JP2008244196A - Plot data generating method and storage medium storing plot data file - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide plot data having excellent processing efficiency, and to provide its generating method. <P>SOLUTION: In the plot data generating method for plotting by the use of charged particle beams from design data of a circuit, the plot data generating method comprises: a first data file generating step of generating a first data file containing size data indicating a size of a cell constituted of at least one figure and pattern data of the cell as a part of plot data; and a second data file generating step of generating a second data file containing arrangement position data indicating an arrangement position of the cell and the size data of the cell as a part of the plot data. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a drawing data creation method and a storage medium storing the created drawing data file, and more particularly to a drawing data creation method and data file used in an electron beam drawing apparatus.

  Lithography technology, which is responsible for the progress of miniaturization of semiconductor devices, is an extremely important process for generating a pattern among semiconductor manufacturing processes. In recent years, with the high integration of LSI, circuit line widths required for semiconductor devices have been reduced year by year. In order to form a desired circuit pattern on these semiconductor devices, a highly accurate original pattern (also referred to as a reticle or a mask) is required. Here, the electron beam (electron beam) drawing technique has an essentially excellent resolution, and is used for producing a high-precision original pattern.

FIG. 12 is a conceptual diagram for explaining the operation of the variable shaped electron beam drawing apparatus.
The variable shaped electron beam (EB) drawing apparatus operates as follows. First, the first aperture 410 is formed with a rectangular opening 411 for forming the electron beam 442. Further, the second aperture 420 is formed with a variable shaping opening 421 for shaping the electron beam 442 that has passed through the opening 411 into a desired rectangular shape. The electron beam 442 irradiated from the charged particle source 430 and passed through the opening 411 is deflected by a deflector. And it passes through a part of variable shaping | molding opening 421, and is irradiated to the sample mounted on the stage. The stage continuously moves in a predetermined direction (for example, the X direction) during drawing. Thus, a rectangular shape that can pass through both the opening 411 and the variable shaping opening 421 is drawn in the drawing region of the sample 440. A method of creating an arbitrary shape by passing both the opening 411 and the variable forming opening 421 is referred to as a variable forming method.

  In performing such electron beam drawing, first, a layout of a semiconductor integrated circuit is designed, and layout data (design data) is generated. Then, the layout data is converted, and drawing data to be input to the electron beam drawing apparatus is generated. Based on the drawing data, the data is further converted into data in a format in the electron beam drawing apparatus and drawn.

Here, a description of a technique for creating drawing data in which information including a combination of graphic information and graphic arrangement position information is arranged in one data file is disclosed in the literature (for example, patent literature) 1).
JP 2004-214538 A

  Along with the high integration of LSI, the amount of pattern data to be drawn is also increasing. Therefore, further efficiency is required in processing drawing data for input to the drawing apparatus in the drawing apparatus. Here, when the entire pattern drawn on the sample is viewed, generally, a plurality of chip data are often reconfigured and arranged. The drawing data described in Patent Document 1 is a data file in which basic pattern data and arrangement information are mixed and arranged together. However, this leaves a problem that it takes a long time to reconfigure the arrangement information because the degree of freedom of data is low.

  Therefore, although it is not publicly known, attempts have been made to improve the efficiency of data processing by configuring cell pattern data and arrangement data indicating the positions where the cells are arranged in separate files. That is, the pattern data defines the size of the cell and the shape, size, position, etc. of the graphic arranged in the cell, and the arrangement data defines the coordinate position where the cell is arranged. . Thus, there is an advantage that the reconfiguration process can be facilitated by configuring the files in separate files.

  Here, normally, for example, in order to confirm the layout status of a pattern arranged on the entire surface of the mask using the drawing data, the user sets an arbitrary area and sets the pattern defined in the area. There is a case where a process in which only an outline is arranged is displayed on a monitor or the like of the apparatus. However, the apparatus cannot select a cell to be displayed unless the arrangement coordinates of the cell origin and the cell size are known. In the arrangement data, only the origin position of each cell is shown. Therefore, when the cell origin position is outside the specified area, it is impossible to determine whether the cell enters the area without knowing the size of the cell. There is a case. Therefore, when performing this display processing, it is necessary for the arithmetic unit to read both the corresponding arrangement data and all the pattern data corresponding thereto. As described above, since the pattern data has an enormous amount of data, it takes a considerable amount of time for the processing, and there is a problem that the processing efficiency is poor. If the cell size is stored on the arrangement data side, reading the arrangement data file in advance, selecting the corresponding cell, and reading only the pattern data of the selected cell will reduce the overall processing time. Can do.

