JP2008081599A - 薄膜顔料の製造方法 - Google Patents
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- 239000010409 thin film Substances 0.000 title claims abstract description 72
- 239000000049 pigment Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 229910052751 metal Inorganic materials 0.000 claims abstract description 64
- 239000002184 metal Substances 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 28
- 239000010408 film Substances 0.000 claims description 24
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- 239000011777 magnesium Substances 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 239000010936 titanium Substances 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 239000010955 niobium Substances 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 238000009832 plasma treatment Methods 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000003921 oil Substances 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- 238000010298 pulverizing process Methods 0.000 abstract description 3
- 238000000227 grinding Methods 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000000470 constituent Substances 0.000 description 8
- 238000004804 winding Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000007639 printing Methods 0.000 description 7
- 239000004372 Polyvinyl alcohol Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229920002451 polyvinyl alcohol Polymers 0.000 description 6
- 239000002195 soluble material Substances 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 150000001247 metal acetylides Chemical class 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- -1 oxides Chemical class 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
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Abstract
【解決手段】本発明の薄膜顔料の製造方法は、基材1上に、所定のパターン形状の水溶性又は油溶性の下地層2を形成する工程と、基材1上に、金属又は金属化合物からなる薄膜3を成膜する工程と、基材1を水又は油中に浸漬して下地層2を溶解し、上記金属又は金属化合物からなる薄片3Aを上記基材1から分離して回収する工程とを有する。本発明によれば、下地層2のパターン形状を任意に設定することによって所望の形状を有する金属薄片3Aを容易かつ低コストで製造できる。また、粉砕等の機械的微細化工程を施さないため、薄片の表面平滑性を高く維持することができる。
【選択図】図1
Description
(1)基材上に、所定のパターン形状の水溶性又は油溶性の下地層を形成する工程と、 (2)基材上に、金属又は金属化合物からなる薄膜を成膜する工程と、
(3)基材を水又は油中に浸漬して下地層を溶解し、上記金属又は金属化合物からなる薄片を基材から分離して回収する工程とを有する。
2 下地層
3 金属薄膜
3A 金属薄片(薄膜顔料)
10,20 巻取式真空蒸着装置
11 真空槽
12 巻出しローラ
13 メインローラ
14 巻取りローラ
15 蒸発源
16 電子ビーム照射器
17 下地層形成ユニット
18 プラズマ形成部
30 成膜装置
31 真空槽
33A,33B スパッタカソード
Claims (6)
- 基材上に、所定のパターン形状の水溶性又は油溶性の下地層を形成する工程と、
前記基材上に、金属又は金属化合物からなる薄膜を成膜する工程と、
前記基材を水又は油中に浸漬して前記下地層を溶解し、前記金属又は金属化合物からなる薄片を前記基材から分離して回収する工程とを有することを特徴とする薄膜顔料の製造方法。 - 前記金属は、アルミニウム、銅、ニッケル、クロム、鉄、ケイ素、タンタル、ニオブ、チタン、ジルコニウム、マグネシウム、銀、金、白金及びパラジウムのうち何れか1種類の金属、又はこれらのうち2種類以上の合金であることを特徴とする請求項1に記載の薄膜顔料の製造方法。
- 前記金属化合物は、アルミニウム、銅、ニッケル、クロム、鉄、ケイ素、タンタル、ニオブ、チタン、ジルコニウム、マグネシウム、銀のうち何れか1種類の金属又はこれらのうち2種類以上の合金の酸化物、窒化物又は炭化物であることを特徴とする請求項1に記載の薄膜顔料の製造方法。
- 前記薄膜は、屈折率の異なる2種類の金属酸化物を交互に積層した積層膜であることを特徴とする請求項1に記載の薄膜顔料の製造方法。
- 前記基材は可撓性フィルムからなり、前記基材を連続的に巻き取りながら前記薄膜を成膜することを特徴とする請求項1に記載の薄膜顔料の製造方法。
- 前記薄膜の成膜工程の後に、前記薄膜の表面をプラズマ処理する工程を有する
ことを特徴とする請求項1に記載の薄膜顔料の製造方法。
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JP2008081599A true JP2008081599A (ja) | 2008-04-10 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102262939A (zh) * | 2010-05-28 | 2011-11-30 | 三星电机株式会社 | 金属粉末制备方法和多层陶瓷电容器的内部电极制造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0977997A (ja) * | 1994-12-14 | 1997-03-25 | Basf Corp | 水性塗料組成物に使用するための、光学的に可変な顔料の安定化 |
JP2003528168A (ja) * | 2000-02-04 | 2003-09-24 | エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | 光沢のある顔料とその製造のための方法 |
JP2005307237A (ja) * | 2004-04-19 | 2005-11-04 | Ulvac Japan Ltd | 薄膜顔料製造方法 |
JP2006028427A (ja) * | 2004-07-20 | 2006-02-02 | Sumitomo Metal Mining Co Ltd | 耐食光輝性顔料とその製造方法、および耐食光輝性塗膜用塗料組成物 |
JP2006521463A (ja) * | 2003-01-17 | 2006-09-21 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | ナノ粒子を含有する多孔質無機材料またはマトリックス材料の製造方法 |
-
2006
- 2006-09-27 JP JP2006263221A patent/JP4931054B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0977997A (ja) * | 1994-12-14 | 1997-03-25 | Basf Corp | 水性塗料組成物に使用するための、光学的に可変な顔料の安定化 |
JP2003528168A (ja) * | 2000-02-04 | 2003-09-24 | エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | 光沢のある顔料とその製造のための方法 |
JP2006521463A (ja) * | 2003-01-17 | 2006-09-21 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | ナノ粒子を含有する多孔質無機材料またはマトリックス材料の製造方法 |
JP2005307237A (ja) * | 2004-04-19 | 2005-11-04 | Ulvac Japan Ltd | 薄膜顔料製造方法 |
JP2006028427A (ja) * | 2004-07-20 | 2006-02-02 | Sumitomo Metal Mining Co Ltd | 耐食光輝性顔料とその製造方法、および耐食光輝性塗膜用塗料組成物 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102262939A (zh) * | 2010-05-28 | 2011-11-30 | 三星电机株式会社 | 金属粉末制备方法和多层陶瓷电容器的内部电极制造方法 |
JP2011249753A (ja) * | 2010-05-28 | 2011-12-08 | Samsung Electro-Mechanics Co Ltd | 金属粉末の製造方法及びこれを用いる積層コンデンサ用内部電極の製造方法 |
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