JP2008192947A - Resin sealing apparatus and resin sealing method - Google Patents

Resin sealing apparatus and resin sealing method Download PDF

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JP2008192947A
JP2008192947A JP2007027609A JP2007027609A JP2008192947A JP 2008192947 A JP2008192947 A JP 2008192947A JP 2007027609 A JP2007027609 A JP 2007027609A JP 2007027609 A JP2007027609 A JP 2007027609A JP 2008192947 A JP2008192947 A JP 2008192947A
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semiconductor chip
resin
mold
circuit board
injection direction
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JP4999482B2 (en
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Fumio Miyajima
文夫 宮島
Shuji Ide
修二 井出
Akira Katsuyama
昭 勝山
Naoya Goto
直也 後藤
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Apic Yamada Corp
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Apic Yamada Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin sealing apparatus capable of performing underfill molding having high filling efficiency of a resin material and achieving excellent molding quality having no unfilled area without dirtying a mold surface. <P>SOLUTION: On the upstream side of a semiconductor chip 1 in a resin injection direction, a resin material 18 supplied so as to cover a gap between the semiconductor chip 1 and a circuit board 3 is molded as underfill while feeding compressed air from an air compression circuit 14 to a first closed space 16 and sucking air from a second closed space 17 by a suction circuit 15. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、基板に半導体チップがフリップチップ実装されたワークにアンダーフィルモールドする樹脂封止装置及び樹脂封止方法に関する。   The present invention relates to a resin sealing apparatus and a resin sealing method for underfill molding a work in which a semiconductor chip is flip-chip mounted on a substrate.

半導体チップが回路基板にフリップチップ実装されたワークをアンダーフィルモールドする場合、半導体チップの外周に液状樹脂を滴下して加熱流動化させてチップと基板の隙間へ毛細管現象により浸透させて封止することが行なわれている。
或いは、液状樹脂を半導体チップの外周部の一部を除いて滴下してワークを減圧空間においてチップと基板間の隙間へ流動を促し、その後大気解放による気圧差により隙間内部まで樹脂を充填するモールド方法が提案されている(特許文献1参照)。
また、リリースフィルムを用いたトランスファモールド法を用いて、当該フィルムにより半導体チップの樹脂注入方向と平行な側面を閉止して樹脂の流動圧によりアンダーフィルモールドするモールド方法も提案されている(特許文献2参照)。
特開2000−3405899号公報 特開2002−176067号公報
When underfill molding a work in which a semiconductor chip is flip-chip mounted on a circuit board, a liquid resin is dropped on the outer periphery of the semiconductor chip and heated and fluidized to penetrate into the gap between the chip and the board by capillary action and seal. Has been done.
Alternatively, a mold in which liquid resin is dropped except for a part of the outer periphery of the semiconductor chip to promote the flow of the workpiece into the gap between the chip and the substrate in a decompressed space, and then the resin is filled into the gap by the pressure difference due to atmospheric release. A method has been proposed (see Patent Document 1).
Also, a mold method is proposed in which a transfer mold method using a release film is used to close a side surface parallel to the resin injection direction of the semiconductor chip with the film, and underfill molding is performed by resin flow pressure (Patent Document). 2).
JP 2000-3405899 A JP 2002-176067 A

しかしながら、例えば25×25mmの大きさのCPUが複数基板実装されたワークをアンダーフィルモールドする場合、毛細管現象を用いた充填方法では、樹脂の未充填や、エアの囲い込み、フィラー分布の偏りなどを制御することができなくなっている。
また、金属製のモールド金型を用いた場合、比較的サイズの大きい半導体チップの外径寸法の公差やワークの金型に対する位置精度の幅が狭いため、ワークが破損したり成形品質が変動したりするおそれがある。
また、トランスファー成形によれば、封止樹脂を金型内に投入して低粘度領域で急いでアンダーフィルモールドするため、15kgf/cm程度の樹脂注入圧を伴うので、半導体チップの押上げ剥離が生ずるおそれがある。半導体チップを金型で押さえ込むとすれば、モールド金型によりワークが180度付近に加熱加圧された際に金属バンプが押し潰されるおそれもある。
また、樹脂圧によりアンダーフィルモールドする場合には、キャビティに樹脂を満たしてかチップと基板の隙間に充填するため、金型の樹脂汚れが成形するたびに増大して生産効率を低下させる。
However, for example, when underfill molding a workpiece on which a plurality of CPUs with a size of 25 × 25 mm are mounted, the filling method using the capillary phenomenon causes unfilling of resin, air enclosing, uneven distribution of filler, etc. You can no longer control it.
In addition, when a metal mold is used, the tolerance of the outer diameter of a relatively large semiconductor chip and the range of positional accuracy of the workpiece relative to the mold are narrow, so the workpiece may be damaged or the molding quality may vary. There is a risk of
Also, according to transfer molding, a sealing resin is put into a mold and underfill molding is performed in a low-viscosity region, so that a resin injection pressure of about 15 kgf / cm 2 is involved. May occur. If the semiconductor chip is pressed with a mold, the metal bumps may be crushed when the workpiece is heated and pressed to around 180 degrees by the mold.
In addition, when underfill molding is performed by resin pressure, since the cavity is filled with resin or the gap between the chip and the substrate is filled, the resin contamination of the mold increases every time and the production efficiency is lowered.

本発明の目的は、上記従来技術の課題を解決し、樹脂材の充填効率が良く、型面を汚すことなく未充填領域のない成形品質に優れたアンダーフィルモールドが行なえる樹脂封止装置及び樹脂封止方法を提供することにある。   An object of the present invention is to solve the above-mentioned problems of the prior art, a resin sealing apparatus capable of performing an underfill mold excellent in molding quality with good filling efficiency of a resin material, no contamination of a mold surface and no unfilled area. The object is to provide a resin sealing method.

