JP2008142648A - Slit nozzle - Google Patents

Slit nozzle Download PDF

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Publication number
JP2008142648A
JP2008142648A JP2006333930A JP2006333930A JP2008142648A JP 2008142648 A JP2008142648 A JP 2008142648A JP 2006333930 A JP2006333930 A JP 2006333930A JP 2006333930 A JP2006333930 A JP 2006333930A JP 2008142648 A JP2008142648 A JP 2008142648A
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slit nozzle
discharge port
coating liquid
coating solution
slit
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JP5202838B2 (en
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Shinji Takase
真治 高瀬
Kazunobu Yamaguchi
和伸 山口
Hirotsugu Kumazawa
博嗣 熊澤
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Priority to JP2006333930A priority Critical patent/JP5202838B2/en
Priority to TW096142866A priority patent/TW200900162A/en
Priority to KR1020070125973A priority patent/KR100940986B1/en
Priority to CN2007101953264A priority patent/CN101199961B/en
Publication of JP2008142648A publication Critical patent/JP2008142648A/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Nozzles (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a slit nozzle capable of reducing idle time for bubble removal work and removing striped unevenness of a coating film caused by bubbles. <P>SOLUTION: Bubbles (air) entrained in a coating solution are stagnated in the ceiling part of a first storage part 4 after getting off the coating solution during the time the coating solution flows from the first storage part 4 to a second storage part 5 and since the first storage part 4 is formed just like a range of two mountains, the air reaches the top part along the ceiling and is discharged out of a bubble discharge port 7 opened there. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、基板表面に一定の幅で塗布液を塗布するスリットノズルに関する。   The present invention relates to a slit nozzle that applies a coating liquid to a substrate surface with a certain width.

ガラス基板等の表面にホトレジスト等の塗布液を塗布する方法として、通常のノズルから基板表面に塗布液を滴下し、その後高速回転させることで均一な厚みとするスピンコーティングによるものがある。しかし、この方法では塗布された塗布液の９０％以上が飛散してしまい無駄が多い。そこで最近では、スリットノズルを用いて基板に一定幅で塗布液を塗布した後、ある程度回転させて塗膜の厚さを均一にする方法、或いはスリットノズルを用いて基板に一定幅で塗布液を塗布し、回転させることなく塗布工程を終了する方法が行われている。
上記のように、塗布液の無駄を少なくするには、できるだけ基板を回転させないで塗膜の厚みを均一にすることが条件となる。このためスリットノズルには、吐出口から吐出される塗布液の量がスリット状吐出口に沿って均一であることが必要になる。この均一性を確保するため従来から種々の提案がなされている。 As a method for applying a coating solution such as a photoresist on the surface of a glass substrate or the like, there is a method by spin coating in which the coating solution is dropped from a normal nozzle onto the substrate surface and then rotated at a high speed to obtain a uniform thickness. However, in this method, 90% or more of the applied coating solution is scattered, which is wasteful. Therefore, recently, after applying a coating liquid to a substrate with a constant width using a slit nozzle, the coating liquid is applied to the substrate with a constant width by rotating it to a certain degree to make the coating thickness uniform, or using a slit nozzle. There is a method in which the coating process is completed without applying and rotating.
As described above, in order to reduce the waste of the coating liquid, it is necessary to make the thickness of the coating film uniform without rotating the substrate as much as possible. Therefore, the slit nozzle needs to have a uniform amount of coating liquid discharged from the discharge port along the slit-shaped discharge port. Conventionally, various proposals have been made to ensure this uniformity.

図６（ａ）は、従来のスリットノズルの概要を示す斜視図、（ｂ）は同スリットノズルを構成するノズル半体を示す図である。スリットノズル１００は、２つの半体１０１、１０２を突き合わせてなり、一方の半体１０１の中央には塗布液供給孔１０３が形成され、この塗布液供給孔１０３から供給された塗布液は２つの半体１０１、１０２間に形成される流路１０４を介してスリット状吐出口１０５から基板表面に向けて塗布される。そして、従来にあっては流路１０４を天井部を山形に形成し、その頂部に流路１０４内の気泡を排出するための気泡排出口１０６を開けている。   FIG. 6A is a perspective view showing an outline of a conventional slit nozzle, and FIG. 6B is a diagram showing a nozzle half constituting the slit nozzle. The slit nozzle 100 is formed by abutting two halves 101 and 102, and a coating liquid supply hole 103 is formed at the center of one half 101, and two coating liquids are supplied from the coating liquid supply hole 103. It is applied from the slit-shaped discharge port 105 toward the substrate surface through a flow path 104 formed between the half bodies 101 and 102. Conventionally, the flow path 104 is formed in a mountain shape at the ceiling, and a bubble discharge port 106 for discharging bubbles in the flow path 104 is opened at the top.

