JP2008153354A5 - - Google Patents
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- Publication number
- JP2008153354A5 JP2008153354A5 JP2006338380A JP2006338380A JP2008153354A5 JP 2008153354 A5 JP2008153354 A5 JP 2008153354A5 JP 2006338380 A JP2006338380 A JP 2006338380A JP 2006338380 A JP2006338380 A JP 2006338380A JP 2008153354 A5 JP2008153354 A5 JP 2008153354A5
- Authority
- JP
- Japan
- Prior art keywords
- release layer
- organic semiconductor
- forming
- substrate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims 9
- 230000001678 irradiating effect Effects 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 230000003313 weakening effect Effects 0.000 claims 2
- 238000001459 lithography Methods 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006338380A JP2008153354A (ja) | 2006-12-15 | 2006-12-15 | 有機半導体パターンの形成方法および半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006338380A JP2008153354A (ja) | 2006-12-15 | 2006-12-15 | 有機半導体パターンの形成方法および半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008153354A JP2008153354A (ja) | 2008-07-03 |
| JP2008153354A5 true JP2008153354A5 (cg-RX-API-DMAC7.html) | 2012-03-01 |
Family
ID=39655238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006338380A Pending JP2008153354A (ja) | 2006-12-15 | 2006-12-15 | 有機半導体パターンの形成方法および半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008153354A (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102038124B1 (ko) | 2016-06-27 | 2019-10-29 | 숭실대학교산학협력단 | 유기 반도체 소자의 제조 방법 |
| US10991894B2 (en) | 2015-03-19 | 2021-04-27 | Foundation Of Soongsil University-Industry Cooperation | Compound of organic semiconductor and organic semiconductor device using the same |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0613356A (ja) * | 1992-06-24 | 1994-01-21 | Sony Corp | 薄膜パターン形成方法 |
| AUPP699698A0 (en) * | 1998-11-06 | 1998-12-03 | Pacific Solar Pty Limited | Indirect laser patterning of resist |
| KR20050032114A (ko) * | 2002-08-06 | 2005-04-06 | 아베시아 리미티드 | 유기 전기 소자 |
| JP2004304162A (ja) * | 2003-03-17 | 2004-10-28 | Seiko Epson Corp | コンタクトホール形成方法、薄膜半導体装置の製造方法、電子デバイスの製造方法、電子デバイス |
| KR100669764B1 (ko) * | 2004-11-16 | 2007-01-16 | 삼성에스디아이 주식회사 | 박막 트랜지스터 제조 방법, 박막 트랜지스터 및 상기박막 트랜지스터를 구비판 평판 표시 장치 |
| JP2006147910A (ja) * | 2004-11-22 | 2006-06-08 | Sony Corp | 導電性パターン及びその形成方法 |
| JP2006156752A (ja) * | 2004-11-30 | 2006-06-15 | Sony Corp | 有機半導体材料層のパターニング方法、半導体装置の製造方法、電界発光有機材料層のパターニング方法、有機エレクトロルミネッセンス表示装置の製造方法、導電性高分子材料層のパターニング方法、及び、配線層の形成方法 |
| JP4433405B2 (ja) * | 2005-01-21 | 2010-03-17 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
| KR20070009013A (ko) * | 2005-07-14 | 2007-01-18 | 삼성전자주식회사 | 평판표시장치 및 평판표시장치의 제조방법 |
| JP2007243001A (ja) * | 2006-03-10 | 2007-09-20 | Konica Minolta Holdings Inc | 有機薄膜トランジスタの製造方法及び有機薄膜トランジスタ |
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2006
- 2006-12-15 JP JP2006338380A patent/JP2008153354A/ja active Pending