JP2008118123A - 表示装置の作製方法、及びエッチング装置 - Google Patents
表示装置の作製方法、及びエッチング装置 Download PDFInfo
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- JP2008118123A JP2008118123A JP2007265332A JP2007265332A JP2008118123A JP 2008118123 A JP2008118123 A JP 2008118123A JP 2007265332 A JP2007265332 A JP 2007265332A JP 2007265332 A JP2007265332 A JP 2007265332A JP 2008118123 A JP2008118123 A JP 2008118123A
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Images
Abstract
【解決手段】チューブを絶縁層の開口形成領域上に絶縁層に接して配置し、そのチューブを通して処理剤(エッチングガス又はエッチング液)を絶縁層に吐出する。吐出(された処理剤(エッチングガス又はエッチング液)によって、絶縁層を選択的に除去し、絶縁層に開口を形成する。従って、導電層上に開口を有する絶縁層が形成され、絶縁層下の導電層が開口の底面に露出する。露出された導電層と接するように開口に導電膜を形成し、導電層と導電膜を絶縁層に設けられた開口において電気的に接続する。
【選択図】図1
Description
本実施の形態では、確実により簡略化した工程で低コストに作製することを目的としたコンタクトホールの形成方法について、図1を用いて説明する。
本実施の形態では、確実により簡略化した工程で低コストに作製することを目的とした積層構造のコンタクトホールを形成する方法について説明する。詳しくは実施の形態1において、コンタクトホールが複数の積層する膜に亘って形成される例である。従って、同一部分又は同様な機能を有する部分は実施の形態1と同様な材料及び方法を用いればよく、その繰り返しの説明は省略する。
本実施の形態では、簡略化した工程で低コストに作製することを目的とした表示装置の作製方法について、図35を用いて説明する。
図25(A)は本発明に係る表示パネルの構成を示す平面図であり、絶縁表面を有する基板2700上に画素2702をマトリクス上に配列させた画素部2701、走査線側入力端子2703、信号線側入力端子2704が形成されている。画素数は種々の規格に従って設ければ良く、XGAであってRGBを用いたフルカラー表示であれば1024×768×3(RGB)、UXGAであってRGBを用いたフルカラー表示であれば1600×1200×3(RGB)、フルスペックハイビジョンに対応させ、RGBを用いたフルカラー表示であれば1920×1080×3(RGB)とすれば良い。
本実施の形態では、より簡略化した工程で低コストに作製することを目的とした表示装置の例について説明する。詳しくは表示素子に発光素子を用いる発光表示装置について説明する。本実施の形態における表示装置の作製方法を、図15を用いて詳細に説明する。
本発明を適用して薄膜トランジスタを形成し、該薄膜トランジスタを用いて表示装置を形成することができるが、発光素子を用いて、なおかつ、該発光素子を駆動するトランジスタとしてnチャネル型トランジスタを用いた場合、該発光素子から発せられる光は、下方放射、上方放射、両方放射のいずれかを行う。ここでは、それぞれの場合に応じた発光素子の積層構造について、図17を用いて説明する。
本実施の形態では、より簡略化した工程で低コストに作製することを目的とした表示装置の例について説明する。詳しくは表示素子に発光素子を用いる発光表示装置について説明する。本実施の形態では、本発明の表示装置の表示素子として適用することのできる発光素子の構成を、図22を用いて説明する。
本実施の形態では、より簡略化した工程で低コストに作製することを目的とした表示装置の例について説明する。詳しくは表示素子に発光素子を用いる発光表示装置について説明する。本実施の形態では、本発明の表示装置の表示素子として適用することのできる発光素子の構成を、図23及び図24を用いて説明する。
本実施の形態では、より簡略化した工程で低コストに作製することを目的とした表示装置の例について説明する。詳しくは表示素子に液晶表示素子を用いる液晶表示装置について説明する。
本実施の形態では、より簡略化した工程で低コストに作製することを目的とした表示装置の例について説明する。詳しくは表示素子に液晶表示素子を用いる液晶表示装置について説明する。
本実施の形態では、より簡略化した工程で低コストに作製することを目的とした表示装置の一例について説明する。
次に、実施の形態4乃至11によって作製される表示パネルに駆動用のドライバ回路を実装する態様について説明する。
実施の形態4乃至11によって作製される表示パネル(EL表示パネル、液晶表示パネル)において、半導体層を非晶質半導体、又はSASで形成し、走査線側の駆動回路を基板上に形成する例を示す。
本実施の形態を図16を用いて説明する。図16は、本発明を適用して作製されるTFT基板2800を用いてEL表示モジュールを構成する一例を示している。図16において、TFT基板2800上には、画素により構成された画素部が形成されている。
本実施の形態を図20(A)及び図20(B)を用いて説明する。図20(A)、図20(B)は、本発明を適用して作製されるTFT基板2600を用いて液晶表示モジュールを構成する一例を示している。