しかし、最近では基板サイズの大型化にともなって、スリットノズルも大型化し、これに伴い流路１０４の天井部の傾斜が緩くなり流路内の気泡が十分に抜けないという問題が発生してきた。気泡が抜きにくいと、気泡抜き作業のためのアイドル時間が長くなり、また、抜け切らずに残った気泡が塗布液とともに吐出口から排出されて塗膜にスジムラができる原因となる。   However, recently, as the substrate size has increased, the slit nozzle has also increased in size. As a result, the inclination of the ceiling portion of the flow path 104 has become loose, and bubbles in the flow path have not been sufficiently removed. If the bubbles are difficult to be removed, the idle time for removing the bubbles becomes longer, and the remaining bubbles without being completely removed are discharged from the discharge port together with the coating liquid, thereby causing unevenness in the coating film.

特許文献１では、図６（ｃ）に示すように、スリットノズル内の気泡の排出を行う通気口を、スリットノズルの長手方向の両端部に設けている。そしてスリットノズルの気泡溜まり部内の上部が、スリットノズルの中央部から両端部に向けて徐々に高くなるようにＶ字状に傾斜させている。
また、特許文献２では、スリットノズルからの気泡の排出を吸引ポンプによる気泡の吸引によって行っている。 In patent document 1, as shown in FIG.6 (c), the vent which discharges the bubble in a slit nozzle is provided in the both ends of the longitudinal direction of a slit nozzle. And the upper part in the bubble reservoir part of a slit nozzle is made to incline in V shape so that it may become gradually high toward the both ends from the center part of a slit nozzle.
Moreover, in patent document 2, discharge | emission of the bubble from a slit nozzle is performed by the suction | inhalation of the bubble by a suction pump.

特開２００６−２１２５９２号公報JP 2006-212592 A 特開２００６−８７９９９号公報JP 2006-87999 A

特許文献１に開示されたスリットノズルでは気泡は抜けやすくなるが、通気口が両端のみでは気泡の排出を行う通気口までの距離が遠くなり必ずしも万全とは言えない。また、気泡溜まり部内の上部が、スリットノズルの中央部から両端部に向けて徐々に高くなるように傾斜させているため気泡溜まりが大容量となる。   With the slit nozzle disclosed in Patent Document 1, it is easy for bubbles to escape. However, if the vents are only at both ends, the distance to the vent that discharges the bubbles is long, and it is not necessarily perfect. Further, since the upper part in the bubble reservoir is inclined so as to gradually increase from the center of the slit nozzle toward both ends, the bubble reservoir has a large capacity.

また、塗布液量に対してエアーの占める容積が相対的に大きくなるため、エアーによるダンパー効果で、塗布液供給ポンプによる塗布液への加圧が不十分となり吐出圧のコントロールが困難となることも考えられる。   In addition, since the volume of air relative to the amount of coating liquid is relatively large, the air damper effect makes the coating liquid supply pump insufficiently pressurized and makes it difficult to control the discharge pressure. Is also possible.

また特許文献２に開示された吸引ポンプによる手段では、塗布液と混在している気泡を分離吸引することは難しい。   Further, with the means using the suction pump disclosed in Patent Document 2, it is difficult to separate and suck bubbles mixed with the coating liquid.

上記の課題を解決するため本発明は、塗布液が供給される塗布液供給口と、基板上に塗布液を流下させるための幅広のスリット状吐出口と、前記塗布液供給口とスリット状吐出口とをつなぐ塗布液流路とが形成されたスリットノズルであって、前記塗布液流路の天井面は複数の傾斜を有する連山状に形成され、連山状塗布液流路の頂部に塗布液流路内の気泡を排出する排出口が設けられた構成とした。   In order to solve the above problems, the present invention provides a coating liquid supply port to which a coating liquid is supplied, a wide slit-shaped discharge port for allowing the coating liquid to flow down on the substrate, the coating liquid supply port, and the slit-shaped discharge port. A slit nozzle in which a coating liquid channel connecting the outlet is formed, wherein the ceiling surface of the coating liquid channel is formed in a mountain shape having a plurality of slopes, and the coating liquid is formed on the top of the mountain-shaped coating solution channel It was set as the structure provided with the discharge port which discharges the bubble in a flow path.

