TW200900475A - Galvanized fingerprint resistant light-cured combination, galvanized fingerprint resistant film and optical display device - Google Patents

Abstract

The invention provides a fingerprint resistant photo-curing composite improving fingerprint resistance of the surface of the optical display device by using the convenient procedure. The fingerprint resistant photo-curing composite contains (A) polyurethane resin containing the polyether frame; the polyurethane resin containing the polyether frame is the polyurethane resin containing the polyether frame containing the alkylidene oxygen with carbon number over 3; the polyurethane resin containing the polyether frame has the structure of the above formula; the average molecular weight of is over 1000 (while the molecular has a plurality of polyether frames, the summing average molecular weight can be on the pluralities of polyether frame); in the above formula, X represents the polyether frame; R represents the H or CH3.

Description

200900475 IX. Description of the Invention: [Effective Fiff Λ ” TECHNOLOGICAL FIELD The present invention relates to a photocurable composition capable of imparting fingerprint resistance to transparent substrates such as various transparent plastic films, transparent plastic 5 rubber sheets, and glass. And a financial fingerprint film having a coating layer formed of (4) a fingerprint photocurable composition.

[Prior Art: J Background Art 10 In recent years, liquid crystal display devices (liquid crystal displays) have been used in various fields such as computers, word processors, televisions, mobile phones, personal digital assistant devices, and expandable game machines. Further, a so-called touch panel display having a mechanism for operating a device by pressing display on a screen is rapidly spreading. Such touch panel displays are, for example, bank ATMs, vending machines, personal assistants (PDAs), photocopiers, facsimile machines, game machines, information display devices installed in museums and department stores, car navigation, multimedia. Stations (S are also placed in multi-function terminals of convenience stores), mobile phones, monitor devices for railway vehicles, and the like have been widely used. For such an optical display device such as a liquid crystal display device or a touch panel display, it has been pursued that a fingerprint mark may not be applied to the surface of the optical display device, or the fingerprint may be wiped off even if it is stained with a fingerprint. Fingerprint resistance. Further, it is also desired for such optical display devices to have scratch resistance which does not leave scratch marks due to use. In particular, the touch panel display is operated by touching the surface of the display with a finger, so that many fingerprint marks generated by the lipid component such as 200900475 sebum are attached to the surface, so that the adhesion of the fingerprint mark hinders the visibility and operation of the device terminal. Sexual problem. As a method for improving the antifouling property such as fingerprint resistance on the surface of an optical display device, there has been proposed a method of improving the antifouling property (water repellent property and oil repellency) of the surface by applying eucalyptus oil or a fluoropolymer. However, this method merely applies the antifouling agent to the surface. Therefore, the antifouling agent is easily detached, so that the antifouling effect cannot be sustained, that is, it has a disadvantage of poor antifouling durability. On the other hand, there is a method in which the coating layer is provided by using a coating composition containing an additive such as the eucalyptus oil or a fluoropolymer, and the antifouling property such as fingerprint resistance is improved. However, these 10 additives are generally referred to as soft blocks and at the same time have properties imparting flexibility to the resin. Therefore, there is a disadvantage that the mechanical strength such as the surface hardness of the coating layer is lowered by the addition of these additives. JP-A-2004-230562 (Patent Document 1) discloses a hard coat film which is characterized in that a hard coat layer is provided on at least one surface of a transparent base film, and the hard coat layer is composed of an ion radiation-sensitive resin composition. The cured product is formed by surface treatment with an alkaline aqueous solution to form a water contact angle of 70° or less on the surface (Application No. 1). When the hard coating film is cured by ultraviolet irradiation or the like, it is prepared by surface treatment using an alkaline aqueous solution. This method requires additional surface treatment after setting the hard coat layer, so the steps are increased and complicated. In the method of producing a hard coat film, the base film is bonded to a release film having an average surface roughness Ra of 0.1/m or less. After the energy ray hardening hard coating composition layer and heating, the energy line is hardened by irradiation of the energy ray; the hard coating composition layer is hardened and the hard coating layer is closely formed to form the substrate film (application) Patent scope item )). The hard coat film seeks to improve fingerprint wiping property by using a substrate film having a flat/moon surface. Further, the hard coat film is characterized in that a hard coat layer is provided in a state of being sandwiched between the release film and the base film. 5 Therefore, the manufacturing method also requires a modulating step for causing the hard coat layer to be held, and the manufacturing steps are complicated. Japanese Laid-Open Patent Publication No. 2007-34027 (Patent Document 3) discloses a surface material for a display having a concave and convex surface (Application No. 1). Further, the uneven surface of the surface material is formed by coating an alumina sol solution and then impregnating 10 in warm water (Application No. 2). As described therein, the surface material also requires a post-treatment step such as dipping, and the manufacturing steps are complicated. [Patent Document 1] JP-A-2006-43019 (Patent Document 3) JP-A-2007-34027 (Patent Document 3) JP-A-2007-34027 In order to solve the above-mentioned conventional problems, it is an object of the invention to provide a fingerprint-resistant photocurable composition which can improve the fingerprint resistance of the surface of an optical display device by a relatively simple procedure such as coating. Means for Solving the Problems The present invention provides a fingerprint-resistant photocurable composition comprising a polyether-containing urethane resin, and the polyether-containing urethane resin contains a carbon number of 3 The above alkylene oxide has the following formula 7 200900475 [Chemical 1] Η Ο

I II

——Ν——C—Ο — χ—R

Wherein X represents a polyether skeleton; R represents a structure represented by ruthenium or CH 3 ] 5 , and the polyether skeleton moiety has an average molecular weight of 1,000 or more (but when a polyether skeleton moiety is present in the molecule, the total may be The above object can be achieved by the average molecular weight after the majority of the polyether skeleton portion. The fingerprint-resistant photocurable composition contains (A) a polyether-containing chain amine 10-methyl formate resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator, and the (A) The polyether-containing urethane resin preferably has a polyether skeleton-containing amine group obtained by subjecting (a) an isocyanate and (b) a polyether alcohol having an alkylene oxide having 3 or more carbon atoms to an addition reaction. Ethyl formate resin. Further, (A) the polyether-containing urethane resin preferably has (a') a polyisocyanate, (b) a polyether alcohol having an alkylene oxide having 3 or more carbon atoms, and (c) a polyether-containing amide-based decanoic acid ethyl ester resin obtained by an addition reaction of a hydroxyl group-containing and photopolymerizable group monomer, but the polyether-containing backbone urethane resin has a formula of 20 2] Η 〇