本発明は上記目的を達成するため、次の構成を備える。
半導体チップが回路基板にフリップチップ実装されたワークをモールド型でクランプし当該半導体チップの周囲に供給された樹脂材をアンダーフィルモールドする樹脂封止装置であって、半導体チップの樹脂注入方向と平行な両側で当該半導体チップと回路基板との隙間を閉止する閉止手段と、半導体チップ及び回路基板に押接して半導体チップの樹脂注入方向上流側及び下流側の側面に臨む第1、第2の密閉空間を形成する第1、第2の凹部が形成された密閉型と、ワークの端子形成面を支持する支持部が形成された支持型を備えたモールド型と、密閉型の第1の凹部に接続して圧縮空気が送り込まれる空圧回路と、密閉型の第2の凹部に接続してエアが吸引される吸引回路を備えており、半導体チップの樹脂注入方向上流側において当該半導体チップと回路基板の隙間を覆って供給された樹脂材が、空圧回路より第1の密閉空間に圧縮空気を送り込みかつ吸引回路より第2の密閉空間からエアを吸引しながらアンダーフィルモールドされることを特徴とする。
また、閉止手段は、半導体チップの上面から樹脂注入方向と平行な両側面及び基板面に粘着して閉止する粘着テープ材、樹脂材、接着剤、線材、回路基板の表面レジスト層による突条のいずれかであることを特徴とする。
また、密閉型は、ホルダーに支持された弾性部材であり、ワークはヒータを内蔵した支持型に端子形成面を通じて支持されていることを特徴とする。
また、支持型はワークテーブルに支持されており、該ワークテーブルは支持型に支持されたワークを搬送機構により搬送されることを特徴とする。
また、モールド型はアンダーフィルモールドされる際にワークに振動を加える加振手段を備えたことを特徴とする。
In order to achieve the above object, the present invention comprises the following arrangement.
A resin sealing device for clamping a work in which a semiconductor chip is flip-chip mounted on a circuit board with a mold and underfill molding a resin material supplied around the semiconductor chip, and parallel to a resin injection direction of the semiconductor chip Closing means for closing the gap between the semiconductor chip and the circuit board on both sides, and first and second sealing faces the upstream and downstream sides of the semiconductor chip in the resin injection direction by pressing against the semiconductor chip and the circuit board. A sealed mold in which first and second recesses for forming a space are formed; a mold mold having a support mold in which a support portion for supporting a terminal forming surface of a work is formed; and a first recess in the sealed mold A pneumatic circuit that is connected to send compressed air and a suction circuit that is connected to the hermetically sealed second recess and sucks air; The resin material supplied covering the gap between the conductor chip and the circuit board is underfill molded while sending compressed air from the pneumatic circuit to the first sealed space and sucking air from the second sealed space from the suction circuit. It is characterized by that.
Also, the closing means is adhesive tape material, resin material, adhesive, wire material, and surface resist layer of the circuit board that adheres to both the side surface parallel to the resin injection direction and the substrate surface from the upper surface of the semiconductor chip. It is either.
The sealed type is an elastic member supported by a holder, and the work is supported by a support type incorporating a heater through a terminal forming surface.
The support mold is supported by a work table, and the work table is transported by a transport mechanism of the work supported by the support mold.
Further, the mold is provided with a vibration means for applying vibration to the workpiece when underfill molding is performed.

半導体チップが回路基板にフリップチップ実装されたワークをモールド型でクランプし当該半導体チップの周囲に供給された樹脂材をアンダーフィルモールドする樹脂封止方法であって、半導体チップの樹脂注入方向と平行な両側で回路基板との隙間が閉止されたワークの樹脂注入方向上流側において半導体チップと回路基板の隙間を覆って樹脂材を供給する工程と、ワークに密閉型を押し当て、半導体チップの樹脂材が流し込まれる上流側の側面及び下流側の側面に臨む第1、第2の密閉空間を各々形成する工程と、第1の密閉空間へ圧縮空気を送り込み、第2の密閉空間よりエアを吸引することで半導体チップと回路基板の隙間に樹脂材が注入されるアンダーフィルモールド工程と、アンダーフィルモールドされたワークに押接するモールド型を開放し、半導体チップの樹脂注入方向と平行な両側へ、必要に応じて四辺に樹脂材を供給して半導体チップの周囲を封止する工程と、ワークを加熱して樹脂材を硬化させる工程を含むことを特徴とする。
また、ワークに樹脂材を供給する前に半導体チップの樹脂注入方向と平行な両側を閉止手段により閉止する工程と、モールド型を開放した後、半導体チップの樹脂注入方向と平行な両側へ樹脂材を供給する前に閉止手段を除去する工程を有することを特徴とする。
また、アンダーフィルモールド工程を行なう際に、ワークに低周波振動を加えることを特徴とする。
また、モールド樹脂が第1の密閉空間から第2の密閉空間へ到達したことを検出すると第1の密閉空間への圧縮空気の送り込みを停止しアンダーフィルモールドを終了することを特徴とする。
A resin sealing method in which a workpiece in which a semiconductor chip is flip-chip mounted on a circuit board is clamped with a mold, and a resin material supplied around the semiconductor chip is underfill-molded, and parallel to the resin injection direction of the semiconductor chip A step of supplying a resin material covering the gap between the semiconductor chip and the circuit board on the upstream side in the resin injection direction of the workpiece with the gap between the circuit board closed on both sides and the semiconductor chip resin A step of forming first and second sealed spaces facing the upstream side surface and the downstream side surface into which the material is poured, and compressed air is fed into the first sealed space, and air is sucked from the second sealed space As a result, an underfill molding process in which a resin material is injected into the gap between the semiconductor chip and the circuit board, and a mode in which the underfill molded work is pressed against The mold is opened, the resin material is supplied to both sides of the semiconductor chip in parallel with the resin injection direction of the semiconductor chip as necessary, the periphery of the semiconductor chip is sealed, and the workpiece is heated to cure the resin material A step of causing
In addition, a step of closing both sides parallel to the resin injection direction of the semiconductor chip by the closing means before supplying the resin material to the work, and a resin material to both sides parallel to the resin injection direction of the semiconductor chip after opening the mold It has the process of removing a closing means, before supplying.
In addition, when performing the underfill molding process, low-frequency vibration is applied to the workpiece.
In addition, when it is detected that the mold resin has reached the second sealed space from the first sealed space, the feeding of the compressed air to the first sealed space is stopped and the underfill molding is terminated.