本発明によって形成される表示装置によって、テレビジョン装置(単にテレビ、又はテレビジョン受信機ともよぶ)を完成させることができる。図27はテレビジョン装置の主要な構成を示すブロック図を示している。
本発明に係る電子機器として、テレビジョン装置(単にテレビ、又はテレビジョン受信機ともよぶ)、デジタルカメラ、デジタルビデオカメラ、携帯電話装置(単に携帯電話機、携帯電話ともよぶ)、PDA等の携帯情報端末、携帯型ゲーム機、コンピュータ用のモニタ、コンピュータ、カーオーディオ等の音響再生装置、家庭用ゲーム機等の記録媒体を備えた画像再生装置等が挙げられる。その具体例について、図29を参照して説明する。
Claims (14)
- 導電層を形成し、
前記導電層上に絶縁層を形成し、
前記絶縁層にチューブを接して配置し、
前記チューブより処理剤を吐出し前記絶縁層に前記導電層に達する開口を形成し、
前記開口に前記導電層と接するように導電膜を形成することを特徴とする表示装置の作製方法。 - 導電層を形成し、
前記導電層上に絶縁層を形成し、
前記絶縁層にチューブを接して配置し、
前記チューブより処理剤を吐出し前記絶縁層に前記導電層に達する開口を形成し、
前記開口に前記チューブより導電性材料を含む組成物を吐出し前記導電層と接するように導電膜を形成することを特徴とする表示装置の作製方法。 - 導電層を形成し、
前記導電層上に第1の絶縁層を形成し、
前記第1の絶縁層上に第2の絶縁層を形成し、
前記第2の絶縁層にチューブを挿入し第1の開口を形成し、
前記チューブより処理剤を吐出し前記第1の絶縁層に前記導電層に達する第2の開口を形成し、
前記第1の開口及び前記第2の開口に前記導電層と接するように導電膜を形成することを特徴とする表示装置の作製方法。 - 導電層を形成し、
前記導電層上に第1の絶縁層を形成し、
前記第1の絶縁層上に第2の絶縁層を形成し、
前記第2の絶縁層にチューブを挿入し第1の開口を形成し、
前記チューブより処理剤を吐出し前記第1の絶縁層に前記導電層に達する第2の開口を形成し、
前記第1の開口及び前記第2の開口に前記チューブより導電性材料を含む組成物を吐出し前記導電層と接するように導電膜を形成することを特徴とする表示装置の作製方法。 - ゲート電極層、ゲート絶縁層、半導体層、ソース電極層及びドレイン電極層を形成し、
前記ソース電極層及び前記ドレイン電極層上に絶縁層を形成し、
前記絶縁層にチューブを接して配置し、
前記チューブより処理剤を吐出し前記絶縁層に前記ソース電極層又は前記ドレイン電極層に達する開口を形成し、
開口に前記ソース電極層又は前記ドレイン電極層と接するように画素電極層を形成することを特徴とする表示装置の作製方法。 - ソース領域及びドレイン領域を有する半導体層を形成し、
前記半導体層上にゲート絶縁層を形成し、
前記半導体層及び前記ゲート絶縁層上にゲート電極層を形成し、
前記半導体層、前記ゲート絶縁層、及び前記ゲート電極層上に絶縁層を形成し、
前記絶縁層にチューブにより第1の開口を形成し、
前記チューブより処理剤を吐出し前記絶縁層及び前記ゲート絶縁層に前記ソース領域及び前記ドレイン領域に達する第2の開口を形成し、
前記第1の開口及び前記第2の開口に前記ソース領域と接するようにソース電極層を、前記ドレイン領域に接するようにドレイン電極層を形成することを特徴とする表示装置の作製方法。 - 請求項1乃至6のいずれか一項において、前記処理剤を前記チューブより吐出後、前記チューブから吸引し除去することを特徴とする表示装置の作製方法。
- 請求項1乃至7のいずれか一項において、前記チューブは針状であることを特徴とする表示装置の作製方法。
- 請求項1乃至8のいずれか一項において、前記処理剤はエッチングガス、またはエッチング液を用いることを特徴とする表示装置の作製方法。
- 中空構造を有し先端が開口している細管と、
基板を載置するステージと、
前記基板上の所定の位置に前記細管を移動させ設置する位置制御手段と、
前記細管に処理剤を供給する材料貯蔵室と、
前記細管より前記処理剤を吐出する吐出制御手段と
を有することを特徴とするエッチング装置。 - 中空構造を有し先端が開口している細管と、
基板を載置するステージと、
前記基板上の所定の位置に前記細管を移動させ該細管の先端を被加工面に接触させる位置制御手段と、
前記細管に処理剤を供給する材料貯蔵室と、
前記細管より前記処理剤を吐出する吐出制御手段と
を有することを特徴とするエッチング装置。 - 中空構造を有し先端が開口している細管と、
基板を載置するステージと、
前記基板上の所定の位置に前記細管を移動させ設置する位置制御手段と、
前記細管に処理剤を供給する材料貯蔵室と、
前記細管より前記処理剤を吐出する吐出制御手段と、
前記吐出した前記処理剤を吸引する吸引制御手段と
を有することを特徴とするエッチング装置。 - 中空構造を有し先端が開口している細管と、
基板を載置するステージと、
前記基板上の所定の位置に前記細管を移動させ該細管の先端を被加工面に接触させる位置制御手段と、
前記細管に処理剤を供給する材料貯蔵室と、
前記細管より前記処理剤を吐出する吐出制御手段と、
前記吐出した前記処理剤を吸引する吸引制御手段と
を有することを特徴とするエッチング装置。 - 請求項10乃至13のいずれか一項において、前記細管は針状であることを特徴とするエッチング装置。
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