--Ν——C——Ο — X——R

[wherein, X represents a polyether skeleton; and R represents a polyether skeleton urethane resin having a structure represented by hydrazine or CH3]. 8 200900475 In addition, it is used to prepare (B) the (B) epoxy-containing (tetramethylene) resin containing 3 or more epoxy compounds, and the HLB value of the skeleton portion of the material (Davis) Method)) is preferably less than 6. Further, (b) a polyether alcohol containing (A) a polyether skeleton-containing hydroxyacetate-containing resin 5 (b) containing an alkylene oxide having a carbon number of 3 or more, preferably having a repeating number of 12 to 52. Further, the above (A) polyether skeleton amine decanoic acid ethyl ester resin is preferably a polyether alcohol 99 which has (a) isocyanate 1 to 50% by weight and (b) contains an alkylene oxide having 3 or more carbon atoms. ～50% by weight of a polyether skeleton-containing 10 amino decanoic acid ethyl ester resin obtained by an addition reaction. Further, the polyether skeleton-containing urethane resin (A) is preferably a polyether alcohol 94 having (a) a polyisocyanate weight percent and (b) an alkylene oxide having a carbon number of 3 or more. 30% by weight, and (c) 5 to 30% by weight of a hydroxyl group-containing and photopolymerizable group-containing monomer, which is obtained by an addition reaction, and is a resin containing a polyether skeleton amide formate 15 s. The present invention also provides a fingerprint-resistant photocurable composition comprising the above (A) a polyether skeleton-containing amine decanoic acid ethyl ester resin; (B) a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator, And the (A) polyether-containing urethane resin contains a polyether-containing urethane resin having a carbon number of 3 Å on an alkylene oxide by using (a) a polyisocyanate And (b) a polyether alcohol containing an alkylene oxide having 3 or more carbon atoms is subjected to an addition reaction. The (b) polyether alcohol containing an alkylene oxide having 3 or more carbon atoms preferably has an HLB value (Davids method) of the polyhydric alcohol skeleton portion of less than 6. The above-mentioned fingerprint-resistant photocurable composition preferably comprises: 9 200900475 (4) 0.1 to 30% by weight of a polyfluorene-containing frame-based amino acetate resin; (B) a photopolymerizable polyfunctional compound 5 〇 to 99 8 by weight And (C) photopolymerization initiator 0丨~% by weight, (however, the above-mentioned component weight% is based on the weight of the solid component in the composition, and the total solid content of each component is 1〇〇) weight%). The present invention also provides a fingerprint-resistant film having a transparent substrate and a coating layer, and the coating layer is a coating layer formed of the above-mentioned fingerprint-resistant photocurable composition. The present invention also provides an optical display device which uses a coating layer formed of the above-mentioned fingerprint-resistant photocurable composition on the outermost layer 10 of the display. Advantageous Effects of Invention By using the fingerprint-resistant photocurable composition of the present invention, a coating layer having excellent fingerprint resistance can be more easily provided on the surface of an optical display device or the like 15 . The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention is excellent in transparency and is very suitable for use on the surface of an optical display device or the like. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention has excellent scratch resistance and surface film hardness. The coating layer 20 obtained by the fingerprint-resistant photocurable composition of the present invention has excellent fingerprint resistance, high scratch resistance, and surface film hardness even in a single layer. Since the fingerprint-resistant photocurable composition of the present invention is photocurable, it has an advantage that such a coating layer having excellent properties can be formed more easily on the surface of an optical display device. Therefore, by using the fingerprint-resistant photocurable composition of the present invention, it is possible to form a coating layer which is excellent in terms of production efficiency and manufacturing cost, and a fingerprint-resistant film having the coating layer. Further, the coating layer has an advantage that the fingerprint resistance can be maintained for a long period of time and is excellent in fingerprint durability. t Embodiment 3 5 BEST MODE FOR CARRYING OUT THE INVENTION The fingerprint-resistant photocurable composition of the present invention is characterized by containing (A) a polyether-containing urethane resin. (A) polyether-containing urethane-based resin (A) polyether-containing amide-based decanoic acid ethyl ester resin containing polyether skeleton amine decanoic acid having carbon number 3 or more alkylene oxide An ethyl urethane resin, and the urethane resin having an average molecular weight of the polyether skeleton portion of 1 Å or more. Then, the (A) polyether-containing amide-based decanoic acid ethyl ester resin is contained in the photocurable composition, and excellent fingerprint resistance can be exhibited. Further, the "polyether-containing urethane resin" in the present specification means a so-called oligomer having a polymer having 15 repeating units and having a number of repeating units of 2 to 10. The above (A) polyether skeleton-containing amino phthalate resin containing an alkylene oxide having 3 or more carbon atoms has the following formula: [Chemical Formula 3] 20 Η Ο