本発明に係る樹脂封止装置及び方法を用いれば、半導体チップの樹脂注入方向と平行な両側が閉止されたワークに半導体チップの樹脂注入方向上流側において当該半導体チップと回路基板の隙間を覆って供給された樹脂材が、空圧回路より第1の密閉空間に圧縮空気を送り込みかつ吸引回路より第2の密閉空間からエアを吸引しながらアンダーフィルモールドされる。よって、半導体チップの一側面から全幅領域で毛細管現象より早い流速で微細な気泡を巻き込むことなく樹脂のフローフロントを直線的にそろえながら樹脂材をチップと基板の隙間に充填することができる。したがって、アンダーフィルモールドする面積が大きく隙間が狭いワークであっても、樹脂材の充填効率が良く、型面を汚すことなく未充填領域がない成形品質に優れたアンダーフィルモールドが行なえる。
また、密閉型はホルダーに支持された弾性部材であるので、クランプ力を必要以上に強めなくてもシール性がよく、ワークの追従性も期待できるのでワークの公差や型に対する位置精度も高精度である必要がないため、ワークを破損することもない。
また、支持型はワークテーブルに支持されており、ワークテーブルは支持型に支持されたワークを搬送機構により搬送されるようになっていると、ワークへの樹脂材の供給からアンダーフィル工程を経てモールド樹脂を加熱硬化させる工程まで自動化ラインを組んで行なえる。
By using the resin sealing apparatus and method according to the present invention, the work piece closed on both sides parallel to the resin injection direction of the semiconductor chip covers the gap between the semiconductor chip and the circuit board on the upstream side in the resin injection direction of the semiconductor chip. The supplied resin material is underfill molded while sending compressed air from the pneumatic circuit to the first sealed space and sucking air from the second sealed space from the suction circuit. Therefore, the resin material can be filled in the gap between the chip and the substrate while aligning the flow front of the resin linearly from one side surface of the semiconductor chip to the full width region at a flow rate faster than the capillary phenomenon without involving fine bubbles. Therefore, even for a workpiece having a large underfill mold area and a narrow gap, it is possible to perform an underfill mold excellent in molding quality with good filling efficiency of the resin material and no unfilled area without soiling the mold surface.
In addition, since the sealed mold is an elastic member supported by the holder, the sealing performance is good without expecting the clamping force to be increased more than necessary. Therefore, the workpiece is not damaged.
In addition, the support mold is supported by the work table, and when the work table is configured to transport the work supported by the support mold by the transport mechanism, the resin material is supplied to the work through the underfill process. An automated line can be built up to the process of heat-curing the mold resin.

以下、本発明に係る樹脂封止装置及び樹脂封止方法の好適な実施の形態について添付図面と共に詳述する。樹脂封止装置は、半導体チップが回路基板にフリップチップ実装されたワークをモールド型でクランプしての当該半導体チップの周囲に供給された樹脂材をアンダーフィルモールドする。   Hereinafter, preferred embodiments of a resin sealing device and a resin sealing method according to the present invention will be described in detail with reference to the accompanying drawings. The resin sealing device underfill-molds a resin material supplied around the semiconductor chip by clamping a work in which the semiconductor chip is flip-chip mounted on a circuit board with a mold.

先ず、樹脂封止装置の概略構成について図1及び図2を参照して説明する。
図1において、ワークWは半導体チップ1の樹脂注入方向と平行な両側で半導体チップ1と回路基板3の隙間を粘着テープ材2(閉止手段)により閉止されている。図2において粘着テープ材2は半導体チップ1の上面から樹脂注入方向と平行な両側面及び回路基板3に粘着して閉止している。半導体チップ1は回路基板3に対しフリップチップ実装され、回路基板3には外部接続端子4が形成されている。即ち、ワークWは電気的な接続確認が完了したものが用いられている。
First, a schematic configuration of the resin sealing device will be described with reference to FIGS. 1 and 2.
In FIG. 1, a workpiece W is closed on both sides of the semiconductor chip 1 parallel to the resin injection direction by a pressure-sensitive adhesive tape material 2 (closing means) between the semiconductor chip 1 and the circuit board 3. In FIG. 2, the adhesive tape material 2 is adhered and closed to both side surfaces parallel to the resin injection direction and the circuit board 3 from the upper surface of the semiconductor chip 1. The semiconductor chip 1 is flip-chip mounted on the circuit board 3, and external connection terminals 4 are formed on the circuit board 3. That is, the work W is used after electrical connection confirmation is completed.