  In addition, when drawing data input into the drawing apparatus is converted into an internal format specific to the apparatus, the drawing area is virtually divided into a plurality of small areas, and the data is sorted into small areas. It is efficient if distributed processing is performed for each area. For this purpose, it is necessary to perform a process of distributing cells for each small area. Again, since the arrangement data only indicates the origin position of each cell, it cannot be determined whether or not the cell is in the area unless the size of the cell is known. For this reason, it is necessary for the arithmetic device to read both the arrangement data file and the pattern data file.

  On the other hand, for the pattern data, the cell size is required when the pattern data is divided into clusters or converted into an internal format unique to the apparatus. Therefore, it is desirable to define the cell size in the data. Alternatively, it is desirable to be able to refer to it immediately.

  As described above, there are various problems even when the pattern data and the arrangement data are configured in separate files.

  Accordingly, an object of the present invention is to overcome such problems and provide drawing data with excellent processing efficiency and a creation method thereof.

The drawing data creation method of one embodiment of the present invention includes:
In a drawing data creation method for drawing using charged particle beams from circuit design data,
A first data file creation step of creating a first data file including cell size data indicating the size of a cell composed of at least one figure and cell pattern data as part of drawing data;
A second data file creation step of creating a second data file including placement position data indicating the placement position of the cell and cell size data as part of the drawing data;
It is provided with.

  By defining the cell size data in the data file on the arrangement data side, it is not necessary to read a pattern data file having a huge amount of data when performing the above-mentioned problematic processing.

Alternatively, the following configuration is also suitable. That is, the drawing data creation method according to another aspect of the present invention includes:
In a drawing data creation method for drawing using charged particle beams from circuit design data,
A first data file creating step of creating a first data file including size data indicating the size of a cell composed of at least one figure and cell pattern data as part of drawing data;
A second data file creation step of creating a second data file including placement position data indicating the placement position of the cell and predetermined index data as part of the drawing data;
A third data file including link data for linking pattern data and arrangement position data and cell size data defined at a data position indicated by predetermined index data is created as a part of drawing data. 3 data file creation process,
It is provided with.

  With this configuration, it is possible to refer to a data file in which link data different from a pattern data file having a huge amount of data is stored.

Alternatively, the following configuration is also suitable. That is, the drawing data creation method according to another aspect of the present invention includes:
In a drawing data creation method for drawing using charged particle beams from circuit design data,
A first data file creating step of creating a first data file including cell pattern data composed of at least one figure and predetermined index data as part of drawing data;
A second data file creation step of creating a second data file including placement position data indicating the placement position of the cell and predetermined index data as part of the drawing data;
A third data file including link data for linking pattern data and arrangement position data and cell size data defined at a data position indicated by predetermined index data is created as a part of drawing data. 3 data file creation process,
It is provided with.

  In the case of such a configuration, the size data of the cell is obtained during the pattern data processing, and the data file in which the link data is stored is referred to. However, by defining the cell size data in one data file, the data amount of the entire drawing data can be reduced.

The drawing data file created as described above is stored in a storage medium for distribution or data transfer. That is, the storage medium storing the drawing data file of one aspect of the present invention is
In a storage medium storing a drawing data file for drawing a predetermined pattern on a sample using a charged particle beam,
A first data file including size data indicating the size of a cell composed of at least one graphic and cell pattern data;
A second data file including arrangement position data indicating cell arrangement positions and cell size data;
It is provided with.