I II

- Ν - C - Ο - X-R represents the structure of the resin. In the formula, "X" represents a polyether skeleton; "R" represents an example of a polyether skeleton represented by "X" or CH3, and may be an alkylene oxide having 3 or more carbon atoms. Further, another example of the polyether skeleton represented by "X" may be a block type polycondensation skeleton composed of a ring of carbon number 3 or more and an epoxy group. In the above-mentioned (Α)-containing methacrylic acid-containing ethyl acetonate resin having a carbon number of 3 or more, the polyether skeleton portion has an average molecular weight of 1 〇〇〇 2 5 . However, (4) when the polymysteryl carboxylic acid-containing acetic acid resin has a plurality of poly-bonding skeleton portions in the molecule, the average molecular weight may be an average molecular weight after the total number of the skeletons. That is, the (Α) polyether-containing urethane resin contained in the photocurable composition of the present invention is characterized by having a molecular weight of a certain value or more. In the first aspect of the present invention, the (A) isocyanate and the polyether alcohol having an alkylene oxide having a carbon number of 3 or more may be subjected to an addition reaction to prepare (A) a polyether skeleton-containing aminocarboxylic acid. Ethyl resin. (a) an isocyanate for modulating (A) a polyether-containing urethane resin, which may be a monoisocyanate having 1 NCO group in its molecule, or 15 or 2 in its molecule Two or more NCO-based polyisocyanates. Specific examples of the monoisocyanate include, for example, methyl isocyanate, ethyl isocyanate, propyl isocyanate, isopropyl isopropyl sulfate, phenyl isocyanate, toluene isocyanate, isocyanic acid. Naphthyl ester and the like. In addition, it is also possible to use isocyanuric acid (decyl) decyl acrylate, isocyanate (meth) propylene oxime, 20 丨, 1-isocyanato bis(propylene oxymethyl) ethyl ester, isocyanide An unsaturated bond isocyanate such as dimethyl dimethyl-isopropene diphenylethylenedione. Specific examples of the polyisocyanate include, for example, toluene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), p-phenyl diisocyanate, and naphthyl diisocyanate. Isocyanate; 12 200900475 Hexamethylene diisocyanate (HMDI), 2,2,4-diisocyanate trimethylhexanone vinegar, and --isophthalic acid lysine Sa neon number 3~12 Aliphatic serotonin g; 1,4-diisoacousic acid cyclohexyl ester (CDI), diisocyanato-isophorone vinegar (ipDi), 4,4-diisocyanate Burning vinegar (hydrocracking mdi), 5 methylcyclohexane diisocyanate, 4,4'-diisocyanate isopropylidene diacetate, and hydrazine, 3 - diisocyanate methyl ring Hexane ester (hydrocracking XDI), hydrocracking butanol 1, 2 5_ or 2,6-bis(isocyanatomethyl)-bicyclo[2,2,1]heptane (also known as diiso)妒 妒 莰 酯 ) ) 等 5 5 5 5 5 5 5 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' An aliphatic diisocyanate having an aromatic ring, such as an anthracene t (TMXDI), and a modified product of the diisocyanate (for example, an amine hydrazine) The acid ethyl ester is diimenimine, uret〇di〇ne, uretoimine, biuret (dimer), and heterotrimer, etc.). θ (dimer) These may be used singly or in combination of two or more. In the present invention, it is preferred to use (a) polyisocyanate as (4). Hunting is prepared by using (a,) polyisocyanuric acid vinegar (8) polyquaternary bone-containing, oxic acid ester resin 'can be prepared with polyisocyanic skeleton and photopolymerizable formula: formic acid ethyl acetate resin' and can obtain more polymerization degree A large polyalkyl 2 phthalate-based resin is used, whereby more excellent fingerprint resistance can be obtained. Amino A This is the case where the (4) isocyanic acid vinegar is used in the field. - 曰 and polyisocyanide are used to prepare (A) a polyether alcohol amide formic acid containing a polyether skeleton having an alkylene oxide number of 3 or more (b) containing a 'system having a poly(tetra) frame (four) ^ 13 200900475 Then, the (b) polyether alcohol is exemplified by an epoxy burning having a carbon number of 3 or more in the polyether skeleton, that is, polyethylene glycol is not contained in the epoxy compound having a carbon number of 3 or more in (8) of the present specification. The ether ketone may be, for example, a propylene oxide represented by -〇_CH2-CH(CH3)-; a tetrahydrofuran represented by _0_(CH2)L 5; -CH2-CH(CH2Cl)_ represents an alkylene oxide having 3 to 4 carbon atoms such as 3-epoxychlorodioxane. The "alkylene oxide having 3 or more carbon atoms" is preferably epoxypropane, and isopropylene oxide is more preferred. The (A) polyether skeleton amine decanoic acid ethyl ester resin used in the present invention has a polyether skeleton portion having an average molecular weight of 1 Å or more. That is, in the preparation of the (a) poly(xanthene ether skeleton) urethane resin, it is prepared by using (b) a polyether alcohol having an average molecular weight of 1,000 or more and (b) an alkylene oxide having a carbon number of 3 or more. . By using a polyether alcohol having an average molecular weight of 1,000 or more and (b) a polyether alcohol having a carbon number of 3 or more and oxyalkylene to prepare a polyether-containing urethane-containing resin, the affinity for the lipid component can be improved. Get more excellent finger resistance. Further, when the average molecular weight of the (b) polyether alcohol becomes too large, the concentration of the ethyl phthalate ethyl ester is lowered, which is not preferable. The (b) polyether alcohol preferably has an average molecular weight of 3 Å or less from the viewpoint of the ethyl urethane binding concentration, even the mixing property and the workability at the time of coating. Further, in the preparation of (A) a polymysteryl urethane resin, when (b) a polyether alcohol is used for the purpose of introducing a plurality of polyether skeletons represented by the above formula 20 into the resin, The average molecular weight of the polyether skeleton portion referred to herein means the sum of the average molecular weights of the rx_R" portion of most polyether alcohol skeletons contained in the resin. For the preparation of (A) polyether-containing urethane resin (b) containing 14 200900475 carbon number 3 or more epoxy-fired poly-, which is determined by the Davids method for the polyol skeleton portion The HLB value is preferably less than 6, and more preferably less than 5. In addition, the lower limit of the HLB value is preferably _2. The HLB value means a physical property value indicating the degree of hydrophilicity and lipophilicity. A representative calculation method of the HLB value can be given by the Griffil1 method and the Davids method. In the present specification, the HLB value calculated by the Davids method is used as the HLB value of the polyol skeleton portion. By using the polyalcohol skeleton portion of (b) a polyether alcohol containing (3) a polyether skeleton containing a polyether skeleton urethane resin to have a carbon number of 3 or more, the HLB value is less than 6, and it can be improved. With respect to the affinity of the obtained (a) lipid component containing the poly-skeletal amino decanoic acid ethyl ester 10 resin, more excellent fingerprint resistance can be obtained. The Davids method, which is one of the methods for calculating the HLB value of the polyol skeleton portion, refers to a method which is calculated by the following formula using a constant (base) specific to each functional group. The HLB value of the polyol skeleton portion = 7 + (the sum of the bases of the hydrophilic groups) + (the sum of the 15 bases of the lipophilic group) [Table 1] The number of each functional group The number of hydrophilic groups - S〇3Na 38.7 -COOK '''' '~~~~- 21.1 -COONa -19.1 >N<(Level 4脍) 酉曰(Sorbetol Ring) 9.4 6.8 Ester (Free)~~~ ' 2.4 -C0OH ''''''^ -OH '~'- -OH(山曼曼许-(C^CH^T'- 2.1 1.9 0.5 1.3 0.33 lipophilic base number-ch2- -0.475 ch3- -0.475 =CH- -0.475 -(CH(CH3)CH20 )- -0.15 -((CH2)40)- -0.6 15 200900475 (b) Containing a polyether skeleton urethane resin (b) containing a carbon number of 3 or more w & The polyether alcohol to be fired is preferably a polyether alcohol having a repeat number of carbon atoms of 3 or more and having a repeat number of from 12 to 52, and more preferably a repeating number of 5 alcohols. By using the polyether having the above-mentioned repetition number, the affinity for the waxy component can be improved, and more excellent fingerprint resistance can be obtained. Further, (b) a polyether alcohol containing an alkylene oxide having 3 or more carbon atoms, As long as 疋3 has a charcoal bismuth-containing polyoxyl of 3 or more epoxy-burning units, that is, In addition to polypropylene glycol or the like, a polyepoxyethane containing a carbon number of 3 or more and an epoxy epoxiconne (referred to as a polyepoxy(tetra)(p))-linked polymer, specifically, That is, EO_p〇_E 〇 ethylene glycol (terminal E 〇 ethylene glycol) and P 〇 ~ E 〇 _ 〇 〇 ethylene glycol (terminal PO ethylene glycol), etc., can also be used as (b) polyether alcohol, Modification of (A) polyether-containing backbone urethane resin. When using polyethylene oxide-polypropylene oxide-agglomerate as described above as the polyether alcohol, the number of repeats of poly(p-oxirane) Preferably, it is 12 to 52. Further, the EO% of the polyethylene oxide-polypropylene oxide-agglomerate polymer is preferably 40% or less. In the present invention, (A) the polyether skeleton-containing amine decanoic acid In the preparation of the ethyl ester resin, in order to exhibit a state in which no free NCO group remains, that is, a polyether having (a) an isocyanate having an NCO group and (b) having a carbon number of 3 or more alkylene oxide 20 The alcohol has a molar equivalent ratio of the H-based reaction, and (a) an isocyanate and (b) an epoxy-fired polyether alcohol having a carbon number of 3 or more are used. (a) a polyether-containing urethane-containing carboxylic acid In the preparation of the resin, only use a) isocyanic acid vinegar and (b) polyether alcohol containing an alkylene oxide having 3 or more carbon atoms, preferably - (a) isocyanate 1 to 5 % by weight and (b) ring having 3 or more carbon atoms The polyether alcohol of the oxyalkane is 99 to 50 by weight 16 200900475. In the other aspect of the preparation of the (A) polyether-containing amide-based decanoic acid ethyl ester resin, in addition to the aforementioned isocyanate component and polyether alcohol component, (c) a hydroxyl group-containing and photopolymerizable group may be used. body. (A) Polyether-containing amino group-containing group obtained by using (c) hydroxyl group-containing and photopolymerizable group monomer in the preparation of (A) polyether-containing amide-based quinone ethyl acrylate resin The ethyl phthalate resin has a photopolymerizable group, whereby a fingerprint-resistant photocurable composition which is more excellent in fingerprint durability can be obtained. The (A) polyether-containing amide-based decanoic acid ethyl ester 10 resin having such a photopolymerizable group can be obtained by using (a') polyisocyanate or (b) poly(alcohol) containing an epoxy group having a carbon number of 3 or more. And (c) a hydroxyl group-containing and photopolymerizable group monomer obtained by an addition reaction. However, the polyether-containing hydroxyformate formate obtained as described above has the following formula: [Chemical Formula 4] 15 H〇