モールド型5は、上型に相当する密閉型6と下型に相当する支持型7を備えている。密閉型6は、ホルダー8に組み付けられた型ケース9に支持されている。密閉型6は例えばシリコンゴムなどの弾性部材が好適に用いられる。密閉型6のクランプ面には、第1、第2の凹部6a、6bが各々形成されている。密閉型6はワークWの半導体チップ1の上面及び両側面並びに回路基板3上面に押接し、半導体チップ1の樹脂注入方向上流側及び下流側の側面に臨む第1、第2の密閉空間16、17を各々形成するようになっている。密閉型6は、例えばエアシリンダやサーボモータなどを駆動源とする公知の上下動機構(図示せず)により上下動するようになっている。   The mold 5 includes a sealed mold 6 corresponding to an upper mold and a support mold 7 corresponding to a lower mold. The sealed mold 6 is supported by a mold case 9 assembled to a holder 8. The sealing mold 6 is preferably an elastic member such as silicon rubber. First and second recesses 6a and 6b are formed on the clamping surface of the hermetic mold 6, respectively. The sealed mold 6 is in contact with the upper surface and both side surfaces of the semiconductor chip 1 of the work W and the upper surface of the circuit board 3, and the first and second sealed spaces 16 facing the upstream and downstream side surfaces of the semiconductor chip 1 in the resin injection direction, 17 is formed. The hermetic mold 6 is moved up and down by a known vertical movement mechanism (not shown) using, for example, an air cylinder or a servo motor as a drive source.

支持型7は、ワークWの端子形成面を支持する支持部7aが上面側に形成されている。また、支持型7の内部にはワークWを外部接続端子4を通じて加熱するヒータ7bが設けられている。支持型7は断熱材10を介してワークテーブル11に支持されている。ワークテーブル11はワーク搬送機構を構成するボールねじ12と連繋している。ボールねじ12をサーボモータ13により回転駆動するとワークテーブル11がボールねじ12の長手方向に移動するようになっている。このワーク搬送機構を用いて、ワークWへ樹脂材18の供給からワークWを載置した支持型7を密閉型6に対して位置合わせしてアンダーフィルモールドを行ない、アンダーフィルモールド後の加熱硬化(キュア)の各ステージへ自動化ラインを組んでワークWを搬送することができる。   The support die 7 has a support portion 7 a that supports the terminal forming surface of the work W on the upper surface side. In addition, a heater 7 b for heating the workpiece W through the external connection terminal 4 is provided inside the support die 7. The support die 7 is supported on the work table 11 via a heat insulating material 10. The work table 11 is connected to a ball screw 12 constituting a work transfer mechanism. When the ball screw 12 is rotationally driven by a servo motor 13, the work table 11 moves in the longitudinal direction of the ball screw 12. Using this workpiece transfer mechanism, the support mold 7 on which the workpiece W is placed from the supply of the resin material 18 to the workpiece W is aligned with the sealed mold 6 to perform underfill molding, and heat curing after the underfill molding is performed. The work W can be conveyed by assembling an automated line to each stage of (cure).

また、密閉型6の第1の凹部6aに連通して圧縮空気が送り込む空圧回路14が設けられている。また、密閉型6の第2の凹部6bに連通してエアを吸引する吸引回路15が接続されている。空圧回路14、吸引回路15には、電磁弁14a、15aが設けられており、各回路を構成する流路14b、15bを開閉する。   In addition, a pneumatic circuit 14 is provided which communicates with the first recess 6a of the hermetic mold 6 and sends compressed air. In addition, a suction circuit 15 that communicates with the second recess 6b of the hermetic mold 6 and sucks air is connected. The pneumatic circuit 14 and the suction circuit 15 are provided with electromagnetic valves 14a and 15a, and open and close the flow paths 14b and 15b constituting each circuit.

図2(a)〜(c)において、半導体チップ1の一側面側の当該チップ1と回路基板3の隙間を覆って第1の密閉空間16に供給された樹脂材(液状樹脂)18が第1の密閉空間16に圧縮空気を送り込みかつ第2の密閉空間17よりエアを吸引しながら隙間に充填される。   2A to 2C, a resin material (liquid resin) 18 that covers the gap between the chip 1 on one side surface of the semiconductor chip 1 and the circuit board 3 and is supplied to the first sealed space 16 is the first. The compressed air is fed into one sealed space 16 and the gap is filled while sucking air from the second sealed space 17.

ここで、図3(a)〜(f)を参照して、樹脂封止工程の一例について説明する。
図3(a)において、ワークWに樹脂材18を供給する前に、半導体チップ1の樹脂注入方向と平行な両側で回路基板3との隙間を粘着テープ材2を粘着させて閉止する。粘着テープ材2は、半導体チップ1の上面、樹脂注入方向と平行な両側面及び回路基板3に粘着して閉止する。尚、後述するように、回路基板3の表面レジスト層に予め突条22などが形成されて、半導体チップ1の樹脂注入方向と平行な両側で回路基板3との隙間が形成されない場合には、この工程を省略することもできる。
Here, an example of the resin sealing step will be described with reference to FIGS.
In FIG. 3A, before supplying the resin material 18 to the workpiece W, the gap between the semiconductor chip 1 and the circuit board 3 is closed by adhering the adhesive tape material 2 on both sides parallel to the resin injection direction. The adhesive tape material 2 adheres and closes to the upper surface of the semiconductor chip 1, both side surfaces parallel to the resin injection direction, and the circuit board 3. As will be described later, when the protrusions 22 and the like are formed in advance on the surface resist layer of the circuit board 3 and a gap with the circuit board 3 is not formed on both sides parallel to the resin injection direction of the semiconductor chip 1, This step can be omitted.

図3(b)において、図示しないディスペンサーを用いて、半導体チップ1と回路基板3の隙間が形成されている一側面(ゲート側面)に樹脂材(例えば液状樹脂)18を供給する。樹脂材18は、半導体チップ1のゲート側面を覆って、両側の粘着テープ材2まで及んで塗布されることが望ましい。これにより、密閉型6によりワークWをクランプすると、第1の凹部6aに第1の密閉空間16が形成される(図1参照)。   In FIG. 3B, a resin material (for example, liquid resin) 18 is supplied to one side surface (gate side surface) where a gap between the semiconductor chip 1 and the circuit board 3 is formed using a dispenser (not shown). The resin material 18 is preferably applied so as to cover the gate side surface of the semiconductor chip 1 and reach the adhesive tape material 2 on both sides. Thus, when the workpiece W is clamped by the sealed mold 6, a first sealed space 16 is formed in the first recess 6a (see FIG. 1).