Alternatively, the storage medium storing the drawing data file of another aspect of the present invention is
In a storage medium storing a drawing data file for drawing a predetermined pattern on a sample using a charged particle beam,
A first data file including size data indicating the size of a cell composed of at least one graphic and cell pattern data;
A second data file including arrangement position data indicating the arrangement position of the cells and predetermined index data;
A third data file including link data for linking the pattern data and the arrangement position data, and size data of the cell defined at the data position indicated by the predetermined index data;
It is provided with.

Alternatively, the storage medium storing the drawing data file of another aspect of the present invention is
In a storage medium storing a drawing data file for drawing a predetermined pattern on a sample using a charged particle beam,
A first data file including cell pattern data composed of at least one figure and predetermined index data;
A second data file including arrangement position data indicating the arrangement position of the cells and predetermined index data;
A third data file including link data for linking the pattern data and the arrangement position data, and size data of the cell defined at the data position indicated by the predetermined index data;
It is provided with.

  According to the present invention, in a process that requires only cell frame information and does not require cell graphic information, there is generally no need to read a cell pattern data file containing a large amount of graphic information. On the other hand, even when processing is performed on a cell pattern, it is possible to perform processing with cell pattern data alone. By squeezing the target data file required by each process, the data process can be efficiently performed as a whole.

  Hereinafter, in the embodiment, a configuration using an electron beam (electron beam) will be described as an example of a charged particle beam (charged particle beam). However, the charged particle beam is not limited to an electron beam, and may be a beam using charged particles such as an ion beam.

Embodiment 1 FIG.
FIG. 1 is a block diagram showing the main configuration of the drawing data creation apparatus according to the first embodiment.
In FIG. 1, a drawing data creation device 300 includes a cell arrangement data file creation circuit 310, a cell pattern data file creation circuit 320, a link data file creation circuit 330, a monitor 340, a storage device 350, an interface (I / F) circuit 362. 364. In FIG. 1, constituent parts necessary for explaining the first embodiment are shown. Needless to say, the drawing data creation apparatus 300 may normally include other necessary configurations.

FIG. 2 is a flowchart showing main steps of the method for creating electron beam drawing data according to the first embodiment.
As shown in FIG. 2, the drawing data 12 is created by converting the design data 10 by a drawing data creation device. The created drawing data 12 is input into the drawing apparatus. In FIG. 2, the electron beam drawing data creation method executes a series of steps of a cell arrangement data file creation step (S102), a cell pattern data file creation step (S104), and a link data file creation step (S106). .

  In manufacturing a semiconductor integrated circuit, first, a layout of the semiconductor integrated circuit is designed, and design data 10 is generated. Next, the design data 10 is converted by the drawing data creation device 300 to generate drawing data 12. In the design data 10, a plurality of cells are arranged on a chip, and one or more figures that are element patterns constituting the cells are arranged in each cell. In the created drawing data 12, the drawing area includes a chip layer, a frame layer obtained by virtually dividing the chip area into a strip shape in a certain direction parallel to the drawing surface, for example, the y direction, and a frame area having a predetermined size. A layer is divided into a series of a plurality of internal structural units such as a layer of blocks virtually divided into regions, a layer of cells described above, and a layer of figures that form patterns constituting the cells. Here, the chip area is divided into strips in the y direction (predetermined direction) for the frame, but this is only an example, and the chip area is divided in the x direction parallel to the drawing surface and perpendicular to the y direction. There may be cases. Alternatively, other directions parallel to the drawing surface may be used.

  First, the design data 10 is input to the drawing data creation apparatus 300 via the I / F circuit 362. In S (step) 102, as a cell arrangement data file creation step, the cell arrangement data file creation circuit 310 creates a cell arrangement data file as a part of the drawing data 12 based on the design data 10.

  In step S <b> 104, as a cell pattern information file creation step, the cell pattern data file creation circuit 320 creates a cell pattern data file as part of the drawing data 12 based on the design data 10.

  In S106, as a link information file creation step, the link data file creation circuit 330 creates a link data file as a part of the drawing data 12 based on the design data 10.