I II

—N—c 〜. One χ—R

[wherein X represents a polyether skeleton; and R represents a structure represented by hydrazine or CH3]. That is, (a,) polyisole vinegar, (b) polycondensation of an epoxy group containing 3 or more carbon atoms, and (c) a chlorooxy group and a photopolymerizable group 20 In the case of ruthenium addition reaction, polyisocyanuric acid and (8) contain a carbon number of 3, and the poly(tetra) which is epoxidized is subjected to an addition reaction. (4) 3 The wind-reducing and photopolymerizable group monomer may be a single photopolymerizable group monomer having one photopolymerizable soil, or may have two or more photopolymerization ports. g can be a photopolymerizable group monomer. Here, the photopolymerizable group may be an unsaturated double bond group or the like. The monofunctional photopolymerizable monomer may, for example, be (fluorenyl) hydroxyethyl acrylate, (hydroxy) hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, 2-hydroxy-3-(hydroxy) acrylate Phenoxypropionate and the like. Examples of the polyfunctional photopolymerizable monomer include (meth)acrylic acid glycerin diester, (meth)acrylic acid new pentaerythritol triester, and (meth)acrylic acid ditrihydroxypropane propane triester. Base) dipentaerythritol pentaester, sorbitol penta(meth)acrylate, and the like. In the preparation of (A) a polyether-containing urethane resin, (a) a polyisocyanate is used as the isocyanate when (c) a hydroxyl group-containing and a photopolymerizable group-containing monomer are used. By using (a,) a polyisocyanate to prepare (A) a polyether-containing skeleton urethane-containing resin, a urethane resin having both a framing skeleton and a photopolymerizable group can be prepared. By using the polyether-containing urethane-based resin obtained as described above, a fingerprint-resistant photocurable composition excellent in fingerprint durability and fingerprint durability can be obtained. In the fingerprint-resistant photocurable composition of the present invention, from the viewpoints of fingerprint resistance, fingerprint durability, surface hardness, and the like, (a, polyisocyanate, (9) is used. (A) The average molecular weight of the skeleton portion obtained by the addition reaction of the epoxy group having a carbon number of 3 or more and (4) the chlorooxy group and the photopolymerizable group-containing monomer is (A) the poly(tetra)-containing framework The urethane formic acid resin is more preferred. (2) In the preparation of the (A) polyether-containing urethane hydroxyacetate, in order to exhibit a state in which no free NCO group remains, that is, the NCO of the (a,) polyiso-acid vinegar may be used. The molar equivalent ratio of all the groups to (8) the epoxy group-containing polycarboxyl alcohol having 3 or more carbon atoms and (C) the hydroxyl group-containing hydroxy group and the photopolymerizable group-containing monomer, (a,) Polyisocyanate, (8) a polyether alcohol containing an alkylene oxide having a carbon number of 3 or more and 18 200900475, and (C) a hydroxyl group-containing and photopolymerizable group-containing monomer. In this case, it is preferable to make (a') polyisocyanate 丨~仞% by weight, (b) 94 to 30% by weight of polyether alcohol containing 3 or more carbon atoms, and ((:) hydroxyl group-containing and The photopolymerizable group monomer is polymerized in an amount of 5 to 30% by weight. 5 Another aspect of the fingerprint-resistant photocurable composition of the present invention includes (A) a polyether-containing amino group-based ethyl phthalate resin; a photopolymerizable polyfunctional compound; and (C) a photopolymerization initiator, wherein the (A) polyether skeleton amine decanoic acid ethyl ester resin contains a polyether-containing carboxylic acid having a carbon number of 3 or more The ethyl ester resin is a fingerprint-resistant photocurable composition prepared by subjecting (a, polyisocyanate) and a polyether alcohol containing an epoxy group having a carbon number of 10 3 or more to an addition reaction. In this case, (b) a polyether alcohol containing an alkylene oxide having 3 or more carbon atoms, preferably having a HLB value of less than 6 in the skeleton portion of the polyalcohol. The (A) polyether-containing urethane resin is subjected to addition 15 reaction by (a, polyisocyanuric acid, and (b) poly(octanol) having an alkyl group having a carbon number of 3 or more. A polyether-containing backbone urethane resin prepared. Further, it is used for preparing a poly(alcohol) containing an epoxy group having a carbon number of 3 or more and having an average molecular weight of less than 1 Å. This is because the (A) polyether-containing urethane resin is prepared by using (a') polyisocyanate and not using (c) a hydroxyl group-containing and photopolymerizable group monomer. '2 or more or (b) an alcohol having an epoxy burn of 3 or more carbon atoms reacts with a majority of the isocyanate groups of the (a') polyisocyanate, whereby (b) the poly(mysteryl alcohol) The average molecular weight is less than 丨〇〇〇, and the molecular weight of the obtained (A) poly-framework-containing urethane resin is also large enough to sufficiently exhibit fingerprint resistance, such as most polyether skeletons contained in the molecule. In total, the average molecular weight after 19 200900475 will be 1000 or more. At this time, the HLB value (Davids method) of the polyhydric alcohol skeleton portion of the polyhydric alcohol is preferably less than 6. Further, (b) the average molecular number of the polyether alcohol containing an epoxy group having 3 or more carbon atoms, and more preferably 7 Å or more. In addition, the reason why the fingerprint-resistant property is excellent by containing the polyether-containing urethane resin is not limited to the theory, but it is considered to be a ring having a hydrophobic carbon number of 3 or more in the molecule. The oxane and the hydrophilic urethane bonding portion improve the affinity for the lipid component of the obtained coating layer, thereby improving the fingerprint resistance. (10) The polymerizable multifunctional photo-curable composition of the present invention is characterized by containing (A) a polyether-containing amide-based phthalic acid ethyl ester resin. Further, the coating film forming component is not particularly limited as long as it is a photocurable component. Such a fingerprint-resistant photocurable composition preferably contains a photopolymerizable polyfunctional compound. (B) The photopolymerizable polyfunctional compound functions as a coating film forming component. Further, by containing the (B) photopolymerizable polyfunctional compound, the photocurability of the fingerprint-resistant photocurable composition can be improved, and the mechanical strength of the obtained coating layer can be improved. (B) The photopolymerizable polyfunctional compound is a compound having two or more photopolymerizable groups in one molecule. A compound having two molecules of 20 or more (meth) acryloyl fluorenyl groups can be used as the (B) photopolymerizable polyfunctional compound. (B) The photopolymerizable polyfunctional compound is preferably a compound having three or more (fluorenyl) acrylonitrile groups. Further, the (B) photopolymerizable polyfunctional compound may be a monomer or a low polymer as long as it has a compound having two or more (meth) acryloyl groups. 20 200900475 Monomers can be exemplified by (meth)acrylic acid ethylene glycol diacetate, (meth)acrylic acid

(4) Trimethyl methacrylate, dimethyl ketone (meth) acrylate, hexanol, etc. (meth) acrylate polyol vinegar or its epoxy-fired modified material; iso-cyanuric acid ring Oxygen-burning modified material (meth)acrylic acid di- or triacetic acid. The oligomeric D material may be a low polymer such as (mercapto)acrylic acid polyacetic acid, (meth)acrylic acid epoxy, or (meth)acrylic acid. Further, these low polymers which can be used as the (9) photosynthetic polyfunctional compound preferably have a number average molecular weight of from 300 to 5,000, more preferably from 5 Å to 3 Å. If it is greater than 5 〇〇〇, it will become high viscosity and it will be difficult to handle. 15 (B) photopolymerizable polyfunctional compound may be used alone or in combination