図3(c)において、ワークWを支持した支持型7を密閉型6と位置合わせし、密閉型6を型閉じする。このとき、密閉型6をワークWの基板面及びチップ面に押し当てて、半導体チップ1の樹脂材18が流し込まれる上流側の側面及び下流側の側面に臨む第1、第2の密閉空間16、17が各々形成される。   In FIG. 3C, the support die 7 that supports the workpiece W is aligned with the sealed die 6, and the sealed die 6 is closed. At this time, the sealed mold 6 is pressed against the substrate surface and the chip surface of the workpiece W, and the first and second sealed spaces 16 facing the upstream side surface and the downstream side surface into which the resin material 18 of the semiconductor chip 1 is poured. , 17 are formed.

この後、空圧回路14より第1の密閉空間16へ圧縮空気を送り込み、吸引回路15より第2の密閉空間17からエアを吸引することで、図3(d)に示すように、半導体チップ1と回路基板3の隙間に樹脂材18が注入される(アンダーフィルモールド)。実験例を示すと、面積16×18mmで隙間46μmのアンダーフィル空間に空圧3kgf/cm、吸引圧−0.95kgf/cmで樹脂注入温度80℃の条件下で約20秒かけてアンダーフィルモールドを行なった。その結果、半導体チップ1の損傷はなく、半導体チップ1のバンプの潰れもなく、金型汚れも発生することがなかった。 Thereafter, compressed air is sent from the pneumatic circuit 14 to the first sealed space 16 and air is sucked from the second sealed space 17 from the suction circuit 15, so that the semiconductor chip as shown in FIG. A resin material 18 is injected into the gap between 1 and the circuit board 3 (underfill molding). In an experimental example, an underfill space with an area of 16 × 18 mm 2 and a gap of 46 μm takes about 20 seconds under conditions of air pressure 3 kgf / cm 2 , suction pressure −0.95 kgf / cm 2 and resin injection temperature 80 ° C. Underfill molding was performed. As a result, the semiconductor chip 1 was not damaged, the bumps of the semiconductor chip 1 were not crushed, and mold contamination did not occur.

尚、アンダーフィルモールド工程を行なう際に、ワークWに振動数30Hz以下で振幅が20μm以下の低周波振動を加えるようにしてもよい。これにより、樹脂材18の流れ性が向上し、フィラー分布の偏りも是正できる。
また、モールド樹脂が第1の密閉空間16から第2の密閉空間17へ到達したことを光学センサー(図示せず)により検出すると、空圧回路14による第1の密閉空間16への圧縮空気の送り込みを停止しアンダーフィルモールドを終了するようにしてもよい。
When performing the underfill molding process, low frequency vibration having a vibration frequency of 30 Hz or less and an amplitude of 20 μm or less may be applied to the workpiece W. Thereby, the flowability of the resin material 18 is improved, and the uneven distribution of the filler can be corrected.
Further, when it is detected by an optical sensor (not shown) that the mold resin has reached the second sealed space 17 from the first sealed space 16, the compressed air is supplied to the first sealed space 16 by the pneumatic circuit 14. The underfill molding may be terminated by stopping the feeding.

次に、図3(e)において、モールド型5を開放した後、半導体チップ1に粘着していた粘着テープ材2を除去する。尚、粘着テープ材2を使用しない場合には、この工程は省略することができる。また、図4において、粘着テープ材2の樹脂注入方向下流側の一部には、当該粘着テープ材2を剥離し易くするための粘着層が存在しない舌部2aが設けられていても良い。また、半導体チップ1の表面に粘着テープ材2の粘着剤を付けたくない場合は、当該粘着テープ材2の半導体チップ1に当接する部位の粘着剤を部分的に塗布しないようにしてもよい。   Next, in FIG. 3E, after the mold 5 is opened, the adhesive tape material 2 adhered to the semiconductor chip 1 is removed. If the adhesive tape material 2 is not used, this step can be omitted. In FIG. 4, a part of the adhesive tape material 2 on the downstream side in the resin injection direction may be provided with a tongue 2 a that does not have an adhesive layer for easily peeling the adhesive tape material 2. Moreover, when it is not desired to attach the adhesive of the adhesive tape material 2 to the surface of the semiconductor chip 1, the adhesive of the part contacting the semiconductor chip 1 of the adhesive tape material 2 may not be applied partially.

次いで、図3(f)において、粘着テープ材2で覆われていた半導体チップ1の樹脂注入方向と平行な両側へ図示しないディスペンサーにより樹脂材(フィレット樹脂材)18を供給して半導体チップ1の周囲を封止する。このように半導体チップ1に周囲にフィレット樹脂材18を形成する理由は、半導体チップ1と回路基板3との熱膨張係数の差により熱応力が半導体チップ1に繰返し作用してもバンプが剥離するのを防ぎ、また、エッジ部に形成された傷から割れが生じて当該半導体チップ1が破損するのを防ぐためである。   Next, in FIG. 3F, a resin material (fillet resin material) 18 is supplied to both sides parallel to the resin injection direction of the semiconductor chip 1 covered with the adhesive tape material 2 by a dispenser (not shown). Seal around. The reason why the fillet resin material 18 is formed around the semiconductor chip 1 as described above is that the bumps are peeled off even when thermal stress repeatedly acts on the semiconductor chip 1 due to the difference in thermal expansion coefficient between the semiconductor chip 1 and the circuit board 3. In addition, the semiconductor chip 1 is prevented from being broken due to cracks formed in the edge portion.