FIG. 3 is a diagram illustrating an example of drawing data according to the first embodiment.
When a pattern is drawn by the drawing apparatus, for example, the frame is drawn as a drawing unit. In FIG. 3, as an example, data located in a frame area identified by a number “n” in a certain chip will be described. Then, cell arrangement data, link data, and cell pattern data are created as the drawing data 12 for the frame. In FIG. 3, the drawing data 12 includes a cell arrangement data file 22, a link data file 24, and a cell pattern data file 26 as an example. These files are created for each frame. The drawing data 12 further includes a chip configuration file 20 that defines configuration information of each frame, parameters common to the entire chip, and the like for a chip configured with one or more frames. Further, FIG. 3 shows an example of a correspondence relationship between each data in the cell arrangement data file 22, the link data file 24, and the cell pattern data file 26. When a desired pattern is drawn on a sample, it is composed of one or more chips for one mask. In such a case, there are a plurality of chip data composed of these files, and has layout information for arranging them on the mask.

  The cell placement data file 22 includes placement data (placement information) for placing cells corresponding to the pattern data of a certain chip included in the design data 10. The cell arrangement data file 22 includes arrangement data for arranging any of the arranged cells for each block area. In FIG. 3, as an example, arrangement data for arranging any of the cells (i) to (l) that are part of the arranged cells is shown. The cell arrangement data is indicated by coordinates indicating the arrangement position of the reference point of the cell. In FIG. 3, a cell arrangement data file 22 is followed by a block (0, 0) header, cell arrangement data (p), cell arrangement data (q), and cells arranged in the block (0, 0). Arranged data (r), block (0, 1) header, cell arrangement data (s) arranged in block (0, 1), block (1, 0) header, arranged in block (1, 0) The cell arrangement data (t) is defined (stored). Other arrangement data is further stored.

FIG. 4 is a diagram illustrating an example of cell arrangement data in the first embodiment.
Each cell arrangement data 32 includes a cell size (S _X , S _Y ), cell arrangement coordinates (x, y), and a link data index (Km). The cell size (S _X , S _Y ) is an example of size data indicating the size of the cell. The cell arrangement coordinate (x, y) is an example of arrangement position data indicating the arrangement position of the cell. With this data, the cell arrangement data file 22 can grasp the size and coordinates of the cells representing the frame information of the cells arranged in each block, and information for linking to cell pattern data described later.

  Next, the cell pattern data file 26 includes each pattern data of a plurality of cells arranged in a frame n of a certain chip. In FIG. 3, each pattern data of the cells (i) to (l) is shown as an example. Here, the cell pattern data file 26 includes, as part thereof, a pattern data segment (0), cell pattern data (i) indicating pattern data of the cell (i), and cell pattern indicating pattern data of the cell (j). Data (j) is stored once in order. Subsequently, cell pattern data (k) indicating the pattern data segment (1) and the pattern data of the cell (k) is stored. Further, other data is stored, and thereafter, pattern data segment (4) and cell pattern data (l) indicating the pattern data of cell (l) are stored. In general, a plurality of figures arranged in each cell are stored per cell pattern data, and one figure is defined by shape type, size, arrangement coordinates, etc., so figure data occupies in cell pattern data The ratio is large. Therefore, the cell pattern data is very large with respect to the entire drawing data. In FIG. 3, cell pattern data (i) is required for cell arrangement data (p) and (r), and cell pattern data (j) is required for cell arrangement data (q). The cell pattern data (k) is required for the cell arrangement data (s). The cell pattern data (l) is required for the cell arrangement data (t). If the cell pattern data is repeatedly described for each arrangement many times, the amount of data becomes enormous. In particular, cell pattern data that increases the data amount is not repeatedly described as shown in FIG. The data amount can be compressed by storing the data in one segment in order.

FIG. 5 is a diagram showing an example of cell pattern data in the first embodiment.
The cell pattern data 36 stores (defines) the data length, cell size (S _X , S _Y ), and pattern data that is graphic information.

  The link data file 24 includes link information for referring to each cell pattern data from each cell arrangement data and operation information to the cell pattern data. In FIG. 3, the link data file 24 includes, as a part thereof, relation data (a) for associating cell arrangement data (p) with cell pattern data (i), and cell arrangement data (q) as cell pattern data. Relation data (b) for relating to (j), Relation data (c) for relating cell arrangement data (r) to cell pattern data (i), and cell arrangement data (s) to cell pattern data (k) ) And relation data (e) for associating the cell arrangement data (t) with the cell pattern data (l) are stored together with other data.