It is preferable to use a monomer having three or more photopolymerizable groups in one molecule as the (B) photopolymerizable polyfunctional compound. By using such a monomer, the mechanical strength of the obtained coating layer can be further improved. The preferred (B) photopolymerizable polyfunctional compound may, for example, be neopentyl neoprene triester, oxydihydrocarbyl propane EO modified triester, dipentaerythritol pentaerythritol, Dipentaerythritol hexaacrylate and the like. The (B) photopolymerizable polyfunctional compound is preferably used in an amount of from 5 Å to 99.8% by weight (solid content by weight) 21 200900475, based on the solid content of the fingerprint-resistant photocurable composition. (B) When the amount of the photopolymerizable polyfunctional compound is less than 50% by weight, the physical strength such as scratch resistance and surface film hardness may be poor. (C) Photopolymerization 丨 丨 丨 The fingerprint-resistant photocurable composition of the present invention preferably contains (c) a photopolymerization initiator. By the presence of the (C) photopolymerization initiator, the polymerizability of the fingerprint-resistant photocurable composition irradiated to the active amount line can be improved. (C) The photopolymerization initiator may, for example, be an alkyl ketone photopolymerization initiator, an oxidized tyrosyl phosphine photopolymerization initiator, a titanocene photopolymerization initiator, or an oxime ester polymerization initiator. The alkylphenone-based photopolymerization initiator may, for example, be 2,2-10 dimethoxy-1,2-diphenylethane ketone, hydrazine-hydroxy-cyclohexyl-phenyl ketone, and 2 benzyl-2-indole 1-phenyl-propane ketone, hydroxyethoxy) phenyl] 2 hydroxy-2-mercapto-1-propane ketone, 2 hydroxy 44444-(2-hydroxy-2-indenyl propyl醯)_dipropen ethylenedione]phenyl}-2-methyl-propan-1-one, 2-methyl-1-(4-methylthiophenyl)-2-morpholinepropane_ι-ketone, 2-Diphenylethylenedione-2-dimethylamine_ι_(4_15morpholinylphenyl)·butanone-1,2-(dimethylamine)-2-[(4-methylphenyl)methyl]- I-[4_(4-Mercapto)phenyl]-1-butanthine and the like. The ruthenium oxyphosphine-based photopolymerization initiator may, for example, be 2,4,6-trimethylbenzimidium-diphenylphosphine oxide or bis(2,4,6-trimethylbenzhydrazide)-oxidation. Phenylphosphine and the like. The titanocene-based photopolymerization initiator may, for example, be bis(??5-2,4-cyclopentadienyl)di(2,6-difluoro+20yl)phenyl) titanium or the like. The oxime ester type polymerization initiator may, for example, be 1,2-dienedione, 1-[4-(phenylthio)-, 2-(o-benzamide), ethyl ketone, i-[9_ Ethyl_6·(2_methylbenzhydrazide)-9Η-oxazol-3-yl]-,1-(0-acetamidine), oxyphenylacetic acid, 2·[2_oxyl-2-benton Ethyl ethoxy ethoxy] ethyl acetonate, 2-(2-ethoxylated) ethane g. In addition, monophenyl ketone, 2,4,6-trimethyldiphenyl ketone, benzamidine 22 200900475 : 2::::, 2,4-diethyl thioxanthone, 2-B can also be used. Based on onion, 樟, etc. These photopolymerization initiators may be used alone or in combination of two or more. J "And in the photopolymerization initiator, to use 2 via the base - HiHi sister cyclohexyl phenyl, 2 ^ (1 A = yl) · 2- 琳 二 II H, like dioxane The base-1,2-diphenylethyl ketone is more preferably. The solid content of the fingerprint-resistant photocurable composition is 10 15 20 . The light-based initiator is used in an amount of 1 to 20% by weight (solid content by weight). (6) When the amount of the photopolymerization initiator deviates from the above range, the photocurability is not sufficient, and the physical strength is not good. Other components The fingerprint-resistant photocurable composition of the present invention may also be used as needed. A compound having one ethylenic unfluorenyl group is mixed with the compound. The intimate property, hardness, and recording property of the obtained (four) layer can be adjusted by containing the undole compound. The compound having a (10) ethylenically unsaturated group can be mentioned. (meth)acrylic acid vinegar compound having a cyclic structure soil such as (meth)acrylic acid cyclohexanoic acid, (meth) acrylic acid vinegar, (meth)acrylic acid tetrahydroanthracene vinegar; (meth)acrylic acid 2_Surprising B_, (meth)acrylic acid 2- succinct (meth)acrylic acid (4); (meth)acrylic acid phenoxyacetic acid, etc. (meth)acrylic acid brewing compound; (meth)acrylic acid ethylene glycol monoester, (mercapto)acrylic acid methoxyethylene glycol monoester (mercapto)acrylic acid tetraethylene glycol-vinegar, a (meth)acrylic acid monoester of a diol such as (meth)acrylic acid tripropylene = alcohol monoacetate; a vinyl compound such as N_vinyl bromo ketone or a group of ethylene caprolactam, etc. 23 200900475 The fingerprint photocurable composition may optionally contain an inorganic filler. The inorganic filler may further improve the chemical scratch resistance and the surface film hardness of the coating layer. For example, a metal filler may be used. Examples of the metal include, for example, Si, Ti, A1, 5 Zn, Zr, In, Sn, Sb, etc. Specific inorganic fillers include, for example, sulphur dioxide, oxidized zirconia, zirconia, titanium oxide, and the like. It is more preferable that the inorganic filler has an average particle diameter of about 5 to 50 nm. When an inorganic filler is used, the solid component weight of the fingerprint-resistant photocurable composition is about 1 to 50% by weight. Preferably, the inorganic filler content exceeds 50 When the amount is 10%, the strength of the coating film obtained may be weakened. The fingerprint-resistant photocurable composition of the present invention may further contain an organic solvent as a diluent solvent as needed. Examples of such an organic solvent include: Specific examples of the solvent which can be used are, for example, aromatic solvents such as toluene and xylene; aliphatic solvents such as hexane, heptane, octane, and mineral spirits; mercaptoethyl ketone, 15 acetone, and methyl isobutylene. a ketone solvent such as a ketone or a cyclohexanone; diethyl ether, diisopropyl ether, tetrahydrogen, furan, dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dioxime ether, Ether solvent such as diethylene glycol diethyl ether, propylene glycol monoterpene ether, phenyl ether, phenyl ether; ester solvent such as ethyl acetate, butyl acetate, isopropyl acetate or ethylene glycol diacetate; Amidoxime solvent such as carbamide, diethyl 20-mercaptoamine, dimethyl sulfoxide or N-methylpyrrolidone; methyl seroton, ethyl serosol, butyl suelu, etc. Sol Su solvent: ether ester solvent such as propylene glycol monodecyl ether acetate or propylene glycol monoethyl ether acetate; methanol Alcohol solvents such as ethanol, propanol and the like; dichloro Yue, dichloroethane, halogen-based solvents such as chloroform and the like. These solvents may be used alone or in combination with 24 200900475. The fingerprint-resistant photocurable composition of the present invention may further contain a photopolymerization initiation auxiliary agent, an antistatic agent, an organic filler, a polymerization inhibitor, an antioxidant, an external line absorber, a light stabilizer, an antifoaming agent, and a dyeing agent. Additives such as agents and pigments. For example, a photopolymerization initiation assistant which can be suitably used may, for example, be ethyl 4-diamine benzoate, isoamyl 4-diguanamine benzoate, dibutylethanolamine or decyldiethanolamine. Ke fingerprint photo-curing 'H: fine-grained material The fingerprint-resistant photocurable composition of the present invention contains at least (A) a poly- 10 skeletal urethane resin, (B) a photopolymerizable polyfunctional compound, and (C) Photopolymerization initiator. Then, by using the fingerprint-resistant photocurable composition of the present invention, even if only a single layer is formed, the fingerprint resistance is excellent, and the scratch resistance 'surface film hardness and fingerprint durability are excellent. Coating layer. Further, the fingerprint-resistant photocurable composition of the present invention is photocurable. Therefore, there is an advantage in that the coating layer is formed without heating it. The optical display device also contains a plurality of low-calorie components such as a resin film. The fingerprint-resistant photocurable composition of the present invention has an advantage that the coating layer can be formed well even in the case of an optical display device and a resin film containing such a low heat-resistant member. The fingerprint-resistant photocurable composition of the present invention can be prepared by mixing the above-mentioned forming tools. Further, when the composition is prepared, an organic solvent which can be used for dilution can also be used as needed. Further, the fingerprint-resistant photocurable composition of the present invention may be used diluted or used without dilution. 25 200900475 The preparation method of the fingerprint-resistant photocurable composition can be carried out, for example, by mixing the above (A) polyether skeleton-containing amine decanoic acid ethyl ester resin, (B) photopolymerizable polyfunctional compound, (C) photopolymerization The initiator is prepared by adding an additive and an organic solvent as needed. 5 The fingerprint-based photocurable composition of the present invention contains 0.1% to 30% by weight of (A) polyether-containing urethane resin when not containing a reactive inorganic filler; (B) Light 50 to 99.8% by weight of the polymerizable polyfunctional compound; and (C) photopolymerization initiator 0 to 1 to 20% by weight of 10 (however, the component% by weight is based on the weight of the solid component in the composition, and each component is The amount of the solid component in a total amount of 100% by weight or more is more preferably. Further, in the case where the reactive inorganic filler of the present invention contains a reactive inorganic filler, each component contains 0.1 to 30% by weight of a 15 (A) polyether-containing urethane resin; (B) 50 to 99.7% by weight of the photopolymerizable polyfunctional compound; (C) 0.1 to 20% by weight of the photopolymerization initiator; and 0.1 to 50% by weight of the reactive inorganic filler (however, the aforementioned component% by weight is in the composition) The amount of the solid component is preferably 20, and the total solid content of each component is 100% by weight. Further, it is preferable that the fingerprint-resistant photocurable composition of the present invention does not contain any of a polyoxon-based additive and a fluorine-based additive. This is because these additives have the effect of improving the water repellency and oil repellency of the obtained coating layer, and the effect of the two anti-staining properties is In the oily interval, the fat component attached to the coating layer (4) is excluded, but the conspicuousness is changed. Read ####################################################### The finger-resistant film has a "substrate and". «The layer formed by the aforementioned fingerprint-resistant photocurable composition is formed by the presence of the layer. It can be used for modulating the fingerprint film. As the transparent substrate, for example, a TAC film, a polyethylene terephthalate (ρΕτ) film, a diacetate fiber, a ruthenium film, a Sf acid butyrate film, a poly(tetra) film, and a polypropylene can be used. Resin film, urethane urethane resin film, poly s film, polycarbonate secret, poly stone film, 4 ether film, polymethylpentene film, poly sputum film, (methyl) propyl Various transparent plastic films such as dilute nitrile film, and it is preferable to use polyethylene terephthalate as a transparent substrate. In addition, although the