前記連山状塗布液流路の頂部に開口する排出口の他に、スリットノズル長手方向の両端部側面または長手方向の中央部にも排出口を形成してもよい。   In addition to the discharge port opening at the top of the continuous coating liquid flow path, the discharge port may be formed on both side surfaces of the slit nozzle in the longitudinal direction or in the center in the longitudinal direction.

本発明に係るスリットノズルによれば、塗布液流路内の気泡を排出する排出口が連山状塗布液流路の頂部に複数開けられているため、気泡を容易に排出することができる。したがって、気泡抜き作業のためのアイドル時間の低減、および、気泡を原因とする塗膜のスジムラをなくすことが可能である。   According to the slit nozzle according to the present invention, since a plurality of discharge ports for discharging the bubbles in the coating liquid channel are opened at the top of the continuous coating solution channel, the bubbles can be easily discharged. Therefore, it is possible to reduce the idle time for removing bubbles and to eliminate the unevenness of the coating film caused by bubbles.

以下に本発明の最適な実施例を添付図面に基づいて説明する。図１は本発明に係るスリットノズルの斜視図、図２は本発明に係るスリットノズルを構成するノズル半体を示す図、図３（ａ）は図１のＡ−Ａ方向断面図、（ｂ）は図１のＢ−Ｂ方向断面図である。   DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings. 1 is a perspective view of a slit nozzle according to the present invention, FIG. 2 is a view showing a half nozzle body constituting the slit nozzle according to the present invention, FIG. ) Is a cross-sectional view in the BB direction of FIG.

スリットノズルは左右のノズル半体１，２を突き合わせボルトにて結合一体化することで構成され、一方のノズル半体１のノズル半体２との対向面には、塗布液流路３が形成されている。この塗布液流路３は第１貯留部４及び第２貯留部５からなる塗布液流路が形成されている。   The slit nozzle is configured by joining and integrating the left and right nozzle halves 1 and 2 with a butt bolt, and a coating liquid flow path 3 is formed on the surface of one nozzle half 1 facing the nozzle half 2. Has been. The coating liquid flow path 3 is formed with a coating liquid flow path including a first storage section 4 and a second storage section 5.

第１貯留部４の天井部４ａはノズル半体１の厚み方向（図２の左右方向）の約半分近くの深さまで穿設され、その断面形状は同一幅で深さが深くなるほど高くなるように傾斜している。また第１貯留部４のノズル半体１のノズル半体２との対向面に開口している部分４ｂの形状は、図２に示すように、長手方向（図２の左右方向）に２つの連山状としてあり、中央部（谷部）において塗布液供給孔６と連通し、２つの頂上部において気泡排出口７に連通している。   The ceiling part 4a of the first storage part 4 is drilled to a depth of about half of the thickness direction of the nozzle half body 1 (left-right direction in FIG. 2), and the cross-sectional shape thereof becomes higher as the depth increases with the same width. It is inclined to. Moreover, the shape of the part 4b opened to the surface facing the nozzle half body 2 of the nozzle half body 1 of the 1st storage part 4 is two in the longitudinal direction (left-right direction of FIG. 2), as shown in FIG. It has a continuous mountain shape, communicates with the coating liquid supply hole 6 at the center (valley), and communicates with the bubble discharge port 7 at the two tops.

第２貯留部５は前記第１貯留部４の下側に連続して形成され、その深さはノズル半体１の厚み方向を基準として前記第１貯留部４よりも小さくされている。また、第２貯留部５の下側には他方のノズル半体２との間でオリフィスを形成する平坦面８が連続して形成され、このオリフィスの下端がスリット状吐出口９となる。   The second reservoir 5 is formed continuously below the first reservoir 4, and the depth thereof is smaller than that of the first reservoir 4 with respect to the thickness direction of the nozzle half 1. Further, a flat surface 8 that forms an orifice with the other nozzle half 2 is continuously formed below the second reservoir 5, and the lower end of the orifice is a slit-like discharge port 9.

また、第１貯留部４、第２貯留部５及びオリフィス８からの塗布液の漏れを防止するため、ノズルの両端には端板１０，１１が取り付けられている。   Further, end plates 10 and 11 are attached to both ends of the nozzle in order to prevent leakage of the coating liquid from the first reservoir 4, the second reservoir 5 and the orifice 8.

