is 100 reciprocally and 200 reciprocally. The haze of the sample before and after the evaluation test was measured according to the above, and the Δhaze value was determined. The obtained Δ haze values are shown in the table. The smaller the Δhaze value is, the better the surface hardness is, and it can be said that scratches are less likely to occur on the coating layer.

Evaluation of adhesion 11 scratches at an interval of 1 mm were placed on the surface of the coating layer of the obtained sample with a cutter knife, 11 in width, and 100 squares in total were produced. Next, Nichibansello tape ^{(registered trademark)} was completely adhered from above, peeled off in a 45-degree direction with respect to the film, and evaluated by the number of squares completely remaining on the film.

  The anti-fingerprint films obtained from the anti-fingerprint curable compositions of the examples have high total light transmittance and high transparency. And both fingerprint resistance and SW resistance are very excellent. The film of an Example is further excellent in adhesiveness. On the other hand, all of the films according to the comparative examples were inferior in fingerprint resistance.

  By using the fingerprint-resistant photocurable composition of the present invention, a coating layer having excellent fingerprint resistance can be more easily provided on the surface of an optical display device or the like. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention has excellent transparency and is very suitable for use on the surface of an optical display device or the like. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention further has excellent scratch resistance and surface film hardness. Furthermore, since the fingerprint-resistant photocurable composition of the present invention is photocurable, a coating layer having such excellent performance can be more easily formed on the surface of the optical display device. By using the fingerprint-resistant photocurable composition of the present invention, there is an industrial advantage that a coating layer excellent in production efficiency and production cost can be formed. Furthermore, this coating layer can maintain fingerprint resistance for a long period of time, and is excellent in fingerprint resistance durability.

1 is a cross-sectional schematic view of a fingerprint resistant film of the present invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Fingerprint-resistant film, 3 ... Coating layer, 5 ... Transparent base material.

Claims (12)

(A) A polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, wherein the polyether skeleton-containing urethane resin has a structure represented by the following formula, and the average molecular weight of the polyether skeleton portion is Anti-fingerprint including a polyether skeleton-containing urethane resin that is 1000 or more (provided that when there are a plurality of polyether skeleton portions in the molecule, the average molecular weight may be the sum of the plurality of polyether skeleton portions). Photocurable composition.

[Wherein, X represents a polyether skeleton, and R represents H or CH ₃ . ] A fingerprint-resistant photocurable composition comprising: (A) a polyether skeleton-containing urethane resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator;
The (A) polyether skeleton-containing urethane resin is a polyether skeleton-containing urethane resin obtained by addition reaction of (a) an isocyanate and (b) a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. The fingerprint-resistant photocurable composition according to claim 1. The (A) polyether skeleton-containing urethane resin is added with (a ′) polyisocyanate, (b) polyether polyol containing alkylene oxide having 3 or more carbon atoms, and (c) hydroxyl group and photopolymerizable group-containing monomer. A polyether skeleton-containing urethane resin obtained by reacting, provided that the polyether skeleton-containing urethane resin has a structure represented by the following formula: Curable composition.

[Wherein, X represents a polyether skeleton, and R represents H or CH ₃ . ]   The polyether polyol containing (b) an alkylene oxide having 3 or more carbon atoms used for the preparation of the (A) polyether skeleton-containing urethane resin has an HLB value of the skeleton portion of the polyol (Davis method) of less than 6. Item 4. The fingerprint-resistant photocurable composition according to Item 2 or 3.   The repeating number of the polyether polyol containing the alkylene oxide (b) C3 or more used for preparation of the said (A) polyether frame | skeleton containing urethane resin is 12-52 in any one of Claims 2-4. A fingerprint-resistant photocurable composition.   The (A) polyether skeleton-containing urethane resin is obtained by addition reaction of (a) 1 to 50% by weight of an isocyanate and (b) 99 to 50% by weight of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms. The anti-fingerprint photocurable composition according to claim 2, which is a polyether skeleton-containing urethane resin.   The (A) polyether skeleton-containing urethane resin comprises (a ′) 1 to 40% by weight of a polyisocyanate, (b) 94 to 30% by weight of a polyether polyol containing an alkylene oxide having 3 or more carbon atoms, and (c) a hydroxyl group. The fingerprint-resistant photocurable composition according to claim 3, which is a polyether skeleton-containing urethane resin obtained by addition reaction of 5 to 30% by weight of a photopolymerizable group-containing monomer. A fingerprint-resistant photocurable composition comprising: (A) a polyether skeleton-containing urethane resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator;
The (A) polyether skeleton-containing urethane resin is a polyether skeleton-containing urethane resin containing an alkylene oxide having 3 or more carbon atoms, and (a ′) a polyisocyanate and (b) an alkylene oxide having 3 or more carbon atoms. The fingerprint-resistant photocurable composition according to claim 1, which is prepared by addition reaction of a polyether polyol containing.   The fingerprint-resistant photocurable composition according to claim 8, wherein (b) the HLB value (Davis method) of the skeleton portion of the polyol of the polyether polyol containing an alkylene oxide having 3 or more carbon atoms is less than 6. (A) Polyether skeleton-containing urethane resin 0.1 to 30% by weight,
(B) 50-99.8 wt% of photopolymerizable polyfunctional compound, and (C) 0.1-20 wt% of photopolymerization initiator.
(However, the above component weight% is based on the solid weight in the composition, and the total solid weight of each component is 100 weight%.)
The fingerprint-resistant photocurable composition according to claim 2, comprising:   A fingerprint-resistant film having a transparent substrate and a coating layer, wherein the coating layer is a coating layer formed by the fingerprint-resistant photocurable composition according to any one of claims 1 to 10. the film.   An optical display device in which a coating layer formed of the fingerprint-resistant photocurable composition according to claim 1 is used as an outermost layer of a display.

Images