FIG. 6 is a diagram illustrating an example of relational data in the first embodiment.
The relationship data 34 stores a pattern data segment index, a cell pattern data pointer, and operation information. The pattern data segment index indicates the head address of the pattern data segment in the cell pattern data file 26. The cell pattern data pointer indicates the start address of the cell pattern data in the pattern data segment. These are link information to cell pattern data for reference by cell arrangement data. The operation information defines (stores) information such as pattern data inversion information, rotation information, scaling information, and format type information to be linked.

  Then, the created file group serving as the drawing data 12 is output to the outside via the I / F circuit 364. Alternatively, the data is stored in a storage device serving as a storage medium such as a read only memory (ROM), a flexible disk (FD), a compact disk (CD), a DVD, an MO, or a hard disk device. Further, data contents during or after data creation can be displayed on the monitor 340.

And it inputs into a drawing apparatus.
FIG. 7 is a conceptual diagram illustrating an example of a main configuration of the drawing apparatus according to the first embodiment.
In FIG. 7, the drawing apparatus 100 includes a drawing unit 150 and a control unit 160. The drawing apparatus 100 is an example of a charged particle beam drawing apparatus. Then, the drawing apparatus 100 draws a pattern based on the drawing data 12 on the sample 101. The control unit 160 includes a control circuit 110, a drawing data processing circuit 120, a storage device 122, and a monitor 124. The drawing unit 150 includes an electron column 102 and a drawing chamber 103. In the electron column 102, an electron gun 201, an illumination lens 202, a first aperture 203, a projection lens 204, a deflector 205, a second aperture 206, an objective lens 207, and a deflector 208 are disposed. In the drawing chamber 103, an XY stage 105 is arranged so as to be movable. A sample 101 and a Faraday cup 209 are disposed on the XY stage 105. As the sample 101, for example, an exposure mask for transferring a pattern to a wafer is included. Further, this mask includes, for example, mask blanks on which no pattern is formed. In FIG. 7, components necessary for explaining the first embodiment are described. Needless to say, the drawing apparatus 100 may normally include other necessary configurations.

  As described above, the drawing data creation device 300 creates the drawing data 12 and outputs it to the storage device 122 such as a hard disk device. Then, the drawing data processing circuit 120 reads the drawing data 12 input from the storage device 122 and converts it into device internal data. Then, the drawing unit 150 is controlled by the control circuit 110 in accordance with the internal device data. Then, a desired graphic pattern is drawn on the sample 101 by the drawing unit 150. Specifically, it is drawn as follows.

  The electron beam 200 emitted from the electron gun 201 illuminates the entire first aperture 203 having a rectangular shape, for example, a rectangular hole, by the illumination lens 202. Here, the electron beam 200 is first shaped into a rectangle. Then, the electron beam 200 of the first aperture image that has passed through the first aperture 203 is projected onto the second aperture 206 by the projection lens 204. The position of the first aperture image on the second aperture 206 is controlled by the deflector 205. Thereby, a beam shape and a dimension can be changed. The electron beam 200 of the second aperture image that has passed through the second aperture 206 is focused by the objective lens 207. Then, the electron beam 200 is deflected by the deflector 208. In this manner, the desired position of the sample 101 on the XY stage 105 is irradiated. Further, the beam intensity and the like can be measured by irradiating the Faraday cup 209 with the electron beam 200.

  As described above, in the drawing data 12 according to the first embodiment, the configuration in which the cell size is stored in the cell arrangement data file 22 independently of the cell pattern data file 26 has been described. By configuring in this way, for example, when performing the viewer processing that has been a problem, it is possible to select cells to be displayed only by the cell arrangement data file 22. In other words, since the cell size and position coordinates are defined in the cell arrangement data file 22, it can be determined whether or not the cell falls within an arbitrary set region. By selecting cells in advance, the amount of cell pattern data file 26 to be read can be reduced. In general, it is possible to reduce the reading amount of a cell pattern data file having a large amount of data.