以上において、塗布液供給孔６から第１貯留部４に流入した塗布液は、第１貯留部４を経て第２貯留部５に均等に流入する。なお、均等流入の効果を高めるため２つの山の頂点、つまり塗布液供給孔６の近傍に２つの塗布液供給孔６を形成してもよい。   In the above, the coating liquid that has flowed into the first reservoir 4 from the coating liquid supply hole 6 flows equally into the second reservoir 5 through the first reservoir 4. In order to enhance the effect of uniform inflow, two coating liquid supply holes 6 may be formed at the tops of two peaks, that is, in the vicinity of the coating liquid supply holes 6.

塗布液に巻き込まれた気泡（エアー）は第１貯留部４から第２貯留部５へ流入する間に塗布液から抜け出して第１貯留部４内の天井部分に溜まるが、第１貯留部４が２つの連山状に形成されているため、エアーは天井に沿って頂部に達し、ここに開けられた気泡排出口７から排出される。   Air bubbles (air) entrained in the coating solution escape from the coating solution while flowing from the first storage unit 4 to the second storage unit 5 and accumulate in the ceiling portion in the first storage unit 4. Is formed in two continuous mountain shapes, air reaches the top along the ceiling and is discharged from the bubble discharge port 7 opened here.

図６に既述した従来の機構では、気泡排出口が一箇所或いは塗布液供給孔６からの距離が大き過ぎたため、スリット幅の広いスリットノズルへ適用するとエアーの排出が困難となっていたが、本発明のスリットノズルでは容易である。   In the conventional mechanism described above with reference to FIG. 6, it is difficult to discharge air when applied to a slit nozzle having a wide slit width because the bubble discharge port is one place or the distance from the coating liquid supply hole 6 is too large. The slit nozzle of the present invention is easy.

本発明のスリットノズルは、上記例の他にも気泡排出口７を、複数、色々な場所に設けることができる。図４は本発明のスリットノズルの他の例を示す正面図である。簡便化のため、本図においては気泡排出口７以外の気泡排出口７ａ，７ｂ，７ｃの位置と、気泡排出方向のみを示している。   The slit nozzle of the present invention can be provided with a plurality of bubble outlets 7 in various places in addition to the above example. FIG. 4 is a front view showing another example of the slit nozzle of the present invention. For the sake of simplicity, only the positions of the bubble discharge ports 7a, 7b, 7c other than the bubble discharge port 7 and the bubble discharge direction are shown in the figure.

また、図５は別実施例を示すスリットノズルの断面図であり、気泡排出口７が開口する面をノズル半体１の上面ではなく、背面にしている。   FIG. 5 is a cross-sectional view of a slit nozzle showing another embodiment, and the surface where the bubble discharge port 7 is opened is not the top surface of the nozzle half 1 but the back surface.

塗布液は、塗布液供給孔６から図示しない第１貯留部に送られる。そして塗布液に混在していた気泡はエアーとなって第１貯留部の天井部分に溜まる。ここで、排出口７ａのみを頂点にした第１貯留部を形成するのが図６（ｂ）に示した従来例である。別実施例においては、排出口７と長手方向両端の排出口７ｂ，７ｂを併設する。あるいは、排出口７と長手方向両端の排出口７ｃ，７ｃを併設する。   The coating liquid is sent from the coating liquid supply hole 6 to a first storage unit (not shown). Then, the air bubbles mixed in the coating liquid become air and accumulate in the ceiling portion of the first reservoir. Here, it is the conventional example shown in FIG. 6B that forms the first storage portion having only the discharge port 7a as the apex. In another embodiment, the discharge port 7 and discharge ports 7b and 7b at both ends in the longitudinal direction are provided side by side. Alternatively, the discharge port 7 and discharge ports 7c and 7c at both ends in the longitudinal direction are provided.

また、排出口７を２箇所に開けるのは図２の実施例であるが、この場合、排出口を図５に示したように側面に開口させることもできる。さらに、以上説明した排出口７ａ、７ｂおよび７ｃのうちの２つまたはそれ以上を適宜組み合わせて、本発明のスリットノズルを構成することができる。この場合、各排出口が頂上となるよう第１貯留部を傾斜させておくことが望ましいのは既述の通りである。   Moreover, although it is the Example of FIG. 2 that opens the discharge port 7 in two places, a discharge port can also be opened to a side surface as shown in FIG. Furthermore, the slit nozzle of the present invention can be configured by appropriately combining two or more of the discharge ports 7a, 7b and 7c described above. In this case, as described above, it is desirable to incline the first reservoir so that each discharge port is at the top.