次に、ワーク搬送機構のサーボモータ13を起動して、ワークWを支持する支持型7を図示しない加熱ステージへ搬送して樹脂材18を所定温度(例えば180℃程度)で所定時間加熱して硬化させる(キュア)。   Next, the servo motor 13 of the workpiece transfer mechanism is activated, the support die 7 that supports the workpiece W is transferred to a heating stage (not shown), and the resin material 18 is heated at a predetermined temperature (for example, about 180 ° C.) for a predetermined time. Cure (cure).

以上のように、アンダーフィルモールドする面積が大きく(例えば20×20mm)隙間が狭い(例えば30μm〜50μm)ワークWであっても、樹脂材18の充填効率が良く、型面を汚すことなく未充填領域がない成形品質に優れたアンダーフィルモールドが行なえる。 As described above, even if the workpiece W has a large area for underfill molding (for example, 20 × 20 mm 2 ) and a narrow gap (for example, 30 μm to 50 μm), the filling efficiency of the resin material 18 is good and the mold surface is not soiled. An underfill mold excellent in molding quality with no unfilled area can be performed.

次に、ワークWの半導体チップ1の樹脂注入方向と平行な両側面と回路基板3との隙間を塞ぐ閉止手段の他例について図5乃至図7を参照して説明する。
図5は、閉止手段として半導体チップ1の樹脂注入方向と平行な両側面と回路基板3との間の隙間を塞ぐ樹脂材18若しくは接着剤(樹脂材等)を塗布するものである。この樹脂材等を塗布する高さは、一点鎖線で示すフィレット樹脂ラインLの高さの半分以下が望ましい。
Next, another example of closing means for closing a gap between both side surfaces of the workpiece W parallel to the resin injection direction of the semiconductor chip 1 and the circuit board 3 will be described with reference to FIGS.
FIG. 5 shows the application of a resin material 18 or an adhesive (resin material or the like) that closes the gap between both side surfaces parallel to the resin injection direction of the semiconductor chip 1 and the circuit board 3 as a closing means. The height at which the resin material or the like is applied is desirably half or less of the height of the fillet resin line L indicated by a one-dot chain line.

また、閉止手段としては、図6(a)に示す粘着テープ材2を回路基板3に粘着することで半導体チップ1の樹脂注入方向と平行な両側面と回路基板3との間の隙間を塞ぐようにしてもよい。
或いは、図6(b)に示すように、半導体チップ1の樹脂注入方向と平行な両側面に沿って線材20を回路基板3に設けて隙間を塞ぐようにしてもよい。
また或いは、図6(c)に示すように、半導体チップ1の樹脂注入方向と平行な両側面に沿って回路基板3の表面レジスト層に形成される散点状の突起21、連続する突条22のいずれかであってもよい。
Further, as a closing means, the adhesive tape material 2 shown in FIG. 6A is adhered to the circuit board 3 so as to close the gap between the side surfaces parallel to the resin injection direction of the semiconductor chip 1 and the circuit board 3. You may do it.
Alternatively, as shown in FIG. 6B, a wire 20 may be provided on the circuit board 3 along both side surfaces parallel to the resin injection direction of the semiconductor chip 1 so as to close the gap.
Alternatively, as shown in FIG. 6C, scattered protrusions 21 formed on the surface resist layer of the circuit board 3 along the both side surfaces parallel to the resin injection direction of the semiconductor chip 1 and continuous protrusions. Any of 22 may be sufficient.

また、閉止手段としては、アンダーフィルモールドに用いる樹脂材18を用い、粘着テープ材2を併用するようにしてもよい。図7(a)において、予めディスペンサ(図示せず)によりワークWの半導体チップ1の樹脂注入方向と平行な両側面と回路基板3との間の隙間を塞ぐように樹脂材18を塗布しておく。次いで、図7(b)において、樹脂材18が塗布されたワークWに粘着テープ材2を半導体チップ1の上面、両側面、回路基板3上を覆って粘着する。これにより半導体チップ1の樹脂注入方向と平行な両側において回路基板3との間の隙間は確実に塞がれる。その後、図7(c)において、図示しないディスペンサーを用いて、半導体チップ1と回路基板3の隙間が形成されている一側面(ゲート側面)に樹脂材18を供給する。樹脂材18は、半導体チップ1のゲート側面を覆って、両側の粘着テープ材2まで及んで塗布されることが望ましい。その後、図3(d)〜図3(f)と同様のアンダーフィル工程、フィレット樹脂材塗布工程、モールド樹脂の加熱硬化工程が行なわれる。   Moreover, as a closing means, you may make it use the adhesive tape material 2 together using the resin material 18 used for an underfill mold. In FIG. 7A, a resin material 18 is applied in advance by a dispenser (not shown) so as to close a gap between both side surfaces of the workpiece W parallel to the resin injection direction of the semiconductor chip 1 and the circuit board 3. deep. Next, in FIG. 7B, the adhesive tape material 2 is adhered to the work W coated with the resin material 18 so as to cover the upper surface and both side surfaces of the semiconductor chip 1 and the circuit board 3. As a result, the gap between the semiconductor chip 1 and the circuit board 3 is reliably closed on both sides parallel to the resin injection direction. Thereafter, in FIG. 7C, a resin material 18 is supplied to one side surface (gate side surface) where a gap is formed between the semiconductor chip 1 and the circuit board 3 using a dispenser (not shown). The resin material 18 is preferably applied so as to cover the gate side surface of the semiconductor chip 1 and reach the adhesive tape material 2 on both sides. Thereafter, an underfill process, a fillet resin material application process, and a mold resin heat curing process similar to those shown in FIGS. 3D to 3F are performed.

