JP2008124188A5 - - Google Patents

Download PDF

Info

Publication number
JP2008124188A5
JP2008124188A5 JP2006305111A JP2006305111A JP2008124188A5 JP 2008124188 A5 JP2008124188 A5 JP 2008124188A5 JP 2006305111 A JP2006305111 A JP 2006305111A JP 2006305111 A JP2006305111 A JP 2006305111A JP 2008124188 A5 JP2008124188 A5 JP 2008124188A5
Authority
JP
Japan
Prior art keywords
wire
fine
insulating
electrode structure
thin wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006305111A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008124188A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006305111A priority Critical patent/JP2008124188A/ja
Priority claimed from JP2006305111A external-priority patent/JP2008124188A/ja
Publication of JP2008124188A publication Critical patent/JP2008124188A/ja
Publication of JP2008124188A5 publication Critical patent/JP2008124188A5/ja
Pending legal-status Critical Current

Links

JP2006305111A 2006-11-10 2006-11-10 電極構造体及びその製造方法、並びに電子デバイス Pending JP2008124188A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006305111A JP2008124188A (ja) 2006-11-10 2006-11-10 電極構造体及びその製造方法、並びに電子デバイス

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006305111A JP2008124188A (ja) 2006-11-10 2006-11-10 電極構造体及びその製造方法、並びに電子デバイス

Publications (2)

Publication Number Publication Date
JP2008124188A JP2008124188A (ja) 2008-05-29
JP2008124188A5 true JP2008124188A5 (enExample) 2009-12-03

Family

ID=39508633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006305111A Pending JP2008124188A (ja) 2006-11-10 2006-11-10 電極構造体及びその製造方法、並びに電子デバイス

Country Status (1)

Country Link
JP (1) JP2008124188A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5360528B2 (ja) * 2008-05-07 2013-12-04 国立大学法人北陸先端科学技術大学院大学 ギャップで分断された薄膜の製造方法、およびこれを用いたデバイスの製造方法
US8114787B2 (en) * 2009-02-19 2012-02-14 Empire Technology Development Llc Integrated circuit nanowires
KR101407209B1 (ko) * 2010-10-07 2014-06-16 포항공과대학교 산학협력단 미세 패턴 형성 방법 및 이를 이용한 미세 채널 트랜지스터 및 미세 채널 발광트랜지스터의 형성방법
CN108072683B (zh) * 2016-11-10 2021-04-23 元太科技工业股份有限公司 感测元件及其形成方法
US11784227B2 (en) 2017-10-13 2023-10-10 Wayne State University Method for fabricating wafer scale/nano sub micron gap electrodes and arrays via photolithography
GB2610886B (en) * 2019-08-21 2023-09-13 Pragmatic Printing Ltd Resistor geometry
GB2587793B (en) 2019-08-21 2023-03-22 Pragmatic Printing Ltd Electronic circuit comprising transistor and resistor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2373095A (en) * 2001-03-09 2002-09-11 Seiko Epson Corp Patterning substrates with evaporation residues

Similar Documents

Publication Publication Date Title
MY169953A (en) Copper metal film, method for producing same, copper metal pattern, conductive wiring line using the copper metal pattern, copper metal bump, heat conduction path, bonding material, and liquid composition
US20100101832A1 (en) Compound magnetic nanowires for tco replacement
TWI525923B (zh) 電性接點零件
WO2010087053A1 (ja) ボンディングワイヤ
JP2001319946A5 (enExample)
JP2017092078A (ja) ボールボンディング用貴金属被覆銅ワイヤ
JP2008124188A5 (enExample)
TW200701275A (en) Ceramic electronic component and manufacturing method thereof
JP2012182129A5 (enExample)
JP2017050407A (ja) ボールボンディング用パラジウム(Pd)被覆銅ワイヤ
TW201247524A (en) Bump with nanolaminated structure, package structure of the same and method of preparing the same
GB2579505A (en) Dynamic glass and method of formation
JPWO2014027418A1 (ja) 電子部品および電子部品の製造方法
US9111556B1 (en) Low resistance interface metal for disk drive suspension component grounding
JP2008193009A5 (enExample)
CN106653910A (zh) 一种光伏焊带及其制备方法
JP2007043113A5 (ja) 半導体装置の作製方法
CN105981165B (zh) 在载条上制造可结合覆层的方法
JP2007103828A5 (enExample)
CN103776882B (zh) 一种基于氮化硅的纳米金膜电极
CN104607648B (zh) 一种制备纳米或亚微米级锡或锡合金微球的方法
JP7072811B2 (ja) 金属めっき物
JP2006108354A5 (enExample)
KR102216738B1 (ko) 반도체 패키지용 클립구조체
CN103367304B (zh) 封装基板、覆晶式封装及其制造方法