  The same applies to the case where the drawing data input into the drawing apparatus is converted into an internal format specific to the apparatus, and the process of allocating cells for each small area (here, block) is performed. That is, since the cell size and position coordinates are defined in the cell arrangement data file 22, it can be determined whether or not the cell is in the block. By selecting cells in advance, the amount of cell pattern data file 26 to be read can be reduced. In general, it is possible to reduce the reading amount of a cell pattern data file having a large amount of data. Therefore, more efficient data processing can be performed.

  On the other hand, for the pattern data, when the pattern data is divided into clusters or converted into an internal format specific to the apparatus, the cell size is required. However, since the cell size is defined in the cell pattern data file 26, Data processing is not hindered.

Embodiment 2. FIG.
In the first embodiment, the configuration in which the cell size is stored in the arrangement data file has been described. In the second embodiment, a configuration in which the cell size is stored in the link data file will be described. The configurations of the drawing data creation device 300 and the drawing device 100 are the same as those in the first embodiment. The drawing data creation method and the subsequent drawing method are the same as those in the first embodiment. The file structure of the drawing data 12 is the same as that shown in FIG. The second embodiment is the same as the first embodiment except for the cell arrangement data in the cell arrangement data file 22 and the relation data in the link data file 24.

FIG. 8 is a diagram illustrating an example of cell arrangement data in the second embodiment.
Each cell arrangement data 42 includes cell arrangement coordinates (x, y) and a link data index (Km). In the second embodiment, the cell size (S _X , S _Y ) is not defined. Others are the same as in the first embodiment.

FIG. 9 is a diagram illustrating an example of relation data in the second embodiment.
The relation data 44 stores a pattern data segment index, a cell pattern data pointer, operation information, and a cell size (S _X , S _Y ).

As described above, in the second embodiment, the cell size (S _X , S _Y ) is stored in the relation data 44 instead of the cell arrangement data 42. Others are the same as in the first embodiment. With this configuration, for example, when performing the viewer process that has been a problem, the cell arrangement data file 22 and the link data file 24 can select cells to be displayed. That is, since the cell size is defined in the link data file 24 and the position coordinates are defined in the cell arrangement data file 22, an arbitrary value set by referring to the link data file 24 in addition to the cell arrangement data file 22 is set. It can be determined whether the cell falls within the area. When referring to the link data file 24, data may be searched according to the link data index. By selecting cells in advance, the amount of cell pattern data file 26 to be read can be reduced. In general, it is possible to reduce the reading amount of a cell pattern data file having a large amount of data. Therefore, more efficient data processing can be performed.

  The same applies to the case where the drawing data input into the drawing apparatus is converted into an internal format specific to the apparatus, and the process of allocating cells for each small area (here, block) is performed. That is, since the cell size is defined in the link data file 24 and the position coordinates are defined in the cell arrangement data file 22, the link data file 24 is referred to in addition to the cell arrangement data file 22 to enter the block. Whether it is a cell or not can be determined. By selecting cells in advance, the amount of cell pattern data file 26 to be read can be reduced. In general, it is possible to reduce the reading amount of a cell pattern data file having a large amount of data. Therefore, more efficient data processing can be performed.

  On the other hand, for the pattern data, when the pattern data is divided into clusters or converted into an internal format specific to the apparatus, the cell size is required. However, since the cell size is defined in the cell pattern data file 26, Data processing is not hindered.

Embodiment 3 FIG.
In the second embodiment, the configuration in which the cell size is stored in the link data file and the pattern data file has been described. In the third embodiment, a configuration in which the cell size is stored only in the link data file will be described. The configurations of the drawing data creation device 300 and the drawing device 100 are the same as those in the first embodiment. The drawing data creation method and the subsequent drawing method are the same as those in the first embodiment. The file structure of the drawing data 12 is the same as that shown in FIG. The third embodiment is the same as the second embodiment except for the cell pattern data in the cell pattern data file 26.