本発明に係るスリットノズルの斜視図The perspective view of the slit nozzle which concerns on this invention 本発明に係るスリットノズルを構成するノズル半体を示す図The figure which shows the nozzle half body which comprises the slit nozzle which concerns on this invention. （ａ）は図１のＡ−Ａ方向断面図、（ｂ）は図１のＢ−Ｂ方向断面図1A is a cross-sectional view in the AA direction in FIG. 1, and FIG. 1B is a cross-sectional view in the BB direction in FIG. 別実施例を示すスリットノズルの正面図Front view of slit nozzle showing another embodiment 別実施例を示すスリットノズルの断面図Sectional drawing of the slit nozzle which shows another Example （ａ）は従来のスリットノズルの斜視図、（ｂ）及び（ｃ）は従来のスリットノズルを構成するノズル半体を示す図(A) is a perspective view of a conventional slit nozzle, and (b) and (c) are diagrams showing a nozzle half constituting the conventional slit nozzle.

符号の説明Explanation of symbols

１，２…ノズル半体、３…塗布液流路、４…第１貯留部、５…第２貯留部、６…塗布液供給孔、７， ７a，７b，７c…気泡排出口、８…オリフィスを形成する平坦面、９…スリット状吐出口、１０、１１…端板、１００…スリットノズル、１０１，１０２…スリット半体、１０３…塗布液供給孔、１０４…塗布液流路、１０５…スリット状吐出口、１０６…気泡排出口。   DESCRIPTION OF SYMBOLS 1, ... Nozzle half body, 3 ... Coating liquid flow path, 4 ... 1st storage part, 5 ... 2nd storage part, 6 ... Coating liquid supply hole, 7, 7a, 7b, 7c ... Bubble discharge port, 8 ... Flat surface forming an orifice, 9 ... slit-shaped discharge port, 10, 11 ... end plate, 100 ... slit nozzle, 101, 102 ... half slit, 103 ... coating liquid supply hole, 104 ... coating liquid flow path, 105 ... Slit-like discharge port 106 ... Bubble discharge port.

Claims (2)

塗布液が供給される塗布液供給口と、基板上に塗布液を流下させるための幅広のスリット状吐出口と、前記塗布液供給口とスリット状吐出口とをつなぐ塗布液流路とが形成されたスリットノズルであって、前記塗布液流路の天井面は複数の傾斜を有する連山状に形成され、連山状塗布液流路の頂部に塗布液流路内の気泡を排出する排出口が設けられていることを特徴とするスリットノズル。 Formed are a coating solution supply port through which the coating solution is supplied, a wide slit-shaped discharge port for allowing the coating solution to flow down on the substrate, and a coating solution flow path connecting the coating solution supply port and the slit-shaped discharge port. The coating liquid channel ceiling surface is formed in a plurality of slopes having a plurality of slopes, and a discharge port for discharging air bubbles in the coating solution channel is formed at the top of the mountain coating liquid channel. A slit nozzle characterized by being provided. 請求項１に記載のスリットノズルにおいて、前記排出口はスリットノズル長手方向の両端部側面または長手方向の中央部にも形成されていることを特徴とするスリットノズル。






The slit nozzle of Claim 1 WHEREIN: The said discharge port is also formed in the both-ends side surface of a slit nozzle longitudinal direction, or the center part of a longitudinal direction, The slit nozzle characterized by the above-mentioned.






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TW096142866A TW200900162A (en) 2006-12-12 2007-11-13 Slit nozzle
KR1020070125973A KR100940986B1 (en) 2006-12-12 2007-12-06 Slit nozzle
CN2007101953264A CN101199961B (en) 2006-12-12 2007-12-10 Slit nozzle

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CN102688828A (en) * 2011-03-25 2012-09-26 恒辉新能源（昆山）有限公司 High-precision coater
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JP2009178649A (en) * 2008-01-30 2009-08-13 Dainippon Printing Co Ltd Die head and die coater equipped with it
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JP2012183463A (en) * 2011-03-04 2012-09-27 Toray Ind Inc Applicator
CN102688828A (en) * 2011-03-25 2012-09-26 恒辉新能源（昆山）有限公司 High-precision coater
JP2012239976A (en) * 2011-05-19 2012-12-10 Fuji Kikai Kogyo Kk Coating apparatus
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KR100940986B1 (en) 2010-02-05
TWI330109B (en) 2010-09-11
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TW200900162A (en) 2009-01-01
JP5202838B2 (en) 2013-06-05
CN101199961B (en) 2011-02-09

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