ワークWは半導体チップ(例えばCPUなど)1が回路基板3上に隣接して並べて設けられたものや複数の半導体チップがマトリクス状に配置されたものでもよい。樹脂材18は液状樹脂に限らず、顆粒状、粉状、固形状のいずれでもよい。
また、半導体チップ1と密閉型6との密着性がよい場合には、粘着テープ材2の粘着面を反転させて密閉型6側に粘着させてもよいし、リリースフィルムを密閉型6に吸着保持させるようにしてもよい。
The workpiece W may be a semiconductor chip (for example, a CPU) 1 provided adjacently on the circuit board 3 or a plurality of semiconductor chips arranged in a matrix. The resin material 18 is not limited to a liquid resin, and may be any of granular, powder, and solid.
When the adhesion between the semiconductor chip 1 and the sealed mold 6 is good, the adhesive surface of the adhesive tape material 2 may be reversed and adhered to the sealed mold 6 side, or the release film is adsorbed to the sealed mold 6. You may make it hold | maintain.

樹脂封止装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the resin sealing apparatus. モールド型の平面図、正面断面図、側断面図である。It is a top view of a mold type, a front sectional view, and a side sectional view. 樹脂封止工程の一例を示す説明図である。It is explanatory drawing which shows an example of the resin sealing process. 粘着テープ材の他例を示す説明図である。It is explanatory drawing which shows the other example of an adhesive tape material. 閉止手段の他例を示す説明図である。It is explanatory drawing which shows the other example of a closing means. 閉止手段の他例を示す説明図である。It is explanatory drawing which shows the other example of a closing means. 閉止手段の他例を示す説明図である。It is explanatory drawing which shows the other example of a closing means.

符号の説明Explanation of symbols

W ワーク
1 半導体チップ
2 粘着テープ材
2a 舌部
3 回路基板
4 外部接続端子
5 モールド型
6 密閉型
6a 第1の凹部
6b 第2の凹部
7 支持型
7a 支持部
7b ヒータ
8 ホルダー
9 型ケース
10 断熱材
11 ワークテーブル
12 ボールねじ
13 サーボモータ
14 空圧回路
14a,15a 電磁弁
14b、15b 流路
15 吸引回路
16 第1の密閉空間
17 第2の密閉空間
18 樹脂材
20 線材
21 突起
22 突条
W Work 1 Semiconductor chip 2 Adhesive tape material 2a Tongue part 3 Circuit board 4 External connection terminal 5 Mold type 6 Sealed type 6a 1st recessed part 6b 2nd recessed part 7 Supporting type 7a Supporting part 7b Heater 8 Holder 9 Type case 10 Thermal insulation Material 11 Work table 12 Ball screw 13 Servo motor 14 Pneumatic circuit 14a, 15a Solenoid valve 14b, 15b Flow path 15 Suction circuit 16 First sealed space 17 Second sealed space 18 Resin material 20 Wire material 21 Projection 22 Projection

Claims (10)