FIG. 10 is a diagram illustrating an example of cell pattern data according to the third embodiment.
In the cell pattern data 46, a data length, a link data index, and pattern data are stored (defined). That is, a link data index is stored instead of the cell size (S _X , S _Y ).

As described above, in the third embodiment, except for the cell sizes _(S X, S _Y) from the cell pattern data 46, instead the cell size of the link data file 24 _(S X, S _Y) so that it can refer to Contains the link data index. Others are the same as in the second embodiment. With this configuration, for example, the flow when performing the viewer processing that has been a problem or performing the processing of distributing cells for each small region (here, a block) is as described in the second embodiment. Efficient data processing can be performed.

  On the other hand, when the pattern data is divided into clusters or converted into an internal format specific to the apparatus, the cell pattern data file 26 and the link data file 24 can perform cluster division and format conversion. That is, since the cell size is defined in the link data file 24 and the pattern data is defined in the cell pattern data file 26, cluster division and format conversion can be performed by referring to the link data file 24 in addition to the cell pattern data file 26. Can be performed. Therefore, there is no problem in data processing. Furthermore, by defining only cell data having a cell size larger than the link data index in the link data file 24, the data amount can be reduced as viewed from the entire drawing data 12.

  In the above description, what is described as “˜circuit” or “˜process” can be configured by a computer-operable program. Or you may make it implement by not only the program used as software but the combination of hardware and software. Alternatively, a combination of hardware and firmware may be used. When configured by a program, the program is recorded on a recording medium such as a magnetic disk device, a magnetic tape device, an FD, a CD, a DVD, an MO, or a ROM.

FIG. 11 is a block diagram illustrating an example of a hardware configuration when configured by a program.
A CPU 50 serving as a computer is connected via a bus 74 to a RAM (Random Access Memory) 52, a ROM 54, a magnetic disk (HD) device 62, a keyboard (K / B) 56, a mouse 58, an external interface (I / F) 60, The monitor 64, the printer 66, the FD 68, the DVD 70, and the CD 72 are connected. Here, a RAM (Random Access Memory) 52, a ROM 54, a magnetic disk (HD) device 62, an FD 68, a DVD 70, and a CD 72 are examples of a storage device. A keyboard (K / B) 56, a mouse 58, an external interface (I / F) 60, an FD 68, a DVD 70, and a CD 72 are examples of input means. The external interface (I / F) 60, the monitor 64, the printer 66, the FD 68, the DVD 70, and the CD 72 are examples of output means.

  The embodiments have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. For example, in each embodiment, cell information is mainly described as an internal component, but the present invention is not limited to this, and data may be configured centering on another hierarchical data.

  In addition, although descriptions are omitted for parts and the like that are not directly required for the description of the present invention, such as a device configuration and a control method, a required device configuration and a control method can be appropriately selected and used. For example, although the description of the control unit configuration for controlling the drawing apparatus 100 is omitted, it goes without saying that the required control unit configuration is appropriately selected and used.

  In addition, all electron beam drawing data creation methods, electron beam drawing data conversion methods, and their apparatuses that include elements of the present invention and that can be appropriately modified by those skilled in the art are included in the scope of the present invention. .

1 is a block diagram illustrating a main configuration of a drawing data creation apparatus according to Embodiment 1. FIG. FIG. 3 is a flowchart showing main steps of a method for creating electron beam drawing data in the first embodiment. 6 is a diagram illustrating an example of drawing data according to Embodiment 1. FIG. 6 is a diagram illustrating an example of cell arrangement data in Embodiment 1. FIG. 6 is a diagram showing an example of cell pattern data in Embodiment 1. FIG. 6 is a diagram illustrating an example of relational data in Embodiment 1. FIG. 3 is a conceptual diagram illustrating an example of a main configuration of the drawing apparatus according to Embodiment 1. FIG. FIG. 10 is a diagram showing an example of cell arrangement data in the second embodiment. FIG. 11 is a diagram illustrating an example of relation data in the second embodiment. FIG. 10 is a diagram showing an example of cell pattern data in the third embodiment. It is a block diagram which shows an example of the hardware constitutions when comprising by a program. It is a conceptual diagram for demonstrating operation | movement of a variable shaping type | mold electron beam drawing apparatus.