thickness of the transparent substrate can be selected at the right time, it can be used as follows: 25~1000 &quot The coating layer having the fingerprint resistance is formed by applying the fingerprint-resistant photocurable composition onto a transparent substrate. The coating method of the fingerprint-resistant photocurable composition can be visually observed. The conditions of the fingerprint photocuring composition and the coating step are selected as appropriate, and can be, for example, Dip coating method, air knife coating method 20, curtain coating method, roller coating method, ring bar coating method, gravure coating method or extrusion coating method (this method is described in US Pat. No. 2,681,294 The method is followed by coating, and then the fingerprint-resistant photocurable composition coated on the transparent substrate is cured by exposure to active energy rays, thereby forming a fingerprint-resistant 27 200900475 coating layer. The irradiation at the time of irradiation with a wavelength of 200 to 250 nm is preferably 0.5 to 240 seconds. Further, by applying the fingerprint-resistant photocurable composition of the present invention to the surface of an optical display device, it is possible to optically 5 coating layers are formed on the surface of the display device. The optical display device in which the coating layer can be provided using the fingerprint-resistant photocurable composition of the present invention may be a liquid crystal display device, a CRT (Cathode Ray Tube) display device, or a touch panel. A display or the like can be applied to the surface of the optical display device 10 by applying the fingerprint-resistant photocurable composition of the present invention to various transparent plastic films, transparent plastic plates, glass, and the like which can be used for the surface of the light-rotating display device. Coating on The coating method of the fingerprint-resistant photocurable composition may, for example, be a spin coating method, a dip coating method, a gravure coating method, a spray coating method, a roll method, a brush coating method, or the like. It is preferable to select an appropriate coating method for the type of optical display device. It is preferable to apply the coating layer having a thickness of 0.1 to 20/zm in the coating of the fingerprint-resistant photocurable composition. The fingerprint-resistant photocurable composition coated on the surface of the optical display device is cured by exposure to active energy rays, thereby forming a fingerprint-resistant coating layer. It is preferable that the light of 〇〇~25〇 nm is irradiated for 0_5 to 240 seconds. [Examples] The present invention will be more specifically illustrated by the following examples, but the invention is not limited thereto. In the examples, "parts" and "%" are based on the weight basis unless otherwise stated. _Box·Framework Aminocarbamate oxime (1) 诵 28 28 200900475 Parts of the weight shown in Table 2 (a) isocyanate, (b) polyether alcohol, and (c) hydroxyl-containing and light After the polymerizable group monomer was added to the reaction vessel, then dibutyltin laurate 100 pm as a catalyst, hydroquinone 1000 ppm as a polymerization inhibitor, and methyl isobutyl ketone as a solvent (MIBK) were added. Then, the solid content was 40% by using 5, and the mixture was mixed with air for 8 hours at 80 ° C to obtain a polyether-containing amide-based decanoic acid ethyl ester resin (1). Production Example 2 to Production Example 18 Except for the parts by weight shown in Tables 2 to 4, the same as in Production Example 1, the polyether-containing urethane resin 10 (2) was obtained. ~(18). Comparative Production Examples 1 to 6 Except for the parts by weight shown in the respective component use tables shown in Table 5, the same procedures as in Production Example 1 were carried out to obtain a polyether-containing urethane resin (19) to (24). . 15 20 29 200900475 [Table 2] Table 2 Production Example 1 Production Example 2 Production Example 3 Production Example 4 Production Example 5 Production Example 6 (a) Type of isocyanate IPDI IPDI IPDI IPDI IPDI IPDI IPI (a) molecular weight 222 222 222 222 222 222 (a) parts by weight 222 222 222 222 222 222 (b) structure of polyether alcohol PO PO PO PO EO-PO-EO EO-PO-EO (b) average molecular weight (Mw) 1000 1000 2000 2000 1000 1000 (b) The number of repetitions 17.2 17.2 34.4 34.4 17.6 17.6 PO 17.2 17.2 34.4 34.4 15.9 15.9 EO - - - - 1.8 1.8 EO ratio (%) - - - - 10% 10% (b) of the polyol skeleton HLB value 4.4 4.4 1.8 1.8 5.2 5.2 Average molecular weight (sum) of the polyether skeleton portion of (A) 1000 2000 2000 4000 1000 2000 (b) Parts by weight 1000 2000 2000 4000 1000 2000 (C) Hydroxy group-containing and photopolymerization Base monomer PETA* _ PETA* PETA* - (C) parts by weight 450 - 450 - 450 - Polyether skeleton urethane resin (1) (2) (3) (4) (5) (6 30 10 200900475 [Table 3] Table 3 Manufacturing Example 7 Manufacturing Example 8 Manufacturing Example 9 Manufacturing Example 10 Manufacturing Example 11 Production Example 12 (a) Type of isocyanate IPDI IPDI IPDI IPDI IPD I IPDI (a) molecular weight 222 222 222 222 222 222 (a) parts by weight 222 222 222 222 222 222 (b) structure of polyether alcohol EO-PO-EO EO-PO-EO EO-PO-EO EO- PO-EO EO-PO-EO PTMG (b) Average molecular weight (Mw) 2450 2900 2900 2100 2800 1000 (b) Repeat number 44.3 55.3 55.3 38.0 53.4 13.9 PO 35.5 33.2 33.2 30.4 32.0 - EO 8.9 22.1 22.1 7.6 21.4 - EO% (%) 20% 40% 40% 20% 40% - (b) The HLB value of the polyol skeleton portion 4.6 9.3 9.3 4.9 9.2 -1.3 (A) The average molecular weight (sum) of the polyether skeleton portion 4900 2900 5800 4200 5600 1000 (b) Parts by weight 4900 2900 5800 4200 5600 1000 (C) Hydroxy group-containing and photopolymerizable group monomers _ PETA* • _ PETA* (C) parts by weight - 450 - - - 450 Polyether-containing amino phthalate resin (7) (8) (9) (10) (11) (12) 31 10 200900475 [Table 4] Table 4 Manufacturing Example 13 Manufacturing Example 14 Manufacturing Example 15 Manufacturing Example 16 Manufacturing Example 17 Production Example 18 (a) Type of isocyanate IPDI MDI MDI HMDI HMDI IPDI (a) molecular weight 222 250 250 168 168 222 (a) parts by weight 222 250 250 168 168 222 (b) structure of polyether alcohol PTMG PO PO PO PO PO (b) average molecular weight (Mw) 1000 1000 1000 1000 1000 700 (b) repeat number 13.9 17.2 17.2 17.2 17.2 12.0 PO - 17.2 17.2 17.2 17.2 12.0 EO - - - - - - EO ratio (%) - - - - - - (b) The HLB value of the polyol skeleton portion - 1.3 4.4 4.4 4.4 4.4 5.2 The average molecular weight (sum) of the polyether skeleton portion of (A) 2000 1000 2000 1000 2000 1400 (b) Parts by weight 2000 1000 2000 1000 2000 1400 (C) Hydroxy-containing and photopolymerizable monomers _ PETA* _ PETA* • - (C) parts by weight - 450 - 450 - - Polyether skeleton amino citric acid Ethyl acetate resin (13) (14) (15) (16) (17) (18) 32 10 200900475 [Table 5] Table 5 Comparative Manufacturing Example 1 Comparative Production Example 2 Comparative Production Example 3 Comparative Production Example 4 Comparative Production Example 5 Comparative Production Example 6 (a) Type of isocyanate IPDI IPDI IPDI IPDI IPDI IPDI IPDI (a) molecular weight 222 222 222 222 222 222 (a) parts by weight 222 222 222 222 222 222 (b) structure of polyether alcohol EO PO PO PO PO PO (b) average molecular weight (Mw) 1000 134 134 400 400 700 (b) repeat number 22.7 2.0 2.0 6.9 6.9 12.0 PO - 2.0 2.0 6.9 6. 9 12.0 EO 22.7 - - - - - EO ratio (%) 1005 - - - - - (b) The HLB value of the polyol skeleton portion 14.5 6.7 6.7 6.0 6.0 5.2 (A) The average molecular weight of the polyether skeleton portion (Total) 2000 134 268 400 800 700 (b) parts by weight 2000 134 268 400 800 700 (C) Hydroxy-containing and photopolymerizable monomers - PETA* - PETA* - PETA* (C) parts by weight - 450 - 450 - 450 Polyether skeleton amino decanoic acid ethyl ester resin (19) (20) (21) (22) (23) (24) In the above Tables 2 to 5, 5 IPDI · · diisocyanate Dukethone ester MDI: diphenyl decyl diisocyanate HMDI : hexamethylene diisocyanate PO : polypropylene glycol backbone EO : polyethylene glycol backbone 10 PTMG: polybutane diol backbone PETA* : new acrylic acid Mixture of pentaerythritol triester and neopentyl pentoxide tetraester (mixing weight ratio 60 : 40) 33 200900475 "Repeat number of (b)" as shown in Tables 2 to 5, calculated using the above average molecular weight . The HLB value of the polyol skeleton portion (b) described in Tables 2 to 5 is a value calculated by the Davis method using the formula described in the present specification. 5 Example 1 Modification of the fingerprint-resistant light-lightening composition (1) 3 parts by weight of the polyether-containing urethane resin (1) obtained in Production Example 1 and pentaerythritol acrylate And a mixture of pentaerythritol tetraacrylate (mixing weight ratio 60: 40) 97 parts by weight, and 2-methyl-1[4-(methylthio)phenyl]-2-morpholinepropane-1,7 After the parts by weight, MIBK was then adjusted as a solvent to 40% by weight to obtain a fingerprint-resistant photocurable composition. After the obtained composition was applied onto a PET film (thickness 100/m) by a coating bar (Νο·12), it was removed in order to make the dried film thickness 5 y (Zni and heated at 80 ° C for 1 minute). After drying the solvent, the coating layer was formed by exposure to an ultraviolet light having an energy of 300 mJ/cm 2 by a high-pressure mercury lamp (120 W/cm) to obtain a coating layer, thereby obtaining a fingerprint-resistant film. Examples 2 to 18 Fingerprint-resistant photocurable composition [2) to Π U$ In addition to the use of the polymymond-containing urethane resin (2) to (18) obtained in Preparation Examples 2 to 18, 3 parts by weight The fingerprint-resistant photocurable composition was obtained in the same manner as in Example 1 except that the polyacrylamide-containing ethyl phthalate resin (1) obtained in Production Example 1 was used. Further, after the coating layer was formed in the same manner as in Example 1, a fingerprint-resistant film was obtained. Comparative Examples 1 to 6 Modification of the deuterated composition was carried out except that 3 parts by weight of the poly-framework-containing urethane resin (19) to (24) obtained by Comparative Production Examples 1 to 6 were used. The photohardenable composition was obtained in the same manner as in Example 1 except that the obtained polyether skeleton amino decanoic acid ethyl ester resin (1) was used. Further, a film was formed in the same manner as in Example 1 to obtain a film. Comparative Example 7 5 Mixture of mixed neopentyl alcohol triacrylate and neopentyl glycol tetraester (mixing weight ratio 60: 40) 100 parts by weight, and 2-methyl-1[4-(methylthio)benzene After 7 parts by weight of 2-morpholinopropan-1-one, the MIBK was adjusted as a solvent so that the nonvolatile content was 40% by weight, that is, a photocurable composition was obtained. After the coating layer was formed in the same manner as in Example 1 using the obtained composition, 10 was obtained. The evaluation of the sample having the obtained coating layer was carried out as described below. In addition, the results obtained by the evaluation methods are shown in the following table. The haze (haze) and the total light transmittance were measured by using a haze meter (manufactured by Suga Test Instruments Co., Ltd.), and the diffusion transmittance of the sample (Td (%)) and the total light transmittance (Tt (%)) were measured. Calculate the haze value. The total light transmittance (%) and the haze (%) shown in Tables 6 to 9 are the values measured for the 100 μm thick PET film portion used as the substrate when the coating layer is prepared. . [Number 1] 20 Η (%) X 10 0 Η : Haze (haze) (%)

