JP2008244266A5 - - Google Patents
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- Publication number
- JP2008244266A5 JP2008244266A5 JP2007084619A JP2007084619A JP2008244266A5 JP 2008244266 A5 JP2008244266 A5 JP 2008244266A5 JP 2007084619 A JP2007084619 A JP 2007084619A JP 2007084619 A JP2007084619 A JP 2007084619A JP 2008244266 A5 JP2008244266 A5 JP 2008244266A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- annealing
- forming
- piezoelectric layer
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000137 annealing Methods 0.000 claims 8
- 238000002425 crystallisation Methods 0.000 claims 4
- 230000008025 crystallization Effects 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 239000002243 precursor Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 230000001681 protective effect Effects 0.000 claims 3
- 239000003990 capacitor Substances 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007084619A JP5196106B2 (ja) | 2007-03-28 | 2007-03-28 | 圧電素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007084619A JP5196106B2 (ja) | 2007-03-28 | 2007-03-28 | 圧電素子の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012264698A Division JP2013077827A (ja) | 2012-12-03 | 2012-12-03 | 圧電素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008244266A JP2008244266A (ja) | 2008-10-09 |
| JP2008244266A5 true JP2008244266A5 (enrdf_load_stackoverflow) | 2010-02-04 |
| JP5196106B2 JP5196106B2 (ja) | 2013-05-15 |
Family
ID=39915212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007084619A Expired - Fee Related JP5196106B2 (ja) | 2007-03-28 | 2007-03-28 | 圧電素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5196106B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5549913B2 (ja) * | 2009-09-01 | 2014-07-16 | 株式会社リコー | 電気機械変換素子の製造方法 |
| GB2579039A (en) | 2018-11-15 | 2020-06-10 | Xaar Technology Ltd | Electrical component |
| GB2579041A (en) | 2018-11-15 | 2020-06-10 | Xaar Technology Ltd | Electrical component |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0492915B1 (en) * | 1990-12-17 | 1996-09-04 | Canon Kabushiki Kaisha | Cantilever probe and apparatus using the same |
| JPH1012751A (ja) * | 1996-06-27 | 1998-01-16 | Sharp Corp | 強誘電体記憶素子 |
| JP2000332209A (ja) * | 1999-05-21 | 2000-11-30 | Oki Electric Ind Co Ltd | Ｂｉ系強誘電体素子の製造方法 |
| JP2004311924A (ja) * | 2003-03-26 | 2004-11-04 | Seiko Epson Corp | 強誘電体キャパシタおよびその製造方法、強誘電体メモリ、圧電素子。 |
| JP2006246451A (ja) * | 2005-02-07 | 2006-09-14 | Kyocera Corp | 薄膜バルク音響波共振子およびフィルタならびに通信装置 |
| KR101101566B1 (ko) * | 2006-03-30 | 2012-01-02 | 후지쯔 세미컨덕터 가부시키가이샤 | 반도체 장치 및 그 제조 방법 |
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2007
- 2007-03-28 JP JP2007084619A patent/JP5196106B2/ja not_active Expired - Fee Related