Explanation of symbols

10 Design data 12 Drawing data 20 Chip configuration file 22 Cell arrangement data file 24 Link data file 26 Cell pattern data files 32 and 42 Cell arrangement data 34 and 44 Relation data 36 and 46 Cell pattern data 50 CPU
52 RAM
54 ROM
56 K / B
58 Mouse 60 I / F
62 HD device 64 Monitor 66 Printer 68 FD
70 DVD
72 CD
74 Bus 100 Drawing device 101, 440 Sample 102 Electron barrel 103 Drawing chamber 105 XY stage 110 Control circuit 120 Drawing data processing circuit 122, 350 Storage device 124, 340 Monitor 150 Drawing unit 160 Control unit 200 Electron beam 201 Electron gun 202 Illumination Lenses 203 and 410 First aperture 206 and 420 Second aperture 204 Projection lens 205 and 208 Deflector 207 Objective lens 209 Faraday cup 300 Drawing data creation device 310 Cell arrangement data file creation circuit 320 Cell pattern data file creation circuit 330 Link Data file creation circuit 362, 364 I / F circuit 411 Opening 421 Variable shaping opening 430 Charged particle source 442 Electron beam

Claims (6)

In a drawing data creation method for drawing using charged particle beams from circuit design data,
A first data file for creating, as part of the drawing data, a first data file including size data indicating the size of a cell composed of at least one graphic and pattern data indicating graphic information configuring the cell Creation process,
A second data file creation step of creating a second data file including placement position data indicating the placement position of the cells and size data of the cells as part of the drawing data;
A drawing data creation method characterized by comprising: In a drawing data creation method for drawing using charged particle beams from circuit design data,
A first data file for creating, as part of the drawing data, a first data file including size data indicating the size of a cell composed of at least one graphic and pattern data indicating graphic information configuring the cell Creation process,
A second data file creation step of creating a second data file including placement position data indicating the placement position of the cells and predetermined index data as part of the drawing data;
A third data file including link data for linking the pattern data and the arrangement position data and the size data of the cell defined at the data position indicated by the predetermined index data is stored in the drawing data. A third data file creation step to be created as a part;
A drawing data creation method characterized by comprising: In a drawing data creation method for drawing using charged particle beams from circuit design data,
A first data file creating step for creating a first data file including pattern data of cells composed of at least one figure and predetermined index data as a part of the drawing data;
A second data file creation step of creating a second data file including placement position data indicating the placement position of the cells and the predetermined index data as part of the drawing data;
A third data file including link data for linking the pattern data and the arrangement position data and the size data of the cell defined at the data position indicated by the predetermined index data is stored in the drawing data. A third data file creation step to be created as a part;
A drawing data creation method characterized by comprising: In a storage medium storing a drawing data file for drawing a predetermined pattern on a sample using a charged particle beam,
A first data file including size data indicating the size of a cell composed of at least one graphic and pattern data indicating graphic information of the cell;
A second data file including arrangement position data indicating the arrangement position of the cells and size data of the cells;
A storage medium storing a drawing data file characterized by comprising: In a storage medium storing a drawing data file for drawing a predetermined pattern on a sample using a charged particle beam,
A first data file including size data indicating a size of a cell composed of at least one graphic and pattern data indicating graphic information configuring the cell;
A second data file including arrangement position data indicating the arrangement position of the cells and predetermined index data;
A third data file including link data for linking the pattern data and the arrangement position data, and size data of the cell defined at a data position indicated by the predetermined index data;
A storage medium storing a drawing data file characterized by comprising: In a storage medium storing a drawing data file for drawing a predetermined pattern on a sample using a charged particle beam,
A first data file including cell pattern data composed of at least one figure and predetermined index data;
A second data file including arrangement position data indicating the arrangement position of the cells and the predetermined index data;
A third data file including link data for linking the pattern data and the arrangement position data, and the size data of the cells defined at the data position indicated by the predetermined index data;
A storage medium storing a drawing data file characterized by comprising:

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