半導体チップが回路基板にフリップチップ実装されたワークをモールド型でクランプし当該半導体チップの周囲に供給された樹脂材をアンダーフィルモールドする樹脂封止装置であって、
半導体チップの樹脂注入方向と平行な両側で当該半導体チップと回路基板との隙間を閉止する閉止手段と、
半導体チップ及び回路基板に押接して半導体チップの樹脂注入方向上流側及び下流側の側面に臨む第1、第2の密閉空間を形成する第1、第2の凹部が形成された密閉型と、ワークの端子形成面を支持する支持部が形成された支持型を備えたモールド型と、
密閉型の第1の凹部に接続して圧縮空気が送り込まれる空圧回路と、密閉型の第2の凹部に接続してエアが吸引される吸引回路を備えており、
半導体チップの樹脂注入方向上流側において当該半導体チップと回路基板の隙間を覆って供給された樹脂材が、空圧回路より第1の密閉空間に圧縮空気を送り込みかつ吸引回路より第2の密閉空間からエアを吸引しながらアンダーフィルモールドされる樹脂封止装置。
A resin sealing device for clamping a work in which a semiconductor chip is flip-chip mounted on a circuit board with a mold and underfill molding a resin material supplied around the semiconductor chip,
A closing means for closing a gap between the semiconductor chip and the circuit board on both sides parallel to the resin injection direction of the semiconductor chip;
A sealed mold in which first and second recesses are formed to form first and second sealed spaces that are pressed against the semiconductor chip and the circuit board and face the upstream and downstream side surfaces of the semiconductor chip in the resin injection direction; A mold die provided with a support die on which a support portion for supporting the terminal forming surface of the workpiece is formed;
A pneumatic circuit connected to the sealed first recess and fed with compressed air; and a suction circuit connected to the sealed second recess and sucked air;
The resin material supplied to cover the gap between the semiconductor chip and the circuit board on the upstream side in the resin injection direction of the semiconductor chip sends compressed air from the pneumatic circuit to the first sealed space and from the suction circuit to the second sealed space. Resin sealing device that is underfill molded while sucking air from.
閉止手段は、半導体チップの上面から樹脂注入方向と平行な両側面及び基板面に粘着して閉止する粘着テープ材である請求項1記載の樹脂封止装置。   2. The resin sealing device according to claim 1, wherein the closing means is an adhesive tape material that adheres and closes to both side surfaces parallel to the resin injection direction and the substrate surface from the upper surface of the semiconductor chip. 閉止手段は、半導体チップの樹脂注入方向と平行な両側で当該半導体チップと回路基板との隙間を塞ぐ樹脂材、接着剤、線材、回路基板の表面レジスト層による突条のいずれかである請求項1記載の樹脂封止装置。   The closing means is any one of a resin material, an adhesive, a wire, and a protrusion formed by a surface resist layer of the circuit board that closes a gap between the semiconductor chip and the circuit board on both sides parallel to the resin injection direction of the semiconductor chip. 1. The resin sealing device according to 1. 密閉型は、ホルダーに支持された弾性部材であり、ワークはヒータを内蔵した支持型に端子形成面を通じて支持されている請求項1記載の樹脂封止装置。   The resin sealing device according to claim 1, wherein the sealed type is an elastic member supported by a holder, and the work is supported by a support type incorporating a heater through a terminal forming surface. 支持型はワークテーブルに支持されており、該ワークテーブルは支持型に支持されたワークを搬送機構により搬送される請求項1記載の樹脂封止装置。   The resin sealing apparatus according to claim 1, wherein the support mold is supported by a work table, and the work table is transported by a transport mechanism. モールド型はアンダーフィルモールドされる際にワークに振動を加える加振手段を備えた請求項1記載の樹脂封止装置。   The resin sealing device according to claim 1, wherein the mold includes an oscillating means for applying vibration to the workpiece when underfill molding is performed. 半導体チップが回路基板にフリップチップ実装されたワークをモールド型でクランプし当該半導体チップの周囲に供給された樹脂材をアンダーフィルモールドする樹脂封止方法であって、
半導体チップの樹脂注入方向と平行な両側で回路基板との隙間が閉止されたワークの樹脂注入方向上流側において半導体チップと回路基板の隙間を覆って樹脂材を供給する工程と、
ワークに密閉型を押し当て、半導体チップの樹脂材が流し込まれる上流側の側面及び下流側の側面に臨む第1、第2の密閉空間を各々形成する工程と、
第1の密閉空間へ圧縮空気を送り込み、第2の密閉空間よりエアを吸引することで半導体チップと回路基板の隙間に樹脂材が注入されるアンダーフィルモールド工程と、
アンダーフィルモールドされたワークに押接するモールド型を開放し、半導体チップの樹脂注入方向と平行な両側へ樹脂材を供給して半導体チップの周囲を封止する工程と、
ワークを加熱して樹脂材を硬化させる工程を含む樹脂封止方法。
It is a resin sealing method in which a semiconductor chip is flip-chip mounted on a circuit board, clamped with a mold, and a resin material supplied around the semiconductor chip is underfill molded,
Supplying a resin material covering the gap between the semiconductor chip and the circuit board on the upstream side in the resin injection direction of the workpiece in which the gap between the circuit board is closed on both sides parallel to the resin injection direction of the semiconductor chip;
A process of forming a first and a second sealed space respectively facing the upstream side surface and the downstream side surface into which the resin material of the semiconductor chip is poured, pressing the sealed mold against the workpiece;
An underfill molding step in which a resin material is injected into the gap between the semiconductor chip and the circuit board by sending compressed air into the first sealed space and sucking air from the second sealed space;
Opening the mold that presses against the underfill-molded workpiece, supplying a resin material to both sides parallel to the resin injection direction of the semiconductor chip, and sealing the periphery of the semiconductor chip;
A resin sealing method including a step of curing a resin material by heating a workpiece.
ワークに樹脂材を供給する前に半導体チップの樹脂注入方向と平行な両側を閉止手段により閉止する工程と、
モールド型を開放した後、半導体チップの樹脂注入方向と平行な両側へ樹脂材を供給する前に閉止手段を除去する工程を有する請求項7記載の樹脂封止方法。
A step of closing both sides of the semiconductor chip parallel to the resin injection direction by the closing means before supplying the resin material to the workpiece;
8. The resin sealing method according to claim 7, further comprising a step of removing the closing means after the mold is opened and before the resin material is supplied to both sides of the semiconductor chip parallel to the resin injection direction.
アンダーフィルモールド工程を行なう際に、ワークに低周波振動を加える請求項7記載の樹脂封止方法。   The resin sealing method according to claim 7, wherein low-frequency vibration is applied to the workpiece when performing the underfill molding step. モールド樹脂が第1の密閉空間から第2の密閉空間へ到達したことを検出すると第1の密閉空間への圧縮空気の送り込みを停止しアンダーフィルモールドを終了する請求項7記載の樹脂封止方法。   8. The resin sealing method according to claim 7, wherein when it is detected that the mold resin has reached the second sealed space from the first sealed space, the feeding of the compressed air to the first sealed space is stopped and the underfill molding is terminated. .
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010177584A (en) * 2009-01-30 2010-08-12 Furukawa Electric Co Ltd:The Method of manufacturing optical module, and optical module manufactured by the method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11121488A (en) * 1997-10-15 1999-04-30 Toshiba Corp Manufacture of semiconductor device and resin sealing device
JPH11274189A (en) * 1998-03-24 1999-10-08 Fuji Xerox Co Ltd Method and apparatus for sealing mounted electronic component unit
JP2002237496A (en) * 2001-02-08 2002-08-23 Mitsubishi Electric Corp Apparatus for manufacturing semiconductor device, and method for manufacturing the device by using the apparatus
JP2002359258A (en) * 2001-03-26 2002-12-13 Denso Corp Method for mounting electronic component

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11121488A (en) * 1997-10-15 1999-04-30 Toshiba Corp Manufacture of semiconductor device and resin sealing device
JPH11274189A (en) * 1998-03-24 1999-10-08 Fuji Xerox Co Ltd Method and apparatus for sealing mounted electronic component unit
JP2002237496A (en) * 2001-02-08 2002-08-23 Mitsubishi Electric Corp Apparatus for manufacturing semiconductor device, and method for manufacturing the device by using the apparatus
JP2002359258A (en) * 2001-03-26 2002-12-13 Denso Corp Method for mounting electronic component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010177584A (en) * 2009-01-30 2010-08-12 Furukawa Electric Co Ltd:The Method of manufacturing optical module, and optical module manufactured by the method

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