Td: diffuse transmittance (%)

Tt: total light transmittance (%) Oleic acid wiping evaluation (fingerprint resistance) 35 200900475 A drop of oleic acid was dropped on the coating layer of the obtained sample. Next, use a wipe to wipe it once, 10 times, 20 times, and 30 times. The yaw value of the △ was determined by evaluating the haze of the sample before the test and after the evaluation test according to the above measurement. The resulting △ haze value is shown in the table. The smaller the Δ haze value, the better the rubbing property of the oil component, that is, the better the fingerprint resistance. Resistance to SW evaluation Under the load of lg/cm2, steel wool of #0000 was reciprocated 10 times, 30 times, 50 times, 100 times, and 200 times on the coating layer of the obtained sample. According to the above-mentioned measurement, the haze of the sample before and after the evaluation of the test was evaluated, and the value of △ haze was obtained. The obtained Δ haze value is shown in the table. The smaller the Δ haze value, the better the surface hardness, and the occurrence of scratches on the coating layer. Adhesion evaluation A total of 100 grids were produced by dicing a slit of 11 mm in a vertical direction of 1 mm on the coating layer of the obtained sample with a knife. Next, the transparent tape Nichiban Cellotape (registered trademark) was completely adhered from above, and was peeled off in a 45-degree direction with respect to the film, and then evaluated based on the number of lattices completely remaining on the film. 20 36 200900475 [Table 6] Table 6 Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Polyether skeleton aminoacetic acid ethyl acetate resin (1) (2) (3) (4) ( 5) (6) Haze (%) 0.5 0.4 0.5 0.5 0.3 0.3 Total light transmittance (%) 91 91 92 91 91 91 Resistance to 1 -0.1 0.1 0.1 0.0 0.1 0.1 Refers to 10 times -0.1 0.1 0.1 0.0 0.2 0.1 Grain 20 Time 0.2 0.1 0.1 0.0 0.2 0.1 sex 30 times 0.2 0.4 0.3 0.0 0.4 0.1 Round trip resistance 10 times -0.1 0.1 0.0 0.2 0.2 0.3 S Round trip 30 times 0.2 0.1 0.3 0.2 0.3 0.4 W Round trip 50 times 0.2 0.1 0.3 0.3 0.4 0.3 Round trip 100 Time 0.3 0.4 0.3 0.3 0.4 0.4 Round trip 200 times 0.4 0.4 0.4 0.4 0.5 0.5 Adhesion evaluation 100/100 100/100 100/100 100/100 100/100 100/100 [Table 7] Table 7 Example 7 Example 8 Implementation Example 9 Example 10 Example 11 Example 12 Polyether skeleton amino phthalate resin (7) (8) (9) (10) (11) (12) Haze (%) 0.5 0.5 0.5 0.5 0.4 0.5 Light transmittance (%) 92 92 91 92 91 92 Resistance 0.0 0.0 -0.1 0.0 -0.1 0.4 10 times 0.0 0.0 0.0 0.0 -0.3 0.0 20 times 0.0 0.2 0.0 0.1 -0.3 0.1 30 times 0.1 0.2 0.0 0.0 -0.2 0.1 and only 10 times 0.0 0.3 0.3 0.1 -0.3 0.3 S round trip 30 0.2 0.3 0.4 0.2 0.2 0.3 W round trip 50 times 0.3 0.4 0.4 0.3 0.2 0.4 round trip 100 times 0.3 0.5 0.4 0.4 0.3 0.4 round trip 200 times 0.4 0.5 0.5 0.4 0.4 0.5 adhesion evaluation 100/100 100/100 100/100 100/100 100/100 100/100 37 200900475 [Table 8] Table 8 Example 13 Example 14 Example 15 Implementation Example 16 Example 17 Example 18 Polyether skeleton urethane resin (13) (14) (15) (16) (Π) (18) Haze (%) .- 0.4 0.4 0.5 0.5 0.5 0.5 Full light transmission Rate (%) 92 91 91 92 92 92 Finger resistance 1 time 0.1 0.3 -0.1 0.0 0.0 — 0.0 0.1 0.4 0.0 0.5 0.0 -0.1 Grain 20 times 0.1 0.4 0.0 0.9 0.1 -0.1 Degree 30 times 0.2 0.5 0.0 1.0 0.1 ^ 0.0 Resistance SW round trip 10 times 0.1 0.3 -0.1 0.1 0.1 0.0 round trip 30 times 0.3 0.3 0.0 0.1 〇.1 1 0.2 round trip 50 times 0.3 0.3 0.3 0.1 0.4 0.3 round trip 100 times 0.3 0.4 0.3 0.2 0.4 0.3 round trip 200 attack 0.4 0.5 0.3 0.3 0.5 0.4 Reverse evaluation 100/100 100/100 100/100 100/100 ϊοο/ιοό^ 100/100 [Table 9]

