JP2008122845A5 - - Google Patents
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- Publication number
- JP2008122845A5 JP2008122845A5 JP2006309101A JP2006309101A JP2008122845A5 JP 2008122845 A5 JP2008122845 A5 JP 2008122845A5 JP 2006309101 A JP2006309101 A JP 2006309101A JP 2006309101 A JP2006309101 A JP 2006309101A JP 2008122845 A5 JP2008122845 A5 JP 2008122845A5
- Authority
- JP
- Japan
- Prior art keywords
- solder resist
- resist pattern
- forming
- film
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000679 solder Inorganic materials 0.000 claims 10
- 238000000034 method Methods 0.000 claims 8
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 229920001169 thermoplastic Polymers 0.000 claims 3
- 239000004416 thermosoftening plastic Substances 0.000 claims 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims 2
- 238000002835 absorbance Methods 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005476 soldering Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006309101A JP2008122845A (ja) | 2006-11-15 | 2006-11-15 | ソルダーレジストパターンの形成方法 |
| TW96142700A TWI426351B (zh) | 2006-11-15 | 2007-11-12 | Photolithography (Phototool) and the formation of resistance to resistance pattern |
| CN 200710187256 CN101183212B (zh) | 2006-11-15 | 2007-11-15 | 光工具以及阻焊图案的形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006309101A JP2008122845A (ja) | 2006-11-15 | 2006-11-15 | ソルダーレジストパターンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008122845A JP2008122845A (ja) | 2008-05-29 |
| JP2008122845A5 true JP2008122845A5 (https=) | 2010-01-07 |
Family
ID=39507631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006309101A Pending JP2008122845A (ja) | 2006-11-15 | 2006-11-15 | ソルダーレジストパターンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008122845A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5079310B2 (ja) * | 2006-11-15 | 2012-11-21 | 太陽ホールディングス株式会社 | ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
| JP2001296666A (ja) * | 2000-04-12 | 2001-10-26 | Orc Mfg Co Ltd | 基板露光方法および露光装置 |
| JP3876991B2 (ja) * | 2002-08-07 | 2007-02-07 | 三菱化学株式会社 | 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法 |
| JP4852225B2 (ja) * | 2003-10-20 | 2012-01-11 | 大日本印刷株式会社 | 露光装置および露光方法 |
| TWI403761B (zh) * | 2005-02-15 | 2013-08-01 | Fujifilm Corp | 透光性導電性膜之製法 |
-
2006
- 2006-11-15 JP JP2006309101A patent/JP2008122845A/ja active Pending
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