The fingerprint-resistant film obtained by the fingerprint-resistant and hardenable composition of the examples has a high light-weight material and a high-transparency film, and is excellent in the index-resistant SW (four). Correction, the actual age of the close contact ^ 38 200900475 is also very good. On the other hand, the film obtained by the comparative example was inferior in fingerprint resistance. [Industrial Applicability] By using the fingerprint-resistant photocurable composition of the present invention, it is possible to provide a coating layer having excellent fingerprint resistance on the surface of an optical display device or the like in a simpler manner. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention is also excellent in transparency, and is very suitable for use on the surface of an optical display device or the like. The coating layer obtained by the fingerprint-resistant photocurable composition of the present invention has excellent scratch resistance and surface film hardness. Further, since the fingerprint-resistant photocurable composition of the present invention is photocurable, it is easier to form such a coating layer having excellent properties on the surface of an optical display device. By using the fingerprint-resistant photocurable composition of the present invention, there is an industrial advantage in that a coating layer excellent in production efficiency and manufacturing cost can be formed. Further, the coating layer can maintain fingerprint resistance for a long period of time and is excellent in durability against fingerprints. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view of a fingerprint film of the present invention. [Description of main component symbols] 1··. Fingerprint resistant film 5... Transparent substrate 3. · · Finishing layer 39

Claims (1)

200900475 X. Patent application scope: 1. A fingerprint-resistant photocurable composition containing (A) a polyether-containing urethane resin, and the polyether-containing amide-based phthalate resin containing carbon The alkylene oxide having a number of 3 or more has a structure represented by the following formula, and the average molecular weight of the polyether skeleton portion is 1000 or more (but when a plurality of polyether skeleton portions are present in the molecule, the total number may be the same) The average molecular weight after the polyether skeleton portion, [Chemical Formula 1] Η Ο I II 10 -Ν-c-〇-X-R [wherein, X represents a polyether skeleton; R represents hydrazine or CH3]. 2. The fingerprint photocurable composition according to claim 1 of the patent application, comprising the above (A) polyether-containing urethane resin; (B) photopolymerizable polyfunctional compound; and (C) The photopolymerization initiator, 15 and the (A) polyether skeleton urethane resin is added by (a) an isocyanate and (b) a polyether alcohol containing an alkylene oxide having 3 or more carbon atoms. The polyether-containing urethane resin obtained by the reaction is obtained. 3. The fingerprint-resistant photocurable composition according to claim 1 or 2, wherein the (A) polyether-containing urethane resin is (a') polyisocyanate, (b) a polyether alcohol containing a polyether alcohol having 3 or more carbon atoms, and (c) a polyether skeleton-containing amine decanoic acid ethyl ester resin obtained by an addition reaction of a hydroxyl group-containing and photopolymerizable group monomer, but The polyether-containing backbone urethane resin is conditioned on the structure represented by the following formula: [Chem. 2] 40 200900475 [wherein X represents a polyether skeleton; R represents deuterium or CH3]. The female application is called the fingerprint range photo-curing composition of the second or third patent range. The secret of the above (4) contains the skeleton of the amino acid formic acid, and the (b) 3 has an epoxy number of 3 or more rabbits. The poly-alcohol has a HLB value (Davis method) of the polyol skeleton portion of less than 6. <RTI ID=0.0># </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; A polyether alcohol containing an alkylene oxide having 3 or more carbon atoms, and having a repeating number of 12 to 52. 6. The fingerprint-resistant photocurable composition of claim 2, wherein the uranium (A) polyether-containing urethane resin is 1 to 50% by weight of (&amp;) isocyanate and (b) A polyether-containing skeleton amino decanoic acid ethyl ester resin obtained by an addition reaction of 99 to 50% by weight of a polyether alcohol containing an alkylene oxide having 3 or more carbon atoms. 7. The fingerprint-resistant photocurable composition according to claim 3, wherein the (A) polyether-containing urethane resin is 1 to 40% by weight of (a,) polyisocyanate, (b) 94 to 30% by weight of a polyether alcohol containing an alkylene oxide having 3 or more carbon atoms, and (c) 5 to 30% by weight of a hydroxyl group-containing and photopolymerizable group monomer, which are obtained by an addition reaction Polyether backbone amine ruthenium phthalate is a resin. 8. The fingerprint-resistant photocurable composition of claim 1 containing (A) a polyether-containing urethane resin; a photopolymerizable 41 200900475 functional compound; and (c) photopolymerization In the initiator, the (A) polyether-containing urethane resin contains a polyether-containing urethane resin having a carbon number of 3 or more, and is made by (a') The polyisocyanate and (b) a polyether alcohol containing an alkylene oxide of 3 or more are subjected to an addition reaction. 9. The fingerprinting photocurable composition of claim 8 wherein (b) the polyether alcohol having an alkylene oxide having a carbon number of 3 or more has an HLB value of a polyhydric skeleton portion (Davids) Method) is less than 6. 10. The fingerprint-resistant photocurable composition 10 according to any one of claims 2 to 9, which comprises: (A) 0.1 to 30% by weight of a polyether skeleton-based phthalic acid ethyl ester resin; B) the photopolymerizable polyfunctional compound is 50 to 99.8% by weight; and (C) the photopolymerization initiator is 0.1 to 20% by weight, (however, the component weight % is based on the weight of the solid component in the composition, and The total solid content of each component was 100% by weight). A fingerprint-resistant film comprising a transparent substrate and a coating layer, wherein the coating layer is formed by the fingerprint-resistant photocurable composition according to any one of claims 1 to 10. Coating layer. 12. An optical display device for use in a coating layer formed by the fingerprint-resistant photocurable composition according to any one of claims 1 to 10 of claim 20 in the outermost layer of the display. 42